CN209231710U - Photoetching gum coating apparatus - Google Patents
Photoetching gum coating apparatus Download PDFInfo
- Publication number
- CN209231710U CN209231710U CN201920167999.7U CN201920167999U CN209231710U CN 209231710 U CN209231710 U CN 209231710U CN 201920167999 U CN201920167999 U CN 201920167999U CN 209231710 U CN209231710 U CN 209231710U
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- CN
- China
- Prior art keywords
- coating apparatus
- swivel plate
- gum coating
- photoetching gum
- photoresist
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Abstract
The utility model discloses a kind of photoetching gum coating apparatus, the photoetching gum coating apparatus includes support platform and rotation shell；The support platform is in horizontally disposed and is configured to be rotated around own axes to drive the glass substrate being placed on it to rotate；The rotation shell includes horizontally disposed swivel plate and the stop wall at edge that the swivel plate is circumferentially arranged in, the swivel plate is arranged below the support platform and can be around own axis, the level height of the upper end of the stop wall is higher than the level height of the support platform, it is provided with recovery port at the link position of the stop wall and the swivel plate, the returnable being connected to the recovery port is provided with below the recovery port.The utility model can in time recycle used photoresist, to improve the utilization rate of photoresist, reduce the cost of manufacture of color filter film.
Description
Technical field
The utility model relates to the processing technique fields of color filter film, more particularly to a kind of photoetching gum coating apparatus.
Background technique
There are many films in liquid crystal display panel, wherein very important one kind is exactly color filter film, is responsible for supply display
Device provides color and is used, itself is resin material, is formed after having the tri- color region RGB, light to penetrate these regions above
Coloured picture, color filter film about occupy the 20% of panel material, are the key technologies that display realizes color.
Currently, the manufacturing process of color filter film includes the techniques such as coating, exposure, development and baking, and is needed in production
Many chemical liquid materials, such as photoresist, developer solution etc. are wanted, wherein photoresist is primary in color filter film manufacturing process
Critical material and fairly expensive, existing photoresist coating process generallys use the mode of centrifugal coating, still, existing light
There is no setting photoresist recyclable devices for photoresist rotary coating device, this allows for the presence of photoresist benefit in the actual production process
It is low with rate and be difficult to the problem of effectively recycling.
Utility model content
The purpose of this utility model is to overcome problems of the existing technology, provide a kind of photoetching gum coating apparatus,
The photoetching gum coating apparatus can in time recycle used photoresist, to improve the utilization rate of photoresist, drop
The low cost of manufacture of color filter film.
To achieve the goals above, the utility model provides a kind of photoetching gum coating apparatus, the photoetching gum coating apparatus
Including support platform and rotation shell；The support platform is in horizontally disposed and is configured to rotate around own axes with band
The dynamic glass substrate rotation being placed on it；The rotation shell includes horizontally disposed swivel plate and is circumferentially arranged
Stop wall at the edge of the swivel plate, the swivel plate are arranged below the support platform and can turn around own axes
Dynamic, the level height of the upper end of the stop wall is higher than the level height of the support platform, the stop wall and the rotation
It is provided with recovery port at the link position of plate, the returnable being connected to the recovery port is provided with below the recovery port.
Preferably, the cross section of the inner wall of the stop wall is in polygonized structure, and the recovery port is arranged described polygon
The interior corner locations of shape structure.
Preferably, the stop wall is vertically installed in the swivel plate.
Preferably, the cross section is in regular polygon structure.
Preferably, the lower part of the returnable is provided with delivery pipe, is provided with valve on the delivery pipe.
Preferably, the photoetching gum coating apparatus includes recovery approach, and the recovery approach is fixed at the rotation
The lower section of plate and the delivery pipe can pass through the surface of the recovery approach.
Preferably, the photoetching gum coating apparatus includes the peripheral framework for being circumferentially positioned at the outside of the rotation shell,
The lower part of the peripheral framework is arranged in the recovery approach.
Preferably, the photoetching gum coating apparatus includes matching and capable of covering from top with the shape of the rotation shell
The lid of the swivel plate is covered, the photoresist inlet that can allow for photoresist to pass through is offered on the lid.
Preferably, the lid includes that can cover the ceiling plate portion of the swivel plate and circumferentially be arranged the lid
The wall that hangs down at the edge in plate portion, the lid are configured to when the ceiling plate portion covers the swivel plate, and the wall that hangs down can
It is circumferentially positioned at the outside of the stop wall.
