CN208521905U - A kind of IPA make-up system - Google Patents
A kind of IPA make-up system Download PDFInfo
- Publication number
- CN208521905U CN208521905U CN201821278326.0U CN201821278326U CN208521905U CN 208521905 U CN208521905 U CN 208521905U CN 201821278326 U CN201821278326 U CN 201821278326U CN 208521905 U CN208521905 U CN 208521905U
- Authority
- CN
- China
- Prior art keywords
- fluid reservoir
- ipa
- make
- weighing
- board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012530 fluid Substances 0.000 claims abstract description 134
- 238000005303 weighing Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 abstract description 9
- 239000000126 substance Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
It includes: the first fluid reservoir that the utility model, which provides a kind of IPA make-up system, and first fluid reservoir is connected with board, for supplying IPA solution to the board；Second fluid reservoir, second fluid reservoir are located at the top of first fluid reservoir, and second fluid reservoir is connected with feeding device, for laying in the IPA solution for first fluid reservoir；Control valve is connected between first fluid reservoir and second fluid reservoir, and with first fluid reservoir and the second fluid reservoir.So that drying wafer, which is made, stablizes and improves board output capacity.
Description
Technical field
The utility model belongs to field of semiconductor manufacture, is related to a kind of IPA make-up system.
Background technique
In wafer manufacture, with the upgrading of process technique, the miniaturization of device, flat journey of the photoetching technique to crystal column surface
Spend (Non-uniformity) requirement it is higher and higher, existing wafer planarization method include: chemical grinding, mechanical lapping and
Chemical mechanical grinding.Simple chemical grinding, surface accuracy is higher, and damage is low, and integrality is good, it is not easy to surface/Asia table occurs
Surface damage, but grinding rate is slower, material removal efficiency is lower, cannot correct surface type face precision, grinds comparison of coherence
Difference；Simple mechanical lapping, grinding consistency is good, and surface smoothness is high, and grinding efficiency is high, but is easy to appear superficial layer/Asia
Damage of surface layer, surface roughness value are relatively low.Chemical mechanical grinding (CMP, Chemical Mechanical Polish) is comprehensive
The advantage of chemical grinding and mechanical lapping has been closed, more perfect surface can have been obtained while guaranteeing material removal efficiency, obtain
To flatness be higher by the 1-2 order of magnitude than using simple mechanical lapping or chemical grinding, and nanoscale may be implemented
To the surface roughness of atom level, therefore from after nineteen ninety-five, CMP technique is developed rapidly, and is widely used in semiconductor
Industry.
CMP, which is also known as, to be chemically-mechanicapolish polished, and principle is that chemical attack effect and mechanical removal act on the processing combined
Technology is the technology that surface global planarization uniquely may be implemented in current machining.CMP process needs IPA solution (isopropyl
Alcohol) wafer is dried, as shown in Figure 1, being shown as a kind of IPA make-up system in the prior art, including IPA fluid reservoir
100, weighing-appliance 200, board 300 and feeding device 400, board 300 and feeding device 400 are connected by pipeline 500, but
For store IPA solution IPA fluid reservoir 100 only one, the quality of IPA fluid reservoir 100 is detected by weighing-appliance 200,
When the quality of the IPA solution in IPA fluid reservoir 100 drops to a certain amount of, need logical to the IPA solution in IPA fluid reservoir 100
Feeding device 400 is crossed to be fed, since feeding device 400 is when feeding IPA solution to IPA fluid reservoir 100, IPA fluid reservoir
IPA solution in 100 is unstable, and due to storage IPA solution IPA fluid reservoir 100 only one, IPA fluid reservoir need to be passed through
100 supply IPA solution for board 300, usually need to be by machine in order to avoid unstable due to the IPA solution used for board 300
Platform 300 is modulated to standby mode, completes until the IPA solution in IPA fluid reservoir 100 is fed, therefore cause drying wafer system
At unstable and 300 output capacity of board decline.
Based on the above, a kind of IPA make-up system is provided to solve feeding IPA to IPA fluid reservoir in the prior art
When solution, since the IPA solution in IPA fluid reservoir is unstable, cause that board standby mode need to be modulated to, until IPA liquid storage
IPA solution in tank, which is fed, to be completed, so that drying wafer is made the problem of unstable and board output capacity declines and is necessary.
