CN208008885U - A kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering - Google Patents
A kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering Download PDFInfo
- Publication number
- CN208008885U CN208008885U CN201820416528.0U CN201820416528U CN208008885U CN 208008885 U CN208008885 U CN 208008885U CN 201820416528 U CN201820416528 U CN 201820416528U CN 208008885 U CN208008885 U CN 208008885U
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- China
- Prior art keywords
- air inlet
- constant pressure
- pressure atmosphere
- needle valve
- valve switch
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- 238000004544 sputter deposition Methods 0.000 title claims abstract description 19
- 239000007789 gas Substances 0.000 abstract description 37
- 238000002474 experimental method Methods 0.000 abstract description 3
- 239000004615 ingredient Substances 0.000 abstract description 3
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011150 reinforced concrete Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a kind of constant pressure atmosphere control systems for reaction magnetocontrol sputtering, including rack, proton flowmeter, mixed gas tank, proportioning valve and control box are provided in the rack, proton flowmeter is connect with mixed gas tank and control box respectively, mixed gas tank is connect with proportioning valve, further includes PLC controller, proportioning valve and control box are connect with PLC controller respectively, air inlet and gas outlet are provided in rack, air inlet is connected to proton flowmeter.Constant pressure atmosphere system provided by the utility model, a few road gases needed for reaction magnetocontrol sputtering can be transported to according to accurate proportioning in magnetron sputtering cavity, in addition the constant pressure atmosphere of system can be kept, one of an important factor for being coating process, it is ensured that the consistency of membranous layer ingredient, the repeatability for improving film quality and experiment.
Description
Technical field
The utility model is related to plated film Instrument technology fields, and in particular to a kind of constant pressure atmosphere for reaction magnetocontrol sputtering
Control system.
Background technology
Magnetron sputtering plating instrument belongs to one kind of PVD technique, is to prepare one of important method of thin-film material, extensively
It is applied in the experiment of research universities and colleges, but there are still have following deficiency for existing instrument：(1) for reaction magnetocontrol sputtering, reaction
The accurate proportioning input sputtering system of gas is still to be improved；(2) existing equipment is difficult holding system in sputtering process
Constant pressure, to influence the uniformity and consistency of membranous layer ingredient.
Utility model content
The purpose of this utility model is to provide a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering, can overcome existing
There is the deficiency of technology.
To achieve the above object, the utility model uses following technical scheme：
A kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering, including rack are provided with proton in the rack
Flowmeter, mixed gas tank, proportioning valve and control box, proton flowmeter are connect with mixed gas tank and control box respectively, mix gas tank and ratio
Valve connects, and further includes PLC controller, proportioning valve and control box are connect with PLC controller respectively, and air inlet is provided in rack
And gas outlet, air inlet are connected to proton flowmeter.
Further, air inlet needle valve switch and outlet needle valve switch, air inlet needle valve switch and air inlet are provided in rack
Mouth connection, air inlet needle valve switch are connect with proton flowmeter；Outlet needle valve switch is connect with proportioning valve, outlet needle valve switch with go out
Gas port is connected to.
Further, the proton flow is calculated as four road proton flowmeters, and the air inlet is four road air inlets, it is described into
Air tube threshold switch is four tunnel air inlet needle valve switch.
Further, gas tank is mixed to connect with proportioning valve by the mixed gas tank gas outlet of setting.
Further, the air inlet and gas outlet are arranged on the rear panel of rack.
Further, the air inlet needle valve switch and outlet needle valve switch are arranged on the front panel of rack.
As shown from the above technical solution, including gas control system rack, machine frame inside be fixed with four road admission lines with
Outlet pipe all the way, four road admission line one end are connect with air source, and one end is connected with the needle-valve being fixed on the rack, and connects later
It onto proton flowmeter, is connected to by the proton flowmeter other end in built-in stainless steel reinforced concrete gas tank, proton flowmeter port connects
It is connected to flow-control box, outlet pipe one end is connected in built-in stainless steel reinforced concrete gas tank, and the other end connect with proportioning valve and is used for
Constant pressure outlet controls, and the proportioning valve of flow-control box and the control of constant pressure outlet in PLC controller all by being controlled.
Constant pressure atmosphere system provided by the utility model, can be by a few road gases needed for reaction magnetocontrol sputtering according to accurately matching
Than being transported in magnetron sputtering cavity, one of an important factor in addition can keeping the constant pressure atmosphere of system, being coating process, can protect
It demonstrate,proves the consistency of membranous layer ingredient, improve the repeatability of film quality and experiment.
Description of the drawings
Fig. 1 is the overlooking structure diagram of the utility model.
Specific implementation mode
The utility model is described in further detail below in conjunction with the accompanying drawings：
As shown in Figure 1, a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering of the present embodiment, including gas control
System chassis 1 processed, machine frame inside are fixed with proton flowmeter 2, mixed gas tank 3 and proportioning valve 4, and proton flowmeter 2 is four tunnel matter
Subflow gauge, proton flowmeter sensor are connected in control box 5, and proportioning valve sensor and control box 5 are controlled by PLC
Device 6 is controlled, and four road air inlets 8 and gas outlet 9 are provided on rack rear panel 7, four are provided on rack front panel 10
Road air inlet needle valve switch 11 and outlet needle valve switch 12.
