CN209729883U - A kind of wash chamber - Google Patents
A kind of wash chamber Download PDFInfo
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- CN209729883U CN209729883U CN201920484550.3U CN201920484550U CN209729883U CN 209729883 U CN209729883 U CN 209729883U CN 201920484550 U CN201920484550 U CN 201920484550U CN 209729883 U CN209729883 U CN 209729883U
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- mechanical arm
- load
- bearing part
- plummer
- silicon wafer
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Abstract
The utility model relates to a kind of wash chambers, comprising: cavity；It is equipped with rotatable plummer in the cavity；Multiple clamping jaws for clamping silicon wafer are equipped in the upper end of plummer；Blower fan filtering unit right above cavity, and the air outlet face plummer of blower fan filtering unit are set；The two sides of blower fan filtering unit be respectively equipped with can oscilaltion mechanical arm, and mechanical arm is far from air outlet；It is equipped with transversely movable load-bearing part in the front end of mechanical arm, load-bearing part can be rotated around the front end of mechanical arm；The intracorporal gas flow of wash chamber lumen of the utility model will not be blocked, and the intracorporal cleannes of chamber are high；It will not be splashed on mechanical arm and load-bearing part by medical fluid remaining on cavity inner wall simultaneously, it avoids and the secondary of silicon wafer is not disturbed, and gap is provided between shield and plummer, gas flows smoothly, it avoids the residual particles in air from staying on silicon wafer, guarantees the cleaning precision and cleaning effect of silicon wafer.
Description
Technical field
The utility model belongs to the cleaning chamber during IC manufacturing field more particularly to a kind of used Wafer Cleaning
Room.
Background technique
With being constantly progressive for integrated circuit fabrication process, the volume of semiconductor devices is just becoming smaller and smaller, this also leads
If particle very small on silicon wafer has been caused not clean up, the manufacture and performance of semiconductor devices also will affect, so,
Silicon wafer cleaning process also becomes more and more important.
Currently, silicon wafer mostly uses greatly one chip cleaning method to be cleaned, this is because the cleaning effect of one chip and clear
It is higher to wash precision, silicon wafer in the process of cleaning persistently blow to wash chamber by blower fan filtering unit, makes the interior of wash chamber
Portion keeps the state of high cleanliness, guarantees the high request of Wafer Cleaning, existing wash chamber is as shown in Fig. 1, including cavity
1, rotatable plummer 3 is installed in cavity 1, blower fan filtering unit 5 is equipped with above plummer 3, the upper end of plummer 3 is installed
There is the clamping jaw 4 of clamping silicon wafer 7, the two sides of plummer 3 are arranged in mechanical arm 2, slidable load-bearing part 6 is equipped on mechanical arm 2,
Mechanical arm 2 and load-bearing part 6 are located at the lower section of blower fan filtering unit 5；But it is found after actual use, such wash chamber tool
It has the disadvantage that
1. load-bearing part and mechanical arm are located at the lower section of blower fan filtering unit blasting air mouth, sent out from blower fan filtering unit in this way
Air can be blocked by mechanical arm and load-bearing part, cause the air-flow of wash chamber obstructed, make the cleannes of wash chamber
It is lower.
2. might have liquor residue on the inner wall of wash chamber, such blower fan filtering unit is in air-supply, medical fluid meeting
It is splashed on mechanical arm and load-bearing part, mechanical arm and load-bearing part is damaged.
3. biography may be remained on mechanical arm and load-bearing part when being transmitted using mechanical arm and load-bearing part to silicon wafer
The medical fluid left when serving a silicon wafer, such load-bearing part may cause secondary pollution to silicon wafer when carrying silicon wafer；Exist simultaneously
Load-bearing part is in a horizontal position, and the particle in air may also remain on the load bearing member, causes to pollute again to silicon wafer.
Utility model content
The utility model aim is for overcome the deficiencies in the prior art and provides a kind of intracorporal gas flowing of guarantee chamber
It is smooth, so that the inside of cavity is kept the state of high cleanliness, and the wash chamber of secondary pollution will not be caused to silicon wafer.
In order to achieve the above objectives, the technical solution adopted in the utility model is: a kind of wash chamber, comprising:
Cavity；
It is equipped with the rotatable plummer for placing silicon wafer in the cavity；
It is equipped in the upper end of the plummer slidable for clamping multiple clamping jaws of silicon wafer；
Blower fan filtering unit right above the cavity, and the air outlet face plummer of blower fan filtering unit are set；
The two sides of the blower fan filtering unit be respectively equipped with can oscilaltion mechanical arm, and mechanical arm far from air-supply
Mouthful；
It is equipped with transversely movable load-bearing part in the front end of the mechanical arm, and load-bearing part can be revolved around the front end of mechanical arm
Turn, when the load-bearing part rotates by a certain angle, load-bearing part is far from air outlet.
