CN208384287U - A kind of detection device of etch structures - Google Patents
A kind of detection device of etch structures Download PDFInfo
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- CN208384287U CN208384287U CN201821156239.8U CN201821156239U CN208384287U CN 208384287 U CN208384287 U CN 208384287U CN 201821156239 U CN201821156239 U CN 201821156239U CN 208384287 U CN208384287 U CN 208384287U
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- platform
- detection device
- probe
- assembly
- etch structures
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Abstract
The utility model discloses a kind of detection devices of etch structures, are related to detection device technical field.The detection device of the etch structures includes that pedestal, platform, translation component, probe assembly and lifting assembly, the translation component are set to before the pedestal and the platform, and can drive the platform along the horizontal plane on first direction and second direction move；The probe assembly is set to the top of the platform；The lifting assembly is connect with the probe, for driving the probe to move up and down.Workpiece to be detected is fixed on platform, platform can move in the horizontal plane relative to pedestal, probe assembly is set to above platform, pass through mobile platform, probe assembly can be made opposite with any position on platform, so that many places to workpiece to be detected mark detection, the interception in advance to bad products is realized, avoiding bad products from flowing to client leads to customer complaint.
Description
Technical field
The utility model relates to detection device technical field more particularly to a kind of detection devices of etch structures.
Background technique
It is guaranteed quality demand after producing large batch of product, it is necessary to increase detection dress in liquid crystal display industry
It sets.Laser marker is a kind of precision equipment, to guarantee that label and the graphical quality of etching meet production requirement, needs to pass through inspection
It surveys device and carries out actual measurement.
ITO (Indium Tin Oxide, tin indium oxide) electro-conductive glass, ITO conduction glass are generally comprised in liquid crystal display
Glass is to plate indium oxide layer tin film on the basis of sodium calcium base or silicon boryl substrate glass using the method for magnetron sputtering and process
It forms.In the process of liquid crystal display, need to etch label on ITO electro-conductive glass by laser marker.
In existing detection device, the label of the specified location of ITO electro-conductive glass can only be detected, can not be carried out
The full width face of ITO electro-conductive glass is detected, it cannot be guaranteed that product etch effect, once there is bulk bad problem, it can not be timely
Product is intercepted, there is the risk for flowing to client and customer complaint.
Utility model content
The purpose of this utility model is that proposing a kind of detection device of etch structures, many places can be marked and be examined
It surveys, realization intercepts bad products in advance.
For this purpose, the utility model uses following technical scheme:
A kind of detection device of etch structures, including pedestal and platform, further includes:
Component is translated, the translation component is set between the pedestal and the platform, and can drive the platform
First direction and second direction on along the horizontal plane is mobile；
Probe assembly, the probe assembly are set to the top of the platform；And
Lifting assembly, the lifting assembly are connect with the probe, for driving the probe to move up and down.
Wherein, the probe assembly includes two probes.
Wherein, the distance between two described probes are adjustable.
Wherein, the probe assembly further includes fixed plate, and the fixed plate includes the first plate and second being detachably connected
Plate, the probe are clamped and fastened between first plate and second plate.
Wherein, be provided with multiple mounting holes between first plate and second plate, the probe can selectively with
One mounting hole cooperation.
Wherein, support frame is provided on the pedestal, the lifting assembly is set on support frame as described above, the probe groups
Part is connect with the output end of the lifting assembly.
Wherein, the lifting assembly includes cylinder.
Wherein, the translation component includes the first translation mechanism and the second translation mechanism, the first translation mechanism setting
In the pedestal, first translation mechanism can drive the platform to move along the first direction, the second translation machine
Structure can drive the platform to move along the second direction.
Wherein, first translation mechanism includes the first sliding rail being set on the pedestal along the first direction, institute
Stating the second translation mechanism can slide along first sliding rail；Second translation mechanism includes being arranged along the second direction
Second sliding rail, the platform can be slided along second sliding rail.
Wherein, the detection device of the etch structures further includes control assembly, the control assembly respectively with the lifting
Component and translation component electrical connection.
