JP2015172450A - Drier, and treatment film forming system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a drier and a treatment film forming system for performing a dehydration processing capable of changing the wind speed distribution of a supply gas on the width direction of a base material.SOLUTION: A center side suppression nozzle 442, an intermediate suppression nozzle 443 and an end side suppression nozzle 444 inject hot winds with individually different wind velocity distributions. Moreover, the center side suppression nozzle 442, an intermediate suppression nozzle 443 and an end side suppression nozzle 444 are individually equipped with flow regulating valves for adjusting the flow rates of a hot wind. By adjusting the hot wind flow rates to be injected from the individual nozzles (the center side suppression nozzle 442, the intermediate suppression nozzle 443 and the end side suppression nozzle 444) individually, therefore, the hot winds can be fed in various wind velocity distributions to the vicinities of treatment agents on the base material, which are carried on the position opposing the nozzle group 441.

Description

  The present invention relates to a drying apparatus and a processing film forming system.

  For example, in the manufacturing process of an electrode of a chemical battery such as a lithium ion battery or a magnetic recording medium, a slurry-like treatment agent (also referred to as a coating agent) is applied to the main surface of a base material (typically a metal foil). After that, a treatment film is formed on the main surface of the base material by drying the base material.

  As an apparatus for performing such a drying process, Patent Document 1 discloses that a plurality of rollers in contact with the lower surface of a base material are rotated in a chamber while blowing air from below the base material upward. A drying apparatus is described that floats and conveys a material, blows gas downward from above the substrate to be conveyed, and dries the treatment agent applied to the upper surface (upper main surface) of the substrate. .

  In this type of field, from the viewpoint of forming a uniform coating film on the main surface of the base material, the entire surface of the treatment agent applied to the main surface of the base material is dried at a uniform drying rate. It is hoped that.

JP 2012-172960 A

  However, usually when the gas is supplied with a uniform wind speed distribution in the width direction (the direction perpendicular to the conveying direction in the plane along the substrate) with respect to the treatment agent coated on the upper surface of the substrate, The drying rate of the treatment agent coated on the upper surface of the substrate is faster at both ends in the width direction than at the center in the width direction. This is because, among the gases blown to the base material, the gas blown to the center side in the width direction of the base material tends to stay above the base material, while the gas blown to both ends in the width direction of the base material is It originates in being easy to substitute with the air of the side of a base material.

  In this case, in order to make the drying speed uniform in the width direction of the base material, the wind speed distribution of the gas supplied to the treatment agent coated on the upper surface of the base material is centered in the width direction at both ends in the width direction of the base material. It is desirable that the wind speed be smaller than that on the side.

  Also, as an aspect different from the above, when various processing conditions such as the components of the processing agent, the coating mode of the processing agent, and the device design are taken into consideration, the processing agent is supplied to the top surface of the base material. In some cases, it is desirable that the wind speed distribution of the gas is a distribution in which the wind speed is larger at both ends in the width direction than at the center in the width direction.

  Therefore, in a drying apparatus in which the wind speed distribution of the supply gas cannot be changed in the width direction of the base material, it is difficult to perform an appropriate drying process based on various processing conditions.

  This invention is made | formed in view of the said subject, and it aims at providing the drying apparatus and processing film formation processing system which perform the drying process which can change the wind speed distribution of supply gas about the width direction of a base material. .

  The drying apparatus according to the first aspect of the present invention includes a transport mechanism that transports a base material coated with a treatment agent on one main surface along the transport direction, and the main surface of the base material that is transported. And a plurality of first air supply nozzles arranged along the transport direction, and a plurality of first air supply nozzles for supplying gas supplied from an air supply source. A plurality of air supply paths for supplying the gas to each of the plurality of air supply paths, and a plurality of adjusting portions provided in each of the plurality of air supply paths for adjusting the flow rate of the gas supplied to the plurality of first air supply nozzles. The plurality of first air supply nozzles have a relatively small opening area at both ends in the width direction as an opening pattern of the first air supply port as compared to the opening area at the center side. An end side suppression nozzle having an end side suppression pattern, and the opening pattern of the first air supply port A central-side suppression nozzle having a central-side suppression pattern whose opening area on the central side in the direction is relatively smaller than the opening area on both end sides, and the plurality of air supply paths by the adjusting unit The plurality of first supplies to the treatment agent applied to the main surface of the base material transported along the transport direction in a state in which the flow rate of the gas fed to each of the base materials is adjusted. Gas is supplied from a gas nozzle.

  A drying device according to a second aspect of the present invention is the drying device according to the first aspect, wherein the opening pattern in the plurality of first air supply nozzles extends from the center side to one end side in the width direction. The pattern and the pattern from the center side to the other end side are the same.

  A drying device according to a third aspect of the present invention is the drying device according to the first aspect or the second aspect, wherein the plurality of first air supply nozzles are continuously provided along the transport direction. At least one nozzle group configured by a combination of a plurality of arranged nozzles is included, and the nozzle group is the end-side suppressing nozzle disposed on the upstream side in the transport direction in the nozzle group. In the nozzle group, the central side suppression nozzle disposed on the downstream side in the transport direction, and in the nozzle group, disposed between the end side suppression nozzle and the central side suppression nozzle. At least one intermediate suppression nozzle, and the opening pattern of each nozzle constituting the nozzle group is sequentially from the end side suppression pattern to the central side suppression pattern along the transport direction. To change And features.

  A drying device according to a fourth aspect of the present invention is the drying device according to the first aspect or the second aspect, wherein the plurality of first air supply nozzles are continuously provided along the transport direction. At least one nozzle group configured by a combination of a plurality of arranged nozzles is included, and the nozzle group is the central side suppression nozzle arranged on the upstream side in the transport direction in the nozzle group. And, in the nozzle group, disposed between the end-side suppression nozzle and the center-side suppression nozzle in the nozzle group, and the end-side suppression nozzle disposed on the downstream side in the transport direction. At least one intermediate suppression nozzle, and the opening pattern of each nozzle constituting the nozzle group is sequentially from the end side suppression pattern to the central side suppression pattern along the transport direction. To change And features.

  The drying device according to the fifth aspect of the present invention is the drying device according to the third aspect or the fourth aspect, wherein the opening pattern of each nozzle constituting the nozzle group is a nozzle along the transport direction. While sequentially changing between each other, the inside of each nozzle is constant along the transport direction, so that the opening pattern of each nozzle constituting the nozzle group is stepwise along the transport direction. It is characterized by changing to.

