CN207958480U - Plated film nozzle and coating system - Google Patents

Plated film nozzle and coating system Download PDF

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Publication number
CN207958480U
CN207958480U CN201721429549.8U CN201721429549U CN207958480U CN 207958480 U CN207958480 U CN 207958480U CN 201721429549 U CN201721429549 U CN 201721429549U CN 207958480 U CN207958480 U CN 207958480U
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China
Prior art keywords
ejiction opening
plated film
process gas
film nozzle
gas
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CN201721429549.8U
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Chinese (zh)
Inventor
吕永贺
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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Abstract

The utility model provides a kind of plated film nozzle and coating system, is related to optically coated technical field, including plated film nozzle body, the first ejiction opening sprayed for process gas is provided in the plated film nozzle body;First ejiction opening both sides are provided with the second ejiction opening of protective gas ejection.The first ejiction opening in the plated film nozzle body of plated film nozzle and coating system provided by the utility model sprays process gas; the second ejiction opening in the first ejiction opening both sides sprays protective gas; to make process gas and air insulated; ensure that process gas by external influence, does not reach better coating effects.

Description

Plated film nozzle and coating system
Technical field
The utility model is related to optically coated technical fields, more particularly, to a kind of plated film nozzle and coating system.
Background technology
The continuous effort of the centuries mankind is have passed through, optical thin film has become an important composition portion of contemporary optics Point.Laser, the rapid development of space technology and spectral technique and electronic computer popularization and application, pushed optical thin film fly Speed development.Even to this day, importance of the film in modern science and technology is growing day by day.
Vacuum coating technology is widely used in modern industry, modern science technology.As everybody now known to Optical instrument speculum, the contact conductor in semiconductor devices, the cold mirror of projector lamp, the high reflection of laser resonant cavity Film etc. is all prepared by four methods for using vacuum coating.With the development of Film Optics, semiconductor technology and integrated optics etc., very Equipment aspect all achieves prodigious development to empty coating technique in theory, in technique and together.And in the integrated optics film phase Between, the thin magnetic film of storage, memory on computer, the heat-insulation and heat-preservation film, electroluminescent used on material surface modifying and building Control light solar energy film etc. achieves prodigious success.
Plated film is to plate the dielectric film of layer of transparent in material surface with method physically or chemically, or plate one layer of metal Film, it is therefore an objective to change the transmission and reflection characteristic of material surface.
In visible light and infrared wave segment limit, the reflectivity of most metals is all up 78%-98%, but not 98% can be higher than.Either for CO2 laser, speculum is made using copper, molybdenum, silicon, germanium etc., using germanium, GaAs, selenizing Zinc as output window and transmission optical component material, or for YAG laser using common optical glass as speculum, defeated Appearance and transmission optical component material cannot all reach 99% requirements above of total reflection mirror.
Outgoing mirror has the requirement of different transmitances when different application, it is therefore necessary to use optical coating method.
For infrared ray wave band in CO2 laser lamps, common Coating Materials has yttrium fluoride, praseodymium fluoride, germanium etc.;For YAG Laser lamp near infrared band or visible light wave range, common Coating Materials have zinc sulphide, magnesium fluoride, titanium dioxide, zirconium oxide etc..
Other than high-reflecting film, anti-reflection film, can also plate to certain wavelength increase reflection, it is anti-reflection to another wavelength penetrate it is special Spectro-film in film, such as laser freuqency doubling technology.
Also wear-resistant film, either spectacle lens made of inorganic material or organic material, it is daily in use, by Can all eyeglass be caused to wear in the friction with dust or gravel (silica), cut is generated in lens surface.Compared with sheet glass, Hardness degree made of organic material is relatively low, is more also easy to produce cut.By microscope, we can observe that lens surface is drawn Trace is broadly divided into two kinds, first, due to the cut that gravel generates, shallow and tiny, glasses wearer is not easy to discover;Another kind be by compared with The cut that big gravel generates, depth and periphery rough, can then affect vision in central area;Plated film can increase on the ophthalmic lens The rub proofness of spectacle lens.
But during plated film, some process gas can react with air, to influence the quality of plated film.
Utility model content
The purpose of this utility model is to provide plated film nozzle and coating system, with alleviate process gas plated film process In with air reaction, the technical issues of to influence coating quality.
