CN209443080U - Magnetron sputtering coating system - Google Patents

Abstract

The utility model provides a kind of magnetron sputtering coating system, room is unreeled including what is be sequentially connected, drying room, preceding transition chamber, coating apparatus, transition chamber and winding room afterwards, unreel room, drying room, preceding transition chamber, coating apparatus, transition chamber and winding room are connected with vaccum-pumping equipment afterwards, unreel room, drying room, preceding transition chamber, coating apparatus, multiple deflector rolls for being used to transport fabric are equipped in transition chamber and winding room afterwards, deflector roll is connected with driving equipment, deflector roll rotates in same direction under the driving of driving equipment, fabric to be transported in winding room by the room of unreeling；Wherein, it is equipped with drying unit in drying room, is equipped with cooling device in preceding transition chamber.The coating system of the utility model is conducive to improve coating effects, and can accommodate higher volume of fabric, is advantageously implemented the high-volume flow line production of fabric.

Description

Magnetron sputtering coating system

Technical field

The utility model relates to fabric coating technique more particularly to a kind of magnetron sputtering coating systems.

Background technique

Vacuum coating is a kind of technology for generating thin-film material, and the atom of Coating Materials or molecule are from surface in vacuum chamber It isolates and gets on the surface of plated object.Vacuum coating generally refers to the method deposition film with physics, mainly there is evaporation Plated film, ion plating and sputter coating.Wherein the magnetron sputtering plating in sputter coating it is good, high-efficient with its film base binding strength, The advantages that pollution-free, is widely used.Magnetron sputtering is to carry out high-speed sputtering at low pressure, it is necessary to effectively improve gas The ionization level of body.By introducing magnetic field in target cathode surface, it is close that plasma is improved to the constraint of charged particle using magnetic field It spends to increase the method for sputtering yield.Its principle is: substrate and target being installed in vacuum chamber, low-pressure state gas is being in Glow discharge in form positive and negative ion and electronics.Target of the positive ion bombardment as cathode, is sputtered out target atom Come, film is formed on substrate, to realize the various functionalization of basis material.In the prior art, magnetron sputtering technology It is mainly used for the plated film of glass, plastic film and other material, is rarely applied to fabric, the technology of fabric magnetron sputtering plating is ground Study carefully less.

Fig. 1 is the structure diagram of magnetron sputtering coater in the prior art；Please refer to Fig. 1.A kind of magnetic control is shown in Fig. 1 Sputter coating machine, can be applied to the magnetron sputtering plating of fabric, and magnetron sputtering coater mainly includes vacuum chamber 1, vacuum chamber 1 Interior to be equipped with film coating roller 2, being respectively arranged on the left side and the right side above film coating roller 2 receives cotton piece buff 3 and puts cotton piece buff 4, is additionally provided in vacuum chamber 1 Multiple directive wheels 5, the lower section of film coating roller 2 are equipped with target cover 6 and template 7, are equipped with multiple sputtering sources, 6 He of target cover in target cover 6 Gap between film coating roller 2 is target sputtering zone, and template 7 is located in the region.When carrying out fabric plated film, it is wrapped in receipts Fabric in cotton piece buff 3 is wrapped on film coating roller 2 after the guidance of directive wheel 5, and the fabric being wrapped on film coating roller 2 is splashed by target When penetrating region, the target particle flux projected out of target cover 6 passes through the hollowed out area of template 7, has to be formed in fabric surface There is the film layer of adding lustre to of certain pattern.

But since fabric has certain wettability power, water content is much larger than glass, plastic film and other material, In the magnetron sputtering process of fabric, excessive moisture will become vapor, and vapor and fabric slurry in weaving process are remaining Ingredient volatilizees or the gases such as the ammonia, the hydrogen that decomposite in conjunction with and fabric surface form separation layer, to hinder sputtering The target particle deposition got off greatly influences the adhesive force of film layer on the fabric that adds lustre in fabric surface.Therefore, the prior art Magnetron sputtering coater coating effects it is poor.In addition, the unreeling of its fabric of the magnetron sputtering coater of the prior art, plated film It is carried out in vacuum chamber 1 with winding, due to being limited by 1 inner space of vacuum chamber, the magnetron sputtering coater of the prior art It is only applicable to the processing of the fabric of small lot, is unfavorable for realizing the high-volume flow line production of fabric.

Utility model content

In order to overcome the drawbacks described above under the prior art, the purpose of this utility model is to provide a kind of magnetron sputtering platings System, the magnetron sputtering coating system of the utility model can be realized the high-volume flow line production of fabric, and have preferable Coating effects.

The utility model provides a kind of magnetron sputtering coating system, unreels room, drying room, preceding transition including what is be sequentially connected Room, coating apparatus, rear transition chamber and winding room, it is described to unreel room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and receipts Volume room is connected with vaccum-pumping equipment, described to unreel in room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and winding room Multiple deflector rolls for being used to transport fabric are equipped with, the deflector roll is connected with driving equipment, and the deflector roll is in the driving equipment It is rotated in same direction under driving, the fabric is transported in the winding room by the room of unreeling；Wherein, the baking It is equipped with drying unit in dry chamber, is equipped with cooling device in the preceding transition chamber.

Magnetron sputtering coating system as described above, optionally, the deflector roll include drive roll and driven voller, the drying At least one described drive roll is equipped in room, preceding transition chamber, coating apparatus and rear transition chamber, the drive roll connects the drive Dynamic equipment.

Magnetron sputtering coating system as described above, optionally, described to unreel equipped with cotton piece buff is put in room, the cotton piece buff of putting connects Connect the driving equipment.