Preferably, the photoetching gum coating apparatus includes the rotary shaft connecting with external driving mechanism, and the support is flat
Platform and the rotation shell are coaxially installed on the rotary shaft.
Through the above technical solutions, since photoresist flows to rotation from the edge of glass substrate under the influence of centrifugal force
Swivel plate on, and continue to flow to the edge of swivel plate under the influence of centrifugal force, most terminate and be butted at stop wall, then pass through
The recovery port at the link position of stop wall and the swivel plate flows in returnable, to realize having for photoresist
Effect recycling.
Detailed description of the invention
Fig. 1 is that the photoetching gum coating apparatus of the utility model removes the schematic top plan view after lid and glass substrate；
Fig. 2 is the cross-sectional view of AA line in Fig. 1.
Specific embodiment
Specific embodiment of the present utility model is described in detail below in conjunction with attached drawing.It should be understood that herein
Described specific embodiment is only used for describing and explaining the present invention, and is not intended to limit the utility model.
As depicted in figs. 1 and 2, the photoetching gum coating apparatus of the utility model includes support platform 2 and rotation shell 3；
Support platform 2 is in horizontally disposed and is configured to be rotated around own axes to drive the glass substrate being placed on it 9 to rotate；
The stop wall 3H that shell 3 includes horizontally disposed swivel plate 3G and the edge that swivel plate 3G is circumferentially arranged in is rotated,
Swivel plate 3G is arranged below support platform 2 and can be around own axis, and the level height in the upper end of stop wall 3H is high
In the level height of support platform 2, it is provided with recovery port 6 at the link position of stop wall 3H and swivel plate 3G, under recovery port 6
Side is provided with the returnable 7 being connected to recovery port 6.
When needing to 9 coating photoresist of glass substrate, glass substrate 9 is placed in support platform 2, support platform is made
2 drive glass substrate 9 to rotate, and then provide photoresist to glass substrate 9, and rotating glass substrate 9 generates photoresist
Centrifugal force, photoresist is flowed to the edge of glass substrate 9 under the influence of centrifugal force, to be diffused in the surface of glass substrate 9
To complete coating work, the photoresist stayed on glass substrate 9 forms color filter film.Photoresist is under the influence of centrifugal force
From the swivel plate 3G that the edge of glass substrate 9 flows to rotation, and continue the side to swivel plate 3G under the influence of centrifugal force
It along flowing, most terminates and is butted at stop wall 3H, then the recovery port 6 at the link position for passing through stop wall 3H and swivel plate 3G flows
Into returnable 7, to realize effective recycling of photoresist.
Moreover, by level height that the level height of the upper end of stop wall 3H is set above to support platform 2 (due to
Ordinary circumstance lower glass substrate 9 is relatively thin, therefore its height can be ignored, if but when glass substrate 9 has certain thickness
When, it should here be understood that being set above the level height of glass substrate 9 for the level height of the upper end of stop wall 3H), thus
Photoresist can be made not flown out except stop wall 3H when being thrown away by glass substrate 9, therefore can guarantee the recycling of photoresist
Amount.
And in order to make can to fall into rotation shell 3 from the photoresist thrown away above glass substrate 9, it should to prop up
Support the plane locating for swivel plate 3G of platform 2 projection be completely disposed in the surface of swivel plate 3G, therefore, the utility model it is excellent
It selects in embodiment, support platform 2 and swivel plate 3G is coaxially disposed and the area of 2 upper surface of support platform is less than swivel plate 3G
The area of upper surface.
To flow to photoresist can fast and efficiently at recovery port 6 in rotation shell 3, it is preferable that stop wall 3H
The cross section of inner wall be in polygonized structure, the interior corner locations of polygonized structure are arranged in recovery port 6.That is, being centrifuged
Under the action of power, photoresist is mobile more easily along the inner wall of stop wall 3H and is deposited in the interior corner locations of polygonized structure, by
It is arranged in recovery port 6 in interior corner locations, therefore improves the efficiency that photoresist flows to recovery port 6.
