CN208414253U - A kind of low-reflection plating glass - Google Patents
A kind of low-reflection plating glass Download PDFInfo
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- CN208414253U CN208414253U CN201821133966.2U CN201821133966U CN208414253U CN 208414253 U CN208414253 U CN 208414253U CN 201821133966 U CN201821133966 U CN 201821133966U CN 208414253 U CN208414253 U CN 208414253U
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Abstract
The utility model discloses a kind of low-reflection plating glass, and including substrate, the N being set on substrate layer high refractive index layer and N layers of low-index film, each layer high refraction film layer and each layer low-index film are arranged alternately；High refractive index layer with a thickness of 10nm~120nm, low-index film is not less than 2 with a thickness of 20nm~100nm, N.It can be seen that, reduction reflectivity is arranged alternately by high refractive index layer and low-index film in the application, and by the way that the thickness of high refractive index layer is set as 10nm~120nm, the thickness of low-index film is set as 20nm~100nm, make the low-reflection plating glass in the application that there is in the wave band of 410nm~430nm and 840nm-860nm lower reflectivity compared with the prior art, to can be improved the clarity of imaging picture when in use.
Description
Technical field
The utility model embodiment is related to coating technique field, more particularly to a kind of low-reflection plating glass.
Background technique
If the reflectivity of video wall eyeglass is higher, the interference of light will form, cause to form ghost image when imaging, influence picture
Face clarity.Therefore, in order to reduce video wall lens reflecting, need to be arranged on video wall eyeglass low reflection plated film, current
For low-reflection plating glass primarily directed to the entire wave band of 400~900nm, such as AR film, versatility is stronger, therefore in the prior art
Video wall eyeglass reflection is reduced using AR film, still, since the targeted wave band of video wall eyeglass is 410nm~430nm
And 840nm-860nm, and coated glass in the prior art is in the wave band of 410nm~430nm and 840nm-860nm
Reflectivity is still higher, causes certain ghost phenomena, influences the clarity of video wall eyeglass to a certain extent.
Therefore, the low-reflection plating glass for how providing a kind of solution above-mentioned technical problem becomes those skilled in the art's mesh
Preceding problem to be solved.
Utility model content
The purpose of the utility model embodiment is to provide a kind of low-reflection plating glass, in use compared to existing
Technology has lower reflectivity in the wave band of 410nm~430nm and 840nm-860nm, to can mention when in use
The clarity of height imaging picture.
In order to solve the above technical problems, the utility model embodiment provides a kind of low-reflection plating glass, including substrate,
The N layer high refractive index layer and N layers of low-index film being set on the substrate, each layer high refraction film layer and each layer institute
Low-index film is stated to be arranged alternately；The high refractive index layer with a thickness of 10nm~120nm, the low-index film
With a thickness of 20nm~100nm, the N is not less than 2, and the high refractive index layer is directly contacted with the substrate.
Optionally, the high refractive index layer is titanium pentoxide layer Ti3O5Film layer.
Optionally, the low-index film is silica SiO2Film layer.
Optionally, the N is equal to 5.
Optionally, the first Ti3O5Film layer, the 2nd Ti3O5Film layer, the 3rd Ti3O5Film layer, the 4th Ti3O5Film layer and the 5th
The thickness of Ti3O5 film layer is respectively 18.22nm, 42.08nm, 111.41nm, 104.2nm and 18.22nm；First Ti3O5
Film layer is directly contacted with the substrate；
First SiO2Film layer, the 2nd SiO2Film layer, the 3rd SiO2Film layer, the 4th SiO2Film layer and the 5th SiO2Film layer distinguishes position
In the first Ti3O5Film layer is to the 5th Ti3O5The top of film layer, the first SiO2Film layer, the 2nd SiO2Film layer,
3rd SiO2Film layer, the 4th SiO2Film layer and the 5th SiO2The thickness of film layer be respectively 27.57nm,
27.41nm, 38.53nm, 47.73nm and 99.36nm.
