JPH081067A - Cleaning structure of rotary-cup liquid chemicals treating device - Google Patents

Abstract

PURPOSE:To surely and rapidly clean the inside of a liq. chemicals treating device without disassembling it. CONSTITUTION:This device is provided with a rotary cup 2 with a freely detachable hood 3 formed to the upper opening and plural chemicals discharge holes formed an annular weir 22a, a bearing to support the cup 2 corotatably around the center of a vertical shaft and a casing having chemicals recovery passage surrounding the annular weir 22a of the cup 2 and the bottom face of the weir 22a and corresponding to the chemicals discharge holes. The upper cleaning soln. passage 43a and lower cleaning soln. passage 43b for supplying the cleaning liquid in the vicinity of the discharge holes outside the weir 22a are formed in the casing.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the formation of a thin film on the surface of a wafer, a mask, a liquid crystal panel or the like, or the development or etching of the surface in the manufacturing process of semiconductor devices and masks, liquid crystal panels, etc. The present invention relates to a cleaning structure for a rotary cup type chemical liquid processing device using centrifugal force.

[0002]

2. Description of the Related Art In a semiconductor manufacturing process, a coating film on which a chemical solution such as a photosensitive solution is uniformly applied is formed on a substrate such as a wafer. A predetermined process is applied to such a coating film to manufacture a semiconductor product. The thickness of the coating film is usually as thin as several microns or less, and a uniform thickness is required, so that the above requirement can be satisfied.
The chemical liquid processing device 10 as shown in FIG.

As shown in this figure, the chemical treatment device 10
Has a configuration including a rotary cup 20, a hood 30 that covers the upper surface of the rotary cup 20, and a casing 40 that rotatably supports the rotary cup 20 around its axis and covers the outer peripheral portion. There is. The substrate B is adsorbed and arranged on the upper surface of the rotating cup 20, the chemical liquid is dropped on the base B, and the rotary cup 20 is covered with the hood 30 to rotate the rotary cup 20 at a high speed. Thus, a uniform coating film is formed on the substrate B.

A hood 3 is provided on the outer peripheral edge of the rotary cup 20.
0 and the rotating cup 20 between the base mounting space S
A plurality of discharge holes 201 that communicate between the casing 4 and the outside are bored, and excess chemical liquid is introduced into the casing 4 through these discharge holes 201.
It is designed to be discharged into the recovery passage 401 provided at 0.

By the way, since the chemical liquid dripped on the surface of the base B is usually a very viscous liquid, the base B is sequentially subjected to the predetermined chemical liquid treatment as described above in the rotary cup 20. If left to stand, the chemical liquid remains in the rotary cup 20. Since the remaining chemical liquid is dried and becomes dust, which causes an inconvenience such as adversely affecting the substrate B to be processed next, the cleaning process in the rotary cup 20 is usually performed every time a predetermined number of substrates B are processed. It

In the above cleaning process, the tip of the movable cleaning nozzle is exposed to the inside of the rotating cup 20 while the hood 30 is retracted upward and the rotating cup 20 is rotated, and the cleaning liquid is sprayed from the cleaning nozzle. Is common. By doing so, the cleaning liquid supplied into the rotary cup 20 moves in the radial direction while being diffused by the centrifugal force due to the high speed rotation of the rotary cup 20, and the chemical liquid adhering to the inside is washed away. The cleaning liquid in which the chemical liquid is dissolved is discharged from the discharge hole 201 into the recovery passage 401.

[0007]

Although the inside of the rotary cup 20 is always cleaned by the above-mentioned cleaning process,
The deposition of the chemical liquid is not limited to the rotary cup 20. That is, during normal operation, the chemical liquid is scattered in the radial direction by the rotation of the rotary cup 20, and is collected in the recovery passage 401 through the discharge hole 201. Therefore, the chemical liquid is in the outer peripheral surface of the rotary cup 20 and inside the recovery passage 401. It also adheres to the wall surface and grows. If such adhesion and deposition of chemicals is left, various parts of the passage for the recovered chemical may be blocked.

Further, the pressure fluctuations in the vicinity of the outer periphery of the rotary cup 20 due to the change in rotation of the rotary cup 20 cause the recovery passage 4
An air flow is generated from 01 toward the back surface of the rotating cup 20.
Then, the collected chemical liquid is entrained in the air flow and the collected chemical liquid is rotated by the rotating cup
Since it enters into the narrow back surface part of the above, the chemical liquid also adheres to this part, which interferes with the normal rotation of the rotary cup 20. Further, the chemical liquid adhering to this portion is dried and becomes dust, and the dust flows into the rotary cup 20 by being multiplied by the change in the rotation of the rotary cup 20 and the pressure fluctuation in the rotary cup 20 due to the lifting and lowering of the hood 30. B may be adversely affected.