Further, be additionally provided on the outside of the plummer can oscilaltion shield；The shield and plummer
Between be equipped with gap；The blow vent communicated with gap is provided on the lower part of the cavity.
Further, the quantity of the clamping jaw is six, and round array distribution is put on the basis of the center of plummer.
Further, the load-bearing part can be rotated by 90 ° around the front end of mechanical arm.
Due to the application of the above technical scheme, the utility model has the advantage that compared with prior art
1. blower fan filtering unit, when blowing to wash chamber, mechanical arm and load-bearing part will not make the flow direction for sending out gas
At blocking, the entire intracorporal gas of chamber is flowed smoothly, and the cleannes of inside cavity are high；
2. medical fluid remaining on cavity inner wall will not be splashed to machinery by gas during blower fan filtering unit blasting air
On arm and load-bearing part, the service life of mechanical arm and load-bearing part is improved, while load-bearing part will not in horizontal bearing silicon wafer
Secondary pollution is caused to silicon wafer, and load-bearing part is in straight down when not working, the particle in such air will not be residual
It stays on the load bearing member；
3. guarantee inside cavity gas circulation, avoid the particle residue in air on silicon wafer, it is ensured that silicon wafer it is clear
Wash precision and cleaning effect.
Detailed description of the invention
Technical solutions of the utility model are described further with reference to the accompanying drawing:
Attached drawing 1 is the structural schematic diagram of the prior art；
Attached drawing 2 is the structural schematic diagram of the utility model；
Wherein: cavity 1, mechanical arm 2, plummer 3, clamping jaw 4, blower fan filtering unit 5, load-bearing part 6, silicon wafer 7, shield
8, blow vent 9, gap 10.
Specific embodiment
With reference to the accompanying drawing and specific embodiment the utility model is described in further detail.
Attached drawing 2 is please referred to, for a kind of wash chamber that an embodiment of the present invention provides, including cavity 1；Described
The rotatable plummer 3 for placing silicon wafer 7 is equipped in cavity 1；It is equipped in the upper end of the plummer 3 and is slidably used for
Clamp multiple clamping jaws 4 of silicon wafer 7；Blower fan filtering unit 5 right above the cavity 1 is set, and blower fan filtering unit 5 is sent
Air port face plummer 3；The two sides of the blower fan filtering unit 5 be respectively equipped with can oscilaltion mechanical arm 2, and mechanical arm
2 far from air outlet, and in the present embodiment, 5 side of blower fan filtering unit is arranged in mechanical arm 2 straight down；In the mechanical arm 2
Front end be equipped with transversely movable load-bearing part 6, load-bearing part 6 mainly silicon wafer transmission when play the role of carry silicon wafer, and
And load-bearing part 6 can be rotated around the front end of mechanical arm 2, when the load-bearing part 6 rotates by a certain angle, load-bearing part 6 is far from blower mistake
Air outlet in filter group 5.
Embodiment as a further preference, the quantity of clamping jaw 4 are six, and using the center of plummer 3 as benchmark null circle
Shape array distribution, it is best to the clamping effect of silicon wafer at this time.
Embodiment as a further preference, when load-bearing part 6 is rotated by 90 ° around the front end of mechanical arm 8, load-bearing part 6 and machine
Tool arm 2 is down-set vertically together, the gas flow far from air outlet in blower fan filtering unit 5.
In the present embodiment, when load-bearing part 6 and mechanical arm 2 do not work, the two simultaneously straight down, such 6 He of load-bearing part
Mechanical arm 2 avoids the gas sent out to the air outlet of blower fan filtering unit 5 from making far away from the air outlet in blower fan filtering unit 5
At blocking, while will not be by the intracorporal liquid splash of chamber to load-bearing part 6 and mechanical arm 2.
Also, due to the presence for not having waste liquid on mechanical arm 2 and load-bearing part 6, silicon wafer will not be caused so secondary
Pollution.
Meanwhile when not working, load-bearing part is in state straight down, and the particle in air will not remain in load-bearing part
On, will not cause load-bearing part is secondary pollution to silicon wafer.
When specific works, silicon wafer 7 is put on plummer 3 by the cooperation of mechanical arm 2 and load-bearing part 6 first, then
Multiple clamping jaws 4 clamp silicon wafer 7, and then mechanical arm 2 and load-bearing part 6 return to original position, after load-bearing part 6 is rotated by 90 °, 6 He of load-bearing part
Mechanical arm 2 is vertically provided at the two sides of blower fan filtering unit 5, the gas that will not be sprayed in this way to air outlet in blower fan filtering unit 5
Body is stopped, and ensure that the unobstructed of air-flow, improves the intracorporal cleannes of chamber；And it may residual on the inner wall of cavity 1
There is waste liquid, due to mechanical arm 2 and the load-bearing part 6 not air outlet in the lower section of blower fan filtering unit 5, such blower fan filtering unit 5
The gas of submitting will not be splashed on mechanical arm and load-bearing part, improve the service life of mechanical arm and load-bearing part.