  A drying device according to a sixth aspect of the present invention is the drying device according to the third aspect or the fourth aspect, wherein the opening pattern of each nozzle constituting the nozzle group is a nozzle along the transport direction. The opening pattern of each nozzle constituting the nozzle group is changed along the carrying direction by sequentially changing between each other and continuously changing inside the individual nozzles along the carrying direction. It is characterized by continuously changing.

  A drying apparatus according to a seventh aspect of the present invention is the drying apparatus according to any one of the first to sixth aspects, wherein the second opening opens toward the main surface of the substrate to be conveyed. And at least one second air supply nozzle arranged along the transport direction, and the gas supplied from the air supply source is supplied to the at least one second air supply nozzle. And at least one air supply path, and at least one adjustment unit that is provided in the at least one air supply path and adjusts a flow rate of the gas supplied to the at least one second air supply nozzle. And the opening pattern of the second air supply port is the same in any of the at least one second air supply nozzle, and the plurality of first air supply nozzles are more than the at least one second air supply nozzle. Also up along the transport direction Characterized in that it is arranged on the side.

  The treatment film forming system according to the eighth aspect of the present invention is a coating apparatus for coating the treatment agent on the main surface of the base material in order from the upstream side along the transport direction of the base material; A drying apparatus according to any one of the first to seventh aspects.

  The treatment film forming system according to the ninth aspect of the present invention is a coating apparatus for coating the treatment agent on the main surface of the base material in order from the upstream side along the transport direction of the base material; A drying apparatus according to any one of the first to seventh aspects; and a second air supply opening that opens toward the main surface of the substrate to be conveyed, and is arranged along the conveying direction. A plurality of second air supply nozzles, a plurality of air supply paths for supplying gas supplied from an air supply source to the plurality of second air supply nozzles, and the plurality of air supply paths. A plurality of adjusting portions for adjusting a flow rate of the gas supplied to the second air supply nozzle, and an opening pattern of the second air supply port is the same in any of the plurality of second air supply nozzles. And the same pattern drying device.

  In the first aspect of the present invention, the opening area at both ends in the width direction of the base material as the opening pattern of the first air supply opening is compared with the opening area at the center side in the plurality of first air supply nozzles. The opening area on the center side in the width direction of the substrate is relatively smaller than the opening area on both ends as the opening pattern of the end-side suppressing nozzle having a relatively small end-side suppressing pattern and the first air supply port. And a central side suppression nozzle having a small central side suppression pattern. Then, a plurality of processing agents applied to the main surface of the substrate conveyed along the conveying direction in a state where the flow rate of the gas supplied to each of the plurality of air supply paths is adjusted by the adjusting unit. The gas is supplied from the first air supply nozzle. For this reason, it becomes possible to supply gas with various wind speed distribution with respect to the processing agent coated on the base material conveyed by the position facing a some 1st air supply nozzle.

  In the third aspect of the present invention, the nozzle group is configured by a combination of a plurality of nozzles continuously arranged along the transport direction. For this reason, it becomes possible to supply gas with various wind speed distribution with respect to the processing agent coated on the base material conveyed by the position facing this nozzle group. In addition, the opening pattern of each nozzle constituting the nozzle group sequentially changes from the end side suppression pattern to the center side suppression pattern along the transport direction. For this reason, in the third aspect, the airflow in the vicinity of the treatment agent applied to the main surface of the base material is more stable than in the aspect in which each nozzle is arranged without corresponding to the change in the opening pattern, and more The drying process can be executed with high accuracy.

  In the fourth aspect of the present invention, the nozzle group is configured by a combination of a plurality of nozzles continuously arranged along the transport direction. For this reason, it becomes possible to supply gas with various wind speed distribution with respect to the processing agent coated on the base material conveyed by the position facing this nozzle group. In addition, the opening pattern of each nozzle constituting the nozzle group sequentially changes from the center side suppression pattern to the end side suppression pattern along the transport direction. For this reason, in the fourth aspect, the airflow in the vicinity of the treatment agent applied to the main surface of the base material is more stable than in the aspect in which each nozzle is arranged without corresponding to the change in the opening pattern, and more The drying process can be executed with high accuracy.

  In the sixth aspect of the present invention, the opening pattern of each nozzle constituting the nozzle group sequentially changes between the nozzles along the carrying direction and continuously changes within the individual nozzles along the carrying direction. As a result, the opening pattern of each nozzle constituting the nozzle group continuously changes along the transport direction. Therefore, in the sixth aspect, the airflow in the vicinity of the treatment agent applied to the main surface of the substrate is more stable and more accurate than in the aspect in which the opening pattern does not continuously change along the conveyance direction. A drying process can be performed.

1 is a diagram illustrating an overall configuration of a processing film forming system 1. FIG. It is XZ side view which shows schematic structure of the drying apparatus 40a. 7 is a bottom view of nine first air supply nozzles 44. FIG. It is a conceptual diagram which shows the center side suppression pattern Pa, the intermediate | middle suppression pattern Pb, and the end side suppression pattern Pc. It is a figure which shows the wind speed distribution in the vicinity of the process agent P of the hot air ejected from the center side suppression nozzle 442. FIG. It is a figure which shows the wind speed distribution in the vicinity of the processing agent P of the hot air ejected from the intermediate | middle suppression nozzle 443. FIG. It is a figure which shows the wind speed distribution in the vicinity of the process agent P of the hot air ejected from the end side suppression nozzle 444. FIG. It is a figure which shows the wind speed distribution in the vicinity of the processing agent P of the hot air ejected from the nozzle group. It is a bottom view of nine second air supply nozzles 44A. It is a figure which shows the wind speed distribution in the vicinity of the processing agent P of the hot air ejected from the 2nd air supply nozzle 44A. It is a conceptual diagram which shows center side suppression pattern Pa1, intermediate | middle suppression pattern Pb1, and end side suppression pattern Pc1. It is a conceptual diagram which shows center side suppression pattern Pa2, intermediate | middle suppression pattern Pb2, and end side suppression pattern Pc2. It is a bottom view of six first supply nozzles 44 and three second supply nozzles 44A.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<1 embodiment>
<1.1 Overall Configuration of Processed Film Formation System 1>
FIG. 1 is a diagram illustrating an overall configuration of a processing film forming system 1 incorporating drying apparatuses 40a to 40c. In addition, in FIG. 1 and subsequent figures, in order to clarify the directional relationship, an XYZ orthogonal coordinate system in which the Z-axis direction is a vertical direction and the XY plane is a horizontal plane is appropriately attached. Further, in FIG. 1 and the subsequent drawings, the dimensions and numbers of the respective parts are exaggerated or simplified as necessary for easy understanding.