Therefore, conventionally, the chemical liquid processing apparatus 10 is regularly disassembled to clean the narrow portion, but disassembling and cleaning one by one is troublesome, and a great deal of manpower and time are consumed. There was a problem that it was done.

The present invention has been made in order to solve the above-mentioned problems, and can be achieved without disassembling the chemical liquid processing device.
An object of the present invention is to provide a cleaning structure for a rotary cup type chemical liquid processing device capable of reliably and promptly cleaning chemical liquid attached to a narrow portion of the chemical liquid processing device.

[0011]

According to a first aspect of the present invention, there is provided a cleaning structure for a rotary cup type chemical liquid treatment device, which is supported so as to be able to rotate about an axis of a vertical shaft supported by a bearing body, and Rotation comprising a rotating cup having a plurality of chemical liquid discharge holes in an outer peripheral wall portion and a casing surrounding the outer peripheral wall portion of the rotary cup and having an annular chemical liquid recovery passage corresponding to the chemical liquid discharge hole In the cup type chemical liquid processing device,
In the casing, a cleaning liquid passage having a front end opening facing the chemical liquid discharge hole is provided.

According to a second aspect of the present invention, there is provided a cleaning structure for a rotary cup type chemical liquid treatment device, which is supported so as to be rotatable about an axis of a vertical shaft supported by a bearing body, and has a plurality of outer peripheral wall portions. A rotary cup provided with a chemical discharge hole, and an outer peripheral wall of the rotary cup and a bottom surface of the outer peripheral wall are surrounded, and
In a rotary cup type chemical liquid treatment device comprising a casing having an annular chemical liquid recovery passage corresponding to the chemical liquid discharge hole, a casing facing the bottom surface of the outer peripheral wall of the rotary cup is centered on the axis of a vertical axis. An annular cleaning liquid groove is formed, and a cleaning liquid passage is connected to the cleaning liquid groove.

According to a third aspect of the present invention, there is provided a cleaning structure for a rotary cup type chemical liquid processing device according to a second aspect of the present invention, in which the cleaning liquid groove is provided outside the cleaning liquid groove. Is characterized in that a cleaning hole communicating with the upper surface of is formed.

[0014]

According to the cleaning structure of the rotary cup type chemical liquid processing device of the first aspect, since the cleaning liquid passage having the tip opening facing the chemical liquid discharge hole is provided in the casing, the rotary cup is mounted on the vertical shaft. If the cleaning liquid is supplied through the cleaning liquid passage in a state of being rotated about the axis of the cleaning liquid, the cleaning liquid is injected into the chemical liquid discharge hole on the outer side of the outer peripheral wall, and the chemical liquid adhering to the hole or its periphery is discharged. The outer peripheral wall is cleaned by being dissolved in the cleaning liquid, and the cleaning liquid scatters radially outward of the rotary cup due to centrifugal force.

By the scattering of the cleaning liquid, the chemical liquid adhering to the chemical liquid recovery passage of the casing is washed away, and the interior of the chemical liquid recovery passage is cleaned. The cleaning liquid in which the chemical liquid is dissolved is discharged out of the system through the chemical liquid recovery passage.

According to the cleaning structure of the rotary cup type chemical liquid processing device of the second aspect, the casing facing the bottom surface of the outer peripheral wall of the rotary cup has an annular cleaning liquid groove centered on the axis of the vertical shaft. Since the cleaning liquid passage is connected to the cleaning liquid groove, the cleaning liquid fed into the cleaning liquid passage in the rotating state of the rotary cup is once supplied into the annular cleaning liquid groove and is filled in the groove. It is guided by the rotation of the rotary cup and moves in the groove in the rotation direction.

A centrifugal force is applied to the cleaning liquid by the circular motion along the groove, and the cleaning liquid receives a force which goes over the outer wall of the cleaning liquid groove and is directed in the radial direction. From the gap between the bottom surface of the section and the upper surface of the casing facing it, the particles scatter outward and are trapped in the chemical recovery passage. Such scattering of the cleaning liquid effectively dissolves and removes the above-mentioned gap, the chemical liquid in the vicinity of the chemical liquid discharge hole of the rotary cup, and further the chemical liquid adhering to the recovery passage.

Even if the rotary cup is not rotating,
Since the cleaning liquid overflowing from the cleaning liquid groove flows down through the gap, the chemical liquid adhering to the gap and the upper surface of the casing can be dissolved and removed.