Optionally, the substrate is glass substrate.
The utility model embodiment provides a kind of low-reflection plating glass, high including substrate, the N being set on substrate layer
Refractivity film layer and N layers of low-index film, each layer high refraction film layer and each layer low-index film are arranged alternately；High refractive index
Film layer with a thickness of 10nm~120nm, low-index film is not less than 2 with a thickness of 20nm~100nm, N.As it can be seen that the application
In reduction reflectivity is arranged alternately by high refractive index layer and low-index film, and by by high refractive index layer
Thickness is set as 10nm~120nm, and the thickness of low-index film is set as 20nm~100nm, makes the low reflection plated film in the application
Glass has lower reflectivity in the wave band of 410nm~430nm and 840nm-860nm compared with the prior art, thus
It can be improved the clarity of imaging picture when in use.
Detailed description of the invention
It, below will be to the prior art and embodiment in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
Needed in attached drawing be briefly described, it should be apparent that, the accompanying drawings in the following description is only the utility model
Some embodiments for those of ordinary skill in the art without creative efforts, can also be according to this
A little attached drawings obtain other attached drawings.
Fig. 1 is a kind of structural schematic diagram of low-reflection plating glass provided by the embodiment of the utility model；
Fig. 2 is reflectance curve schematic diagram corresponding with one of the utility model embodiment low-reflection plating glass；
Fig. 3 is the partial enlargement diagram of Fig. 2；
Fig. 4 is reflectance curve schematic diagram corresponding with low-reflection plating glass in the prior art；
Fig. 5 is the partial enlargement diagram of Fig. 4.
Specific embodiment
The utility model embodiment provides a kind of low-reflection plating glass, exists compared with the prior art in use
There is lower reflectivity, to can be improved imaging when in use in the wave band of 410nm~430nm and 840nm-860nm
The clarity of picture.
It is practical new below in conjunction with this to keep the objectives, technical solutions, and advantages of the embodiments of the present invention clearer
Attached drawing in type embodiment, the technical scheme in the utility model embodiment is clearly and completely described, it is clear that is retouched
The embodiment stated is the utility model a part of the embodiment, instead of all the embodiments.Based on the implementation in the utility model
Example, every other embodiment obtained by those of ordinary skill in the art without making creative efforts belong to
The range of the utility model protection.
Fig. 1 is please referred to, Fig. 1 is a kind of structural schematic diagram of low-reflection plating glass provided by the embodiment of the utility model.
The low-reflection plating glass, including substrate 3, the N being set on substrate 3 layer high refractive index layer 1 and N layers of low refraction
Rate film layer 2, each layer high refraction film layer 1 and each layer low-index film 2 are arranged alternately；High refractive index layer 1 with a thickness of 10nm
~120nm, low-index film 2 are not less than 2 with a thickness of 20nm~100nm, N.
It should be noted that the low-reflection plating glass in the application is primarily directed to 410nm~430nm and 840nm-
What the light wave of the wave band of 860nm was designed, and the substrate 3 in the application can be glass substrate, naturally it is also possible to it is it
The substrate of his material.
In addition, due to titanium pentoxide layer Ti3O5The advantages that refractive index with higher, stability are high, corrosion-resistant, so
High refractive index layer 1 in the application can be Ti3O5Film layer；Again due to silica SiO2Performance it is relatively stable and reflect
Rate is lower, so the low-index film 2 in the application can be SiO2Film layer.
Specifically, the low-reflection plating glass in the application specifically can be by substrate and 10 tunic layers constitute namely N is equal to
5, wherein five layers of Ti3O5Film layer and five layers of Ti3O5Film layer is arranged alternately.As shown in Figure 1, sequentially consisting of substrate, first
Ti3O5Film layer, the first SiO2Film layer, the 2nd Ti3O5Film layer, the 2nd SiO2Film layer, the 3rd Ti3O5Film layer, the 3rd SiO2Film layer,
Four Ti3O5Film layer, the 4th SiO2Film layer, the 5th Ti3O5 film layer and the 5th SiO2Film layer.
