CN210272275U

CN210272275U - Cleaning device

Info

Publication number: CN210272275U
Application number: CN201921417914.2U
Authority: CN
Inventors: 蒋国彪
Original assignee: Changxin Memory Technologies Inc
Current assignee: Changxin Memory Technologies Inc
Priority date: 2019-08-28
Filing date: 2019-08-28
Publication date: 2020-04-07
Anticipated expiration: 2029-08-28

Abstract

The utility model relates to the field of semiconductor technology, a belt cleaning device is disclosed. In the utility model, the cleaning device comprises a cleaning box; the rotating platform is arranged in the cleaning box and used for placing and driving the object to be cleaned to rotate; the ventilation opening is arranged above the rotating platform and used for inputting dust-free air into the cleaning box; a first baffle plate arranged around the rotating table; the second baffle plate and the third baffle plate extend upwards from the first baffle plate and towards the direction close to the inner part of the first baffle plate, the second baffle plate is at least partially positioned above the rotating table, the third baffle plate is positioned above the second baffle plate, and the included angle between the third baffle plate and the rotating table is larger than that between the second baffle plate and the rotating table; the second baffle and the first baffle form a ventilation channel with the rotating platform at intervals. The utility model discloses embodiment provides a belt cleaning device has the particle of effectual reduction treating the washing thing surface and remains.

Description

Cleaning device

Technical Field

The utility model relates to the field of semiconductor technology, in particular to belt cleaning device.

Background

With the rapid development of semiconductor integrated circuit manufacturing technology, the pattern feature size of integrated circuit chips has entered the deep submicron stage, and the critical contaminant feature size causing the failure or damage of ultra-fine circuits on the chips has been greatly reduced.

During the integrated circuit manufacturing process, a semiconductor wafer is usually subjected to a plurality of processing steps, such as film deposition, etching, polishing, etc. These process steps become important sites for the generation of stains. In order to maintain the surface of the silicon wafer in a clean state and remove contaminants deposited on the surface of the silicon wafer in the respective process steps, it is necessary to perform a cleaning process on the silicon wafer after undergoing each process step. Therefore, the cleaning process becomes the most common process step in the integrated circuit fabrication process, and the objective is to effectively control the contamination level of each step to achieve the goal of each process step.

In order to effectively remove stains on the surface of a silicon wafer, a water washing machine special for washing the silicon wafer appears in the prior art, and in the water washing machine, the silicon wafer is placed on a rotating platform in a cavity of a single wafer washing machine and rotates at a certain speed; and simultaneously spraying water with a certain flow rate to the surface of the silicon wafer to clean the surface of the silicon wafer. Meanwhile, in order to prevent the liquid drops from splashing, a baffle is arranged around the cleaning table.

In addition, after the silicon wafer is cleaned by the water washing machine table in the prior art, the silicon wafer needs to be ventilated to blow off particle residues such as liquid drops on the silicon wafer, a ventilation channel is formed between the baffle and the rotating table at the moment, and introduced air enters the ventilation channel to blow off particles and is discharged from the ventilation channel.

However, the inventor of the present invention finds that the wind speed is slow in the process of blowing off the particles by the existing cleaning device, the effect is poor, and more particles are still remained on the surface of the silicon wafer.

SUMMERY OF THE UTILITY MODEL

An object of the embodiment of the utility model is to provide a cleaning device, can effectual reduction treat that the particle on washing thing surface remains.

In order to solve the above technical problem, an embodiment of the present invention provides a cleaning device, including: a cleaning tank; the rotating platform is arranged in the cleaning box and used for placing and driving the object to be cleaned to rotate; the ventilation opening is arranged above the rotating platform and used for inputting dust-free air into the cleaning box; the first baffle is arranged around the rotating platform, and the first baffle and the rotating platform are arranged at intervals; the second baffle and the third baffle are located above the rotating table, the third baffle is located above the second baffle, and the included angle between the third baffle and the rotating table is larger than that between the second baffle and the rotating table.

