CN207757439U - Wandering star wheel assembly and its burnishing device - Google Patents

Wandering star wheel assembly and its burnishing device Download PDF

Info

Publication number
CN207757439U
CN207757439U CN201721773581.8U CN201721773581U CN207757439U CN 207757439 U CN207757439 U CN 207757439U CN 201721773581 U CN201721773581 U CN 201721773581U CN 207757439 U CN207757439 U CN 207757439U
Authority
CN
China
Prior art keywords
star wheel
polished part
protrusion
erratic star
erratic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201721773581.8U
Other languages
Chinese (zh)
Inventor
冯光建
夏秋良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Meguiar (Suzhou) semiconductor technology Co.,Ltd.
Original Assignee
Suzhou Nanosecond Science And Technology Co Ltd Of New Micron Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Nanosecond Science And Technology Co Ltd Of New Micron Technology filed Critical Suzhou Nanosecond Science And Technology Co Ltd Of New Micron Technology
Priority to CN201721773581.8U priority Critical patent/CN207757439U/en
Application granted granted Critical
Publication of CN207757439U publication Critical patent/CN207757439U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The utility model provides a kind of wandering star wheel assembly and its burnishing device, it is related to technical field of semiconductors, during the existing polishing process of solution, the outer surface of workpiece to be added is also polished under the extruding of polishing fluid and erratic star wheel inner wall so that the problem of original appearance of polished part or the outer surface pattern of polished part are destroyed and design.It is related to a kind of wandering star wheel assembly, including:There is trepanning, the inner peripheral surface of erratic star wheel to be equipped with drive mechanism for erratic star wheel, erratic star wheel, and drive mechanism is in contact with the outer circumference surface of polished part, and the outer circumference surface for protecting polished part.A kind of burnishing device is further related to, including:Above-mentioned wandering star wheel assembly.The wandering star wheel assembly and its burnishing device can protect the outer circumference surface of polished part not squeezed by the inner peripheral surface of erratic star wheel so that the outer circumference surface pattern of the original appearance of polished part or polished part is not destroyed.

