CN210221001U - Calibration sample piece for evaluating and calibrating deep groove measuring capability of contour testing instrument - Google Patents
Calibration sample piece for evaluating and calibrating deep groove measuring capability of contour testing instrument Download PDFInfo
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- CN210221001U CN210221001U CN201921171165.XU CN201921171165U CN210221001U CN 210221001 U CN210221001 U CN 210221001U CN 201921171165 U CN201921171165 U CN 201921171165U CN 210221001 U CN210221001 U CN 210221001U
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Abstract
The utility model discloses a calibration sample piece for evaluating and calibrating deep groove measuring capability of a contour testing instrument, which comprises a substrate, a standard deep groove structure and a cleavage guide structure; the standard deep groove structure consists of a series of analysis grooves which are arranged in parallel and have the same depth; the cleavage guide structures are positioned on two sides of the standard deep groove structure and can be in a hexahedral shape, a triangular shape, a rectangular shape or a combined shape of the hexahedral shape, the triangular shape and the rectangular shape, and the central axes are positioned on the same straight line and perpendicular to the length direction of the standard deep groove structure. The cleavage guide structure is added to assist in section sample preparation, the calibration sample piece is cleaved along a preset position, and the groove structure measurement in the vertical direction is converted into the section structure measurement in the horizontal direction, so that more accurate geometric parameters of the deep groove can be obtained, and the evaluation and calibration of the deep groove measurement capability of the surface profile measurement instrument can be realized; the measurement of the deep groove structure is not limited to silicon-based materials, but also applicable to amorphous materials.
Description
Technical Field
The utility model relates to an evaluation and calibration profile test instrument deep groove measuring ability's calibration sample spare belongs to calibration technical field.
Background
The continuous development of the integrated circuit industry, especially the continuous development of super junction technology and 2.5D and 3D packaging technology in recent years, puts higher requirements on etching and filling of deep trenches. Under the driving of continuous miniaturization and integration of a system, the characteristic size of the deep groove structure is continuously reduced, the influence of the morphology characteristic on a device becomes more important, and therefore, the accurate measurement of the size of the deep groove structure has important significance for controlling the process and improving the yield.
The traditional method for measuring the micro-nano structure comprises a step profiler, an atomic force microscope, a Fizeau interferometer and the like, but along with the reduction of the characteristic size, the method cannot meet the measurement requirement of the deep groove structure with a large depth-to-width ratio: the step profiler and the atomic force microscope adopt a probe contact type measuring mode, and when the groove is measured, the needle point needs to be deep into the bottom of the groove, so that the test scene with small characteristic size and large depth-to-width ratio cannot be met; the Fizeau interferometer performs testing by utilizing the mutual interference of reflected light of a tested surface, and the incidence and reflection of light rays of a groove with a large depth-to-width ratio are difficult, so that the Fizeau interferometer is only suitable for a structure with slowly changed surface appearance.
The paper "Real-time etch-depthmeasues of MEMS devices" published by james m.bustillo, berkeley, california, 2002, proposes measuring the etch depth of MEMS devices using infrared reflectance spectroscopy. Patents CN101131317, CN201138196, CN101393015 and CN102082108A also disclose measurement schemes combining infrared reflection spectroscopy with equivalent medium theory to realize geometric parameter measurement of trench width and depth with high aspect ratio. However, the method has complicated optical path, requires the substrate material to be infrared transparent, and has complicated rear-end signal processing of the equivalent medium theory, and is easy to introduce errors.
Although the current micro-nano processing technology can prepare a deep trench structure with a larger depth-to-width ratio, due to the limitation of the measuring method, the geometric parameters of the deep trench structure with the large depth-to-width ratio cannot be directly and accurately measured, so that an effective calibration sample and a calibration method are still lacked to evaluate and calibrate the deep trench measuring capability of a surface profile measuring instrument at present.
SUMMERY OF THE UTILITY MODEL
Based on the above description, it is necessary to provide a method for accurately measuring the geometric parameters of a deep trench structure with a simple system and a wide application range, and the utility model discloses a calibration sample piece for evaluating and calibrating the deep trench measuring capability of a profile testing instrument.
