CN209493698U

CN209493698U - A kind of more changing device of the baseline for pattern sewing machine

Info

Publication number: CN209493698U
Application number: CN201822056990.7U
Authority: CN
Inventors: 谢行知
Original assignee: Wenzhou Hanhai Mechanical And Electrical Technology Co Ltd
Current assignee: Wenzhou Hanhai Mechanical And Electrical Technology Co Ltd
Priority date: 2018-12-07
Filing date: 2018-12-07
Publication date: 2019-10-15
Anticipated expiration: 2028-12-07

Abstract

A kind of more changing device of the baseline for pattern sewing machine, shuttle including being wound with baseline, hollow out inside the shuttle, shuttle upper surface sets that there are two the skewed slots that extend into shuttle, a kind of more changing device of the baseline for pattern sewing machine further includes wire-changing device and workspace, the wire-changing device includes feeding device and clamp device, the clamp device includes manipulator, the manipulator includes the robot base for solid mechanical hand, with the hinged first mechanical arm of robot base, the first mechanical arm is equipped with limit sliding rail, the limit sliding rail is equipped with sliding block, the manipulator further includes second mechanical arm and the third mechanical arm for being fixed on sliding block, the second mechanical arm is equipped with the first rotating electric machine, the third mechanical arm is equipped with the first rotary shaft, it is hinged for clamping shuttle with the first rotary shaft Sub clamping claw and the driving motor for driving clamping claw movement, the clamping claw are adapted with the shape size of skewed slot.

Description

A kind of more changing device of the baseline for pattern sewing machine

Technical field

The utility model relates to sewing mechanical equipment fields more particularly to a kind of baseline for pattern sewing machine more to change the outfit It sets.

Background technique

Pattern sewing machine is widely used in present clothing production, in the pattern sewing machine course of work, every work one The section time requires replacement shuttle, and for supplementing baseline for pattern sewing machine, most of sewing machine is all to pass through people in the market Work mode replaces shuttle, and this traditional baseline replacing options produce pattern sewing machine can not continuously automatically, production efficiency by To influence.

Summary of the invention

To solve the above-mentioned problems, the utility model provides one kind and can be improved production efficiency, completes pattern sewing machine The more changing device of the baseline for pattern sewing machine of automated production.

The technical solution of the utility model includes: a kind of more changing device of the baseline for pattern sewing machine, including it is wound with baseline Shuttle, hollow out inside the shuttle, shuttle upper surface sets there are two the skewed slot extended into shuttle, described a kind of to be used for style The baseline of sewing machine more changing device further includes the wire-changing device for replacing shuttle and the work for placing the shuttle after replacing Area, the wire-changing device include for providing the feeding device of original shuttle to material-changing device and for clamping shuttle Clamp device, the clamp device include the manipulator for clamping shuttle, and the manipulator includes for solid mechanical hand Robot base and the hinged first mechanical arm of robot base, the first mechanical arm is equipped with limit sliding rail, described It limits sliding rail and is equipped with sliding block, the manipulator further includes that one end is fixedly connected with a slide block and the other end and robot base hinge The second mechanical arm of connection and the third mechanical arm for being fixed on sliding block, the second mechanical arm are equipped with for driving the second machinery First rotating electric machine of arm rotation, the third mechanical arm are equipped with the first rotary shaft and the hinged use of the first rotary shaft In the clamping claw for clamping shuttle and for driving the driving motor for clamping claw movement, the shape of the clamping claw and skewed slot Size is adapted.

By adopting the above technical scheme, second mechanical arm rotation is driven by the driving of the first rotating electric machine, due to the second machine Tool arm is fixedly connected with a slide block, and sliding block is located on limit sliding rail, and limit sliding rail drives first mechanical arm rotation, meanwhile, with sliding block The third mechanical arm being fixedly connected is also with movement, and on third manipulator motion to feeding device, the first rotary shaft will be clamped Claw is rotated to suitable position, and driving motor driving clamping claw clamps shuttle by the skewed slot on shuttle, then passes through the first rotation The driving of rotating motor drives, and makes third manipulator motion to the suitable position of workspace, shuttle is put into workspace, completes shuttle More change jobs, the baseline that pattern sewing machine may be implemented so is automatically replaced, and greatly improves production efficiency, save manpower at This.

The further setting of the utility model: the feeding device includes swivel base, is used on swivel base Place the fixed column of shuttle, second rotary shaft positioned at swivel base bottom for rotating swivel base and for driving the Second rotating electric machine of two rotary shafts movement, the shuttle bottom are equipped with mounting hole, the installation bore dia and fixed column diameter Size is adapted.

By adopting the above technical scheme, the rotation of the second rotary shaft is driven by the second rotating electric machine, so that swivel base is realized Rotation, thus can be after manipulator clamps a shuttle, by rotation swivel base rapidly by new shuttle ready for use Son rotation substantially increases the efficiency of the replacement baseline of the baseline more changing device of pattern sewing machine to station；Simultaneously because shuttle Bottom is equipped with mounting hole, and is adapted with the fixed column diameter on swivel base, and therefore, shuttle can be fixedly mounted on On fixed column, avoid when swivel base rotates, shuttle is because centrifugal force is detached from feeding device.