Description

Wandering star wheel assembly and its burnishing device
Technical field
The utility model is related to technical field of semiconductors, more particularly, to a kind of wandering star wheel assembly and its burnishing device.
Background technology
Chemically mechanical polishing (CMP) technology is one of the key technology of semiconductor material surface processing, in large scale bare crystalline It is used widely in circle and silicon member processing of surface polishing.The process of chemically mechanical polishing mainly passes through polishing pad, polishing fluid Effect with selected chemical reagent is from chip or the process of silicon member remove materials.
For double throwing machines, the two sides to process semiconductor crystal wafer and silicon member simultaneously will will be to be processed with erratic star wheel Component is fixed between the disk up and down of polishing machine, and upper and lower disk all posts polishing cloth, and polishing fluid is polished above to flow in disk Get off, two disks apply pressure to chip and secure the wafer among disk, and erratic star wheel, which can then rotate, drives chip in disk Between rotate, while two deep bids in the same direction or reversely rotate, and then achieve the purpose that polishing.
But in double throwing machine polishing process, the outer surface of workpiece to be added inside erratic star wheel because will rotate, with throwing Light liquid flows down along the surface of workpiece, and the outer surface of workpiece to be added is also thrown under the extruding of polishing fluid and erratic star wheel inner wall Light, this is for needing for the requirement for keeping polished part original appearance or try not to influence the polished part outer surface pattern to be extremely Unfavorable.
Utility model content
The first of the utility model is designed to provide a kind of polishing assembly, existing in the prior art existing to solve During polishing process, the outer surface of workpiece to be added is also polished under the extruding of polishing fluid and erratic star wheel inner wall so that polishing The technical issues of original appearance of part or the outer surface pattern of polished part are destroyed.
Wandering star wheel assembly provided by the utility model, including:Erratic star wheel, the erratic star wheel have trepanning, the erratic star wheel Inner peripheral surface be equipped with drive mechanism, the drive mechanism is in contact with the outer circumference surface of polished part, and is used to protect to wait throwing The outer circumference surface of light part.
Further, the drive mechanism includes the multiple protrusions being arranged in the inner peripheral surface of the erratic star wheel, each described Protrusion is disposed radially inwardly along the erratic star wheel.
Further, the drive mechanism includes the middle circle being arranged in the inner peripheral surface of the erratic star wheel, in described Between the outer circumference surface of annulus be in contact with the inner peripheral surface of the erratic star wheel.
Further, the inner peripheral surface of the middle circle is equipped with multiple protrusions, and each protrusion is along the middle circle Ring is disposed radially inwardly.
Further, the protrusion is located on the erratic star wheel, and the protrusion is identical with the material of the erratic star wheel, the two It is integrally formed.
Either, the protrusion is different with the material of the erratic star wheel, and the protrusion and the erratic star wheel are using detachable Formula is fixedly connected.
The protrusion is located on the middle circle, and the protrusion is identical with the material of the middle circle, the two one Molding.
Either, the protrusion is different with the material of the middle circle, and the protrusion is used with the middle circle can It is detachably fixed connection.
Further, along the axis direction of polished part, the thickness of each protrusion is not more than the thickness of the erratic star wheel.
Further, along the axis direction of polished part, the protrusion be from top to bottom disposed with it is multigroup, wherein each Group includes multiple protrusions.
Further, the cross-sectional shape of the protrusion is using any one of circle, semicircle, triangle, rectangular.
Further, the protrusion uses the structure type of idler wheel, the axis of the axis direction of the idler wheel and polished part Line is parallel, and the idler wheel is articulated on the inner peripheral surface of the erratic star wheel.
The advantageous effect of wandering star wheel assembly provided by the utility model:
In the wandering star wheel assembly, the inner peripheral surface of erratic star wheel is additionally arranged drive mechanism, since the drive mechanism treats throwing The outer circumference surface of light part plays a certain protective role, thus the outer circumference surface of polished part can not by or it is few by the shadow polished It rings, compared with prior art, the peripheral surface of the drive mechanism is in contact with the inner peripheral surface of erratic star wheel, the inner peripheral surface of drive mechanism It is in contact with the outer circumference surface of polished part, the outer circumference surface for avoiding polished part directly connects with the inner peripheral surface of erratic star wheel It touches, thus, which can protect the outer circumference surface of polished part not squeezed by the inner peripheral surface of erratic star wheel (inner wall), So that the outer circumference surface pattern of the original appearance of polished part or polished part is not destroyed.
The second of the utility model is designed to provide a kind of burnishing device, existing in the prior art existing to solve During polishing process, the outer surface of workpiece to be added is also polished under the extruding of polishing fluid and erratic star wheel inner wall so that polishing The technical issues of original appearance of part or the outer surface pattern of polished part are destroyed.
Burnishing device provided by the utility model, including:Above-mentioned wandering star wheel assembly.
The advantageous effect of burnishing device provided by the utility model:
Above-mentioned wandering star wheel assembly is set in the burnishing device, wherein the concrete structure of the wandering star wheel assembly, connection are closed System and advantageous effect etc. are described in detail in above-mentioned word, and details are not described herein.
Description of the drawings
It, below will be right in order to illustrate more clearly of specific embodiment of the present invention or technical solution in the prior art Specific implementation mode or attached drawing needed to be used in the description of the prior art are briefly described, it should be apparent that, it is described below In attached drawing be that some embodiments of the utility model are not paying creativeness for those of ordinary skill in the art Under the premise of labour, other attached drawings are can also be obtained according to these attached drawings.
Fig. 1 is that a kind of structure of wandering star wheel assembly provided in this embodiment and the connection structure of polished part when in use are illustrated Figure;