The utility model has the advantages that the utility model provides a kind of detection device of etch structures, workpiece to be detected is fixed on flat
On platform, platform can move in the horizontal plane relative to pedestal, and probe assembly is set to above platform, can be with by mobile platform
Keep probe assembly opposite with any position on platform, so that many places to workpiece to be detected mark detection, realizes to bad production
The interception in advance of product, avoiding bad products from flowing to client leads to customer complaint.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the check device of etch structures provided by the utility model；
Fig. 2 is the structural schematic diagram of lifting assembly and probe assembly provided by the utility model；
Fig. 3 is the explosive view of fixed plate provided by the utility model.
Wherein:
1, pedestal；11, support frame；2, platform；3, probe assembly；31, probe；32, the first plate；321, the first groove；
322, threaded hole；33, the second plate；331, the second groove；332, through-hole；4, lifting assembly；41, output end；5, component is translated；
51, the first translation mechanism；52, the second translation mechanism.
Specific embodiment
The technical issues of to solve the utility model, the technical solution of use and the technical effect that reaches are clearer,
Further illustrate the technical solution of the utility model below with reference to the accompanying drawings and specific embodiments.
As shown in Figure 1, present embodiments provide a kind of detection device of etch structures, it can be used for detecting on workpiece and etch
The effect of structure, etch structures can mark for pattern, the text etc. formed on workpiece by the methods of laser-induced thermal etching, this implementation
In example, introduced so that workpiece to be detected is ITO electro-conductive glass as an example.Specifically, the detection device of etch structures includes pedestal 1, sets
Platform 2, lifting assembly 4 and the probe assembly 3 being placed on pedestal 1, lifting assembly 4 is connect with probe assembly 3, for driving probe
Component 3 moves up and down.In use, ITO electro-conductive glass is fixed on platform 2, probe assembly 3 is driven downwards by lifting assembly 4,
So that probe assembly 3 is contacted with the mark position specified on ITO electro-conductive glass, so that the insulation performance of mark position is examined
It surveys.
Since there are the labels of many places etching on ITO electro-conductive glass, the up and down motion of probe assembly 3 is only leaned on, it can only be to one
The specified label in place is detected, can not full width face detection label, be easy to appear defective products and become a mandarin client and cause client's throwing
The problem of telling.To solve the above problems, the detection device of the etch structures in the present embodiment further includes translation component 5, translation group
Part 5 is set between pedestal 1 and platform 2, for drive platform 2 on pedestal 1 along the horizontal plane on first direction and second party
To movement.In order to facilitate introduction, in the present embodiment, first direction is left and right directions shown in Fig. 1, second direction be shown in Fig. 1 before
Rear direction.
Before use, probe assembly 3 is located at the top of platform 2, and it is located at the center of pedestal 1.In use, platform 2 is logical
It crosses left and right and is moved forward and backward, so that etching the underface that markd position is located at probe assembly 3 on platform 2, pass through liter later
Part 4 of coming down to a lower group drives probe assembly 3 to decline, and contacts with ITO electro-conductive glass, to be detected.When needing to detect other positions
When label, probe assembly 3 is lifted by lifting assembly 4, and mobile platform 2 again, so that mark position to be detected and spy
Needle assemblies 3 are aligned, and drive the decline of probe assembly 3 to realize detection by lifting assembly 4.
In the present embodiment, by the movement of platform 2, probe assembly 3 can be made opposite with any position on platform 2, with
Just detection is marked to many places of workpiece to be detected, detection is more comprehensive, realizes the interception in advance to bad products, avoids bad production
Product, which flow to client, leads to customer complaint.
Specifically, translation component 5 includes the first translation mechanism 51 and the second translation mechanism 52, and the first translation mechanism 51 can be with
Realize the movement in left-right direction of platform 2, the movement of platform 2 along the longitudinal direction may be implemented in the second translation mechanism 52, by the
The movement of the both direction of platform 2 may be implemented in one translation mechanism 51 and the second translation mechanism 52, thus by probe assembly 3 with
Any coordinate alignment on ITO electro-conductive glass.
Optionally, the first translation mechanism 51 and the second translation mechanism 52 can be slide unit slide track component, leadscrew-nut mechanism
Or gear and rack teeth mechanism etc..By taking slide unit slide track component as an example, the first translation mechanism 51 may include the first sliding rail, the first sliding rail edge
The left and right directions of pedestal 1 is arranged；Second translation mechanism 52 can be slided along the first sliding rail, and the second translation mechanism 52 may include edge
Second sliding rail of front-rear direction setting, the second sliding rail can be slidably connected with the first sliding rail, i.e. the second sliding rail is slided as with first
The sliding block of rail cooperation, platform 2 are connect with the second sliding rail.It, can be with moving platform 2 along a left side when the second sliding rail is slided along the first sliding rail
Right direction is mobile；Similarly, platform is slidably connected as the sliding block of the second sliding rail with the second sliding rail, and platform 2 can be realized along preceding
The movement of rear direction.
