CN208572572U - Etching solution monitoring device and etching machines with the etching solution monitoring device - Google Patents
Etching solution monitoring device and etching machines with the etching solution monitoring device Download PDFInfo
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- CN208572572U CN208572572U CN201821180930.XU CN201821180930U CN208572572U CN 208572572 U CN208572572 U CN 208572572U CN 201821180930 U CN201821180930 U CN 201821180930U CN 208572572 U CN208572572 U CN 208572572U
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- etching solution
- liquid medicine
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- etching
- specific gravity
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Abstract
The utility model is suitable for board production technical field, provides a kind of etching solution monitoring device and etching machines.Above-mentioned etching solution monitoring device includes the first monitoring assembly and the second monitoring assembly, first monitoring assembly is connect by the first inlet tube and the first return pipe with etching solution main tank, second monitoring assembly is connect by the second inlet tube and the second return pipe with etching solution main tank, first monitoring assembly has also been electrically connected exhaust fan and has inflated blower, and the second monitoring assembly is also electrically connected with liquid-adding device.Above-mentioned etching machines include above-mentioned etching solution monitoring device.A kind of etching solution monitoring device provided by the utility model and the etching machines with the etching solution monitoring device, etching solution monitoring device can pH value, ORP value and liquid medicine content rate of specific gravity to etching solution be monitored and control, the stability of etching solution etch-rate is improved, and then is conducive to improve the fineness that etching machines carry out circuit board line processing.
Description
Technical field
The utility model belongs to board production technical field more particularly to a kind of etching solution monitoring device and has the erosion
Carve the etching machines of liquid monitoring device.
Background technique
Printed circuit board (abbreviation PCB) generallys use the mode of alkali etching when manufacturing to realize.Capital equipment
It include: to move back film machine, etching machine, deleading/tin machine three parts to form a train line.Its process flow and principle are as follows: upper trigger
→ move back film → alkali etching → deleading/tin → lower trigger.Wherein:
Move back film: after graphic plating, the copper not being plated on the substrate of part is covered with by dry film, and the part is final
It is to be etched when forming line pattern to go, so dry film is first had to strip to expose copper face before the etch.It is dilute for moving back film liquid
Alkali, when diluted alkaline enters in dry film, with the resin neutralization reaction containing acidic group and be dissolved and come out, so that dry film is detached from copper face.
Copper-clad plate: being processed into printed circuit board by alkali etching, needs to erode the part copper sheet in copper-clad plate.Because
Containing ammonium hydroxide and in alkalinity in corrosive liquid, therefore this process is known as alkali etching, the liquid medicine for corroding copper claims etching solution.In etching solution
Bivalent cupric ion is a kind of oxidant, it reacts with metallic copper and solves metallic copper deeply.
And in specific etching process, the active holding of etching solution and control affect the efficiency and route of etching
Fineness.It is then desired to each ingredient in etching solution is monitored and is regulated and controled, the efficiency and route that can ensure to etch
Fineness, promote the quality of circuit board.And in existing production equipment, it can't fully achieve.
Utility model content
The purpose of the utility model is to overcome above-mentioned the deficiencies in the prior art, provide a kind of etching solution monitoring device and
Etching machines with the etching solution monitoring device, etching solution monitoring device can pH value, ORP value and liquid medicine contents to etching solution
Rate of specific gravity is monitored and controls, and improves the stability of etching solution etch-rate, and then is conducive to improve etching machines progress
The fineness of circuit board line processing.
The utility model is realized in this way: a kind of etching solution monitoring device is connect with etching solution main tank, including for examining
Survey the first monitoring assembly of pH value and ORP value in analysis etching solution and for testing and analyzing etching solution Chinese medicine water content specific gravity
Two monitoring assemblies, first monitoring assembly are connect by the first inlet tube and the first return pipe with the etching solution main tank, institute
It states the second monitoring assembly to connect by the second inlet tube and the second return pipe with the etching solution main tank, first monitoring assembly
It is also electrically connected the blower of inflating for regulating and controlling the exhaust fan of pH value in etching solution and for regulating and controlling ORP value in etching solution,
Second monitoring assembly is also electrically connected with the liquid-adding device for regulating and controlling etching solution Chinese medicine water content specific gravity.
Optionally, first monitoring assembly includes for containing the first liquid medicine detection box of detection liquid medicine, for detecting
Analyze the PH probe of pH value in etching solution, the first controller for controlling the exhaust fan, for testing and analyzing in etching solution
The ORP of ORP value pops one's head in and for controlling the second controller for inflating blower, the PH probe and ORP probe are all provided with
It sets on first liquid medicine detection box and one end is put in in first liquid medicine detection box, the PH probe passes through described
First controller and the exhausting mechatronics, the ORP probe are electrically connected by the second controller with the blower of inflating
It connects.