According to the cleaning structure of the rotary cup type chemical liquid processing apparatus of the third aspect, the cleaning liquid groove is formed outside the cleaning liquid groove so as to communicate with the upper surface of the chemical liquid recovery passage. A part of the cleaning liquid overflowing from is discharged from the cleaning hole into the chemical liquid recovery passage, and descends while wetting the inner wall surface of the passage. By the descent of the cleaning liquid along the inner wall surface in a planar diffusion state, the portion that is likely to become a blind spot in the chemical liquid recovery passage is effectively cleaned.

[0020]

1 is a partially cutaway perspective view showing an example of a rotary cup type chemical treatment device to which the cleaning structure of the present invention is applied, and FIG. 2 is a sectional view taken along line AA. As shown in these figures, the chemical treatment device 1 attaches and detaches a disc-shaped rotary cup 2, a hood 3 covering the upper surface of the rotary cup 2, a casing 4 in which the rotary cup 2 is fitted, and a hood 3. The hood attachment / detachment mechanism 5, the cup rotation mechanism 6 for rotating the rotary cup 2, and the elevating mechanism 7 for elevating / lowering the intermediate diameter shaft portion 21 are included.

The rotary cup 2 comprises a medium diameter shaft portion 21 and an annular dish portion 22. The upper surface of the annular dish portion 22 is dimensioned so as to be flush with the upper surface of the medium-diameter shaft portion 21 or slightly flush with the upper surface of the medium-diameter shaft portion 21. B is placed so as to coincide with the central axis of the medium diameter shaft portion 21. An annular weir portion (outer peripheral wall portion) 22a protruding upward is provided on the outer peripheral edge of the annular dish portion 22, and the annular weir portion 22a receives the hood 3. The base mounting space S is formed in a portion surrounded by the annular weir portion 22a with the hood 3 attached.

A plurality of small-diameter discharge holes 201 are formed at predetermined intervals on the peripheral surface of the lower portion of the annular weir portion 22a and are inclined downward from the substrate mounting space S outward. Excess chemical liquid in the board mounting space S is discharged to the outside through the hole 201.

A concentric rotary shaft (vertical shaft) 23 is rotatably coupled to the lower portion of the medium-diameter shaft portion 21. An intake passage 23a is formed in the shaft center portion of the medium diameter shaft portion 21 and the rotary shaft 23 so as to penetrate them, and a tube 23b connected to the lower end portion of the rotary shaft 23 by operating a vacuum pump (not shown). The base B is sucked into the medium diameter shaft portion 21 via the.

The rotary cup 2 is fixed to the large-diameter shaft portion 24 with the small-diameter portion of the medium-diameter shaft portion 21 fitted in the cylindrical hole of the cylindrical large-diameter shaft portion 24. A flange portion 24a is formed on an upper portion of the large diameter shaft portion 24, and the annular dish portion 22 of the rotary cup 2 is fixed to the flange portion 24a.

The lower portion of the large-diameter shaft portion 24 is fitted into the mounting hole P1 formed in the support frame P, and the support cylinder 25 having a flange (bearing body) 25a on the outer peripheral surface thereof is supported by the bearing 26.
It is fitted through. Therefore, the rotary cup 2 is rotatable about the axis of the rotary shaft 23 with respect to the support base P.

The hood 3 has a hood main body 31, a cylindrical grip portion 32 having a central portion of the hood main body 31 protruding upward, and a bulging edge portion 33 in which an outer peripheral edge portion of the hood main body 31 bulges upward. It consists of This bulge 33
Is provided corresponding to the annular weir portion 22a, and the bottom portion of the bulging edge portion 33 contacts the upper surface portion of the annular weir portion 22a to close the rotary cup 2. On the top portion of the grip portion 32, the body portion 3 under the hood attachment / detachment mechanism 5 to enable attachment / detachment operation is performed.
A collar portion 32b having a diameter larger than that of 2a is formed.

As shown in FIG. 3, on the upper surface of the annular dam 22a formed on the outer peripheral portion of the rotary cup 2, there are two strips of an annular inner protrusion 27 and outer protrusion 28 having a rectangular cross section. Projections are provided at predetermined intervals in the radial direction. An annular retaining piece 28a protruding inward is provided on the inner peripheral surface of the outer protrusion 28. The retaining piece 28a is tapered, and an oblique upper inclined wall 28b is formed on the lower surface thereof.

A lower inclined wall 28c, which is parallel to or substantially parallel to the upper inclined wall 28b, is located between the inner protrusion 27 and the outer protrusion 28 and faces the retaining piece 28a.
An annular fitting groove 29 having a cross-sectional shape into which at least half of the flexible annular O-ring 9 such as rubber is formed is formed between the upper inclined wall 28b and the lower inclined wall 28c. The O-ring 9 is fitted in the fitting groove 29 to form a seal structure.

