CN209804667U - Laminated antireflection film for crystalline silicon solar cell - Google Patents

Abstract

The utility model provides a laminated anti-reflection film for a crystalline silicon solar cell, which comprises a silicon nitride layer, a silicon dioxide layer and a titanium dioxide-silicon dioxide composite layer sequentially stacked on the surface of a crystalline silicon solar cell. The silicon layer, the silicon dioxide layer and the titanium dioxide-silicon dioxide composite layer are all independent anti-reflection coating layers. The reflected light can be interfered and canceled in turn to form a triple anti-reflection, which has a better effect; the silicon nitride layer is used as an anti-reflection film contacting the Si substrate (that is, a crystalline silicon solar cell), which not only has anti-reflection characteristics, but also has surface passivation. It can effectively improve the minority carrier life of crystalline silicon cells; the titanium dioxide-silicon dioxide composite layer, as the outermost anti-reflection film, has a certain hardness and photocatalytic effect, which can effectively prevent the surface of crystalline silicon cells from Scratches and stains adhere; silica, as the middle layer, plays the role of transitional bonding, making the laminated structure more compact and firm.

Description

Laminated anti-reflection film for crystalline silicon solar cells

technical field

The utility model relates to the field of photovoltaic power generation, in particular to a laminated anti-reflection film for crystalline silicon solar cells.

Background technique

The role of crystalline silicon solar cells is to convert solar energy into electrical energy, and its conversion efficiency is generally defined as the ratio of the output power of crystalline silicon solar cells to the total power of sunlight incident on the surface of crystalline silicon solar cells. The crystalline silicon solar cell module is the core part of the solar power generation system, and also the most important part of the solar power generation system. Therefore, in order to increase the absorption of light by the packaged crystalline silicon solar cells to improve the conversion efficiency, it is necessary to reduce the reflection loss generated during the process of sunlight irradiating the surface of the crystalline silicon solar cells.

With the development of solar technology, anti-reflection coatings are usually coated on the surface of crystalline silicon solar cells to reduce reflection loss and increase light absorption. At present, there are many kinds of anti-reflection coatings, which usually adopt a single-layer structure, and it is difficult to obtain ideal anti-reflection effects.

Utility model content

Therefore, the utility model provides a laminated anti-reflection film for crystalline silicon solar cells with compact structure, reasonable structure and better anti-reflection effect.

In order to achieve the above object, the technical scheme provided by the utility model is as follows:

A laminated anti-reflection film for a crystalline silicon solar cell, comprising a silicon nitride layer, a silicon dioxide layer and a titanium dioxide-silicon dioxide composite layer sequentially stacked on the surface of a crystalline silicon solar cell, the silicon nitride layer, the two Both the silicon oxide layer and the titanium dioxide-silicon dioxide composite layer are independent anti-reflection film layers.

Further, the refractive index of the titanium dioxide-silicon dioxide composite layer is greater than that of the silicon dioxide layer.

Further, the refractive index of the silicon nitride layer is 2.01.

Further, the film thickness of the silicon nitride layer is 75-80 nm.

Further, the refractive index of the silicon dioxide layer is 1.43.

Further, the film thickness of the silicon dioxide layer is 105-112 nm.

Further, the refractive index of the titanium dioxide-silicon dioxide composite layer is 1.74.

Further, the film thickness of the titanium dioxide-silicon dioxide composite layer is 85-92 nm.

Further, the silicon dioxide layer is a silicon dioxide layer with a silane coupling agent.

The technical solution provided by the utility model has the following beneficial effects:

Silicon nitride layer, silicon dioxide layer and titanium dioxide-silicon dioxide composite layer stacked in sequence, and the silicon nitride layer, silicon dioxide layer and titanium dioxide-silicon dioxide composite layer are all independent anti-reflection film layers , the reflected light can be sequentially interfered and canceled to form a triple anti-reflection with better effect;

The silicon nitride layer is used as an anti-reflection film in contact with the Si substrate (i.e., crystalline silicon solar cells), which not only has anti-reflection properties, but also has surface passivation, which can effectively improve the minority carrier lifetime of crystalline silicon cells; titanium dioxide- The silicon dioxide composite layer is used as the outermost anti-reflection film. The mixture of titanium dioxide and silicon dioxide can obtain Si-O-Ti bonds. The thin film between substances, titanium dioxide makes the layer have a certain hardness and photocatalysis, which can effectively prevent the surface of the crystalline silicon cell from scratches and stains from adhering; The stacked structure is more compact and firm;

The laminated anti-reflection film of this solution has a compact and reasonable structure and better anti-reflection effect. Under the packaging conditions of crystalline silicon solar cells, it has a good anti-reflection effect on light in the wavelength range of 220-1200nm, so that the crystalline silicon The conversion efficiency of the solar cell after encapsulation is improved.