The utility model discloses embodiment is less than the contained angle of third baffle and revolving stage for prior art, the contained angle that sets up second baffle and revolving stage, when exhausting to wasing the case, the contained angle of third baffle among the contained angle of second baffle and revolving stage than prior art is littleer, carminative effect area is littleer, the exhaust effect is concentrated more, under the unchangeable condition of combustion gas total amount, the effect area is littleer, the wind speed is big during the exhaust, the big particle that then takes out of wind speed is more big more, thereby the effectual particle that reduces and treat to wash the thing surface remains. In addition, the ventilation opening inputs dustless air into the cleaning box, so that the cleanliness in the cleaning box is kept, and the influence of particles in the cleaning box on the cleaning effect of the object to be cleaned is reduced.

In addition, the included angle between the second baffle and the rotating platform is less than or equal to 30 degrees and greater than or equal to 20 degrees.

Additionally, the first baffle includes a first inner surface proximate the rotary stage, the first inner surface having a hydrophilic coating disposed thereon. The hydrophilic coating is arranged on the first inner surface, and can effectively absorb liquid drops splashed to the first inner surface of the object to be cleaned in the rotating process along with the rotating table, so that the probability that the liquid is splashed to the object to be cleaned again is reduced, and the particle residue on the surface of the object to be cleaned is further reduced.

In addition, the first baffle includes a first inner surface adjacent to the rotary table, the first inner surface being a rough surface. The first inner surface is a rough surface, and the liquid drops splashed to the first inner surface by the object to be cleaned in the rotating process along with the rotating table can be better attached to the first inner surface, so that the probability that the liquid is splashed to the object to be cleaned again is reduced, and the particle residue on the surface of the object to be cleaned is further reduced.

Additionally, the second baffle includes a second inner surface adjacent to the rotary stage, the second inner surface having a hydrophilic coating disposed thereon. The hydrophilic coating is arranged on the second inner surface, and can effectively absorb liquid drops splashed to the second inner surface of the object to be cleaned in the rotating process along with the rotating table, so that the probability that the liquid is splashed to the object to be cleaned again is reduced, and the particle residue on the surface of the object to be cleaned is further reduced.

In addition, the second baffle includes a second inner surface adjacent to the rotary table, the second inner surface being a rough surface. The second inner surface is a rough surface, and the liquid drops splashed to the second inner surface by the object to be cleaned in the rotating process along with the rotating table can be better attached to the first inner surface, so that the probability that the liquid is splashed to the object to be cleaned again is reduced, and the particle residue on the surface of the object to be cleaned is further reduced.

In addition, the device also comprises an air pressure control valve connected with the cleaning tank, wherein the air pressure control valve is used for controlling the exhaust air pressure in the cleaning tank to be greater than or equal to 160 pascal and less than or equal to 180 pascal. The air pressure control valve controls the exhaust air pressure in the cleaning box to be greater than or equal to 160 pascals, and the larger the exhaust air pressure is, the larger the air speed is during exhaust, so that the particle residue on the surface of the object to be cleaned is further reduced; the exhaust air pressure in the cleaning box is controlled to be less than or equal to 180 pascals, so that waste of power resources caused by excessive air pressure is avoided.

In addition, the wind speed meter also comprises an exhaust pipeline connected with the cleaning box and an anemometer arranged in the exhaust pipeline and used for measuring the exhaust wind speed in the exhaust pipeline. The anemometer is arranged in the exhaust pipeline, so that the wind speed in the exhaust pipeline is acquired in real time, and the exhaust process is conveniently controlled.

In addition, still include with the fan filter unit of vent intercommunication, fan filter unit is used for to wash the incasement input dustless air.

In addition, still include from revolving stage downwardly extending's fourth baffle, the fourth baffle with first baffle presss from both sides and establishes and forms exhaust passage.

In addition, the cleaning device also comprises a positioning device which is arranged inside the fourth baffle and used for positioning the object to be cleaned. Set up the position that the thing was waited to wash in the positioner location, avoid waiting to wash the thing and place the position deviation and cause the damage at rotatory in-process, in addition, positioner sets up inside the fourth baffle, and the liquid drop that can reduce to splash in the cleaning process causes the damage to positioner's electron device.