Magnetron sputtering coating system as described above, optionally, indoor be equipped with of the winding receive cotton piece buff, and the receipts cotton piece buff connects Connect the driving equipment.

Magnetron sputtering coating system as described above, optionally, the drying unit are ultra redray drier and/or microwave Drying unit.

The bottom of the preceding transition chamber is arranged in magnetron sputtering coating system as described above, optionally, the cooling device Portion, the cooling device include a plurality of cooling tube interconnected.

Magnetron sputtering coating system as described above, optionally, the coating apparatus include multiple coating chambers, adjacent institute It states and is additionally provided with load lock between coating chamber, the load lock is connected with the vaccum-pumping equipment.

Magnetron sputtering coating system as described above is optionally additionally provided with film coating roller, the film coating roller in the coating chamber Lower section be equipped with multiple sputtering sources, circumferential direction equidistantly distributed of multiple sputtering sources along the film coating roller.

Magnetron sputtering coating system as described above is optionally equipped with sputtering source baffle between the adjacent sputtering source, The gap passed through for the fabric is formed between the sputtering source baffle and the film coating roller.

Magnetron sputtering coating system as described above is optionally additionally provided with horizontal baffle, the level in the coating chamber The gap passed through for the fabric is formed between partition and the film coating roller, the coating chamber is divided into biography by the horizontal baffle Room and sputtering chamber are sent, the transfer chamber is located at the top of the sputtering chamber, and the indoor deflector roll of plated film is arranged in the transmission Interior, the sputtering source are located in the sputtering chamber.

Magnetron sputtering coating system provided by the utility model unreels room, drying room, preceding transition including what is be sequentially connected Room, coating apparatus, rear transition chamber and winding room unreel room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and winding room Be connected with vaccum-pumping equipment, unreel room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and winding room in be equipped with it is more A deflector roll for being used to transport fabric, deflector roll are connected with driving equipment, and deflector roll turns in same direction under the driving of driving equipment It is dynamic, fabric is transported in winding room by the room of unreeling；Wherein, it is equipped with drying unit in drying room, is equipped in preceding transition chamber cold But device.Magnetron sputtering coater compared with the prior art, the utility model pass through setting drying room and preceding transition chamber, drying Interior is equipped with drying unit, is equipped with cooling device in preceding transition chamber, so as to utilize drying unit by water extra in fabric Point drying, and the moisture for remaining in fabric surface after using cooling device drying room being dried liquefies rapidly solidification, and from The surface of fabric is dripped, and then is prevented and formed the risk of separation layer on surface since fabric gets damp again, and is conducive to improve plated film Effect.In addition, unreeling room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and winding room by what setting was sequentially connected So that the unreeling of fabric, plated film and winding carry out in different chambers, magnetron sputtering coating system is accommodated bigger The fabric of volume is advantageously implemented the high-volume flow line production of fabric.

Detailed description of the invention

In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is Some embodiments of the utility model, for those of ordinary skill in the art, without creative efforts, It is also possible to obtain other drawings based on these drawings.

Fig. 1 is the structure diagram of magnetron sputtering coater in the prior art；

Fig. 2 is the structure diagram for the magnetron sputtering coating system that an embodiment of the present invention provides；

Fig. 3 is the structure diagram for the magnetron sputtering transition chamber that an embodiment of the present invention provides；

Fig. 4 is the structure diagram for the magnetron sputtering coating system that another embodiment of the utility model provides；

Fig. 5 is the structure diagram for the magnetron sputtering transition chamber that another embodiment of the utility model provides；

Fig. 6 is the local structural graph for the magnetic control sputtering film plating device that an embodiment of the present invention provides.

Appended drawing reference:

1- vacuum chamber；2- film coating roller；

3- receives cotton piece buff；4- puts cotton piece buff；

5- directive wheel；6- target cover；

7- template；110- unreels room；

111- puts cotton piece buff；120- drying room；

121- drying unit；Transition chamber before 130-；

131- cooling device；132- shell；

133- fabric inlet；134- fabric outlet；

135- vertical baffle；136- through-hole；

137- protection board；140- coating apparatus；

141- coating chamber；142- load lock；

143- shell；144- fabric inlet；

145- fabric outlet；146- film coating roller；

147- sputtering source；148- sputtering source baffle；

149- horizontal baffle；Transition chamber after 150-；

160- winds room；161- receives cotton piece buff；

170- deflector roll；210- unreels room；

211- drying unit；212- puts cotton piece buff；

Transition chamber before 220-；The pre- transition chamber of 221-；

222- vacuum transition chamber；223- cooling device；

224- fabric inlet；225- fabric outlet；

226- vertical baffle；227- through-hole；

228- protection board；Transition chamber after 230-；

240- winds room；241- receives cotton piece buff.

Specific embodiment

It is practical new below in conjunction with this to keep the objectives, technical solutions, and advantages of the embodiments of the present invention clearer Attached drawing in type embodiment, the technical scheme in the utility model embodiment is clearly and completely described, it is clear that is retouched The embodiment stated is the utility model a part of the embodiment, instead of all the embodiments.

Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work Every other embodiment obtained, fall within the protection scope of the utility model.In the absence of conflict, following implementation Feature in example and embodiment can be combined with each other.

In the description of the present invention, it should be understood that term " center ", " longitudinal direction ", " transverse direction ", " length ", " width Degree ", " thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside", The orientation or positional relationship of the instructions such as " clockwise ", " counterclockwise ", " axial direction ", " radial direction ", " circumferential direction " is based on the figure Orientation or positional relationship is merely for convenience of describing the present invention and simplifying the description, rather than the dress of indication or suggestion meaning It sets or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to the utility model Limitation.

