CN209515606U - A kind of aluminum pipe columnar electrode plasma wafer cleaning cavity - Google Patents
A kind of aluminum pipe columnar electrode plasma wafer cleaning cavity Download PDFInfo
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- CN209515606U CN209515606U CN201920380157.XU CN201920380157U CN209515606U CN 209515606 U CN209515606 U CN 209515606U CN 201920380157 U CN201920380157 U CN 201920380157U CN 209515606 U CN209515606 U CN 209515606U
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- aluminum pipe
- cabinet
- wall
- columnar electrode
- wafer cleaning
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Abstract
The utility model discloses a kind of aluminum pipe columnar electrode plasma wafer cleaning cavitys, running through between the box bilateral wall has multipair aluminum pipe group, each pair of neighbouring setting of aluminum pipe group, aluminum pipe group includes more aluminum pipes, more aluminum pipe word orders, aluminum pipe one end is fixed on cabinet side inner wall, and the aluminum pipe other end passes through another side wall of cabinet, and the end of aluminum pipe is connected by electrode plate；Box back surface is provided with vacuum orifice；Cabinet front is rotatably connected to chamber door by hinge, and chamber door free end is provided with door lock, is provided with air inlet on chamber door；The cabinet wall is provided with guide rail, and mobile connection has wafer bracket in the guide rail.The design is structurally reasonable, easy to maintain, cleaning uniformly, be easy to push and pull, cleaning effect it is good.
Description
Technical field
The utility model relates to a kind of aluminum pipe columnar electrode plasma wafer cleaning cavitys, belong to plasma cleaner technology
Field.
Background technique
Currently, plasma cleaner is also plasma cleans machine or Surface Treatment with Plasma instrument, it is a kind of completely new height
Science and technology achieve the effect that Conventional cleaning method is unable to reach using plasma.The mechanism of plasma clean, mainly
It is to achieve the purpose that remove body surface spot by active particle " activation " in plasma.
Wafer refers to silicon wafer used in silicon semiconductor production of integrated circuits, since its shape is circle, therefore referred to as wafer；
As the integrated level of integrated circuit is continuously improved, the cleannes as its surface of the wafer of integrated circuit raw material are also constantly being mentioned
It rises.
The electrode that existing plasma cleaner uses is horizontal multi-layer electrode plate structure, and this structure is for inorganic gas
Convective is poor in the cavity for body, between electrode in jig product treatment effect and uniformity have certain defect.And
And it, when mutually moving movement, is easy to generate because of friction small using being slidably connected between existing carrier and box body guide rail
Particle forms secondary pollution to wafer.
Utility model content
Purpose: in order to overcome the deficiencies in the prior art, the utility model provide a kind of aluminum pipe columnar electrode etc. from
Sub- wafer cleaning cavity.
Technical solution: in order to solve the above technical problems, the technical solution adopted by the utility model is:
A kind of aluminum pipe columnar electrode plasma wafer cleaning cavity, comprising: cabinet, through having between the box bilateral wall
Multipair aluminum pipe group, each pair of neighbouring setting of aluminum pipe group, aluminum pipe group include more aluminum pipes, more aluminum pipe word orders, aluminum pipe one
End is fixed on cabinet side inner wall, and the aluminum pipe other end passes through another side wall of cabinet, and the end of aluminum pipe is connected by electrode plate；
Box back surface is provided with vacuum orifice；Cabinet front is rotatably connected to chamber door by hinge, and chamber door free end is provided with door lock, case
Air inlet is provided on door；The cabinet wall is provided with guide rail, and the guide rail includes: mounting rack, and the mounting rack includes: this
Body is provided with overhead gage above ontology, and ontology rear end is provided with rear baffle, and horizontal row, which is shown, on ontology multiple sidewinders mechanism, institute
It states and sidewinders mechanism including being mounted on intrinsic sleeve, barrel forward end activity is connected with ball；The sheet sidewindered below mechanism
Multiple camshaft bearings are horizontally fixed with by fixed column on body；Mobile connection has wafer bracket in the guide rail.
Preferably, inner wall setting in the cabinet side is fluted, and sleeve is provided in groove, is set on another side wall
It is equipped with through-hole, clamping joint is provided in through-hole, aluminum pipe one end is removably connected with sleeve, and the aluminum pipe other end is from through-hole one end
It penetrates, is pierced by from the clamping joint other end, clamping joint exit is also socketed with sealing ring, and sealing ring passes through sealing cover phase with clamping joint
Fixed, the sleeve and clamping joint are all made of isolation material.
