CN207352199U - A kind of new pattern laser galvanometer eyeglass and laser galvanometer - Google Patents
A kind of new pattern laser galvanometer eyeglass and laser galvanometer Download PDFInfo
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- CN207352199U CN207352199U CN201721094442.2U CN201721094442U CN207352199U CN 207352199 U CN207352199 U CN 207352199U CN 201721094442 U CN201721094442 U CN 201721094442U CN 207352199 U CN207352199 U CN 207352199U
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Abstract
Laser mirror techniques field is the utility model is related to, more particularly, to a kind of new pattern laser galvanometer eyeglass and laser galvanometer.The new pattern laser galvanometer eyeglass includes：Basement membrane layer, middle film layer and the high-reflecting film layer set gradually from bottom to top；The middle film layer includes：The first connection film layer, Al films and the second connection film layer set gradually from bottom to top.The new pattern laser galvanometer eyeglass can meet any wave band instruction light demands of 400 700nm, eyeglass is had more versatility；Realize and at least meet two optical maser wavelength into frequency multiplication relation, can meet the high reflection requirement of two wave bands more than 99.8% of 532nm and 1064nm at the same time；With excellent thermal conductivity, the laser reflection power of eyeglass unit area is substantially improved, significantly mitigates the weight of laser vibration mirror reflected eyeglass, so as to improve the response speed of galvanometer.
Description
Technical field
Laser mirror techniques field is the utility model is related to, more particularly, to a kind of new pattern laser galvanometer eyeglass and laser
Galvanometer.
Background technology
At present, galvanometer eyeglass be scanning galvanometer in the scan control application process to laser, pass through X and Y reflecting optics
Swing, laser is realized in working face and is accurately positioned at a high speed.Conventional laser galvanometer eyeglass meets that the height of operation wavelength is anti-
(reflectivity is more than 99.4%) is penetrated, specifies instruction light reflection (reflectivity is more than 80%), its shortcoming is mainly some：Operation wavelength
It is only a kind of；Instruction optical wavelength is restricted, and does not possess versatility；Galvanometer piece thermal conductivity is poor, and main substrate material is BK7 (light
Learn glass)；Galvanometer sheet weight is heavier, and the density mainly due to substrate material BK7 causes.
The information for being disclosed in the background section is merely intended to deepen the understanding to this general background technology, without answering
When being considered as recognizing or imply the information structure prior art known to those skilled in the art in any form.
Utility model content
The purpose of this utility model is to provide a kind of new pattern laser galvanometer eyeglass and laser galvanometer, to solve existing skill
Operation wavelength present in art only has a kind of, instruction optical wavelength to be restricted, and does not possess the technical problem of versatility.
To achieve these goals, the utility model uses following technical scheme：
In a first aspect, the utility model provides a kind of new pattern laser galvanometer eyeglass, it includes：Set gradually from bottom to top
Basement membrane layer, middle film layer and high-reflecting film layer；The middle film layer includes：Set gradually from bottom to top first connection film layer,
Al films and the second connection film layer.
As a kind of further technical solution, the first connection film layer includes but not limited to：Al2O3Film.
As a kind of further technical solution, the second connection film layer includes but not limited to：Al2O3Film.
As a kind of further technical solution, the basement membrane layer includes but not limited to：Si substrates.
As a kind of further technical solution, the high-reflecting film layer includes：The L-type film that is arranged alternately from bottom to top, H-type
Film, wherein, the L-type film is made of low-index material, and the H-type film is made of high-index material.
As a kind of further technical solution, the low-index material that the L-type film uses includes but not limited to：
SiO2。
As a kind of further technical solution, the high-index material that the H-type film uses includes but not limited to：
HfO2。
Second aspect, the utility model also provide a kind of laser galvanometer, it includes the new pattern laser galvanometer eyeglass.Should
New pattern laser galvanometer eyeglass includes：Basement membrane layer, middle film layer and the high-reflecting film layer set gradually from bottom to top；The intermediate coat
Layer includes：The first connection film layer, Al films and the second connection film layer set gradually from bottom to top.