  In this treatment film forming system 1, a treatment agent containing an active material as an electrode material is applied to the upper surface of a metal foil as a substrate, and the treatment agent is dried to form a treatment film on the substrate. It is an apparatus for manufacturing an electrode of a lithium ion secondary battery. The treatment film forming system 1 mainly includes a coating apparatus 10, drying apparatuses 40a to 40c, a transport mechanism 80, and a control unit 90.

  The base material 5 is a metal foil that functions as a current collector of a lithium ion secondary battery. When manufacturing the positive electrode of a lithium ion secondary battery with the process film formation system 1, aluminum foil (Al) can be used as the base material 5, for example. Moreover, when manufacturing a negative electrode with the process film formation system 1, copper foil (Cu) can be used as the base material 5, for example. The base material 5 is a long sheet-like (strip-shaped) metal foil, and the width and thickness thereof are not particularly limited. For example, the width may be 600 mm to 700 mm and the thickness may be 10 μm to 20 μm. .

  The long base material 5 is conveyed in the order of the coating device 10 and the drying devices 40a to 40c in the process of being fed from the unwinding roller 81 and wound by the winding roller 82. The transport mechanism 80 includes the unwinding roller 81, the winding roller 82, and a plurality of auxiliary rollers 83a to 83d. In addition, about the number and arrangement | positioning of auxiliary roller 83a-83d, it is not limited to the example of FIG. 1, It can increase / decrease suitably as needed.

  The coating apparatus 10 includes a coating nozzle 11 and a backup roller 12. A treatment agent containing an active material that is an electrode material is applied from the coating nozzle 11 to the front main surface (upper surface S1) of the substrate 5 that travels while being pressed and supported by the backup roller 12. When manufacturing a positive electrode with the processing film formation system 1, as a positive electrode material from the coating nozzle 11, for example, lithium cobaltate (LiCoO2) which is a positive electrode active material, carbon (C) which is a conductive auxiliary agent, and a binder. A mixed liquid of polyvinylidene fluoride (PVDF) as an organic solvent and N-methyl-2-pyrrolidone (NMP) as an organic solvent is applied to the substrate 5. Instead of lithium cobaltate, lithium nickelate (LiNiO2), lithium manganate (LiMn2O4), lithium iron phosphate (LiFePO4), or the like can be used as the positive electrode active material, but is not limited thereto.

  On the other hand, when the negative electrode is produced by the treatment film forming system 1, as the negative electrode material from the coating nozzle 11, for example, graphite (graphite) as the negative electrode active material, PVDF as the binder, and NMP as the organic solvent. The mixed solution is applied to the substrate 5. Instead of graphite, hard carbon, lithium titanate (Li4Ti5O12), silicon alloy, tin alloy, or the like can be used as the negative electrode active material. In both the positive electrode material and the negative electrode material, styrene-butadiene rubber (SBR) or the like can be used as a binder instead of PVDF.

  As the coating nozzle 11, a slit nozzle provided with a slit-like discharge port along the width direction (Y direction in the drawing) of the substrate 5 can be used. The coating nozzle 11 discharges the electrode material processing agent fed from the pump unit 15 from the discharge port, and applies the electrode material processing agent P to the upper surface S1 of the traveling substrate 5. The base material 5 coated with the processing agent P by the coating apparatus 10 is sequentially transported to the drying devices 40a to 40c by the transport mechanism 80, and the processing agent P is dried.

  Then, the base material 5 subjected to the drying process by the drying devices 40 a to 40 c is transported via the auxiliary roller 83 d downstream of the transport and is collected by the winding roller 82. The collected base material 5 is transported to a processing unit (not shown) outside the processing film forming system 1, cut into a desired size by the processing unit, and then processed as an electrode plate.

  The control unit 90 controls the mechanism of each unit provided in the processing film forming system 1, and the hardware configuration is the same as that of a general computer. That is, the control unit 90 stores a CPU that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, control software, data, and the like. It is configured with a magnetic disk. The processing in the processing film forming system 1 proceeds when the CPU of the control unit 90 executes a predetermined processing program.

<1.2 Dryers 40a-40c>
Hereinafter, the details of the drying devices 40a to 40c will be described. The drying devices 40a to 40c are arranged in series from the transport upstream side to the downstream side in that order. When the base material 5 is conveyed through the inside of the drying devices 40a to 40c and is subjected to a drying process by the drying devices 40a to 40c, the treatment agent P applied to the upper surface S1 of the base material 5 is dried.

  In general, in the early stage of the drying treatment, the solvent component of the treatment agent P tends to evaporate, and the solid component of the treatment agent P tends to flow in the treatment agent P. For this reason, in the early stage of the drying treatment, if the treatment agent P is spatially uniformly dried, the solid component is uniformly present in the treatment agent P, and the performance of the final product (in this embodiment, a lithium ion battery). However, if the treatment agent P is spatially non-uniformly dried, the solid components are unevenly distributed in the treatment agent P, and the performance of the final product is deteriorated.

  On the other hand, at the end of the drying process, the solvent component of the treating agent P is less likely to evaporate and the solid component of the treating agent P is less likely to flow in the treating agent P than in the early stage of the drying process. For this reason, at the end of the drying process, even if the treatment agent P is spatially non-uniformly dried, the performance of the final product is unlikely to deteriorate.

  Therefore, when drying the treatment agent P, it is desirable that a precise drying process is performed in the early stage rather than the final stage. From this point of view, in this embodiment, a drying device 40a and a drying device 40b that can supply hot air with various wind speed distributions are arranged on the upstream side in the transport direction corresponding to the early stage of the drying process. Further, a drying device 40c capable of supplying hot air with a constant wind speed distribution is disposed on the downstream side in the transport direction corresponding to the final stage of the drying process. In addition, although this embodiment demonstrates the aspect which supplies a hot air to the base material 5 in drying apparatus 40a-40c, it may replace with a hot air and may supply normal temperature air and inert gas.

