CN209307479U - The vacuum coating equipment that a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated - Google Patents
The vacuum coating equipment that a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated Download PDFInfo
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- CN209307479U CN209307479U CN201821691449.7U CN201821691449U CN209307479U CN 209307479 U CN209307479 U CN 209307479U CN 201821691449 U CN201821691449 U CN 201821691449U CN 209307479 U CN209307479 U CN 209307479U
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- magnetron sputtering
- ion
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- vacuum chamber
- etching
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Abstract
The utility model discloses a kind of integrated ion(ic) etchings, the vacuum coating equipment that multi sphere ion and magnetron sputtering are integrated, it includes vacuum chamber, it is arranged in the indoor magnetron sputtering film unit of vacuum, it is symmetricly set on the workpiece support unit and arc source unit of magnetron sputtering film unit two sides, and the plasma being arranged on vacuum chamber generates unit, workpiece support unit includes a shaft, shaft electrical connection has a grid bias power supply part, inert gas feeding duct is provided on vacuum chamber, etching gas input channel and exhaust pipe, magnetron sputtering film unit includes cathode electrode column, angularly it is distributed in several magnetic control target magnet of cathode electrode column circumferential surface, by all magnetic control target magnet be wrapped in copper backboard and copper backboard is wrapped in interior tubulose magnetic control target.The function that heating surfaces of work pieces, ion(ic) etching cleaning, multi-arc ion plating film and magnetron sputtering plating carry out simultaneously may be implemented in the utility model, substantially increases coating quality and plating membrane efficiency.
Description
[technical field]
The utility model belongs to tool surface processing technology field, more particularly to a kind of integrated ion(ic) etching, multi sphere from
The vacuum coating equipment that son and magnetron sputtering are integrated.
[background technique]
Its surface needs plated film to strengthen its performance of raising to some workpiece in the production process, firstly, it is necessary in a secret room
It vacuumizes, is then heated, it is subsequent also to need Ion Cleaning, magnetron sputtering plating and multi sphere plated film, it is in the prior art, more
Kind plated film mode individually carries out, and has obvious score layer in the coating that workpiece surface is formed, and mutual binding force is poor, more
Arc ion film plating ion energy is strong, causes film layer to be handed over hard, the internal stress of film layer is big, but ion deposition speed is fast；And magnetron sputtering
The ion energy of plated film is weak, and the film layer of formation is softer, and film layer internal stress is small, but ion deposition speed is slow.
Therefore, it is necessary to provide a kind of integrated ion(ic) etching, the vacuum coating that multi sphere ion and magnetron sputtering are integrated
Machine solves the above problems.
[utility model content]
It is one the main purpose of the utility model is to provide a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering
It is same that heating surfaces of work pieces, ion(ic) etching cleaning, multi-arc ion plating film and magnetron sputtering plating may be implemented in the vacuum coating equipment of body
The function of Shi Jinhang substantially increases coating quality and plating membrane efficiency.
The utility model is achieved through the following technical solutions above-mentioned purpose: a kind of integrated ion(ic) etching, multi sphere ion and
The vacuum coating equipment that magnetron sputtering is integrated comprising vacuum chamber, setting the indoor magnetron sputtering film unit of the vacuum,
Be symmetricly set on magnetron sputtering film unit two sides workpiece support unit and arc source unit and be arranged in the vacuum
Plasma on room generates unit, and the workpiece support unit includes the shaft for driving workpiece synchronous rotary, and the shaft is electrical
It is connected with a grid bias power supply part, inert gas feeding duct, etching gas input channel and row are provided on the vacuum chamber
Feed channel, the magnetron sputtering film unit include cathode electrode column, are angularly distributed in the cathode electrode column circumferential surface
Several magnetic control target magnet, by all magnetic control target magnet be wrapped in copper backboard and in the copper backboard is wrapped in
Tubulose magnetic control target.
Further, the arc source unit includes being fixed on the vacuum chamber interior walls cathode arc target, above and below the vacuum chamber
It is wound with coil.
Further, heating device is additionally provided in the vacuum chamber.
Compared with prior art, a kind of integrated ion(ic) etching of the utility model, multi sphere ion and magnetron sputtering are integrated
The beneficial effect of vacuum coating equipment be: heating surfaces of work pieces, ion(ic) etching cleaning, multi-arc ion plating film and magnetic may be implemented
The function that sputter coating carries out simultaneously is controlled, coating quality and plating membrane efficiency are substantially increased.
[Detailed description of the invention]
Fig. 1 is the structural schematic diagram of the utility model embodiment；
Fig. 2 is the structural schematic diagram of magnetron sputtering film unit in the utility model embodiment；
Digital representation in figure:
101 workpiece；1 vacuum chamber；2 magnetron sputtering film units, 21 cathode electrode columns, 22 magnetic control target magnet, 23 copper backboards,
24 tubulose magnetic control targets；3 workpiece support units, 31 shafts；4 arc source units, 41 cathode arc targets；5 plasmas generate unit；6 partially
Voltage source part；7 inert gas feeding ducts；8 etching gas input channels；9 exhaust pipes；10 coils；11 heating devices.
