CN209383334U - A kind of wafer lift mechanism - Google Patents
A kind of wafer lift mechanism Download PDFInfo
- Publication number
- CN209383334U CN209383334U CN201920003162.9U CN201920003162U CN209383334U CN 209383334 U CN209383334 U CN 209383334U CN 201920003162 U CN201920003162 U CN 201920003162U CN 209383334 U CN209383334 U CN 209383334U
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- CN
- China
- Prior art keywords
- wafer
- supporting platform
- top flat
- push
- electric machine
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
The utility model discloses a kind of wafer lift mechanism, including wafer-supporting platform, the wafer-supporting platform is connected on probe station by the installation pedestal of lower section；Uniformly distributed there are four slide opening at the center of the upper surface of the wafer-supporting platform, the installation pedestal is connect by link block with wafer top flat mechanism.The utility model is compact-sized, occupies little space, and wafer transhipment and fetching process are stablized, and effectively prevents the influence of wafer upper surface to be measured feature and ink dot to wafer is drawn, avoids the damage for causing wafer to be measured.
Description
Technical field
The utility model relates to automatic conveying device for silicon wafer field more particularly to a kind of wafer lift mechanisms.
Background technique
Probe station is the common test equipment of semiconductor test field, before detecting to wafer, usually passes through machinery
Wafer to be measured is transported on wafer-supporting platform by hand, and after wafer test, upper surface has feature and ink dot, in order to avoid machinery
Influence of the hand to wafer upper surface feature and ink dot, it is necessary to research and develop a kind of wafer lift mechanism, wafer has been lifted, thus side
Just manipulator takes the wafer being completed without damaging wafer away below wafer.
Utility model content
The purpose of the utility model is to provide a kind of wafer lift mechanisms, occupy little space, wafer transhipment and fetching process
Stablize, effectively prevents the influence of wafer upper surface to be measured feature and ink dot to wafer is drawn, avoid and cause wafer to be measured
Damage.
In order to solve the above technical problems, the utility model adopts the following technical solution:
A kind of wafer lift mechanism of the utility model, including wafer-supporting platform, the wafer-supporting platform are connected by the installation pedestal of lower section
It connects on probe station；It is uniformly distributed there are four slide opening at the center of the wafer-supporting platform upper surface, the installation pedestal by link block with
The connection of wafer top flat mechanism；
Wafer top flat mechanism includes frame body and lifting arm, and the upper end of the frame body is mounted in the installation pedestal,
The lifting arm is located at the lower section of the wafer-supporting platform, and one end of the lifting arm is provided with pallet, and the other end runs through the frame body
It is connect with lifting seat, push-rod electric machine, the working end of the push-rod electric machine and the lifting seat is provided with below the lifting seat
Connection, and the push-rod electric machine is mounted on the bottom plate of the frame body；It is evenly distributed on the pallet there are four vertical top flat column,
The upper end of each top flat column extends in the slide opening.
Further, the lifting arm is connected with sensor baffle, the side of the frame body in one end away from the pallet
Setting is there are two limit sensors on wall, the push-rod electric machine drive the sensor baffle rise or fall respectively with the limit
Level sensor cooperation, the push-rod electric machine are moved back and forth between two limit sensors by process control, are realized brilliant
It is round with the contact of the wafer-supporting platform or to separate.
Further, the upper end of the top flat column is provided with rubber pad.
Compared with prior art, the advantageous effects of the utility model:
A kind of wafer lift mechanism of the utility model, including wafer-supporting platform and wafer top flat mechanism, are passed through by push-rod electric machine
It drives lifting arm to rise, so that top flat column be driven to rise along slide opening, the survey wafer being completed is jacked up, to facilitate manipulator
The wafer being completed is taken away without damaging wafer below from wafer.The utility model is compact-sized, occupies little space, wafer
Transhipment and fetching process are stablized, and effectively prevent the influence of wafer upper surface to be measured feature and ink dot to wafer is drawn, avoid
Cause the damage of wafer to be measured.
Detailed description of the invention
The utility model is described in further detail for explanation with reference to the accompanying drawing.
Fig. 1 is the structural schematic diagram of the utility model wafer lift mechanism；
Fig. 2 is the structural schematic diagram of the wafer top flat mechanism of the utility model.
Description of symbols: 1, wafer-supporting platform；2, slide opening；3, wafer top flat mechanism；301, frame body；302, lifting arm；303,
Pallet；304, top flat column；305, lifting seat；306, sensor baffle；307, push-rod electric machine；308, limit sensors；4, it connects
Block；5, installation pedestal.
Specific embodiment
As shown in Fig. 1 to 2, a kind of wafer lift mechanism, including wafer-supporting platform 1, wafer-supporting platform 1 are mounted on by bolt assembly
It fills on pedestal 5, installation pedestal 5 is connected on probe station by bolt assembly, the installation of wafer-supporting platform 1, installation pedestal 5 and probe station
Belong to the prior art, details are not described herein.Uniformly distributed there are four slide opening 2 at the center of 1 upper surface of wafer-supporting platform, installation pedestal 5 passes through
Link block 4 is connect with wafer top flat mechanism 3, and link block 4 wafer top flat mechanism 3 can be isolated with wafer-supporting platform 1, due to testing
Cheng Zhong, wafer-supporting platform 1 have high voltage, if wafer top flat mechanism 3 is directly installed on wafer-supporting platform, high pressure can be to push-rod electric machine
307 impact, and link block 4 can prevent the high pressure in test process from impacting to push-rod electric machine 307.