In order to make low-reflection plating glass that there is lower reflection in the wave band of 410nm~430nm and 840nm-860nm
Rate, to there is ghost phenomena when preventing and the low-reflection plating glass being set to video wall eyeglass, further, in the application
The first Ti3O5Film layer, the 2nd Ti3O5Film layer, the 3rd Ti3O5Film layer, the 4th Ti3O5The thickness of film layer and the 5th Ti3O5 film layer point
It Wei not 18.22nm, 42.08nm, 111.41nm, 104.2nm and 18.22nm；Correspondingly, the first SiO2Film layer, the 2nd SiO2Film
Layer, the 3rd SiO2Film layer, the 4th SiO2Film layer and the 5th SiO2The thickness of film layer be respectively 27.57nm, 27.41nm, 38.53nm,
47.73nm and 99.36nm.When the low-reflection plating glass in the application is based on above-mentioned each Ti3O5Film layer and each SiO2
When the coated glass of film layer, the low-reflection plating glass in the application is in 410nm~430nm and 840nm-860nm wave band
Reflectivity compared with the prior art in reflectivity of the coated glass in 410nm~430nm and 840nm-860nm wave band it is big
Big to reduce, to can further decrease the reflection of lens surface in use, the picture for improving video wall glass is clear
Degree and image quality, improve the usage experience of user.
Wherein, the low-reflection plating glass in the utility model embodiment shows in 400~900nm wave band internal reflection rate curve
It is intended to as shown in Figures 2 and 3, wherein as 3 be the partial enlargement diagram of Fig. 2；Low-reflection plating glass in the prior art exists
400~900nm wave band internal reflection rate curve synoptic diagram is as shown in Figure 4 and Figure 5, wherein as 5 be Fig. 4 partial enlargement diagram.
From the figure 3, it may be seen that reflectivity of the low-reflection plating glass in 410nm~430nm and 840nm-860nm wave band in the application is equal
For 0.05% hereinafter, as shown in Figure 5, low-reflection plating glass in the prior art is in 410nm~430nm and 840nm-
The reflectivity of 860nm wave band is 0.5% or so, it is seen then that low-reflection plating glass provided by the present application than in the prior art low
The reflectivity of reflection coated glass is much lower, therefore it is just much smaller to reflect generated interference, therefore uses low in the application
The picture of reflection coated glass will be more clear.
Certainly, each layer Ti in the application3O5Film layer and each layer SiO2The thickness value of film layer is not limited only to above-mentioned specifically take
It is worth, each layer Ti in practical application3O5Film layer and each layer SiO2The thickness value of film layer can be on the basis of above-mentioned corresponding occurrence
It fluctuates in a certain range namely the thickness value of each layer can be in default error range, so as to ensure to make in the application
Low-reflection plating glass in 410nm~430nm and 840nm-860nm wave band have lower reflectivity.
The utility model embodiment provides a kind of low-reflection plating glass, high including substrate, the N being set on substrate layer
Refractivity film layer and N layers of low-index film, each layer high refraction film layer and each layer low-index film are arranged alternately；High refractive index
Film layer with a thickness of 10nm~120nm, low-index film with a thickness of 20nm~100nm.As it can be seen that passing through high folding in the application
That penetrates rate film layer and low-index film is arranged alternately reduction reflectivity, and by the way that the thickness of high refractive index layer to be set as
The thickness of 10nm~120nm, low-index film are set as 20nm~100nm, compare the low-reflection plating glass in the application
There is lower reflectivity in the wave band of 410nm~430nm and 840nm-860nm in the prior art, thus when in use
It can be improved the clarity of imaging picture.