Optionally, one end of first inlet tube and first return pipe is connected to the first liquid medicine detection box,
The other end is connected to the etching solution main tank.
Optionally, the switch for controlling feed liquor on-off is connected on first inlet tube.
Further, it is additionally provided in the first liquid medicine detection box for extra detection liquid medicine to be fed back to the erosion
Carve the overflow pipe in liquid main tank.
Optionally, second monitoring assembly includes for containing the second liquid medicine detection box of detection liquid medicine, for detecting
The specific gravity for analyzing etching solution Chinese medicine water content specific gravity pops one's head in and than treasure ontology, described to be arranged than treasure ontology in second medicine
Water detects on box, and the specific gravity probe setting is in second liquid medicine detection box, the specific gravity probe and the liquid-adding device
It is electrically connected with the specific gravity ontology.
Optionally, first partition and second partition, the first partition are arranged at intervals in the second liquid medicine detection box
Or the second partition is extended from up to down and the bottom plate interval with second liquid medicine detection box, the second partition
Or the bottom-up top plate interval being extended and box is detected with second liquid medicine of first partition, the specific gravity probe
It is arranged between the first partition and the second partition.
The utility model additionally provides a kind of etching machines, including above-mentioned etching solution monitoring device.
A kind of etching solution monitoring device provided by the utility model and the etching machines with the etching solution monitoring device,
The etching solution monitoring device realizes the monitoring to pH value in etching solution and ORP value by being provided with the first monitoring assembly；Pass through
It is provided with the second detecting/monitoring component, realizes the monitoring to etching solution Chinese medicine water content specific gravity.In this way, under combination,
It realizes the pH value to etching solution, ORP value and liquid medicine content rate of specific gravity to be monitored and control, enables the etch-rate of etching solution
It is enough to keep stablizing, and then improve the efficiency of circuit board line production.Moreover, because can be controlled to the etch-rate of etching solution
System just can also ensure that the fineness of circuit board line production, be conducive to the promotion of wiring board total quality.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the first monitoring assembly provided by the embodiment of the utility model；
Fig. 2 is the structural schematic diagram of the second monitoring assembly provided by the embodiment of the utility model.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describing, it is clear that described embodiment is only a part of the embodiment of the utility model, rather than all
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are not making creative work premise
Under every other embodiment obtained, fall within the protection scope of the utility model.
It is to be appreciated that the directional instruction (such as up, down, left, right, before and after ...) of institute in the utility model embodiment
It is only used for explaining in relative positional relationship, the motion conditions etc. under a certain particular pose (as shown in the picture) between each component, such as
When the fruit particular pose changes, then directionality instruction also correspondingly changes correspondingly.
It should also be noted that, when an element is referred to as being " fixed " or " disposed " on another element, it can be straight
Connect on the other element or may be simultaneously present centering elements.When an element is known as " connection " another element,
It, which can be, is directly connected to another element or may be simultaneously present centering elements.
In addition, the description for being related to " first ", " second " etc. in the present invention is used for description purposes only, and cannot understand
For its relative importance of indication or suggestion or implicitly indicate the quantity of indicated technical characteristic.Define as a result, " first ",
The feature of " second " can explicitly or implicitly include at least one of the features.In addition, the technical side between each embodiment
Case can be combined with each other, but must be based on can be realized by those of ordinary skill in the art, when the combination of technical solution
Conflicting or cannot achieve when occur will be understood that the combination of this technical solution is not present, also not in the requires of the utility model
Protection scope within.