Using above-mentioned technical proposal, the utility model has the advantages that：
1), the new pattern laser galvanometer eyeglass can meet any wave band instruction light demands of 400-700nm, have more eyeglass
Versatility；
2), the new pattern laser galvanometer eyeglass, which can be realized, at least meets two optical maser wavelength into frequency multiplication relation, except
Beyond the instruction reflection of 635nm feux rouges, it can meet the high reflection requirement of two wave bands more than 99.8% of 532nm and 1064nm at the same time；
3), the new pattern laser galvanometer eyeglass has excellent thermal conductivity further using Si substrates as basement membrane layer, can
The laser reflection power of eyeglass unit area on the lens base of same specification, is substantially improved, bear more powerful sharp
Light device；
4), the new pattern laser galvanometer eyeglass is further using Si substrates as basement membrane layer, compared to conventional BK7 and quartz
For eyeglass, it can significantly mitigate the weight of laser vibration mirror reflected eyeglass, so as to improve the response speed of galvanometer.
Brief description of the drawings
, below will be right in order to illustrate more clearly of the utility model embodiment or technical solution of the prior art
Embodiment or attached drawing needed to be used in the description of the prior art are briefly described, it should be apparent that, describe below
In attached drawing be the utility model some embodiments, for those of ordinary skill in the art, do not paying creativeness
On the premise of work, other attached drawings can also be obtained according to these attached drawings.
Fig. 1 is the structure diagram for the new pattern laser galvanometer eyeglass that the utility model embodiment provides；
Fig. 2 is the flow chart for the coating process that the utility model embodiment provides.
Reference numeral：
1- basement membrane layers；The connection film layers of 2- first；3-Al films；
The connection film layers of 4- second；5- high-reflecting film layers.
Embodiment
The technical solution of the utility model is clearly and completely described below in conjunction with attached drawing, it is clear that described
Embodiment is the utility model part of the embodiment, instead of all the embodiments.Based on the embodiment in the utility model, sheet
Field those of ordinary skill all other embodiments obtained without making creative work, belong to this practicality
Novel protected scope.
, it is necessary to explanation in the description of the utility model, term " " center ", " on ", " under ", it is "left", "right", " perpendicular
Directly ", the orientation of the instruction such as " level ", " interior ", " outer " or position relationship are based on orientation shown in the drawings or position relationship, are only
Described for the ease of description the utility model and simplifying, rather than instruction or imply signified device or element must have it is specific
Orientation, with specific azimuth configuration and operation, therefore it is not intended that limitation to the utility model.In addition, term " the
One ", " second ", " the 3rd " are only used for description purpose, and it is not intended that instruction or hint relative importance.
, it is necessary to which explanation, unless otherwise clearly defined and limited, term " are pacified in the description of the utility model
Dress ", " connected ", " connection " should be interpreted broadly, for example, it may be fixedly connected or be detachably connected, or integratedly
Connection；Can mechanically connect or be electrically connected；It can be directly connected, can also be indirectly connected by intermediary,
It can be the connection inside two elements.For the ordinary skill in the art, on can understanding as the case may be
State concrete meaning of the term in the utility model.
Specific embodiment of the present utility model is described in detail below in conjunction with attached drawing.It should be appreciated that herein
Described embodiment is only used for describing and explaining the present invention, and is not intended to limit the present invention.
Embodiment one
With reference to shown in Fig. 1, the present embodiment provides a kind of new pattern laser galvanometer eyeglass, it includes：Set gradually from bottom to top
Basement membrane layer 1, middle film layer and high-reflecting film layer 5；The middle film layer includes：The first junctional membrane set gradually from bottom to top
Layer 2, Al films 3 and second connect film layer 4.Due to the design of middle film layer, relative to traditional handicraft, it can meet 400-700nm
Any wave band instruction light demand, makes eyeglass have more versatility.Moreover, the design of high-reflecting film layer 5 meets frequency-doubled wavelength at the same time
High reflection (reflectivity more than 99.5%) demand.
