CN208679979U - A kind of double-station wafer cleaning machine - Google Patents

A kind of double-station wafer cleaning machine Download PDF

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Publication number
CN208679979U
CN208679979U CN201821290575.1U CN201821290575U CN208679979U CN 208679979 U CN208679979 U CN 208679979U CN 201821290575 U CN201821290575 U CN 201821290575U CN 208679979 U CN208679979 U CN 208679979U
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hinged
double
cleaning
basket
station
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CN201821290575.1U
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Chinese (zh)
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马玉水
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Shandong Liansheng Electronic Equipment Co Ltd
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Shandong Liansheng Electronic Equipment Co Ltd
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Abstract

The utility model discloses a kind of double-station wafer cleaning machines, belong to semiconductor cleaning device technical field, including frame body, and frame body is equipped with two groups or so mirror settings washing stations;Washing station positioned at frame body left end includes that the top of several word orders is equipped with the rinse bath of opening, clean basket mounting table, the left side of rinse bath is equipped with longitudinally reciprocating motion device, longitudinally reciprocating motion device is equipped with vertical reciprocator, grabbing device is installed on the top of vertical reciprocator, grabbing device includes bracket, the all right one way or the other hinged cantilever along the rotation of its central axes and controllable two hinged cantilevers while the rotation drive device reversely rotated are horizontally installed on bracket, each hinged cantilever is connected with several hooks far from vertical reciprocator end, two hooks that the midpoint of two hinged cantilevers is located on same longitudinal straight line form a hook pair.The utility model cleaning machine has cleaning efficiently, the small feature of occupied area.

Description

A kind of double-station wafer cleaning machine
Technical field
The utility model relates to silicon/wafer cleaning device of the industries such as semiconductor, photovoltaic, LED more particularly to silicon/chips Double-station wafer cleaning machine.
Background technique
Sapphire wafer of wafer, the silicon wafer in photovoltaic industry and LED industry etc. is in manufacturing process in semicon industry In all have to pass through cleaning process, to remove silicon/wafer surface metal ion pollution, organic pollution or Particulate Pollution, Its cleaning process is carried out in the cleaning of special multi-groove type.
Above-mentioned multi-groove type cleaning machine generally mainly by be set in rack rinse bath, cleaning solution pipe-line system, ultrasound Wave system system, heating system, cleaning throwing device, and cleaning basket transportation system and electric control part are constituted, the silicon/crystalline substance for needing to clean Piece is commonly held in dedicated silicon wafer basket, and in order to improve cleaning efficiency, usual cleaning machine is all equipped with the female basket of cleaning, clearly Several silicon wafer baskets are placed in a female basket when washing, female basket will be cleaned by cleaning basket transportation system and be delivered to each rinse bath one by one In, to be cleaned to the silicon/chip cleaned in female basket in each silicon wafer basket.
It is cleaned using female basket carrying silicon wafer basket is cleaned, can once clean multiple silicon wafer baskets, hence it is evident that improve cleaning The working efficiency of machine, but a cleaning machine is usually constructed with a station more than ten, in addition quantity required for having enough to meet the need, a cleaning machine meeting Need the female baskets of at least 20 cleanings, and clean the corrosion that female basket needs resistance to cleaning chemical liquids, general metal material without Method uses, and needs the engineering plastics using chemically-resistant liquid, and the manufacture processing for cleaning female basket needs professional equipment, therefore cleans female basket Cost can be higher, in addition, cleaning female basket fills basket at feeding end in use, the silicon cleaned in female basket is taken out after the completion of cleaning Piece basket, empty cleaning mother's basket need continuously to be recycled to feeding end and load silicon wafer basket again, and recruitment is more, heavy workload, also It is easy to cause the damage for cleaning female basket and then influences normal production.