Wafer top flat mechanism 3 includes frame body 301 and lifting arm 302, and the upper end of frame body 301 is mounted on by bolt assembly
It fills on pedestal 5, lifting arm 302 is located at the lower section of wafer-supporting platform 1, and one end of lifting arm 302 is welded with pallet 303, the other end
It is bolted after frame body 301 with lifting seat 305, the lower section of lifting seat 305 is provided with push-rod electric machine 307, push rod electricity
The working end of machine 307 is connected through a screw thread with lifting seat 305, and push-rod electric machine 307 is mounted on the bottom of frame body 301 by bolt assembly
On plate, uniformly distributed on pallet 303 there are four vertical top flat columns 304, and the lower end of each top flat column 304 is connected through a screw thread or welds
On pallet 303, the upper end of each top flat column 304 is extended in slide opening 2, to prevent damage of the top flat column 304 to wafer, top flat column
304 upper end is provided with rubber pad.Push-rod electric machine 307 is also known as linear push rod, can buy existing finished product on the market, herein not
It repeats again.
Lifting arm 302 is equipped with sensor baffle 306, sensor baffle 306 by bolt in one end away from pallet 303
For L shape, by bolt installation there are two limit sensors 308 on the side wall of frame body 301, push-rod electric machine 307 drives sensor gear
Piece 306 rises or falls to be cooperated with limit sensors 308 respectively, and motor 307 passes through program between two limit sensors 308
Control moves back and forth, and realizes wafer and the contact of wafer-supporting platform 1 or separates.Limit sensors 308 are specially groove type photoelectric switch, slot
Type optoelectronic switch can buy finished product on the market, and details are not described herein.
In the present embodiment, the control section of the utility model belongs to the prior art, and those skilled in the art completely can be with
Implement, details are not described herein.
The action process of the utility model is as follows:
Firstly, push-rod electric machine 307 drives lifting arm 302 and sensing when wafer to be measured is placed on wafer-supporting platform 1 by manipulator
Device baffle 306 rises, and lifting arm 302 drives top flat column 304 to rise along slide opening 2, when sensor baffle 306 reaches the limit at the upper limit
When level sensor 308, the upper end of top flat column 304 is close to the lower surface of wafer to be measured, while limit sensors 308 feed back signal
To controller, controller control push-rod electric machine 307 stops working, and controls manipulator and put down wafer to be measured, when crystalline substance to be measured
When circle falls on the upper end of top flat column 304, controller controls push-rod electric machine 307 and drives under lifting arm 302 and sensor baffle 306
Drop, lifting arm 302 drive top flat column 304 to decline along slide opening 2, and the wafer to be measured of 304 upper end of top flat column drops into the upper of wafer-supporting platform 1
Surface, when sensor baffle 306 reaches the limit sensors 308 at lower limit, push-rod electric machine 307 stops working, lifting arm
302 stop decline.
After wafer test, push-rod electric machine 307 drives lifting arm 302 and sensor baffle 306 to rise, top flat column
304 upper end jacks up wafer, and when sensor baffle 306 reaches the limit sensors 308 at the upper limit, controller controls push-rod electric machine
307 stop working, while manipulator takes wafer away below wafer.
Embodiment described above is only that the preferred embodiment of the utility model is described, not to the utility model
Range is defined, and under the premise of not departing from the spirit of the design of the utility model, those of ordinary skill in the art are practical new to this
The various changes and improvements that the technical solution of type is made should all fall into the protection scope that the utility model claims book determines
It is interior.
Claims (3)
1. a kind of wafer lift mechanism, including wafer-supporting platform (1), the wafer-supporting platform (1) is connected to by the installation pedestal (5) of lower section
On probe station；It is characterized by: uniformly distributed at the center of wafer-supporting platform (1) upper surface, there are four slide opening (2), the installation pedestals
(5) it is connect by link block (4) with wafer top flat mechanism (3)；
Wafer top flat mechanism (3) includes frame body (301) and lifting arm (302), and the upper end of the frame body (301) is mounted on institute
It states on installation pedestal (5), the lifting arm (302) is located at the lower section of the wafer-supporting platform (1), one end of the lifting arm (302)
It is provided with pallet (303), the other end is connect through the frame body (301) with lifting seat (305), under the lifting seat (305)
Side is provided with push-rod electric machine (307), and the working end of the push-rod electric machine (307) is connect with the lifting seat (305), and described
Push-rod electric machine (307) is mounted on the bottom plate of the frame body (301)；
Uniformly distributed on the pallet (303) there are four vertical top flat columns (304), and the upper end of each top flat column (304) extends to
In the slide opening (2).
2. wafer lift mechanism according to claim 1, it is characterised in that: the lifting arm (302) is deviating from the support
One end of disk (303) is connected with sensor baffle (306), and there are two limit sensors for setting on the side wall of the frame body (301)
(308), the push-rod electric machine (307) drive the sensor baffle (306) rise or fall respectively with the limit sensors
(308) cooperating, the push-rod electric machine (307) is moved back and forth between two limit sensors (308) by process control,
Realize the contact or separation of wafer and the wafer-supporting platform (1).
3. wafer lift mechanism according to claim 1, it is characterised in that: the upper end of the top flat column (304) is provided with
Rubber pad.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920003162.9U CN209383334U (en) | 2019-01-02 | 2019-01-02 | A kind of wafer lift mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920003162.9U CN209383334U (en) | 2019-01-02 | 2019-01-02 | A kind of wafer lift mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209383334U true CN209383334U (en) | 2019-09-13 |
Family
ID=67863456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920003162.9U Active CN209383334U (en) | 2019-01-02 | 2019-01-02 | A kind of wafer lift mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209383334U (en) |
-
2019
- 2019-01-02 CN CN201920003162.9U patent/CN209383334U/en active Active
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