Embodiment as a further preference, the side of plummer 3 be additionally provided with can oscilaltion shield 8, protection
Cover 8 is made of transparent material；Gap 10 is equipped between shield 8 and plummer 3；Be provided on the lower part of the cavity 1 with
The blow vent 9 that gap 10 communicates, the quantity of blow vent 9 are two, the lower half portion in cavity 1.
In the present embodiment, due to opened up gap 10 between shield 8 and plummer 3 so that it is convenient to gas into
Row circulation, cooperates blower fan filtering unit 5, considerably increases the air fluency of inside cavity, improve the cleaning of inside cavity
Degree, it is ensured that high request of the silicon wafer to cleaning environment.
When specific works, when carrying out medicine liquid washing to silicon wafer 7 by wash chamber, shield 8 rises to certain automatically
Height, play the problem of preventing medical fluid to be splashed to silicon wafer；When silicon wafer does not clean, shield 8 drops to certain height, so
Rear fan filter bank 5 continues to blow to the inside of cavity, and gas passes through the gap 10 of shield 8 and plummer 3 at this time
It after circulation, is finally discharged from two blow vents 9, ensure that flowing smoothly for gas in cavity 1, this is because in air may be used
Some particulate matters can be attached to and will increase the probability that particle stays on silicon wafer, it is ensured that silicon if gas circulation is slack
The high-precision requirement of piece cleaning.
The above is only the specific application examples of the utility model, do not constitute any limit to the protection scope of the utility model
System.Any technical scheme formed by adopting equivalent transformation or equivalent replacement, all fall within the utility model rights protection scope it
It is interior.
Claims (4)
1. a kind of wash chamber characterized by comprising
Cavity；
It is equipped with the rotatable plummer for placing silicon wafer in the cavity；
It is equipped in the upper end of the plummer slidable for clamping multiple clamping jaws of silicon wafer；
Blower fan filtering unit right above the cavity, and the air outlet face plummer of blower fan filtering unit are set；
The two sides of the blower fan filtering unit be respectively equipped with can oscilaltion mechanical arm, and mechanical arm is far from air outlet；
It is equipped with transversely movable load-bearing part in the front end of the mechanical arm, and load-bearing part can be rotated around the front end of mechanical arm, when
When the load-bearing part rotates by a certain angle, load-bearing part is far from air outlet.
2. wash chamber according to claim 1, it is characterised in that: being additionally provided on the outside of the plummer can oscilaltion
Shield；Gap is equipped between the shield and plummer；It is provided on the lower part of the cavity and communicates with gap
Blow vent.
3. wash chamber according to claim 1, it is characterised in that: the quantity of the clamping jaw is six, and with plummer
Center on the basis of put round array distribution.
4. wash chamber according to claim 1, it is characterised in that: the load-bearing part can be rotated around the front end of mechanical arm
90°。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920484550.3U CN209729883U (en) | 2019-04-12 | 2019-04-12 | A kind of wash chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920484550.3U CN209729883U (en) | 2019-04-12 | 2019-04-12 | A kind of wash chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209729883U true CN209729883U (en) | 2019-12-03 |
Family
ID=68691075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920484550.3U Active CN209729883U (en) | 2019-04-12 | 2019-04-12 | A kind of wash chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209729883U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115463907A (en) * | 2022-10-19 | 2022-12-13 | 东莞仕达通自动化有限公司 | Equipment and method for removing dust by utilizing high acceleration and deceleration characteristics of linear motor |
-
2019
- 2019-04-12 CN CN201920484550.3U patent/CN209729883U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115463907A (en) * | 2022-10-19 | 2022-12-13 | 东莞仕达通自动化有限公司 | Equipment and method for removing dust by utilizing high acceleration and deceleration characteristics of linear motor |
| CN115463907B (en) * | 2022-10-19 | 2024-04-12 | 东莞仕达通自动化有限公司 | Device and method for removing dust by utilizing high acceleration and deceleration characteristics of linear motor |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP02 | Change in the address of a patent holder | ||
| CP02 | Change in the address of a patent holder |
Address after: 215000 Room 101, building 4, northwest area, Suzhou nano City, No. 99, Jinjihu Avenue, Suzhou Industrial Park, Jiangsu Province Patentee after: Ruomingxin Semiconductor Technology (Suzhou) Co., Ltd. Address before: 215000 Room 214, 23 Blocks, Zhongbei District, No. 99 Jinjihu Avenue, Suzhou Industrial Park, Jiangsu Province Patentee before: Ruomingxin Semiconductor Technology (Suzhou) Co., Ltd. |