In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " Gu It is fixed " etc. terms shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be It is connected directly, the mutual of connection inside two elements or two elements can also be can be indirectly connected through an intermediary Interactively.For the ordinary skill in the art, it can understand that above-mentioned term is practical new at this as the case may be Concrete meaning in type.

It should be noted that term " first ", " second " are only used for facilitating description different in the description of the present invention, Component, be not understood to indicate or imply ordinal relation, relative importance or implicitly indicate indicated technical characteristic Quantity." first " is defined as a result, the feature of " second " can explicitly or implicitly include at least one of the features.

It is described below in conjunction with the detailed content to the utility model of attached drawing, so that those skilled in the art can The more detailed content for understanding the utility model.

Embodiment one

Fig. 2 is the structure diagram for the magnetron sputtering coating system that one embodiment of the present embodiment provides；Referring to figure 2..This reality It applies example and a kind of magnetron sputtering coating system is provided, unreel room 110, drying room 120, preceding transition chamber 130, plating including what is be sequentially connected Film device 140, rear transition chamber 150 and winding room 160, unreel room 110, drying room 120, preceding transition chamber 130, coating apparatus 140, Transition chamber 150 and winding room 160 are connected with vaccum-pumping equipment afterwards, unreel room 110, drying room 120, preceding transition chamber 130, plated film It is equipped in device 140, rear transition chamber 150 and winding room 160 multiple for transporting the deflector roll 170 of fabric, deflector roll 170 and driving Equipment is connected, and deflector roll 170 rotates in same direction under the driving of driving equipment, and fabric is transported to by unreeling Room 110 It winds in room 160；Wherein, it is equipped with drying unit 121 in drying room 120, is equipped with cooling device 131 in preceding transition chamber 130.

Specifically, its in the magnetron sputtering coating system of the present embodiment unreel room 110, drying room 120, preceding transition chamber 130, Coating apparatus 140, rear transition chamber 150 and winding room 160 are connected with vaccum-pumping equipment, i.e., whole system operates in vacuum environment Under, it unreels room 110 and is equipped with the opening being put into for fabric, fabric is put into after unreeling room 110 and closes opening, make whole system It is isolated with ambient atmosphere, opens vaccum-pumping equipment and internal system is extracted into the sputtering plating for carrying out fabric after preset vacuum degree again Film, system moment during sputter coating keep vacuum state, can effectively guarantee the quality of plated film.

When the present embodiment is in use, it is put into and unreels the fabric in room 110 and turn in same direction under the driving of deflector roll 170 It is dynamic, fabric is transported in winding room 160 by unreeling Room 110.In the process, drying room 120 can will be extra in fabric Moisture drying；Preceding transition chamber 130 can liquefy rapidly the moisture for remaining in fabric surface solidification, and drip from the surface of fabric It falls, and then prevents and form the risk of separation layer on surface since fabric gets damp again；Coating apparatus 140 can plate fabric Film operation；Transition chamber 150 can make fabric disperse the heat accumulated in coating process afterwards；It is received for collecting fabric winding room 160 After collection by the air pressure wound in room 160 be down to it is identical as ambient atmosphere after open the outlet that is disposed thereon again for fabric It takes out, to complete a production operation.Due to the unreeling of the present embodiment, plated film and winding in different chambers into Row, and the overall space volume of system is significantly increased compared with the prior art, to realize the high-volume flow line production of fabric.

Magnetron sputtering coating system provided in this embodiment unreels room 110, drying room 120, preceding mistake including what is be sequentially connected Room 130, coating apparatus 140, rear transition chamber 150 and winding room 160 are crossed, room 110, drying room 120, preceding transition chamber 130, plating are unreeled Film device 140, rear transition chamber 150 and winding room 160 are connected with vaccum-pumping equipment, unreel room 110, drying room 120, preceding transition Multiple deflector rolls 170 for being used to transport fabric are equipped in room 130, coating apparatus 140, rear transition chamber 150 and winding room 160, are led Roller 170 is connected with driving equipment, and deflector roll 170 rotates in same direction under the driving of driving equipment, by fabric by unreeling Room 110 are transported in winding room 160；Wherein, it is equipped with drying unit 121 in drying room 120, is equipped with cooling in preceding transition chamber 130 Device 131.Magnetron sputtering coater compared with the prior art, the present embodiment pass through setting drying room 120 and preceding transition chamber 130, drying room 120 is interior to be equipped with drying unit 121, cooling device is equipped in preceding transition chamber 130, so as to utilize drying unit 121 dry moisture extra in fabric, and remain in fabric table after using cooling device 131 drying room 120 being dried The moisture in face liquefies rapidly solidification, and drips from the surface of fabric, so prevent due to fabric gets damp again and surface formed every The risk of absciss layer is conducive to improve coating effects.In addition, unreeling room 110, drying room 120, preceding mistake by what setting was sequentially connected It crosses room 130, coating apparatus 140, rear transition chamber 150 and winding room 160 and makes that the unreeling of fabric, plated film and winding are in different chambers Indoor progress, allows magnetron sputtering coating system to accommodate higher volume of fabric, is advantageously implemented the high-volume stream of fabric Waterline production.