In the present embodiment, first connection film layer 2, second connect film layer 4 is used as articulamentum, the purpose is to Al films 3 with it is adjacent
Combination dynamics between film layer.Therefore, as a kind of further technical solution, the first connection film layer 2 includes but unlimited
In：Al2O3Film.The second connection film layer 4 includes but not limited to：Al2O3Film.What deserves to be explained is Al2O3Film is a kind of compares
Good embodiment, other materials articulamentum (such as：Metal oxide) it is equally applicable to the present embodiment.
In the present embodiment, as a kind of further technical solution, the basement membrane layer 1 includes but not limited to：Si substrates.
Si substrates have excellent thermal conductivity, and the laser of eyeglass unit area on the lens base of same specification, can be substantially improved
Reflection power, bears more powerful laser；For conventional BK7 and fused silica glass, it can significantly mitigate laser and shake
The weight of mirror reflecting optics, so as to improve the response speed of galvanometer.
Certainly, for the basement membrane layer 1, the materials such as BK7, quartz can also be used.These materials have difference
Hot expansion property and thermal conductivity.In these three materials, it is known that Si materials have good thermal conductivity, and according to BK7
Formed with the basic element of quartz it is not difficult to find that its atomic mass is much larger than Si, so the weight of Si is these three common used materials
In it is most light.
In the present embodiment, as a kind of further technical solution, the high-reflecting film layer 5 includes：Alternately set from bottom to top
L-type film, the H-type film put, wherein, the L-type film is made of low-index material, and the H-type film uses high-index material
It is made.
Wherein, the high-index material that the H-type film uses includes but not limited to：HfO2.The low folding that the L-type film uses
The rate material of penetrating includes but not limited to：SiO2.The present embodiment is by the best HfO of anti-laser activity2As high-index material, meanwhile,
With SiO2It is used cooperatively, SiO2With preferable mechanical performance and Laser resist characteristic so that galvanometer eyeglass has preferable anti-laser
Damage threshold.
For clearer description, it is illustrated with a kind of specific membrane system：
Laser galvanometer Film Design is as follows in the present embodiment：Si/Al2O3 Al Al2O3(2SiO2 HfO2) ^20/Air, its
Design wavelength lambda=750nm.Conventional laser galvanometer Film Design is as follows：BK7/(0.6*Ta2O5 0.6*SiO2)^7(Ta2O5
SiO2) ^20/Air design wavelength lambdas=1175nm.Relative to traditional handicraft, embodiment adds can improve overall visible light wave
The plating membrane part of section (400nm-700nm) reflection：Al2O3 Al Al2O3, and traditional handicraft only has (0.6*Ta2O5 0.6*
SiO2) ^7 indicates light as the reflection of 650nm.In addition, traditional handicraft may only be directed to the operation wavelength that 1064nm is reflected
Section (Ta2O5 SiO2) ^20, novel process adds (2SiO2 HfO2) ^20 Multiple frequency designs, it can meet the height of frequency-doubled wavelength at the same time
Reflect (reflectivity more than 99.5%).
Certainly, HfO is selected2It is only one of which preferred embodiment as high-index material, can also selects
Use ZrO2、Ta2O5、Ti3O5Among any one.
To sum up, the utility model has the advantages that：
1), the new pattern laser galvanometer eyeglass can meet any wave band instruction light demands of 400-700nm, have more eyeglass
Versatility；
2), the new pattern laser galvanometer eyeglass, which can be realized, at least meets two optical maser wavelength into frequency multiplication relation, except
Beyond the instruction reflection of 635nm feux rouges, it can meet the high reflection requirement of two wave bands more than 99.8% of 532nm and 1064nm at the same time；
3), the new pattern laser galvanometer eyeglass has excellent thermal conductivity further using Si substrates as basement membrane layer 1,
The laser reflection power of eyeglass unit area on the lens base of same specification, can be substantially improved, bear more powerful
Laser；
4), the new pattern laser galvanometer eyeglass is further using Si substrates as basement membrane layer 1, compared to conventional BK7 and stone
For English eyeglass, it can significantly mitigate the weight of laser vibration mirror reflected eyeglass, so as to improve the response speed of galvanometer.
