CN209401630U - Has the pixel substrate of quantum dot - Google Patents
Has the pixel substrate of quantum dot Download PDFInfo
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- CN209401630U CN209401630U CN201920275762.0U CN201920275762U CN209401630U CN 209401630 U CN209401630 U CN 209401630U CN 201920275762 U CN201920275762 U CN 201920275762U CN 209401630 U CN209401630 U CN 209401630U
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- quantum dot
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Abstract
The utility model discloses a kind of pixel substrates for having quantum dot, and the pixel substrate of the tool quantum dot includes: a transparent substrate；One black matrix layer is formed in the surface of the transparent substrate, defines multiple pixel spaces；Multiple quantum dot glue-lines, are respectively formed in the pixel space；And wherein, which is made by the hardening of minus photoresist, and forms an angle less than 90 degree with the transparent substrate, and makes the bowl structure of those pixel spaces one inverted trapezoidal of composition.By the utility model, the pixel substrate with most simple processing procedure production tool quantum dot is realized, and quantum dot perfusion is allowed to be easy, production yield improves, and quantum dot can further be accelerated to apply to special technique effect of display technology process.
Description
Technical field
The utility model is about a kind of technology of quantum dots, especially in regard to a kind of pixel substrate for having quantum dot.
Background technique
Quantum dot (Quantum Dots) has become next-generation display skill as the application material of flat-panel screens technology
Aobvious of art.Quantum dot has characteristic below, and conversion spectrum can be (big by adjusting the nano-crystals of quantum dot with size adjusting
Small, size is in 1nm between 20nm), the optical properties such as luminous efficiency is high, stability of photoluminescence is good.Also, quantum dot is mostly nothing
Machine compound, performance are stablized, with the good characteristic of durability.So that technology of quantum dots becomes the concern of next-generation display technology
Emphasis.
Currently, having there is manufacturer to develop light emitting diode with quantum dots (Quantum Dots Light Emitting
Diodes, QD-LEDs), quantum dot Organic Light Emitting Diode (Quantum Dots Organic Light Emitting
Diodes, QD-LEDs) etc. display technologies.Current development mainly utilizes light emitting diode or the hair of Organic Light Emitting Diode
Light allows it to be transformed into and wants luminous frequency spectrum as the light source of quantum dot.It is either any to apply means, due to quantum dot
Process technique and the processing procedures of light emitting diode or organic light-emitting diodes differ widely, therefore, the pixel being made of quantum dot
The production of substrate, it is still necessary to the processing procedures with the two to separate at present.
Therefore, the processing procedure and its structure for how simplifying the pixel substrate that quantum dot is constituted, become current quantum dot
The developing direction that display technology development company is hoped for.
Utility model content
In order to achieve the above object, the utility model provides a kind of pixel substrate for having quantum dot, most simple processing procedure system can reach
Make the pixel substrate of tool quantum dot, and quantum dot perfusion is allowed to be easy, production yield improves, and can further quantum dot be accelerated to apply to
Special technique effect of display technology process.
It is according to the present utility model, a kind of pixel substrate for having quantum dot is provided, includes: a transparent substrate；One black square
Battle array layer, is formed in the surface of the transparent substrate, defines multiple pixel spaces；Multiple quantum dot glue-lines, are respectively formed in the pixel
In space；And wherein, which is made by the hardening of minus photoresist, and the black matrix layer and the transparent substrate shape
At an angle less than 90 degree, and make the bowl structure of those pixel spaces one inverted trapezoidal of composition.
For the above and other purpose, feature and advantage of the utility model can be clearer and more comprehensible, be cited below particularly it is several compared with
Good embodiment, and cooperate institute's accompanying drawings, it is described in detail below.
Detailed description of the invention
Fig. 1 is a kind of revealed flow chart of the production method for the pixel substrate for having quantum dot of the utility model；
Fig. 2A -2E is the production flow diagram of the sectional view of the part 2 of Fig. 3 B figure；
Fig. 3 A is to illustrate the pixel substrate 10 and its corresponding light-emitting substrate 20 of the tool quantum dot of the utility model
Schematic diagram；
Fig. 3 B is the pixel substrate 10 of the tool quantum dot of the utility model and its enlarged diagram of corresponding part 2；
And
Fig. 3 C is diagrammatic cross-section of the part 2 along A-A hatching of the pixel substrate 10 of the tool quantum dot of the utility model.
Symbol description:
2: part；
10: having the pixel substrate of quantum dot；
11: transparent substrate；
12: photoresist layer；
12-1: black matrix layer；
20: luminescent layer；
30-1,30-2,30-3,30-4,30-5,30-6: quantum dot glue-line；
40: light shield；
80: ultraviolet light；
90: light；
91: target light.