Fig. 2 is that another structure of wandering star wheel assembly provided in this embodiment and the connection structure of polished part when in use are illustrated Figure;
Fig. 3 is that the another structure of wandering star wheel assembly provided in this embodiment and the connection structure of polished part when in use are illustrated Figure;
Fig. 4 is the transverse sectional view of Fig. 1;
Fig. 5 is another structural schematic diagram of Fig. 4.
Icon:100- erratic star wheels;200- polished parts;300- protrusions;400- middle circles.
Specific implementation mode
The technical solution of the utility model is clearly and completely described below in conjunction with attached drawing, it is clear that described Embodiment is the utility model a part of the embodiment, instead of all the embodiments.Based on the embodiments of the present invention, originally All other embodiment that field those of ordinary skill is obtained without making creative work, belongs to this practicality Novel protected range.
It is in the description of the present invention, it should be noted that term "center", "upper", "lower", "left", "right", " perpendicular Directly ", the orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" is to be based on the orientation or positional relationship shown in the drawings, and is only The utility model and simplifying describes for ease of description, do not indicate or imply the indicated mechanism or element must have it is specific Orientation, with specific azimuth configuration and operation, therefore should not be understood as limiting the present invention.In addition, term " the One ", " second ", " third " are used for description purposes only, and are not understood to indicate or imply relative importance.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " is pacified Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally Connection;It can be mechanical connection, can also be electrical connection;Can be directly connected, can also indirectly connected through an intermediary, It can be the connection inside two elements.For the ordinary skill in the art, it can understand above-mentioned art with concrete condition The concrete meaning of language in the present invention.
Embodiment
As shown in Figures 1 to 5, a kind of wandering star wheel assembly is present embodiments provided, including:Erratic star wheel 100, erratic star wheel 100 With trepanning, the inner peripheral surface of erratic star wheel 100 is equipped with drive mechanism, and drive mechanism connects with the outer circumference surface of polished part 200 It touches, and drive mechanism is used to protect the outer circumference surface of polished part 200.
It should be noted that:
1, " trepanning " mentioned above is circular hole.
2, " outer circumference surface for protecting polished part 200 " mentioned above refers to, by above-mentioned drive mechanism to throwing The outer circumference surface (outer circumference surface of polished part 200 is the face without polishing) of light part 200 plays the role of protection so that polishing The outer circumference surface of part 200 is not polished or reduces polishing.
In the wandering star wheel assembly, the inner peripheral surface of erratic star wheel 100 is additionally arranged drive mechanism, since the drive mechanism is treated The outer circumference surface of polished part 200 plays a certain protective role, thus the outer circumference surface of polished part 200 can not by or it is few by The influence of polishing, compared with prior art, the peripheral surface of the drive mechanism are in contact with the inner peripheral surface of erratic star wheel 100, transmission The inner peripheral surface of structure is in contact with the outer circumference surface of polished part 200, avoid the outer circumference surface of polished part 200 directly with trip The inner peripheral surface of star-wheel 100 is in contact, thus, which can protect the outer circumference surface of polished part 200 not swum The inner peripheral surface (inner wall) of star-wheel 100 squeezes so that the original appearance of polished part 200 or the outer circumference surface shape of polished part 200 Looks are not destroyed.
In some embodiments, the concrete form of drive mechanism can there are many, be not limited to following several.
As shown in Figure 1, drive mechanism include be arranged erratic star wheel 100 inner peripheral surface multiple raised 300, each protrusion 300 being disposed radially inwardly along erratic star wheel 100.
In this kind of structure type, " drive mechanism is in contact with the outer circumference surface of polished part 200 " mentioned above is Refer to, multiple raised 300 outermost faces far from erratic star wheel 100 are in contact with the outer circumference surface of polished part 200.Use the wandering star When wheel assembly is polished polished part 200, since protrusion 300 is multiple, by more between erratic star wheel 100 and polished part 200 A raised 300 are driven to realize, which makes the contact area between erratic star wheel 100 and polished part 200 greatly reduce, to The degree that the outer circumference surface of polished part 200 is polished can be mitigated.
In practical polishing process, the excircle of raised 300 outermost faces and polished part 200 far from erratic star wheel 100 Face is in contact, and " contact " herein refers to, the outer circumference surface of the outermost face of the protrusion 300 and polished part 200 can be each other There are small gaps between contact or both.
Please continue to refer to Fig. 1, raised 300 cross-sectional shape shown in FIG. 1 is circle, by taking this kind of structure as an example, works as trip When star-wheel 100 rotates, protrusion 300 is driven to rotate, due to the outer circumference surface of the outermost face and polished part 200 of the protrusion 300 There are small gaps between capable of being in contact with each other or both, in real-world operation, between protrusion 300 and polished part 200 There are certain frictional force, under the action of the frictional force, while erratic star wheel 100 drives protrusion 300 to rotate, can drive and wait throwing Light part 200 rotates.
As shown in Fig. 2, above-mentioned drive mechanism includes the middle circle 400 being arranged in the inner peripheral surface of erratic star wheel 100, it is intermediate The outer circumference surface of annulus 400 is in contact with the inner peripheral surface of erratic star wheel 100.
In this kind of structure type, " drive mechanism is in contact with the outer circumference surface of polished part 200 " mentioned above is Refer to, the inner peripheral surface of middle circle 400 is in contact with the outer circumference surface of polished part 200." contact " herein refers to middle circle There are small gaps between the outer circumference surface of the inner peripheral surface of ring 400 and polished part 200 can be in contact with each other or both; Also, there are micro- between the outer circumference surface of middle circle 400 and the inner peripheral surface of erratic star wheel 100 can be in contact with each other or both Small gap.
