CN209715929U - A kind of plasma chamber conducive to wafer cleaning - Google Patents
A kind of plasma chamber conducive to wafer cleaning Download PDFInfo
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- CN209715929U CN209715929U CN201920380533.5U CN201920380533U CN209715929U CN 209715929 U CN209715929 U CN 209715929U CN 201920380533 U CN201920380533 U CN 201920380533U CN 209715929 U CN209715929 U CN 209715929U
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- aluminum pipe
- wafer
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- chamber door
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Abstract
The utility model discloses a kind of plasma chambers conducive to wafer cleaning, running through between the box bilateral wall has multipair aluminum pipe group, each pair of neighbouring setting of aluminum pipe group, aluminum pipe group includes more aluminum pipes, more aluminum pipe word orders, aluminum pipe one end is fixed on cabinet side inner wall, and the aluminum pipe other end passes through another side wall of cabinet, and the end of aluminum pipe is connected by electrode plate；Box back surface is provided with vacuum orifice；Cabinet front is rotatably connected to chamber door by hinge, and chamber door free end is provided with door lock, is provided with air inlet on chamber door；The cabinet wall is provided with guide rail, and mobile connection has wafer bracket in the guide rail, and wafer through slot edge is symmetrically arranged with elastic card bead.The design can effectively fix wafer in cleaning, avoid secondary pollution after cleaning, cavity is easy to maintain, and cleaning effect is good.
Description
Technical field
The utility model relates to a kind of plasma chambers conducive to wafer cleaning, belong to plasma cleaner technical field.
Background technique
Currently, plasma cleaner is also plasma cleans machine or Surface Treatment with Plasma instrument, it is a kind of completely new height
Science and technology achieve the effect that Conventional cleaning method is unable to reach using plasma.The mechanism of plasma clean, mainly
It is to achieve the purpose that remove body surface spot by active particle " activation " in plasma.
Wafer refers to silicon wafer used in silicon semiconductor production of integrated circuits, since its shape is circle, therefore referred to as wafer；
As the integrated level of integrated circuit is continuously improved, the cleannes as its surface of the wafer of integrated circuit raw material are also constantly being mentioned
It rises, so plasma cleaner is mostly used to clean wafer.
The electrode that existing plasma cleaner uses is horizontal multi-layer electrode plate structure, and this structure is for inorganic gas
Convective is poor in the cavity for body, between electrode in jig product treatment effect and uniformity have certain defect.It takes out
When wind and inflation process, gas flow concentrates disengaging from escape pipe, air inlet pipe, and pressure is bigger, and due to the structure of leveling, gas is straight
It connects the wafer from carrier to skim over, disturbance can be fixed with to wafer, wafer is caused to vibrate, to damage wafer.And existing carrier
Using being slidably connected between box body guide rail, when mutually moving movement, it is easy because friction generates small particle, to wafer
Form secondary pollution.
Utility model content
Purpose: in order to overcome the deficiencies in the prior art, the utility model provide it is a kind of conducive to wafer cleaning etc.
Ion cavity.
Technical solution: in order to solve the above technical problems, the technical solution adopted by the utility model is:
A kind of plasma chamber conducive to wafer cleaning, comprising: cabinet, through there is multipair aluminium between the box bilateral wall
Pipe group, each pair of neighbouring setting of aluminum pipe group, aluminum pipe group include more aluminum pipes, and more aluminum pipe word orders, aluminum pipe one end is fixed
In cabinet side inner wall, the aluminum pipe other end passes through another side wall of cabinet, and the end of aluminum pipe is connected by electrode plate；Cabinet back
Face is provided with vacuum orifice；Cabinet front is rotatably connected to chamber door by hinge, and chamber door free end is provided with door lock, sets on chamber door
It is equipped with air inlet；The cabinet wall is provided with guide rail, and the guide rail includes: mounting rack, and the mounting rack includes: ontology, this
Overhead gage is provided with above body, ontology rear end is provided with rear baffle, on ontology horizontal row show it is multiple sidewinder mechanism, it is described to sidewinder
Mechanism includes being mounted on intrinsic sleeve, and barrel forward end activity is connected with ball；Lead on the ontology sidewindered below mechanism
It crosses fixed column and is horizontally fixed with multiple camshaft bearings；Mobile connection has wafer bracket in the guide rail, and the wafer bracket includes:
Supporting plate is arranged between bracket in bracket, and wafer through slot is installed on supporting plate, and wafer through slot lower edge is provided with boss, and wafer is logical
Groove edge is symmetrically arranged with elastic card bead.
