CN208766430U - A kind of electrochomeric glass of quick color-changing, doubling glass and hollow glass - Google Patents
A kind of electrochomeric glass of quick color-changing, doubling glass and hollow glass Download PDFInfo
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- CN208766430U CN208766430U CN201821498832.0U CN201821498832U CN208766430U CN 208766430 U CN208766430 U CN 208766430U CN 201821498832 U CN201821498832 U CN 201821498832U CN 208766430 U CN208766430 U CN 208766430U
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- glass
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- wire casing
- ion barrier
- silk
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Abstract
The utility model provides a kind of electrochomeric glass of quick color-changing, doubling glass and hollow glass, including the glass substrate being sequentially stacked, ion barrier, first including transparent conducting oxide layer, electrochromism composite layer and the second including transparent conducting oxide layer, it is extended vertically through on the ion barrier and multiple wire casings is distributed with, the upper surface of the wire casing is flushed with ion barrier far from the first surface of glass substrate, the lower surface of wire casing passes through ion barrier, and enter glass substrate, filled with the first low resistance conductive silk being connected in parallel with each other in the multiple wire casing, second including transparent conducting oxide layer is provided with the second low resistance conductive silk far from the surface of electrochromism composite layer.Electric conductivity of the utility model by setting low resistance conductive silk and metal conductive paste to improve two including transparent conducting oxide layers, can reduce well the sheet resistance of two conductive layers in electrochromic device, and then accelerate its colourshifting process.
Description
Technical field
The utility model relates to electrochomeric glass technical fields, and in particular to a kind of electrochromism glass of quick color-changing
Glass, doubling glass and hollow glass.
Background technique
Electrochromism technology is a kind of glass technology of intelligent power saving.It is commonly utilized in high-end building, such as lighting roof,
Curtain wall, side elevation etc..At present in technology, the Coloring Time for the electrochomeric glass that a block size is 0.7 square metre, generally
20~30 minutes or so.If it is desired to electrochomeric glass is commonly utilized on the large-area glass product of the vehicles, such as vapour
Vehicle skylight, side window, high-speed rail side window etc. need to accelerate its Coloring Time to even shorter time within 3 minutes.
The primary structure of full-solid electrochromic glass is glass substrate, ion barrier, the first conductive layer, complex function
Layer and the second conductive layer.Its electrical model can be equivalent to the charge and discharge behavior of capacitance-resistance series model substantially, so resistance
Its Coloring Time (i.e. charge and discharge time) is influenced very big.In electrochromism field, response time of electrochromic device with
The sheet resistance of transparency conducting layer (being mostly used ITO at present) has positively related relationship.The sheet resistance for reducing transparency conducting layer can effectively contract
Short Coloring Time, and alleviate the non-uniform phenomenon in colourshifting process.
All there is side in common metal conductive oxide film currently on the market, such as ito glass, AZO glass and FTO
Higher problem is hindered, wherein the preferable ITO of electric conductivity, its sheet resistance can only also drop to 5~10 Ω or so at present.But it is answered certain
With occasion, such as static status display and automotive field, such sheet resistance influence under Coloring Time it is still partially slow, using being limited
System.
Utility model content
In order to solve the above technical problems, the utility model provides a kind of electrochomeric glass of quick color-changing, electricity is improved
The color change of photo chromic glass is caused, specific technical solution is as follows:
A kind of electrochomeric glass of quick color-changing, including the glass substrate, ion barrier, first transparent being sequentially stacked
Conductive oxide layer, electrochromism composite layer and the second including transparent conducting oxide layer, extend vertically through on the ion barrier point
It is furnished with a plurality of parallel arrangement or intersects the wire casing in netted arrangement, the upper surface of the wire casing and ion barrier are far from glass substrate
Surface flush, the lower surface of wire casing passes through ion barrier and enters glass substrate, filled with being connected in parallel to each other in the wire casing
First low resistance conductive silk of connection, second including transparent conducting oxide layer are provided with that far from the surface of electrochromism composite layer
What this was connected in parallel is in the second low resistance conductive silk of netted arrangement in a plurality of parallel arrangement or intersection.
Preferably, the second low resistance conductive silk can be the gold for adding mask plate or laser ablation using vacuum magnetic-control sputtering
Belong to, or using the metal conductive paste of silk-screen printing.
Preferably, the line width of the second low resistance conductive silk is 1 ~ 1000 μm.