Please continue to refer to Fig. 3, since middle circle 400 is between erratic star wheel 100 and polished part 200, in polishing, The inner peripheral surface of erratic star wheel 100 first generates friction with the outer circumference surface of middle circle 400, intermediate under the action of the frictional force Annulus 400 rotates, then polished part 200 is driven to rotate, and to reduce the polishing thread of the rotation of polished part 200, subtracts significantly The degree that the outer circumference surface of polished part 200 is polished is lacked.
It should be noted that when drive mechanism uses middle circle 400, in same time, the circle of the rotation of erratic star wheel 100 Number is more than the number of turns that middle circle 400 rotates, and the number of turns that middle circle 400 rotates is more than the number of turns that polished part 200 rotates.
As shown in figure 3, when drive mechanism uses middle circle 400, can be also equipped on the inner peripheral surface of middle circle 400 Multiple raised 300, each raised 300 being disposed radially inwardly along middle circle 400.
Please continue to refer to Fig. 3, in this kind of structure type, the inner circle of the outer circumference surface and erratic star wheel 100 of middle circle 400 Circumferential surface is in contact, and multiple raised 300 outermost faces far from erratic star wheel 100 are in contact with the outer circumference surface of polished part 200, should Ibid, details are not described herein for " contact " that place mentions.
Raised 300 cross-sectional shape shown in Fig. 3 is circle, by taking this kind of structure as an example, when erratic star wheel 100 rotates, The inner peripheral surface of erratic star wheel 100 first generates friction with the outer circumference surface of middle circle 400, intermediate under the action of the frictional force Annulus 400 rotates, while protrusion 300 being driven to rotate, and then polished part 200 is driven to rotate again, to reduce polished part The polishing thread of 200 rotations, is added, and protrusion 300 is directly in contact with polished part 200 so that erratic star wheel 100 and polished part Contact area between 200 greatly reduces, the degree that the outer circumference surface to significantly reduce polished part 200 is polished.
It should be noted that when drive mechanism is using middle circle 400 plus protrusion 300, in same time, erratic star wheel The number of turns of 100 rotations is more than the number of turns that middle circle 400 rotates, and the number of turns that middle circle 400 rotates is more than 200 turns of polished part The dynamic number of turns.
On the basis of the above embodiments, when protrusion 300 is directly arranged on erratic star wheel 100, protrusion 300 and erratic star wheel 100 material is identical, and the two is integrally formed
Either, protrusion 300 is different with the material of erratic star wheel 100, and protrusion 300 and erratic star wheel 100 are using detachable solid Fixed connection.
Such as:Protrusion 300 is fixed on by screw or glue on erratic star wheel 100.
When protrusion 300 is located on middle circle 400, protrusion 300 is identical with the material of middle circle 400, the two one at Type.
Either, protrusion 300 is different with the material of middle circle 400, and protrusion 300 and middle circle 400 are using detachable Formula is fixedly connected.
Such as:Protrusion 300 is fixed on by screw or glue on middle circle 400.
Wherein, the material of erratic star wheel 100 is using any one of metal, epoxy resin, polytetrafluoroethylene (PTFE), PVC, PP.
The material of the middle circle 400 is identical as the material of erratic star wheel 100;Either, the material of middle circle 400 uses Glass or ceramics etc..
On the basis of the above embodiments, as shown in figure 4, along polished part 200 axis direction, each raised 300 thickness Thickness of the degree no more than erratic star wheel 100.
On the basis of the above embodiments, as shown in figure 5, along polished part 200 axis direction, protrusion 300 by up to Under be disposed with multigroup, wrapped in (each group herein refers to being located at the protrusion 300 being same as on horizontal plane) wherein each group Include multiple raised 300.
On the basis of the above embodiments, protrusion 300 cross-sectional shape also can be used semicircle, triangle, it is rectangular in It is any.
Either, protrusion 300 uses the structure type of idler wheel, wherein the axis of the axis direction of idler wheel and polished part 200 Line is parallel, and idler wheel is articulated on the inner peripheral surface of erratic star wheel 100.When polished part 200 and idler wheel contact, erratic star wheel When 100 rotation, idler wheel rolls across on the outer circumference surface of polished part 200, and the outer circumference surface of polished part 200 will not be caused to be thrown Light.
On the basis of the above embodiments, a kind of specific size of wandering star wheel assembly is following setting:
As shown in Figure 4 and Figure 5, the outer diameter of erratic star wheel 100 ranging from 10mm~10m;The width of the protrusion 300 (hangs down Directly in the axis direction of polished part 200) range 100um~100mm;The thickness of the protrusion 300 is (along the axis side of polished part 200 To) ranging from 100um~100mm.
Width (perpendicular to the axis direction of polished part 200) range of the intermediate ring 400 is in 100um~100mm;Its thickness (along the axis direction of polished part 200) ranging from 100um~100mm, thickness are less than or equal to the thickness of erratic star wheel 100.
The present embodiment also provides a kind of burnishing device, including:Above-mentioned wandering star wheel assembly.
Above-mentioned wandering star wheel assembly is set in the burnishing device, wherein the concrete structure of the wandering star wheel assembly, connection are closed System and advantageous effect etc. are described in detail in above-mentioned word, and details are not described herein.
Above-mentioned wandering star wheel assembly is set in the burnishing device, is improved by the outer circumference surface to erratic star wheel 100, In its inner peripheral surface setting protrusion 300, the contact area with polished part 200 in polishing process is reduced, it is polished to reach mitigation The degree that 200 outer circumference surface of part is affected;Alternatively, middle circle 400 is added, it can be between erratic star wheel 100 and polished part Among 200, first with the outer circumference surface friction of middle circle 400, middle circle 400 rotates 100 inner peripheral surface of erratic star wheel when polishing, It drives polished part 200 to rotate again, reduces the polishing thread of the rotation of polished part 200, it can be significantly by both methods Reduce the degree that the outer circumference surface of polished part 200 is polished.
Finally it should be noted that:The above various embodiments is only to illustrate the technical solution of the utility model, rather than limits it System;Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should Understand:It still can be with technical scheme described in the above embodiments is modified, either to which part or whole Technical characteristic carries out equivalent replacement;And these modifications or replacements, this practicality that it does not separate the essence of the corresponding technical solution are new The range of each embodiment technical solution of type.

