CN207669894U - Transparent panel and its application - Google Patents
Transparent panel and its application Download PDFInfo
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- CN207669894U CN207669894U CN201720809527.8U CN201720809527U CN207669894U CN 207669894 U CN207669894 U CN 207669894U CN 201720809527 U CN201720809527 U CN 201720809527U CN 207669894 U CN207669894 U CN 207669894U
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The utility model embodiment discloses a kind of transparent panel, which includes panel body and the pellicular cascade structure being formed on the surface of panel body, which includes at least one antireflection layer and at least one stiffening layer.By the above-mentioned means, by antireflection layer and stiffening layer the hardness and wearability of transparent panel can be improved while improving the translucency of transparent panel.The utility model embodiment is further disclosed using the display screen of the transparent panel, terminal, windshield and mobile traffic.
Description
Technical field
The utility model embodiment is related to Material Field, more particularly to a kind of transparent panel and applies the transparent panel
Display screen, terminal, windshield and mobile traffic.
Background technology
Often have higher requirement to its hardness for the face glass used in the fields such as automobile or mobile phone, at present on
It states hardening mode used by face glass and generally comprises two kinds：
One is chemicosolidifying methods, and glass surface is immersed in high temeperature chemistry reagent solution particular by chemical method
In, the sodium ion of surface layer of glass can be replaced by the ion in solvent, form ion exchange.The ion ratio sodium ion exchanged
Diameter it is big so that the area of surface layer of glass increases, but practical upper volume does not change, therefore will produce " compression ".To
Face glass is set to obtain stiffened reinforcing.But by above-mentioned chemicosolidifying treated face glass with other elements (example
Such as, touch screen) it is bonded in process, compatibility is poor always, is unable to get thorough solution.
Another kind is physical hardening method, is cooled down rapidly after face glass is specifically heated to 600-700 DEG C, and glass is made
Surface is drastically shunk, and forms compression, and glass middle level is shunk slower, and forms tensile stress, so make face glass obtain compared with
High intensity.But by above-mentioned physical hardening, treated that face glass can exist that reflective is strong, glass brittleness is larger, holds
The shortcomings of easy fragmentation.
Further, it to obtain better translucent effect, is often plated on face glass and sets anti-reflection film, and existing anti-reflection film
The hardness of face glass is not improved.
Utility model content
The utility model embodiment provides a kind of transparent panel, while improving the translucency of transparent panel, to improve
The hardness and wearability of transparent panel.Further, the utility model embodiment provides a kind of display of the application transparent panel
Screen, terminal, windshield and mobile traffic.
In order to solve the above technical problems, the technical solution that the utility model embodiment uses is：It provides a kind of transparent
Panel, the transparent panel include panel body and the pellicular cascade structure being formed on the surface of panel body, pellicular cascade
Structure includes the antireflection layer being cascading outward from the surface of panel body and stiffening layer；Wherein, the thickness of stiffening layer
Spend ranging from 8nm-35nm.
Wherein, the refractive index of antireflection layer is less than stiffening layer, and the hardness of stiffening layer is higher than antireflection layer.
Wherein, refractive index of the antireflection layer in 380nm-780nm wave-length coverages is 1.48-1.44, and stiffening layer is in 380nm-
Refractive index in 780nm wave-length coverages is 2.04-2.01.
Wherein, the Mohs' hardness of antireflection layer is 6-7, and the Mohs' hardness of stiffening layer is 9-9.5.
Wherein, the absorption coefficient in 380nm-780nm wave-length coverages of antireflection layer is less than 0.001, and stiffening layer exists
Absorption coefficient in 380nm-780nm wave-length coverages is 0.0068-0.0066.
Wherein, antireflection layer is oxide antireflection layer, and stiffening layer is in nitride stiffening layer and diamond-like-carbon stiffening layer
One kind.