Preferably, inner wall setting in the cabinet side is fluted, and sleeve is provided in groove, is set on another side wall
It is equipped with through-hole, clamping joint is provided in through-hole, aluminum pipe one end is removably connected with sleeve, and the aluminum pipe other end is from through-hole one end
It penetrates, is pierced by from the clamping joint other end, clamping joint exit is also socketed with sealing ring, and sealing ring passes through sealing cover phase with clamping joint
Fixed, the sleeve and clamping joint are all made of isolation material.
Preferably, the bottom of box is provided with locating piece.
Preferably, observation window is provided on the chamber door.
Preferably, the sealing ring uses silica gel material.
Preferably, the aluminum pipe group is set as two pairs, and aluminum pipe group is made of 6-10 root aluminum pipe.
The utility model has the advantages that a kind of plasma chamber conducive to wafer cleaning provided by the utility model, the design is in cleaning
Wafer can be effectively fixed, avoids secondary pollution after cleaning, cavity is easy to maintain, and cleaning effect is good.
Detailed description of the invention
Fig. 1 is the positive structure schematic of the utility model；
Fig. 2 is the structure schematic diagram of the utility model；
Fig. 3 is the structural schematic diagram of guide rail；
Fig. 4 is guide rail and wafer bracket connection schematic diagram；
Fig. 5 is wafer bracket perspective view；
Fig. 6 is wafer bracket sectional view；
The connection schematic diagram of Fig. 7 aluminum pipe and cabinet wall；
The connection schematic diagram of Fig. 8 aluminum pipe and wall box.
Specific embodiment
The utility model is further described with reference to the accompanying drawing.
As shown in figures 1 to 6, a kind of plasma chamber conducive to wafer cleaning, comprising: cabinet 1,1 two sidewalls of cabinet it
Between through there is a multipair aluminum pipe group 2, the neighbouring setting of each pair of aluminum pipe group 2, aluminum pipe group 2 includes more aluminum pipes 3, more aluminum pipes 3 one
Word arrangement, 3 one end of aluminum pipe are fixed on 1 side inner wall of cabinet, and 3 other end of aluminum pipe passes through another side wall of cabinet 1, the end of aluminum pipe 3
It is connected by electrode plate 4；1 back side of cabinet is provided with vacuum orifice 5；1 front of cabinet is rotatably connected to chamber door by hinge
6,6 free end of chamber door is provided with door lock, and air inlet 7 is provided on chamber door 6；1 inner wall of cabinet is provided with guide rail 8, described to lead
Rail 8 includes: mounting rack 801, and the mounting rack 801 includes: ontology 01, is provided with overhead gage 02 above ontology 01, after ontology 01
End is provided with rear baffle 03, on ontology 01 horizontal row show it is multiple sidewinder mechanism 04, the mechanism 04 of sidewindering includes being mounted on this
Sleeve 05 in body 01,05 front end activity of sleeve are connected with ball 06；By solid on the ontology 01 for sidewindering 04 lower section of mechanism
Fixed column 07 is horizontally fixed with multiple camshaft bearings 08；Mobile connection has wafer bracket 9 in the guide rail 8, and the wafer bracket 9 is wrapped
Include: supporting plate 902 is arranged between bracket 901 for bracket 901, is installed with wafer through slot 903 on supporting plate 902, under wafer through slot 903
Edge is provided with boss 904, and 903 edge of wafer through slot is symmetrically arranged with elastic card bead 905.
