CN209656591U - A kind of Soft X-ray microimaging device - Google Patents
A kind of Soft X-ray microimaging device Download PDFInfo
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- CN209656591U CN209656591U CN201822254814.4U CN201822254814U CN209656591U CN 209656591 U CN209656591 U CN 209656591U CN 201822254814 U CN201822254814 U CN 201822254814U CN 209656591 U CN209656591 U CN 209656591U
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- 238000006073 displacement reaction Methods 0.000 claims abstract description 52
- 239000011521 glass Substances 0.000 claims abstract description 30
- 230000007246 mechanism Effects 0.000 claims abstract description 19
- 239000003507 refrigerant Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 14
- 239000013078 crystal Substances 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 4
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 23
- 239000007788 liquid Substances 0.000 description 18
- 239000002184 metal Substances 0.000 description 17
- 238000010586 diagram Methods 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 238000003384 imaging method Methods 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 238000005057 refrigeration Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000005469 synchrotron radiation Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- HTCXJNNIWILFQQ-UHFFFAOYSA-M emmi Chemical compound ClC1=C(Cl)C2(Cl)C3C(=O)N([Hg]CC)C(=O)C3C1(Cl)C2(Cl)Cl HTCXJNNIWILFQQ-UHFFFAOYSA-M 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000004060 metabolic process Effects 0.000 description 2
- 244000005700 microbiome Species 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000008506 pathogenesis Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000004224 protection Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 230000000391 smoking effect Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 208000033748 Device issues Diseases 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003834 intracellular effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000008239 natural water Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000003711 photoprotective effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 230000017105 transposition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Abstract
The application provides a kind of Soft X-ray microimaging device, including soft X_ray source, three-D displacement mechanism, vacuum unit, laser cell, reflector element, sample room and detector, soft X_ray source includes vacuum target chamber, refrigerating chamber and nozzle, refrigerating chamber and nozzle are placed in vacuum target chamber, vacuum target chamber has two opposite outlets, nozzle is set on refrigerating chamber, vacuum unit includes the first vacuum pump and the second vacuum pump, and the first vacuum pump and the second vacuum pump are connected with two outlets of vacuum target chamber respectively；The laser that pulse laser generator issues focuses at nozzle after laser condensing lens；Reflector element has the second reflecting mirror, and reflector element is connected to vacuum target chamber；Sample room is connected to vacuum target chamber, and glass capillary is accommodated in sample room, and the position of glass capillary is corresponding with the focus of nozzle and reflecting mirror；Detector is with sample room's connection and corresponding with the position of glass capillary.The application detects accurate, high-efficient, save the cost.
Description
Technical field
This application involves grenz ray fields, relate more specifically to a kind of Soft X-ray microimaging device.
Background technique
X-ray is a kind of electromagnetic radiation that wavelength is very short, and wavelength is about 0.01~100 Ethylmercurichlorendimide, between ultraviolet light and γ
Between ray, there is very high penetrating power, many substances opaque to visible light can be penetrated.The shorter X-ray energy of wavelength
Amount is bigger, also referred to as hard X ray, and the long X-ray energy of wavelength is lower, referred to as grenz ray.In general, wavelength is less than 0.1 angstrom
The title Super-hard X-ray of rice, title hard X ray of the wavelength within the scope of 0.1~10 Ethylmercurichlorendimide, wavelength is within the scope of 10~100 Ethylmercurichlorendimides
Claim grenz ray.
In recent years, grenz ray is widely used in many scientific domains, especially in soft X ray micro-imaging
In the fields such as Soft X-ray Projection Lithography Technology.In Soft X-ray microimaging field, Soft X-ray microimaging instrument is used
The grenz ray of water window wave band (wavelength is between 2.3nm-4.4nm) is imaged, can be directly under natural water-bearing state
Active bio sample carry out nanoscale three-dimensional imaging, be the key tool for observing intracellular true three-dimension ultra microstructure,
It is extremely important to cytoarchitectonics and function assessment research.
Soft X-ray microimaging instrument in the prior art includes that Synchrotron Radiation Soft X ray microsurgical instrument and small-sized soft X are penetrated
Line microsurgical instrument, wherein the synchrotron radiation light source in Synchrotron Radiation Soft X ray microsurgical instrument must be generated by large-scale accelerator,
At the acquired aspect of light source by huge restriction, the application popularization of instrument is significantly limited；For using the small-sized of liquid target
In grenz ray microsurgical instrument, the detection of grenz ray is carried out using grenz ray camera, however, the gain of grenz ray camera
Relatively low, the number of photons when amplification factor is larger due to unit area is greatly decreased, and causes Effect on Detecting poor, in low energy
There are energy resolutions in radionetric survey it is low, the time for exposure is long the problems such as, these problems strong influence performance of instrument and
Service life.In addition, grenz ray microsurgical instrument is high for the precise requirements of optical path, the accuracy of optical path be will have a direct impact on
To image quality, instrument in the prior art is comparatively laborious when adjusting optical path, and the regulation scheme and installation cost used is higher,
Cause image taking speed to be unable to satisfy the rapid three dimensional imaging demand of cell ultrastructure at all, significantly limits the application of instrument
It is universal.
Summary of the invention
The purpose of the application is to provide a kind of Soft X-ray microimaging device, so that it is aobvious to solve grenz ray in the prior art
The low and with high costs problem of the detection efficient of micro- Image-forming instrument.
In order to solve the above-mentioned technical problem, the technical solution of the application is to provide a kind of Soft X-ray microimaging device, institute
Stating Soft X-ray microimaging device includes:
Soft X_ray source, the soft X_ray source include vacuum target chamber, refrigerating chamber and nozzle, the refrigerating chamber and described
Nozzle is placed in the vacuum target chamber, and the vacuum target chamber has two opposite outlets, and the nozzle is set to the system
On cold chamber,
Vacuum unit, the vacuum unit include the first vacuum pump and the second vacuum pump, first vacuum pump and described
Second vacuum pump is connected with two outlets of the vacuum target chamber respectively；
Laser cell, the laser cell include pulse laser generator and laser condensing lens, the pulse laser hair
The laser that raw device issues is focused on after the laser condensing lens at the nozzle；
Reflector element, the reflector element have the second reflecting mirror, and the reflector element is connected to the vacuum target chamber；
Sample room, the sample room are connected to the vacuum target chamber, and glass capillary, the hair are accommodated in the sample room
The position of thin glass tube is corresponding with the focus of the nozzle and the reflecting mirror；And
Detector, the detector connect and corresponding with the position of the glass capillary with the sample room.