  In the present embodiment, the drying device 40a and the drying device 40b have the same configuration. Therefore, in the following, only the drying device 40a will be described in detail as a representative of these, and the description of the drying device 40b will be omitted. The drying device 40c will be described separately.

<1.2.1 Drying device 40a>
FIG. 2 is an XZ side view showing a schematic internal configuration of the drying device 40a.

  The drying device 40a includes an upper hot air blowing portion 45, a lower hot air blowing portion 51, an upper exhaust box 56, and a lower exhaust box 55 inside a chamber 41 having openings formed at both ends.

  The chamber 41 is provided so as to surround the transport path of the base material 5 transported by the transport mechanism 80. At both ends of the chamber 41, a carry-in port 41a into which the base material 5 is carried in and a carry-out port 41b through which it is carried out are formed. The length of the chamber 41 is not particularly limited, but is about 3000 mm in this embodiment. In addition, the sizes of the carry-in port 41a and the carry-out port 41b are not particularly limited, but in the present embodiment, a distance of about 5 mm can be secured above and below the conveyance path (that is, the size in the vertical direction). Is about 10 mm).

  Inside the chamber 41, on the upper side of the transfer path, a plurality of upper hot air ejection portions 45 (9 in the present embodiment) and a plurality of upper exhaust boxes 56 (10 in the present embodiment) are transferred along the X direction. ) Are alternately arranged along. In FIG. 2, a part of the configuration relating to the upper hot air ejection part 45 and the upper exhaust box 56 is omitted for the purpose of preventing the illustration from being complicated.

  The rectifying plates 43 are respectively disposed below the nine upper hot air jetting portions 45 (gas supply portions) provided on the upper side of the transport path.

  The rectifying plate 43 is a plate-like member provided so as to be parallel to the conveyance path. The current plate 43 is provided with a slit-like air supply port 431 (FIG. 3) extending along the width direction (Y direction) of the base material 5, and the air supply port (first air supply port) is It opens toward the upper surface S1 of the substrate 5 to be conveyed. In the present specification, a combination of one upper hot air ejection part 45 and one rectifying plate 43 disposed immediately below is referred to as a “first air supply nozzle 44”. Details of the configuration of the first air supply nozzle 44 will be described later with reference to FIG.

  The upper hot air ejection part 45 is connected to the air guide pipe 35, and directs the hot air supplied from the air guide pipe 35 (air supply path) from the air supply port of the rectifying plate 43 toward the base material 5 in the conveyance path. Erupts. The proximal end side of the air guide pipe 35 is connected to the hot air supply part 34 (air supply source), and the distal end side is branched into nine parts, and each is connected to the upper hot air blowing part 45 in communication. A flow rate adjustment valve 36 (adjustment unit) is inserted in each of the nine air guide pipes 35 branched, and the flow rate of hot air supplied to the nine first supply nozzles 44 by the flow rate adjustment valve 36 is determined. Adjusted.

  The hot air supply unit 34 includes a heater and a blower, and supplies the heated air as hot air to the upper hot air ejection unit 45. The flow rate of the hot air supplied to each of the nine upper hot air ejection portions 45 is individually adjusted by the corresponding flow rate adjustment valve 36. Then, the hot air fed to the upper hot air ejection part 45 through the air guide pipe 35 is ejected from the air supply port of the rectifying plate 43 toward the treatment agent P on the base material 5.

  Further, ten upper exhaust boxes 56 are provided for the nine upper hot air ejection sections 45, and the upper hot air ejection sections 45 are provided between the upper exhaust boxes 56 arranged adjacent to each other in the X direction. Yes. Each upper exhaust box 56 includes a suction port extending along the width direction of the substrate 5 at the lower end. Each upper exhaust box 56 is connected to an exhaust part 58 through an exhaust pipe 57. That is, the proximal end side of the exhaust pipe 57 is connected to the exhaust part 58, and the distal end side is branched into ten and each is connected to the upper exhaust box 56. A flow rate adjusting valve 91 is inserted in each of the exhaust pipes 57 branched into ten.

  The exhaust unit 58 includes a suction blower and applies a negative pressure to the upper exhaust box 56 via the exhaust pipe 57. As a result, the upper exhaust box 56 sucks the atmosphere around the suction port at the lower end and discharges it to the exhaust pipe 57. The exhaust flow rate of the gas sucked by each of the ten upper exhaust boxes 56 is individually adjusted by the corresponding flow rate adjusting valve 91.

  On the other hand, inside the chamber 41, a plurality of lower hot-air ejection portions 51 (nine in the present embodiment) and a plurality of lower exhaust boxes 55 (two in the present embodiment) are arranged below the conveyance path. Has been. In FIG. 2, for the purpose of preventing the illustration from becoming complicated, a part of the configuration related to the lower hot air ejection part 51 is omitted.

  Each of the nine lower hot air ejection portions 51 provided on the lower side of the transport path includes a plurality of ejection holes (not shown) facing upward. The lower hot air ejection part 51 is connected in communication with a hot air supply part 53 via a pipe 52. That is, the proximal end side of the pipe 52 is connected to the hot air supply unit 53, and the distal end side is branched into nine parts, and each is connected to the lower hot air ejection unit 51. A flow rate adjusting valve 54 is inserted into each of the nine branched pipes 52.

  The hot air supply unit 53 includes a heater and a blower, and supplies the heated air as hot air to the lower hot air ejection unit 51. The flow rate of the hot air supplied to each of the nine lower hot air ejection portions 51 is individually adjusted by the corresponding flow rate adjustment valve 54. The nine lower hot air ejection sections 51 eject hot air supplied from the hot air supply section 53 from the ejection holes toward the upper conveyance path.

  Below the transport path, two lower exhaust boxes 55 are provided for the nine lower hot air ejection portions 51. Each lower exhaust box 55 includes a suction port extending along the width direction of the base material 5 at the upper end. The lower exhaust box 55 is connected to the exhaust part 93 through an exhaust pipe 92. That is, the proximal end side of the exhaust pipe 92 is connected to the exhaust part 93, and the distal end side is branched into two and each is connected to the lower exhaust box 55. A flow rate adjusting valve 94 is inserted in each of the two branched exhaust pipes 92. The exhaust unit 93 includes a suction blower, and applies a negative pressure to the lower exhaust box 55 via the exhaust pipe 92. As a result, the lower exhaust box 55 sucks the atmosphere around the suction port at the upper end and discharges it to the exhaust pipe 92. The exhaust flow rate of the gas sucked by each of the two lower exhaust boxes 55 is individually adjusted by the corresponding flow rate adjusting valve 94.