A kind of plated film nozzle provided by the utility model, including plated film nozzle body, set in the plated film nozzle body It is equipped with the first ejiction opening sprayed for process gas;
First ejiction opening both sides are provided with the second ejiction opening of protective gas ejection.
Further, first ejiction opening is strip shape gob.
Further, second ejiction opening is strip shape gob.
Further, the length of second ejiction opening is not less than the length of the first ejiction opening.
Further, the second ejiction opening there are one being respectively set at left and right sides of the length direction of first ejiction opening.
Further, it is provided at least one suction hole in the plated film nozzle body.
Further, the suction hole is located at the left and right sides of the length direction of first ejiction opening, and described second Ejiction opening is between the suction hole and first ejiction opening.
Further, the suction hole is provided with multiple on the length direction of first ejiction opening.
Further, the suction hole is strip hole.
The utility model also provides a kind of coating system, using plated film nozzle described above.
The first ejiction opening in the plated film nozzle body of plated film nozzle and coating system provided by the utility model is by technique Gas sprays, and the second ejiction opening in the first ejiction opening both sides sprays protective gas, to make process gas and air insulated, Ensure that process gas by external influence, does not reach better coating effects.
When in use, process gas sprays plated film nozzle from the first ejiction opening, and the second ejiction opening sprays protective gas, than Such as nitrogen;The protective gas of second ejiction opening protects the process gas that the first ejiction opening sprays, in process gas surrounding Gas wall is formed, process gas and air insulated are opened, extra protective gas is discharged from suction hole, it is therefore prevented that air-flow is disorderly gone here and there, shadow Ring plated film.
Description of the drawings
It, below will be right in order to illustrate more clearly of specific embodiment of the present invention or technical solution in the prior art Specific implementation mode or attached drawing needed to be used in the description of the prior art are briefly described, it should be apparent that, it is described below In attached drawing be that some embodiments of the utility model are not paying creativeness for those of ordinary skill in the art Under the premise of labour, other drawings may also be obtained based on these drawings.
Fig. 1 is the structural schematic diagram for the plated film nozzle that the utility model embodiment provides;
Fig. 2 is the structural schematic diagram of another angle of plated film nozzle shown in Fig. 1;
Fig. 3 is the schematic diagram that plated film nozzle sprays air-flow shown in Fig. 1;
Fig. 4 is the schematic diagram that another plated film nozzle that the utility model embodiment provides sprays air-flow.
Icon:100- plated film nozzle bodies;The first ejiction openings of 200-;The second ejiction openings of 300-;400- suction holes; 500- process gas air-flows;600- protective gas air-flows.
Specific implementation mode
The technical solution of the utility model is clearly and completely described below in conjunction with attached drawing, it is clear that described Embodiment is the utility model a part of the embodiment, instead of all the embodiments.Based on the embodiments of the present invention, originally The every other embodiment that field those of ordinary skill is obtained without making creative work, belongs to this practicality Novel protected range.
It is in the description of the present invention, it should be noted that term "center", "upper", "lower", "left", "right", " perpendicular Directly ", the orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" is to be based on the orientation or positional relationship shown in the drawings, and is only The utility model and simplifying describes for ease of description, do not indicate or imply the indicated device or element must have it is specific Orientation, with specific azimuth configuration and operation, therefore should not be understood as limiting the present invention.In addition, term " the One ", " second ", " third " are used for description purposes only, and are not understood to indicate or imply relative importance.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " is pacified Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally Connection;It can be mechanical connection, can also be electrical connection;Can be directly connected, can also indirectly connected through an intermediary, It can be the connection inside two elements.For the ordinary skill in the art, it can understand above-mentioned art with concrete condition The concrete meaning of language in the present invention.
Fig. 1 is the structural schematic diagram for the plated film nozzle that the utility model embodiment provides;Fig. 2 is plated film nozzle shown in Fig. 1 Another angle structural schematic diagram;Fig. 3 is the schematic diagram that plated film nozzle sprays air-flow shown in Fig. 1;Fig. 4 is that the utility model is real Another plated film nozzle for applying example offer sprays the schematic diagram of air-flow.
As Figure 1-Figure 4, a kind of plated film nozzle provided by the utility model, including plated film nozzle body 100, in institute State the first ejiction opening 200 for being provided in plated film nozzle body 100 and being sprayed for process gas;