The patent of Publication No. CN203664250U discloses a kind of without female basket cleaning machine, including rack, is installed on rack On rinse bath and manipulator, the cantilever of the manipulator is located at the top of rinse bath, slidably supported on cantilever to have two movements Contrary crawl hook seat, each hook seat that grabs are fixedly installed silicon wafer basket crawl hook, are provided with silicon wafer in the rinse bath Basket pallet.This can not only carry out the cleaning of several silicon wafer baskets, life with higher without female basket cleaning machine simultaneously in each station Efficiency is produced, and without cleaning female basket, reduces recruitment, reduces use cost.But the technical solution is deposited without female basket cleaning machine Following insufficient: only one only longitudinal station;The slidably supported crawl hook seat for having two directions of motion opposite on cantilever, respectively Crawl hook seat is fixedly installed silicon wafer basket crawl hook, acts in the top of each rinse bath there are many component, friction generates Minimum particle very likely falls into cleaning column the pollution in turn resulted in cleaning materials;Two crawl hook seats are driven by respective cylinder Dynamic, transmission component construction is complicated, and crawl precision is low.
Utility model content
The purpose of this utility model is that in view of the deficiencies of the prior art, providing a kind of double-station wafer cleaning machine, have Have space occupied is small, maintenance is convenient, cleaning efficiency is high, not cleaning materials easy to pollute the characteristics of.
The technical solution adopted in the utility model is as follows.
A kind of double-station wafer cleaning machine, including frame body, frame body are equipped with two groups of washing stations.
Washing station positioned at frame body left end includes that the top of several word orders is equipped with the rinse bath of opening, rearmost The front side of the rinse bath of the rear side and/or forefront of rinse bath is equipped with cleaning basket mounting table, and cleaning basket mounting table is equipped with cleaning Basket locating slot;The left side of rinse bath is equipped with longitudinally reciprocating motion device, and longitudinally reciprocating motion device is equipped with vertical reciprocating motion Device is equipped with grabbing device on the top of vertical reciprocator, and grabbing device includes bracket, is horizontally installed on bracket The all right one way or the other rotation drive device reversely rotated simultaneously along the hinged cantilever of its central axes rotation and controllable two hinged cantilevers, it is each to revolve Turn cantilever is connected with several hooks far from vertical reciprocator end, and the midpoint of two hinged cantilevers is located at same longitudinal straight line On two hook formed one hook pair;Hinged cantilever it is each hook to longitudinally reciprocating motion device, vertical reciprocator, Under the action of rotation drive device, the cleaning basket cleaned on basket mounting table can be picked up and be put into each rinse bath and cleaned and clear Cleaning basket is placed on cleaning basket mounting table after the completion of washing.
It is positioned at the washing station of frame body right end and the washing station structure of frame body left end identical and be located at frame body right end Washing station or so mirror settings.
As optimal technical scheme, if two hinged cantilevers are rack-mount by respectively passing through dry bearing;Two rotation on bracket Turn vertically to telescopic mounting is equipped between cantilever, the top of telescopic mounting is hinged with two wing plates and is distinguished by two wing plates It is connected with the outer radial periphery surface of two hinged cantilevers.Using this technical solution, stretching for telescopic mounting can be controlled accurately Two hinged cantilevers reversely rotate simultaneously.
As optimal technical scheme, two wing plates are longitudinally disposed and no longer in same plane, and telescopic mounting is arranged two Between wing plate, the top of telescopic mounting is connected with stringer board, and front end, the rear end of stringer board respectively pass through connection transverse slat respectively at two wing plates Far from hinged cantilever end connected to it is hinged.Using this technical solution, rotary motion, cost are controlled by vertical movement It is low and can accurately control two hinged cantilevers while reversely rotate.
As optimal technical scheme, each wing plate far from hinged cantilever end connected to it be equipped with U-shaped opening or long side with The parallel long strip through hole of the long side of wing plate, the rotation not connected to it of the opening direction of the U-shaped opening of each wing plate towards each wing plate Turn cantilever end, connection transverse slat is equipped with the lateral shaft that can be run in the U-shaped opening or long strip through hole of wing plate connected to it.It adopts With this technical solution, rotary motion is controlled by vertical movement, it is at low cost and can accurately to control two hinged cantilevers anti-simultaneously To rotation.