According to one embodiment of the application, the Soft X-ray microimaging device further includes three-D displacement mechanism, described
Three-D displacement mechanism is connect with the refrigerating chamber and the vacuum target chamber respectively.
According to one embodiment of the application, the three-D displacement mechanism includes the first displacement governor, second transposition
It saves device and third displacement governor, first displacement governor, second displacement adjuster and third displacement governor is equal
It is set between the support plate and the vacuum target chamber and controls the support plate respectively and moved along orthogonal three directions
It is dynamic.
According to one embodiment of the application, the vacuum target chamber includes: tee tube, and the tee tube has opposite the
One outlet and second outlet and the third outlet between the first outlet and the second outlet, the first outlet
It is connect with support plate, refrigerant inlet pipeline, refrigerant outlet pipeline and process gas pipes are each passed through the support plate
And connect with the refrigerating chamber, the third outlet is connect with first vacuum pump；And multi-pass pipe, the multi-pass pipe include
Opposite top opening and bottom opening and several sides between the top opening and the bottom opening are opened
Mouthful, the top opening is closely connect with the second outlet, is provided at the bottom opening and is connected with second vacuum pump
The vacuum outlet connect, the position of the nozzle is corresponding with side opening, and fluted, the groove is arranged below the nozzle
It is fixed by adapter, the adapter is set at the vacuum outlet, and the groove is connected to the vacuum outlet.
According to one embodiment of the application, the vacuum unit further includes vacuum controller, the vacuum controller point
It is not connect with first vacuum pump and second vacuum pump.
According to one embodiment of the application, the laser cell further includes the first reflecting mirror, and first reflecting mirror is set
It is placed between the pulse laser generator and the laser condensing lens to conduct laser optical path.
According to one embodiment of the application, lifting platform, first reflecting mirror are provided with below the pulse laser
Lower section is provided with the first adjuster, is provided with the second adjuster below the laser condensing lens.
According to one embodiment of the application, the reflector element includes third bracket, third threaded rod and blind plate, institute
It states third threaded rod to be set on the third bracket, the blind plate is set on the third threaded rod, second reflection
Mirror is installed on the blind plate.
According to one embodiment of the application, it is provided on the third threaded rod more with the third shaft
A third bolt, the third bolt are located at the two sides of the blind plate.
According to one embodiment of the application, the sample room includes sample chamber enclosure, the sample chamber enclosure it is opposite
Two side walls connect respectively with the vacuum target chamber and the detector, be provided with glass capillary and light in the sample room
Door screen pipe, the diaphragm pipe is interior to have the aperture extended in the axial direction, and one end of the aperture corresponds to the capillary glass
Pipe, the other end of the aperture correspond to the detector, the nozzle, the focus of second reflecting mirror, the capillary glass
The top of glass pipe and the aperture are located on same horizontal line.
According to one embodiment of the application, it is additionally provided with terrace with edge between the diaphragm pipe and the glass capillary, institute
Stating has terrace with edge hole in terrace with edge, the extending direction in the terrace with edge hole is consistent with the extending direction of the aperture, the terrace with edge hole
Zone plate is provided at one end of the glass capillary.
According to one embodiment of the application, the terrace with edge is set in three-dimensional current potential moving stage, the three-dimensional current potential moving stage
It is connect with the aviation plug being set on the sample chamber enclosure.
According to one embodiment of the application, the glass capillary is set on sample turntable, the sample rotation
Platform is set on sample two-dimensional adjustment platform.
According to one embodiment of the application, the detector includes scintillation crystal and silicon photomultiplier, the flashing
Crystal is corresponding with the sample room, and the silicon photomultiplier is coupled with the scintillation crystal.
According to one embodiment of the application, three-D displacement platform is provided with below the detector.
Soft X-ray microimaging device provided by the present application greatly improves its detection efficient to low light signals, drop
The low Imagewise exposure time, it can be realized higher amplification factor.Soft X ray source in the application uses adjustable three
Displacement mechanism is tieed up, the adjusting in a vacuum to liquid miniflow position and angle is realized, improves the geometry essence of grenz ray optical path
Accuracy facilitates optical path adjusting.The reflector element adjusted in the application using multiaxis, can be in a vacuum to the second reflecting mirror
Geometric position and pitch angle are adjusted, and realize the optimization of optical path.Vacuum system in the application can be by taking out in advance, taking out entirely
And the designs such as metal frustum realize vacuum chamber in normal pressure to vacuum accurate control.Soft X_ray source used herein
Advantage with low-debris, high conversion, improves the intensity of light source, reduces the damage to optical element in optical path, can
Improve the service life of instrument.In short, Soft X-ray microimaging device provided by the present application, can reach nanoscale at lower cost
Imaging resolution, grade two-dimensional imaging time second can be widely applied to life science, nanoscale quick three in medical research and development field
It ties up in micro-imaging, the research fields such as structure and metabolism, microorganism pathogenesis for functioning cell have exemplary role.
Detailed description of the invention
In order to illustrate the technical solutions in the embodiments of the present application or in the prior art more clearly, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The some embodiments recorded in application, for those of ordinary skill in the art, in the premise of not making the creative labor property
Under, it is also possible to obtain other drawings based on these drawings.
