CN207765415U - A kind of high yield energy chain type transmission vacuum etching and filming equipment - Google Patents
A kind of high yield energy chain type transmission vacuum etching and filming equipment Download PDFInfo
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- CN207765415U CN207765415U CN201820100608.5U CN201820100608U CN207765415U CN 207765415 U CN207765415 U CN 207765415U CN 201820100608 U CN201820100608 U CN 201820100608U CN 207765415 U CN207765415 U CN 207765415U
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Abstract
Include loading chamaer, cushion chamber one, process cavity, cushion chamber two and the unloading chamber set gradually by process sequence the utility model discloses a kind of high yield energy chain type transmission vacuum etching and filming equipment；Loading chamaer, process cavity and unloading chamber are correspondingly arranged on loading pump, technique pump and de-ballast pump by pump conduit respectively；Support plate lifting body is respectively set in loading chamaer and unloading chamber, the support plate lifting body of loading chamaer is used to pass in and out while two pieces of untreated support plates, for being passed in and out while support plate after two pieces of processing, support plate is conveyed between loading chamaer, cushion chamber one, process cavity, cushion chamber two and unloading chamber by chain type roller the support plate lifting body of unloading chamber.As a result of support plate lifting body so that loading chamaer and unloading chamber can once pass in and out two pieces of support plates, therefore greatly improve the production capacity of equipment and greatly reduce energy consumption due to reducing the frequency of backfill gas.
Description
Technical field
The utility model is related to silicon chip of solar cell production technical field, more particularly to a kind of high yield energy chain type transmission is true
Sky etching and filming equipment.
Background technology
It is transmitted in vacuum coating or etching technics equipment in chain type, to improve productive temp, general device needs to be equipped with dress
Carry chamber（Sample cavity）, process cavity and unloading chamber（Go out sample chamber）Three chambers, material to be processed is realized by loading and unloading chamber
It is docked under vacuum conditions with process cavity, makes full use of process cavity, improve efficiency and save energy consumption.
With reference to figure 1 and 2, it includes loading chamaer 11, buffering that conventional chain type, which transmits vacuum coating or etching technics equipment successively,
Chamber 1, process cavity 21, cushion chamber 2 52 and unloading chamber 31, loading chamaer 11 are singly connected with loading pump 12 by pump conduit 13,
Process cavity 21 is singly connected with technique pump 22 by pump conduit 23, and unloading chamber 31 is singly connected with de-ballast pump by pump conduit 33
32, cushion chamber 1, process cavity 21 and cushion chamber 2 52 are to be connected to the chamber of one and under the action of technique pump 22 when work
Vacuum state is constantly in ensure that etching or coating process are normally carried out in process cavity 21.
But a packaged support plate 41 for being loaded with silicon chip manually or mechanically can only be put into loading chamaer 11 by hand by usual manner every time
The entrance of rear enclosed loading chamaer 11, at this time the entrance of cushion chamber 1 be in closed state, then bootload pump 12 pairs be in
The loading chamaer 11 of closed state is vacuumized, and then opens the entrance of cushion chamber 1 and loading chamaer 11 is made to connect with cushion chamber 1
Logical to be simultaneously in vacuum state simultaneously, then the support plate 41 unloaded in chamber 11 is delivered under the action of chain type roller 61 by loading chamaer 11
Cushion chamber 1 is simultaneously further delivered to the progress plated film of process cavity 21 or etching processing, then passes through the load of plated film or etching processing
Plate 41 continues on to cushion chamber 2 52 under the drive of chain type roller 61, and the outlet of cushion chamber 2 52 at this time is in closed
State, and unload at this time chamber 31 outlet close and vacuumized under the action of de-ballast pump 32, the support plate 41 in cushion chamber 2 52 by
Chain type roller 61 is delivered to the unloading chamber 31 in vacuum state Nei and closes the outlet of cushion chamber 2 52, then opens unloading chamber
31 outlet can support plate 41 unloads by treated.
Since the loading chamaer 11 and unloading chamber 31 of usual manner once can only pass in and out one piece of support plate 41 by chain type roller 61,
And plated film or etching technics have higher treatment effeciency, thus conventional each one piece of disengaging in the process cavity 21 of the prior art
Support plate 51 is difficult to meet the plated film of the prior art or etching technics processing speed, relatively low so as to cause equipment capacity；Moreover, loading
Chamber 11 and unloading chamber 31 are required to open entrance after one piece of support plate 41 of disengaging to be fed again and discharging every time, the process
It needs that loading pump 12 or each disengaging support plate 41 of de-ballast pump 32 are required to carry out air backfill and then vacuumized again, and so on
Air backfill and vacuum naturally there are huge energy consumptions.