As optimal technical scheme, the rotation drive device includes bracket, and two hinged cantilevers by bearing by respectively being pacified On bracket;The linkage gear that central axes are overlapped with its central axes, the connection of two hinged cantilevers are respectively installed on two hinged cantilevers Moving gear intermeshing;Vertically to telescopic mounting is equipped on bracket, the top of telescopic mounting is hinged with a wing plate and leads to The wing plate is crossed to be connected with the outer radial periphery surface of the hinged cantilever in two hinged cantilevers.Using this technical solution, by hanging down Straight motion control rotary motion, it is at low cost and can accurately control two hinged cantilevers while reversely rotate.
As optimal technical scheme, wing plate is equipped with U-shaped opening or long side and wing far from hinged cantilever end connected to it The parallel long strip through hole of the long side of plate, the rotation not connected to it of the opening direction of the U-shaped opening of each wing plate towards each wing plate Cantilever end, telescopic mounting are equipped with the lateral shaft that can be run in the U-shaped opening or long strip through hole of wing plate connected to it.It adopts With this technical solution, rotary motion is controlled by vertical movement, it is at low cost and can accurately to control two hinged cantilevers anti-simultaneously To rotation.
As optimal technical scheme, bracket is equipped with shield.
As optimal technical scheme, longitudinally reciprocating motion device is transmission belt, and the top of vertical reciprocator is arranged in On face;
Alternatively, longitudinally reciprocating motion device includes longitudinal rail pair, vertical reciprocator installation is in longitudinal rail On secondary sliding block, longitudinal rail pair is equipped with slide-driving device.
Vertical reciprocator is electric putter or lifting cylinder.
The telescopic mounting is electric putter or lifting cylinder.
As optimal technical scheme, the hook is in plane where " Qian " font and hook and hook of opening upwards and its The hinged cantilever of connection is in the same plane;The rear and front end of the cleaning basket is equipped with hangers.
As optimal technical scheme, the seal closure that frame body is equipped with, seal closure is equipped with air-introduced machine;The cleaning basket of seal closure Mounting table side is equipped with the dodge gate for cleaning basket disengaging.
The beneficial effects of the utility model are: two hinged cantilevers are located at the top of rinse bath, when two hinged cantilevers are anti-simultaneously To when rotation, the bottom end of two hooks is close to each other/separate, can grab/decontrol cleaning basket, each hook of hinged cantilever is to vertical To under the action of reciprocator, vertical reciprocator, rotation drive device, the cleaning on basket mounting table can will be cleaned Basket is picked up and is put into cleaning in each rinse bath and cleaning basket is placed on cleaning basket mounting table after the completion of cleaning.Due to two rotations Turn cantilever to be fixedly connected with hook, the movement of hook drives not on hinged cantilever, so in the top of each rinse bath without more Kind does the component acted, does not have little particulate and falls into cleaning column.Rotary motion is controlled by vertical movement, it is at low cost and can be with Two hinged cantilevers of accurate control reversely rotate simultaneously, and crawl effect is good and convenient for maintaining crawl posture.Positioned at the clear of frame body right end Wash station it is identical as the washing station structure of frame body left end and with washing station or so the mirror settings that are located at frame body right end, each work The longitudinally reciprocating motion device of position, vertical reciprocator, rotation drive device are respectively positioned on the left and right sides of frame body, circuit Or gas circuit lays convenient and easy access, is arranged using double-station, using a set of control system, air supply system, heating system, i.e., Achievable cleaning efficiency doubles and can be greatly saved space.
Detailed description of the invention
Fig. 1 is the structural perspective of one preferred embodiment of the utility model double-station wafer cleaning machine.
Fig. 2 is the partial enlarged view of the part A of Fig. 1.