Claims (10)

1. a kind of wandering star wheel assembly, which is characterized in that including:Erratic star wheel (100), the erratic star wheel (100) has trepanning, described The inner peripheral surface of erratic star wheel (100) is equipped with drive mechanism, and the drive mechanism connects with the outer circumference surface of polished part (200) It touches, and the drive mechanism is used to protect the outer circumference surface of polished part (200).
2. wandering star wheel assembly according to claim 1, which is characterized in that the drive mechanism includes being arranged in the wandering star It takes turns multiple raised (300) of the inner peripheral surface of (100), each described raised (300) radially-inwardly setting along the erratic star wheel (100) It sets.
3. wandering star wheel assembly according to claim 1, which is characterized in that the drive mechanism includes being arranged in the wandering star Take turns the middle circle (400) of the inner peripheral surface of (100), outer circumference surface and the erratic star wheel (100) of the middle circle (400) Inner peripheral surface be in contact.
4. wandering star wheel assembly according to claim 3, which is characterized in that on the inner peripheral surface of the middle circle (400) Equipped with multiple raised (300), each described raised (300) being disposed radially inwardly along the middle circle (400).
5. wandering star wheel assembly according to claim 4, which is characterized in that the protrusion (300) is located at the erratic star wheel (100) on, the protrusion (300) is identical with the material of the erratic star wheel (100), and the two is integrally formed;Either, the protrusion (300) different with the material of the erratic star wheel (100), the protrusion (300) and the erratic star wheel (100) are using detachable solid Fixed connection;
The protrusion (300) is located on the middle circle (400), the material of protrusion (300) and the middle circle (400) Matter is identical, and the two is integrally formed;Either, raised (300) are different with the material of the middle circle (400), described convex (300) are played to be fixedly connected using detachable with the middle circle (400).
6. wandering star wheel assembly according to claim 5, which is characterized in that the axis direction along polished part (200), each institute The thickness for stating raised (300) is not more than the thickness of the erratic star wheel (100).
7. wandering star wheel assembly according to claim 5, which is characterized in that the axis direction along polished part (200), it is described Raised (300) be from top to bottom disposed with it is multigroup, wherein each group includes multiple protrusions (300).
8. according to claim 2,4,6-7 any one of them wandering star wheel assemblies, which is characterized in that the cross of the protrusion (300) Cross sectional shape is using any one of circle, semicircle, triangle, rectangular.
9. according to claim 2,4,6-7 any one of them wandering star wheel assemblies, which is characterized in that the protrusion (300) uses The structure type of idler wheel, the axis direction of the idler wheel is parallel with the axis of polished part (200), and the idler wheel is articulated in institute On the inner peripheral surface for stating erratic star wheel (100).
10. a kind of burnishing device, which is characterized in that including the claims 1-9 any one of them wandering star wheel assemblies.
CN201721773581.8U 2017-12-18 2017-12-18 Wandering star wheel assembly and its burnishing device Active CN207757439U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201721773581.8U CN207757439U (en) 2017-12-18 2017-12-18 Wandering star wheel assembly and its burnishing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201721773581.8U CN207757439U (en) 2017-12-18 2017-12-18 Wandering star wheel assembly and its burnishing device