In addition, the cleaning device also comprises a fixing piece which is arranged on the rotating platform and used for fixing the object to be cleaned. Set up the mounting on the revolving stage, treat to wash the thing and fix, avoid the revolving stage to treat the rotatory in-process of washing thing in the drive, treat that the washing thing breaks away from the revolving stage and cause the damage.

Drawings

Fig. 1 is a schematic structural view of a cleaning apparatus according to a first embodiment of the present invention;

FIG. 2 is a schematic representation of the cleaning results of a prior art water wash apparatus;

fig. 3 is a schematic view of a cleaning result of the cleaning apparatus according to the first embodiment of the present invention;

fig. 4 is a schematic structural view of a cleaning device according to a second embodiment of the present invention;

fig. 5 is a schematic structural view of a cleaning apparatus according to a third embodiment of the present invention;

fig. 6 is a schematic structural view of a cleaning apparatus according to a fourth embodiment of the present invention;

FIG. 7 is a graph of wind velocity versus total number of particles in an embodiment of the present invention;

FIG. 8 is an image of the particle at point 1 of FIG. 7;

FIG. 9 is an image of the particle at point 2 of FIG. 7;

FIG. 10 is an image of the particle at point 3 of FIG. 7;

FIG. 11 is an image of the particle at point 4 of FIG. 7;

FIG. 12 is an image of the particle at point 5 of FIG. 7;

fig. 13 is an image of the particles at point 6 in fig. 7.

Reference numerals: 10-cleaning box, 20-rotating table, 30-first baffle, 31-first inner surface, 40-second baffle, 41-second inner surface, 50-fan filter unit, 60-fixing piece, 70-third baffle, 80-positioning device, 90-fourth baffle, 100-hydrophilic coating, 110-exhaust pipeline and 120-anemometer.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention clearer, the following will explain in detail each embodiment of the present invention with reference to the accompanying drawings. However, it will be appreciated by those of ordinary skill in the art that in various embodiments of the invention, numerous technical details are set forth in order to provide a better understanding of the present application. However, the technical solution claimed in the present application can be implemented without these technical details and various changes and modifications based on the following embodiments.

A first embodiment of the present invention relates to a cleaning device, as shown in fig. 1, including: the cleaning device comprises a cleaning box 10, a rotating platform 20 arranged in the cleaning box 10, wherein the rotating platform 20 is used for placing an object to be cleaned and driving the object to be cleaned to rotate, the object to be cleaned generally refers to a silicon wafer after water cleaning, fine liquid drops and other particles are remained on the surface of the silicon wafer, a first baffle plate 30 arranged around the rotating platform 20, a second baffle plate 40 and a third baffle plate 70 extending upwards from the first baffle plate 30 and towards the direction close to the inner part of the first baffle plate 30, at least part of the second baffle plate 40 is positioned above the rotating platform 20, the third baffle plate 70 is positioned above the second baffle plate 40, and the included angle between the third baffle plate 70 and the rotating platform 20 is larger than the included angle between the second baffle plate 40 and the rotating platform 20; the second baffle 40 and the first baffle 30 form a ventilation channel with the rotating platform 20. In addition, a ventilation opening is provided in the cleaning tank 10 for introducing the dust-free air into the cleaning tank 10.

Compared with the prior art, the utility model discloses among the cleaning device that the first embodiment provided, the contained angle of second baffle 40 and revolving stage 20 is less than the contained angle of third baffle 70 and revolving stage 20, when exhausting to wasing case 10, the contained angle of second baffle 40 and revolving stage 20 is less, carminative effect area is less, the exhaust effect is concentrated more, under the unchangeable condition of combustion gas total amount, the effect area is less, the wind speed is big more during the exhaust, the big particle that then takes out of wind speed is more, thereby the cleaning performance of wasing the thing is treated in effectual promotion, it remains to reduce the particle of waiting to wash the thing surface. The second baffle 40 is at least partially located above the rotating platform 20, so that liquid drops splashed by the rotating platform 20 can be effectively blocked, the influence of the liquid drops on electronic devices in the cleaning box 10 is reduced, meanwhile, the air flow flows downwards along the second baffle 40 and the first baffle 30, and the air flow is convenient for taking away particles. In addition, set up the vent and to wasing the interior dustless air of input of case 10 to guarantee to wash the cleanliness factor in the case 10, avoid wasing the cleaning performance that the thing was treated to the micronic dust in the case 10 and cause the influence. The third baffle 70 is longer than the second baffle 40 to provide an effective shield against liquid during cleaning and to prevent liquid droplets from splashing outside and affecting parts outside the baffles within the wash tank 10.