[specific embodiment]
Embodiment:
Please refer to Fig. 1-Fig. 2, the present embodiment is the vacuum that integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated
Coating machine 100 comprising vacuum chamber 1, is symmetricly set on magnetron sputtering at the magnetron sputtering film unit 2 being arranged in vacuum chamber 1
The workpiece support unit 3 and arc source unit 4 of 2 two sides of film coating unit and the plasma being arranged on vacuum chamber 1 generate unit 5,
Workpiece support unit 3 includes the shaft 31 of driving 101 synchronous rotary of workpiece, and the electrical connection of shaft 31 has a grid bias power supply part 6, very
Inert gas feeding duct 7, etching gas input channel 8 and exhaust pipe 9 are provided in empty room 1.
Magnetron sputtering film unit 2 includes cathode electrode column 21, is angularly distributed in 21 circumferential surface of cathode electrode column
Several magnetic control target magnet 22, by all magnetic control target magnet 22 be wrapped in copper backboard 23 and by copper backboard 23 be wrapped in
Tubulose magnetic control target 24.
Arc source unit 4 includes being fixed on 1 inner wall cathode arc target 41 of vacuum chamber, and about 1 vacuum chamber is wound with coil 10.
Heating device 11 is additionally provided in vacuum chamber 1, for heating workpiece surface temperature.
The vacuum coating equipment 100 that the present embodiment integrates ion(ic) etching, multi sphere ion and magnetron sputtering are integrated is by setting
The magnetron sputtering film unit of column structure is set, and is symmetrical arranged rotatable workpiece support around magnetron sputtering film unit
Unit, by the way that magnetron sputtering plating can be realized to workpiece grounding or one grid bias power supply of application；By being set in vacuum chamber interior walls
Cathode multi-arc source target is set, realizes multi-arc ion plating film using arc discharge；Unit and vacuum chamber interior walls chamber are generated using plasma
Plasma is generated between body, realizes plasma etching under electric field action；It is clear to realize heating surfaces of work pieces, ion(ic) etching
It washes, the function that multi-arc ion plating film and magnetron sputtering plating carry out simultaneously, substantially increases coating quality and plating membrane efficiency.
Above-described is only some embodiments of the utility model.For those of ordinary skill in the art,
Without departing from the concept of the present invention, various modifications and improvements can be made, these belong to practical
Novel protection scope.
Claims (3)
1. the vacuum coating equipment that a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated, it is characterised in that: it is wrapped
Vacuum chamber is included, is arranged in the indoor magnetron sputtering film unit of the vacuum, is symmetricly set on the magnetron sputtering film unit
The workpiece support unit and arc source unit of two sides and the plasma being arranged on the vacuum chamber generate unit, the workpiece
Support unit includes the shaft for driving workpiece synchronous rotary, and the shaft electrical connection has a grid bias power supply part, the vacuum chamber
On be provided with inert gas feeding duct, etching gas input channel and exhaust pipe, the magnetron sputtering film unit packet
Include cathode electrode column, several magnetic control target magnet for being angularly distributed in the cathode electrode column circumferential surface, by all magnetic
Control target magnet is wrapped in interior copper backboard and the copper backboard is wrapped in interior tubulose magnetic control target.
2. the vacuum coating equipment that integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated as described in claim 1,
Be characterized in that: the arc source unit includes being fixed on the vacuum chamber interior walls cathode arc target, and the vacuum chamber winds wired up and down
Circle.
3. the vacuum coating equipment that integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated as described in claim 1,
It is characterized in that: being additionally provided with heating device in the vacuum chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821691449.7U CN209307479U (en) | 2018-10-18 | 2018-10-18 | The vacuum coating equipment that a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821691449.7U CN209307479U (en) | 2018-10-18 | 2018-10-18 | The vacuum coating equipment that a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated |
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| Publication Number | Publication Date |
|---|---|
| CN209307479U true CN209307479U (en) | 2019-08-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821691449.7U Active CN209307479U (en) | 2018-10-18 | 2018-10-18 | The vacuum coating equipment that a kind of integrated ion(ic) etching, multi sphere ion and magnetron sputtering are integrated |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110527966A (en) * | 2019-09-05 | 2019-12-03 | 西安交通大学 | A kind of horizontal magnetron sputtering apparatus for long tube plated film |
-
2018
- 2018-10-18 CN CN201821691449.7U patent/CN209307479U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110527966A (en) * | 2019-09-05 | 2019-12-03 | 西安交通大学 | A kind of horizontal magnetron sputtering apparatus for long tube plated film |
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