As depicted in figs. 1 and 2, etching solution monitoring device provided in the utility model embodiment, with etching solution main tank
10 connections, including for testing and analyzing in etching solution the first monitoring assembly 11 of pH value and ORP value and for testing and analyzing etching
Second monitoring assembly 12 of liquid Chinese medicine water content specific gravity, first monitoring assembly 11 pass through the first inlet tube 13 and the first return pipe
14 connect with etching solution main tank 10, and the second monitoring assembly 12 passes through the second inlet tube and the second return pipe 15 and etching solution main tank 10
Connection.In this way, by the first inlet tube 13 and the first return pipe 14 realize the first monitoring assembly 11 and etching solution main tank 10 it
Between series connection, so that the liquid medicine in the liquid medicine and etching solution main tank 10 that enter in the first monitoring assembly 11 is circulated, really
Protecting the accuracy that monitoring pH value and ORP value numerical value detect, (ORP is the contracting of English Oxidation-Reduction Potential
It writes, Chinese meaning are as follows: oxidation-reduction potential).Equally, the second monitoring group is realized by the second inlet tube and the second return pipe 15
Connecting between part 12 and etching solution main tank 10 makes to enter in liquid medicine and etching solution main tank 10 in the second monitoring assembly 12
Liquid medicine can circulate, it is ensured that the accuracy of etching solution Chinese medicine water content rate of specific gravity detection.In this way, the first prison for passing through setting
The function combination for surveying component 11 and the second monitoring assembly 12, realizes to pH value, ORP value and liquid medicine content rate of specific gravity in etching solution
It is monitored.Also, in order to realize to the regulation of pH value, ORP value and liquid medicine content rate of specific gravity in etching solution, enable each numerical value
It is maintained in the range of production regulation, which is also electrically connected and is used to pH value in etching solution
Exhaust fan and blower of inflating for regulating and controlling ORP value in etching solution, and the second monitoring assembly 12 is also electrically connected with for regulating and controlling erosion
Carve the liquid-adding device of liquid Chinese medicine water content specific gravity.In this way, in the actual production process, according to the type that circuit board line etches,
The numberical range of pH value, ORP value and liquid medicine content rate of specific gravity when the good etching solution of default keeps stable living, is then producing
During carry out real-time monitoring, and the air in etching groove is extracted by control exhaust fan and realizes the regulation to pH value, led to
It crosses control and inflates blower and inject oxygen into etching solution and realize the regulation to ORP value, by controlling liquid-adding device to etching solution
Addition etches sub- liquid and realizes the control to etching solution Chinese medicine water content rate of specific gravity in main tank 10.It is such to pass through one-to-one correspondence, list
The mode solely regulated and controled, it is ensured that the accuracy of regulation, and then the stability for promoting etching solution etch-rate can be integrated.
Optionally, in specific etching process, the key reaction mechanism of route production is carried out by etching solution are as follows:
Complex reaction: CuCl2+4NH3=[Cu (NH3)3]Cl2
[Cu(NH3)4]2+Cl2It is the complex ion with Strong oxdiative ability
Etching reaction: Cu+ [Cu (NH3)4]2+Cl2=2 [Cu (NH3)2]Cl1
Metal copper atom Cu generates a copper ion after reaction, and [Cu (NH3)2] Cl do not have oxidability, it needs
Regeneration just has oxidative function.Regenerative response:
2[Cu(NH3)2]Cl+2NH4C1+2NH3·H20+1/202=2 [Cu (NH3)4]Cl2+3H20
By upper reaction equation it is found that needing to consume oxygen in regenerative response.Thus, in the utility model embodiment, lead to
The real-time monitoring to ORP value is crossed, oxygen needed for capable of injecting reaction into etching solution in time is able to maintain ORP value and is closing
In suitable range, guarantee the stability of reaction rate.Certainly, it is not limited to inflate blower injection oxygen in etching solution, further includes
Injecting compressed air and the injection for realizing oxygen.
Optionally, as shown in Figure 1, in the utility model embodiment, which includes for containing inspection
The first liquid medicine for surveying liquid medicine detects box 111, the PH probe 112 for testing and analyzing pH value in etching solution, for controlling exhaust fan
The first controller, for test and analyze ORP value in etching solution ORP pop one's head in 113 and for control inflate blower second control
Device processed, PH 112 and ORP of probe probe 113 is arranged on the first liquid medicine detection box 111 and one end puts in and examines in the first liquid medicine
It surveys in box 111, so as to be immersed in etching solution and realize sample detecting.PH probe 112 passes through the first controller and exhausting
Mechatronics, ORP probe 113 by second controller with inflate blower and be electrically connected.Setting in this way, first liquid medicine inspection
It surveys in box 111 and is loaded with etching solution, led to then when pH value is higher than specified value by the pH value of 112 detection etching solution of PH probe
Cross the first controller makes pH value reduction (due to containing ammonium hydroxide in etching solution, can release ammonia to start exhaust fan progress exhausting
Gas.The concentration of ammonia is thus reduced by way of exhausting, and then realizes the reduction of pH value).And when pH value in specified value
When, it can be adjusted by addition ammonium hydroxide.Equally, the ORP value of 113 detection etching solution of ORP probe, then in ORP value lower than rule
When definite value, is started by second controller and inflate blower and inject oxygen into etching solution, for improving the rate of regenerative response.
It is such, by being precisely controlled to pH value and ORP value, the etch-rate of etching solution is made to be able to maintain higher and stable activity,
Be conducive to keep the efficiency of circuit board etching.