Fig. 1 is the stereoscopic schematic diagram according to the Soft X-ray microimaging device of one embodiment of the application；
Fig. 2 is the floor map according to the back side of the Soft X-ray microimaging device of Fig. 1；
Fig. 3 is the schematic top plan view according to the Soft X-ray microimaging device of Fig. 1；
Fig. 4 is the stereoscopic schematic diagram according to the soft X_ray source of the Soft X-ray microimaging device of Fig. 1；
Fig. 5 is that three-D displacement machine is shown according to the stereoscopic schematic diagram of the partial enlargement of the soft X_ray source of Fig. 4
Structure；
Fig. 6 is that refrigerating chamber and true is shown according to the stereoscopic schematic diagram of the local cutting of the soft X_ray source of Fig. 4
Air target room；
Fig. 7 is according to the diagrammatic cross-section of the soft X_ray source of Fig. 4, wherein illustrating only top half；
Fig. 8 is according to the diagrammatic cross-section of the soft X_ray source of Fig. 4, wherein illustrating only lower half portion；
Fig. 9 is that nozzle and heating is shown according to the stereoscopic schematic diagram of the partial enlargement of the soft X_ray source of Fig. 8
Mechanism；
Figure 10 is the stereoscopic schematic diagram according to the reflector element of the Soft X-ray microimaging device of Fig. 1；
Figure 11 is the stereoscopic schematic diagram according to the cutting of the reflector element of the Soft X-ray microimaging device of Figure 10；
Figure 12 is the stereoscopic schematic diagram inside the sample room according to the Soft X-ray microimaging device of Fig. 1.
Specific embodiment
Below in conjunction with specific embodiment, the application is described further.It should be understood that following embodiment is merely to illustrate this
Application is not for limitation scope of the present application.
It should be noted that it can directly set when component/part is referred to as on " setting exists " another component/part
It sets on another component/part or there may also be component/parts placed in the middle.When component/part is referred to as " connection/connection
Connect " to another component/part, it, which can be, is directly connected to/is attached to another component/part or may be simultaneously present residence
Middle component/part.Term as used herein " connection/connection " may include electrical and/or mechanical-physical connection/connection.This
Term "comprises/comprising" used in text refers to feature, step or the presence of component/part, but is not precluded one or more
Other feature, step or the presence of component/part or addition.Term as used herein "and/or" includes one or more phases
Close any and all combinations of listed item.
Unless otherwise defined, all technical and scientific terms used herein and the technical field for belonging to the application
The normally understood meaning of technical staff is identical.Term used herein is intended merely to the purpose of description specific embodiment, and
It is not intended to limitation the application.
In addition, term " first ", " second " etc. are used for description purposes only pair similar with distinguishing in the description of the present application
As between the two and sequencing being not present, indication or suggestion relative importance can not be interpreted as.In addition, the application's
In description, unless otherwise indicated, the meaning of " plurality " is two or more.
Fig. 1 is according to the stereoscopic schematic diagram of the Soft X-ray microimaging device of one embodiment of the application, and Fig. 2 is root
According to the floor map at the back side of the Soft X-ray microimaging device of Fig. 1, Fig. 3 is filled according to the Soft X-ray microimaging of Fig. 1
The schematic top plan view set, by Fig. 1 combination Fig. 2 and Fig. 3 it is found that Soft X-ray microimaging device provided by the present application includes soft X
Ray source 300, vacuum unit 400, laser cell 500, reflector element 600, sample room 700 and detector 800, wherein
X-ray source 300, laser cell 500, reflector element 600, sample room 700 and detector 800 are all set in the first operation
On platform 100, vacuum unit 400 is set on the second operating platform 200, and there is soft X_ray source 300 three-D displacement to adjust machine
Structure, tee tube 40 and multi-pass pipe 50, three-D displacement regulating mechanism are set on tee tube 40, and tee tube 40 and multi-pass pipe 50 are mutual
Connection；Vacuum unit 400 includes vacuum controller 410, the first vacuum pump 420 and the second vacuum pump 430, vacuum controller 410
The operating of the two is connect and controlled with the first vacuum pump 420 and the second vacuum pump 430 respectively, the first vacuum pump 420 passes through right angle
Bend pipe 431 is connect with one of outlet of tee tube 40, and the second vacuum pump 430 below vacuum pipe and multi-pass pipe 50 by setting
The vaccum exhaust outlet 432 set connects；Laser cell 500 includes pulse laser generator 501, the first reflecting mirror 510 and laser
Focus lamp 520,501 bottom of pulse laser generator are provided with the lifting platform 502 of adjustable height and direction, the first reflecting mirror
510 bottoms are provided with the first adjuster 511 of adjustable height and angle, and 520 bottom of laser condensing lens is provided with adjustable height
Second adjuster 521 of degree and angle can be with by the adjusting of lifting platform 502, the first adjuster 511 and the second adjuster 521
So that the laser that pulse laser generator 501 issues passes through 520 (such as Fig. 3 of reflection directive laser condensing lens of the first reflecting mirror 510
Shown in middle arrow), it is further focused on the liquid miniflow in soft X_ray source 300 by laser condensing lens 520, so that liquid
Body miniflow is plasmarized and generates grenz ray；Reflector element 600 is connect with one of outlet of 50 side of multi-pass pipe, instead
It penetrates in unit 600 and is provided with the second reflecting mirror 611 (Figure 11) so that grenz ray focusing is reflected towards sample room 700；Sample room
700 is positioned opposite about multi-pass pipe 50 with reflector element 600, sample room 700 it is corresponding on multi-pass pipe 50 by one outlet
Outlet connection, be provided with sample in sample room, the grenz ray after overregulating can be penetrated directly on sample, and sample is passed through
X ray continue to arrive forward detector 800 and be detected by detector 800；Detector 800 by pipeline 780,870 with
The opening of 700 other side of sample room connects, and the optical path of detector 800 and grenz ray is in same horizontal line, detector 800
Bottom be provided with three-D displacement platform 810, pass through the position of the adjustable detector 800 of three-D displacement platform 810；Detector 800
Including scintillation crystal and the SiPM coupled with scintillation crystal (silicon photomultiplier), wherein scintillation crystal is used to receive
Grenz ray is converted to visible light, and SiPM will be seen that light is converted to electric signal and exports, and the electric signal of output further passes through data
Processing forms corresponding image.
The various pieces of Soft X-ray microimaging device provided by the present application are discussed in detail below in conjunction with Fig. 4-Figure 12.
Fig. 4 is according to the stereoscopic schematic diagram of the soft X_ray source 300 of one embodiment of the application, as shown in Figure 4, originally
The soft X_ray source 300 that application provides includes three-D displacement mechanism, vacuum target chamber, refrigeration mechanism and light source generation mechanism, below
The detailed description of components is carried out in conjunction with attached drawing.