Preferably, in the present embodiment, the cleaning apparatus further includes a fan filter unit 50 communicated with the ventilation opening, and the fan filter unit 50 is used for inputting the dust-free air into the cleaning tank 10. It is understood that in this embodiment, the fan filter unit 50 is located inside the cleaning tank 10, but in other embodiments of the present invention, the fan filter unit 50 may also be located outside the cleaning tank 10, and is not limited herein, and may be flexibly set according to actual needs.

Preferably, in the present embodiment, the cleaning apparatus further includes a fixing member 60 for fixing the object to be cleaned, and the fixing member 60 is disposed on the rotating table 20. Set up mounting 60 on revolving stage 20 and wait to wash the thing with the fixed to guarantee to wait to wash the thing and revolving stage 20's zonulae occludens, avoid in the cleaning process, revolving stage 20 and wait to take place relative slip between the thing, wait to wash the thing even and drop from revolving stage 20 and cause the damage of waiting to wash the thing.

Specifically, in the present embodiment, the fixing member 60 is a fixing clip. It should be understood that the fixing member 60 is a fixing clip, which is only a specific example in this embodiment, and is not limited thereto, and in other embodiments of the present invention, the fixing member 60 may also be other structures, such as a suction cup, which are not illustrated herein, and can be flexibly set according to actual needs.

Further, in the present embodiment, the distance between the contact point (point a in fig. 1) of the first shutter 30 and the second shutter 40 and the contact point (point B in fig. 1) of the first shutter 30 and the third shutter 70 is 3 cm.

In addition, in this embodiment, the cleaning device further includes a positioning device 80 for positioning the object to be cleaned, the positioning device 80 is provided for positioning the object to be cleaned, and the object to be cleaned is placed and damaged in the rotating cleaning process due to the deviation of the placing position.

Further, in the present embodiment, the turntable further includes a fourth baffle 90 extending downward from the turntable 20, and the fourth baffle 90 and the first baffle 30 form an exhaust passage therebetween; the positioning device 80 is disposed inside the fourth baffle 90. The positioning device 80 is arranged inside the fourth baffle 90, so that the possibility that liquid drops generated in the cleaning and exhausting processes fall on the positioning device 80 can be effectively reduced, and the damage of the liquid drops to electronic devices in the positioning device 80 is reduced.

Next, a specific use example of the cleaning device according to the first embodiment of the present invention is specifically described, fig. 2 is a schematic diagram showing a cleaning result of a water washing device in the prior art, and fig. 3 is a schematic diagram showing a cleaning result of the cleaning device according to the first embodiment of the present invention; wherein the first circle is the pre-particle test value, the second circle is the particle map after the cleaning device process, and the third circle is the particle map of the second circle minus the first circle. It can be seen that the number of particles cleaned by the cleaning device provided by the first embodiment of the present application is significantly less than that of particles cleaned by the prior art cleaning device. It is understood that fig. 2 and 3 are only schematic diagrams of experimental results and are not limiting in any way.

A second embodiment of the present invention relates to a cleaning apparatus, and as shown in fig. 4, the second embodiment is substantially the same as the first embodiment, and also includes a cleaning tank 10, a cleaning table 20, a first baffle 30, a second baffle 40, a fan filter unit 50, a fixing member 60, a third baffle 70, a positioning device 80, and a fourth baffle 90; in contrast, in the present embodiment, the first barrier 30 includes a first inner surface 31 adjacent to the rotating table 20, and the cleaning apparatus further includes a hydrophilic coating 100 disposed on the first inner surface 31.

Specifically, in the present embodiment, the material of the hydrophilic coating 100 is dimethylacetamide. It is to be understood that the material of the hydrophilic coating 100 is dimethylacetamide merely as a specific example in this embodiment, and is not limited thereto, and in other embodiments of the present invention, the material of the hydrophilic coating 100 may be resin or the like, and is not limited thereto, and may be flexibly set according to actual needs.