Further, in this embodiment deflector roll 170 include drive roll and driven voller, drying room 110, preceding transition chamber 120, At least one drive roll is equipped in coating apparatus 130 and rear transition chamber 140, drive roll connects driving equipment.It unreels in room 110 Equipped with cotton piece buff 111 is put, puts cotton piece buff 111 and connect driving equipment.It winds to be equipped in room 160 and receives cotton piece buff 161, receive the connection of cotton piece buff 161 and drive Dynamic equipment.What the present embodiment made to be connected with driving equipment under the driving of driving equipment puts cotton piece buff 111, drive roll and receives cotton piece buff 161 rotate in the same direction, to drive the movement of fabric and driven voller, realize the transport of fabric.Fabric is in transmission process Tensile requirements choose suitable cornerite angle and arrange deflector roll 170, driving equipment may include multiple driving motors, and a driving The frequency of motor can be selected as needed.

Further, in this embodiment drying unit 121 be ultra redray drier and/or drying device by microwaves.Due to The present embodiment is run under vacuum conditions, and therefore vacuum non-conducting thermal energy needs the heat with radiation forms under vacuum conditions Heat object.For fabric, burning point is very low, and the easier radiation forms of Ying Caiyong energy hole are heated.This reality Apply in example and heated using ultra redray drier and/or drying device by microwaves, ultra redray drier can for infrared radiation lamp, Infra-red radiation lamp group or infra-red radiation lamp box etc..In addition, drying device by microwaves can remove the gas and moisture of fabric, make The water content of fabric reduces, and its heating process is short, high-efficient, saves cost.Since selectivity of the microwave to hydrone heats, Usual fabric is aqueous more, and when heating from inside to outside, and internal-external temperature difference consistent with moisture content dispersal direction is small, is not in The irregular phenomenon of conventional drying heat distribution, therefore ultra redray drier and drying device by microwaves are combined and carry out drying its effect more It is good.

Fig. 3 is the structure diagram for the magnetron sputtering transition chamber that an embodiment of the present invention provides；Referring to figure 3..This reality The magnetron sputtering transition chamber of mode is applied as the preceding transition chamber 130 in above-mentioned magnetron sputtering coating system, magnetron sputtering transition chamber packet Shell 132 is included, fabric inlet 133 and fabric outlet 134, the inside of shell 132 are respectively equipped on the opposite two sidewalls of shell 132 It is connected with vaccum-pumping equipment, the inside of shell 132 is equipped with multiple deflector rolls 170, and deflector roll 170 is connected with driving equipment, sets in driving Multiple deflector rolls 170 rotate in same direction under standby driving, and fabric is transported to fabric outlet by fabric inlet 133 134, the inside of shell 132 is additionally provided with cooling device 131.

Magnetron sputtering transition chamber provided in this embodiment is arranged between drying room 120 and coating apparatus 140, including shell Body 132 is respectively equipped with fabric inlet 133 and fabric outlet 134, the inside of shell 132 and pumping on the opposite two sidewalls of shell 132 Vacuum equipment is connected, and the inside of shell 132 is equipped with multiple deflector rolls 170, and deflector roll 170 is connected with driving equipment, in driving equipment Multiple deflector rolls 170 rotate in same direction under driving, and fabric is transported to fabric outlet 134, shell by fabric inlet 133 The inside of body 132 is additionally provided with cooling device 131.The present embodiment in transition chamber by being arranged cooling device 131, so that fabric passes through Temperature can be rapidly reduced when crossing transition chamber, so that drying room 120 remains in fabric surface moisture after drying is fast Speed liquefaction solidification, and dripped from the surface of fabric, and then prevent and form the risk of separation layer on surface since fabric gets damp again, Be conducive to improve coating effects.

Further, in this embodiment cooling device 131 can be selected as water cooling plant, certain those skilled in the art can also With the cooling device for selecting other suitable as needed, the present embodiment does not further limit this.

Further, in this embodiment cooling device 131 be arranged on the bottom wall of shell 132, cooling device 131 includes The more cooling water pipes being serially connected, the entrance and exit of cooling water pipe are connected with external refrigeration device, to realize cooling water Recycle.

Further, a drive roll, drive roll and driving equipment phase are included at least in multiple deflector rolls 170 of the present embodiment Even, under the driving of driving equipment, drive roll is rotated in the same direction by fabric drive driven voller, thus by driven voller from knitting Object entrance 133 is transported to fabric outlet 134.

Wherein, which is chosen as common equipment under the prior arts such as driving motor.

Further, multiple vertical baffles 135, multiple vertical baffles are additionally provided in the magnetron sputtering transition chamber of the present embodiment Magnetron sputtering transition chamber is divided into multiple chambers by 135, by multiple chambers on drying room 120 to the direction of coating apparatus 140 Vacuum degree increases step by step, and multiple chambers can be connected with vaccum-pumping equipment, so that the pumpdown time substantially reduces, section Save the production time.Using vacuum degree, the stability of coating apparatus 140 can also be effectively protected in raised chamber step by step.

Further, in this embodiment being equipped with the through-hole 136 passed through for fabric, fabric inlet on vertical baffle 135 133, the size of fabric outlet 134 and through-hole 136 is slightly larger than the thickness of fabric, as long as can satisfy fabric normal through i.e. Can, and it is the smaller the better, to effectively increase air flow resistance, reduces vacuum degree in adjacent chamber and influence each other.It is optional at one In embodiment, the size of fabric inlet 133, fabric outlet 134 and through-hole 136 is all larger than fabric thickness 1-5mm, certainly, this Field technical staff is clear that above-mentioned size can be determined according to actual needs.

Further, through-hole 136 is horizontally disposed or is obliquely installed, and the height of adjacent through-hole 136 is different.It is obliquely installed Through-hole 136 and the difference in height of two neighboring through-hole 136 can further increase flow resistance, reduce the influence between adjacent chamber.