Optionally, as shown in Figure 1, one end of first inlet tube 13 and the first return pipe 14 is connected to the detection of the first liquid medicine
Box 111, the other end are connected to etching solution main tank 10.In this way, enabling the liquid medicine in etching solution main tank 10 by the first inlet tube 13
The first liquid medicine detection box 111 is enough entered, and is back in etching solution main tank 10 by the first return pipe 14, following for etching solution is formed
Circulation is dynamic, it is ensured that the first liquid medicine detects the activity of 111 liquid medicine of box and detects the accuracy of numerical value.
Optionally, as shown in Figure 1, being connected with the switch 16 for controlling feed liquor on-off on the first inlet tube 13.To,
Feed liquor can be controlled on demand, meet the use demand under the different conditions of production.
Further, as shown in Figure 1, being additionally provided in the first liquid medicine detection box 111 for returning extra detection liquid medicine
Transport to the overflow pipe 17 in etching solution main tank 10.In this way, when the liquid medicine liquid level entered in the first liquid medicine detection box 111 is excessively high,
It can be back in etching solution main tank 10 by the overflow pipe 17, it is ensured that the first liquid medicine detects the liquid level energy in box 111
Enough it is maintained in the range of setting.
Optionally, as shown in Fig. 2, in the utility model embodiment, which includes for containing inspection
Survey the second liquid medicine detection box 121 of liquid medicine, specific gravity probe 122 and specific gravity for testing and analyzing etching solution Chinese medicine water content specific gravity
Device ontology 123, than the setting of treasure ontology 123 on the second liquid medicine detection box 121,122 setting of specific gravity probe is examined in the second liquid medicine
It surveys in box 121, specific gravity probe 122 and liquid-adding device are electrically connected with specific gravity ontology.Specific gravity probe 122 is immersed in the inspection of the second liquid medicine
It surveys box 121 and carries out sample detecting, and be electrically connected the transmission for realizing data with specific gravity ontology by conducting wire.Further according to what is detected
Liquid medicine content rate of specific gravity controls whether liquid-adding device needs to start the sub- liquid of addition, to realize to etching solution Chinese medicine water content specific gravity
Adjustment, it is ensured that the rate of etch-rate.
Optionally, as shown in Fig. 2, being arranged at intervals with first partition 18 and second partition in the second liquid medicine detection box 121
19, and first partition 18 or second partition 19 are extended from up to down and between the bottom plate of the second liquid medicine detection box 121
Every, second partition 19 or the bottom-up top plate interval being extended and box 121 is detected with the second liquid medicine of first partition 18, and
Specific gravity probe 122 is arranged between first partition 18 and second partition 19.In this way, passing through first partition 18 and second partition 19
The inner cavity of second liquid medicine detection box 121 is separated, so that internal liquid flowing is not generated horizontal laminar flow, and then ensure specific gravity
The accuracy of 122 data of popping one's head in acquisition.
Etching solution monitoring device provided in the utility model embodiment passes through the PH in PH 112 pairs of etching solutions of probe
Value is detected, and carries out exhausting to etching groove using the first controller control exhaust fan, realizes the tune to pH value in etching solution
Control；It is detected by the ORP value in ORP 113 pairs of etching solutions of probe, and inflates blower to etching using second controller control
Liquid carries out oxygen addition, realizes the regulation to ORP value in etching solution；Pass through the content of liquid medicine in specific gravity 122 pairs of etching solutions of probe
The detection of specific gravity, and realized to control the sub- liquid addition of liquid-adding device progress to liquid medicine in etching solution using than treasure ontology 123
Content specific gravity regulation.By above-mentioned setting, synthesis improves the stability of etching solution etch-rate.
The utility model additionally provides a kind of etching machines, including above-mentioned etching solution monitoring device.Due to above-mentioned etching
Liquid monitoring device can be monitored and regulate and control to the etching solution activity in etching machines, and etch-rate is made to be able to maintain stabilization,
And then the efficiency of circuit board line production and the fineness of route are improved, the product quality of production is high.
The above is only the preferred embodiment of the utility model only, is not intended to limit the utility model, all at this
Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model
Protection scope within.
Claims (8)
1. a kind of etching solution monitoring device, connect with etching solution main tank, which is characterized in that including for testing and analyzing in etching solution
First monitoring assembly of pH value and ORP value and the second monitoring assembly for testing and analyzing etching solution Chinese medicine water content specific gravity, institute
It states the first monitoring assembly to connect by the first inlet tube and the first return pipe with the etching solution main tank, second monitoring assembly
It is connect by the second inlet tube and the second return pipe with the etching solution main tank, first monitoring assembly has also been electrically connected
Blower of inflating for regulating and controlling the exhaust fan of pH value in etching solution and for regulating and controlling ORP value in etching solution, the second monitoring group
Part is also electrically connected with the liquid-adding device for regulating and controlling etching solution Chinese medicine water content specific gravity.