Preferably, the resistivity of the first low resistance conductive silk and the second low resistance conductive silk is 10-6~10-8Ω•M。
Preferably, the wire casing uses laser engraving, and depth is 5 ~ 500 μm, and width is at 5 ~ 500 μm.
A kind of doubling glass, using above-mentioned electrochomeric glass.
A kind of hollow glass, using above-mentioned electrochomeric glass.
From the above technical scheme, the utility model is by setting low resistance conductive silk and metal conductive paste to improve
The electric conductivity of two including transparent conducting oxide layers can reduce the sheet resistance of two conductive layers in electrochromic device well, into
And accelerate its colourshifting process;Metal conductive paste upper surface in wire casing is flushed with the upper surface of ion barrier, can be effective
Solution film layer microstructure uneven phenomenon.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model;
Fig. 2 is a kind of arrangement of the utility model medium or low resistance conductive filament;
Fig. 3 is another arrangement of the utility model medium or low resistance conductive filament.
Specific embodiment
Below in conjunction with the drawings and specific embodiments, the utility model is described in detail, it is practical new this is described in detail
Before the technical solution of each embodiment of type, related noun and term are explained, in the present specification, title is identical
Or the identical component of label represents similar or identical structure, and is only limitted to the purpose of signal.
As shown in Figure 1, the electrochomeric glass of the quick color-changing includes glass substrate 1, the ion barrier being sequentially stacked
The 2, first including transparent conducting oxide layer 4 of layer, electrochromism composite layer 5 and the second including transparent conducting oxide layer 6.Ion barrier 2
On extend vertically through multiple wire casings 3 be distributed with, the first surface of upper surface and ion barrier far from glass substrate of wire casing 3 is neat
Flat, the lower surface of wire casing is pierced by second surface of the ion barrier close to glass substrate, and enters glass substrate certain depth.It is more
Filled with the metal conductive paste being connected in parallel with each other in a wire casing, the first low resistance conductive silk 31 is formed, described second transparent leads
Electroxidation nitride layer is provided with the second low resistance conductive silk 7 far from the surface of electrochromism composite layer.
The ion barrier 2 can be formed by the nitride of the oxide of silicon, titanyl compound or silicon, and effect is resistance
The metal ion kept off in glass enters the first including transparent conducting oxide layer, electrochromism composite layer and the second transparent conductive oxide
Nitride layer.
First including transparent conducting oxide layer 4 and the second including transparent conducting oxide layer 6 can by zinc oxide, tin oxide,
The transparent conductive oxides shapes such as Al-Doped ZnO (AZO), tin indium oxide (ITO), fluorine-doped tin oxide (FTO), zinc sulphide (ZnS)
At with a thickness of 5 ~ 500nm;It preferably, is ITO and AZO, with a thickness of 20 ~ 200nm.
The second low resistance conductive silk 7 is made of multiple parallel arrangements or intersection in the conductive filament of netted arrangement, multiple to lead
Electrical filament is connected in parallel, Fig. 2 shows a kind of arrangement of the second low resistance conductive silk, the conductive filament including multiple parallel arrangements,
Fig. 3 shows another arrangement, is in the conductive filament of netted arrangement including square crossing.
The resistivity of the second low resistance conductive silk is 10-7~10-8Ω * M number grade, the line of the second low resistance conductive silk
Width is 1 ~ 1000 μm, and the second low resistance conductive silk adds the metal of mask plate or laser ablation using vacuum magnetic-control sputtering, or adopts
With the metal conductive paste of silk-screen printing, preferably silver and silver paste.
The processing flow that metal conductive paste is related to is:
Vacuum magnetic-control sputtering plates ion barrier on the glass substrate, then laser scoring, then scratches metallic conduction slurry
Material, then polishes, and removes extra metal conductive paste and allows the upper of the electrocondution slurry upper surface in wire casing and ion barrier
Surface flushes, and then vacuum magnetic-control sputtering plates the first including transparent conducting oxide layer.
Since metal conductive paste and low resistance conductive silk are in different film layer positions, so being electrically insulated from one another.