Fig. 3 is the partial enlarged view of the part B of Fig. 1.
Fig. 4 is the partial enlarged view of the C portion of Fig. 1.
Fig. 5 is the structural schematic diagram of shield.
Fig. 6 is the grabbing device structural schematic diagram of the wafer cleaning machine of the utility model double-station shown in Fig. 1.
Fig. 7 is the partial enlarged view of the part D of Fig. 6.
Fig. 8 is the partial enlarged view of the part E of Fig. 6.
Fig. 9 is the partial enlarged view of the part F of Fig. 8.
Figure 10 is the structural schematic diagram for cleaning basket.
Figure 11 is the structural schematic diagram of the frame body of the wafer cleaning machine of utility model double-station shown in Fig. 1.
Figure 12 is a kind of grabbing device structural schematic diagram of the utility model double-station wafer cleaning machine.
Figure 13 is the partial enlarged view of the part G of Figure 12.
Figure 14 is the partial enlarged view of the part H of Figure 13.
Figure 15 is a kind of grabbing device structural schematic diagram of the utility model double-station wafer cleaning machine.
Wherein: frame body -1;Seal closure -11;Air-introduced machine -12;Dodge gate -13;Electric control gear -14;Observation window -15;Maintenance Door -16;Washing station -2;Rinse bath -3;Clean basket bracket -31;Clean basket mounting table -4;Longitudinally reciprocating motion device -5;It hangs down To reciprocator -6;Grabbing device -7;Bracket -71;Hinged cantilever -72;Hook -73;Bearing -74;Telescopic mounting- 75;Wing plate -76;Stringer board -77;Connect transverse slat -78;U-shaped opening -79;Long strip through hole -710;Lateral shaft -711;Linkage gear- 712;Shield -713;Link up with height adjustment device -714;Hook rack -715;Clean basket -8.
Specific embodiment
In the following, being described further in conjunction with the accompanying drawings and embodiments to utility model.
Embodiment 1.As shown in figs. 1-11, a kind of double-station wafer cleaning machine, including frame body 1, frame body 1 are clear equipped with two groups Wash station 2.
The rinse bath 3 of opening is equipped with positioned at the top of the washing station 2 including several word orders of 1 left end of frame body, most before The front side of the rinse bath 3 of side is equipped with cleaning basket mounting table 4, and cleaning basket mounting table 4 is equipped with cleaning basket locating slot 41;Rinse bath 3 Left side be equipped with longitudinally reciprocating motion device 5, longitudinally reciprocating motion device 5 is equipped with vertical reciprocator 6, vertical reciprocal Grabbing device 7 is installed, grabbing device 7 includes bracket 71, is horizontally installed with all right one way or the other edge on bracket 71 on the top of telecontrol equipment 6 The rotation drive device that the hinged cantilever 72 of its central axes rotation and controllable two hinged cantilever 72 reversely rotate simultaneously, it is each to rotate Cantilever 72 is connected with several hooks 73 far from vertical 6 end of reciprocator, and the midpoint of two hinged cantilevers 72 is located at same vertical Two hooks 73 on straight line form a hook pair;Each hook of hinged cantilever 72 is in longitudinally reciprocating motion device 5, vertical past Under the action of multiple telecontrol equipment 6, rotation drive device, the cleaning basket 8 cleaned on basket mounting table 4 can be picked up and be put into each cleaning It cleans in slot 3 and cleaning basket 8 is placed on cleaning basket mounting table 4 after the completion of cleaning.
It is identical as 2 structure of washing station of 1 left end of frame body positioned at the washing station 2 of 1 right end of frame body and right with frame body 1 is located at The washing station 2 at end is along a vertical face or so mirror settings.