In other embodiments, platform 2 can also be realized relative to the movement of pedestal 1 by leadscrew-nut mechanism.Specifically,
First translation mechanism 51 includes the first lead screw being arranged in left-right direction, the first nut with the cooperation of the first lead screw, the second translation
Mechanism 52 includes the second lead screw being arranged along the longitudinal direction and the second nut with the cooperation of the second lead screw.Wherein, the first nut
Support plate is can connect, the second lead screw is set in support plate, and platform 2 is connect with the second nut.First lead screw and second
Thick stick is vertically arranged, and drives the first nut to move in left-right direction by the rotation of the first lead screw, to be driven by support plate flat
Platform 2 moves in left-right direction；The rotation of second lead screw, drives the second nut to move along the longitudinal direction, to move with moving platform 2 or so
It is dynamic.
In the present embodiment, probe assembly 3 includes two probes 31, and detection components can be set between two probes 31,
Such as electric current characterizes part.When two contact point contacts of two probes 31 and label, ITO electro-conductive glass, two 31 and of probe
Closed circuit is formed between electric current characterization part, detecting by ammeter certificate whether there is electric current in closed circuit, to detect mark
Remember the insulating properties of position.Wherein, electric current characterization part can be ammeter or light bulb.
In the present embodiment, support frame 11 is provided on pedestal 1, lifting assembly 4 is fixed on support frame 11, probe assembly 3
It is connect with the output end 41 of lifting assembly 4, to drive probe assembly 3 to move up and down.Wherein, as shown in Fig. 2, lifting assembly 4
It may include cylinder, in other embodiments, lifting assembly 4 can be hydraulic cylinder, gear and rack teeth mechanism, leadscrew-nut mechanism etc.
Linear transmission mechanism.
Due to the thinner thickness of ITO electro-conductive glass, cause after scratching ITO electro-conductive glass or contact in order to avoid probe 31
ITO electro-conductive glass is broken, before detection, needs that probe contact point is arranged in the marked locations for needing to detect, it is possible to reduce ITO
The damage of electro-conductive glass.
Since there are the different label of shapes and sizes, corresponding different label, two probes 31 on ITO electro-conductive glass
The distance between it is also not identical.In order to improve etch structures detection device versatility, in the present embodiment, two probes 31 it
Preceding distance is adjustable.
Specifically, as shown in Fig. 2, probe assembly 3 further includes fixed plate, the company of output end 41 of fixed plate and lifting assembly 4
It connects.Fixed plate includes the first plate 32 and the second plate 33 being detachably connected, and probe 31 is clamped to the first plate 32 and the second plate
Between 33.Before detection, spacing as needed adjusts the position between two probes 31, later by the first plate 32 and
Two plates 33 are fixed, and two probes 31 are clamped between the first plate 32 and the second plate 33.It wherein, can be on the first plate 32
Be provided with threaded hole 322, the second plate 33 is provided with through-hole 332 in corresponding position, screw pass through after through-hole 332 with threaded hole 322
Being detachably connected for the first plate 32 and the second plate 33 may be implemented in cooperation.
In order to facilitate the position between two probes 31 of adjustment, can be set at the link position of the first plate 32 and the second plate 33
It is equipped with multiple mounting holes.Specifically, as shown in figure 3, being provided with multiple first on the end face that the first plate 32 is contacted with the second plate 33
Groove 321, multiple second grooves 331 are provided on corresponding second plate 33, and the second groove 331 and the first groove 321 1 are a pair of
It answers, and the first groove 321 of corresponding position and the second groove 331 form a mounting hole.When fixed probe 31, between required
Away from, two probes 31 are placed in corresponding first groove 321, it is fixed after later docking the second plate 33 with the first plate 32,
Realize the fixation to probe 31.
In order to improve the fixed effect of probe 31, when not placing probe 31, the first groove 321 of corresponding position and
The aperture of the mounting hole of two grooves 331 composition can be less than the aperture of probe 31, so that probe 31 and mounting hole are interference fitted, it can
To improve the fixed effect of probe 31.