Resistance calculations process is exemplified below:
The ion barrier of the electrochomeric glass of one piece of 1M*1M is the silica of 20nm, using vacuum magnetic-control sputtering
Mode plated film.After the completion of plated film, then laser scoring, then scratches high temperature silver paste, then polishes, remove extra metallic conduction
Slurry simultaneously allows the conductive silver paste upper surface in wire casing to flush with the upper surface of ion barrier, then vacuum magnetic-control sputtering plating first
Including transparent conducting oxide layer.After sintering, the resistivity of silver paste is 2*10-7Ω * M, line width 0.1mm, line-spacing 5mm, thickness
It is 10 μm.First including transparent conducting oxide layer on its upper layer is 200nm ITO, using vacuum magnetic-control sputtering mode plated film, sheet resistance
For 12 Ω.
The calculation formula R of resistance=(ρ * L)/(n*S), n are low resistance conductive strand number, ρ 2*10-7Ω * M, L 1M,
S is the cross-sectional area of conductive filament, then the resistance of the first low resistance conductive silk is 1 Ω, the first low resistance conductive silk and the first electrically conducting transparent
The parallel resistance of oxide skin(coating) is 0.92 Ω.
The low resistance conductive silk cooperates halftone mask technique using magnetron sputtering plating, target using silver-colored target, formation it is low
Resistance conductive filament material is fine silver, resistivity 1.65*10-8Ω * M, line width 0.1mm, line-spacing 30mm, with a thickness of 5 μm, resistance
Calculation formula R=(ρ * L)/(n*S), n is conductive strand number, and S is the cross-sectional area of conductive filament, then the first low resistance conductive
The resistance of silk is 1 Ω, and the parallel resistance of low resistance conductive silk and the second including transparent conducting oxide layer is also 0.92 Ω.
Compared with low resistance conductive silk and metal conductive paste is not added, the resistance of electrochromism composite layer two sides is fallen to originally
Ten one thirds, Coloring Time can have great promotion.
Embodiment described above is only that preferred embodiments of the present invention are described, not practical to this
Novel range is defined, and under the premise of not departing from the spirit of the design of the utility model, those of ordinary skill in the art are to this
The various changes and improvements that the technical solution of utility model is made should all fall into the guarantor that claims of the utility model determine
It protects in range.
Claims (7)
1. a kind of electrochomeric glass of quick color-changing, including be sequentially stacked glass substrate, ion barrier, first transparent lead
Electroxidation nitride layer, electrochromism composite layer and the second including transparent conducting oxide layer, which is characterized in that hang down on the ion barrier
Straight to run through the wire casing that a plurality of parallel arrangement is distributed with or intersects in netted arrangement, the upper surface of the wire casing and ion barrier are separate
The surface of glass substrate flushes, and the lower surface of wire casing passes through ion barrier and enters glass substrate, is filled in the wire casing
The first low resistance conductive silk being connected in parallel with each other, the surface of second including transparent conducting oxide layer far from electrochromism composite layer
Be provided be connected in parallel with each other in a plurality of parallel arrangement or intersect be in netted arrangement the second low resistance conductive silk.
2. electrochomeric glass according to claim 1, which is characterized in that the second low resistance conductive silk can be use
Vacuum magnetic-control sputtering adds the metal of mask plate or laser ablation, or the metal conductive paste using silk-screen printing.
3. electrochomeric glass according to claim 1, which is characterized in that the line width of the second low resistance conductive silk be 1 ~
1000μm。
4. electrochomeric glass according to claim 1, which is characterized in that the first low resistance conductive silk and the second low-resistance
The resistivity of conductive filament is 10-6~10-8Ω•M。
5. electrochomeric glass according to claim 1-4, which is characterized in that the wire casing is carved using laser
It carves, depth is 5 ~ 500 μm, and width is at 5 ~ 500 μm.
6. a kind of doubling glass, which is characterized in that use the described in any item electrochomeric glass of claim 1-5.
7. a kind of hollow glass, which is characterized in that use the described in any item electrochomeric glass of claim 1-5.
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CN201821498832.0U CN208766430U (en) | 2018-09-13 | 2018-09-13 | A kind of electrochomeric glass of quick color-changing, doubling glass and hollow glass |
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CN201821498832.0U CN208766430U (en) | 2018-09-13 | 2018-09-13 | A kind of electrochomeric glass of quick color-changing, doubling glass and hollow glass |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2024178639A1 (en) * | 2023-02-28 | 2024-09-06 | 京东方科技集团股份有限公司 | Electrochromic light adjusting structure and traffic device |
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2018
- 2018-09-13 CN CN201821498832.0U patent/CN208766430U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024178639A1 (en) * | 2023-02-28 | 2024-09-06 | 京东方科技集团股份有限公司 | Electrochromic light adjusting structure and traffic device |
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