Utility model content
In order to solve the above technical problems, the utility model provides a kind of high yield energy chain type transmission vacuum etching and plated film is set
It is standby, including：
Loading chamaer, cushion chamber one, process cavity, cushion chamber two and the unloading chamber set gradually by process sequence, the loading
Vacuum partition board one able to turn on or off is provided between chamber and cushion chamber one, the cushion chamber one, process cavity and cushion chamber two are connection
Chamber, the cushion chamber two and unloading chamber between be provided with vacuum partition board two able to turn on or off；
The loading chamaer is correspondingly arranged on loading pump by pump conduit, and the process cavity is correspondingly arranged on work by pump conduit
Skill pumps, and the unloading chamber is correspondingly arranged on de-ballast pump by pump conduit；
The loading chamaer and unloading chamber are correspondingly arranged on support plate lifting body, the support plate lifting body of the loading chamaer respectively
Including lifting platform for one of support plate jacking by the loading chamaer is entered to realize in the loading chamaer while enter
Two pieces of support plates, the support plate lifting body of the unloading chamber include lifting platform for that will enter one of load of the unloading chamber
Plate jacking is to realize the unloading intracavitary while enter two pieces of support plates, and the support plate is in the loading chamaer, cushion chamber one, technique
It is conveyed by chain type roller between chamber, cushion chamber two and unloading chamber.
Further, in order to realize more energy saving and drop this, the loading pump and de-ballast pump are shared true for same
Sky pump, the shared vacuum pump control the loading chamaer and unloading chamber by pump conduit simultaneously, and by controlling the load
Plate passes in and out the loading chamaer and unloads the beat of chamber and flow and make full use of the vacuum pump work interval time to realize one
A vacuum pump serves the loading chamaer and unloading chamber simultaneously；And when equipment since the loading chamaer and unloading occurs in failure
When chamber beat is interfered, the unloading chamber priority task is controlled to ensure that apparatus and process is smooth, to make equipment restore by program
To normal productive temp；The pump line branch that the pump conduit of vacuum pump is divided into two-way parallel connection is respectively connected to the loading chamaer and unloads
Chamber is carried, and setting valve alternately controls the loading chamaer and unloading to realize on the pump line branch road of the loading chamaer and unloading chamber
Chamber is vacuumized.
Further, it in order to realize drop originally and save floor occupying area, is both provided in the cushion chamber one and cushion chamber two
Support plate lifting body in the support plate lifting body, the cushion chamber one and cushion chamber two includes lifting platform for will be into
Enter one cushion chamber two of the cushion chamber one of support plate jack with realize in the cushion chamber one and cushion chamber two simultaneously into
Enter two pieces of support plates.
Through the above technical solutions, the utility model has the following advantages that：
（1）Due to using support plate lifting body in loading chamaer and unloading chamber so that loading chamaer and unloading chamber once can be with
Two pieces of support plates of disengaging and greatly improve the production capacity of equipment, and every time two pieces of support plates of disengaging and reduce corresponding loading chamaer and unloading
The frequency of chamber backfill gas and the energy consumption for vacuumizing generation；
（2）Due to toilet's construction and higher operating costs, control loading chamaer and unloading chamber are coordinated by a vacuum pump,
The manufacturing expense, hardware controls device input and space of a vacuum pump, and a vacuum pump standby mode can be saved
Under energy consumption be about 30-40% under normal operating conditions energy consumption, therefore pass through vacuum pump and coordinate control loading chamaer and unloading
Chamber and the standby energy consumption for greatly reducing vacuum pump；
（3）In order to coordinate loading chamaer and unloading chamber that can pass in and out two pieces of support plates simultaneously, needed cushion chamber under conventional sense
One and the length doubles of cushion chamber two passed in and out while two pieces of support plates with meeting, therefore, in cushion chamber one and cushion chamber two
Support plate lifting body is set simultaneously, to reduce device length and save space while meeting raising production capacity.
Description of the drawings
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Or attached drawing needed to be used in the description of the prior art is briefly described.