Compared with the prior art, the utility model discloses the belt cleaning device that the second embodiment provided sets up hydrophilic coating 100 on the internal surface of first baffle 30 when keeping first embodiment's whole technological effect, because in the cleaning process, the liquid drop exists the anti phenomenon that spatters, the liquid of waiting to wash the thing by throwing away promptly is sputtered back to waiting to wash the thing by first baffle 30, increase hydrophilic coating 100 at first internal surface 31, increase hydrophilicity, hydrophilic coating 100 is better to the absorption performance of liquid drop, the aqueous vapor is adsorbed by hydrophilic coating 100 after spattering first internal surface 31, reduce the anti phenomenon that spatters, further promotion cleaning performance.

Preferably, in the present embodiment, the second baffle 40 includes a second inner surface 41 adjacent to the rotating table 20, and the hydrophilic coating 100 is disposed on the second inner surface 41. The hydrophilic coating 100 is arranged on the second inner surface 41, so that splashed liquid drops are further adsorbed, the reverse sputtering process of the liquid drops is further reduced, and the cleaning effect is better improved.

The third embodiment of the present invention relates to a cleaning apparatus, and as shown in fig. 5, the third embodiment is substantially the same as the first embodiment, and also includes a cleaning tank 10, a cleaning table 20, a first baffle 30, a second baffle 40, a fan filter unit 50, a fixing member 60, a third baffle 70, a positioning device 80, and a fourth baffle 90; in contrast, in the present embodiment, the first shutter 30 includes a first inner surface 31 adjacent to the turntable 20, and the first inner surface 31 is a rough surface.

Compared with the prior art, the utility model discloses the belt cleaning device that the third embodiment provided sets up first internal surface 31 into rough surface when keeping the whole technological effects of first embodiment, and when the liquid drop splashed to first internal surface 31, the liquid drop that the absorption that rough surface can be better splashed reduced the phenomenon of splashing, further promotion cleaning performance.

Preferably, in the present embodiment, the second baffle 40 includes a second inner surface 41 adjacent to the rotating table 20, and the second inner surface 41 is a rough surface. The second inner surface 41 is a rough surface, so that splashed liquid drops are further adsorbed, the reverse sputtering process of the liquid drops is further reduced, and the cleaning effect is better improved.

A fourth embodiment of the present invention relates to a cleaning apparatus, and as shown in fig. 6, the second embodiment is substantially the same as the first embodiment, and also includes a cleaning tank 10, a cleaning table 20, a first baffle 30, a second baffle 40, a fixing member 50, a third baffle 60, a positioning device 70, a fourth baffle 80, and a fan filter unit 90; in contrast, in the present embodiment, an air pressure control valve (not shown) connected to the purge tank 10 is further included, and the air pressure control valve is configured to control the exhaust air pressure in the purge tank 10 to be greater than or equal to 160 pascal and less than or equal to 180 pascal.

Compared with the prior art, the fourth embodiment of the present invention maintains all the technical effects of the first embodiment, and controls the exhaust pressure in the cleaning box 10 to be greater than or equal to 160 pascals through the air pressure control valve, and the larger the exhaust pressure is, the larger the air speed is when exhausting air, thereby further reducing the particle residue on the surface of the object to be cleaned; meanwhile, the exhaust air pressure in the cleaning box 10 is controlled to be less than or equal to 180 pascals through the air pressure control valve, so that the electric quantity consumption caused by overlarge air pressure is effectively reduced, and the electric power resource is effectively saved.

Preferably, in the present embodiment, the air exhaust duct 110 connected to the cleaning tank 10 is further provided, and the anemometer 120 is disposed inside the air exhaust duct 110, and the anemometer 120 is configured to measure the speed of the exhaust air in the air exhaust duct 110. The anemometer 120 is arranged for measuring the exhaust air speed in the exhaust pipeline 110, so that the exhaust air speed is monitored in real time, and when the exhaust air speed is too small, the air pressure control valve can control the exhaust air pressure in the cleaning box 10 to increase, so that the exhaust air speed is increased, and the cleaning effect of the object to be cleaned is ensured.