Wherein, antireflection layer is one kind in silica antireflection layer, aluminium oxide antireflection layer, oxidation sial antireflection layer, stiffening layer
For silicon nitride stiffening layer, aluminium nitride stiffening layer, titanium nitride stiffening layer, chromium nitride stiffening layer, tantalum nitride stiffening layer, zirconium nitride stiffened
Layer, aluminium silicon nitride stiffening layer, TiAlN stiffening layer, chromium nitride aluminum stiffening layer, chromium nitride titanium aluminum stiffening layer, nitridation chromium-silicon-aluminium add
Hard formation, titanium silicon nitride aluminium stiffening layer, boron nitride stiffening layer, nitrogen titanium boride stiffening layer, nitrogen chromium boride stiffening layer, nitrogen titanium boride aluminium add
Hard formation, nitrogen titanium boride silicon stiffening layer, nitrogen silicon boride titanium aluminium stiffening layer, TiCN stiffening layer, nitrogen chromium carbide stiffening layer, nitrogen carbonization
One kind in zirconium stiffening layer, nitrogen tungsten carbide stiffening layer.
Wherein, antireflection layer is oxide antireflection layer, and thickness range 8nm-150nm, stiffening layer is nitride stiffening layer.
Wherein, the thickness range of antireflection layer is 8-90nm.
Wherein, antireflection layer and stiffening layer are stacked gradually on the surface of panel body, and the outermost layer of pellicular cascade structure
For stiffening layer.
Wherein, a lamination period is formed by the antireflection layer to contact with each other and a stiffening layer, pellicular cascade structure includes
The one or more lamination period.
Wherein, pellicular cascade structure setting is at making pellicular cascade structure flat in 380nm-780nm visible-ranges
Equal transmitance is not less than 85%.
Wherein, pellicular cascade structure setting is at so that the transmitted light through panel is in the CIE LAB colour spaces in a natural environment
In coordinate value be：39≤L≤53, -2.5≤A≤- 0.5, and -2.0≤B≤- 3.0 or 35≤L≤45,4.5≤A≤
7.0, and -2.5≤B≤- 4.5.
In order to solve the above technical problems, the technical solution that the utility model embodiment uses is：A kind of display is provided
Screen, which includes above-mentioned transparent panel, and transparent panel is set to the outermost of display screen.
In order to solve the above technical problems, the technical solution that the utility model embodiment uses is：A kind of terminal is provided,
The terminal includes above-mentioned display screen.
In order to solve the above technical problems, the technical solution that the utility model embodiment uses is：One kind is provided to keep out the wind
Glass, the windshield include above-mentioned transparent panel.
In order to solve the above technical problems, the technical solution that the utility model embodiment uses is：A kind of movement is provided
The vehicles, the mobile traffic include above-mentioned windshield.
The advantageous effect of the utility model embodiment is：It can improve transparent panel by antireflection layer and stiffening layer
While translucency, the hardness and wearability of transparent panel are improved.
Description of the drawings
Fig. 1 is the structural schematic diagram according to the transparent panel of the utility model first embodiment；
Fig. 2 is the structural schematic diagram according to the transparent panel of the utility model second embodiment；
Fig. 3 is the structural schematic diagram according to the transparent panel of the utility model 3rd embodiment；
Fig. 4 is the structural schematic diagram according to the transparent panel of the utility model fourth embodiment；
Fig. 5 is the structural schematic diagram of the transparent panel and terminal using the utility model embodiment；
Fig. 6 is the structural schematic diagram of the windshield and automobile using the utility model embodiment；
Fig. 7 is bent with the variation of thicknesses of layers using the case hardness of the panel body of the nitride stiffening layer of different materials
Line；
Fig. 8 is the mean transmissivity of the nitride stiffening layer of different materials with the change curve of thicknesses of layers；
Fig. 9 is the transmitance of the nitride stiffening layer of different thicknesses of layers with the change curve of wavelength；
Figure 10-15 be include different materials antireflection layer and stiffening layer double membrane structure mean transmissivity with stiffening layer
Thicknesses of layers change curve.
Specific implementation mode
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describing, it is clear that described embodiment is only a part of the embodiment of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
The every other embodiment obtained, shall fall within the protection scope of the present invention.
Shown in referring to Fig.1, Fig. 1 is the structural schematic diagram according to the transparent panel of the utility model first embodiment.This reality
The transparent panel for applying example includes panel body 10 and the pellicular cascade structure 11 being formed on the surface of panel body 10.Face
The material of plate ontology 10 can be any transparent material appropriate such as glass, polystyrene, polymethyl methacrylate.