In Fig. 4, three-D displacement mechanism includes support plate 10, the first bellows 60, the displacement of first flange disk 30, first
Adjuster 70, second displacement adjuster 80 and third displacement governor 14, wherein support plate 10 is plate-like；First bellows
60 are cylindrical in shape and may be implemented along its axial stretching, and the top of the first bellows 60 is sealed at the lower face of support plate 10
On, the bottom of the first bellows 60 is closely connect with first flange disk 30, support plate 10, the first bellows 60 and first flange
Disk 30 forms the space of closed substantially tubular；The vertical centerline for defining the cylindrical space is (paper vertical i.e. in figure) for Z
Axis direction, defining two mutual mutually perpendicular directions in the plane vertical with Z-direction is X-axis and Y direction；First method
Several the first screw rods 24 extended along Z-direction are provided on blue disk 30, the top of the first screw rod 24 is fixedly installed annular
Third support plate 23, be provided with the first displacement governor 70 in third support plate 23；Second support plate 22 and third support plate
23 shapes are identical and arranged in parallel, and the second support plate 22 is located at 23 top of third support plate and by the first displacement governor
70 connect with third support plate 23, are provided with second displacement adjuster 80 in the second support plate 22；First support plate 21 and second
22 shape of support plate is identical and arranged in parallel, and the first support plate 21 is located at 22 top of the second support plate and passes through second displacement
Adjuster 80 is connect with the second support plate 22；First support plate 21, the second support plate 22 and third support plate 23 are substantially laminated
Arrangement and the through-hole with same size, the first bellows 60 are placed in these through-holes；It is arranged in first support plate 21 several
The second screw rod 15 that a (usually three) extend along Z-direction, support plate 10 are fixed on the second spiral shell by adjusting nut 14
On bar 15, adjusting nut 14 is formed as third displacement governor at this time, and third displacement governor 14 can be adjusted along Z-direction
The position of support plate 10；Process gas pipes 11, refrigerant outlet pipeline 12 and refrigerant is additionally provided in support plate 10 to enter
Mouth pipeline 13, process gas pipes 11, refrigerant outlet pipeline 12 and refrigerant inlet pipeline 13 are from outside across support plate 10
And it is inserted into inside the first bellows 60.
Further, in Fig. 4, vacuum target chamber includes tee tube 40 and multi-pass pipe 50, and there are three go out for the tool of tee tube 40
Mouthful: top exit, outlet at bottom and side exit form the tubular extended along Z-direction between top exit and outlet at bottom
Space, side exit are connected to the cylindrical space；It is provided with second flange disk 41 at top exit, is provided at side exit
Three ring flanges 42 are provided with the 4th ring flange 43 at outlet at bottom；First flange disk 30 and second flange disk 41 by gasket and
Bolt closely connects；Multi-pass pipe 50 has upper opening, under shed and several sides opening, shape between upper opening and under shed
At the cylindrical space extended along Z-direction, side opening is connected to the cylindrical space, meanwhile, the 5th method is formed at upper opening
Blue disk 51, lower opening are formed with the 6th ring flange 53, and corresponding ring flange 52,54 etc. has can be set in side opening, the
Five ring flanges 51 are closely connect with the 4th ring flange 43 by gasket core bolt；Vacuum evacuation is provided in the middle part of 6th ring flange 53
Mouth 511.Although those skilled in the art should be noted that first flange disk 30 is closely connect with second flange disk 41,
Cylinder in the tee tube 40 of 41 downside of cylindrical space and second flange disk in first bellows 60 of 30 upside of first flange disk
Shape space is not attached to logical；Although the 4th ring flange 43 is closely connect with the 5th ring flange 51, on the 4th ring flange 43
Cylindrical space in the multi-pass pipe 50 of 51 downside of cylindrical space and the 5th ring flange in the tee tube 40 of side is connected to logical.It is more
Multiple side openings of 50 lateral position of siphunculus can according to need corresponding setting CCD fixator 55, CCD adapter 56；Swash
Means are commonly arranged for those skilled in the art in photoprotection cover 57, observation window 58,59 etc., and details are not described herein.
Further, Fig. 5 be according to the stereoscopic schematic diagram of the partial enlargement of the soft X_ray source of Fig. 4, as shown in Figure 5,
It is provided with equally distributed bolt hole at circumference on first flange disk 30 and second flange disk 41, by bolt hole interpolation
Enter the close connection that fastening bolt realizes first flange disk 30 and second flange disk 41；First flange disk 30 by several the
One screw rod 24 is fixedly connected with third support plate 23, so that not can be movable relatively therebetween；First displacement governor 70 includes
First support 71, the first propeller 72, the first guide rail 73 and first rail groove 74 (Fig. 7), wherein first support 71 is in L
Shape, one end of first support 71 are fixed in third support plate 23, the other end of first support 71 raise upward and with third branch
Plane where fagging 23 is vertical；First propeller 72 is set on the other end of first support 71 along X-direction and with
The alignment of two support plates 22, allows the movement of the first propeller 72 that the second support plate 22 is pushed to move；Two the first guide rails 73
Be set to the upper surface of third support plate 23 and along X axis extend, two the first guide rails 73 be arranged symmetrically about bellows 60 and
Be parallel to each other, be provided on the lower surface of the second support plate 22 with the first guide rail 73 cooperation first rail groove 74 (Fig. 7), first
Guide rail 73 is placed in first rail groove 74 and can slide along first rail groove 74, when the movement of the first propeller 72, the
Two support plates 22 are slided along the first guide rail 73 in X-direction；Second displacement adjuster 80 is pushed away including second support 81, second
Into device 82, the second guide rail 83 and the second guide-track groove, wherein second support 81 is L-shaped, and one end of second support 81 is fixed on
In two support plates 22, the other end of second support 81 raises upward and vertical with the plane where the first support plate 21；Second pushes away
It is set on the other end of second support 81 into device 82 along Y direction and is aligned with the first support plate 21, so that second promotes
The movement of device 82 can push the first support plate 21 to move；Two the second guide rails 83 are set to the upper surface of the second support plate 22
And extend along Y-axis, two the second guide rails 83 are arranged symmetrically and are parallel to each other about bellows 60, the following table of the first support plate 21
The second guide-track groove with the cooperation of the second guide rail 83 is provided on face, the second guide rail 83 is placed in the second guide-track groove and can be along
The sliding of second guide-track groove, when the movement of the second propeller 82, the first support plate 21 is slided along the second guide rail 83 in Y direction；
Since bellows 60 is cylindrical in shape and may be implemented axially retractable, the top of bellows 60 is sealed at the lower plate of support plate 10
On face, support plate 10 is fixed on the second screw rod 15 by adjusting nut 14, therefore, when adjusting 71 He of the first propeller respectively
When the second propeller 82, support plate 10 can also be moved along X-direction, Y direction accordingly；When adjusting third displacement governor
When 14, support plate 10 is moved along Z-direction accordingly.