Fig. 1 and 2 is that the chain type of the prior art transmits the vertical view and side structure schematic view of vacuum etching and filming equipment；
Fig. 3 and 4 is that support plate lifting body is arranged simultaneously in loading chamaer and unloading chamber disclosed in the utility model embodiment
A kind of high yield energy chain type transmission vacuum etching and filming equipment vertical view and side structure schematic view；
Fig. 5 is a kind of high production capacity of the loading chamaer and the shared vacuum pump of unloading chamber disclosed in the utility model embodiment
Chain type transmits the side structure schematic view of vacuum etching and filming equipment；
Fig. 6 is being set simultaneously in loading chamaer, cushion chamber one, cushion chamber two and unloading chamber disclosed in the utility model embodiment
Set the side structure schematic view of a kind of high yield energy chain type transmission the vacuum etching and filming equipment of support plate lifting body.
Digital representation in figure：
11. 12. loading pump of loading chamaer, 13. pump conduit
21. 22. technique of process cavity pumps 23. pump conduits
31. unloading 32. de-ballast pump of chamber, 33. pump conduit
41. 51. cushion chamber of support plate, one 52. cushion chamber two
61. 71. vacuum pump of chain type roller, 72. pump conduit
73. don't pipe branch
Specific implementation mode
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe.
Embodiment one：
With reference to figure 3 and 4, a kind of high yield energy chain type transmission vacuum etching and filming equipment, including：It is set successively by process sequence
The loading chamaer 11 set, cushion chamber 1, process cavity 21, cushion chamber 2 52 and unloading chamber 31, loading chamaer 11 and cushion chamber 1 it
Between be provided with vacuum partition board one able to turn on or off, cushion chamber 1, process cavity 21 and cushion chamber 2 52 are the chamber of connection, cushion chamber
It is provided with vacuum partition board two able to turn on or off between 2 52 and unloading chamber 31；Loading chamaer 11 is correspondingly arranged on loading by pump conduit 13
Pump 12, process cavity 21 are correspondingly arranged on technique pump 22 by pump conduit 23, and unloading chamber 31 is correspondingly arranged on by pump conduit 33 to be unloaded
Carry pump 32；Loading chamaer 11 and unloading chamber 31 are correspondingly arranged on support plate lifting body, the support plate lifting body packet of loading chamaer 11 respectively
Lifting platform is included for jacking the one of support plate 41 for entering loading chamaer 11 to realize in loading chamaer 11 while enter two pieces
The support plate lifting body of support plate 41, unloading chamber 31 includes that lifting platform pushes up for will enter the one of support plate 41 for unloading chamber 31
Rise with realize unloading chamber 31 in simultaneously enter two pieces of support plates 41, support plate 41 loading chamaer 11, cushion chamber 1, process cavity 21, delay
It rushes between chamber 2 52 and unloading chamber 31 and is conveyed by chain type roller 61.
Embodiment two：
Further, in order to realize more energy saving and drop this, based on embodiment together with reference to figure 5, loading pump 12 with unload
It is same shared vacuum pump 71 to carry pump 32, which controls loading chamaer 11 simultaneously by pump conduit 72 and unload
Chamber 31 is carried, the pump conduit 72 of vacuum pump 71 divides the pump line branch 73 for two-way parallel connection to be respectively connected to loading chamaer 11 and unloading chamber
31, and valve is set to realize alternately control loading chamaer 11 and unload chamber on the pump line branch 73 of loading chamaer 11 and unloading chamber 31
31 are vacuumized, to pass in and out loading chamaer 11 by controlling support plate 41 and unload the beat of chamber 31 and flow and make full use of true
The sky 71 work interval times of pump are to realize a vacuum pump 71 while serve loading chamaer 11 and unloading chamber 31；And when equipment due to
When loading chamaer 11 and unloading 31 beat of chamber interference occurs in failure, unloading 31 priority task of chamber is controlled to ensure equipment work by program
Skill is smooth, to make equipment be restored to normal productive temp.
Embodiment three：
Further, in order to realize drop this and save floor occupying area, based on embodiment one or two and with reference to figure 6, cushion chamber
1 and cushion chamber 2 52 in be both provided with support plate lifting body, the support plate lifting body in cushion chamber 1 and cushion chamber 2 52
Include lifting platform for by enter one 51 cushion chamber 2 52 of cushion chamber one of support plate 41 jack to realize cushion chamber
1 and cushion chamber 2 52 in simultaneously enter two pieces of support plates 41.