In the present embodiment, pellicular cascade structure 11 includes antireflection layer 111 and stiffening layer 112.Wherein, antireflection layer 111
Be formed on the surface of panel body 10, stiffening layer 112 is formed on the surface of antireflection layer 111 so that antireflection layer 111 and plus
Hard formation 112 is stacked gradually in contacting on the surface of panel body 10 and each other.
Transparent area can be improved by antireflection layer 111 and stiffening layer 112 while improving the translucency of transparent panel
The hardness and wearability of plate.
Further, consider from the physical characteristic of antireflection layer 111 and stiffening layer 112, it is general next in order to obtain said effect
It says and the refractive index of antireflection layer 111 is required to be less than stiffening layer 112, and the hardness of stiffening layer 112 is higher than antireflection layer 111.
In concrete application example, refractive index of the antireflection layer 111 in 380nm-780nm wave-length coverages is 1.48-1.44, and
Refractive index of the stiffening layer 112 in 380nm-780nm wave-length coverages is 2.04-2.01.It is further alternative, antireflection layer 111
Mohs' hardness is 6-7, and the Mohs' hardness of stiffening layer 112 is 9-9.5.
In addition, in order to obtain better translucent effect, absorption system of the antireflection layer 111 in 380nm-780nm wave-length coverages
Number is formed as less than 0.001, and absorption coefficient of the stiffening layer 112 in 380nm-780nm wave-length coverages is 0.0068-0.0066.
Consider from the material property of antireflection layer 111 and stiffening layer 112, oxide, example can be used in the material of antireflection layer 111
If the material of antireflection layer 111 can be at least one of silica, aluminium oxide and oxidation sial or combination.
The material of stiffening layer 112 can be at least one of nitride and diamond-like-carbon or combination.The nitride
It can also be nitrogen boride or nitrogen carbide.For example, the material of stiffening layer 112 can be silicon nitride, aluminium nitride, titanium nitride, nitrogen
Change chromium, tantalum nitride, zirconium nitride, aluminium silicon nitride, TiAlN, chromium nitride aluminum, chromium nitride titanium aluminum, nitridation chromium-silicon-aluminium, titanium silicon nitride
Aluminium, boron nitride, nitrogen titanium boride, nitrogen chromium boride, nitrogen titanium boride aluminium, nitrogen titanium boride silicon, nitrogen silicon boride titanium aluminium, TiCN, nitrogen carbon
Change at least one of chromium, nitrogen zirconium carbide, nitrogen tungsten carbide or combination.
Consider that the thickness range of antireflection layer 111 can be 50nm- from antireflection layer 111 and the thicknesses of layers of stiffening layer 112
The thickness range of 100nm, stiffening layer 112 can be 5nm-20nm.It is highly preferred that the thickness range of antireflection layer 111 can be
The thickness range of 80nm-90nm, stiffening layer 112 can be 10nm-15nm.It needs it is worth noting that, above-mentioned numberical range is real
Include the numerical value of two endpoints on border.
With reference to shown in Fig. 2, Fig. 2 is the structural schematic diagram according to the transparent panel of the utility model second embodiment.This reality
The transparent panel for applying example includes panel body 20 and the pellicular cascade structure 21 being formed on the surface of panel body 20.It is thin
Film lamination structure 21 includes antireflection layer 211 and stiffening layer 212.The transparent panel of the present embodiment and transparent panel shown in FIG. 1
The difference is that the transparent substrate of the present embodiment is further formed in panel body 20 and the antireflection layer 211 that is disposed adjacent
Between substrate layer 22.The purpose of setting of substrate layer 22 is to increase the attachment between antireflection layer 211 and panel body 20
Power.Any suitable material may be selected in substrate layer 22, while the thickness of substrate layer 22 can carry out arbitrary setting according to actual conditions.
Such as in the present embodiment, the material of substrate layer 22 is identical as stiffening layer 212, and the thickness of substrate layer 22 is 5nm-20nm, and
It is preferred that it is identical as the thickness of stiffening layer 212, it thus can simplify coating process.Further, the outside of pellicular cascade structure 21 into
One step forms anti-fingerprint layer 23, and polymer coating or appropriate material with hydrophobicity and oleophobic property may be used in anti-fingerprint layer 23
The plated film of material.