First ejiction opening, 200 both sides are provided with the second ejiction opening 300 of protective gas ejection.
In some embodiments, process gas refers to that thin-film material is had the solid state transformed object for Qitai or ionic state Matter;Due to the difference of thin-film material, process gas is also different.
During the optical thin film of some physical vapor depositions, solid state transformed by thin-film material forms gas for gaseous state, It is sprayed onto glass surface from the first ejiction opening 200, process gas arrives at after glass surface and gradually forms film.
Since the gaseous state of thin-film material may be influenced by air, react with the oxygen in air;In order to ensure Coating quality, the second ejiction opening 300 spray protective gas, make process gas during plated film, in process gas both sides shape At protection gas wall, make process gas and air insulated, ensures coating effects.
Protective gas can be nitrogen or argon gas etc..
On above-described embodiment basis, further, first ejiction opening 200 is strip shape gob.
In some embodiments, the first ejiction opening 200 is strip shape gob, in the process gas one that the first ejiction opening 200 sprays As be to be moved in the width direction of strip shape gob, the first ejiction opening 200 is towards carrying out plated film in the region to be plated of object to be plated.
On above-described embodiment basis, further, second ejiction opening 300 is strip shape gob.
In some embodiments, the second ejiction opening 300 is also strip shape gob, and the first ejiction opening 200 sprays process gas, the Two ejiction openings 300 spray protective gas, such as nitrogen, and for nitrogen in the both sides of gas supply gas, can play makes process gas restrain Purpose, reduce the first ejiction opening 200 spray process gas diffusion.Process gas is set to converge at the region to be plated of object to be plated It is interior.
Second ejiction opening 300 can be formed the second ejiction opening 300 by multistage ejiction opening;Have between every section of ejiction opening certain Interval.
Multistage ejiction opening can be set around the first ejiction opening 200, and multistage ejiction opening surrounds 200 shape of the first ejiction opening At the second ejiction opening 300;The guarantor that the process gas air-flow 500 that such first ejiction opening 200 sprays is sprayed by the second ejiction opening 300 Shield gas flow 600 surrounds, and effectively makes process gas air-flow 500 and air insulated, prevents air from contacting hair with process gas Raw reaction, ensures the quality of plated film.
As shown in Fig. 2, on above-described embodiment basis, further, the length of second ejiction opening 300 is not less than The length of first ejiction opening 200.
As shown in figure 3, in some embodiments, the length of the second ejiction opening 300 is not less than the length of the first ejiction opening 200 Degree;When the equal length of length and the first ejiction opening 200 of the second ejiction opening 300, the both ends of the first ejiction opening 200 with The both ends of second ejiction opening 300 are aligned.
The protective gas that the process gas air-flow 500 that such first ejiction opening 200 sprays is sprayed by the second ejiction opening 300 Air-flow 600 squeezes, and so that process gas air-flow 500 is restrained to centre, reduces diffusion around;Protective gas air-flow 600 simultaneously Process gas air-flow 500 is protected, itself and air insulated are made, prevents the oxygen in air from reacting with process gas, Influence the quality of plated film.
As shown in figure 4, in some embodiments, the length of the second ejiction opening 300 is more than the length of the first ejiction opening 200; The both ends of first ejiction opening 200 are located between the both ends of the second ejiction opening 300;The process gas that such first ejiction opening 200 sprays Body air-flow 500 is squeezed by the protective gas air-flow 600 that the second ejiction opening 300 sprays, and process gas air-flow 500 is made to be received to centre It holds back, reduces diffusion around;Protective gas air-flow 600 protects process gas air-flow 500 simultaneously;It is sprayed at two second The protective gas air-flow 600 that outlet 300 sprays interlocks, and forms gas wall;To which process gas air-flow 500 all around has protection Gas surrounds, and makes itself and air insulated, prevents process gas from reacting with air, to influence the quality of plated film.
On above-described embodiment basis, further, the left and right sides point of the length direction of first ejiction opening 200 It She Zhi not be there are one the second ejiction opening 300.
In some implementations, the both sides of the first ejiction opening 200 are provided with the second ejiction opening 300, the first ejiction opening 200 and Two ejiction openings 300 are strip shape gob, and second ejiction opening 300 is respectively arranged in the both sides of the length direction of the first ejiction opening 200; Second ejiction opening 300 can spray nitrogen.
The connecting hole of connection protective gas feeding mechanism is useful in plated film nozzle body 100, protective gas can be from Connecting hole enters, and is sprayed from the second ejiction opening 300, to form isolation around the process gas that the first ejiction opening 200 sprays Layer.