With reference to figure 4-6, below to be correspondingly arranged in loading chamaer 11, cushion chamber 1, cushion chamber 2 52 and unloading chamber 31
Have support plate lifting body and loading chamaer 11 and unloading chamber 31 share same vacuum pump 71 for, illustrate the utility model
Operation principle：
When work, cushion chamber 1, process cavity 21 and cushion chamber 2 52 that chamber is integrated are in closed state, i.e.,
Vacuum partition board two between loading chamaer 11 and cushion chamber 1 between vacuum partition board one and cushion chamber 2 52 and unloading chamber 31 is located
In closed state, cushion chamber 1, process cavity 21 and cushion chamber 2 52 is set to locate always so as to be vacuumized by technique pump 22
It is performed etching or coating film treatment in vacuum state and to the support plate 41 for entering process cavity 21；
Meanwhile one piece of support plate 41 is put on the chain type roller 61 of loading chamaer 11 and by support plate top by artificial or machine
The lifting platform for rising mechanism jacks the support plate 41 to certain altitude, is then put into second piece on the chain type roller 61 of corresponding position
Support plate 41 is then shut off the support plate entrance of loading chamaer 11, then by the valve transfer of corresponding pump line branch to being mounted with two
The loading chamaer 11 of block support plate 41 is vacuumized；
Then, it after loading chamaer 11 is consistent with the vacuum degree of process cavity 21, opens between loading chamaer 11 and cushion chamber 1
Vacuum partition board one so that loading chamaer 11 is connected to cushion chamber 1, then chain type roller 61 starts and will be located at chain in loading chamaer 11
Support plate 41 on formula roller 61 be delivered to cushion chamber 1 and contained by cushion chamber 1 plate lifting machine structure lifting platform jack to
Certain altitude, then the lifting platform decline of 11 support plate lifting body of loading chamaer is falling another piece of support plate 41 on chain type roller 61
And be delivered to the lower section of corresponding upper 41 position of a support plate in cushion chamber 1, then it closes between loading chamaer 11 and cushion chamber 1
Vacuum partition board opens the support plate entrance of loading chamaer 11 to repeat above-mentioned 41 loading process of support plate together；
Then, after the vacuum partition board one between loading chamaer 11 and cushion chamber 1 is closed, being located in cushion chamber 1
Support plate 41 on chain type roller 61 is delivered to process cavity 21 by chain type roller 61 and performs etching or coating film treatment, meanwhile, it is located at slow
The support plate 41 that rushes on the lifting platform of one 51 support plate lifting body of chamber declines and falls on chain type roller 61, and second piece of support plate 41 with
First piece of support plate 41 is end to end to be performed etching to process cavity 21 by 61 continuous conveying of chain type roller or coating film treatment；
Then, first piece of support plate 41 after the etching of process cavity 21 or coating film treatment is delivered to cushion chamber through chain type roller 61
Certain altitude, and the after the etching of process cavity 21 or coating film treatment are jacked by the support plate lifting body of cushion chamber 2 52 after 2 52
Two pieces of support plates 41 continuously enter cushion chamber 2 52 and are delivered to positioned at first piece of 41 lower section of the support plate jacked；
Then, when loading chamaer 11 loads gap by between the unloading chamber 31 vacuumized of vacuum pump 71 and cushion chamber 2 52
Vacuum partition board two open, then enter cushion chamber 2 52 be located at chain type roller 61 on second piece of support plate 41 be delivered to unloading chamber
31 and certain altitude is jacked by the lifting platform of support plate lifting body, meanwhile, it is located on support plate lifting body in cushion chamber 2 52
Support plate 41 decline and fall on chain type roller 61 and be transported in unloading chamber 31, be then shut off unloading chamber 31 and cushion chamber 2 52
Between vacuum partition board two；
Then, the support plate outlet for opening unloading chamber 31, the support plate 41 on chain type roller 61 first exported and unloaded,
The support plate 41 on support plate lifting body is declined and fallen again and exports and unloads on chain type roller 61, is back to back as a result,
Two pieces of support plates 41 complete whole technical process and enter subsequent handling；
The continuous simultaneously repetitive operation of the above process, to realize high production capacity, low energy consumption, the etching of low cost or the plated film of support plate
Processing.
