CN209804667U - Laminated antireflection film for crystalline silicon solar cell - Google Patents
Laminated antireflection film for crystalline silicon solar cell Download PDFInfo
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- CN209804667U CN209804667U CN201920583284.XU CN201920583284U CN209804667U CN 209804667 U CN209804667 U CN 209804667U CN 201920583284 U CN201920583284 U CN 201920583284U CN 209804667 U CN209804667 U CN 209804667U
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- China
- Prior art keywords
- layer
- solar cell
- crystalline silicon
- antireflection film
- silicon solar
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- 229910021419 crystalline silicon Inorganic materials 0.000 title claims abstract description 41
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 90
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 49
- 239000002131 composite material Substances 0.000 claims abstract description 29
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 27
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 25
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 25
- TVUBDAUPRIFHFN-UHFFFAOYSA-N dioxosilane;oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4].O=[Si]=O TVUBDAUPRIFHFN-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 7
- 238000003475 lamination Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 19
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000010936 titanium Substances 0.000 abstract description 4
- 238000002161 passivation Methods 0.000 abstract description 3
- 230000001699 photocatalysis Effects 0.000 abstract description 3
- 238000007146 photocatalysis Methods 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 239000000969 carrier Substances 0.000 abstract description 2
- 210000004027 cell Anatomy 0.000 abstract 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 2
- 229910052719 titanium Inorganic materials 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 84
- 239000010408 film Substances 0.000 description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000004806 packaging method and process Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- 238000010248 power generation Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- Laminated Bodies (AREA)
Abstract
The utility model provides a stromatolite antireflection coating that crystalline silicon solar cell used, include silicon nitride layer, silica layer and titanium dioxide-silica composite bed that stack gradually on crystalline silicon solar cell surface, silicon nitride layer, silica layer and titanium dioxide-silica composite bed are independent antireflection rete. The reflected light can be sequentially subjected to interference offset to form triple antireflection, so that the effect is better; the silicon nitride layer is used as an antireflection film contacting with a Si substrate (namely a crystalline silicon solar cell), not only has antireflection characteristics, but also has a surface passivation effect, and can effectively prolong the service life of minority carriers of the crystalline silicon cell; the titanium dioxide-silicon dioxide composite layer is used as an antireflection film on the outermost layer, has certain hardness and photocatalysis, and can effectively prevent surface scratches and stain adhesion of the crystalline silicon cell; the silicon dioxide is used as the middle layer and plays a role in transitional bonding, so that the laminated structure is more compact and firm.
Description
Technical Field
The utility model relates to a photovoltaic power generation field, concretely relates to stromatolite antireflection coating that crystalline silicon solar cell used.
Background
the crystalline silicon solar cell is used for converting solar energy into electric energy for use, and the conversion efficiency is generally defined as the ratio of the output power of the crystalline silicon solar cell to the total power of sunlight incident on the surface of the crystalline silicon solar cell. The crystalline silicon solar cell module is a core part in a solar power generation system and is also the most important part in the solar power generation system. Therefore, in order to increase the absorption of light by the packaged crystalline silicon solar cell to improve the conversion efficiency, the reflection loss generated in the process of irradiating sunlight to the surface of the crystalline silicon solar cell is reduced.
With the development of solar energy technology, an antireflection film is generally plated on the surface of a crystalline silicon solar cell to reduce reflection loss and increase absorption of light. At present, a plurality of antireflection films are available, and a single-layer structure is usually adopted, so that an ideal antireflection effect is difficult to obtain.
SUMMERY OF THE UTILITY MODEL
Therefore, the utility model provides a stromatolite antireflection coating that compact structure, reasonable, the better brilliant silicon solar cell of antireflection effect used.
In order to achieve the above purpose, the utility model provides a technical scheme as follows:
a laminated antireflection film for a crystalline silicon solar cell comprises a silicon nitride layer, a silicon dioxide layer and a titanium dioxide-silicon dioxide composite layer which are sequentially laminated on the surface of the crystalline silicon solar cell, wherein the silicon nitride layer, the silicon dioxide layer and the titanium dioxide-silicon dioxide composite layer are independent antireflection film layers.
Further, the refractive index of the titanium dioxide-silicon dioxide composite layer is larger than that of the silicon dioxide layer.
Further, the refractive index of the silicon nitride layer is 2.01.
Further, the thickness of the film layer of the silicon nitride layer is 75-80 nm.
further, the refractive index of the silicon dioxide layer is 1.43.
Further, the thickness of the silicon dioxide layer is 105-112 nm.
further, the refractive index of the titania-silica composite layer was 1.74.
Further, the thickness of the film layer of the titanium dioxide-silicon dioxide composite layer is 85-92 nm.
Further, the silica layer is a silica layer having a silane coupling agent.