With reference to shown in Fig. 3, Fig. 3 is the structural schematic diagram according to the transparent panel of the utility model 3rd embodiment.This reality
The transparent panel for applying example includes panel body 30 and the pellicular cascade structure 31 being formed on the surface of panel body 30.This
The transparent panel of embodiment and transparent panel shown in FIG. 1 the difference is that, the pellicular cascade structure 31 of the present embodiment is wrapped
Include the antireflection layer 311 being cascadingly set on the surface of panel body 30, stiffening layer 312, antireflection layer 313 and stiffening layer
314。
In the present embodiment, antireflection layer 311 and stiffening layer 312 can be used as to a lamination period, and by antireflection layer 313
It is used as a lamination period with stiffening layer 314.That is, in the embodiment shown in fig. 1, pellicular cascade structure 11 only includes
The lamination period formed by the antireflection layer 111 and stiffening layer 112 that contact with each other.And in the embodiment shown in fig. 3, film
Laminated construction 31 includes antireflection layer 311 and stiffening layer 312 by contacting with each other and the antireflection layer 311 by contacting with each other respectively
It is formed by two lamination periods with stiffening layer 312.In other embodiments, pellicular cascade structure can also include two or more
The lamination period is formed by by the antireflection layer and stiffening layer that contact with each other.Wherein, within each lamination period, stiffening layer is set to
The side of the separate panel body of antireflection layer.And the outermost layer of pellicular cascade structure is stiffening layer.
Further, between the panel body 30 and pellicular cascade structure 31 of the present embodiment and pellicular cascade structure 31 most
Outside can also increase substrate layer and anti-fingerprint layer in embodiment illustrated in fig. 2 according to actual needs.
With reference to shown in Fig. 4, Fig. 4 is the flow of the manufacturing method of the transparent panel of fourth embodiment according to the present utility model
Figure.The manufacturing method of the present embodiment mainly includes the following steps that：
Step 41, surface clean and drying are carried out to panel body；
In this step, since the surface smoothness of panel body is very big to coating influence, preferably pass through ultrasound
Wave cleaning way carries out surface clean to panel body.
In a concrete application example, ultrasonic cleaning agent is added in the first ultrasonic cleaner, is heated to 70 DEG C,
Panel body is placed wherein again, starts ultrasonic cleaning, terminates after five minutes；
City's water is added in second and third ultrasonic cleaner, and panel body is sequentially placed into second and third ultrasound
In wave rinse bath, ultrasonic rinsing is carried out, per 5 minutes slot duration；
Ultrasonic cleaning agent is added in the 4th ultrasonic cleaner, and carries out ultrasonic cleaning 5 under normal temperature condition and divides
Clock；
Pure water, the wherein resistivity of pure water >=10-15M Ω/CM are added in the 5th to the 7th ultrasonic cleaner3, will
Panel body is put into wherein, carries out ultrasonic rinsing successively, is 5 minutes per the slot duration；
Panel body is placed in the 8th ultrasonic cleaner and carries out primary dewatering, then panel body the 9th and 10 are surpassed
Hot drying and dewatering twice is carried out in sound wave rinse bath；
Finally, it is placed in pallet through the glass panel after the completion of ultrasonic cleaning, is ready for vacuum sputtering coating processing.
Step 42, in such a way that substrate material is by vacuum splashing and plating substrate layer is formed on the surface of panel body；
Step 43, in such a way that antireflective material is by vacuum splashing and plating antireflection layer is formed on the surface of substrate layer；
Step 44, in such a way that stiffened material is by vacuum splashing and plating stiffening layer is formed on the surface of antireflection layer.
In above-mentioned steps 42-44, vacuum splashing and plating can be used in medium frequency reactive sputtering, radio-frequency sputtering, high energy pulse sputtering
One kind or combination.Substrate material, antireflective material and stiffened material can be used above-described a variety of materials, and substrate material and
Identical material can be used in stiffened material.Further, the physical characteristic of substrate layer, antireflection layer and stiffening layer and thicknesses of layers can be set
Above-described various numberical ranges are set to, and the physical characteristic and thicknesses of layers of substrate layer and stiffening layer can be identical.