The foregoing description of the disclosed embodiments enables professional and technical personnel in the field to realize or use this practicality new
Type.A variety of modifications of above-described embodiment will be apparent to those skilled in the art, determine herein
The General Principle of justice can be realized in other embodiments without departing from the spirit or scope of the present utility model.Cause
This, the utility model is not intended to be limited to the embodiments shown herein, and is to fit to and principles disclosed herein
The widest range consistent with features of novelty.
Claims (4)
1. a kind of high yield energy chain type transmission vacuum etching and filming equipment, which is characterized in that including：
The loading chamaer that is set gradually by process sequence, cushion chamber one, process cavity, cushion chamber two and unloading chamber, the loading chamaer with
Vacuum partition board one able to turn on or off is provided between cushion chamber one, the cushion chamber one, process cavity and cushion chamber two are the chamber of connection
Room is provided with vacuum partition board two able to turn on or off between the cushion chamber two and unloading chamber；
The loading chamaer is correspondingly arranged on loading pump by pump conduit, and the process cavity is correspondingly arranged on technique by pump conduit
Pump, the unloading chamber are correspondingly arranged on de-ballast pump by pump conduit；
The loading chamaer and unloading chamber are correspondingly arranged on support plate lifting body respectively, and the support plate lifting body of the loading chamaer includes
Lifting platform is for jacking the one of support plate for entering the loading chamaer to realize in the loading chamaer simultaneously into two pieces
Support plate, the support plate lifting body of the unloading chamber include lifting platform for that will enter one of support plate top of the unloading chamber
Rise to realize the unloading intracavitary simultaneously into two pieces of support plates, the support plate in the loading chamaer, cushion chamber one, process cavity, delay
It rushes between chamber two and unloading chamber and is conveyed by chain type roller.
2. a kind of high yield energy chain type transmission vacuum etching according to claim 1 and filming equipment, which is characterized in that described
Loading pump is same shared vacuum pump with de-ballast pump, which controls the dress simultaneously by pump conduit
It carries chamber and unloading chamber, and passes in and out the loading chamaer by controlling the support plate and unload the beat of chamber and flow and make full use of institute
The vacuum pump work interval time is stated to realize a vacuum pump while serve the loading chamaer and unloading chamber；And work as equipment
When there is the loading chamaer and unloading chamber beat interference due to failure, the unloading chamber priority task is controlled to ensure by program
Apparatus and process is smooth, to make equipment be restored to normal productive temp.
3. a kind of high yield energy chain type transmission vacuum etching according to claim 2 and filming equipment, which is characterized in that described
The pump line branch that the pump conduit of vacuum pump is divided into two-way parallel connection is respectively connected to the loading chamaer and unloading chamber, and in the loading
Valve is arranged to realize that alternately control the loading chamaer is vacuumized with unloading chamber in chamber and the pump line branch road for unloading chamber.
4. according to a kind of high yield energy chain type transmission vacuum etching of claim 1-3 any one of them and filming equipment, feature
It is, the support plate lifting body, the cushion chamber one and cushion chamber two is both provided in the cushion chamber one and cushion chamber two
Interior support plate lifting body includes lifting platform for will enter one of support plate top of one cushion chamber two of the cushion chamber
It rises to realize in the cushion chamber one and cushion chamber two while enter two pieces of support plates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820100608.5U CN207765415U (en) | 2018-01-19 | 2018-01-19 | A kind of high yield energy chain type transmission vacuum etching and filming equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820100608.5U CN207765415U (en) | 2018-01-19 | 2018-01-19 | A kind of high yield energy chain type transmission vacuum etching and filming equipment |
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| Publication Number | Publication Date |
|---|---|
| CN207765415U true CN207765415U (en) | 2018-08-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820100608.5U Active CN207765415U (en) | 2018-01-19 | 2018-01-19 | A kind of high yield energy chain type transmission vacuum etching and filming equipment |
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| CN (1) | CN207765415U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111485229A (en) * | 2020-05-28 | 2020-08-04 | 深圳市捷佳伟创新能源装备股份有限公司 | Battery piece coating equipment and battery piece coating method |
-
2018
- 2018-01-19 CN CN201820100608.5U patent/CN207765415U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111485229A (en) * | 2020-05-28 | 2020-08-04 | 深圳市捷佳伟创新能源装备股份有限公司 | Battery piece coating equipment and battery piece coating method |
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