As Figure 7-8, the 1 side inner wall of cabinet is arranged fluted 10, is provided with sleeve 11, the other side in groove 10
It is provided with through-hole 12 on wall, clamping joint 13 is provided in through-hole 12,3 one end of aluminum pipe is removably connected with sleeve 11, aluminum pipe 3
The other end is penetrated from 12 one end of through-hole, is pierced by from 13 other end of clamping joint, and 13 exit of clamping joint is also socketed with sealing ring 14, close
Seal 14 is fixed with clamping joint 13 by 15 phase of sealing cover, and the sleeve 11 is all made of isolation material with clamping joint 13.
The bottom of box is provided with locating piece 16.
Observation window 17 is provided on the chamber door.
The sealing ring 14 uses silica gel material.
The aluminum pipe group 2 is set as two pairs, and aluminum pipe group 2 is made of 6-10 root aluminum pipe 3.
Embodiment:
In use, wafer bracket is pulled out, wafer 100 is respectively clamped on the boss of wafer through slot, due to wafer through slot
It is symmetrically arranged with elastic card bead on side wall, including elastic card bead under the action of portion's spring, when being pushed into wafer, draws back, works as crystalline substance
After round bottom portion is contacted with boss, stop pushing wafer, elastic card bead withstands wafer side under the action of the screen resilience of spring, protects
Certain chucking power to wafer is held, to will not vibrate because of flow-disturbing.
Wafer bracket is pushed back again, the frame bottom at wafer bracket both ends is placed in above camshaft bearing, bracket both ends side wall
It is in contact, wafer bracket is pushed at the rear baffle of mounting rack rear end with the ball for sidewindering mechanism, by chamber door and box sealing, very
Sky pump is vacuumized from box back surface vacuum orifice by cabinet, then injects argon gas, hydrogen from chamber door air inlet, at this point, each pair of aluminum pipe
It is respectively connected to radio frequency and ground connection on two electrode plates of group, mixed gas is ionized between each pair of aluminum pipe group, due to aluminum pipe
Between have gap, so the plasma being ionized can flow freely in entire cabinet, to the wafer on bracket into
Row cleaning, improves product cleaning effect and homogeneity.Since bracket and guide rail are by ball and camshaft bearing mobile connection
, so bracket is easy to push and pull, and friction area is small between each other, is not likely to produce molecule.
Meanwhile the design uses aluminum pipe detachable structure, aluminum pipe one end is threadedly secured in the inner wall of cabinet side
In sleeve, the aluminum pipe other end is mutually fixed with wall box by clamping joint, since sleeve and clamping joint all use isolation material, is used
In ensuring mutually insulated between aluminum pipe and cabinet.In addition, gap is mutually sealed by clamping joint between aluminum pipe and through-hole, clamping joint with
Gap is mutually sealed by sealing ring between aluminum pipe, for ensuring the air-tightness of cabinet.And between clamping joint, sealing ring, sealing cover
It is all that the maintenance and replacement in later period are easy to using the connection of the removablies such as clamping.
The above is only the preferred embodiment of the utility model, it should be pointed out that: for the common skill of the art
For art personnel, without departing from the principle of this utility model, several improvements and modifications can also be made, these improve and
Retouching also should be regarded as the protection scope of the utility model.
Claims (6)
1. a kind of plasma chamber conducive to wafer cleaning, comprising: cabinet, it is characterised in that: passed through between the box bilateral wall
It is installed with multipair aluminum pipe group, each pair of neighbouring setting of aluminum pipe group, aluminum pipe group includes more aluminum pipes, more aluminum pipe word orders, aluminium
Pipe one end is fixed on cabinet side inner wall, and the aluminum pipe other end passes through another side wall of cabinet, and the end of aluminum pipe passes through electrode plate phase
Connection；Box back surface is provided with vacuum orifice；Cabinet front is rotatably connected to chamber door by hinge, and chamber door free end is provided with door
It locks, is provided with air inlet on chamber door；The cabinet wall is provided with guide rail, and the guide rail includes: mounting rack, the mounting rack packet
Include: ontology is provided with overhead gage above ontology, and ontology rear end is provided with rear baffle, and horizontal row, which is shown, on ontology multiple sidewinders machine
Structure, the mechanism of sidewindering includes being mounted on intrinsic sleeve, and barrel forward end activity is connected with ball；It is described to sidewinder below mechanism
Ontology on multiple camshaft bearings are horizontally fixed with by fixed column；Mobile connection has wafer bracket, the crystalline substance in the guide rail
Circle bracket includes: bracket, and supporting plate is arranged between bracket, wafer through slot is installed on supporting plate, wafer through slot lower edge is provided with
Boss, wafer through slot edge are symmetrically arranged with elastic card bead.