Further, the top of fabric inlet 133, fabric outlet 134 and through-hole 136 is additionally provided with protection board 137, protection board 137 are articulated and connected with shell 132, and the rotation of protection board 137 can block fabric inlet 133, fabric outlet 134 or through-hole 136 On, under vacuum conditions, protection board 137 is horizontally disposed, and when adjacent chamber breaks down, vacuum degree is drastically reduced, at this point, protecting The vacuum degree of 137 place chamber of backplate changes, and protection board 137 lands, and is rotated by 90 ° and blocks above-mentioned aperture, to protect and be Subsequent chamber of uniting is without damage.

Embodiment two

Fig. 4 is the structure diagram for the magnetron sputtering coating system that another embodiment of the utility model provides；Fig. 5 is that this is practical The structure diagram for the magnetron sputtering transition chamber that novel another embodiment provides；- Fig. 5 referring to figure 4..The present embodiment provides a kind of magnetic Sputter coating system is controlled, unreels room 210, preceding transition chamber 220, coating apparatus 140,230 and of rear transition chamber including what is be sequentially connected Room 240 is wound, room 210 is unreeled and winds room 240 and atmosphere, preceding transition chamber 220, coating apparatus 140 and rear transition chamber 230 are connected with vaccum-pumping equipment, unreel room 210, preceding transition chamber 220, coating apparatus 140, rear transition chamber 230 and winding room Multiple deflector rolls 170 for being used to transport fabric are equipped in 240, deflector roll 170 is connected with driving equipment, and deflector roll 170 is in driving equipment Driving under rotate in same direction, by fabric by unreel room 210 be transported to winding room 240 in；Wherein, room 210 is unreeled Interior to be equipped with drying unit 211, preceding transition chamber 220 includes the pre- transition chamber 221 and vacuum transition chamber 222 to connect, pre- transition chamber 221 are connected with room 210 is unreeled, and vacuum transition chamber 222 is connected with coating apparatus 140, and cooling device is equipped in vacuum transition chamber 222 223。

Specifically, room 210 and winding room 240 are unreeled and atmosphere in the present embodiment, so as to realize just Work is unreeled and wound under normal atmospheric pressure to system, and then the assembly line for realizing fabric is produced in enormous quantities, so that this The system of embodiment can be used in the plated film of the fabric of random length.

The preceding transition chamber 220 of the present embodiment includes the pre- transition chamber 221 and vacuum transition chamber 222 to connect, pre- transition chamber 221 can be gradually decrease to the vacuum degree of system preset value, guarantee that vacuum transition chamber 222 and coating apparatus 140 operate in very Under dummy status.When the present embodiment is in use, it is put into and unreels the fabric in room 210 under the driving of deflector roll 170 in same direction Fabric is transported in winding room 240 by movement by unreeling Room 210.In the process, drying unit 211 can will be in fabric Extra moisture drying；The water that preceding transition chamber 220 can be such that fabric progresses under vacuum environment, and will remain in fabric surface Divide liquefaction solidification rapidly, and dripped from the surface of fabric, and then prevents due to fabric resurgence and form separation layer on surface Risk；Coating apparatus 140 can carry out plated film operation to fabric；Transition chamber 230 can make fabric disperse product in coating process afterwards Tired heat；Winding room 240 is for collecting fabric, to complete a production operation.Due to the unreeling of the present embodiment, plated film and Winding is carrying out in different chambers, and the overall space volume of system is significantly increased compared with the prior art, to realize The high-volume flow line production of fabric.

Magnetron sputtering coating system provided in this embodiment unreels room 210, preceding transition chamber 220, plating including what is be sequentially connected Film device 140, rear transition chamber 230 and winding room 240, unreel room 210 and wind room 240 and atmosphere, preceding transition chamber 220, coating apparatus 140 and rear transition chamber 230 are connected with vaccum-pumping equipment, unreel room 210, preceding transition chamber 220, coating apparatus 140, multiple deflector rolls 170 for being used to transport fabric, deflector roll 170 and driving equipment are equipped in rear transition chamber 230 and winding room 240 It is connected, deflector roll 170 rotates in same direction under the driving of driving equipment, and fabric is transported to winding by unreeling room 210 In room 240；Wherein, it unreels and is equipped with drying unit 211 in room 210, preceding transition chamber 220 includes 221 He of pre- transition chamber to connect Vacuum transition chamber 222, pre- transition chamber 221 are connected with room 210 is unreeled, and vacuum transition chamber 222 is connected with coating apparatus 140, vacuum Cooling device 223 is equipped in transition chamber 222.Magnetron sputtering coater compared with the prior art, the present embodiment is by unreeling Drying unit 221 is set in room 210, cooling device 223 is set in vacuum transition chamber 222, so as to utilize drying unit 221 dry moisture extra in fabric, and make the moisture for remaining in fabric surface after drying fast using cooling device 223 Speed liquefaction solidification, and dripped from the surface of fabric, and then prevent and form the risk of separation layer on surface since fabric gets damp again, Be conducive to improve coating effects.In addition, by setting be sequentially connected unreel room 210, preceding transition chamber 220, coating apparatus 140, Transition chamber 230 and winding room 240 make that the unreeling of fabric, plated film and winding carry out in different chambers afterwards, so that magnetic control splashes Higher volume of fabric can be accommodated by penetrating coating system, be advantageously implemented the high-volume flow line production of fabric.The present embodiment Unreel room 210 and winding room 240 and atmosphere, the investment of fabric and taking out carries out under atmospheric environment, not by vacuum The influence of degree, so as to realize high-volume continuous production of the fabric under atmospheric condition.