Specific embodiment
Embodiment according to the present utility model, the utility model make the pixel of tool quantum dot with exposure development processing procedure
Substrate allows quantum dot that can accurately be poured into the pixel as defined in black matrix layer so as to producing high-precision black matrix layer
In space, and then reach that processing procedure is simple, has the pixel substrate of quantum dot needed for high-resolution next generation's display technology, to make
For quantum dot displays use.
Referring to FIG. 1, a kind of revealed flow chart of the production method for the pixel substrate for having quantum dot of the utility model,
It please also refer to Fig. 2A -2E (production process of the sectional view of the part 2 of Fig. 3 B), have the production method of the pixel substrate of quantum dot
Include step S101 to step S105.
Step S101: a photoresist layer is formed in the surface of transparent substrate.For example, forming thickness gradually with spray coating method and being situated between
In the photoresist of 1.5um to 20um；Alternatively, forming thickness between the photoresist of 15um to 20um.Since extended meeting makes after this photoresist layer
Therefore minus photoresist is selected to make for the permanent material bed of material.In addition, this photoresist layer will be made as black matrix layer, it is therefore, optional
With the minus photoresist of doping black pigment.As shown in Fig. 2A, 2B, in the range of the part 2 of amplification, by transparent substrate 11
On film thickness produced between 1.5um to the photoresist layer 12 between 20um with spray coating method.
Step S102: the photoresist layer is exposed with a light shield.This light shield is the light shield for corresponding to black matrix layer
Pattern can be exposed with ultraviolet light.It as shown in Figure 2 C, can be to photoresist layer 12 with light shield 40 under the exposure of ultraviolet light 80
It is exposed.
Step S103: the photoresist layer not being exposed is removed, and the photoresist layer not being exposed is made as trapezium structure
Black matrix layer, to define multiple pixel spaces, and the black matrix layer and the transparent substrate form an angle less than 90 degree.By
In selected photoresist be minus photoresist, therefore, the part not being exposed, can developed dose dispose.And it stays
Part be then black matrix layer that the utility model stays in advance.Further, since the black matrix layer to be formed and transparent base
Angle between plate is trapezium structure less than 90 degree, can be in the time of the process choosing developer appropriate and development of development
To make this trapezium structure.The angle of the angle is between 45 to 90 degree, alternatively, the angle of the angle is between 60 to 85 degree
Between.Fig. 2 D is please referred to, the part not being exposed, and constitute black matrix layer 12-1.
Step S104: solidify the black matrix layer.For example, further allowing black matrix by way of heat cure or photocuring
Layer is cured as the permanent material bed of material.
Step S105: multiple pixel space is respectively corresponded to the quantum dot glue-line that corresponding pixel materials are perfused.Wherein,
The thickness of quantum dot glue-line is less than the thickness of black matrix layer, and between 1um between 15um.Please refer to Fig. 2 E, quantum dot glue-line
30-1,30-2,30-3,30-4,30-5,30-6 are independently formed in black matrix layer 12-1 and are formed by pixel space.
Wherein, transparent substrate 11 can be PET (polyethylene terephthalate, Polyethylene
Terephthalate, abbreviation PET) substrate, COP substrate, PC substrate, CPI substrate, glass substrate, polyvinyl butyral resin
(Polyvinyl Butyral Resin abbreviation PVB) substrate etc..Transparent substrate 10 is spent thoroughly in the light of visible light wave range is greater than 80%
More than.
Photoresist in the utility model uses negative photoresist, preferably, the photoresist layer of the utility model is using high-resolution
Negative light resistance agent.The material of photoresist layer is mainly by macromolecule resin (Resin), photosensitive initiator (Photo initiator), list
Body (Monomer), solvent (Solvent) and additive (Additives) are formed.
Wherein in the material of photoresist layer, the function of macromolecule resin (Resin) is adhesion, developability, pigment point
Dissipate property, mobility, heat resistance, endurance, analytic ability；The function of photosensitive initiator (Photo initiator) is photosensitive
Characteristic, analytic ability；The function of monomer (Monomer) is adhesion, developability, analytic ability；The function of solvent (Solvent)
It can be viscosity and coating property；The function of additive (Additives) is then coating, levelability and foaming characteristic.
Macromolecule resin (Resin) can be polymer or copolymer containing carboxylic acid group (COOH), such as acryl
(Acrylic) resin, acryl-epoxy (Epoxy) resin, the resistance to ware of acryl _ U.S. (Melamine) resin, acryl-benzene second
The resins such as alkene (Styrene) resin, phenol-phenolic aldehyde (Phenolic Aldehyde) resin, or any mixing of the above resin,
But not limited to this.The weight percentage ranges of resin in the photoresist can be 0.1% to 99%.