  In addition, the nine upper hot air ejection portions 45 and the nine lower hot air ejection portions 51 are arranged to face each other across the conveyance path. That is, each lower hot air ejection part 51 is provided in a one-to-one correspondence with each upper hot air ejection part 45, and the lower hot air ejection part 51 is arranged directly below each upper hot air ejection part 45. Accordingly, hot air is blown from the lower hot air blowing portion 51 and the upper hot air blowing portion 45 to the same position on the upper and lower surfaces of the base material 5.

  When the lower hot air jetting part 51 blows hot air from below the base material 5, the base material 5 is directly heated, and the treatment agent P is heated by heat conduction from the base material 5. The hot air blown from the lower hot air jet part 51 to the lower surface of the base material 5 is collected by the lower exhaust box 55.

  Further, when the upper hot air ejection part 45 blows hot air from above the base material 5, the treatment agent P applied to the upper surface S <b> 1 of the base material 5 is directly heated. As shown in FIG. 2, the hot air blown from the upper hot air blowing portion 45 onto the upper surface of the base material 5 flows along the X direction between the rectifying plate 43 provided in parallel with the transport path and the base material 5. Then, the gas is collected in an upper exhaust box 56 provided on both sides of the upper hot air ejection part 45. Since hot air flows between the rectifying plate 43 and the base material 5, the treatment agent P coated on the base material 5 continues to come into contact with hot air with low humidity, and the treatment agent P is efficiently heated and dried. be able to.

  Thus, when the processing agent P is heated from above and below the substrate 5, the organic solvent (NMP in the present embodiment) evaporates from the processing agent P, and the drying process proceeds.

  In addition, the nine lower hot air jetting portions 51 spray hot air from below the base material 5 to the upper side of the base material 5, in addition to the function of indirectly heating the treatment agent P described above, to the base material 5 by the wind pressure of the hot air. It works to rise upward. Thereby, even if it does not provide a roller intrinsic | native to the drying apparatus 40a, the base material 5 is conveyed along a conveyance path | route, without largely bend | curving between the auxiliary roller 83a and the auxiliary roller 83b. That is, the lower hot-air ejection part 51 also plays an auxiliary role of the transport mechanism 80 that floats and transports the base material 5.

  Furthermore, since the nine upper hot air ejection portions 45 and the nine lower hot air ejection portions 51 are arranged to face each other across the conveyance path, the lower hot air ejection portion 51 is placed on the lower surface of the base material 5. Hot air is blown from the upper hot air blowing portion 45 to the opposite side (upper surface side) of the position where the hot air is blown. For this reason, hot air is blown from the top and bottom to the same position on the upper and lower surfaces of the substrate 5, and the wave of the substrate 5 can be prevented.

  Hereinafter, the first air supply nozzle 44 will be described in detail.

  FIG. 3 is a bottom view of nine first air supply nozzles 44 among the components arranged in the drying device 40a.

  In the present embodiment, a nozzle group 441 is configured by a combination of three first air supply nozzles 44 that are continuously arranged along the transport direction (X direction). For this reason, three nozzle groups 441 are configured by the nine first supply nozzles 44.

  Each nozzle group 441 has, in order from the upstream side in the transport direction, a central side suppression nozzle 442 having a central side suppression pattern as the opening pattern of the air supply port 431 and an intermediate suppression having an intermediate suppression pattern as the opening pattern of the air supply port 431. The nozzle 443 and the end side suppression nozzle 444 which has an end side suppression pattern as an opening pattern of the air supply port 431 are provided. Thus, in the present embodiment, a mode in which the first supply nozzle 44 includes three types of nozzles, that is, the center side suppression nozzle 442, the intermediate side suppression nozzle 443, and the end side suppression nozzle 444 will be described.

  FIG. 4 is a conceptual diagram showing the center side suppression pattern Pa, the intermediate suppression pattern Pb, and the end side suppression pattern Pc. The shaded portion in FIG. 4 means a portion where the slit-shaped opening is sealed by a sealing member 432 described later.

  FIG. 5 shows a wind speed distribution in the vicinity of the treatment agent P of hot air ejected from the center side suppression nozzle 442. FIG. 6 shows a wind speed distribution in the vicinity of the treatment agent P of hot air ejected from the intermediate suppression nozzle 443. FIG. 7 shows a wind speed distribution in the vicinity of the treatment agent P of hot air ejected from the end side suppression nozzle 444. 5 to 7, the vertical axis indicates the velocity of hot air near the treatment agent P, and the horizontal axis indicates the position in the Y direction. As for the opening pattern in each nozzle, since the pattern from the center side to one end side and the pattern from the center side to the other end side are the same in the Y direction (FIG. 4), as shown in FIGS. The wind speed distribution is also symmetrical with respect to the Y direction.

  In the center side suppression nozzle 442, a sealing member 432 is disposed on the Y direction center side of the lower surface of the rectifying plate 43, and the Y direction center side of the slit-shaped air supply port 431 provided in the rectifying plate 43 is sealed. It is sealed by the member 432 (FIG. 3). For this reason, the opening pattern of the center side suppression nozzle 442 becomes a center side suppression pattern Pa in which the opening area on the center side in the Y direction is relatively smaller than the opening area on both ends (FIG. 4). As a result, in the vicinity of the treatment agent P on the base material 5, the hot air jetted from the center side suppression nozzle 442 has a low wind speed at the Y direction center side and a high wind speed at both ends in the Y direction (FIG. 5). In addition, as an aspect with which the sealing member 432 is arrange | positioned in the lower surface of the baffle plate 43, various aspects, such as the aspect fixed with members, such as a screw | thread, the aspect fixed with an adhesive agent etc., are employable. This also applies to the intermediate suppression nozzle 443 and the end side suppression nozzle 444.

  In the intermediate suppression nozzle 443, a sealing member 432 is provided in each of the lower surface of the rectifying plate 43 between the Y direction center side and the Y direction both ends, and a slit-like air supply port 431 provided in the rectifying plate 43. Among these, the said area is sealed by the sealing member 432 (FIG. 3). For this reason, the opening pattern of the intermediate suppression nozzle 443 is an intermediate suppression pattern Pb in which the opening area in the section in the Y direction is relatively smaller than the opening areas on the center side and both end sides (FIG. 4). As a result, the hot air jetted from the intermediate suppression nozzle 443 has a low wind speed in the Y direction in the vicinity of the treatment agent P on the substrate 5, and a high wind speed at the Y direction center side and the Y direction both ends ( FIG. 6).