In order to improve etch structures detection device intelligence, detection device can also include control assembly, control group
Part is electrically connected with translation component 5 and lifting assembly 4.Before use, the label for needing to detect can be inputted into control assembly
Coordinate, control assembly translates component 5 according to the coordinate control of input later and lifting assembly 4 works, successively to multiple labels
It is detected.
The above content is only the preferred embodiment of the utility model, for those of ordinary skill in the art, according to this reality
With novel thought, there will be changes in the specific implementation manner and application range, and the content of the present specification should not be construed as
Limitations of the present invention.
Claims (10)
1. a kind of detection device of etch structures, including pedestal (1) and platform (2), which is characterized in that further include:
It translates component (5), the translation component (5) is set between the pedestal (1) and the platform (2), and can drive
The platform (2) along the horizontal plane on first direction and second direction it is mobile；
Probe assembly (3), the probe assembly (3) are set to the top of the platform (2)；And
Lifting assembly (4), the lifting assembly (4) connect with the probe assembly (3), for driving the probe assembly (3)
It moves up and down.
2. the detection device of etch structures as described in claim 1, which is characterized in that the probe assembly (3) includes two
Probe (31).
3. the detection device of etch structures as claimed in claim 2, which is characterized in that between two probes (31) away from
From adjustable.
4. the detection device of etch structures as claimed in claim 3, which is characterized in that the probe assembly (3) further includes solid
Fixed board, the fixed plate include the first plate (32) and the second plate (33) being detachably connected, and the probe (31) is clamped and fastened on
Between first plate (32) and second plate (33).
5. the detection device of etch structures as claimed in claim 4, which is characterized in that first plate (32) and described second
Multiple mounting holes are provided between plate (33), the probe (31) can selectively cooperate with a mounting hole.
6. the detection device of etch structures as described in claim 1, which is characterized in that be provided with support on the pedestal (1)
Frame (11), the lifting assembly (4) are set on support frame as described above (11), the probe assembly (3) and the lifting assembly (4)
Output end (41) connection.
7. the detection device of etch structures as described in claim 1, which is characterized in that the lifting assembly (4) includes cylinder.
8. the detection device of etch structures as described in claim 1, which is characterized in that the translation component (5) includes first
Translation mechanism (51) and the second translation mechanism (52), first translation mechanism are set to the pedestal (1), first translation
Mechanism (51) can drive the platform (2) to move along the first direction, and second translation mechanism (52) can drive institute
Platform (2) is stated to move along the second direction.
9. the detection device of etch structures as claimed in claim 8, which is characterized in that first translation mechanism (51) includes
It is set to the first sliding rail on the pedestal (1) along the first direction, second translation mechanism (52) can be along described
The sliding of one sliding rail；Second translation mechanism (52) includes the second sliding rail along second direction setting, platform (2) energy
It is enough to be slided along second sliding rail.
10. the detection device of etch structures as described in claim 1, which is characterized in that the detection device of the etch structures
It further include control assembly, the control assembly is electrically connected with the lifting assembly (4) and the translation component (5) respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821156239.8U CN208384287U (en) | 2018-07-20 | 2018-07-20 | A kind of detection device of etch structures |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821156239.8U CN208384287U (en) | 2018-07-20 | 2018-07-20 | A kind of detection device of etch structures |
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| Publication Number | Publication Date |
|---|---|
| CN208384287U true CN208384287U (en) | 2019-01-15 |
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ID=64962020
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| Application Number | Title | Priority Date | Filing Date |
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| CN201821156239.8U Active CN208384287U (en) | 2018-07-20 | 2018-07-20 | A kind of detection device of etch structures |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109491319A (en) * | 2019-01-22 | 2019-03-19 | 蓝思智能机器人(长沙)有限公司 | Glass panel detection method and glass panel feeding detection device |
-
2018
- 2018-07-20 CN CN201821156239.8U patent/CN208384287U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109491319A (en) * | 2019-01-22 | 2019-03-19 | 蓝思智能机器人(长沙)有限公司 | Glass panel detection method and glass panel feeding detection device |
| CN109491319B (en) * | 2019-01-22 | 2023-11-28 | 蓝思智能机器人(长沙)有限公司 | Glass panel detection method and glass panel material taking detection device |
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