In the present embodiment, the fitting groove 29 has horizontal and vertical surfaces formed in a flat shape, but the shape is not limited to a flat shape, and a curved surface is formed along the cross-sectional shape of the O-ring 9. You may However, the fitting groove 29 is set to have a size and shape which is at least equal to or slightly larger than the cross section of the fitting portion of the O ring 9 so that the density distribution of the inserted O ring 9 becomes uniform. Preferably.

On the other hand, an inner annular groove 33a corresponding to the inner protrusion 27 and an outer annular groove corresponding to the outer protrusion 28 are formed on the lower surface of the bulged edge 33 which is bulged above the peripheral edge of the hood body 31. 33b are recessed in a rectangular cross section, and an annular fitting protrusion (annular protrusion) 33c is fitted between the inner annular groove 33a and the outer annular groove 33b in the gap between the inner protrusion 27 and the outer protrusion 28. It is supposed to be done.

FIG. 3 is a partially enlarged view of the main part of FIG. 2, and FIG. 4 is a perspective view showing the casing. As shown in these figures and FIGS. 1 and 2, the casing 4 is formed of an annular body, and is supported and fixed to the flange 25a with the large-diameter shaft portion 24 fitted therein. Specifically, the casing 4 includes an upper solid portion 402 surrounding the annular weir portion 22a of the rotary cup 2, an outer solid portion 402a forming an outer peripheral surface of the casing 4, and a continuous outer solid portion 402a. Lower solid part 40 forming the lower part of the casing 4
3 and an inner solid portion 40 forming the inner peripheral surface of the casing 4.
And 4.

Inside the casing 4, an annular recovery passage 401 surrounded by an upper solid portion 402, an outer solid portion 402a, a lower solid portion 403 and an inner solid portion 404 is formed. An annular upper surface portion 405 facing the lower surface portion of the annular dam portion 22a of the rotary cup 2 is formed on the top of the inner solid portion 404. The annular upper surface portion 405 is provided with a downwardly projecting annular eave portion 405a projecting outward in the radial direction, and between the upper surface portion of the annular eave portion 405a and the lower surface portion of the upper solid portion 402. Recovery passage 40
1 is provided with an annular discharge band hole 41.

The opening of the discharge band hole 41 is provided so as to face the discharge hole 201 formed in the annular dam portion 22a,
The unwanted matter discharged from the base mounting space S of the rotary cup 2 is introduced into the recovery passage 401 through the discharge band hole 41. A vertical hole 42 is provided downward in a part of the recovery passage 401 in the circumferential direction.
The unnecessary substances accumulated in 1 are discharged from the vertical hole 42 to the outside.

Further, in the chemical liquid processing apparatus 1, the hood attaching / detaching mechanism 5 is provided for attaching / detaching the hood 3 to / from the rotary cup 2.
Is provided. The hood attaching / detaching mechanism 5 is surrounded by the casing 4 and closes the hood 3, a lid 51, an L-shaped arm 52 having a horizontal arm fixed to the lid 51, and the L-shaped arm 52.
It is composed of a cylinder 53 that moves the character arm 52 up and down. The cylinder 53 is placed vertically, and the upper end of a cylinder rod 54 protruding from the top of the cylinder 53 is L-shaped.
It is fixed to the vertical arm of the letter arm 52.

The grip portion 32 is provided at the center of the lid 51.
An insertion hole 51b having a diameter larger than the outer diameter of the body portion 32a and smaller than the flange portion 32b is provided, and a cover portion 51a for accommodating the flange portion 32b therein is provided at the center of the lid 51. ing. When the lid 51 is pulled up by the cylinder 53, the edge of the fitting hole 51b engages with the flange 32b, and the hood 3 is also pulled up.

In order to rotate the rotary cup 2 around the axis of the rotary shaft 23, a cup rotating mechanism 6 is provided below the support frame P. This cup rotation mechanism 6
Is a drive motor 61, a drive pulley 62 provided so as to rotate together with the drive shaft of the drive motor 61, and the large-diameter shaft portion 2
4 and the ball spline 63a, a driven pulley 63 provided so as to rotate together, and a belt 64 stretched between the drive pulley 62 and the driven pulley 63.

A spline is formed on the outer peripheral surface of the rotary shaft 23, and a ball spline 63a meshing with the spline is fitted and fixed in the lower portion of the cylindrical hole of the large diameter shaft portion 24. The driven pulley 63 is fixed so as to rotate together with the large diameter shaft portion 24 and the ball spline 63a. Therefore, the rotational force of the drive motor 61 is transmitted to the large-diameter shaft portion 24 and the ball spline 63a via the drive pulley 62, the belt 64, and the driven pulley 63, and is also transmitted to the rotary shaft 23 via the ball spline 63a. The rotating cup 2 including the medium diameter shaft portion 21 and the annular dish portion 22 is adapted to rotate.