The further setting of the utility model: the robot base is equipped with limiting groove, in the second mechanical arm Equipped with convex block, the width of the convex block is adapted with the width of limiting groove, the shape and second mechanical arm of the limiting groove It is identical with the motion profile shape of first mechanical arm junction.

By adopting the above technical scheme, by being arranged limiting groove in robot base, and the shape of limiting groove and the Two mechanical arms are identical with the motion profile shape of first mechanical arm junction, can play limit mechanical hands movement track in this way Effect, it is ensured that manipulator moves between workspace and feeding device always.

The further setting of the utility model: the limit sliding rail includes slide bar and postive stop baffle, limits sliding rail one end Postive stop baffle is connect with robot base hinge, and the sliding block is equipped with through-hole, and the diameter of the through-hole and the diameter of slide bar are big Small to be adapted, limit sliding rail is connect by slide bar with sliding block.

By adopting the above technical scheme, since limit sliding rail includes slide bar and postive stop baffle, and the diameter and cunning of slide bar The diameter of through-hole on block is adapted, it may therefore be assured that the movement of sliding block can be moved with moving slide-bar, while sliding block Linear movement direction is identical as the direction of slide bar, simultaneously as limit sliding rail is equipped with postive stop baffle, it is ensured that sliding block will not Slide bar is skidded off, equipment is avoided to break down.

Detailed description of the invention

Attached drawing 1 is that a kind of structure of more changing device of the baseline for pattern sewing machine of the utility model specific embodiment is shown It is intended to.

Attached drawing 2 is the charging in a kind of more changing device of the baseline for pattern sewing machine of the utility model specific embodiment The structural schematic diagram of device.

Attached drawing 3 is the shuttle in a kind of more changing device of the baseline for pattern sewing machine of the utility model specific embodiment Cross-sectional view.

Attached drawing 4 is second in a kind of more changing device of the baseline for pattern sewing machine of the utility model specific embodiment The structural schematic diagram of mechanical arm.

Specific embodiment

As shown in Figs 1-4, a kind of more changing device of the baseline for pattern sewing machine, the shuttle 1 including being wound with baseline, institute 1 inside hollow out of shuttle is stated, 1 upper surface of shuttle is set there are two the skewed slot 2 extended into shuttle 1, and described one kind is sewed for style The baseline of machine more changing device further includes the wire-changing device 3 for replacing shuttle 1 and the workspace for placing the shuttle 1 after replacing 4, the wire-changing device 3 includes for providing the feeding device 5 of original shuttle 1 to material-changing device 3 and for clamping shuttle The clamp device 6 of son 1, the clamp device 6 include the manipulator 7 for clamping shuttle 1, and the manipulator 7 includes for solid Determine the robot base 8 and the hinged first mechanical arm 9 of robot base 8 of manipulator 7, is set in the first mechanical arm 9 There is limit sliding rail 10, the limit sliding rail 10 is equipped with sliding block 11, and the manipulator 7 further includes that one end is fixedly connected with sliding block 11 And the other end and the hinged second mechanical arm 12 of robot base 8 and the third mechanical arm 13 for being fixed on sliding block 11, it is described Second mechanical arm 12 is equipped with the first rotating electric machine 14 for driving second mechanical arm 12 to rotate, on the third mechanical arm 13 Equipped with the first rotary shaft 15, it is hinged for clamping the clamping claw 16 of shuttle 1 and for driving with the first rotary shaft 15 The driving motor 17 that claw 16 moves is clamped, the clamping claw 16 is adapted with the shape size of skewed slot 2.

Second mechanical arm 12 is driven to rotate by the driving of the first rotating electric machine 14, due to second mechanical arm 12 and sliding block 11 It being fixedly connected, sliding block 11 is located on limit sliding rail 10, and limit sliding rail 10 drives first mechanical arm 9 to rotate, meanwhile, it is solid with sliding block 11 Surely the third mechanical arm 13 connected is also with movement, and when third mechanical arm 13 moves on feeding device 5, the first rotary shaft 15 will The rotation of claw 16 is clamped to suitable position, the driving clamping claw 16 of driving motor 17 clamps shuttle 1 by the skewed slot 2 on shuttle 1, It is driven again by the driving of the first rotating electric machine 14, so that third mechanical arm 13 is moved to the suitable position of workspace 4, by shuttle 1 It is put into workspace 4, completes more changing jobs for shuttle 1, the baseline that pattern sewing machine may be implemented so is automatically replaced, and is mentioned significantly High efficiency saves human cost.