Further, described above, those skilled in the art can according to actual needs omit step 42, or
Repeat step 43-44 so that finally formed pellicular cascade structure include more than one by the antireflection layer that contacts with each other and
Stiffening layer is formed by the lamination period.Wherein, stiffening layer is preferably placed at the outermost layer of pellicular cascade structure.
Further, fingerprint proof membrane can also be further formed on the outside of pellicular cascade structure.
Below using substrate of glass as panel body, with silica (SiO2) it is used as antireflective material, with silicon nitride (Si3N4)
As describing a concrete application example for substrate material and stiffened material.
In concrete application example, after carrying out ultrasonic surface cleaning, dehydration, drying to substrate of glass first, it is placed on true
On the work rest of null device.Vacuum equipment is opened, substrate of glass is entered continuously by transmission mechanism with 2.5cm/ seconds speed
The base vacuum of sputter coating vacuum equipment, vacuum equipment is 3.0 × 10-3Pa, and it is coated with nitrogen successively on the surface of panel body
Silicon substrate layer, silica antireflection layer and silicon nitride stiffening layer trilamellar membrane layer structure.
Wherein, in silicon nitrate substrate layer during being coated with, Si targets configure 40KW intermediate frequencies and react power supply, to vacuum equipment
The argon gas of 300sccm is inside filled with as protective gas, while the nitrogen for being filled with 120sccm thereto again makes as reaction gas
Working vacuum degree is 0.5-0.8Pa, ensures that the deposition thickness of silicon nitrate substrate layer is 10-20 nanometers；
In silica antireflection layer during being coated with, it is 3.0 × 10 to keep the base vacuum of vacuum equipment-3Pa, Si target
It configures 40KW intermediate frequencies and reacts power supply, be filled with the argon gas and 80-120sccm oxygen of 350sccm, working vacuum degree 0.5Pa,
Ensure that the deposition thickness of silica antireflection layer is 80-100 nanometers.
Silicon nitride stiffening layer is identical as the sputtering process parameter of silicon nitrate substrate layer, and deposition thickness is 10-20 nanometers.
After tested, 4% is improved using the substrate of glass transmitance of above-mentioned pellicular cascade structure, and hardness can reach lead
The 9H of hardness, has many advantages, such as that hardness height, abrasion-resistant, scratch-resistant, service life are long.
As indicated above, it is wrapped in the transparent panel of each embodiment of the utility model by being arranged on the surface of panel body
The pellicular cascade structure for including an at least antireflection layer and stiffening layer can improve transparent while improving the translucency of transparent panel
The hardness and wearability of panel, and can be widely applied to multiple fields.
Referring to Figure 5, Fig. 5 is shown using the display screen of transparent panel and the structure of terminal of the utility model embodiment
It is intended to.
In the present embodiment, the transparent panel of the various embodiments described above is set in the outermost of the display screen 51 of terminal device 50
52, and the outermost stiffening layer of transparent panel 52 is arranged towards to the outside of display screen 51.
With reference to shown in Fig. 6, Fig. 6 is the structure of the windshield and automobile using the transparent panel of the utility model embodiment
Schematic diagram.
In the present embodiment, the windshield 61 of automobile 60, will be transparent using the transparent panel of the various embodiments described above
The outermost stiffening layer of panel is arranged towards the outside of automobile 60, or equal in the both sides of transparent panel according to actual needs
Above-mentioned pellicular cascade structure is set, so that outermost stiffening layer is respectively facing the inside and outside of automobile.Such as art technology
The above-mentioned windshield that personnel are understood can also be applied on other mobile traffics.