  In the end-side suppression nozzle 444, sealing members 432 are disposed on both ends in the Y direction on the lower surface of the rectifying plate 43, and both ends in the Y direction of the slit-shaped air supply ports 431 provided on the rectifying plate 43 are sealed. It is sealed by the stop member 432 (FIG. 3). For this reason, the opening pattern of the end-side suppression nozzle 444 is an end-side suppression pattern Pc in which the opening area at both ends in the Y direction is relatively smaller than the opening area at the center side (FIG. 4). As a result, in the vicinity of the treatment agent P on the substrate 5, the hot air jetted from the end-side suppression nozzle 444 has a low wind speed at both ends in the Y direction and a high wind speed at the center in the Y direction (FIG. 7).

  As described above, the center side suppression nozzle 442, the intermediate suppression nozzle 443, and the end side suppression nozzle 444 each eject hot air with different wind speed distributions. Further, as described above, each of the center side suppression nozzle 442, the intermediate suppression nozzle 443, and the end side suppression nozzle 444 is provided with a flow rate adjustment valve 36 that adjusts the flow rate of hot air.

  For this reason, the hot air flow rate ejected from each nozzle (center side suppression nozzle 442, intermediate suppression nozzle 443, end side suppression nozzle 444) constituting one nozzle group 441 is adjusted to face the nozzle group 441. It becomes possible to supply hot air with various wind speed distributions to the vicinity of the treatment agent P on the substrate 5 being transported.

  For example, the flow rate of hot air ejected from the center side suppression nozzle 442, the flow rate of hot air ejected from the intermediate suppression nozzle 443, and the flow rate of hot air ejected from the end side suppression nozzle 444 are 0.8: 0.8: 1. When the opening degree of each flow rate adjustment valve 36 is adjusted to be 4, the hot air blown from the nozzle group 441 has a slightly lower wind speed at both ends in the Y direction in the vicinity of the treatment agent P on the substrate 5 (FIG. 8). As described above, when the flow rate of hot air ejected from each nozzle 442 to 444 is 0.8: 0.8: 1.4, the average flow rate of hot air ejected from the nozzle group 441 is 1. Therefore, compared with the case where the flow rates of hot air ejected from the nozzles 442 to 444 are 1: 1: 1, respectively, the same hot air supply amount is obtained as viewed from the nozzle group 441 as a whole.

  Normally, when hot air is supplied with a uniform wind speed distribution in the width direction with respect to the treatment agent P coated on the upper surface S1 of the substrate 5, the drying rate of the treatment agent P coated on the upper surface S1 of the substrate 5 Is faster at both ends in the width direction of the substrate 5 than at the center in the width direction. This is because among the hot air blown to the base material 5, the hot air blown to the center side in the width direction of the base material 5 tends to stay above the base material 5, while blowing to both ends of the base material 5 in the width direction. The generated hot air is caused by the fact that it is easy to replace the air on the side of the substrate 5.

  In the drying apparatus 40a of the present embodiment, hot air is blown out from each nozzle group 441 so that the wind speed at both ends in the Y direction is slightly reduced in the vicinity of the treatment agent P on the base material 5 (FIG. 8). It is possible to suppress drying at both ends in the Y direction where the drying speed is relatively fast in a normal state while promoting drying at the Y direction center side where the drying speed is relatively slow. As a result, in this embodiment, the treatment P on the base material 5 can be dried at a more uniform drying speed in the entire region in the width direction (Y direction), and a more accurate final product can be obtained. Can do.

  The wind speed distribution of the hot air ejected from the nozzle group 441 is not limited to that shown in FIG. The wind speed distribution of the hot air ejected from the nozzle group 441 can be variously changed according to the component of the treatment agent P and the stage of the drying treatment.

  In this embodiment, since the drying device 40b has the same configuration as the drying device 40a described above, the description of the drying device 40b is omitted.

<1.2.2 Drying device 40c>
The drying device 40c has a second air supply nozzle 44A (FIG. 9) instead of the first air supply nozzle 44 of the drying device 40a and the drying device 40b. Other configurations of the drying device 40c are the same as those of the drying device 40a and the drying device 40b. Therefore, the configuration of the second supply nozzle 44A will be mainly described below. In addition, the same code | symbol is attached | subjected about the same part as the structure of the drying apparatus 40a, and duplication description is abbreviate | omitted.

  FIG. 9 is a bottom view of nine second air supply nozzles 44A among the components arranged in the drying device 40c.

  Similarly to the first air supply nozzle 44, the second air supply nozzle 44A is configured by combining one upper hot-air ejection part 45 and one current plate 43 arranged immediately below the upper air-air ejection part 45. Further, each of the nine second air supply nozzles 44 </ b> A (the nine upper hot air ejection portions 45) is connected to an air guide pipe 35 that supplies hot air supplied from the hot air supply portion 34 to the upper hot air ejection portion 45. Has been. In addition, a flow rate adjustment valve 36 (adjustment unit) is inserted in each of the nine air guide pipes 35 branched from the nine air supply nozzles 44A by the flow rate adjustment valve 36. The flow rate is adjusted.

  As shown in FIG. 9, the second supply nozzle 44 </ b> A is different from the first supply nozzle 44 in that the sealing member 432 (FIG. 3) is not provided on the rectifying plate 43. Therefore, in the drying device 40c (same pattern drying device), the opening patterns of the nine second air supply nozzles 44A all have the same slit shape (long shape). The hot air jetted from the slit-like air supply port 431 (second air supply port) is supplied to the treatment agent P on the substrate 5 with a uniform air velocity distribution in the Y direction (FIG. 10). As a result, as described above, the drying rate of the treatment agent P applied to the upper surface S1 of the base material 5 becomes faster at both ends of the base material 5 in the Y direction.

  However, since the drying device 40c is disposed on the downstream side in the transport direction corresponding to the final stage of the drying process, when the processing agent P is spatially non-uniformly dried (specifically, faster at both ends in the Y direction). Even when dried, the performance of the final product is unlikely to decline.

