CN207775334U - Sub- mask plate and mask plate - Google Patents
Sub- mask plate and mask plate Download PDFInfo
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- CN207775334U CN207775334U CN201820003884.XU CN201820003884U CN207775334U CN 207775334 U CN207775334 U CN 207775334U CN 201820003884 U CN201820003884 U CN 201820003884U CN 207775334 U CN207775334 U CN 207775334U
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- mask plate
- transition region
- sub
- bottom edge
- pattern area
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Abstract
The utility model discloses a seed mask plate and mask plates, belong to evaporated device field.The sub- mask plate includes pattern area and two clamp areas,Two clamp areas are located at the opposite both sides in pattern area,Trapezoidal transition region is equipped between at least one of pattern area and two clamp areas,First bottom edge of transition region is connect with clamp area,Second bottom edge of transition region is connect with pattern area,First bottom edge is the longer bottom edge of transition region,Second bottom edge is the shorter bottom edge of transition region,When clamping two clamp areas by screen-tensioning machine and being stretched,It will produce the pulling force of the extending direction of the waist along transition region in transition region,Since the angle of the length direction in the direction and pattern area of pulling force is more than 0,Therefore the pulling force will produce the component of the length direction perpendicular to pattern area,To reduce the possibility that pattern area generates fold,After so mask plate is fabricated to FMM,The fold of FMM is less,To improve the flatness of FMM.
Description
Technical field
The utility model is related to show equipment manufacturing technology field, more particularly to a seed mask plate and mask plate.
Background technology
Currently, mostly using FMM (Fine Metal Mask, high-precision metal mask plate) during evaporation process will steam
Plating material is vaporized on the specified position of substrate, and the flatness of FMM can influence the effect of vapor deposition, and the precision of vapor deposition is higher, to FMM's
Flatness requirement is higher.
FMM includes mask plate frame and multiple sub- mask plates, and mask is fixed on after the stretching that sub- mask plate passes through screen-tensioning machine
On chase frame, the quantity of sub- mask plate can be configured according to the actual needs on mask plate frame.
Sub- mask plate includes rectangular pattern area and is connected to two clamp areas at the both ends in pattern area, due to
When stretching sub- mask plate, after screen-tensioning machine clamps two clamp areas, the length direction along sub- mask plate draws sub- mask plate
It stretches, therefore the direction of pull that sub- mask plate is subject to is consistent with the length direction of sub- mask plate, and in the length perpendicular to sub- mask plate
Sub- mask plate does not have under tension effect on degree direction, this makes sub- mask plate be susceptible to along direction of pull in drawing process
The fold of extension reduces so as to cause the flatness of FMM, influences the effect of vapor deposition.
Utility model content
In order to solve the problems, such as that existing sub- mask plate is susceptible to fold, the utility model embodiment provides a seed
Mask plate and mask plate.The technical solution is as follows：
On the one hand, the utility model embodiment provides a seed mask plate, and the sub- mask plate includes pattern area and two
A clamp area, described two clamp areas are located at the opposite both sides in the pattern area, the pattern area and described two clampings
Trapezoidal transition region is equipped between at least one of area, the first bottom edge of the transition region is connect with the clamp area, institute
The second bottom edge for stating transition region is connect with the pattern area, and first bottom edge is the longer bottom edge of the transition region, described
Second bottom edge is the shorter bottom edge of the transition region.
Optionally, the junction in the waist of the transition region and the pattern area is provided with knuckle.
Optionally, the equal length of two waists of the transition region.
Optionally, it is provided with engraved structure in the transition region.
Optionally, the engraved structure includes the hollow slots of multiple strips, and the hollow slots of the multiple strip are arranged symmetrically
Extended line in the symmetry axis both sides of the transition region, the hollow slots of each strip intersects with the symmetry axis.
Optionally, each hollow slots extend to second bottom edge from first bottom edge.
Optionally, the intersection point of the extended line of two waists of the transition region is located on the extended line of each hollow slots.
Optionally, it is equipped with deformation buffering area between the pattern area and the transition region, is equipped in the deformation buffering area
At least one network, each network is bar shaped, and the length direction of each network is with described the
Two bottom edges are parallel.