Description of drawings

FIG. 1 is a schematic diagram of the structure of the laminated anti-reflection film in the embodiment.

Detailed ways

In order to further illustrate various embodiments, the utility model provides accompanying drawings. These drawings are part of the disclosure content of the present invention, which are mainly used to illustrate the embodiments, and can be used in conjunction with the relevant descriptions in the specification to explain the operating principles of the embodiments. With reference to these contents, those skilled in the art should be able to understand other possible implementations and advantages of the present utility model. Components in the figures are not drawn to scale, and similar component symbols are generally used to denote similar components.

The utility model is further described now in conjunction with accompanying drawing and specific embodiment.

Embodiment one

Referring to FIG. 1 , a laminated anti-reflection film for crystalline silicon solar cells provided in this embodiment includes a silicon nitride layer 10, a silicon dioxide layer 20, and a titanium dioxide- The silicon dioxide composite layer 30, the silicon nitride layer 10, the silicon dioxide layer 20 and the titanium dioxide-silicon dioxide composite layer 30 are all independent antireflection film layers.

The silicon nitride layer 10, silicon dioxide layer 20 and titanium dioxide-silicon dioxide composite layer 30 stacked in sequence are adopted, and the silicon nitride layer 10, silicon dioxide layer 20 and titanium dioxide-silicon dioxide composite layer 30 are all The independent anti-reflection film layer can interfere and cancel the reflected light in turn to form a triple anti-reflection layer with better effect;

The silicon nitride layer 10 is used as an anti-reflection film contacting the Si substrate (i.e. crystalline silicon solar cell), which not only has anti-reflection properties, but also has a surface passivation effect, which can effectively improve the minority carrier life of the crystalline silicon cell; titanium dioxide -The silicon dioxide composite layer 30 is used as the anti-reflection film on the outermost layer, and the mixture of titanium dioxide and silicon dioxide can obtain Si-O-Ti bonds, which have cross-linking effect, and the two substances are uniformly dispersed, and at the same time, the refractive index medium is obtained. In the thin film between the two substances, titanium dioxide makes the layer have a certain hardness and photocatalysis, which can effectively prevent the surface scratches and stains of the crystalline silicon cell; The role of the laminated structure is more compact and firm;

The laminated anti-reflection film of this solution has a compact and reasonable structure and better anti-reflection effect. Under the packaging conditions of crystalline silicon solar cells, it has a good anti-reflection effect on light in the wavelength range of 220-1200nm, so that the crystalline silicon The conversion efficiency of the solar cell after encapsulation is improved.

In this embodiment, the refractive index of the silicon nitride layer 10 is 2.01, and its thickness is 75-80 nm; the refractive index of the silicon dioxide layer 20 is 1.43, and its thickness is 105-112 nm; The refractive index of the silicon oxide composite layer 30 is 1.74, and its thickness is 85-92 nm. The stacked anti-reflection film has a good anti-reflection effect on light in the wavelength range of 220-1200nm, and at the same time has the lowest reflectivity for the spectral response region with a wavelength of about 640nm, and the film thickness of each layer is Be able to keep the thinnest.

At the same time, the refractive index of the titanium dioxide-silicon dioxide composite layer 30 is greater than that of the silicon dioxide layer 20, and the refractive index of the medium forms a high-low structure, which can increase the amount of incident light and total reflection of reflected light.