Through the utility model people further study show that, on the basis of above-mentioned film layer structure, it is also contemplated that following to become
Type：
First, in the case where not considering antireflective effect, can also be arranged only on the surface of panel body and class above
As nitride stiffening layer, and then achieve the effect that carry out stiffened to the surface of panel body, panel body can also be at this time
Non-transparent material.As shown in fig. 7, respectively illustrating the thicknesses of layers variation of the nitride stiffening layer of different materials in Fig. 7 and leading
The change curve of the case hardness of the panel body of cause.Wherein shown by taking silicon nitride, aluminium nitride and aluminium silicon nitride as an example, but
As understood by those skilled in the art, nitride stiffening layer can also use other nitride materials being mentioned above, and
With similar characteristic.Since the thickness of nitride stiffening layer directly affects the case hardness of panel body, in this practicality
The thickness selection of novel middle nitride stiffening layer is most important.It can be sent out from Fig. 7 and to the test result of other nitride materials
Existing, when the thicknesses of layers of nitride stiffening layer reaches 8nm, the Mohs' hardness on the surface of panel body has reached or is more than mesh
The Mohs' hardness of preceding commercially available simple glass panel, and reach or close to 6.0.Therefore, in the present invention, nitride stiffened
The thickness of layer is preferably provided to be not less than 8nm.It further, can be by the way that nitride stiffened be arranged to obtain better protecting effect
The thicknesses of layers of layer so that the case hardness of panel body is even higher not less than 6.0, such as 7.0,8.0,9.0 etc., specifically
Depending on the actual use scene of panel.In an alternative embodiment of the utility model, by the way that nitride stiffening layer is arranged
Thickness make panel body surface Mohs' hardness between 6.0-8.5.
Further, from Fig. 7 and to the test result of other nitride materials can be found that the case hardness of panel body with
Nonlinear change is presented in the thicknesses of layers of nitride stiffening layer.After the thickness of nitride stiffening layer reaches certain thickness, panel
The case hardness of ontology no longer obviously increases.For example, when the thickness of nitride stiffening layer reaches 500nm, the table of panel body
Surface hardness has reached or (silicon nitride stiffening layer and aluminium silicon nitride stiffening layer reach close to the ultimate hardness determined by material itself
To Mohs' hardness 9.0, and aluminium nitride stiffening layer reaches Mohs' hardness 8.5), and no longer increase substantially with thicknesses of layers and increase.
Therefore, in the present invention, the thickness of nitride stiffening layer can be selected in the range of 8nm-500nm.
Further, it from Fig. 7 and the test result of other nitride materials is can be found that is changed to from 8nm in thicknesses of layers
During 500nm, the case hardness of panel body rapidly increases with the increased of thicknesses of layers first, and certain increasing to
Slowly increase with the increase of thicknesses of layers after degree.For example, when the thickness of nitride stiffening layer reaches 150nm, panel sheet
The increase trend of the case hardness of body tends to slow down with the increase of the thickness of nitride stiffening layer.Therefore, in the utility model
In further integrate stiffening effect and the dual of economic cost and consider, the thickness of nitride stiffening layer can be 8nm-150nm's
It carries out selecting selection appropriate in range.In an alternative embodiment of the utility model, by the way that silicon nitride stiffening layer is arranged
Thickness and make panel body case hardness add between 6.5-8.5, or by aluminium nitride stiffening layer or aluminium silicon nitride
The thickness of hard formation and make panel body case hardness between 6.5-8.0.
Further, as shown in figure 8, under respectively illustrating the thicknesses of layers of nitride stiffening layer of different materials in Fig. 8
The change curve of mean transmissivity.Test result from Fig. 8 and to other nitride materials is it can be found that nitride stiffening layer
There are larger impacts for mean transmissivity of the thicknesses of layers to nitride stiffening layer.Therefore, when panel is as protecting LCD screen cover board
Or in the case that other need to consider transmission intensity, need to be based further on the mean transmissivity of nitride stiffening layer nitridation is arranged
The thicknesses of layers of object stiffening layer.For example, the thicknesses of layers of nitride stiffening layer can be arranged in 8nm-35nm or 100-
150nm obtains relatively high mean transmissivity, while ensureing relatively low economic cost.Further, the utility model
In one alternative embodiment, for the further following preferred thicknesses of layers of specific materials variances, the thickness of silicon nitride layer is 12nm-
35nm or 100nm-135nm；The thickness of aln layer is 16nm-35nm or 115nm-150nm；The thickness of silicon nitride aluminium layer is
14nm-35nm or 110nm-140nm.In one alternative embodiment of the utility model, the thickness of nitride stiffening layer is arranged to make
It obtains mean transmissivity of the nitride stiffening layer in 380nm-780nm visible-ranges and is not less than 82%, more preferably no less than
85%.