The feeding device 5 includes swivel base 18, the fixed column for being used to place shuttle 1 on swivel base 18 19, positioned at the second rotary shaft 20 for being used to that swivel base 18 to be made to rotate of 18 bottom of swivel base and for driving the second rotary shaft Second rotating electric machine 21 of 20 movements, 1 bottom of shuttle are equipped with mounting hole 22, and 22 diameter of mounting hole and fixed column 19 are straight Diameter size is adapted.

By adopting the above technical scheme, the rotation of the second rotary shaft 21 is driven by the second rotating electric machine 20, so that swivel base 18 realize rotation, thus can be after manipulator 7 clamps a shuttle 1, rapidly will be new by rotation swivel base 18 The rotation of shuttle 1 ready for use substantially increases the efficiency of the replacement baseline of the baseline more changing device of pattern sewing machine to station；Together When mounting hole 22 is equipped with due to 1 bottom of shuttle, and be adapted with 19 diameter of fixed column on swivel base 18, therefore, shuttle Son 1 can be fixedly mounted in fixed column 19, be avoided when swivel base 18 rotates, shuttle 1 because centrifugal force be detached from into Expect device 5.

The robot base 8 is equipped with limiting groove 23, and the second mechanical arm 12 is equipped with convex block 24, the convex block 24 width is adapted with the width of limiting groove 23, the shape and second mechanical arm 12 of the limiting groove 23 and the first machinery The motion profile shape of 9 junction of arm is identical.

By being arranged limiting groove 23 in robot base 8, and the shape of limiting groove 23 and second mechanical arm 12 and The motion profile shape of 9 junction of first mechanical arm is identical, can play the role of 7 motion profile of limit mechanical hand in this way, can To guarantee that manipulator 7 moves between workspace 4 and feeding device 5 always.

The limit sliding rail 10 includes slide bar 25 and postive stop baffle 26, limits the postive stop baffle 26 and machinery of 10 one end of sliding rail The connection of 8 hinge of hand pedestal, the sliding block 11 are equipped with through-hole 27, and the diameter of the through-hole 27 is mutually fitted with the diameter of slide bar 25 Match, limit sliding rail 10 is connect by slide bar 25 with sliding block 11.

Since limit sliding rail 10 includes slide bar 25 and postive stop baffle 26, and it is logical in the diameter of slide bar 25 and sliding block 11 The diameter in hole 27 is adapted, it may therefore be assured that the movement of sliding block 11 can be moved with moving slide-bar 25, and sliding block 11 is straight The line direction of motion is identical as the direction of slide bar 25, simultaneously as limit sliding rail 10 is equipped with postive stop baffle 26, it is ensured that sliding block 11 will not skid off slide bar 25, and equipment is avoided to break down.

Claims

1. a kind of more changing device of the baseline for pattern sewing machine, the shuttle including being wound with baseline, shuttle inside hollow out, Shuttle upper surface sets that there are two the skewed slots that extend into shuttle, it is characterised in that: a kind of baseline for pattern sewing machine More changing device further includes the wire-changing device for replacing shuttle and the workspace for placing the shuttle after replacing, the thread-changing dress It sets including the feeding device for providing original shuttle to material-changing device and the clamp device for clamping shuttle, it is described Clamp device includes the manipulator for clamping shuttle, the manipulator include for solid mechanical hand robot base, with The hinged first mechanical arm of robot base, the first mechanical arm are equipped with limit sliding rail, set on the limit sliding rail There is a sliding block, the manipulator further includes that one end is fixedly connected with a slide block and the other end and hinged second machine of robot base Tool arm and the third mechanical arm for being fixed on sliding block, the second mechanical arm are equipped with first for driving second mechanical arm rotation Rotating electric machine, the third mechanical arm is equipped with the first rotary shaft and the first rotary shaft is hinged for clamping shuttle Claw and the driving motor for driving clamping claw movement are clamped, the clamping claw is adapted with the shape size of skewed slot.

2. a kind of more changing device of the baseline for pattern sewing machine described in accordance with the claim 1, it is characterised in that: the charging Device includes swivel base, the fixed column for placing shuttle on swivel base, is used for positioned at swivel base bottom The second rotary shaft for rotating swivel base and the second rotating electric machine for driving the second rotary shaft to move, the shuttle bottom Equipped with mounting hole, the installation bore dia is adapted with fixed column diameter.

3. a kind of more changing device of the baseline for pattern sewing machine described in accordance with the claim 1, it is characterised in that: the machinery Hand pedestal is equipped with limiting groove, and the second mechanical arm is equipped with convex block, the width of the convex block and the width of limiting groove It is adapted, the shape of the limiting groove is identical as the motion profile shape of second mechanical arm and first mechanical arm junction.

4. a kind of more changing device of the baseline for pattern sewing machine described in accordance with the claim 1, it is characterised in that: the machinery Limit sliding rail is additionally provided on hand pedestal, the limit sliding rail includes slide bar and postive stop baffle, limits the postive stop baffle of sliding rail one end It being connect with robot base hinge, the sliding block is equipped with through-hole, and the diameter of the through-hole is adapted with the diameter of slide bar, Limit sliding rail is connect by slide bar with sliding block.