An elevating mechanism 7 is provided below the rotary shaft 23. The lifting mechanism 7 includes a second cylinder 71 vertically installed near the lower end of the rotary shaft 23, a lifting block 73 coupled to the upper end of a cylinder rod 72 of the second cylinder 71, and the lifting block 73.
And a guide rail 74 extending in the vertical direction for guiding the vertical movement of the.

The elevating block 73 has a bearing 73.
It is connected to the lower part of the rotary shaft 23 via a, and the second cylinder 71 is operated to move the cylinder rod 72 up and down to move the rotary shaft 23 up and down. When the rotary shaft 23 is lifted by the operation of the second cylinder 71, the coupled state between the medium-diameter shaft portion 21 and the large-diameter shaft portion 24 provided at the top of the second cylinder 71 is released,
Only the medium diameter shaft portion 21 moves upward with respect to the annular dish portion 22, so that the base B can be easily placed and picked up.

Since the rotary cup type chemical treatment device to which the cleaning structure of the present invention is applied is constructed as described above, first, in order to form a coating film on the surface of the base B, first, the two-dot chain line in FIG. As shown by, the cylinder 53 is operated to raise the lid body 51 via the cylinder rod 54, the L-shaped arm 52 and the lying bowl portion 51a. Then, the prone bowl 51
The hood 3 is lifted upward with a holding the flange 32b of the grip 32, and the base mounting space S of the rotary cup 2 is exposed to the outside.

If the second cylinder 71 is further operated in this state to raise the elevating block 73, the medium-diameter shaft portion 21 rises via the rotary shaft 23 due to this rise, and the upper surface portion of the medium-diameter shaft portion 21 is placed in the base mounting space. It is in a state of protruding from S to the outside.
In this state, the base B is accurately placed on the upper surface of the medium diameter shaft portion 21 by a robot arm (not shown) or by manual operation, and a predetermined amount of the chemical solution is dropped on the surface of the base B. And
Alternatively, vacuum suction is performed via the intake passage 23a immediately after mounting. After that, the second cylinder 71 is operated in the opposite manner to lower the intermediate diameter shaft portion 21 and bring it into a state of being flush with the annular dish portion 22 again.

Then, the cylinder 53 is operated in the opposite manner to lower the hood 3 to close the board mounting space S.
The suction of the board B may be performed after the hood 3 is closed, that is, before the rotation of the rotary cup 2 is started.

When the drive motor 61 of the cup rotating mechanism 6 is driven in this state, the rotation is driven by the drive pulley 62,
Belt 64, driven pulley 63 and ball spline 6
The rotary cup 2 transmitted to the rotary shaft 23 and the large-diameter shaft portion 24 via 3a and connected thereto rotates at a predetermined speed. Due to the centrifugal force generated by the rotation of the rotary cup 2, the chemical liquid dropped on the base B is thinly diffused in the radial direction to form a coating film on the surface of the base B. The excess chemical liquid shaken off from the base B is discharged from the discharge hole 201 formed in the annular weir portion 22a of the rotary cup 2 and introduced into the recovery passage 401 through the discharge band hole 41 of the casing 4. , Vertical hole 4
It is derived from 2 to the outside.

After a lapse of a predetermined time, the drive motor 61
Of the hood 3 by stopping the rotational driving of the hood 3 and driving the cylinder 53 to move the cylinder rod 54 upward.
Is lifted, and the base B immediately after the coating film on the rotary cup 2 is formed is exposed. In this state, the cylinder rod 72 is raised by the operation of the second cylinder 71, and the medium diameter shaft portion 21 of the rotary cup 2 is raised via the rotary shaft 23 coupled to the cylinder rod 72, and is mounted thereon. The laid base B is pushed out from the base mounting space S to the outside. Then, the board B is similarly taken out from the rotary cup 2 by a robot arm or the like and transferred to the next step. By repeating the above operation, a uniform coating film of the chemical solution is sequentially formed on the surface of the substrate B.