Optionally, the length of the network and the deformation buffering area on the direction for being parallel to second bottom edge
Length it is identical.
On the other hand, the utility model embodiment additionally provides a kind of mask plate, and the mask plate includes mask plate frame
With the multiple sub- mask plates being fixed on the mask plate frame, wherein at least one of the multiple sub- mask plate is such as
Preceding any seed mask plate.
The advantageous effect brought of technical solution that the utility model embodiment provides is：By clamp area and pattern area it
Between transition region is set, since transition region is trapezoidal, the longer bottom edge of clamp area and transition region connects, pattern area and transition region
Shorter bottom edge connection will produce in transition region along mistake in this way when clamping two clamp areas by screen-tensioning machine and being stretched
The pulling force for crossing the extending direction of the waist in area, since the angle of the length direction in the direction and pattern area of pulling force is more than 0, the drawing
Power will produce the component of the length direction perpendicular to pattern area, to reduce the possibility that pattern area generates fold, so mask
After version is fabricated to FMM, the fold of FMM is less, to improve the flatness of FMM.
Description of the drawings
It is required in being described below to embodiment in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
Attached drawing to be used is briefly described, it should be apparent that, the accompanying drawings in the following description is only some realities of the utility model
Example is applied, it for those of ordinary skill in the art, without creative efforts, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the structure chart for the seed mask plate that the utility model embodiment provides；
Fig. 2 is the close-up schematic view for the seed mask plate that the utility model embodiment provides；
Fig. 3 is the partial structural diagram for another seed mask plate that the utility model embodiment provides；
Fig. 4 is the partial structural diagram for another seed mask plate that the utility model embodiment provides；
Fig. 5 is the structural schematic diagram for another seed mask plate that the utility model embodiment provides；
Fig. 6 is pattern area when a kind of sub- mask plate that deformation buffering area not being arranged that the utility model embodiment provides stretches
Status diagram；
Fig. 7 is pattern area when a kind of sub- mask plate being provided with deformation buffering area that the utility model embodiment provides stretches
Status diagram；
Fig. 8 is a kind of structural schematic diagram for mask plate that the utility model embodiment provides.
Specific implementation mode
It is new to this practicality below in conjunction with attached drawing to keep the purpose of this utility model, technical solution and advantage clearer
Type embodiment is described in further detail.
Fig. 1 is the structure chart for the seed mask plate that the utility model embodiment provides, as shown in Figure 1, the sub- mask plate
Including pattern area 10 and two clamp areas 20, two clamp areas 20 are located at the opposite both sides in pattern area 10.Pattern area 10 with
Trapezoidal transition region 30, the first bottom edge 30a of transition region 30 and clamp area there are one being respectively set between two clamp areas 20
20 connections, the second bottom edge 30b of transition region 30 are connect with pattern area 10, wherein the first bottom edge 30a is the longer of transition region 30
Bottom edge, the second bottom edge 30b are the shorter bottom edge of transition region 30.
In the other embodiment of the utility model, can also only it be arranged between a clamp area 20 and pattern area 10
Cross area 30.
Pattern area 10 is rectangular, and two clamp areas 20 are connected on two opposite side in pattern area 10, and pattern area 10 is wrapped
Include pierced pattern 11 and the white space 12 around pierced pattern 11, pierced pattern 11 includes the opening of multiple hollow outs, into
Row vapor deposition.
When realization, pattern area 10, clamp area 20 and transition region 30 can be an integral molding structure.
Pattern area 10 shown in Fig. 1 includes 5 pierced patterns 11 being alternatively arranged in a row, and each pierced pattern 11 is equal
It is rectangular, specific implementation when, the quantity of pierced pattern 11, the arrangement mode of pierced pattern 11, pierced pattern 11 shape with
And relative size between different pierced pattern 11 and position can be configured according to specific needs, shown in Fig. 1 only
For example, such as in other embodiments, pierced pattern 11 can also be arranged 7 or 10, and pierced pattern 11 can also arrange
At 2 rows or 3 rows, pierced pattern 11 can also rounded, triangle or other geometries, between different pierced patterns 11
Shape can be different, the size between different pierced patterns 11 can also be different.