Further, Fig. 6 is according to the stereoscopic schematic diagram of the local cutting of the soft X_ray source of Fig. 4, and Fig. 7 is according to Fig. 4
Soft X_ray source diagrammatic cross-section, Fig. 8 be according to the diagrammatic cross-section of the soft X_ray source of Fig. 4, by Fig. 7, Fig. 8 combine
Fig. 6 is it is found that be additionally provided with process gas pipes 11, refrigerant outlet pipeline 12 and refrigerant inlet pipeline in support plate 10
13, process gas pipes 11, refrigerant outlet pipeline 12 and refrigerant inlet pipeline 13 pass through support plate 10 outside certainly and are inserted into
Inside bellows 60.Refrigeration mechanism includes refrigerating chamber 44, refrigerant inlet pipeline 13 and refrigerant outlet pipeline 12, wherein
Refrigerating chamber 44 is formed as tubular and is placed in vacuum target chamber, and specifically, the internal stretch of refrigerating chamber 44 from tee tube 40 enters more
The top that the inside of siphunculus 50, refrigerant inlet pipeline 13 and refrigerant outlet pipeline 12 distinguish self-supporting slab 10 passes through ripple
Inside pipe 60, first flange disk 30 and second flange disk 41 and fixation is connected to the top of refrigerating chamber 44 so that refrigerant can be with
The temperature that reduces refrigerating chamber 44 in, the gas that refrigerating chamber 44 in generates are conveyed into refrigerating chamber 44 from refrigerant inlet duct 13
Refrigerating chamber 44 is discharged via refrigerant outlet pipeline 12；The top of 11 self-supporting slab 10 of process gas pipes passes through bellows 60
Inside, first flange disk 30, second flange disk 41 and refrigerating chamber 44, process gas pipes 11 are pierced by after refrigerating chamber 44 and spray
Mouth connection, the condensation chamber 111 that middle part one cross-sectional area of formation of process gas pipes 11 increases, at least the one of condensation chamber 111
Part is located in refrigerating chamber 44, it should be noted that and the inside of process gas pipes 11 and the inside of refrigerating chamber 44 are not attached to lead to,
Working gas (such as nitrogen) is conveyed by process gas pipes 11 to nozzle, and is liquefied in the process, via nozzle stream
The state of working gas has changed into liquefaction when out, and the moisture in working gas makes by being condensed when condensation chamber 11
The working gas that must be moved on keeps its purity to prevent nozzle blockage.
Fig. 9 is according to the stereoscopic schematic diagram of the partial enlargement of the soft X_ray source of Fig. 8, by Fig. 9 combination Fig. 6 it is found that light source
Generation mechanism includes nozzle 36, and nozzle 36 is set to 44 lower section of refrigerating chamber and is fixed under refrigerating chamber 44 by adapter 35
Side, nozzle 36 be connected to process gas pipes 11 so that by condensation become the working gas of liquid from nozzle 36 from outflow；
Adapter 35 generallys use metal adapter so that temperature is transmitted more rapidly and accurately；The periphery of adapter 35 is provided with temperature
Sensor 31 is in order to monitor the temperature variations around nozzle 36 in real time, and temperature sensor 31 is by being arranged in support plate
One of plug 17 at 10 tops is connect with external device (ED).The lower section of refrigerating chamber 44 is additionally provided with connection sheet 32, connection sheet 32
On be provided with resistance wire bracket 33, resistance wire 34 is provided on resistance wire bracket 33, a portion resistance wire twist wraps
Be rolled in the side of nozzle 36, resistance wire 34 connect by conducting wire with another plug 17 being arranged at the top of support plate 10 with
Convenient is that resistance wire is powered.Temperature drops caused by the heating of resistance wire 34 can be offset due to refrigerant liquid evacuator body, condensation
It is low, while the high vacuum of cryogenic liquid ambient enviroment will not be destroyed, so that the stability of microstream is further promoted, while when spray
Mouth 36 is condensed to heat by resistance wire 34 when obstruction and be dredged.The lower section of nozzle 36 is additionally provided with metal frustum
37, it is generally disposed at below the nozzle 36 at 15mm, the top of metal frustum 37 is provided with to 37 inner hollow of metal cone platform
Groove, the groove are used to receive the remaining liquid flowed out from nozzle 36.The design of the metal frustum 37 can preferably by due to
It evaporates and the remaining liquid that vacuum degree is affected is taken away in time, reduce the consumption of grenz ray.The lower section of metal frustum 37
It is further connect by metal adapter 513 and metal joint 512 with vaccum exhaust outlet 511, so that passing through vaccum exhaust outlet
511 can extract the liquid of above-mentioned remnants out.Extend it should be noted that being additionally provided on metal adapter 513 along Z-direction
Heat conducting bar 38, heat conducting bar 38 connect to lead to heat transfer and make the temperature of metal adapter 513, metal frustum 37 with refrigerating chamber 44
Spend it is suitable with the temperature at nozzle 36, thus guarantee remnants liquid will not because of temperature change conversion conditions, make vacuum target
Indoor vacuum degree reduces, and influences the brightness of grenz ray.Or it is additionally provided on metal adapter 513 along Z-direction extension
Heat conducting pipe 38, heat conducting pipe pipe 38 is connect with refrigerating chamber 44 so that the refrigerant in refrigerating chamber 44 can be delivered to metal adapter
513, it is suitable with the temperature in refrigerating chamber 44 to make its temperature for metal frustum 37, to prevent cryogenic liquid miniflow in the mistake of flowing
Further gasification reduces vacuum degree in journey, causes the consumption of grenz ray.