Monomer can divide water-insoluble and water-soluble monomer, wherein non-water soluble monomers (water-insoluble
It Monomer) can be penta erythritol triacrylate, trimethyl ether propane triacrylate, trimethyl ether propane trimethyl
Acrylate, three, two-ethyl alcohol isocyanurate triacrylates, two, trihydroxymethyl propane tetraacrylate, diisoamyl tetrol 5 third
Olefin(e) acid ester, five acrylate, tetraacethyl pentaerythritol；The own tetrol of six acetic acid two, six acetic acid diisoamyl tetrols, or be multiple functional radical
Monomer, tree-shaped/more clump of race's acrylate widow body, more clumps of a small bundle of straw, etc. for silkworms to spin cocoons on polyether acrylates, aethylis carbamas.Water-soluble monomer (water-
Soluble monomer) it then can be Ethoxylated (polyoxyethylene) (abbreviation EO) base and Propoxylated (polyoxy third
Alkene) (abbreviation PO) monomer (monomer)；Such as are as follows: two-(two-ethylene oxide ethylene oxides) vinylacrylic acid tenth of the twelve Earthly Branches purports, 15 are gathered
Ethylene oxide trihydroxymethyl propane triacrylate, 30 ethylene oxides two, two-is bis- to phenol methane diacrylate, 30 ethylene oxides
Two, two-is bis- to phenol dimethylamino methane base acrylic acid tenth of the twelve Earthly Branches purport, 20 ethylene oxide trihydroxymethyl propane triacrylates, 15 ethylene oxides three
Methanol propane triacrylate, 550 ethylene oxide monomethacrylates of methyl oxygen, 200 ethylene oxide diacrylates,
400 ethylene oxide diacrylate tenth of the twelve Earthly Branches purports, 400 ethylene oxide dimethylacrylates, 600 ethylene oxide diacrylates, 600 oxygen second
Alkene dimethylacrylate, polyoxypropylene monomethacrylates.Certainly two or more monomers (monomer) mixing can also be added
At co-monomer (co-monomer).The weight percentage ranges of monomer or co-monomer in the photoresist can be 0.1% to 99%.
Light initiator (Photo initiator) can be selected from acetophenone based compound (acetophenone), hexichol first
Ketone (Benzophenone) based compound or diimidazole based compound (bis_imidazole), benzoin based compound
(Benzoin), benzil based compound (Benzil), α-aminoketone based compound (α-amino ketone), acylphosphanes oxidation
Object based compound (Acyl phosphine oxide) or benzoyl formiate based compound are arbitrarily mixed with glazing initiator,
But not limited to this.The weight percentage ranges of light initiator in the photoresist can be to 0.1 to 10%.
Solvent (Solvent) can be glycol propyl ether (ethylene glycol monopropylether), diethylene glycol (DEG)
Dimethyl ether (di-ethylene glycol dimethyl ether), tetrahydrofuran, ethylene glycol monomethyl ether (ethylene glycol
Monomethyl ether), ethylene glycol ethyl ether (ethyleneglycol monoethyl ether), diethylene glycol monomethyl ether (di-
Ethylene glycol mono-methylether), carbitol (di-ethylene glycol mono-ethyl
Ether), diethylene glycol monobutyl ether (di-ethylene glycol mono-butyl ether), propylene glycol methyl ether acetate
(propylene glycol mono-methyl ether acetate), propylene-glycol ethyl ether acetate (propylene
Glycol mono-ethyl ether acetate), propylene glycol propyl ether acetate (propylene glycol mono-
Propyl ether acetate), 3- ethoxyl ethyl propionate (ethyl3_ethoxy propionate) etc. or the above solvent
Arbitrary mixing, but not limited to this.The weight percentage ranges of solvent in the photoresist can be 0.1% to 99%.
Additive is generally pigment dispersing agent, this composition that must be added for the photoresist containing pigment, it is generally non-from
Subtype surfactants are illustrated such as: Solsperse39000, Solsperse21000, the weight hundred of this dispersing agent in the photoresist
Dividing can be than range to 0.1 to 5%.
In the step S102 of the utility model, when being exposed, further include: (1) substrate cleaning (Substrate
Clean)；(2) it is coated with (Coating)；(3) soft roasting (pre-baking)；(4) (exposure) is exposed；(5) develop
(Developing) procedure of processings such as.
Then, Fig. 3 A is please referred to, which illustrate the tool pixel substrates 10 of quantum dot of the utility model and its corresponding
The schematic diagram of light-emitting substrate 20；Fig. 3 B is the pixel substrate 10 and its corresponding local 2 of the tool quantum dot of the utility model
Enlarged diagram；Fig. 3 C is that the part 2 of the pixel substrate 10 of the tool quantum dot of the utility model is illustrated along the section of A-A hatching
Figure.