The purpose of the utility model is realized like this:
a calibration sample piece for evaluating and calibrating deep groove measuring capability of a contour test instrument; the device comprises a dielectric substrate (1), a standard deep groove structure (2) and a cleavage guide structure (3); the cleavage guide structures (3) are positioned on two sides of the standard deep groove structure (2), so that the calibration sample piece can be cleaved along a preset position, the groove structure measurement in the vertical direction is converted into the section structure measurement in the horizontal direction, more accurate geometric parameters of the deep groove are obtained, and the deep groove measurement capability of the surface profile measuring instrument can be evaluated and calibrated conveniently.
The calibration sample piece for evaluating and calibrating the deep groove measuring capability of the contour testing instrument comprises a standard deep groove structure and a standard contour testing device, wherein the standard deep groove structure consists of a series of analysis grooves which are arranged in parallel and have the same depth, and the widths of the analysis grooves can be unchanged or can be increased at equal intervals;
in the calibration sample piece for evaluating and calibrating the deep groove measuring capability of the profile testing instrument, the cleavage guiding structure can be hexagonal, triangular, rectangular or a combination of the hexagonal, triangular and rectangular shapes; can be combined by a plurality of structures; wherein the axes are positioned on the same straight line and vertical to the length direction of the standard deep trench structure;
according to the calibration sample piece for evaluating and calibrating the deep groove measuring capability of the profile testing instrument, the base material is not limited, and the section sample prepared according to the guide structure can be measured in various ways, including an optical microscope, an atomic force microscope, a scanning electron microscope, a confocal microscope and the like.
The utility model relates to an evaluation and calibration profile test instrument deep groove measuring ability's calibration sample spare, its operating procedure includes:
(1) preparing proper cleavage guide structures on two sides of the deep trench structure when the deep trench structure is prepared;
(2) under the assistance of a cleavage guide structure, carrying out section sample preparation;
(3) the deep groove structure vertical to the measuring scanning surface is converted into a structure parallel to the measuring scanning surface, and then the measured groove is measured by using measuring instruments such as a microscope, a contourgraph and the like, so that the geometric shape of the measured groove is accurately obtained.
Has the advantages that:
firstly, a cleavage guide structure is added on two sides of a standard deep groove structure to assist profile sample preparation, so that a calibration sample piece is cleaved along a preset position, the groove structure measurement in the vertical direction is converted into the profile structure measurement in the horizontal direction, the measurement accuracy is ensured, and the evaluation and calibration of the deep groove measurement capability of a surface profile measuring instrument are facilitated.
Secondly, the addition of the guide structure enables the measurement of the deep groove structure not only to be limited to silicon-based materials, but also to be applicable to amorphous materials.
Thirdly, the measurement method of the prepared section sample is many, and is not limited to a scanning electron microscope, an atomic force microscope and the like.
Drawings
FIG. 1 is a first top view of a calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument according to the present invention.
FIG. 2 is a second top view of a calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument according to the present invention.
In the figure: 1 deep trench, 2 guide structure, 3 substrate, the dotted line is the cross-hatching.
Detailed Description
The following describes in further detail embodiments of the present invention with reference to the accompanying drawings.
Detailed description of the preferred embodiment
The embodiment is an embodiment of a calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument.
The top view of the calibration sample for evaluating and calibrating the deep trench measurement capability of the profile testing apparatus in this embodiment is shown in fig. 1. The calibration sample piece comprises a substrate 1, a standard deep groove structure 2 and a cleavage guide structure 3; the material of the substrate 1 is silicon; the standard deep groove structure 2 has consistent width and depth; the cleavage guiding structure 3 is hexagonal, has a depth consistent with that of the standard deep trench structure 2, and is located at two sides of the standard deep trench structure 2, wherein the axes are located on the same straight line and perpendicular to the length direction of the standard deep trench structure. The preparation of the profile calibration sample is carried out by the following steps:
(1) when the deep groove structure is prepared, preparing hexagonal cleavage guide structures on two sides of the deep groove structure;
(2) carrying out section sampling with the aid of a cleavage guide structure so that the substrate is broken along a section line in fig. 1;
(3) and measuring the section of the measured groove by using an atomic force microscope to accurately obtain the geometric shape of the measured groove.