Embodiment two
The present embodiment two also provides a kind of laser galvanometer, it includes the new pattern laser galvanometer eyeglass described in embodiment one.
Wherein, the quantity of the new pattern laser galvanometer eyeglass is two, one of them is applied to galvanometer X, another is applied to galvanometer Y.
Wherein, angle change is 25 ° to 52.5 ° during galvanometer Y-axis film design, and angle change arrives for 32.5 ° during X-axis film design
57.5°。
Specifically, with reference to shown in Fig. 1, new pattern laser galvanometer eyeglass includes：The basement membrane layer set gradually from bottom to top
1st, middle film layer and high-reflecting film layer 5；The middle film layer includes：First set gradually from bottom to top connects film layer 2, Al films 3
With the second connection film layer 4.Due to the design of middle film layer, relative to traditional handicraft, it can meet that any wave bands of 400-700nm refer to
Show light demand, eyeglass is had more versatility.Moreover, the design of high-reflecting film layer 5 meets the high reflection (reflection of frequency-doubled wavelength at the same time
Rate more than 99.5%) demand.
Include in a kind of detailed description of above-described embodiment, the technical solution disclosed in the present embodiment two as other features
Technical solution disclosed in embodiment one, the content that embodiment one is protected fall within the protection content of the present embodiment two, phase
It is no longer repeated for same part.Similarly, the technical solution disclosed in the present embodiment two has identical with embodiment one beneficial
Effect：
1), the new pattern laser galvanometer eyeglass can meet any wave band instruction light demands of 400-700nm, have more eyeglass
Versatility；
2), the new pattern laser galvanometer eyeglass, which can be realized, at least meets two optical maser wavelength into frequency multiplication relation, except
Beyond the instruction reflection of 635nm feux rouges, it can meet the high reflection requirement of two wave bands more than 99.8% of 532nm and 1064nm at the same time；
3), the new pattern laser galvanometer eyeglass has excellent thermal conductivity further using Si substrates as basement membrane layer 1,
The laser reflection power of eyeglass unit area on the lens base of same specification, can be substantially improved, bear more powerful
Laser；
4), the new pattern laser galvanometer eyeglass is further using Si substrates as basement membrane layer 1, compared to conventional BK7 and stone
For English eyeglass, it can significantly mitigate the weight of laser vibration mirror reflected eyeglass, so as to improve the response speed of galvanometer.
Embodiment three
The present embodiment three also provides a kind of film plating process for being used to make new pattern laser galvanometer eyeglass described in embodiment one,
It includes：
Using vacuum evaporation coating membrane technology (as a kind of further technical solution, using vacuum evaporation coating membrane technology, and
Whole process using ion gun carries out deposition auxiliary in coating process), the is deposited by the way of electron beam evaporation in basement membrane layer 1
One connection film layer 2, in the first connection film layer 2 using resistance heating evaporation by the way of depositing Al film 3, using electric on Al films 3
The mode of beamlet evaporation deposits the second connection film layer 4, and height is deposited instead by the way of electron beam evaporation in the second connection film layer 4
Film layer 5.
It has been described in detail in above example one for the concrete structure of new pattern laser galvanometer eyeglass, it is no longer superfluous herein
State.
For the present embodiment, the related procedure that can continue to use existing coating process makes it, can refer to Fig. 2 institutes
Show.In the following, specific expansion description is carried out for some key steps in coating process.
1) it is 2.3*10 in vacuum using ion source deposit ancillary technique, using vacuum evaporation coating membrane technology-3Pa is true
Sky is lower to carry out plated film, due to high-index material can oxygen loss in a vacuum, so being carried out in coating process for this material
The mode of delivery of supplemental oxygen ensures its stability in plated film.In coating process it is whole using ion gun carry out deposition auxiliary so that
Reach the film layer of spectrum densification.Deposition auxiliary is carried out without using ion gun in traditional handicraft, film layer is more coarse.