Further, the side edge length that the first bottom edge 30a is connected with clamp area 20 can be identical, is being stretched in this way
When, pulling force can be transmitted in entire transition region 30, convenient for pattern area 10 to be tensioned.
It should be noted that when being stretched, each clamp area 20 can be pressed from both sides by two fixtures 1 of screen-tensioning machine
It holds, and in clamping, the spacing a being clamped between two fixtures 1 of the same clamp area 20 should be greater than the length on the second bottom edge, with
Conducive to tensioning pattern area 10, fold is reduced.
The utility model embodiment between clamp area and pattern area by being arranged transition region, since transition region is trapezoidal,
Clamp area and the longer bottom edge of transition region connect, and the shorter bottom edge of pattern area and transition region connects, in this way by throwing the net
When machine clamps two clamp areas and stretched, the pulling force of the extending direction of the waist along transition region is will produce in transition region, due to
The direction of pulling force and the angle of the length direction in pattern area are more than 0, therefore the pulling force will produce the length side perpendicular to pattern area
To component, to reduce pattern area generate fold possibility, after so mask plate is fabricated to FMM, the fold of FMM is less,
To improve the flatness of FMM.In addition, setting transition region can also slow down in drawing process pattern area along perpendicular to pattern area
Length direction contraction distortion degree, be conducive to the effect for further increasing vapor deposition.
Fig. 2 is the close-up schematic view for the seed mask plate that the utility model embodiment provides, as shown in Fig. 2, mistake
The junction of the waist and pattern area 10 that cross area 30 is provided with knuckle 30c.It was advantageously reduced by the way that knuckle 30c is arranged
The stress concentration for crossing area 30 and 10 junction of pattern area avoids the case where drawing process neutron mask plate is broken.
Illustratively, the radius of knuckle 30c can be 5mm~10mm, and the radius of knuckle 30c can be according to son
The size of mask plate is configured, and the radius of knuckle 30c can be more than in the usual relatively large sub- mask plate of area
The radius of knuckle 30c in relatively small sub- mask plate.
As shown in Fig. 2, the equal length of two waists of transition region 30, i.e. transition region 30 are in isosceles trapezoid.Transition region 30 is set
Pattern area 10 can be made (direction of the power F in Fig. 1 is pattern by the length direction perpendicular to pattern area by being set to isosceles trapezoid
The length direction in area) and two power (i.e. component of the two pulling force T on the length direction perpendicular to pattern area) of direction on the contrary
Effect, be conducive to be further reduced fold.
Readily comprehensible, when sub- mask plate is clamped by screen-tensioning machine, two fixtures 1 for being clamped in same clamp area 20 can
It being symmetrical arranged with the perpendicular bisector of the first bottom edge 30a about transition region 30, the pulling force when stretching on two fixtures 1 is equal, by
It is in isosceles trapezoid in transition region 30, fixture 1, component of two pulling force T on the length direction perpendicular to pattern area is set in this way
Direction is equal in magnitude on the contrary, can make the surface more smooth in pattern area 10, is conducive to the effect for improving vapor deposition.
Obviously, in other embodiments, two waists of transition region 30 can not also be symmetrical, the utility model not as
Limit.
Fig. 3 is the partial structural diagram for another seed mask plate that the utility model embodiment provides, son shown in Fig. 3
The structure of mask plate and the structure of sub- mask plate shown in Fig. 2 are essentially identical, the difference is that, sub- mask plate shown in Fig. 3
In, it is additionally provided with engraved structure in transition region 330.In the present embodiment, engraved structure includes hollow slots 331, and transition region 330 is in
Trapezoidal, in drawing process, the tension of different zones is different in transition region 330, this can make in transition region 330 tension compared with
Small region forms fold (such as fold 2 in Fig. 2), the especially region close to the middle part on the first bottom edge, by transition
A certain number of hollow slots 331 are set in area 330, can be formed fold to avoid in drawing process in transition region 330, made
It crosses area 330 and keeps smooth in drawing process.