In the embodiment, the cleavage guide structures are added on two sides of the standard deep groove structure to assist profile sampling, so that the calibration sample piece is cleaved along a preset position, the coincidence of the measuring surface and the profile of the deep groove structure is ensured, and the measuring accuracy is ensured. The measurement of the groove structure in the vertical direction is converted into the measurement of the section structure in the horizontal direction, so that more accurate geometric parameters of the deep groove are obtained, and the evaluation and calibration of the deep groove measurement capability of the surface profile measuring instrument are facilitated.
Detailed description of the invention
The embodiment is an embodiment of a calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument.
In this embodiment, a top view of a calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing apparatus is shown in fig. 2. The calibration sample piece comprises a substrate 1, a standard deep groove structure 2 and a cleavage guide structure 3; the substrate 1 is made of glass; the standard deep trench structure 2 has consistent depth and increased width equal difference; the cleavage guiding structure 3 is composed of two triangular structures, has a depth smaller than that of the standard deep trench structure 2, and is located on two sides of the standard deep trench structure 2, wherein the axes are located on the same straight line and perpendicular to the length direction of the standard deep trench structure. The preparation of the profile calibration sample is carried out by the following steps:
(1) when the deep groove structure is prepared, triangular cleavage guide structures are prepared on two sides of the deep groove structure;
(2) under the assistance of the cleavage guide structure, performing cross-sectional sampling so that the substrate is broken along the cross-sectional line direction in fig. 2;
(3) and measuring the profile of the measured groove by using a step profiler, and accurately obtaining the geometric shape of the measured groove.
In the embodiment, the guide structures are added on two sides of the standard deep groove structure to assist profile sampling, so that the calibration sample piece is cleaved along a preset position, the coincidence of the measuring surface and the profile of the deep groove structure is ensured, and the measuring accuracy is ensured. The measurement of the groove structure in the vertical direction is converted into the measurement of the section structure in the horizontal direction, so that more accurate geometric parameters of the deep groove are obtained, and the evaluation and calibration of the deep groove measurement capability of the surface profile measuring instrument are facilitated. In addition, the addition of the cleavage guide structure enables the substrate material to be unlimited, and amorphous material glass can be selected.
Claims (8)
1. A calibration sample for evaluating and calibrating deep groove measuring capability of a contour test instrument is characterized by comprising a substrate (1), a standard deep groove structure (2) and a cleavage guide structure (3); the cleavage guide structures (3) are positioned on two sides of the standard deep groove structure (2) and used for simplifying section sample preparation, ensuring coincidence of a measuring surface and a section, and conveniently and accurately measuring parameters of the deep groove structure.
2. The calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument of claim 1, wherein said standard deep trench structure is comprised of a series of parallel analysis trenches of the same depth.
3. The calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument of claim 2, wherein said analysis trench width is constant or increases at equal intervals.
4. The calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument of claim 1, wherein the cleavage guide structure shape can be hexagonal, triangular, rectangular, or a combination thereof.
5. The calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument according to claim 1, 2, 3 or 4, wherein the central axes of the cleavage guide structures are located on the same line and perpendicular to the length direction of the standard deep trench structure.
6. The calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument as claimed in claim 1, 2, 3 or 4, wherein the cleavage guiding structure is a combination of structures, wherein the axes are aligned perpendicular to the length direction of the standard deep trench structure.
7. The calibration sample for evaluating and calibrating deep trench measurement capability of a profile testing instrument according to claim 1, 2, 3 or 4, wherein: the substrate material is not limited.
8. A calibration sample for evaluating and calibrating deep trench measurement capability of a profilometry instrument according to claim 1, 2, 3 or 4, wherein the cross-sectional sample prepared from the guide structure can be measured in a variety of ways, including optical microscopy, atomic force microscopy, scanning electron microscopy, confocal microscopy, etc.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921171165.XU CN210221001U (en) | 2019-07-24 | 2019-07-24 | Calibration sample piece for evaluating and calibrating deep groove measuring capability of contour testing instrument |
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| CN201921171165.XU CN210221001U (en) | 2019-07-24 | 2019-07-24 | Calibration sample piece for evaluating and calibrating deep groove measuring capability of contour testing instrument |
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| CN210221001U true CN210221001U (en) | 2020-03-31 |
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