Further, in this embodiment deflector roll 170 include drive roll and driven voller, preceding transition chamber 220, coating apparatus 140 and rear transition chamber 230 in be equipped at least one drive roll, drive roll connects driving equipment.It unreels to be equipped in room 210 and puts cloth Wheel 212 puts cotton piece buff 212 and connects driving equipment.It winds to be equipped in room 240 and receives cotton piece buff 241, receive cotton piece buff 241 and connect driving equipment.This What embodiment made to be connected with driving equipment under the driving of driving equipment puts cotton piece buff 212, drive roll and receives cotton piece buff 241 along same Direction rotation, to drive the movement of fabric and driven voller, realizes the transport of fabric.Tensile requirements of the fabric in transmission process Choose suitable cornerite angle arrangement deflector roll 170, driving equipment may include multiple driving motors, and the frequency of a driving motor It can be selected as needed.

Further, in this embodiment drying unit 211 be ultra redray drier and/or drying device by microwaves.Due to The present embodiment is run under vacuum conditions, and therefore vacuum non-conducting thermal energy needs the heat with radiation forms under vacuum conditions Heat object.For fabric, burning point is very low, and the easier radiation forms of Ying Caiyong energy hole are heated.This reality Apply in example and heated using ultra redray drier and/or drying device by microwaves, ultra redray drier can for infrared radiation lamp, Infra-red radiation lamp group or infra-red radiation lamp box etc..In addition, drying device by microwaves can remove the gas and moisture of fabric, make The water content of fabric reduces, and its heating process is short, high-efficient, saves cost.Since selectivity of the microwave to hydrone heats, Usual fabric is aqueous more, and when heating from inside to outside, and internal-external temperature difference consistent with moisture content dispersal direction is small, is not in The irregular phenomenon of conventional drying heat distribution, therefore ultra redray drier and drying device by microwaves are combined and carry out drying its effect more It is good.

Below please continue to refer to Fig. 5, the magnetron sputtering transition chamber of present embodiment is in above-mentioned magnetron sputtering coating system Preceding transition chamber 220, magnetron sputtering transition chamber includes pre- transition chamber 221 and vacuum transition chamber 222 interconnected, pre- transition chamber 221 are connected with room 210 is unreeled, and vacuum transition chamber 222 is connected with coating apparatus 140, pre- transition chamber 221 and vacuum transition chamber 222 On be respectively equipped with fabric inlet 224 and fabric outlet 225, pre- transition chamber 221 and vacuum transition chamber 222 with vaccum-pumping equipment phase Even, multiple deflector rolls 170 are equipped in pre- transition chamber 221 and vacuum transition chamber 222, deflector roll 170 is connected with driving equipment, is driving Multiple deflector rolls 170 rotate in same direction under the driving of equipment, and fabric is transported to fabric outlet by fabric inlet 224 225, cooling device 223 is additionally provided in vacuum transition chamber 222.

Magnetron sputtering transition chamber setting provided in this embodiment is unreeling between room 210 and coating apparatus 140, is connected with each other Pre- transition chamber 221 and vacuum transition chamber 222, pre- transition chamber 221 is connected with room 210 is unreeled, and vacuum transition chamber 222 and plated film fill It sets 140 to be connected, fabric inlet 224 and fabric outlet 225, pre- transition is respectively equipped on pre- transition chamber 221 and vacuum transition chamber 222 Room 221 and vacuum transition chamber 222 are connected with vaccum-pumping equipment, are equipped in pre- transition chamber 221 and vacuum transition chamber 222 multiple Deflector roll 170, deflector roll 170 are connected with driving equipment, and multiple deflector rolls 170 turn in same direction under the driving of driving equipment It is dynamic, fabric is transported to fabric outlet 225 by fabric inlet 224, cooling device 223 is additionally provided in vacuum transition chamber 222.This Embodiment enables fabric fast when passing through vacuum transition chamber 222 by the way that cooling device 223 is arranged in vacuum transition chamber 222 The reduction temperature of speed, the solidification so that moisture for remaining in fabric surface after drying liquefies rapidly, and from the surface of fabric Drippage, and then prevent and form the risk of separation layer on surface since fabric gets damp again, be conducive to improve coating effects；Furthermore originally Embodiment by the pre- transition chamber 221 that is connected with vaccum-pumping equipment of setting by the vacuum degree reduction of system so that fabric gradually into Enter in vacuum environment, to reach the environmental requirement of plated film.

Further, in this embodiment cooling device 223 can be selected as water cooling plant, certain those skilled in the art can also With the cooling device for selecting other suitable as needed, the present embodiment does not further limit this.

Further, in this embodiment cooling device 223 bottom of vacuum transition chamber 222, cooling device 223 are set The cooling water pipe being serially connected including more, the entrance and exit of cooling water pipe are connected with external refrigeration device, cold to realize But water recycles.

Further, a drive roll, drive roll and driving equipment phase are included at least in multiple deflector rolls 170 of the present embodiment Even, under the driving of driving equipment, drive roll is rotated in the same direction by fabric drive driven voller, thus by driven voller from knitting Object entrance 224 is transported to fabric outlet 225.

Wherein, which is chosen as common equipment under the prior arts such as driving motor.

Further, multiple vertical baffles 226 are additionally provided in the pre- transition chamber 221 and vacuum transition chamber 222 of the present embodiment, Pre- transition chamber 221 and vacuum transition chamber 222 are divided into multiple chambers by multiple vertical baffles 226, by unreeling room 210 to coating apparatus Vacuum degree on 140 direction in multiple chambers increases step by step, and multiple chambers can be connected with vaccum-pumping equipment, so as to so that It must substantially reduce in pumpdown time, save the production time.Using vacuum degree, plating can also be effectively protected in raised chamber step by step The stability of film device 140.