Through the utility model provides a technical scheme has following beneficial effect:
The silicon nitride layer, the silicon dioxide layer and the titanium dioxide-silicon dioxide composite layer which are sequentially stacked are adopted, and the silicon nitride layer, the silicon dioxide layer and the titanium dioxide-silicon dioxide composite layer are independent antireflection film layers, so that reflected light can be sequentially interfered and offset to form triple antireflection, and the effect is better;
The silicon nitride layer is used as an antireflection film contacting with a Si substrate (namely a crystalline silicon solar cell), not only has antireflection characteristics, but also has a surface passivation effect, and can effectively prolong the service life of minority carriers of the crystalline silicon cell; the titanium dioxide-silicon dioxide composite layer is used as an antireflection film on the outermost layer, a Si-O-Ti bond can be obtained by mixing the titanium dioxide and the silicon dioxide, the bond has a crosslinking effect, the two substances are uniformly dispersed, and meanwhile, a thin film with a refractive index between the two substances is obtained, the titanium dioxide enables the layer to have certain hardness and a photocatalysis effect, so that surface scratching and stain adhesion of the crystalline silicon cell piece can be effectively prevented; the silicon dioxide is used as the middle layer and plays a role in transitional bonding, so that the laminated structure is more compact and firm;
The laminated antireflection film is compact and reasonable in structure and better in antireflection effect, and has a good antireflection effect on light with the wavelength of 220-plus-1200 nm under the packaging condition of the crystalline silicon solar cell, so that the conversion efficiency of the crystalline silicon solar cell after packaging is improved.
Drawings
Fig. 1 is a schematic structural view of a laminated antireflection film in an example.
Detailed Description
To further illustrate the embodiments, the present invention provides the accompanying drawings. The accompanying drawings, which are incorporated in and constitute a part of this disclosure, illustrate embodiments of the invention and, together with the description, serve to explain the principles of the embodiments. With these references, one of ordinary skill in the art will appreciate other possible embodiments and advantages of the present invention. Elements in the figures are not drawn to scale and like reference numerals are generally used to indicate like elements.
The present invention will now be further described with reference to the accompanying drawings and detailed description.
Example one
Referring to fig. 1, the laminated antireflection film for a crystalline silicon solar cell provided in this embodiment includes a silicon nitride layer 10, a silicon dioxide layer 20, and a titanium dioxide-silicon dioxide composite layer 30 sequentially stacked on a surface of a crystalline silicon solar cell 1, where the silicon nitride layer 10, the silicon dioxide layer 20, and the titanium dioxide-silicon dioxide composite layer 30 are all independent antireflection film layers.
The silicon nitride layer 10, the silicon dioxide layer 20 and the titanium dioxide-silicon dioxide composite layer 30 are sequentially stacked, and the silicon nitride layer 10, the silicon dioxide layer 20 and the titanium dioxide-silicon dioxide composite layer 30 are independent antireflection film layers, so that reflected light can be sequentially interfered and offset to form triple antireflection, and the effect is better;
the silicon nitride layer 10 is used as an antireflection film contacting with a Si substrate (namely, a crystalline silicon solar cell), has an antireflection characteristic and a surface passivation effect, and can effectively prolong the minority carrier service life of the crystalline silicon cell; the titanium dioxide-silicon dioxide composite layer 30 is used as an antireflection film on the outermost layer, a Si-O-Ti bond can be obtained by mixing titanium dioxide and silicon dioxide, the bond has a crosslinking effect, the two substances are uniformly dispersed, and meanwhile, a thin film with a refractive index between the two substances is obtained, the titanium dioxide enables the layer to have certain hardness and a photocatalysis effect, so that surface scratching and stain adhesion of the crystalline silicon cell piece can be effectively prevented; the silicon dioxide layer 20 is used as an intermediate layer and plays a role in transitional bonding, so that the laminated structure is more compact and firm;
The laminated antireflection film is compact and reasonable in structure and better in antireflection effect, and has a good antireflection effect on light with the wavelength of 220-plus-1200 nm under the packaging condition of the crystalline silicon solar cell, so that the conversion efficiency of the crystalline silicon solar cell after packaging is improved.
In this embodiment, the refractive index of the silicon nitride layer 10 is 2.01, and the thickness thereof is 75-80 nm; the refractive index of the silicon dioxide layer 20 is 1.43, and the thickness thereof is 105-112 nm; the titania-silica composite layer 30 has a refractive index of 1.74 and a thickness of 85 to 92 nm. The laminated antireflection film has a good antireflection effect on light with the wavelength of 220-1200nm, can have the lowest reflectivity in a spectral response region with the wavelength of 640nm, and can keep the film thickness of each layer to be the thinnest.