Utility model content
In view of the foregoing deficiencies of prior art, the purpose of this utility model is to provide a kind of IPA make-up systems, use
In solve in the prior art to IPA fluid reservoir feed IPA solution when, since the IPA solution in IPA fluid reservoir is unstable, make
At that board need to be modulated to standby mode, completed until the IPA solution in IPA fluid reservoir is fed, so that drying wafer is made not
The problem of stable and board output capacity declines.
In order to achieve the above objects and other related objects, the utility model provides a kind of IPA make-up system, comprising:
First fluid reservoir, first fluid reservoir are connected with board, for supplying IPA solution to the board；
Second fluid reservoir, second fluid reservoir are located at the top of first fluid reservoir, second fluid reservoir with plus
Material device is connected, for laying in the IPA solution for first fluid reservoir；
Control valve, between first fluid reservoir and second fluid reservoir, and with first fluid reservoir and
Two fluid reservoirs are connected.
Optionally, the control valve includes one of solenoid valve and pneumatic operated valve or combination.
Optionally, it is generally in identical pattern that first fluid reservoir and the second fluid reservoir, which have,.
Optionally, the bottom of first fluid reservoir is connected by pipeline with the board.
Optionally, the IPA make-up system further includes control equipment, and the control equipment connects the control valve.
Optionally, the IPA make-up system further includes weighing-appliance, for weighing first fluid reservoir and the second liquid storage
The quality of tank, the weighing-appliance include most low gear and top gear.
Optionally, the weighing-appliance further includes lower limit stop and upper limit stop, and the weighing-appliance further includes alarm, works as institute
When stating weighing-appliance and being in the lower limit stop and upper limit stop, the alarm starting.
Optionally, the alarm connects the board, and when alarm starting, the board is shut down.
Optionally, when the weighing-appliance is in the most low gear, the control valve is in close state.
Optionally, when the weighing-appliance is in the top gear, the control valve is in the open state.
As described above, the IPA make-up system of the utility model, have the advantages that (1) by it is mutually indepedent and in
Between be connected with control valve the first fluid reservoir and the second fluid reservoir be board supply IPA solution so that IPA solution is being fed
When, the IPA supplied in the first fluid reservoir of IPA solution for board is solution-stabilized, and it is right into second fluid reservoir to be completed at the same time
The supply of IPA solution；(2) intelligent control to feeding device, control valve and board is realized by control equipment, saves manpower,
It realizes and is precisely controlled simultaneously；(3) board is further controlled by alarm, improves product quality.So that drying wafer is made surely
Fixed and raising board output capacity.
Detailed description of the invention
Fig. 1 is shown as a kind of structural schematic diagram of IPA make-up system in the prior art.
Fig. 2 is shown as the structural schematic diagram of the IPA make-up system in the utility model.
Component label instructions
100 IPA fluid reservoirs
110 first fluid reservoirs
120 second fluid reservoirs
200,210 weighing-appliance
300,310 board
400,410 feeding device
500,510 pipeline
610 control valves
710 control equipment
810 alarms
Specific embodiment
The embodiments of the present invention is illustrated by particular specific embodiment below, those skilled in the art can be by this
Content disclosed by specification understands other advantages and effect of the utility model easily.
Please refer to Fig. 2.It should be clear that this specification structure depicted in this specification institute accompanying drawings, ratio, size etc., only to cooperate
The revealed content of specification, so that those skilled in the art understands and reads, being not intended to limit the utility model can be real
The qualifications applied, therefore do not have technical essential meaning, the tune of the modification of any structure, the change of proportionate relationship or size
It is whole, in the case where not influencing the effect of the utility model can be generated and the purpose that can reach, it should all still fall in the utility model institute
The technology contents of announcement obtain in the range of capable of covering.Meanwhile in this specification it is cited as "upper", "lower", "left", "right",
The term of " centre " and " one " etc. is merely convenient to being illustrated for narration, rather than to limit the enforceable range of the utility model,
Its relativeness is altered or modified, under the content of no substantial changes in technology, when being also considered as the enforceable scope of the utility model.
As shown in Fig. 2, the structural schematic diagram for the IPA make-up system being shown as in the utility model, the utility model is provided
A kind of IPA make-up system, comprising: the first fluid reservoir 110, the second fluid reservoir 120, weighing-appliance 210, board 310, feeding device
410 and control valve 610.