Further, in this embodiment vertical baffle 226 on be equipped with the through-hole 227 passed through for fabric, fabric inlet 224, the size of fabric outlet 225 and through-hole 227 is slightly larger than the thickness of fabric, as long as can satisfy fabric normal through i.e. Can, and it is the smaller the better, to effectively increase air flow resistance, reduces vacuum degree in adjacent chamber and influence each other.It is optional at one In embodiment, the size of fabric inlet 224, fabric outlet 225 and through-hole 227 is all larger than fabric thickness 1-5mm, certainly, this Field technical staff is clear that above-mentioned size can be determined according to actual needs.

Further, through-hole 227 is horizontally disposed or is obliquely installed, and the height of adjacent through-hole 227 is different.It is obliquely installed Through-hole 227 and the difference in height of two neighboring through-hole 227 can further increase flow resistance, reduce the influence between adjacent chamber.

Further, the top of the through-hole 227 in vacuum transition chamber 222 is additionally provided with protection board 228, protection board 228 Rotation with the side walls hinged connection of vacuum transition chamber 222, protection board 228 can block through-hole 227, under vacuum conditions, Protection board 228 is horizontally disposed, and when adjacent chamber breaks down, vacuum degree is drastically reduced, at this point, 228 place chamber of protection board Vacuum degree change, protection board 228 land, be rotated by 90 ° and block above-mentioned aperture, thus protect the subsequent chamber of system not by Damage.

Embodiment three

Fig. 6 is the local structural graph for the magnetic control sputtering film plating device that an embodiment of the present invention provides；Please refer to Fig. 6. Magnetic control sputtering film plating device 140 provided in this embodiment can be applied to magnetron sputtering described in above-described embodiment one or embodiment two In coating system, magnetic control sputtering film plating device 140 includes multiple magnetron sputtering plating rooms 141, adjacent magnetron sputtering plating room Load lock 142 is equipped between 141, load lock 142 connects vaccum-pumping equipment, is equipped in load lock 142 multiple Deflector roll 170 includes at least a drive roll in multiple deflector rolls 170, and drive roll is connected with driving equipment, to drive fabric to transport forward It is dynamic.Load lock 142 can effectively prevent collaborating between adjacent coating chamber 141.

Further, 142 surface of load lock of the present embodiment is equipped with watch window, and load lock is also connected with prison Examining system, monitoring system include the sensor being arranged in vacuum insulation room, sensor and ppu communication connection.Sensing Device may include temperature sensor and pressure sensor, and staff is according to the temperature and pressure bonded fabric surface monitored Plated film situation can real-time adjusting process parameter.

The magnetron sputtering plating room 141 of the present embodiment, including shell 143, shell 143 are respectively equipped on opposite two sidewalls Fabric inlet 144 and fabric outlet 145, the inside of shell 143 are connected with vaccum-pumping equipment, and the inside of shell 143 is equipped with plated film Roller 146 and multiple deflector rolls 170, film coating roller 146 and deflector roll 170 are connected with driving equipment, the plated film under the driving of driving equipment Roller 146 and multiple deflector rolls 170 rotate in same direction, and fabric is transported to fabric outlet 145 by fabric inlet 144； The lower section of film coating roller 146 is additionally provided with multiple sputtering sources 147, and plating intermembrane space is formed between multiple sputtering sources 147 and film coating roller 146, It is equipped with sputtering source baffle 148 between adjacent sputtering source 147, is formed between sputtering source baffle 148 and film coating roller 146 for fabric By gap.

Magnetic control sputtering film plating device provided in this embodiment, coating chamber 141 include shell 143, shell 143 it is opposite two Fabric inlet 144 and fabric outlet 145 are respectively equipped on side wall, the inside of shell 143 is connected with vaccum-pumping equipment, shell 143 Inside be equipped with film coating roller 146 and multiple deflector rolls 170, film coating roller 146 and deflector roll 170 are connected with driving equipment, set in driving Film coating roller 146 and multiple deflector rolls 170 rotate in same direction under standby driving, and fabric is transported by fabric inlet 144 To fabric outlet 145；The lower section of film coating roller 146 is additionally provided with multiple sputtering sources 147, between multiple sputtering sources 147 and film coating roller 146 Form plating intermembrane space, be equipped with sputtering source baffle 148 between adjacent sputtering source 147, sputtering source baffle 148 and film coating roller 146 it Between be formed with the gap passed through for fabric.The present embodiment is by being arranged sputtering source baffle 148 between adjacent sputtering source 147 to disappear Except adjacent sputtering source 147 influencing each other in sputtering, so that the thickness of fabric film plating layer is more uniform；The plated film of the present embodiment Room 141 is equipped with fabric inlet 144 and fabric outlet 145, and fabric only carries out plated film operation in coating chamber, can be more by connecting The form of a coating chamber 141 realizes the high-volume flow line production of fabric plated film.

Further, in this embodiment multiple deflector rolls 170 in include at least a drive roll, drive roll and film coating roller 146 are connected with driving equipment.

Further, in this embodiment sputtering source 147 along film coating roller 146 circumferential direction spaced set.Sputter Source 147 is equal to the distance between film coating roller 146, thus the distance phase for passing through target particle when sputtering in each sputtering source Deng the quality of film plating layer has been effectively ensured.