Each embodiment in this specification is described in a progressive manner, the highlights of each of the examples are with other
The difference of embodiment, the same or similar parts in each embodiment may refer to each other.
It should also be noted that, in the present specification, relational terms such as first and second and the like be used merely to by
One entity or operation are distinguished with another entity or operation, without necessarily requiring or implying these entities or operation
Between there are any actual relationship or orders.Moreover, the terms "include", "comprise" or its any other variant meaning
Covering non-exclusive inclusion, so that the process, method, article or equipment for including a series of elements not only includes that
A little elements, but also including other elements that are not explicitly listed, or further include for this process, method, article or
The intrinsic element of equipment.In the absence of more restrictions, the element limited by sentence "including a ...", is not arranged
Except there is also other identical elements in the process, method, article or apparatus that includes the element.
The foregoing description of the disclosed embodiments can be realized professional and technical personnel in the field or using originally practical new
Type.Various modifications to these embodiments will be readily apparent to those skilled in the art, and determine herein
The General Principle of justice can be realized in other embodiments without departing from the spirit or scope of the present utility model.Cause
This, the present invention will not be limited to the embodiments shown herein, and is to fit to and principles disclosed herein
The widest scope consistent with features of novelty.
Claims (6)
1. a kind of low-reflection plating glass, which is characterized in that including substrate, the N being set on substrate layer high refractive index film
Layer and N layers of low-index film, each layer high refraction film layer and each layer low-index film are arranged alternately；The high folding
Penetrate rate film layer with a thickness of 10nm~120nm, the low-index film is not less than 2 with a thickness of 20nm~100nm, the N,
The high refractive index layer is directly contacted with the substrate.
2. low-reflection plating glass according to claim 1, which is characterized in that the high refractive index layer is five oxidations three
Titanium layer Ti3O5Film layer.
3. low-reflection plating glass according to claim 2, which is characterized in that the low-index film is silica
SiO2Film layer.
4. low-reflection plating glass according to claim 3, which is characterized in that the N is equal to 5.
5. low-reflection plating glass according to claim 4, which is characterized in that the first Ti3O5Film layer, the 2nd Ti3O5Film layer,
3rd Ti3O5Film layer, the 4th Ti3O5The thickness of film layer and the 5th Ti3O5 film layer be respectively 18.22nm, 42.08nm,
111.41nm, 104.2nm and 18.22nm；First Ti3O5Film layer is directly contacted with the substrate；
First SiO2Film layer, the 2nd SiO2Film layer, the 3rd SiO2Film layer, the 4th SiO2Film layer and the 5th SiO2Film layer is located at institute
State the first Ti3O5Film layer is to the 5th Ti3O5The top of film layer, the first SiO2Film layer, the 2nd SiO2It is film layer, described
3rd SiO2Film layer, the 4th SiO2Film layer and the 5th SiO2The thickness of film layer be respectively 27.57nm, 27.41nm,
38.53nm, 47.73nm and 99.36nm.
6. low-reflection plating glass described in -5 any one according to claim 1, which is characterized in that the substrate is glass base
Plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821133966.2U CN208414253U (en) | 2018-07-17 | 2018-07-17 | A kind of low-reflection plating glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821133966.2U CN208414253U (en) | 2018-07-17 | 2018-07-17 | A kind of low-reflection plating glass |
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| CN208414253U true CN208414253U (en) | 2019-01-22 |
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| CN201821133966.2U Active CN208414253U (en) | 2018-07-17 | 2018-07-17 | A kind of low-reflection plating glass |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111747658A (en) * | 2020-07-01 | 2020-10-09 | 天津耀皮工程玻璃有限公司 | Colorful color-changing coated glass and preparation method thereof |
-
2018
- 2018-07-17 CN CN201821133966.2U patent/CN208414253U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111747658A (en) * | 2020-07-01 | 2020-10-09 | 天津耀皮工程玻璃有限公司 | Colorful color-changing coated glass and preparation method thereof |
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