2. a kind of plasma chamber conducive to wafer cleaning according to claim 1, it is characterised in that: the cabinet side
Inner wall setting is fluted, and sleeve is provided in groove, through-hole is provided on another side wall, clamping joint, aluminum pipe are provided in through-hole
One end is removably connected with sleeve, and the aluminum pipe other end is penetrated from through-hole one end, is pierced by from the clamping joint other end, clamping joint goes out
Sealing ring is also socketed at mouthful, sealing ring is mutually fixed with clamping joint by sealing cover, and the sleeve and clamping joint are all made of insulation
Material.
3. a kind of plasma chamber conducive to wafer cleaning according to claim 1, it is characterised in that: the bottom of box
It is provided with locating piece.
4. a kind of plasma chamber conducive to wafer cleaning according to claim 1, it is characterised in that: set on the chamber door
It is equipped with observation window.
5. a kind of plasma chamber conducive to wafer cleaning according to claim 2, it is characterised in that: the sealing ring is adopted
Use silica gel material.
6. a kind of plasma chamber conducive to wafer cleaning according to claim 1, it is characterised in that: the aluminum pipe group is set
Two pairs are set to, aluminum pipe group is made of 6-10 root aluminum pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920380533.5U CN209715929U (en) | 2019-03-25 | 2019-03-25 | A kind of plasma chamber conducive to wafer cleaning |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920380533.5U CN209715929U (en) | 2019-03-25 | 2019-03-25 | A kind of plasma chamber conducive to wafer cleaning |
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| Publication Number | Publication Date |
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| CN209715929U true CN209715929U (en) | 2019-12-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201920380533.5U Active CN209715929U (en) | 2019-03-25 | 2019-03-25 | A kind of plasma chamber conducive to wafer cleaning |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110890267A (en) * | 2019-12-24 | 2020-03-17 | 昆山索坤莱机电科技有限公司 | Plasma photoresist device |
| CN111785603A (en) * | 2020-07-20 | 2020-10-16 | 中国计量大学 | Microwave plasma cleaning machine |
| CN113146465A (en) * | 2021-04-06 | 2021-07-23 | 安徽禾臣新材料有限公司 | Adsorption pad for double-sided grinding of thin wafer and production method |
| CN116251803A (en) * | 2023-04-12 | 2023-06-13 | 东莞市晟鼎精密仪器有限公司 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
-
2019
- 2019-03-25 CN CN201920380533.5U patent/CN209715929U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110890267A (en) * | 2019-12-24 | 2020-03-17 | 昆山索坤莱机电科技有限公司 | Plasma photoresist device |
| CN111785603A (en) * | 2020-07-20 | 2020-10-16 | 中国计量大学 | Microwave plasma cleaning machine |
| CN111785603B (en) * | 2020-07-20 | 2023-06-13 | 中国计量大学 | Microwave plasma cleaning machine |
| CN113146465A (en) * | 2021-04-06 | 2021-07-23 | 安徽禾臣新材料有限公司 | Adsorption pad for double-sided grinding of thin wafer and production method |
| CN116251803A (en) * | 2023-04-12 | 2023-06-13 | 东莞市晟鼎精密仪器有限公司 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
| CN116251803B (en) * | 2023-04-12 | 2023-09-22 | 东莞市晟鼎精密仪器有限公司 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
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