It certainly, can be thick by the film layer of nitride stiffening layer in the case where not considering economic cost and transmitance effect
Other ranges are arranged in degree, such as in the case that panel requires more high rigidity and wearability as mobile phone or computer rear cover plate,
150-500nm or other ranges can be arranged in the thicknesses of layers of nitride stiffening layer.
Further, become with wavelength as shown in figure 9, respectively illustrating the nitride stiffening layer under different thicknesses of layers in Fig. 9
The transmittance curve of change.Test result from Fig. 9 and to other nitride materials is it can be found that under certain thicknesses of layers, nitrogen
Compound stiffening layer will produce difference to the transmissivity of different wave length light, therefore will produce certain colour cast, influence color rendition
Degree.Therefore, it when panel is as protecting LCD screen cover board or in the case that other need to consider color rendition degree, needs to be based further on
The chromaticity coordinates of the transmitted light of nitride stiffening layer is arranged the thicknesses of layers of nitride stiffening layer.In the present invention, pass through
The thicknesses of layers of nitride stiffening layer is set so that the transmitted light through panel is in the CIE LAB colour spaces in a natural environment
Coordinate value is：39≤L≤53, -2.5≤A≤- 0.5, and -2.0≤B≤- 3.0 or 35≤L≤45,4.5≤A≤7.0,
And -2.5≤B≤- 4.5, it may thereby be ensured that panel has preferable color rendition degree.
It can effectively improve the case hardness and abrasion resistance of panel body by above-mentioned nitride stiffening layer.Specific choice is not
Nitride material together simultaneously selects different thicknesses of layers in 8nm-500nm, carries out frictional experiment and water droplet angular measurement.It is specific to survey
Strip part is：1kg counterweights are as bearing a heavy burden, and the steel wool of 10 × 10mm of size is as bistrique, stroke 40mm, and speed 50 times is (past
It is multiple)/point, after the completion of friction, water droplet angular measurement is carried out, measures water droplet and substrate surface angle.Judgment criteria：At water droplet angle>
Under the premise of 100 °, the bright wearability of Rubbing number more multilist is more excellent.Simple glass panel is after anti-fingerprint coating film treatment, friction
Test 3000 times, water droplet angle<100 °, the panel of the utility model is by 4000 frictions, water droplet angle>100°.It can be seen that
After the nitride stiffening layer of suitable thickness, the hardness and wearability on panel body surface are obviously improved.
Further, through the utility model people the study found that in above-disclosed antireflection layer and stiffening layer or substrate layer, increasing
The thickness of above-mentioned each film layer can be enlarged according to actual needs in the laminated construction of permeable layers and stiffening layer.
Shown in Fig. 1 using nitride is stiffening layer and using oxide as in the double membrane structure of antireflection layer, in Figure 10-15
It respectively illustrates and is antireflection layer using silica and is antireflection layer and using silicon nitride as stiffened using silicon nitride as stiffening layer, using aluminium oxide
Layer, using silica be antireflection layer and using aluminium nitride as stiffening layer, using aluminium oxide be antireflection layer and using aluminium nitride as stiffening layer, with oxygen
SiClx be antireflection layer and using aluminium silicon nitride be stiffening layer and using aluminium oxide be antireflection layer and using aluminium silicon nitride as stiffening layer six
The mean transmissivity change curve of the double membrane structure of kind different materials.
Specifically, six curves are respectively illustrated in above-mentioned every width schematic diagram, this six curves indicate to increase respectively
When the thickness of permeable layers is arranged to 8nm, 20nm, 30nm, 50nm, 100nm and 150nm, become from 12nm with the thicknesses of layers of stiffening layer
The mean transmissivity of above-mentioned double membrane structure when changing to 150nm.
As shown in fig. 10-15, although the mean transmissivity of each double membrane structure with the change of material and thicknesses of layers and
It is varied from, but substantially remains between 92%-80%.Therefore, the thickness of antireflection layer can between 8nm-150nm into
Row selection, and can further be selected between 8nm-90nm from economic cost consideration.