The following embodiments are given by way of example, and it is to be understood that the following is only a specific example of the embodiments of the present invention, and is not to be construed as limiting.

As shown in tables 1 and 2, the wind speeds at different exhaust pressures are shown, and it can be seen that the larger the exhaust pressure is, the larger the wind speed is.

TABLE 1

Air pressure (Pascal)	Wind speed (meter/second)
		173	5.96
175	5.92
		171	5.83
175	5.98
		174	6.08
175	6.08
		178	5.99
177	6.18

TABLE 2

Fig. 7 is a particle count at different wind speeds, fig. 8 is a particle test image at a point 1 in fig. 7, fig. 9 is a particle test image at a point 2 in fig. 7, fig. 10 is a particle test image at a point 3 in fig. 7, fig. 11 is a particle test image at a point 4 in fig. 7, fig. 12 is a particle test image at a point 5 in fig. 7, and fig. 13 is a particle test image at a point 6 in fig. 7. In fig. 8-13, the first circle is the pre-particle test value, the second circle is the particle map after the cleaning device process, and the third circle is the particle map of the second circle minus the first circle. As can be seen from fig. 7 to 13, when the wind speed is less than 5.7 m/s, the number of particles is significantly reduced with the increase of the wind speed, and when the wind speed is greater than 5.7 m/s, the number of particles gradually becomes stable with the increase of the wind speed, so that it can be seen that the larger the wind speed is in a certain wind speed range, the better the cleaning effect is.

It will be understood by those skilled in the art that the foregoing embodiments are specific examples of the invention, and that various changes in form and details may be made therein without departing from the spirit and scope of the invention in its practical application.

Claims

1. A cleaning device, comprising:

a cleaning tank;

the rotating platform is arranged in the cleaning box and used for placing and driving the object to be cleaned to rotate;

the ventilation opening is arranged above the rotating platform and used for inputting dust-free air into the cleaning box;

a first baffle plate disposed around the rotary table;

the second baffle plate and the third baffle plate extend upwards from the first baffle plate and towards the direction close to the interior of the first baffle plate, at least part of the second baffle plate is positioned above the rotating table, the third baffle plate is positioned above the second baffle plate, and the included angle between the third baffle plate and the rotating table is larger than that between the second baffle plate and the rotating table;

and ventilation channels are formed among the second baffle plate, the first baffle plate and the rotating platform at intervals.

2. The cleaning apparatus of claim 1, wherein the angle between the second baffle and the rotating table is less than or equal to 30 ° and greater than or equal to 20 °.

3. The cleaning apparatus defined in claim 1, wherein the first baffle comprises a first inner surface adjacent the rotatable table, the first inner surface having a hydrophilic coating disposed thereon.

4. The cleaning apparatus defined in claim 1, wherein the first baffle comprises a first inner surface adjacent the rotary table, the first inner surface being a rough surface.

5. The cleaning apparatus defined in claim 1, wherein the second baffle comprises a second inner surface adjacent to the rotary stage, the second inner surface having a hydrophilic coating disposed thereon.

6. The cleaning apparatus defined in claim 1, wherein the second baffle comprises a second interior surface adjacent to the rotary stage, the second interior surface being a roughened surface.

7. The cleaning device of claim 1, further comprising an air pressure control valve connected to the cleaning tank for controlling an exhaust air pressure within the cleaning tank greater than or equal to 160 pascals and less than or equal to 180 pascals.

8. The cleaning apparatus defined in claim 1, further comprising an exhaust duct connected to the cleaning tank and an anemometer disposed in the exhaust duct for measuring the velocity of exhaust air in the exhaust duct.

9. The cleaning apparatus defined in claim 1, further comprising a fan filter assembly in communication with the vent for inputting clean air into the cleaning tank.

10. The cleaning device of claim 1, further comprising a fourth baffle extending downward from the rotary table, the fourth baffle sandwiching the first baffle to form an exhaust channel;

the positioning device is arranged in the fourth baffle and used for positioning the object to be cleaned; the cleaning device also comprises a fixing piece which is arranged on the rotating platform and used for fixing the object to be cleaned.