It should be understood that the angle between stop wall 3H and swivel plate 3G can be acute angle, obtuse angle or right angle, as long as only
Retaining wall 3H can stop photoresist to fly out to rotate shell 3.In some embodiments, the revolving speed of swivel plate 3G is very fast, such as
Angle between fruit stop wall 3H and swivel plate 3G is arranged in obtuse angle, and photoresist may continue under the influence of centrifugal force
The short transverse of stop wall 3H is mobile, rotates except shell 3 until flying out, this is that the utility model wishes the case where avoiding.Cause
This, it is preferable that stop wall 3H is vertically installed in swivel plate 3G, accordingly even when the revolving speed of swivel plate 3G is very fast, photoresist will not
The short transverse for continuing on stop wall 3H under the influence of centrifugal force is mobile, so that guaranteeing that photoresist will not fly out rotates shell
Except 3.It should be further noted that further increase the recycling speed of photoresist, between stop wall 3H and swivel plate 3G
Angle can be set to acute angle, since the upper end of stop wall 3H is consistently higher than support platform 2, photoresist is from glass base
Plate 9 is certain to fall on stop wall 3H when flying out, and photoresist can directly be dropped in swivel plate under the effect of gravity
3G is upper rather than flows downward on swivel plate 3G along stop wall 3H, and the speed of drippage is greater than the speed of flowing certainly, because
And the recycling speed of photoresist is improved, shorten the recovery time of photoresist.
It is to be appreciated that since photoresist is in stickiness, if having accumulated too many photoresist at some recovery port 6,
The efficiency that then photoresist flows in returnable 7 will reduce, to solve this problem, it is preferable that cross section is in just polygon
Recovery port 6 is arranged in each interior corner locations of regular polygon structure in shape structure, this can be such that photoresist equably flows
To each recovery port 6, thus the phenomenon that avoiding most of photoresists from concentrating at some recovery port 6.
In preferred embodiments of the present invention, the lower part of returnable 7 is provided with delivery pipe, is arranged on delivery pipe
There is valve 7B.After photoresist stores a certain amount of in returnable 7, valve 7B can be opened, by the light in returnable 7
Photoresist discharge, so that returnable 7 can continue to receive photoresist.
Specifically, photoetching gum coating apparatus includes recovery approach 8, if needing that recovery approach 8 is cleared up or tieed up
When repairing, in order to not influence the coating work of glass substrate 9, recovery approach 8 is fixed at the lower section of swivel plate 3G and discharge
Pipe can pass through the surface of recovery approach 8.That is, when rotating shell 3 and support platform 2 when rotated, recovery approach 8
Stationary state is still maintained, thus easy cleaning and maintenance work.When needing photoresist being expelled to recovery approach 8, control
Swivel plate 3G stops rotating, and the delivery pipe of returnable 7 is made to stop at the surface of recovery approach 8, then opens valve
Photoresist in returnable 7 is expelled in recovery approach 8 by 7B.
Specifically, photoetching gum coating apparatus includes the peripheral framework 10 for being circumferentially positioned at the outside of rotation shell 3, recycling is logical
The lower part of external surrounding frame body 10 is arranged in road 8.That is, as shown in Fig. 2, peripheral framework 10 in a ring, and peripheral framework 10
Outer wall as recovery approach 8.
To be reduced as far as glass substrate 9 during coating by the interference of dust, it is preferable that photoresist coating
Device includes matching with the shape of rotation shell 3 and capable of covering from above the lid 4 of swivel plate 3G, is offered on lid 4
The photoresist inlet 5 that can allow for photoresist to pass through.Lid 4 backstop dust can be fallen on glass substrate 9 as far as possible, and light
Photoresist inlet 5 can allow for photoresist to flow on glass substrate 9.
To further increase leakproofness of the glass substrate 9 in coating process, it is preferable that lid 4 includes that can cover rotation
The ceiling plate portion 4G of rotating plate 3G and be circumferentially arranged ceiling plate portion 4G edge the wall 4H that hangs down, lid 4 is configured to work as cover board
When portion 4G covers swivel plate 3G, the wall 4H that hangs down can be circumferentially positioned at the outside of stop wall 3H.That is, in the utility model
Preferred embodiment in, ceiling plate portion 4G and swivel plate 3G are coaxially disposed, and the area of the lower surface ceiling plate portion 4G is greater than swivel plate 3G
The area of upper surface, so that stop wall 3H is coated in it by the wall 4H that makes to hang down completely.
In preferred embodiments of the present invention, photoetching gum coating apparatus includes connecting with external driving mechanism
Rotary shaft 1, support platform 2 and swivel plate 3G are coaxially installed on rotary shaft 1.However, it is to be understood that 2 He of support platform
Swivel plate 3G can also be driven by different driving devices to be rotated, and has different rotation speeds, or even realize support
Only one rotation in platform 2 and swivel plate 3G and the static working method of another one.