It specifically when designing hollow slots 331, can be emulated, be simulated in drawing process, transition region with antithetical phrase mask plate
Tension distribution situation on 330 is arranged hollow slots according to the distribution situation of tension, keeps the tension distribution in transition region 330 more equal
It is even, to reduce the fold in transition region 330.
As an example, the utility model embodiment additionally provides another seed mask plate, structure is as shown in figure 4, hollow out
Structure may include the hollow slots 431 of multiple strips, and the hollow slots 431 of multiple strips are symmetrically arranged in the symmetrical of transition region 430
The extended line of the both sides axis c, the hollow slots 431 of each strip intersects with symmetry axis c.It is arranged multiple using symmetrically arranged mode
The hollow slots 431 of shape are conducive to the fold being further reduced in transition region 430, keep the tension distribution in transition region 430 more equal
Even, transition region 430 is more flat, and the power acted on sub- mask plate ontology 410 can be more symmetrical.The transition region 430 is in isosceles ladder
Shape, symmetry axis c are the perpendicular bisector of the first bottom edge 430a.
Further, each hollow slots 431 extend to the second bottom edge 430b from the first bottom edge 430a.Be conducive in this way into
One step reduces the fold in entire transition region 330.
Further, the intersection point of the extended line of two waists of transition region 430 is located on the extended line of each hollow slots 431,
This makes two waists of transition region 430 and the extended line of hollow slots 431 intersect at a point, the folder of multiple hollow slots 431 and symmetry axis c
Angle gradually increases from symmetry axis c to two waists of transition region 430.When due to stretching, tension at two waists of transition region 430 compared with
Greatly, the tension at symmetry axis c is smaller, and the fold formed in transition region 430 is parallel to the tension direction of fold region,
Closer to two waists of transition region 430, the angle of tension and symmetry axis c is bigger, and setting in this way can be further reduced in transition region 430
Fold.When hollow slots 431 are arranged, the angle between the extended line of two hollow slots 431 of arbitrary neighborhood can be equal.
The ranging from 0 °~β of the angle α of hollow slots 431 and symmetry axis c, wherein β are the waist and symmetry axis c of transition region 430
Angle.
It should be noted that Fig. 4 is merely illustrative, what α was indicated is the angle of hollow slots 431 and symmetry axis c, is not refered in particular to most
Close to the angle of the hollow slots 431 and symmetry axis c of symmetry axis c.
Fig. 5 is the structural schematic diagram for another seed mask plate that the utility model embodiment provides, sub- mask shown in fig. 5
The structure and the structure of sub- mask plate shown in FIG. 1 of version are essentially identical, the difference is that, in sub- mask plate shown in fig. 5, figure
The both ends in case area 510 are additionally provided with deformation buffering area 540.As shown in figure 5, being equipped with deformation between pattern area 510 and transition region 530
Buffering area 540, deformation buffering area 540 is interior to be equipped at least one network 541, and each network 541 is bar shaped, and every
The length direction of a network is parallel with the second bottom edge 530b.Due to being formed with opening for multiple hollow outs in pierced pattern 511
Mouthful, therefore the mechanical strength in pattern area 510 at pierced pattern 511 is lower than the mechanical strength in the region except pierced pattern 511,
It is easier to deform upon at pierced pattern 511, when stretching, the deformation degree of pierced pattern 511 everywhere can be different.Fig. 6 is this
Local state schematic diagram when a kind of sub- mask plate that deformation buffering area not being arranged that utility model embodiment provides stretches, such as schemes
Shown in 6, when stretching, in pierced pattern 511 deformation quantity in the region of closer side 511a and side 511b be less than further away from
The deformation quantity in the region of side 511a and side 511b.Shape so as to cause pierced pattern 511 changes, and influences vapor deposition
Effect.Fig. 7 is local shape when a kind of sub- mask plate being provided with deformation buffering area that the utility model embodiment provides stretches
State schematic diagram is engraved on deformation buffering area 540 equipped with network 541, net as shown in fig. 7, by the way that deformation buffering area 540 is arranged
Lattice structure 541 includes the grid of multiple hollow outs, and in drawing process, the network 541 in deformation buffering area 540 can be sent out
Raw deformation, the deformation quantity at the both ends of network 541 is larger, and the intermediate deformation quantity of network 541 is smaller, can reduce in this way
The deformation quantity in the region of the separate side 511a and side 511b of pierced pattern 511, makes pierced pattern 511 in pattern area 510
Evenly, the shape of pierced pattern 511 is more in line with design requirement for deformation, is conducive to the effect for improving vapor deposition.