On above-described embodiment basis, further, at least one air-breathing is provided in the plated film nozzle body 100 Hole 400.
In some embodiments, one or more suction hole 400, the second ejiction opening are set in plated film nozzle body 100 The 300 protection gas sprayed can be discharged from suction hole 400, prevent protection gas from cannot spread in time, influence the plated film of process gas.
Suction hole 400 is multiple, and multiple suction holes 400 can be arranged one week in plated film nozzle body 100, suction hole 400 surround along the second ejiction opening 300;The protective gas air-flow 600 of second ejiction opening 300 stopped by process gas air-flow 500, only Can be to 400 side diffusion of suction hole, since vacuum pump makes suction hole 400 form negative pressuren zone, protective gas enters from suction hole 400, Extra gas is discharged.
On above-described embodiment basis, further, the suction hole 400 is located at the length of first ejiction opening 200 The left and right sides in direction is spent, and second ejiction opening 300 is between the suction hole 400 and first ejiction opening 200.
In some embodiments, suction hole 400 is sprayed in the left and right sides of the length direction of the first ejiction opening 200, second The protective gas air-flows 600 that mouth 300 sprays, cannot be to 200 side of the first ejiction opening due to the effect by process gas air-flow 500 To diffusion, suction hole 400 is arranged in the second ejiction opening 300 far from 200 side of the first ejiction opening, can just absorb expansion in this way The protective gas come that sheds has an impact plated film to prevent air-flow from disorderly going here and there.
On above-described embodiment basis, further, length of the suction hole 400 in first ejiction opening 200 It is provided on direction multiple.
In some embodiments, suction hole 400 is provided with multiple, and multiple suction holes 400 can will be more from different places Remaining gas siphons away.
Mounting hole is additionally provided on plated film nozzle, mounting hole is for connecting air extractor, and than entering vacuum pump, vacuum pump is logical It crosses pipeline to connect with mounting hole, makes to form negative pressuren zone in suction hole 400, to which extra gas can be discharged from suction hole 400.
On above-described embodiment basis, further, the suction hole 400 is strip hole.
In some embodiments, suction hole 400 is strip hole, and the length of strip hole is not less than 300 length of the second ejiction opening, Suction hole 400 can effectively siphon away extra gas in this way, to which the protective gas that the second ejiction opening 300 sprays plays guarantor While shield acts on, influence of the protective gas to process gas is decreased, ensures the coating quality of process gas.
In some embodiments, suction hole 400 can be arranged multiple on the length direction of the second ejiction opening 300, adjacent Suction hole 400 between have certain interval, the suction hole 400 of the length direction of the second ejiction opening 300, adjacent farthest two Distance is not less than the length of the second ejiction opening 300 between suction hole 400.
The utility model also provides a kind of coating system, using plated film nozzle described above.
In some embodiments, coating system include vacuum pumps, evaporation source, main cavity, monitoring system, operating system and Ancillary equipment.
When plated film, target is heated, makes surface component be evaporated out with atom or ionic species, passes through first Ejiction opening 200 is deposited in the surface of substrate, to form film;The material of plating is known as target.
Using the coating system of plated film nozzle, the quality of plated film is improved, during plated film, the process gas of ejection It can be protected the protection of gas, make process gas and air insulated, it is such to prevent process gas and air reaction The coating quality of coating system is more stable, product quality higher.
The first ejiction opening 200 in the plated film nozzle body 100 of plated film nozzle and coating system provided by the utility model Process gas is sprayed, the second ejiction opening 300 in 200 both sides of the first ejiction opening sprays protective gas, to make process gas Body and air insulated, it is ensured that process gas by external influence, does not reach better coating effects.
When in use, process gas sprays plated film nozzle from the first ejiction opening 200, the spray protection of the second ejiction opening 300 Gas, such as nitrogen;The protective gas of second ejiction opening 300 protects the process gas that the first ejiction opening 200 sprays, Process gas surrounding forms gas wall, and process gas and air insulated are opened, and extra protective gas is discharged from suction hole 400, prevents Stop air-flow disorderly to go here and there, influences plated film.
Finally it should be noted that:The above various embodiments is only to illustrate the technical solution of the utility model, rather than limits it System;Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should Understand:It still can be with technical scheme described in the above embodiments is modified, either to which part or whole Technical characteristic carries out equivalent replacement;And these modifications or replacements, this practicality that it does not separate the essence of the corresponding technical solution are new The range of each embodiment technical solution of type.