2. etching solution monitoring device as described in claim 1, which is characterized in that first monitoring assembly includes for containing
The first liquid medicine detection box, the PH for testing and analyzing pH value in etching solution of detection liquid medicine pop one's head in, for controlling the exhaust fan
The first controller, the ORP for testing and analyzing ORP value in etching solution pops one's head in and for controlling second control for inflating blower
Device processed, the PH probe and ORP probe are arranged on the first liquid medicine detection box and one end is put in described first
Liquid medicine detects in box, and the PH probe passes through institute by first controller and the exhausting mechatronics, the ORP probe
Second controller is stated to be electrically connected with the blower of inflating.
3. etching solution monitoring device as claimed in claim 2, which is characterized in that first inlet tube and first reflux
One end of pipe is connected to the first liquid medicine detection box, and the other end is connected to the etching solution main tank.
4. etching solution monitoring device as claimed in claim 2, which is characterized in that be connected on first inlet tube for controlling
The switch of feed liquor on-off processed.
5. etching solution monitoring device as claimed in claim 2, which is characterized in that be additionally provided in the first liquid medicine detection box
For extra detection liquid medicine to be fed back to the overflow pipe in the etching solution main tank.
6. the etching solution monitoring device as described in any one of claims 1 to 5, which is characterized in that second monitoring assembly
It is visited including the second liquid medicine detection box, the specific gravity for testing and analyzing etching solution Chinese medicine water content specific gravity for containing detection liquid medicine
Head and than treasure ontology, it is described than the setting of treasure ontology on second liquid medicine detection box, the specific gravity probe is arranged in institute
It states in the second liquid medicine detection box, the specific gravity probe and the liquid-adding device are electrically connected with the specific gravity ontology.
7. etching solution monitoring device as claimed in claim 6, which is characterized in that interval setting in the second liquid medicine detection box
There are a first partition and second partition, the first partition or the second partition are extended from up to down and with described second
Liquid medicine detects the bottom plate interval of box, the second partition or first partition is bottom-up is extended and with described second
Liquid medicine detects the top plate interval of box, and the specific gravity probe is arranged between the first partition and the second partition.
8. a kind of etching machines, which is characterized in that etching solution monitoring device as claimed in any of claims 1 to 7 in one of claims.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821180930.XU CN208572572U (en) | 2018-07-23 | 2018-07-23 | Etching solution monitoring device and etching machines with the etching solution monitoring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821180930.XU CN208572572U (en) | 2018-07-23 | 2018-07-23 | Etching solution monitoring device and etching machines with the etching solution monitoring device |
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| Publication Number | Publication Date |
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| CN208572572U true CN208572572U (en) | 2019-03-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201821180930.XU Active CN208572572U (en) | 2018-07-23 | 2018-07-23 | Etching solution monitoring device and etching machines with the etching solution monitoring device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110072342A (en) * | 2019-04-30 | 2019-07-30 | 昆山沪利微电有限公司 | A kind of processing unit (plant) for pcb board production |
| CN111334799A (en) * | 2020-03-12 | 2020-06-26 | Tcl华星光电技术有限公司 | Etching apparatus and etching method |
| CN112877696A (en) * | 2021-02-04 | 2021-06-01 | 广州兴森快捷电路科技有限公司 | Method, device and equipment for controlling oxygen content in alkaline etching and storage medium |
-
2018
- 2018-07-23 CN CN201821180930.XU patent/CN208572572U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110072342A (en) * | 2019-04-30 | 2019-07-30 | 昆山沪利微电有限公司 | A kind of processing unit (plant) for pcb board production |
| CN110072342B (en) * | 2019-04-30 | 2024-03-01 | 昆山沪利微电有限公司 | A processingequipment for PCB board preparation |
| CN111334799A (en) * | 2020-03-12 | 2020-06-26 | Tcl华星光电技术有限公司 | Etching apparatus and etching method |
| CN111334799B (en) * | 2020-03-12 | 2022-04-01 | Tcl华星光电技术有限公司 | Etching apparatus and etching method |
| CN112877696A (en) * | 2021-02-04 | 2021-06-01 | 广州兴森快捷电路科技有限公司 | Method, device and equipment for controlling oxygen content in alkaline etching and storage medium |
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