Further, the length of network 541 and deformation buffering area 540 on the direction for being parallel to the second bottom edge 530b
Length it is identical.In the pattern area 510 of bar shaped, the tension in the side edge for being parallel to screen-tensioning machine draw direction is larger, this
Sample setting network 541 can reduce the tension at this, keep the tension distribution in pattern area 510 more uniform.
Specifically in designing grid structure 541, the size and density of grid can be according to sub- masks in network 541
When version is emulated, the deformation of simulation drawing process neutron mask plate everywhere is designed, so that keeping identical in pulling force
In the case of, the shape distortion degree of pierced pattern 511 is minimum.
When realization, sub- mask plate can be metalwork, and the thickness in pattern area can be 30-200 μm.
Illustratively, the metal material for making sub- mask plate can be include at least two structures in nickel, molybdenum, chromium, platinum, tin
At alloy, the alloy being made of at least two in nickel, molybdenum, chromium, platinum, tin has lower coefficient of thermal expansion, steaming in this way
Plating process neutron mask plate larger deformation will not occur since temperature is higher, be conducive to the effect for improving vapor deposition.It is making
When, pattern area, clamp area, transition region and deformation buffering area mentioned in the utility model embodiment can use identical
Metal material is made.
Fig. 8 is a kind of structural schematic diagram for mask plate that the utility model embodiment provides, as shown in figure 8, the mask plate
Including mask plate frame 801 and the multiple sub- mask plates 802 being fixed on mask plate frame 801, wherein multiple sub- mask plates
At least one of 802 be any seed mask plate shown in Fig. 1~Fig. 5.
The utility model embodiment between clamp area and pattern area by being arranged transition region, since transition region is trapezoidal,
Clamp area and the longer bottom edge of transition region connect, and the shorter bottom edge of pattern area and transition region connects, in this way by throwing the net
When machine clamps two clamp areas and stretched, the pulling force of the extending direction of the waist along transition region is will produce in transition region, due to
The direction of pulling force and the angle of the length direction in pattern area are more than 0, therefore the pulling force will produce the length side perpendicular to pattern area
To component, to reduce pattern area generate fold possibility, after so mask plate is fabricated to FMM, the fold of FMM is less,
To improve the flatness of FMM.In addition, setting transition region can also slow down in drawing process pattern area along perpendicular to pattern area
Length direction contraction distortion degree, be conducive to the effect for further increasing vapor deposition.
When being deposited, sub- mask plate 802 can be stretched through screen-tensioning machine, it, will after 802 stretching and leveling of sub- mask plate
Sub- mask plate 802 is welded on mask plate frame 801, and the quantity of sub- mask plate 802 can be according to the big of the region to be deposited
It is small to be configured, after all sub- mask plates 802 are arranged one by one onto mask plate frame 801, you can the correlation being deposited
Technical process.
The above is only the preferred embodiment of the present invention, is not intended to limit the utility model, all in this practicality
Within novel spirit and principle, any modification, equivalent replacement, improvement and so on should be included in the guarantor of the utility model
Within the scope of shield.
Claims (10)
1. a seed mask plate, the sub- mask plate includes pattern area and two clamp areas, and described two clamp areas are located at
The opposite both sides in the pattern area, which is characterized in that set between at least one of the pattern area and described two clamp areas
There is trapezoidal transition region, the first bottom edge of the transition region to be connect with the clamp area, the second bottom edge of the transition region with
The pattern area connection, first bottom edge are the longer bottom edge of the transition region, and second bottom edge is the transition region
Shorter bottom edge.