Meanwhile, the refractive index of the titania-silica composite layer 30 is greater than that of the silica layer 20, and the refractive index of the medium forms a high-low structure, which can increase the amount of incident light and the amount of total reflection of reflected light.
example two
The laminated antireflection film for the crystalline silicon solar cell provided by the embodiment has substantially the same structure as that in the first embodiment, except that: in this embodiment, the refractive index of the silicon nitride layer 10 is 2.01, the thickness thereof is 75-80nm, and the silicon nitride layer 10 has a low reflectivity in a spectral response region with a wavelength of about 640 nm; the refractive index of the silicon dioxide layer 20 is 1.43, the thickness of the silicon dioxide layer is 90-95nm, and the silicon dioxide layer 20 has low reflectivity in a spectral response region with the wavelength of 540nm or so; the titania-silica composite layer 30 has a refractive index of 1.74 and a thickness of 60 to 65nm, and has a low reflectance in a spectral response region having a wavelength of about 450 nm. The laminated antireflection film has a good antireflection effect on light with the wavelength of 220-1200nm, the antireflection effect on visible light is better, and the film thickness of each layer can be kept to be the thinnest.
Of course, in other embodiments, the refractive indexes of the silicon nitride layer 10, the silicon dioxide layer 20 and the titanium dioxide-silicon dioxide composite layer 30 are not limited to the above, and may vary according to actual production, such as the refractive index of the silicon nitride layer 10 is set to 2.04, the refractive index of the silicon dioxide layer 20 is 1.45, the refractive index of the titanium dioxide-silicon dioxide composite layer 30 is 1.76, and so on. The thickness of each film layer can be according to the formula: n × e ═ (1/4) λ is calculated, where n is the refractive index of the film layer, e is the thickness of the film layer, and λ is the wavelength of the reflected light. The silicon nitride layer 10, the silicon dioxide layer 20, and the titanium dioxide-silicon dioxide composite layer 30 may be optimally antireflective with respect to light of the same wavelength band, or the silicon nitride layer 10, the silicon dioxide layer 20, and the titanium dioxide-silicon dioxide composite layer 30 may be optimally antireflective with respect to light of different wavelength bands, respectively.
EXAMPLE III
The laminated antireflection film for the crystalline silicon solar cell provided by the embodiment has substantially the same structure as that in the first embodiment, except that: in this embodiment, the silica layer 20 is a silica layer with a silane coupling agent, and the modification of the silica layer 20 can improve the mechanical properties of the film, so that the film has better flexibility and film-forming property, and the transition bonding property of silica is better.
Silane coupling agents and silane coupling agents applied to the preparation of the silica layer 20 are all the prior art, such as silane coupling agents of KH550, KH560, KH570 and the like in the prior art, and the technology of applying the silane coupling agents to the preparation of the silica layer refers to the invention application with the application number of 201210169644.4 and the name of a decorative composite coating with a hydrophobic self-cleaning function and a preparation method thereof.
While the invention has been particularly shown and described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. A lamination antireflection film for a crystalline silicon solar cell is characterized in that: the silicon nitride layer, the silicon dioxide layer and the titanium dioxide-silicon dioxide composite layer are independent antireflection film layers.
2. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the refractive index of the titanium dioxide-silicon dioxide composite layer is larger than that of the silicon dioxide layer.
3. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the refractive index of the silicon nitride layer is 2.01.
4. The laminated antireflection film for a crystalline silicon solar cell according to claim 3, characterized in that: the thickness of the film layer of the silicon nitride layer is 75-80 nm.
5. The laminated antireflection film for a crystalline silicon solar cell according to claim 1 or 3, characterized in that: the refractive index of the silica layer was 1.43.
6. The laminated antireflection film for a crystalline silicon solar cell according to claim 5, characterized in that: the thickness of the silicon dioxide layer is 105-112nm or 90-95 nm.
7. The laminated antireflection film for a crystalline silicon solar cell according to claim 5, characterized in that: the refractive index of the titania-silica composite layer was 1.74.
8. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the refractive index of the titania-silica composite layer was 1.74.
9. The laminated antireflection film for a crystalline silicon solar cell according to claim 7 or 8, characterized in that: the thickness of the film layer of the titanium dioxide-silicon dioxide composite layer is 85-92nm or 60-65 nm.
10. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the silica layer is a silica layer having a silane coupling agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920583284.XU CN209804667U (en) | 2019-04-26 | 2019-04-26 | Laminated antireflection film for crystalline silicon solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920583284.XU CN209804667U (en) | 2019-04-26 | 2019-04-26 | Laminated antireflection film for crystalline silicon solar cell |
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| Publication Number | Publication Date |
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| CN209804667U true CN209804667U (en) | 2019-12-17 |
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| CN201920583284.XU Expired - Fee Related CN209804667U (en) | 2019-04-26 | 2019-04-26 | Laminated antireflection film for crystalline silicon solar cell |
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- 2019-04-26 CN CN201920583284.XU patent/CN209804667U/en not_active Expired - Fee Related
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| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20191217 |