Two hinged cantilevers 72 are located at the top of rinse bath, when two hinged cantilevers 72 reversely rotate simultaneously, two hooks 73 Bottom end is close to each other/separate, can grab/decontrol cleaning basket, each hook of hinged cantilever 72 is in longitudinally reciprocating motion device 5, under the action of vertical reciprocator 6, rotation drive device, the cleaning basket 8 cleaned on basket mounting table 4 can be picked up and is put Enter cleaning in each rinse bath 3 and cleaning basket 8 is placed on cleaning basket mounting table 4 after the completion of cleaning.Due to two hinged cantilevers 72 73 are fixedly connected with hook, link up with 73 movement and drive not on hinged cantilever 72, so not having above each rinse bath It is a variety of to do the component acted, little particulate is not had to be fallen into cleaning column.Washing station 2 and 1 left end of frame body positioned at 1 right end of frame body 2 structure of washing station it is identical and be located at 1 right end of frame body 2 or so mirror settings of washing station, each station it is longitudinally reciprocal Telecontrol equipment 5, vertical reciprocator 6, rotation drive device are respectively positioned on the left and right sides of frame body, and circuit or gas circuit are laid Convenient and easy access, is arranged using double-station, using a set of control system, air supply system, heating system, cleaning can be realized Efficiency doubles and can be greatly saved space.
If two hinged cantilevers 72 by dry bearing 74 by being respectively mounted on bracket 71;On bracket 71 two hinged cantilevers 72 it Between vertically to telescopic mounting 75 is equipped with, the top of telescopic mounting 75 is hinged with two wing plates 76 and is distinguished by two wing plates 76 It is connected with the outer radial periphery surface of two hinged cantilevers 72.Using this technical solution, stretching for telescopic mounting 75 can be accurate It controls two hinged cantilevers 72 while reversely rotating.
Two wing plates 76 are longitudinally disposed and no longer in same plane, and telescopic mounting 75 is arranged between two wing plates 76, can The top of telescopic device 75 is connected with stringer board 77, and front end, the rear end of stringer board 77 respectively pass through connection transverse slat 78 respectively at two wing plates 76 Far from 72 end of hinged cantilever connected to it is hinged.Using this technical solution, it is same can accurately to control two hinged cantilevers 72 When reversely rotate.
Each wing plate 76 is equipped with U-shaped opening 79, the U-shaped opening 79 of each wing plate 76 far from 72 end of hinged cantilever connected to it Opening direction towards 72 end of hinged cantilever not connected to it of each wing plate 76, connect transverse slat 78 and be equipped with and can be connected thereto Wing plate 76 U-shaped opening 79 in run lateral shaft 711.
Bracket 71 is equipped with shield 713.
In the present embodiment, every hinged cantilever 72 is provided with two hooks pair, and each crawl hook is clear to that can grab one Washing basket, certainly, the hook of every hinged cantilever 72 is to being also possible to one, three or three or more.
Longitudinally reciprocating motion device 5 is transmission belt, is arranged on the top surface of vertical reciprocator 6.
Vertical reciprocator 6 is electric putter or lifting cylinder.
The telescopic mounting 75 is electric putter or lifting cylinder.
The hook 73 is outstanding in the rotation connected to it of plane where " Qian " font and hook 73 and hook of opening upwards Arm 72 is in the same plane;The rear and front end of the cleaning basket 8 is equipped with hangers 81.
The seal closure 11 that frame body 1 is equipped with, seal closure are equipped with air-introduced machine 12;4 side of cleaning basket mounting table of seal closure is set There is the dodge gate 13 for cleaning the disengaging of basket 8.
Cleaning basket bracket 31 is equipped in rinse bath 3.
The hook 73 is connected by hook rack 715 with hinged cantilever 72, and hook rack 715 is equipped with hook height adjustment dress Set 714.Hook 63 includes hanger bulk made of metal material and the plastic foil for being coated on hanger bulk outer surface.The hook Height adjustment device 714 is several screw holes being arranged in hook rack 715, and hook 73 is connected to hook rack by attachment screw On 714 screw hole.
Hook 63 includes hanger bulk made of metal material and the plastic foil for being coated on hanger bulk outer surface.