Claims (8)

1. a kind of plated film nozzle, which is characterized in that including plated film nozzle body, be provided with and be used in the plated film nozzle body The first ejiction opening that process gas sprays;
First ejiction opening both sides are provided with the second ejiction opening of protective gas ejection;
It is provided at least one suction hole in the plated film nozzle body;
The suction hole is located at the left and right sides of the length direction of first ejiction opening, and second ejiction opening is positioned at described Between suction hole and first ejiction opening.
2. plated film nozzle according to claim 1, which is characterized in that first ejiction opening is strip shape gob.
3. plated film nozzle according to claim 2, which is characterized in that second ejiction opening is strip shape gob.
4. plated film nozzle according to claim 3, which is characterized in that the length of second ejiction opening is not less than the first spray The length of outlet.
5. plated film nozzle according to claim 1, which is characterized in that the left and right two of the length direction of first ejiction opening Side is respectively set there are one the second ejiction opening.
6. plated film nozzle according to claim 1, which is characterized in that length of the suction hole in first ejiction opening It is provided on direction multiple.
7. plated film nozzle according to claim 1, which is characterized in that the suction hole is strip hole.
8. a kind of coating system, which is characterized in that using any one of the claim 1-7 plated film nozzles.
CN201721429549.8U 2017-10-31 2017-10-31 Plated film nozzle and coating system Active CN207958480U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
CN201721429549.8U CN207958480U (en) 2017-10-31 2017-10-31 Plated film nozzle and coating system

Publications (1)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114887794A (en) * 2022-04-25 2022-08-12 厦门强力巨彩光电科技有限公司 Deposition coating device and deposition coating method for LED display screen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114887794A (en) * 2022-04-25 2022-08-12 厦门强力巨彩光电科技有限公司 Deposition coating device and deposition coating method for LED display screen
CN114887794B (en) * 2022-04-25 2023-06-27 厦门强力巨彩光电科技有限公司 Deposition coating device and deposition coating method for LED display screen

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