In the present invention, the upper cleaning liquid passage 43a and the lower cleaning liquid passage 43 as shown in FIGS. 1 to 5 are provided in the casing 4 of the chemical liquid processing apparatus 1 as described above.
A cleaning liquid passage 43 composed of b is provided. The upper cleaning liquid passage 43a is bored horizontally in a solid portion (upper solid portion 402) above the recovery passage 401 of the casing 4. The upper cleaning liquid passage 43a has one opening on the outer peripheral surface of the casing 4, and the other opening on the outer peripheral surface of the annular dam portion 22a of the rotary cup 2 facing the upper portion of the discharge hole 201. Have

The lower cleaning liquid passage 43b has one opening on the outer peripheral surface of the lower portion of the casing 4, and from this opening, a solid portion below the recovery passage 401 (lower solid portion 40).
3) horizontally extending toward the center, and further extending upward at a solid portion (inner solid portion 404) inside the recovery passage 401 of the casing 4, and an annular weir portion 22a at the upper end thereof. Has the other opening facing the weir bottom surface 22b.

Joints 44 are screwed into the openings of the cleaning liquid passages 43 on the outer peripheral surface side of the casing 4, as shown in FIG.
As shown in, the cleaning liquid in the cleaning liquid layer 47 is supplied into the cleaning liquid passage 43 by driving the cleaning liquid pump 46 via the cleaning liquid pipe 45 connected to the joint 44.

Instead of the cleaning liquid pump 46, it is also possible to use a so-called pressure-feeding device that pressurizes an inert gas such as nitrogen or helium into a container in which the cleaning liquid is sealed and sends the cleaning liquid into the cleaning liquid passage 43.

Incidentally, in FIG. 1, FIG. 2 and FIG.
An example in which the lower cleaning liquid passage 43b is provided so as to extend upward from the lower solid portion 403 to the inner solid portion 404 is shown, but in FIGS. 4 and 5, the lower cleaning liquid passage 43b is shown.
Is once branched horizontally in the center side of the lower solid portion 403, and the tip portions of each branch are extended upward.

On the other hand, an annular cleaning liquid groove 406 is provided in the annular upper surface portion 405 of the inner solid portion 404 of the casing 4. An opening on the tip side of the lower cleaning liquid passage 43b is provided at the bottom of the cleaning liquid groove 406, and the cleaning liquid is supplied into the cleaning liquid groove 406 from this opening. In addition, a cleaning hole 406 for letting the cleaning liquid communicating with the recovery passage 401 below the annular eave portion 405a escape to the recovery passage 401 at the weir outside the cleaning liquid groove 406.
a is provided.

The lower end opening of the cleaning hole 406a is located at the top of the ceiling surface of the recovery passage 401 having an arcuate cross section. Therefore, the cleaning liquid that has passed through the cleaning hole 406a is inclined surface 4 of the ceiling portion of the recovery passage 401 formed inward and outward in the radial direction of the cleaning hole 406a by the action of surface tension.
01a descends while diffusing.

As described above, the cleaning structure of the rotary cup type chemical liquid processing device of the present invention forms the cleaning liquid passage 43 consisting of the upper cleaning liquid passage 43a and the lower cleaning liquid passage 43b for circulating the cleaning liquid in the solid portion of the casing 4. In addition, since the tip opening of the rotary cup 2 is opposed to the portion to be cleaned which is easily contaminated inside the chemical treatment device 1 by the waste liquid, the rotary cup 2 is rotated by the rotary shaft 2 during cleaning.
When the cleaning liquid pump 46 is operated in the state of being rotated about three times and the cleaning liquid in the cleaning liquid layer 47 is sent out, the cleaning liquid passes through the cleaning liquid pipe 45 and the cleaning liquid passage 43 in the casing 4 is supplied.
And is supplied to the contaminated portion through the opening at the tip of the cleaning liquid passage 43 for cleaning.

The cleaning liquid introduced into the upper cleaning liquid passage 43a in the cleaning liquid passage 43 is the outer peripheral surface (edge portion) of the annular weir portion 22a of the rotating cup 2 rotating from the tip opening of the upper cleaning liquid passage 43a. Since the cleaning liquid supplied to this edge portion is sprayed toward the rotary cup 2,
Is blown off in the radial direction by the centrifugal force of the rotation and collides with the inner wall surface of the discharge band hole 41 on the upper solid portion 402 side. Due to the collision of the cleaning liquid, the sticky layer of the viscous chemical liquid discharged from the discharge hole 201 of the rotary cup 2 and adhered and deposited on the inner wall surface during the operation of the chemical liquid processing device 1 is dissolved in the cleaning liquid to clean the inner wall surface. .

The cleaning liquid introduced into the lower cleaning liquid passage 43b is supplied to the annular cleaning liquid groove 406 recessed in the annular upper surface portion 405 of the casing 4 from the tip opening. Then, when the cleaning liquid supplied to the cleaning liquid groove 406 fills the groove, the cleaning liquid overflows the weir portion on the outer side in the radial direction, so that the space between the annular weir portion 22a of the rotating cup 2 and the annular upper surface portion 405 of the casing 4 is increased. It moves to the outside through the gap.