Publications (1)

Publication Number Publication Date
CN207757439U true CN207757439U (en) 2018-08-24

Family

ID=63187416

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201721773581.8U Active CN207757439U (en) 2017-12-18 2017-12-18 Wandering star wheel assembly and its burnishing device

Country Status (1)

Country Link
CN (1) CN207757439U (en)

Similar Documents

Publication Publication Date Title
ATE516923T1 (en) METHOD AND DEVICE FOR POLISHING SEMICONDUCTOR DISCS ON BOTH SIDES
CN102626902A (en) Cooling device for one-side grinding and polishing machine
CN207757439U (en) Wandering star wheel assembly and its burnishing device
CN102172885A (en) Substrate polishing device and polished substrate thereof
CN208601323U (en) More universal grinding and polishing devices of size
CN211073143U (en) Grinding jig
CN202540147U (en) Cooling device for single-sided grinding and polishing machine
CN109290937A (en) A kind of chip-bearing disc, grinder, polishing machine, grinding method and polishing method
CN102039554A (en) Method for grinding solar silicon rod
CN207788624U (en) Polishing pad and its burnishing device
CN105304522A (en) Silicon wafer back surface cleaning device
CN108068024A (en) Polishing disk
CN201736114U (en) Planetary piece
CN204673417U (en) Sand machine crossed by a kind of bend pipe
CN203887682U (en) Grinding head and grinding device
TW201908054A (en) Separate chuck device and wafer polishing process
CN206952801U (en) A kind of dismountable combined type polishing disk
CN207542199U (en) polishing assembly
CN202097622U (en) Worktable
CN207664025U (en) A kind of wafer is done over again cleaning device
CN204905221U (en) Glue -applicating machine
CN204108857U (en) The Special grinding wheel of novel ITO electropane
CN103418592B (en) A kind of upper pressure wheel assembly
CN212095829U (en) Polishing jig device
CN102254851A (en) Vacuum type chuck device having nitrogen protection

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address

Address after: 215000 room 103, building C, North District, Founder science park, No. 188, Suhong East Road, Suzhou Industrial Park, Suzhou area, China (Jiangsu) pilot Free Trade Zone, Suzhou City, Jiangsu Province

Patentee after: New Meguiar (Suzhou) semiconductor technology Co.,Ltd.

Address before: 215000 Suzhou nano city nw-20 107, 108, 109, 110, No. 99, Jinjihu Avenue, Suzhou Industrial Park, Jiangsu Province

Patentee before: SUZHOU SICREAT NANOTECH Co.,Ltd.

CP03 Change of name, title or address