When in use, several air sources of required mixed gas are connected on four road air inlets 8 and (can be needed to select according to air source type
With 1-4 air inlet), admission line is connected to four tunnel air inlet needle valve switch 11 (in normal when work from four road air inlets 8 later
Open state), then by being connected to four road proton flowmeters at four tunnel air inlet needle valve switch 11, connect after four road proton flowmeters
It is connected in mixed gas tank 3 and carries out mixed gas, the control box 5 of four road proton flowmeters is connected in PLC controller 6, so as to be controlled in PLC
The setting of four road charge flow rates is carried out on device 6 processed, realizes accurately controlling for 4 road charge flow rates；
After four road gases are sufficiently mixed in mixed gas tank 3, flow through mixed gas tank gas outlet 13 and is connected on proportioning valve 4 later,
It is connected to outlet needle valve switch 12 (being in normally open when work) through proportioning valve 4, gas outlet 9 is connected to later, by gas outlet 9
It is attached with reaction magnetocontrol sputtering instrument, sputter is supplied.When work, the control box of proportioning valve 4 is connected to PLC controls
On device 6, constant pressure air pressure can be set in PLC controller 6, to control the pulse switch of proportioning valve 4, set when actual pressure is higher than
When determining air pressure, proportioning valve 4 is closed no longer to air inlet inside sputter, and system air pressure is reduced, and when actual pressure is less than setting gas
When pressure, proportioning valve 4 opens air inlet to increase system air pressure, realizes constant pressure air inlet control.
In summary, in experimentation, cylinder gas enters via four road air inlets 8, passes through four tunnel air inlet needle valve switch
11, four road proton flowmeters 2 are reached later and carry out flow control, are flowed into and are mixed in gas tank 3 and by uniformly mixing by setting flow
Afterwards, via proportioning valve 4 is reached after the output of mixed gas tank gas outlet 13, sputter is output to control the constant pressure of gas by proportioning valve
In, the Isobarically Control pressure of proton flowmeter charge flow rate and proportioning valve can be configured control, operation side on PLC
Just.
Embodiment described above is only that preferred embodiments of the present invention are described, not to this practicality
Novel range is defined, and under the premise of not departing from the spirit of the design of the utility model, those of ordinary skill in the art are to this
The various modifications and improvement that the technical solution of utility model is made, should all fall into the scope of protection of the utility model.
Claims (6)
1. a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering, including rack (1), it is characterised in that：The rack
(1) be provided with proton flowmeter (2), mixed gas tank (3), proportioning valve (4) and control box (5) on, proton flowmeter (2) respectively with it is mixed
Gas tank (3) and control box (5) connection, mixed gas tank (3) are connect with proportioning valve (4), further include PLC controller (6), proportioning valve (4)
And control box (5) is connect with PLC controller (6) respectively, and air inlet (8) and gas outlet (9) are provided in rack (1), into
Gas port (8) is connected to proton flowmeter (2).
2. a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering according to claim 1, it is characterised in that：Machine
Air inlet needle valve switch (11) and outlet needle valve switch (12), air inlet needle valve switch (11) and air inlet (8) are provided on frame (1)
Connection, air inlet needle valve switch (11) are connect with proton flowmeter (2)；Outlet needle valve switch (12) is connect with proportioning valve (4), outlet
Needle valve switch (12) is connected to gas outlet (9).
3. a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering according to claim 2, it is characterised in that：Institute
It is four road proton flowmeters to state proton flowmeter (2), and the air inlet (8) is four road air inlets, the air inlet needle valve switch
(11) it is four tunnel air inlet needle valve switch.
4. a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering according to claim 3, it is characterised in that：It is mixed
Gas tank (3) mixes gas tank gas outlet (13) by setting and is connect with proportioning valve (4).
5. a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering according to claim 4, it is characterised in that：Institute
It states air inlet (8) and gas outlet (9) is arranged on the rear panel (7) of rack (1).
6. a kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering according to claim 5, it is characterised in that：Institute
It states air inlet needle valve switch (11) and outlet needle valve switch (12) is arranged on the front panel (10) of rack (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820416528.0U CN208008885U (en) | 2018-03-27 | 2018-03-27 | A kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820416528.0U CN208008885U (en) | 2018-03-27 | 2018-03-27 | A kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208008885U true CN208008885U (en) | 2018-10-26 |
Family
ID=63889137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820416528.0U Expired - Fee Related CN208008885U (en) | 2018-03-27 | 2018-03-27 | A kind of constant pressure atmosphere control system for reaction magnetocontrol sputtering |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208008885U (en) |
-
2018
- 2018-03-27 CN CN201820416528.0U patent/CN208008885U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20181026 |