Embodiment 2.As shown in figs. 12-14, the present embodiment and the difference of embodiment 1 are: the rotation drive device packet Bracket 71 is included, two hinged cantilevers 72 by bearing 74 by being respectively mounted on bracket 71;In being respectively equipped on two hinged cantilevers 72 The linkage gear 712 of the linkage gear 712 that axis is overlapped with its central axes, two hinged cantilevers 72 is intermeshed;It hangs down on bracket 71 Directly to telescopic mounting 75 is equipped with, the top of telescopic mounting 75 is hinged with a wing plate 76 and by the wing plate 76 and two rotations The outer radial periphery surface of a hinged cantilever 72 in cantilever 72 is connected.
Wing plate 76 is led to far from 72 end of hinged cantilever connected to it equipped with the long side strip parallel with the long side of wing plate 76 Hole 710, telescopic mounting 75 are equipped with the lateral shaft 711 that can be run in the long strip through hole 710 of wing plate 76 connected to it.
Embodiment 3.As shown in figure 15, the present embodiment and the difference of embodiment 1 are: the separate of each wing plate 76 is connected thereto 72 end of hinged cantilever set the long side long strip through hole 710 parallel with the long side of wing plate 76, connection transverse slat 78 be equipped with can with its The lateral shaft 711 run in the long strip through hole 710 of the wing plate 76 of connection.
This specific embodiment is only the explanation to the utility model, is not limitations of the present invention, ability Field technique personnel can according to need the modification that not creative contribution is made to the present embodiment after reading this specification, but As long as all by the protection of Patent Law in the scope of the claims of the utility model.

Claims (10)

1. a kind of double-station wafer cleaning machine, including frame body (1), it is characterised in that: frame body (1) is equipped with two groups of washing stations (2);
Washing station (2) positioned at frame body (1) left end includes that the top of several word orders is equipped with the rinse bath (3) of opening, most The front side of the rinse bath (3) of the rear side and/or forefront of the rinse bath (3) at rear is equipped with cleaning basket mounting table (4), and cleaning basket is put It sets platform (4) and is equipped with cleaning basket locating slot (41);The left side of rinse bath (3) is equipped with longitudinally reciprocating motion device (5), longitudinally reciprocal Telecontrol equipment (5) is equipped with vertical reciprocator (6), and crawl dress is equipped on the top of vertical reciprocator (6) It sets (7), grabbing device (7) includes bracket (71), and it is outstanding that all right one way or the other rotation along the rotation of its central axes is horizontally installed on bracket (71) The rotation drive device that arm (72) and controllable two hinged cantilevers (72) reversely rotate simultaneously, the separate of each hinged cantilever (72) are hung down Several hooks (73) are connected with to reciprocator (6) end, the midpoint of two hinged cantilevers (72) is located on same longitudinal straight line Two hook (73) formed one hook pair;Each hook of hinged cantilever (72) is in longitudinally reciprocating motion device (5), vertical reciprocal Under the action of telecontrol equipment (6), rotation drive device, the cleaning basket (8) cleaned on basket mounting table (4) can be picked up and be put into each It cleans in rinse bath (3) and cleaning basket (8) is placed into cleaning basket mounting table (4) after the completion of cleaning;
It is identical as washing station (2) structure of frame body (1) left end positioned at the washing station (2) of frame body (1) right end and be located at frame Washing station (2) left and right mirror settings of body (1) right end.
2. a kind of double-station wafer cleaning machine as described in claim 1, it is characterised in that: two hinged cantilevers (72) pass through each logical If crossing dry bearing (74) to be mounted on bracket (71);It is vertically scalable to being equipped between two hinged cantilevers (72) on bracket (71) Device (75), the top of telescopic mounting (75) be hinged with two wing plates (76) and by two wing plates (76) respectively with two hinged cantilevers (72) outer radial periphery surface is connected.