  In the drying device 40c, the same amount of hot air is ejected from each second air supply nozzle 44A. For this reason, the drying process in the drying apparatus 40c is easier to control the operation by the control unit 90 than the drying process in the drying apparatus 40a described above.

<2 Modification>
Although the embodiment of the present invention has been described above, the present invention can be modified in various ways other than those described above without departing from the spirit of the present invention.

  FIG. 11 is a conceptual diagram illustrating a center side suppression pattern Pa1, an intermediate suppression pattern Pb1, and an end side suppression pattern Pc1 according to a modification. The shaded portion in FIG. 11 means a portion where the slit-shaped air supply port 431 is sealed by the sealing member.

  In the above embodiment, the opening pattern of each nozzle constituting the nozzle group 441 changes sequentially between the nozzles along the transport direction, while being constant inside each nozzle along the transport direction. Although the mode (FIGS. 3 and 4) in which the opening pattern of each nozzle constituting the nozzle group 441 changes stepwise along the transport direction has been described, the present invention is not limited to this. For example, the opening pattern (center side suppression pattern Pa1, intermediate suppression pattern Pb1, and end side suppression pattern Pc1) of each nozzle constituting the nozzle group sequentially changes between the nozzles along the transport direction and along the transport direction. Thus, it is also possible to adopt a mode (FIG. 11) in which the opening pattern of each nozzle constituting the nozzle group continuously changes along the transport direction by continuously changing within each nozzle. In the aspect in which the opening pattern continuously changes along the conveyance direction as in this modification, the width direction in the nozzle is compared with the aspect in which the opening pattern changes in stages along the conveyance direction as in the above embodiment. The wind speed distribution becomes smoother and the difference in wind speed distribution between adjacent nozzles becomes smaller. As a result, the airflow in the vicinity of the treatment agent P applied to the upper surface S1 of the substrate 5 is more stable, and the drying process can be executed with higher accuracy. In order to realize a mode in which the opening pattern continuously changes even inside the nozzle as in this modification, for example, the air supply port is sealed by a sealing member 432 provided with an inclination in the width direction of the nozzle. do it.

  FIG. 12 is a conceptual diagram showing a center side suppression pattern Pa2, an intermediate suppression pattern Pb2, and an end side suppression pattern Pc2 according to a modification. The shaded portions in FIG. 12 mean locations where the slit-shaped openings are sealed by the sealing member.

  In the above embodiment, the sealing member 432 completely seals the Y direction center side section of the air supply port 431 of the center side suppression nozzle 442, and the sealing member 432 of the air supply port 431 of the intermediate suppression nozzle 443. A mode in which the section between the Y-direction central side and the Y-direction both ends is completely sealed, and the sealing member 432 completely seals the sections on the Y-direction both ends of the air supply port 431 of the end-side suppression nozzle 444. Although the aspect (FIGS. 3 and 4) has been described, the present invention is not limited to this. For example, as shown in FIG. 12, a mode in which a predetermined section in the Y direction of the air supply port 431 of each nozzle is partially sealed by a sealing member may be used.

  In addition to the aspect in which the slit-shaped air supply port 431 in the first air supply nozzle 44 is sealed with a sealing member to form a specific opening pattern as in the above embodiment, the supply of a specific opening pattern shape is originally provided. A mode in which the first supply nozzle 44 having the air opening is used and no sealing member is used may be employed. Various shapes of the air supply port can also be employed. For example, the air supply port may be configured by a plurality of holes.

  FIG. 13 is a bottom view of six first supply nozzles 44 (two nozzle groups 441) and three second supply nozzles 44A among the components arranged in the drying apparatus according to the modification.

  In the embodiment described above, the drying devices 40a and 40b including the nine first supply nozzles 44 and the drying device 40c including the nine second supply nozzles 44A have been described. However, the present invention is not limited thereto. For example, as shown in FIG. 13, a configuration in which both the first air supply nozzle 44 and the second air supply nozzle 44A are arranged in one drying apparatus may be employed. In this case, as in the modified example, a nozzle group 441 including a plurality of first air supply nozzles 44 is arranged on the upstream side in the transport direction (X direction), and along the transport direction (X direction). A configuration in which the second supply nozzle 44A is disposed on the downstream side is particularly desirable. This is because the nozzle group 441 can eject hot air with various wind speed distributions as described above, and can perform a more precise drying process in the early stage of drying.

  Moreover, although the said embodiment demonstrated the process film formation system 1 which has the drying apparatus 40c provided with nine 2nd air supply nozzles 44A, it is not restricted to this. In all the drying apparatuses arranged along the conveyance path, a processing film forming system in which the hot air supply nozzle is constituted by the first air supply nozzle 44 may be used.

  Moreover, although the said embodiment demonstrated the aspect in which the nozzle group 441 was comprised with three types of nozzles, the center side suppression nozzle 442, the intermediate | middle suppression nozzle 443, and the end side suppression nozzle 444, it is not restricted to this. . If there are at least two types of nozzles, that is, the center side suppression nozzle 442 and the end side suppression nozzle 444, a nozzle group can be configured. Moreover, a nozzle group may be comprised by four or more types of nozzles.

  Moreover, in the said embodiment, the center side suppression nozzle 442, the intermediate | middle suppression nozzle 443, and the end side suppression nozzle 444 are distribute | arranged in this order along the conveyance direction, and the opening pattern of each nozzle which comprises the nozzle group 441 is a conveyance direction. Although the aspect which changes sequentially from the edge side suppression pattern Pc to the center side suppression pattern Pa along is described, it is not restricted to this. Each nozzle is arranged in the reverse order along the transport direction, and the opening pattern of each nozzle constituting the nozzle group sequentially changes from the center side suppression pattern Pa to the end side suppression pattern Pc along the transport direction. It does not matter. Moreover, the aspect by which each nozzle is arrange | positioned without respond | corresponding to the change of an opening pattern in a nozzle group may be sufficient. In any aspect, it is possible to eject hot air with various wind speed distributions by adjusting the flow rate of hot air ejected from each nozzle constituting one nozzle group. In addition, if it is an aspect in which the opening pattern of each nozzle constituting the nozzle group sequentially changes as in the above-described embodiment, the base material is compared with an aspect in which each nozzle is arranged without corresponding to the change in the opening pattern. The airflow in the vicinity of the treatment agent P applied to the upper surface S1 of the surface 5 is more stable, and the drying process can be executed with higher accuracy.