2) Al that the mode deposit thickness that the deposited by electron beam evaporation on substrate, is needed before Al films 3 are coated with is 30nm2O3, by
In Al2O3Combined with substrate firm and combined with Al firm, play effective connection function.Traditional handicraft is directly by Ta2O5With base
Piece combines, it can not show a candle to combine firm Al with substrate with reference to dynamics2O3。
3) mode of resistance heating evaporation need to be used when, being coated with Al films 3, is effectively deposited on the speed of 10nm/s on substrate,
Thickness is 120nm, and coordinates ion source deposit ancillary technique, Al films 3 is effectively deposited on Al2O3On film.Al films 3 can be
The whole wave band of visible ray provides the uniformly reflectivity more than 85%, and being coated with for traditional handicraft can only be directed to single 650nm progress
Reflection.
4), it is coated with HfO2The mode of electron beam evaporation need to be used to carry out during film, speed is according to 0.3nm/s, by design thickness
Deposition, makes film layer finer and close using ion source assisted technology.The damage threshold highest of HfO2, coordinates ion gun auxiliary heavy
Accumulating the more traditional Ta2O5 of obtained film layer has obvious advantage.
Finally it should be noted that：Various embodiments above is only to illustrate the technical solution of the utility model, rather than it is limited
System；Although the utility model is described in detail with reference to foregoing embodiments, those of ordinary skill in the art should
Understand：It can still modify the technical solution described in foregoing embodiments, either to which part or whole
Technical characteristic carries out equivalent substitution；And these modifications or replacement, the essence of appropriate technical solution is departed from this practicality newly
The scope of each embodiment technical solution of type.
Claims (8)
- A kind of 1. new pattern laser galvanometer eyeglass, it is characterised in that including：The basement membrane layer that sets gradually from bottom to top, intermediate coat Layer and high-reflecting film layer；The middle film layer includes：The first connection film layer, Al films and the second junctional membrane set gradually from bottom to top Layer.
- 2. new pattern laser galvanometer eyeglass according to claim 1, it is characterised in that the first connection film layer includes： Al2O3Film.
- 3. new pattern laser galvanometer eyeglass according to claim 1, it is characterised in that the second connection film layer includes： Al2O3Film.
- 4. new pattern laser galvanometer eyeglass according to claim 1, it is characterised in that the basement membrane layer includes：Si substrates.
- 5. new pattern laser galvanometer eyeglass according to claim 1, it is characterised in that the high-reflecting film layer includes：From lower and On the L-type film, the H-type film that are arranged alternately, wherein, the L-type film is made of low-index material, and the H-type film is rolled over using high The rate material of penetrating is made.
- 6. new pattern laser galvanometer eyeglass according to claim 5, it is characterised in that the low-refraction that the L-type film uses Material includes：SiO2。
- 7. new pattern laser galvanometer eyeglass according to claim 5, it is characterised in that the high index of refraction that the H-type film uses Material includes：HfO2。
- 8. a kind of laser galvanometer, it is characterised in that including the new pattern laser galvanometer mirror as any one of claim 1-7 Piece.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201721094442.2U CN207352199U (en) | 2017-08-29 | 2017-08-29 | A kind of new pattern laser galvanometer eyeglass and laser galvanometer |
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| CN201721094442.2U CN207352199U (en) | 2017-08-29 | 2017-08-29 | A kind of new pattern laser galvanometer eyeglass and laser galvanometer |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107329196A (en) * | 2017-08-29 | 2017-11-07 | 镇江金海创科技有限公司 | A kind of new pattern laser galvanometer eyeglass, laser galvanometer and film plating process |
| CN110530206A (en) * | 2019-10-11 | 2019-12-03 | 河南平原光电有限公司 | High damage threshold protective film preparation process for laser intelligence field optics code-disc |
-
2017
- 2017-08-29 CN CN201721094442.2U patent/CN207352199U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107329196A (en) * | 2017-08-29 | 2017-11-07 | 镇江金海创科技有限公司 | A kind of new pattern laser galvanometer eyeglass, laser galvanometer and film plating process |
| CN110530206A (en) * | 2019-10-11 | 2019-12-03 | 河南平原光电有限公司 | High damage threshold protective film preparation process for laser intelligence field optics code-disc |
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