The photoetching gum coating apparatus of the utility model can in time recycle used photoresist, to improve
The utilization rate of photoresist reduces the cost of manufacture of color filter film.
Preferred embodiments of the present invention, still, the utility model and unlimited are described in detail in conjunction with attached drawing above
In this.In the range of the technology design of the utility model, a variety of simple variants can be carried out to the technical solution of the utility model,
In order to avoid unnecessary repetition, no further explanation will be given to various combinations of possible ways for the utility model.But these simple changes
Type and combination equally should be considered as content disclosed in the utility model, belong to the protection scope of the utility model.
Claims (10)
1. a kind of photoetching gum coating apparatus, which is characterized in that the photoetching gum coating apparatus includes support platform (2) and rotation
Shell (3)；
The support platform (2) is in horizontally disposed and is configured to be rotated around own axes to drive the glass being placed on it
Substrate (9) rotation；
The rotation shell (3) includes horizontally disposed swivel plate (3G) and is circumferentially arranged in the swivel plate (3G)
Edge stop wall (3H), the swivel plate (3G) setting is below the support platform (2) and can be around own axes turn
Dynamic, the level height of the upper end of the stop wall (3H) is higher than the level height of the support platform (2), the stop wall (3H)
It is provided with recovery port (6) at the link position of the swivel plate (3G), is provided with and described time below the recovery port (6)
The returnable (7) of closing in (6) connection.
2. photoetching gum coating apparatus according to claim 1, which is characterized in that the inner wall of the stop wall (3H) it is transversal
Face is in polygonized structure, and the interior corner locations of the polygonized structure are arranged in the recovery port (6).
3. photoetching gum coating apparatus according to claim 2, which is characterized in that the stop wall (3H) is vertically installed in institute
State swivel plate (3G).
4. photoetching gum coating apparatus according to claim 2, which is characterized in that the cross section is in regular polygon structure.
5. photoetching gum coating apparatus according to claim 1, which is characterized in that the lower part of the returnable (7) is arranged
There is delivery pipe, valve (7B) is provided on the delivery pipe.
6. photoetching gum coating apparatus according to claim 5, which is characterized in that the photoetching gum coating apparatus includes recycling
Channel (8), the recovery approach (8) is fixed at the lower section of the swivel plate (3G) and the delivery pipe can pass through institute
State the surface of recovery approach (8).
7. photoetching gum coating apparatus according to claim 6, which is characterized in that the photoetching gum coating apparatus includes surrounding
Peripheral framework (10) in the outside of rotation shell (3) is set, and recovery approach (8) setting is in the peripheral framework
(10) lower part.
8. photoetching gum coating apparatus according to claim 1, which is characterized in that the photoetching gum coating apparatus includes and institute
The shape for stating rotation shell (3) matches and can cover from above the lid (4) of the swivel plate (3G), the lid (4)
On offer the photoresist inlet (5) that can allow for photoresist to pass through.
9. photoetching gum coating apparatus according to claim 8, which is characterized in that the lid (4) includes that can cover institute
It states the ceiling plate portion (4G) of swivel plate (3G) and the wall that hangs down (4H) at the edge of the ceiling plate portion (4G), institute is circumferentially set
It states lid (4) to be configured to when the ceiling plate portion (4G) covers swivel plate (3G), the wall that hangs down (4H) can surround and set
It sets in the outside of the stop wall (3H).
10. photoetching gum coating apparatus described in any one of -9 according to claim 1, which is characterized in that the photoresist applies
Cloth apparatus includes the rotary shaft (1) connecting with external driving mechanism, the support platform (2) and the rotation shell (3)
It is coaxially installed on the rotary shaft (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920167999.7U CN209231710U (en) | 2019-01-30 | 2019-01-30 | Photoetching gum coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920167999.7U CN209231710U (en) | 2019-01-30 | 2019-01-30 | Photoetching gum coating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209231710U true CN209231710U (en) | 2019-08-09 |
Family
ID=67510983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920167999.7U Active CN209231710U (en) | 2019-01-30 | 2019-01-30 | Photoetching gum coating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209231710U (en) |
-
2019
- 2019-01-30 CN CN201920167999.7U patent/CN209231710U/en active Active
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| GR01 | Patent grant | ||
| GR01 | Patent grant |