Fig. 3 A-3C discloses the pixel substrate 10 of the tool quantum dot of the utility model, and it comprises: transparent substrates 11, black
Matrix layer 12-1 and multiple quantum dot glue-line 30-1,30-2,30-3,30-4,30-5,30-6.Wherein, black matrix layer 12-1 is formed
In the surface of transparent substrate 10, multiple pixel spaces are defined；Multiple quantum dot glue-line 30-1,30-2,30-3,30-4,30-5,
30-6 is then respectively formed in pixel space.Wherein, black matrix layer 12-1 by minus photoresist hardening be made, and with it is saturating
Bright substrate 10 forms an angle less than 90 degree, and multiple pixel space is made to constitute an inverted trapezoidal volume bowl structure, such as Fig. 3 C
It is shown.
It in figure 3 a, is the embodiment for having used luminescent layer 20.Luminescent layer 20 can be LED luminescent layer or OLED hair
Photosphere.The light 90 that control luminescent layer 20 is issued can be exchanged into target light after converting via the pixel substrate 10 of tool quantum dot
91。
Wherein, the thickness of black matrix layer 12-1 is between 1.5um between 10um；With regard to the utility model another embodiment and
Speech, the thickness of black matrix layer is between 10um between 20um.Wherein, the angle of angle is between 45 degree to 90 degree；With regard to this reality
For novel another embodiment, the angle of angle is between 60 degree to 85 degree.Wherein, multiple quantum dot glue-line 30-1,
The thickness of 30-2,30-3,30-4,30-5,30-6 are less than the thickness of black matrix layer 12-1, and between 1um between 9um.
The above is only the preferred embodiments of the utility model, and therefore it does not limit the scope of the patent of the utility model, all
Equivalent structure or equivalent flow shift made based on the specification and figures of the utility model, is applied directly or indirectly in
Other related technical areas are also included in the patent protection scope of the utility model.
Claims (7)
1. it is a kind of have quantum dot pixel substrate, characterized by comprising:
One transparent substrate；
One black matrix layer is formed in the surface of the transparent substrate, defines multiple pixel spaces；
Multiple quantum dot glue-lines, are respectively formed in the pixel space；And
Wherein, which is made by the hardening of minus photoresist, and the black matrix layer and the transparent substrate form one
Angle less than 90 degree, and make the bowl structure of one inverted trapezoidal of multiple pixel space composition.
2. as described in claim 1 tool quantum dot pixel substrate, which is characterized in that the thickness of the black matrix layer between
1.5um is between 10um.
3. the pixel substrate of tool quantum dot as described in claim 1, which is characterized in that the thickness of the black matrix layer is between 10um
To between 20um.
4. the pixel substrate of tool quantum dot as described in claim 1, which is characterized in that the angle of the angle is between 45 degree to 90
Between degree.
5. the pixel substrate of tool quantum dot as described in claim 1, which is characterized in that the angle of the angle is between 60 degree to 85
Between degree.
6. the pixel substrate of tool quantum dot as claimed in claim 2 or claim 3, which is characterized in that the thickness of multiple quantum dot glue-line
Degree is less than the black matrix layer, and between 1um between 15um.
7. the pixel substrate of tool quantum dot as claimed in claim 2 or claim 3, which is characterized in that the thickness of multiple quantum dot glue-line
Degree is less than the black matrix layer, and between 1um between 9um.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920275762.0U CN209401630U (en) | 2019-03-05 | 2019-03-05 | Has the pixel substrate of quantum dot |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201920275762.0U CN209401630U (en) | 2019-03-05 | 2019-03-05 | Has the pixel substrate of quantum dot |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111668254A (en) * | 2019-03-05 | 2020-09-15 | 恒煦电子材料股份有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
| CN112542098A (en) * | 2019-09-23 | 2021-03-23 | 恒煦电子材料股份有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
| CN112634766A (en) * | 2019-09-24 | 2021-04-09 | 恒煦电子材料股份有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
-
2019
- 2019-03-05 CN CN201920275762.0U patent/CN209401630U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111668254A (en) * | 2019-03-05 | 2020-09-15 | 恒煦电子材料股份有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
| CN112542098A (en) * | 2019-09-23 | 2021-03-23 | 恒煦电子材料股份有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
| CN112634766A (en) * | 2019-09-24 | 2021-04-09 | 恒煦电子材料股份有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
| CN112634766B (en) * | 2019-09-24 | 2023-04-07 | 恒煦电子材料国际有限公司 | Pixel substrate with quantum dots and manufacturing method thereof |
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Effective date of registration: 20220727 Address after: Unit 706, happy news building, 1 champley street, Hong Kong, China Patentee after: Hengxu Electronic Materials International Co.,Ltd. Address before: Five street Chinese Taiwan County of Hsinchu Aikou No. 5 lane 68 Chupei Patentee before: Hengyu Electronic Materials Co.,Ltd. |