Embodiment two

A laminated anti-reflection film for crystalline silicon solar cells provided in this embodiment has roughly the same structure as that in Embodiment 1, except that in this specific embodiment, the refractive index of the silicon nitride layer 10 is 2.01, and its thickness is 75-80nm, and the silicon nitride layer 10 has a low reflectivity to the spectral response region with a wavelength of about 640nm; the refractive index of the silicon dioxide layer 20 is 1.43, and its thickness is 90-95nm , the silicon dioxide layer 20 has a low reflectivity in the spectral response region with a wavelength of about 540nm; the refractive index of the titanium dioxide-silicon dioxide composite layer 30 is 1.74, and its thickness is 60-65nm. The silicon composite layer has a low reflectance to the spectral response region with a wavelength of about 450nm. The laminated laminated anti-reflection film has good anti-reflection effect on light in the wavelength range of 220-1200nm, and better anti-reflection effect on visible light, and the film thickness of each layer can be kept the thinnest.

Of course, in other embodiments, the refractive index of the silicon nitride layer 10, the silicon dioxide layer 20 and the titanium dioxide-silicon dioxide composite layer 30 is not limited to the above-mentioned, and can be changed according to actual preparation, such as nitriding The refractive index of silicon 10 is set at 2.04, the refractive index of silicon dioxide layer 20 is 1.45, the refractive index of titanium dioxide-silica composite layer 30 is 1.76, and so on. The thickness of each film layer can be calculated according to the formula: n*e=(1/4)λ, wherein, n is the refractive index of the film layer, e is the thickness of the film layer, and λ is the wavelength of reflected light. The silicon nitride layer 10, the silicon dioxide layer 20 and the titanium dioxide-silicon dioxide composite layer 30 can all be set to perform optimal anti-reflection for the light of the same wavelength band, or the silicon nitride layer 10, the silicon dioxide The layer 20 and the titanium dioxide-silicon dioxide composite layer 30 are respectively set to perform optimal anti-reflection for light of different wavelength bands.

Embodiment three

A laminated anti-reflection film for crystalline silicon solar cells provided in this embodiment has roughly the same structure as in Embodiment 1, except that in this specific embodiment, the silicon dioxide layer 20 is made of silane The silicon dioxide layer of the coupling agent, modifying the silicon dioxide layer 20 can improve the mechanical properties of the film, making it more flexible and film-forming, and the transitional bonding performance of silicon dioxide is better.

Silane coupling agents and silane coupling agents used in the preparation of silicon dioxide layer 20 are all prior art, such as silane coupling agents such as KH550, KH560, KH570 in the prior art, and silane coupling agents are applied to silicon dioxide The technical reference for the preparation of the layer is the application number 201210169644.4, the invention application patent named a decorative composite coating with hydrophobic self-cleaning function and its preparation method, etc.

Although the utility model has been specifically shown and described in conjunction with preferred embodiments, those skilled in the art should understand that, without departing from the spirit and scope of the utility model defined by the appended claims, changes in form and details may be made. Making various changes to the utility model is within the protection scope of the utility model.

Claims (10)

1. A lamination antireflection film for a crystalline silicon solar cell is characterized in that: the silicon nitride layer, the silicon dioxide layer and the titanium dioxide-silicon dioxide composite layer are independent antireflection film layers.

2. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the refractive index of the titanium dioxide-silicon dioxide composite layer is larger than that of the silicon dioxide layer.

3. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the refractive index of the silicon nitride layer is 2.01.

4. The laminated antireflection film for a crystalline silicon solar cell according to claim 3, characterized in that: the thickness of the film layer of the silicon nitride layer is 75-80 nm.

5. The laminated antireflection film for a crystalline silicon solar cell according to claim 1 or 3, characterized in that: the refractive index of the silica layer was 1.43.

6. The laminated antireflection film for a crystalline silicon solar cell according to claim 5, characterized in that: the thickness of the silicon dioxide layer is 105-112nm or 90-95 nm.

7. The laminated antireflection film for a crystalline silicon solar cell according to claim 5, characterized in that: the refractive index of the titania-silica composite layer was 1.74.

8. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the refractive index of the titania-silica composite layer was 1.74.

9. The laminated antireflection film for a crystalline silicon solar cell according to claim 7 or 8, characterized in that: the thickness of the film layer of the titanium dioxide-silicon dioxide composite layer is 85-92nm or 60-65 nm.

10. The laminated antireflection film for a crystalline silicon solar cell according to claim 1, characterized in that: the silica layer is a silica layer having a silane coupling agent.