Further, the target in the present embodiment in multiple sputtering sources 147 is identical or different.I.e. multiple sputtering sources 147 In target can according to need and be arranged to identical target, different targets also can be set into, the present embodiment does not do this It further limits.The present embodiment is not also defined the quantity of sputtering source 147 simultaneously, in an optional embodiment, The quantity of sputtering source 147 is 4-6.

Optionally, it is additionally provided with the cooling system of connection film coating roller 146 and multiple sputtering sources 147, cooling system can be water Cooling system guarantees being normally carried out for plated film operation, using between film coating roller for cooling down for sputtering source 147 and film coating roller 146 It is connected in fabric cooling, avoids fabric temperature excessively high and coking.

Further, it is additionally provided with horizontal baffle 149 inside shell 143, one end of horizontal baffle 149 is interior with shell 143 Wall is fixedly connected, and is formed with the gap passed through for fabric between the other end and film coating roller 146, and horizontal baffle 149 is by shell 143 Inside is divided into transfer chamber and sputtering chamber, and transfer chamber is located at the top of sputtering chamber, and multiple deflector rolls 170 are located in transfer chamber, multiple to splash Source 147 is penetrated to be located in sputtering chamber.The inside of shell 143 is divided into transfer chamber and sputtering chamber, transfer chamber and sputtering by horizontal baffle 149 Room can be all connected with vaccum-pumping equipment.Transfer chamber can play the role of load lock, can be effectively reduced the diffusion of gas, Vacuum degree is kept, the speed of evacuation of 147 region of sputtering source can be also accelerated, saves pumpdown time, reduces pumping and production Cost.

Further, the gap between fabric inlet 144, fabric outlet 145, sputtering source baffle 148 and film coating roller 146 and Gap between horizontal baffle 149 and film coating roller 146 is slightly larger than the thickness of fabric, if can satisfy fabric normal through , and it is the smaller the better, to effectively increase flow resistance, the diffusion of gas is reduced, avoids collaborating, more conducively magnetron sputtering plating And the maintenance of vacuum degree.In an optional embodiment, fabric inlet 144, fabric outlet 145, sputtering source baffle 148 with Gap between gap between film coating roller 146 and horizontal baffle 149 and film coating roller 146 is all larger than fabric thickness 1-5mm, when So, it is clear to the skilled person that above-mentioned size can be determined according to actual needs.

Finally, it should be noted that the above various embodiments is only to illustrate the technical solution of the utility model, rather than it is limited System；Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should Understand: it is still possible to modify the technical solutions described in the foregoing embodiments, or to some or all of Technical characteristic is equivalently replaced；And these are modified or replaceed, it does not separate the essence of the corresponding technical solution, and this is practical new The range of each embodiment technical solution of type.

Claims (10)

1. a kind of magnetron sputtering coating system, which is characterized in that unreel room, drying room, preceding transition chamber, plating including what is be sequentially connected Film device, rear transition chamber and winding room, it is described to unreel room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and winding room It is connected with vaccum-pumping equipment, described unreel is all provided in room, drying room, preceding transition chamber, coating apparatus, rear transition chamber and winding room There are multiple deflector rolls for being used to transport fabric, the deflector roll is connected with driving equipment, driving lower edge of the fabric in the deflector roll Identical direction rotation, the fabric is transported in the winding room by the room of unreeling；Wherein, it is set in the drying room There is drying unit, is equipped with cooling device in the preceding transition chamber, the bottom of the preceding transition chamber, institute is arranged in the cooling device Stating coating apparatus includes multiple coating chambers, and load lock, the load lock are additionally provided between the adjacent coating chamber It is connected with the vaccum-pumping equipment.

2. magnetron sputtering coating system according to claim 1, which is characterized in that the deflector roll includes drive roll and driven Roller is equipped at least one described drive roll, the active in the drying room, preceding transition chamber, coating apparatus and rear transition chamber Roller connects the driving equipment.

3. magnetron sputtering coating system according to claim 1, which is characterized in that it is described unreel in room be equipped with put cotton piece buff, The cotton piece buff of putting connects the driving equipment.

4. magnetron sputtering coating system according to claim 1, which is characterized in that indoor be equipped with of the winding receives cotton piece buff, The receipts cotton piece buff connects the driving equipment.

5. magnetron sputtering coating system according to claim 1, which is characterized in that the drying unit is infrared drying dress It sets and/or drying device by microwaves.

6. magnetron sputtering coating system according to claim 1, which is characterized in that the cooling device includes a plurality of mutual The cooling tube of connection.

7. magnetron sputtering coating system according to claim 1, which is characterized in that the vacuum insulation chamber surface, which is equipped with, to be seen Window is examined, the load lock is also connected with monitoring system, and the monitoring system includes the biography being arranged in vacuum insulation room Sensor, the sensor and ppu communication connection.

8. magnetron sputtering coating system according to claim 1, which is characterized in that be additionally provided with plated film in the coating chamber The lower section of roller, the film coating roller is equipped with multiple sputtering sources, and multiple sputtering sources are equidistant along the circumferential direction of the film coating roller Distribution.

9. magnetron sputtering coating system according to claim 8, which is characterized in that be equipped between the adjacent sputtering source Sputtering source baffle is formed with the gap passed through for the fabric between the sputtering source baffle and the film coating roller.

10. magnetron sputtering coating system according to claim 9, which is characterized in that be additionally provided with level in the coating chamber Partition, is formed with the gap passed through for the fabric between the horizontal baffle and the film coating roller, the horizontal baffle is by institute It states coating chamber and is divided into transfer chamber and sputtering chamber, the transfer chamber is located at the top of the sputtering chamber, the indoor deflector roll of plated film It is arranged in the transfer chamber, the sputtering source is located in the sputtering chamber.