Specifically, the bottom of first fluid reservoir 110 is connected by pipeline 510 with board 310, it is used for the machine
Platform 310 supplies IPA solution, and size, pattern and the material of the pipeline 510 are herein with no restriction.Second fluid reservoir 120
In the top of first fluid reservoir 110, second fluid reservoir 120 is connected with feeding device 410, is filled by the charging
It sets 410 and lays in the IPA solution for first fluid reservoir 110；The control valve 610 be located at first fluid reservoir 110 and
Between second fluid reservoir 120, and it is connected with first fluid reservoir 110 and the second fluid reservoir 120 by the pipeline 510
It connects, so that the setting independently of each other of second fluid reservoir 120 and first fluid reservoir 110, passes through the control valve 610
The connection status between second fluid reservoir 120 and first fluid reservoir 110 is controlled, so that the IPA solution can
The board 310 is stabilized to by first fluid reservoir 110 to supply.
As an example, the control valve 610 includes one of solenoid valve and pneumatic operated valve or combination.In the present embodiment, adopt
With the combination of solenoid valve and pneumatic operated valve, in order to accurately be controlled the IPA solution.It in another embodiment, can also be only
Using IPA solution described in solenoid valve control, herein with no restriction.
As an example, it is generally in identical pattern that first fluid reservoir 110 and the second fluid reservoir 120, which have,.
Specifically, second fluid reservoir 120 is located at the surface of first fluid reservoir 110, and is in the present embodiment
Convenient for controlling the quality of the IPA solution in second fluid reservoir 120 and the first fluid reservoir 110, first fluid reservoir
110 and second fluid reservoir 120 using generally be in identical pattern, in another embodiment, first fluid reservoir 110 and described second
The pattern and size of fluid reservoir 120, those skilled in the art also select according to specific needs, herein with no restriction.
As an example, the IPA make-up system further includes control equipment 710, the control equipment 710 and the control valve
610 are connected, to realize the intelligent control to the control valve 610.
Specifically, the control equipment 710 connects the control valve 610, the switch state of the control valve 610 is carried out
Control, to control the connection status between second fluid reservoir 120 and the first fluid reservoir 110.In another embodiment, institute
State control valve 610 also and can control the flow that second fluid reservoir 120 feeds the IPA solution to first fluid reservoir 110
And flow velocity, so that second fluid reservoir 120 is fed the IPA solution and first fluid reservoir to first fluid reservoir 110
Fixed difference is formed between the dosage of the 110 supply boards 310, first fluid reservoir 110 is further enhanced and supplies institute
State the stability of board 310.
As an example, the weighing-appliance 210 is used to weigh the matter of first fluid reservoir 110 and the second fluid reservoir 120
Amount, to feed back the quality of the IPA solution, the weighing-appliance 210 includes most low gear and top gear.
Specifically, when the weighing-appliance 210 is in most low gear, i.e., described first fluid reservoir 110 and the second fluid reservoir
The IPA solution content in 120 is lower, and when need to be fed, the control valve 610 is in close state at this time, and described
One fluid reservoir 110 continues as the board 310 and supplies the IPA solution, while the feeding device 410 is to second liquid storage
The IPA solution is supplied in tank 120, to increase the content of the IPA solution in second fluid reservoir 120, at this time by
It is in close state in the control valve 610, therefore only the IPA solution in second fluid reservoir 120 is in unstable
State, first fluid reservoir 110 may continue to stable supply the IPA solution for the board 310；When the weighing is set
When being in top gear for 210, i.e., the described IPA solution content is higher, and when without being fed, the feeding device 410 stops at this time
The IPA solution is only supplied into second fluid reservoir 120, the control valve 610 is in the open state, second liquid storage
Tank 120 supplements the IPA solution into first fluid reservoir 110, while first fluid reservoir 110 continues as the board
The 310 supply IPA solution, due to the feeding device 410 stopped feeding the IPA to second fluid reservoir 120 it is molten
Liquid, therefore the IPA solution is fed to first fluid reservoir 110 by the control valve 610 from second fluid reservoir 120
It can avoid directly supplying the IPA solution by the feeding device 410 for first fluid reservoir 110, to improve described the
One fluid reservoir 110 supplies the stability of the IPA solution, improves stability made of drying wafer, and can exempt from by feeding institute
When stating IPA solution, unstable problem is made in drying wafer, so that the shutdown of the board 310 causes 310 output capacity of board
The problem of decline.