Since nozzle 36 is fixed on refrigerating chamber 44, refrigerating chamber 44 passes through refrigerant inlet pipeline 13, refrigerant outlet pipe
Road 12 and process gas pipes 11 are fixed in support plate 10, therefore, pass through the first displacement governor 70, second displacement adjuster
80 and the geometric position that nozzle 36 may be implemented of third displacement governor 14 multiaxis it is adjustable, it can be achieved that in light source working
Nozzle in vacuum target chamber is adjusted, to control the position of liquid miniflow, to be finally reached in three directions of X, Y, Z axis and adjust soft X
The purpose of ray source position.
Figure 10 be according to the stereoscopic schematic diagram of the reflector element 600 of the Soft X-ray microimaging device of Fig. 1, can by Figure 10
Know, reflector element 600 includes two third brackets, 601, three third threaded rods 603, blind plate 604 and the second bellows
606, wherein two third brackets 601 are arranged in parallel and are fixed on the first operating platform 100 by L-type support 602 respectively,
Several bolts hole are provided on third bracket 601, third threaded rod 603 is fixed on third bracket along substantially horizontal direction
On 601 in corresponding bolt hole, the line between the bolt hole on each third bracket 601 forms triangle, so that
Third threaded rod 603 and the component being installed on third threaded rod 603 are more stable；Blind plate 604 is located at two third branch
It between frame 601 and is sheathed on third threaded rod 603, the two sides of blind plate 604 pass through the third spiral shell that cooperates with third threaded rod 603
Bolt 608 is fixed；The end of third threaded rod 603 is additionally provided with reflection ring flange 607, reflects ring flange 607 and blind plate
It is connected between 604 by enemy's bellows 606, the axle center of blind plate 604, reflection ring flange 607 and blind plate 604 is respectively positioned on same
On axis, the axis is corresponding with the liquid miniflow at the nozzle in vacuum target chamber；It reflects ring flange 607 and passes through the 4th bolt
609 are correspondingly connected with the ring flange 52 of 50 side of tee tube, and the through-hole 610 among reflection ring flange 607 makes the second bellows
606 are connected to vacuum target chamber inside.
Figure 11 is according to the stereoscopic schematic diagram of the cutting of the reflector element of the Soft X-ray microimaging device of Figure 10, by scheming
11 it is found that be additionally provided with the second reflecting mirror 605 towards soft X_ray source in blind plate 604, the second reflecting mirror 605 will be collected into
Grenz ray focus reflection, focus falls at the sample in sample room 700.Since the second reflecting mirror 605 is fixed on blind plate 604
On, when adjusting third bolt 608, the second reflecting mirror 605 will move together with blind plate 604, and the second reflecting mirror 605 may be implemented
Two-dimensional movement, the second reflection in space can be determined by being adjusted by the position of the third bolt 608 on different third threaded rods 603
605 place plane of mirror, and then the angle of reflecting mirror 605 and each axis is finely tuned, 605 pitch angle of the second reflecting mirror is micro- in realization vacuum
It adjusts.Third bolt 608 bears chamber external pressure simultaneously.
Figure 12 is the stereoscopic schematic diagram inside the sample room 700 according to the Soft X-ray microimaging device of Fig. 1, by Figure 12
It is found that sample room 700 includes sample chamber enclosure 701, it is respectively arranged in the opposite two side walls of sample chamber enclosure 701 hollow
Ring flange 702,750, ring flange 702 are connect with a ring flange 54 of 50 side of multi-pass pipe so that vacuum target chamber and sample
Room connection, further such that the grenz ray generated in vacuum target chamber can focus via the reflection of the second reflecting mirror 605 and be entered
In sample room 700；Ring flange 750 is connect with pipeline 780；Sample bottom plate 704, sample bottom plate 704 are provided in sample room 700
The three-dimensional current potential moving stage of upper setting, three-dimensional current potential moving stage includes the first slide plate 705, the second slide plate 706 and the third that layer is not arranged
Slide plate 707 is slidably matched between each slide plate；The first objective table 708, the first objective table 708 are provided on third slide plate 707
Side wall on be provided with hollow terrace with edge 709, be hollow and hollow hole inside terrace with edge 709 all the way through terrace with edge 709, should
The axis in hollow hole is located in horizontal plane and essentially identical with the axis of the second reflecting mirror 605, close to the hollow of sample side
Hole at be provided with zone plate；Sample two-dimensional adjustment platform 710, sample two-dimensional adjustment platform are additionally provided on sample bottom plate 704
Sample turntable 711 is provided on 710, setting sample bores 712 on sample turntable 711, places capillary glass on sample cone 712
Pipe 713, glass capillary 713 is interior to load cell sample to be imaged, and sample two-dimensional adjustment platform 710 can cooperate sample to rotate
Platform 711 adjusts the position of glass capillary 713, so that the top of glass capillary 713 is corresponding with the hollow hole of terrace with edge 709；
Diaphragm pipe 714 is provided in pipeline 780, diaphragm pipe 714, which passes through ring flange 750 from pipeline 780, to be goed deep into sample room 700, light
Be provided in late pipe 714 along diaphragm pipe 714 axis direction extension aperture 715, aperture 715 with it is hollow on terrace with edge 709
Hole it is corresponding, allow the soft X ray after injecting cell sample to continue on hole and aperture hollow in terrace with edge 709
715 reach detector 800.In addition, being additionally provided with multiple (such as four) aviation plugs 770, the boat on the side wall of sample room 700
Blind plug is connect respectively with three-dimensional current potential moving stage, sample two-dimensional condition platform 710 and sample turntable 711 with command displacement.Sample
Injection nitrogen in portion's carries out in the device after nitrogen interface 771 (Fig. 3) is additionally provided on the side wall of this room 700 in order to work
Protection.
Those skilled in the art should be noted that the glass capillary 713 and dress that cell sample is loaded in sample room 700
The position that optical path is passed through when the hollow terrace with edge 709 and aperture 715 of zone plate are device operations, with the second reflecting mirror
605 axis substantially remains on same horizontal line.