3. a kind of double-station wafer cleaning machine as claimed in claim 2, it is characterised in that: two wing plates (76) it is longitudinally disposed and No longer in same plane, telescopic mounting (75) is arranged between two wing plates (76), and the top of telescopic mounting (75) is connected with Stringer board (77), front end, the rear end of stringer board (77) respectively pass through connection transverse slat (78) and are connected thereto respectively at the separate of two wing plates (76) Hinged cantilever (72) end it is hinged.
4. a kind of double-station wafer cleaning machine as claimed in claim 3, it is characterised in that: each the separate of wing plate (76) connects with it Hinged cantilever (72) end connect the long strip through hole (710) parallel with the long side of wing plate (76) equipped with U-shaped opening (79) or long side, respectively The hinged cantilever (72) not connected to it of the opening direction of the U-shaped opening (79) of wing plate (76) towards each wing plate (76) is held, even It connects transverse slat (78) and is equipped with the cross that can be run in the U-shaped opening (79) or long strip through hole (710) of wing plate connected to it (76) To axis (711).
5. a kind of double-station wafer cleaning machine as described in claim 1, it is characterised in that: the rotation drive device includes branch Frame (71), two hinged cantilevers (72) by bearing (74) by being respectively mounted on bracket (71);Two hinged cantilevers (72) Shang Gean The linkage gear (712) of the linkage gear (712) being overlapped equipped with central axes with its central axes, two hinged cantilevers (72) is mutually nibbled It closes;Vertically to being equipped with telescopic mounting (75) on bracket (71), the top of telescopic mounting (75) is hinged with a wing plate (76) And it is connected by the wing plate (76) with the outer radial periphery surface of the hinged cantilever (72) in two hinged cantilevers (72).
6. a kind of double-station wafer cleaning machine as claimed in claim 5, it is characterised in that: the separate of wing plate (76) is connected thereto Hinged cantilever (72) end be equipped with U-shaped opening (79) or the long side long strip through hole (710) parallel with the long side of wing plate (76), each wing The hinged cantilever (72) not connected to it of the opening direction of the U-shaped opening (79) of plate (76) towards each wing plate (76) is held, and can be stretched Compression apparatus (75) is equipped with the cross that can be run in the U-shaped opening (79) or long strip through hole (710) of wing plate connected to it (76) To axis (711).
7. a kind of double-station wafer cleaning machine as described in claim 1, it is characterised in that: bracket (71) is equipped with shield (713).
8. a kind of double-station wafer cleaning machine as described in claim 1, it is characterised in that: longitudinally reciprocating motion device (5) is Transmission belt is arranged on the top surface of vertical reciprocator (6);
Alternatively, longitudinally reciprocating motion device (5) includes longitudinal rail pair, vertical reciprocator (6) installation is led longitudinally On the sliding block of rail pair, longitudinal rail pair is equipped with slide-driving device;
Vertical reciprocator (6) is electric putter or lifting cylinder;
The telescopic mounting (75) is electric putter or lifting cylinder.
9. a kind of double-station wafer cleaning machine as described in claim 1, it is characterised in that: the hook (73) is in opening upwards " Qian " font and hook (73) and hook where plane hinged cantilever connected to it (72) in the same plane;The cleaning The rear and front end of basket (8) is equipped with hangers (81).
10. a kind of double-station wafer cleaning machine as described in claim 1, it is characterised in that: the seal closure that frame body (1) is equipped with (11), seal closure is equipped with air-introduced machine (12);Cleaning basket mounting table (4) side of seal closure is equipped with for cleaning basket (8) disengaging Dodge gate (13).
CN201821290575.1U 2018-08-11 2018-08-11 A kind of double-station wafer cleaning machine Active CN208679979U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111403325A (en) * 2020-05-15 2020-07-10 马玉水 Silicon wafer cleaning mechanism

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111403325A (en) * 2020-05-15 2020-07-10 马玉水 Silicon wafer cleaning mechanism

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