As an example, the weighing-appliance 210 further includes lower limit stop and upper limit stop；The weighing-appliance 210 further includes report
Alert device 810, when the weighing-appliance 210 is in the lower limit stop and upper limit stop, the alarm 810 starts.
Specifically, when the weighing-appliance 210 is in the lower limit stop, first fluid reservoir 110 and described second
The quality of fluid reservoir 120 is less than the most low gear, when the weighing-appliance 210 is in the upper limit stop, first liquid storage
The quality of tank 110 and second fluid reservoir 120 is greater than the top gear.When the weighing-appliance 210 is in the lower limit stop
When, IPA solution content described in first fluid reservoir 110 and second fluid reservoir 120 is too low, the feeding device 410
Or the control valve 610 fails to feed the IPA solution into first fluid reservoir 110 in time, therefore there may be failure
The alarm 810 starts, convenient for reminding operator to check.When the weighing-appliance 210 is in the upper limit stop,
IPA solution content described in first fluid reservoir 110 and second fluid reservoir 120 is excessively high, and the feeding device 410 continues
The IPA solution, the feeding device 410 and the control valve 610 are fed into second fluid reservoir 120, and there may be events
Barrier, therefore the alarm 810 starts, convenient for reminding operator to check.The alarm 810 may include sound-light alarm
Device, the type of the alarm 810 is herein with no restriction.
As an example, the alarm 810 connects the board 310, and when the alarm 810 starting, the board
310 shut down.
Specifically, the control equipment 710 and the feeding device 410, control valve 610, weighing-appliance 210, alarm
810 and board 310 be connected.The weighing-appliance 210 weighs first fluid reservoir 110 and the second liquid storage being positioned above
The quality of tank 120, and give the quality information feedback claimed to the control equipment 710, when the weighing-appliance 210 is in described
When most low gear, the control equipment 710 closes the control valve 610, while the control equipment 710 controls the feeding device
410 input the IPA solution into second fluid reservoir 120, to lay in the IPA solution for first fluid reservoir 110.
When the weighing-appliance 210 is in the top gear, the control equipment 710 stops the feeding device 410 to described
The IPA solution is inputted in two fluid reservoirs 120, and opens the control valve 610, and second fluid reservoir 120 passes through institute at this time
It states control valve 610 and feeds the IPA solution into first fluid reservoir 110, it is avoidable to be directly by the feeding device 410
First fluid reservoir 110 supplies the IPA solution, causes drying wafer to be made unstable, meanwhile, described first during being somebody's turn to do
Fluid reservoir 110 is continued for providing the stable IPA solution for the board 310, therefore completes to feed the IPA solution
While, the output capacity of the board 310 can also be improved.When the control valve 610 or the feeding device 410 break down
When, the weighing-appliance 210 is in the lower limit stop and upper limit stop, and the alarm 810 starts, while the alarm 810
It feeds back information to the control equipment 710 and the coupled board 310 is subjected to shutdown operation at the first time, with
Just product quality is improved, is checked convenient for staff.
In conclusion the IPA make-up system of the utility model, have the advantages that (1) by it is mutually indepedent and in
Between be connected with control valve the first fluid reservoir and the second fluid reservoir be board supply IPA solution so that IPA solution is being fed
When, the IPA supplied in the first fluid reservoir of IPA solution for board is solution-stabilized, and it is right into second fluid reservoir to be completed at the same time
The supply of IPA solution；(2) intelligent control to feeding device, control valve and board is realized by control equipment, saves manpower,
It realizes and is precisely controlled simultaneously；(3) board is further controlled by alarm, improves product quality.So that drying wafer is made surely
Fixed and raising board output capacity.So the utility model effectively overcomes various shortcoming in the prior art and has height and produce
Industry utility value.
The above embodiments are only illustrative of the principle and efficacy of the utility model, and not for limitation, this is practical new
Type.Any person skilled in the art can all carry out above-described embodiment under the spirit and scope without prejudice to the utility model
Modifications and changes.Therefore, such as those of ordinary skill in the art without departing from the revealed essence of the utility model
All equivalent modifications or change completed under mind and technical idea, should be covered by the claim of the utility model.
Claims (10)
1. a kind of IPA make-up system, which is characterized in that the IPA make-up system includes:
First fluid reservoir, first fluid reservoir are connected with board, for supplying IPA solution to the board；
Second fluid reservoir, second fluid reservoir are located at the top of first fluid reservoir, and second fluid reservoir and charging fill
It sets and is connected, for laying in the IPA solution for first fluid reservoir；
Control valve stores up between first fluid reservoir and second fluid reservoir, and with first fluid reservoir and second
Flow container is connected.