Preferably, the bottom of box is provided with locating piece.
Preferably, observation window is provided on the chamber door.
Preferably, the sealing ring uses silica gel material.
Preferably, the aluminum pipe group is set as two pairs, and aluminum pipe group is made of 6-10 root aluminum pipe.
The utility model has the advantages that a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity provided by the utility model, the design knot
Structure is reasonable, easy to maintain, cleaning uniformly, be easy to push and pull, cleaning effect it is good.
Detailed description of the invention
Fig. 1 is the positive structure schematic of the utility model；
Fig. 2 is the structure schematic diagram of the utility model；
Fig. 3 is the structural schematic diagram of guide rail；
Fig. 4 is guide rail and wafer bracket connection schematic diagram；
Fig. 5 is the connection schematic diagram of aluminum pipe and cabinet wall；
Fig. 6 is the connection schematic diagram of aluminum pipe and wall box.
Specific embodiment
The utility model is further described with reference to the accompanying drawing.
As shown in Figs 1-4, a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity, comprising: cabinet 1,1 liang of the cabinet
Through having multipair aluminum pipe group 2, the neighbouring setting of each pair of aluminum pipe group 2 between side wall, aluminum pipe group 2 includes more aluminum pipes 3, more aluminium
3 word order of pipe, 3 one end of aluminum pipe are fixed on 1 side inner wall of cabinet, and 3 other end of aluminum pipe passes through another side wall of cabinet 1, aluminum pipe 1
End passes through electrode plate 4 and is connected；1 back side of cabinet is provided with vacuum orifice 5；1 front of cabinet is rotatably connected to by hinge
Chamber door 6,6 free end of chamber door are provided with door lock, air inlet 7 are provided on chamber door 6；1 inner wall of cabinet is provided with guide rail 8, institute
Stating guide rail 8 includes: mounting rack 801, and the mounting rack 801 includes: ontology 01, and overhead gage 02, ontology are provided with above ontology 01
01 rear end is provided with rear baffle 03, on ontology 01 horizontal row show it is multiple sidewinder mechanism 04, the mechanism 04 of sidewindering includes installation
In intrinsic sleeve 05,05 front end activity of sleeve is connected with ball 06；By solid on the ontology for sidewindering 04 lower section of mechanism
Fixed column 07 is horizontally fixed with multiple camshaft bearings 08；Mobile connection has wafer bracket 10 in the guide rail 8.
As seen in figs. 5-6, the 1 side inner wall of cabinet is arranged fluted 11, is provided with sleeve 12, the other side in groove 11
It is provided with through-hole 13 on wall, clamping joint 14 is provided in through-hole 13,3 one end of aluminum pipe is removably connected with sleeve 12, aluminum pipe 3
The other end is penetrated from 13 one end of through-hole, is pierced by from 14 other end of clamping joint, and 14 exit of clamping joint is also socketed with sealing ring 15, close
Seal 15 is fixed with clamping joint 14 by 16 phase of sealing cover, and the sleeve 12 is all made of isolation material with clamping joint 14.
Preferably, 1 bottom of cabinet is provided with locating piece 17.
Preferably, observation window 18 is provided on the chamber door 1.
Preferably, the sealing ring 15 uses silica gel material.
Preferably, the aluminum pipe group 2 is set as two pairs, and aluminum pipe group 2 is made of 6-10 root aluminum pipe 3.
Embodiment:
In use, wafer is respectively put into wafer bracket, wafer bracket both ends bottom is placed in above camshaft bearing, wafer
Bracket both ends side wall is in contact with the ball for sidewindering mechanism, wafer bracket is pushed at the rear baffle of mounting rack rear end, by chamber door
With box sealing, vacuum pump vacuumizes cabinet from box back surface vacuum orifice, then injects argon gas, hydrogen from chamber door air inlet,
At this point, being respectively connected to radio frequency and ground connection on two electrode plates of each pair of aluminum pipe group, mixed gas is abundant between each pair of aluminum pipe group
Ionization, due to there is gap between aluminum pipe, so the plasma being ionized can flow freely in entire cabinet, to support
Wafer on frame is cleaned, and product cleaning effect and homogeneity are improved.Since bracket and guide rail are by ball and cam
Bearing mobile connection, so bracket is easy to push and pull, and friction area is small between each other, is not likely to produce molecule.