Then, part of the cleaning liquid that has moved radially outward through the gap flows down the annular eave portion 405a of the casing 4, the chemical liquid adhering to this portion is washed off, and falls into the recovery passage 401. At the same time, the remaining portion of the cleaning liquid hangs down through the cleaning hole 406a formed in the weir portion of the annular upper surface portion 405 in the vertical direction, and the recovery passage 4 is opened from the lower opening.
Since it descends while wetting the inclined surface 401a of the ceiling part 01, the ceiling part which is the blind spot part of the recovery passage 401 is also cleaned cleanly. The cleaning liquid after cleaning is discharged to the outside of the system from the vertical hole 42 through the recovery passage 401.

Since the cleaning liquid supplied to the cleaning liquid groove 406 through the lower cleaning liquid passage 43b is blocked by the annular wall 405b projecting inside the cleaning liquid groove 406 of the annular upper surface portion 405, the cleaning liquid is located closer to the center than that. It does not flow out, and the rotating mechanism such as the large-diameter shaft portion 24 of the rotating cup 2 fitted in the annular hole in the central portion of the casing 4, the rotating shaft 23, and the driven pulley 63 is not contaminated with the cleaning liquid. .

In the above embodiment, the casing 4 is provided with the upper cleaning liquid passage 43a and the lower cleaning liquid passage 43b as the cleaning liquid passage 43, but the cleaning structure of the present invention has the upper cleaning liquid passage 43a and the lower cleaning liquid passage 43a in the casing 4. It is not limited to providing both of the lower cleaning liquid passages 43b, and only one of them may be provided.

This is because, when only the upper cleaning liquid passage 43a is provided, the cleaning liquid is not supplied to the ceiling surface of the recovery passage 401, but this portion is the portion where the chemical liquid is the most difficult to deposit and accumulate. This is because it is not necessary to wash it frequently, and it is sufficient to wash it at regular disassembly and maintenance. In addition, in this embodiment, an annular eaves portion 405a is provided above the recovery passage 401, and the annular eaves portion 40 is provided.
Due to the presence of 5a, the ceiling portion of the recovery passage 401 has a blind spot on the top of the cleaning liquid supply from the upper cleaning liquid passage 43a. However, when the annular eaves portion 405a is not provided, the blind spot portion disappears. Cleaning liquid passage 43b
It is possible to spread the cleaning liquid over the entire inner surface of the recovery passage 401 without providing the above.

When only the lower cleaning liquid passage 43b is provided, the cleaning liquid moves to the outside through the gap between the annular dam portion 22a of the rotary cup 2 and the annular upper surface portion 405 of the casing 4, so The part is the annular eaves part 40 of the casing 4.
5a, and the remaining part hangs down through a cleaning hole 406a vertically formed in the weir of the annular upper surface 405,
There is no particular inconvenience because it covers all the parts in the recovery passage 401.

If both the upper cleaning liquid passage 43a and the lower cleaning liquid passage 43b are provided as in the above embodiment,
A more complete cleaning effect can be obtained. Further, these cleaning liquid passages may be radially provided in the casing 4. With this configuration, the cleaning liquid can be simultaneously supplied to the portion to be cleaned from the plurality of passages,
The deviation of the cleaning liquid supply site can be eliminated, and the supply amount of the cleaning liquid can be increased, so that the inside of the chemical liquid processing apparatus can be cleaned more effectively and quickly.

[0061]

According to the cleaning structure of the rotary cup type chemical liquid treatment device according to the first aspect of the present invention, a cleaning liquid passage having a tip end opening facing the chemical liquid discharge hole is provided in a casing having an annular chemical liquid recovery passage. It will be.

Therefore, it is possible to simply feed the cleaning liquid into the cleaning liquid passage while rotating the rotary cup without performing a troublesome cleaning operation of disassembling and cleaning the chemical liquid processing device one by one, which is conventionally performed. This makes it possible to quickly and rapidly perform the cleaning operation of the chemical liquid processing device, which is extremely effective in saving labor for maintenance of the chemical liquid processing device.

According to the cleaning structure of the rotary cup type chemical liquid processing device of the second aspect, the casing facing the bottom surface of the outer peripheral wall of the rotary cup has an annular cleaning liquid groove centered on the axis of the vertical shaft. Since the cleaning liquid passage is connected to the cleaning liquid groove, the cleaning liquid fed into the cleaning liquid passage in the rotating state of the rotary cup is once supplied into the annular cleaning liquid groove and is filled in the groove. It is guided by the rotation of the rotary cup and moves in the groove in the rotation direction.