2. IPA make-up system according to claim 1, it is characterised in that: the control valve includes solenoid valve and pneumatic operated valve
One of or combination.
3. IPA make-up system according to claim 1, it is characterised in that: first fluid reservoir and the second fluid reservoir tool
Have generally in identical pattern.
4. IPA make-up system according to claim 1, it is characterised in that: the bottom of first fluid reservoir passes through pipeline
It is connected with the board.
5. IPA make-up system according to claim 1, it is characterised in that: the IPA make-up system further includes that control is set
Standby, the control equipment connects the control valve.
6. IPA make-up system according to claim 1, it is characterised in that: the IPA make-up system further includes that weighing is set
Standby, for weighing the quality of first fluid reservoir and the second fluid reservoir, the weighing-appliance includes most low gear and top gear.
7. IPA make-up system according to claim 6, it is characterised in that: the weighing-appliance further include lower limit stop and on
Limit stop, the weighing-appliance further include alarm, when the weighing-appliance is in the lower limit stop and upper limit stop, the alarm
Device starting.
8. IPA make-up system according to claim 7, it is characterised in that: the alarm connects the board, when described
When alarm starts, the board is shut down.
9. IPA make-up system according to claim 6, it is characterised in that: when the weighing-appliance is in the most low gear
When, the control valve is in close state.
10. IPA make-up system according to claim 6, it is characterised in that: when the weighing-appliance is in the top gear
When, the control valve is in the open state.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821278326.0U CN208521905U (en) | 2018-08-08 | 2018-08-08 | A kind of IPA make-up system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821278326.0U CN208521905U (en) | 2018-08-08 | 2018-08-08 | A kind of IPA make-up system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208521905U true CN208521905U (en) | 2019-02-19 |
Family
ID=65333388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821278326.0U Expired - Fee Related CN208521905U (en) | 2018-08-08 | 2018-08-08 | A kind of IPA make-up system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208521905U (en) |
-
2018
- 2018-08-08 CN CN201821278326.0U patent/CN208521905U/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6764378B2 (en) | Point-of-use fluid regulating system for use in the chemical-mechanical planarization of semiconductor wafers | |
| JP4255494B2 (en) | Photoresist coating liquid supply apparatus, photoresist coating liquid supply method using the same, and photoresist coating apparatus using the same | |
| US20070205214A1 (en) | Liquid dispense system | |
| CN103047539B (en) | Chemical liquor supply system | |
| WO2006055132A2 (en) | Liquid dispensing system | |
| US6802762B2 (en) | Method for supplying slurry to polishing apparatus | |
| JP2003282499A (en) | Device and method for feeding slurry in chemical mechanical polishing facility | |
| US20200081351A1 (en) | Method of dynamically adjusting lifting parameter | |
| CN103846770A (en) | Polishing system and polishing method | |
| CN208521905U (en) | A kind of IPA make-up system | |
| CN206229601U (en) | A kind of dispensing automatic loading/unloading supplies machine | |
| CN213122595U (en) | Chemical liquid feeding system of gluing developing machine | |
| CN203125329U (en) | Polishing liquid supply device for polishing equipment of chemical machinery | |
| CN206357051U (en) | Abrasive disk, grinding pad conditioners and lapping device | |
| KR100566760B1 (en) | Polishing apparatus | |
| US10043681B2 (en) | Fluid supply system, wafer processing system, and method of supplying fluid to wafer processing equipment | |
| CN207495278U (en) | A kind of grinding pad conditioning system | |
| CN108855804A (en) | A kind of dispensing method for minor items assembly | |
| CN103357610A (en) | Centralized fluid infusion system and fluid infusion method | |
| AU2016204415B2 (en) | The regulation method of dynamic equilibrium in the concentrate sorting system | |
| CN101472833A (en) | Method and apparatus for dispensing liquid with precise control | |
| KR20000059169A (en) | System for suplying slurry in the CPM process of semiconductor manufacturing | |
| CN203678457U (en) | Circulating ball-milling system with narrowed particle size distribution | |
| TWM498058U (en) | Feeding system of ultrasonic spraying apparatus | |
| CN108829055A (en) | A kind of steel mill's raw material scheduled production method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190219 |