  Further, the treatment agent P to be subjected to the drying treatment using the technology according to the present invention is not limited to the electrode material film of the lithium ion secondary battery described in the above embodiment, and for example, a solar cell material (electrode) Insulating film or protective film of electronic material may be used. The technique according to the present invention can be suitably applied to dry a treatment agent coated with a thick material having a relatively high viscosity. Therefore, the technique according to the present invention may be used to dry the treatment agent for the pigment and the adhesive.

  As mentioned above, although the drying apparatus and the process film formation system which concern on embodiment and its modification were demonstrated, these are examples of preferable embodiment for this invention, Comprising: The scope of implementation of this invention is not limited. Within the scope of the invention, the present invention can be freely combined with each embodiment, modified with any component in each embodiment, or omitted with any component in each embodiment.

DESCRIPTION OF SYMBOLS 1 Processing film formation system 5 Base material 10 Coating apparatus 40a-40c Drying apparatus 44 1st air supply nozzle 44A 2nd air supply nozzle 45 Upper side hot-air ejection part 80 Conveyance mechanism 90 Control part 431 Air supply port 432 Sealing member 441 Nozzle Group 442 Central side suppression nozzle 443 Intermediate side suppression nozzle 444 End side suppression nozzle P Treatment agent Pa, Pa1, Pa2 Central side suppression pattern Pb, Pb1, Pb2 Intermediate suppression pattern Pc, Pc1, Pc2 End side suppression pattern

Claims (9)

A transport mechanism for transporting the base material coated with the treatment agent on the main surface on one side along the transport direction;
A plurality of first air supply nozzles having a first air supply port that opens toward the main surface of the substrate to be conveyed, and arranged along the conveyance direction;
A plurality of air supply paths for supplying gas supplied from an air supply source to each of the plurality of first air supply nozzles;
A plurality of adjusting portions that are provided in each of the plurality of air supply paths and adjust the flow rate of the gas supplied to the plurality of first air supply nozzles;
With
The plurality of first air supply nozzles include
An end-side suppression nozzle having an end-side suppression pattern in which the opening area on both ends in the width direction of the substrate is relatively smaller than the opening area on the center side as the opening pattern of the first air supply port;
A central side suppression nozzle having a central side suppression pattern in which the opening area at the center side in the width direction is relatively smaller than the opening area at both ends in the width direction as the opening pattern of the first air supply port. And
The process applied to the main surface of the base material transported along the transport direction in a state where the flow rate of the gas supplied to each of the plurality of air supply paths is adjusted by the adjusting unit. A drying device, wherein gas is supplied to the agent from the plurality of first air supply nozzles. The drying apparatus according to claim 1,
In the drying apparatus, the opening pattern in the plurality of first air supply nozzles has the same pattern from the center side to one end side and the pattern from the center side to the other end side in the width direction. The drying apparatus according to claim 1 or 2,
The plurality of first air supply nozzles include at least one nozzle group configured by a combination of a plurality of nozzles arranged continuously along the transport direction,
The nozzle group is
Among the nozzle group, the end-side suppression nozzle disposed on the upstream side in the transport direction;
Among the nozzle group, the central side suppression nozzle arranged on the downstream side in the transport direction,
In the nozzle group, at least one intermediate suppression nozzle disposed between the end side suppression nozzle and the center side suppression nozzle,
Have
The drying apparatus, wherein the opening pattern of each nozzle constituting the nozzle group sequentially changes from the end side suppression pattern to the center side suppression pattern along the transport direction. The drying apparatus according to claim 1 or 2,
The plurality of first air supply nozzles include at least one nozzle group configured by a combination of a plurality of nozzles arranged continuously along the transport direction,
The nozzle group is
Among the nozzle group, the central side suppression nozzle disposed on the upstream side in the transport direction,
In the nozzle group, the end-side suppression nozzle disposed on the downstream side in the transport direction,
In the nozzle group, at least one intermediate suppression nozzle disposed between the end side suppression nozzle and the center side suppression nozzle,
Have
The drying apparatus, wherein the opening pattern of each nozzle constituting the nozzle group sequentially changes from the end side suppression pattern to the center side suppression pattern along the transport direction. The drying apparatus according to claim 3 or 4, wherein
The opening pattern of each nozzle constituting the nozzle group sequentially changes between the nozzles along the transport direction, while being constant within each nozzle along the transport direction,
The drying apparatus, wherein the opening pattern of each nozzle constituting the nozzle group changes stepwise along the transport direction. The drying apparatus according to claim 3 or 4, wherein
The opening pattern of each nozzle constituting the nozzle group changes sequentially between the nozzles along the transport direction, and also continuously changes inside the individual nozzles along the transport direction. ,
The drying apparatus characterized in that the opening pattern of each nozzle constituting the nozzle group continuously changes along the transport direction. A drying apparatus according to any one of claims 1 to 6,
A second air supply port that opens toward the main surface of the substrate to be conveyed; and at least one second air supply nozzle disposed along the conveyance direction;
At least one air supply path for supplying the gas supplied from the air supply source to the at least one second air supply nozzle;
At least one adjustment unit that is provided in the at least one supply path and adjusts the flow rate of the gas supplied to the at least one second supply nozzle;
Further comprising
The opening pattern of the second air supply port is the same in any of the at least one second air supply nozzle,
The drying apparatus, wherein the plurality of first air supply nozzles are arranged upstream of the at least one second air supply nozzle along the transport direction. In order from the upstream side along the transport direction of the base material,
A coating apparatus for coating the treatment agent on the main surface of the substrate;
A drying apparatus according to any one of claims 1 to 7,
A processing film forming system comprising: In order from the upstream side along the transport direction of the base material,
A coating apparatus for coating the treatment agent on the main surface of the substrate;
A drying apparatus according to any one of claims 1 to 7,
A plurality of second air supply nozzles that have a second air supply port that opens toward the main surface of the substrate to be conveyed and are arranged along the conveyance direction, and gas that is supplied from an air supply source A plurality of air supply paths for supplying the gas to the plurality of second air supply nozzles, and a plurality of air flow paths that are provided in the plurality of air supply paths and adjust the flow rate of the gas supplied to the plurality of second air supply nozzles. And the same pattern drying device having the same opening pattern of the second air supply port in any of the plurality of second air supply nozzles,
A processing film forming system comprising:

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