A centrifugal force is applied to the cleaning liquid by the circular motion along the groove, and the cleaning liquid receives a force which goes over the outer wall of the cleaning liquid groove and is directed in the radial direction. From the gap between the bottom surface of the section and the upper surface of the casing facing it, the particles scatter outward and are trapped in the chemical recovery passage. Such scattering of the cleaning liquid effectively dissolves and removes the above-mentioned gap, the chemical liquid in the vicinity of the chemical liquid discharge hole of the rotary cup, and further the chemical liquid adhering to the recovery passage.

Even if the rotary cup is not rotating,
Since the cleaning liquid overflowing from the cleaning liquid groove flows down through the gap, the chemical liquid adhering to the gap and the upper surface of the casing can be dissolved and removed.

According to the cleaning structure of the rotary cup type chemical liquid processing device of the third aspect, the cleaning liquid groove is formed outside the cleaning liquid groove so as to communicate with the upper surface of the chemical liquid recovery passage. A part of the cleaning liquid overflowing from is discharged from the cleaning hole into the chemical liquid recovery passage, and descends while wetting the inner wall surface of the passage. By the descent of the cleaning liquid along the inner wall surface in a planar diffusion state, the portion that is likely to become a blind spot in the chemical liquid recovery passage is effectively cleaned.

[Brief description of drawings]

FIG. 1 is a partially cutaway perspective view showing an example of a rotary cup type chemical liquid treatment device to which a cleaning structure according to the present invention is applied.

FIG. 2 is a sectional view taken along the line AA of FIG.

FIG. 3 is a partially enlarged view of a main part of FIG.

FIG. 4 is a perspective view illustrating a cleaning structure according to the present invention.

5 is a sectional view taken along line BB of FIG.

FIG. 6 is an explanatory view in cross section for explaining a conventional rotary cup type chemical liquid processing device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Chemical treatment device 2 Rotation cup 21 Medium diameter shaft part 22 Annular dish part 22a Annular weir part (outer peripheral wall part) 201 Discharge hole 23 Rotating shaft (vertical axis) 23a Intake passage 23b Tube 24 Large diameter shaft part 25 Support cylinder 25a Flange (bearing body) 26 Bearing 27 Inner protrusion 28 Outer protrusion 29 Fitting groove 3 Hood 31 Hood main body 32 Gripping portion 33 Bulging edge portion 4 Casing 41 Discharging band hole 401 Recovery passage 402 Upper solid portion 402a Outer solid portion 403 Lower solid portion 404 Inner solid portion 405 Annular upper surface portion 405a Annular eaves portion 406 Cleaning liquid groove 406a Cleaning hole 42 Vertical hole 43 Cleaning liquid passage 43a Upper cleaning liquid passage 43b Lower cleaning liquid passage 44 Joint 45 Cleaning liquid pipe 46 Cleaning liquid pump 47 Cleaning liquid layer 5 Hood Attachment / detachment mechanism 51 Lid 52 L-shaped arm 53 Shirin Da 54 Cylinder rod 6 Cup rotation mechanism 61 Drive motor 62 Drive pulley 63 Driven pulley 7 Lifting mechanism 71 Second cylinder 72 Cylinder rod 73 Lifting block 739 O-ring

Claims (3)

[Claims] 1. A rotary cup, which is supported by a bearing body so as to be rotatable about an axis of a vertical shaft and has a plurality of chemical solution discharge holes in an outer peripheral wall portion, and an outer peripheral wall of the rotary cup. In a rotary cup type chemical liquid treatment device surrounding a portion and having a casing having an annular chemical liquid recovery passage corresponding to the chemical liquid discharge hole, in the casing, a tip end opening faces the chemical liquid discharge hole. A cleaning structure for a rotary cup type chemical liquid processing device, characterized in that a cleaning liquid passage is provided. 2. A rotary cup, which is supported by a bearing body so as to be rotatable about the axis of a vertical shaft and in which a plurality of chemical liquid discharge holes are provided in an outer peripheral wall portion, and an outer peripheral wall of the rotary cup. And a bottom surface portion of the outer peripheral wall portion, and a rotary cup type chemical liquid processing device comprising a casing having an annular chemical liquid recovery passage corresponding to the chemical liquid discharge hole, the bottom surface of the outer peripheral wall portion of the rotary cup A cleaning structure for a rotary cup type chemical liquid processing apparatus, wherein an annular cleaning liquid groove centered on the axis of a vertical axis is formed in a casing facing the portion, and a cleaning liquid passage is connected to the cleaning liquid groove. 3. The cleaning structure for a rotary cup type chemical liquid processing apparatus according to claim 2, wherein a cleaning hole communicating with the upper surface of the chemical liquid recovery passage is provided outside the cleaning liquid groove.