2. sub- mask plate according to claim 1, which is characterized in that the connection of the waist of the transition region and the pattern area
Place is provided with knuckle.
3. sub- mask plate according to claim 1, which is characterized in that the equal length of two waists of the transition region.
4. sub- mask plate according to claim 3, which is characterized in that be provided with engraved structure in the transition region.
5. sub- mask plate according to claim 4, which is characterized in that the engraved structure includes the hollow out of multiple strips
The hollow slots of slot, the multiple strip are symmetrically arranged in the symmetry axis both sides of the transition region, the hollow slots of each strip
Extended line intersect with the symmetry axis.
6. sub- mask plate according to claim 5, which is characterized in that each hollow slots are prolonged from first bottom edge
Extend to second bottom edge.
7. sub- mask plate according to claim 6, which is characterized in that the intersection point position of the extended line of two waists of the transition region
In on the extended line of each hollow slots.
8. according to the sub- mask plate of claim 1~7 any one of them, which is characterized in that the pattern area and the transition region
Between be equipped with deformation buffering area, at least one network is equipped in the deformation buffering area, each network is
Bar shaped, and the length direction of each network is parallel with second bottom edge.
9. sub- mask plate according to claim 8, which is characterized in that described on the direction for being parallel to second bottom edge
The length of network is identical as the length of deformation buffering area.
10. a kind of mask plate, which is characterized in that the mask plate includes mask plate frame and is fixed on the mask plate frame
Multiple sub- mask plates, wherein at least one of the multiple sub- mask plate is such as claim 1~9 any one of them
Sub- mask plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820003884.XU CN207775334U (en) | 2018-01-02 | 2018-01-02 | Sub- mask plate and mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820003884.XU CN207775334U (en) | 2018-01-02 | 2018-01-02 | Sub- mask plate and mask plate |
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| Publication Number | Publication Date |
|---|---|
| CN207775334U true CN207775334U (en) | 2018-08-28 |
Family
ID=63223312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820003884.XU Active CN207775334U (en) | 2018-01-02 | 2018-01-02 | Sub- mask plate and mask plate |
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| Country | Link |
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| CN (1) | CN207775334U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110129723A (en) * | 2019-06-27 | 2019-08-16 | 京东方科技集团股份有限公司 | Metal mask item, exposure mask plate framework, metal mask plate and its welding method |
| CN110348134A (en) * | 2019-07-15 | 2019-10-18 | 京东方科技集团股份有限公司 | A kind of design method and device of fine metal mask plate |
| CN111172495A (en) * | 2020-01-22 | 2020-05-19 | 京东方科技集团股份有限公司 | Mask plate, preparation method thereof and mask plate assembly |
| WO2021036372A1 (en) * | 2019-08-28 | 2021-03-04 | 京东方科技集团股份有限公司 | Mask plate, mask device and design method for mask plate |
-
2018
- 2018-01-02 CN CN201820003884.XU patent/CN207775334U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110129723A (en) * | 2019-06-27 | 2019-08-16 | 京东方科技集团股份有限公司 | Metal mask item, exposure mask plate framework, metal mask plate and its welding method |
| US11572616B2 (en) | 2019-06-27 | 2023-02-07 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Mask strip, mask plate frame, mask plate and welding method thereof |
| CN110348134A (en) * | 2019-07-15 | 2019-10-18 | 京东方科技集团股份有限公司 | A kind of design method and device of fine metal mask plate |
| WO2021036372A1 (en) * | 2019-08-28 | 2021-03-04 | 京东方科技集团股份有限公司 | Mask plate, mask device and design method for mask plate |
| CN111172495A (en) * | 2020-01-22 | 2020-05-19 | 京东方科技集团股份有限公司 | Mask plate, preparation method thereof and mask plate assembly |
| WO2021147705A1 (en) * | 2020-01-22 | 2021-07-29 | 京东方科技集团股份有限公司 | Mask plate and preparation method therefor, and mask plat assembly |
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