In addition, Soft X-ray microimaging device provided by the present application further includes refrigerant memory, refrigerant memory is logical
It crosses transfer tube to connect with refrigerant inlet pipeline 13, low-temperature solenoid valve is provided on transfer tube to automatically control the input of refrigerant
It measures and the pressure in refrigerating chamber is maintained to stablize；The Soft X-ray microimaging device further comprises molecular pump, and molecule is true
Sky pump is connect by vacuum transmission pipe with refrigerant outlet pipeline 12, and high-temperature buffer chamber is provided on vacuum transmission pipe, and high temperature is slow
Setting heater at chamber is rushed, vacuum solenoid is additionally provided between high-temperature buffer chamber and molecular pump, passes through high-temperature buffer chamber
It is heated with low-temperature refrigerant of the heater to extraction, prevents the refrigerant damage vacuum solenoid and molecule vacuum that temperature is too low
Pump, vacuum solenoid can be set vacuum level threshold, is closed when pressure is too low in refrigerating chamber, and when refrigerating chamber too high pressure beats
It opens, to realize the control of refrigeration cavity temperature.By molecular pump the refrigerant circulation inside refrigerating chamber 44 is substituted,
So that can be realized lower cryogenic temperature at nozzle, accurate adjustable, refrigerating efficiency is higher, gas that can be very low by certain liquefaction points
Body (such as nitrogen) liquefaction, and more stable injection and longer spray distance are obtained, so that the stability of soft X_ray source is more
By force, while a greater variety of gas targets being also applied for.
Vacuum meter interface 510 is additionally provided on the side of multi-pass pipe 50, vacuum meter passes through vacuum meter interface 510 and multi-pass
Pipe 50 is connected to measure the vacuum degree inside multi-pass pipe 50.In order to maintain the vacuum degree in multi-pass pipe 50 and tee tube 40, three
The first vacuum pump 420 is separately connected at third ring flange 42 on siphunculus 40 and at the vaccum exhaust outlet 511 of 50 bottom of multi-pass pipe
With the second vacuum pump 430, since the gas outlet vacuumized is located at the upper and lower ends of vacuum target chamber, so that in vacuum target chamber
Vacuum degree is able to maintain that in very high level.
At work, High Power Laser Pulses device 501 generates laser simultaneously to Soft X-ray microimaging device provided by the present application
It is acted on the liquid miniflow at nozzle 36 after the reflection of the first reflecting mirror 510 and the focusing of laser focusing lens 520,
So that liquid miniflow is plasmarized and generates grenz ray, the second reflecting mirror 605 being loaded on blind plate 24 will be collected into
Grenz ray focus reflection, focus falls at the cell sample at 713 tip of glass capillary in sample room 700, passes through cell
The soft X ray of sample continues to pass through zone plate and transmits again through aperture 715, is finally irradiated to after pipeline 780,870
On detector 800, finally the electric signal of acquisition is transmitted on computer and carries out subsequent processing.
Those skilled in the art should be noted that the first displacement governor being previously mentioned in technical scheme and
Two displacement governors can use differential head, and third displacement governor can be replaced using other step devices, i.e., all
Can be realized micron accuracy manually, the regulating mechanism of automatic adjustment straight-line displacement, such as electricity driving displacement platform each falls within the application's
Protection scope.Those skilled in the art be also to be noted that the three-D displacement platform used in the application, three-D displacement mechanism,
First adjuster 511, the second adjuster 521, three-dimensional current potential moving stage equipotential moving device can according to need in two and three dimensions
It is selected in movement, the connection relationship and the mechanism of action between internal part can also be used for reference mutually, and details are not described herein.
Those skilled in the art are also to be noted that low temperature resistant glass atomizer, adapter, adapter and metal can be used in nozzle
Frustum etc. can be made of low temperature resistant metal material；High Power Laser Pulses can be produced by high energy nanosecoud pulse laser
It is raw, it can also be generated by the light source of other short pulse superlasers, such as femtosecond pulse laser etc., details are not described herein.
Vacuum pump in the application can use ionic pump, lobe pump etc. to realize the high vacuum in vacuum target chamber.Working gas is preferred
Use nitrogen, nitrogen be intended only as generate laser plasma a kind of target substance, it is all to generate laser plasma physical efficiency
The substance (gas or liquid) of some strength grenz ray, such as the substances such as alcohol, xenon are enough radiated, the guarantor of the application is each fallen within
Protect range.
Detector in the application uses number SiPM, reads to each pixel (basic unit) in SiPM, from
And the photon counting measurement of position sensing type may be implemented, since the basic-cell dimensions of SiPM are at 20 μm or so, so can
Reach with position resolution similar in CCD, compared to traditional CCD element, signal gain improves 1000 times, thus greatly
Improve its detection efficient to low light signals, reduce the Imagewise exposure time, can be realized higher amplification factor.This Shen
Please in soft X_ray source use adjustable three-D displacement mechanism, realize in a vacuum to liquid miniflow position and angle
Adjusting, improve the geometry precision of grenz ray optical path, facilitate optical path adjusting.Using the anti-of multiaxis adjusting in the application
Unit is penetrated, the geometric position to the second reflecting mirror and pitch angle can be adjusted in a vacuum, realize the optimization of optical path.This
Vacuum system in application can be by smoking in advance, smoking entirely and the designs such as metal frustum 37 realize in vacuum chamber normal pressure to vacuum
Accurate control.Soft X_ray source used herein has the advantage of low-debris, high conversion, improves the intensity of light source,
The damage to optical element in optical path is reduced, can be improved the service life of instrument.
In short, Soft X-ray microimaging device provided by the present application, can reach nanoscale imaging at lower cost and differentiate
Rate, grade two-dimensional imaging time second, can be widely applied to life science, in medical research and development field nanoscale quick three-dimensional it is micro- at
As in, the research fields such as structure and metabolism, microorganism pathogenesis for functioning cell have exemplary role.
Above-described, the only preferred embodiment of the application is not intended to limit the scope of the present application, and the application's is upper
Stating embodiment can also make a variety of changes.Made by i.e. all claims and description according to the application application
Simply, equivalent changes and modifications fall within the claims of the application patent.The not detailed description of the application is
Routine techniques content.