Meanwhile the design uses aluminum pipe detachable structure, aluminum pipe one end is threadedly secured in the inner wall of cabinet side
In sleeve, the aluminum pipe other end is mutually fixed with wall box by clamping joint, since sleeve and clamping joint all use isolation material, is used
In ensuring mutually insulated between aluminum pipe and cabinet.In addition, gap is mutually sealed by clamping joint between aluminum pipe and through-hole, clamping joint with
Gap is mutually sealed by sealing ring between aluminum pipe, for ensuring the air-tightness of cabinet.And between clamping joint, sealing ring, sealing cover
It is all that the maintenance and replacement in later period are easy to using the connection of the removablies such as clamping.
The above is only the preferred embodiment of the utility model, it should be pointed out that: for the common skill of the art
For art personnel, without departing from the principle of this utility model, several improvements and modifications can also be made, these improve and
Retouching also should be regarded as the protection scope of the utility model.
Claims (6)
1. a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity, comprising: cabinet, it is characterised in that: the box bilateral wall
Between through having a multipair aluminum pipe group, each pair of neighbouring setting of aluminum pipe group, aluminum pipe group includes more aluminum pipes, more one words of aluminum pipe rows
Column, aluminum pipe one end are fixed on cabinet side inner wall, and the aluminum pipe other end passes through another side wall of cabinet, and the end of aluminum pipe passes through electrode
Plate is connected；Box back surface is provided with vacuum orifice；Cabinet front is rotatably connected to chamber door, the setting of chamber door free end by hinge
There is door lock, is provided with air inlet on chamber door；The cabinet wall is provided with guide rail, and the guide rail includes: mounting rack, the installation
Frame includes: ontology, is provided with overhead gage above ontology, ontology rear end is provided with rear baffle, and horizontal row shows multiple sides on ontology
Roller structure, the mechanism of sidewindering includes being mounted on intrinsic sleeve, and barrel forward end activity is connected with ball；It is described to sidewinder mechanism
Multiple camshaft bearings are horizontally fixed with by fixed column on the ontology of lower section；Mobile connection has wafer bracket in the guide rail.
2. a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity according to claim 1, it is characterised in that: the case
Inner wall setting in body side is fluted, and sleeve is provided in groove, through-hole is provided on another side wall, clamping is provided in through-hole
Head, aluminum pipe one end are removably connected with sleeve, and the aluminum pipe other end is penetrated from through-hole one end, are pierced by from the clamping joint other end,
Clamping joint exit is also socketed with sealing ring, and sealing ring is mutually fixed with clamping joint by sealing cover, and the sleeve and clamping joint are equal
Using isolation material.
3. a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity according to claim 1, it is characterised in that: the case
Body bottom is provided with locating piece.
4. a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity according to claim 1, it is characterised in that: the case
Observation window is provided on door.
5. a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity according to claim 2, it is characterised in that: described close
Seal uses silica gel material.
6. a kind of aluminum pipe columnar electrode plasma wafer cleaning cavity according to claim 1, it is characterised in that: the aluminium
Pipe group is set as two pairs, and aluminum pipe group is made of 6-10 root aluminum pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920380157.XU CN209515606U (en) | 2019-03-25 | 2019-03-25 | A kind of aluminum pipe columnar electrode plasma wafer cleaning cavity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920380157.XU CN209515606U (en) | 2019-03-25 | 2019-03-25 | A kind of aluminum pipe columnar electrode plasma wafer cleaning cavity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209515606U true CN209515606U (en) | 2019-10-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920380157.XU Active CN209515606U (en) | 2019-03-25 | 2019-03-25 | A kind of aluminum pipe columnar electrode plasma wafer cleaning cavity |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110662340A (en) * | 2019-11-04 | 2020-01-07 | 合肥杰硕真空科技有限公司 | Plasma discharge device for flat electrode in square cavity |
| CN111299259A (en) * | 2020-04-20 | 2020-06-19 | 昆山索坤莱机电科技有限公司 | Integrated plasma treatment box |
-
2019
- 2019-03-25 CN CN201920380157.XU patent/CN209515606U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110662340A (en) * | 2019-11-04 | 2020-01-07 | 合肥杰硕真空科技有限公司 | Plasma discharge device for flat electrode in square cavity |
| CN111299259A (en) * | 2020-04-20 | 2020-06-19 | 昆山索坤莱机电科技有限公司 | Integrated plasma treatment box |
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