Claims (15)
1. a kind of Soft X-ray microimaging device, which is characterized in that the Soft X-ray microimaging device includes:
Soft X_ray source, the soft X_ray source include vacuum target chamber, refrigerating chamber and nozzle, the refrigerating chamber and the nozzle
It is placed in the vacuum target chamber, the vacuum target chamber has two opposite outlets, and the nozzle is set to the refrigerating chamber
On,
Vacuum unit, the vacuum unit include the first vacuum pump and the second vacuum pump, first vacuum pump and described second
Vacuum pump is connected with two outlets of the vacuum target chamber respectively；
Laser cell, the laser cell include pulse laser generator and laser condensing lens, the pulse laser generator
The laser of sending is focused on after the laser condensing lens at the nozzle；
Reflector element, the reflector element have the second reflecting mirror, and the reflector element is connected to the vacuum target chamber；
Sample room, the sample room are connected to the vacuum target chamber, and glass capillary, the capillary glass are accommodated in the sample room
The position of glass pipe is corresponding with the focus of the nozzle and the reflecting mirror；And
Detector, the detector connect and corresponding with the position of the glass capillary with the sample room.
2. Soft X-ray microimaging device according to claim 1, which is characterized in that the Soft X-ray microimaging dress
Setting further includes three-D displacement mechanism, and the three-D displacement mechanism is connect with the refrigerating chamber and the vacuum target chamber respectively.
3. Soft X-ray microimaging device according to claim 2, which is characterized in that the three-D displacement mechanism includes
Support plate, the first displacement governor, second displacement adjuster and third displacement governor, first displacement governor,
Two displacement governors and third displacement governor are all set between the support plate and the vacuum target chamber and control respectively
The support plate is moved along orthogonal three directions.
4. Soft X-ray microimaging device according to claim 1, which is characterized in that the vacuum target chamber includes:
Tee tube, the tee tube have opposite first outlet and second outlet and are located at the first outlet and described the
Third outlet between two outlets, the first outlet connect with support plate, refrigerant inlet pipeline, refrigerant outlet pipeline with
And process gas pipes are each passed through the support plate and connect with the refrigerating chamber, the third outlet and first vacuum
Pump connection；And
Multi-pass pipe, the multi-pass pipe include opposite top opening and bottom opening and are located at the top opening and the bottom
Several sides opening between portion's opening, the top opening is closely connect with the second outlet, at the bottom opening
It is provided with the vacuum outlet connecting with second vacuum pump, the position of the nozzle is corresponding with side opening, the spray
Setting is fluted below mouth, and the groove is fixed by adapter, and the adapter is set at the vacuum outlet, described recessed
Slot is connected to the vacuum outlet.
5. Soft X-ray microimaging device according to claim 1, which is characterized in that the vacuum unit further includes true
Empty controller, the vacuum controller are connect with first vacuum pump and second vacuum pump respectively.
6. Soft X-ray microimaging device according to claim 1, which is characterized in that the laser cell further includes
One reflecting mirror, first reflecting mirror are set between the pulse laser generator and the laser condensing lens to conduct laser
Optical path.
7. Soft X-ray microimaging device according to claim 6, which is characterized in that under the pulse laser generator
Side is provided with lifting platform, and the first adjuster is provided with below first reflecting mirror, and the is provided with below the laser condensing lens
Two adjusters.
8. Soft X-ray microimaging device according to claim 1, which is characterized in that the reflector element includes third
Bracket, third threaded rod and blind plate, the third threaded rod are set on the third bracket, and the blind plate is set to described
On third threaded rod, second reflecting mirror is installed on the blind plate.
9. Soft X-ray microimaging device according to claim 8, which is characterized in that be arranged on the third threaded rod
There are multiple third bolts with the third shaft, the third bolt is located at the two sides of the blind plate.
10. Soft X-ray microimaging device according to claim 1, which is characterized in that the sample room includes sample room
The opposite two side walls of shell, the sample chamber enclosure are connect with the vacuum target chamber and the detector respectively, the sample
This interior is provided with glass capillary and diaphragm pipe, has the aperture extended in the axial direction, the light in the diaphragm pipe
The one end in late hole corresponds to the glass capillary, and the other end of the aperture corresponds to the detector, the nozzle, described
The focus of two-mirror, the top of the glass capillary and the aperture are located on same horizontal line.
11. Soft X-ray microimaging device according to claim 10, which is characterized in that the diaphragm pipe and the hair
It is additionally provided with terrace with edge between thin glass tube, there is terrace with edge hole, the extending direction and the diaphragm in the terrace with edge hole in the terrace with edge
The extending direction in hole is consistent, and the terrace with edge hole is provided with zone plate at one end of the glass capillary.
12. Soft X-ray microimaging device according to claim 11, which is characterized in that the terrace with edge is set to three-dimensional
In current potential moving stage, the three-dimensional current potential moving stage is connect with the aviation plug being set on the sample chamber enclosure.
13. Soft X-ray microimaging device according to claim 11, which is characterized in that the glass capillary setting
In on sample turntable, the sample turntable is set on sample two-dimensional adjustment platform.
14. Soft X-ray microimaging device according to claim 1, which is characterized in that the detector includes that flashing is brilliant
Body and silicon photomultiplier, the scintillation crystal is corresponding with the sample room, the silicon photomultiplier and the scintillation crystal
Coupling.
15. Soft X-ray microimaging device according to claim 1, which is characterized in that be provided with below the detector
Three-D displacement platform.
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| CN201822254814.4U CN209656591U (en) | 2018-12-29 | 2018-12-29 | A kind of Soft X-ray microimaging device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020134503A1 (en) * | 2018-12-29 | 2020-07-02 | 苏州瑞派宁科技有限公司 | Soft x-ray micro imaging device |
| CN111935891A (en) * | 2020-08-11 | 2020-11-13 | 中国工程物理研究院流体物理研究所 | Desktop type plasma ultrafast X-ray source |
-
2018
- 2018-12-29 CN CN201822254814.4U patent/CN209656591U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020134503A1 (en) * | 2018-12-29 | 2020-07-02 | 苏州瑞派宁科技有限公司 | Soft x-ray micro imaging device |
| CN111935891A (en) * | 2020-08-11 | 2020-11-13 | 中国工程物理研究院流体物理研究所 | Desktop type plasma ultrafast X-ray source |
| CN111935891B (en) * | 2020-08-11 | 2022-09-09 | 中国工程物理研究院流体物理研究所 | Desktop type plasma ultrafast X-ray source |
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