Meanwhile finding after further study, the case hardness for being provided with the panel body of above-mentioned double membrane structure mainly takes
Certainly in nitride stiffening layer, therefore the thicknesses of layers selection criteria of the nitride stiffening layer in above-mentioned double membrane structure with it is upper
Single layer nitride stiffening layer described in text is similar, optional ranging from 8nm-500nm, further optional ranging from 8nm-
150nm, further optional ranging from 8nm-35nm or 100nm-150nm, and above description can be carried out according to material difference
Optimization.
Further, it is possible to the thicknesses of layers of antireflection layer and stiffening layer is set based on the mean transmissivity of double membrane structure,
So that mean transmissivity of the double membrane structure in 380nm-780nm visible-ranges is not less than 82%, preferentially it is not less than
85%, more preferably no less than 90%.For example, nitride stiffening layer can be selected in the range of 8nm-35nm or 100-150nm
Thicknesses of layers setting and the thicknesses of layers of selective oxidation object antireflection layer is relatively high to obtain in the range of 8nm-90nm
Mean transmissivity, while ensureing relatively low economic cost.It should be pointed out that due to the presence of antireflection layer, it can be by setting
Set the thickness of antireflection layer appropriate so that, the mean transmissivity of above-mentioned double membrane structure identical in stiffened layer thickness
At least increase by 4% compared to the mean transmissivity only with single layer nitride stiffening layer.
Further, it is also possible to which the chromaticity coordinates of the transmitted light based on double membrane structure adds nitride stiffening layer and oxide is arranged
The thicknesses of layers of hard formation.In the present invention, pass through the thicknesses of layers of both settings so that in a natural environment through panel
Coordinate value of the transmitted light in the CIE LAB colour spaces be：39≤L≤53, -2.5≤A≤- 0.5, and -2.0≤B≤- 3.0, or
Person 35≤L≤45,4.5≤A≤7.0, and -2.5≤B≤- 4.5, it may thereby be ensured that panel has preferable color rendition
Degree.
Further, shown in Fig. 2 using nitride is stiffening layer and substrate layer and using oxide as the trilamellar membrane of antireflection layer
In structure, the thickness of nitride layer can be selected in the range of 8nm-500nm, and further alternative in 8nm-
It is selected in the range of 35nm, the thickness of oxide antireflection layer can be selected in the range of 8nm-150nm, and further
Optionally selected in the range of 30nm-90nm, and the thickness of nitride stiffening layer can be in the range of 8nm-500nm
Selected, and it is further alternative selected in the range of 8nm-35nm, and can above be retouched according to material difference
The optimization stated.
Further, shown in Fig. 3 to be stiffening layer using nitride and go forward side by side by four laminated construction of antireflection layer of oxide
One step is arranged in five film structures of nitride layer, the thickness of nitride layer can in the range of 8nm-500nm into
Row selection, and it is further alternative selected in the range of 8nm-35nm, close to panel body the first oxide it is anti-reflection
The thickness of layer can be selected in the range of 8nm-150nm, and further alternative be carried out in the range of 22nm-38nm
Selection, the thickness close to the first nitride stiffening layer of panel body can be selected in the range of 8nm-500nm, be gone forward side by side
One step is optionally selected in the range of 50nm-70nm, and the thickness of the second oxide antireflection layer far from panel body can
Selected in the range of 8nm-150nm, and it is further alternative selected in the range of 10nm-70nm, far from face
The thickness of second nitride stiffening layer of plate ontology can be selected in the range of 8nm-500nm, and it is further alternative
It is selected in the range of 10nm-55nm.Wherein, nitride layer can also be cancelled according to actual needs.
It should be noted that in order to simplify processing procedure and be in cost consideration, the material of nitride layer may be selected to
The material identical of nitride stiffening layer, and its thickness may be selected to the thickness equal to or less than nitride stiffening layer.For example, five
In film structure, the material of nitride layer may be selected and the first nitride stiffening layer and/or the second nitride stiffening layer phase
Together, and the thickness of nitride layer and the thickness of the first nitride stiffening layer and/or the second nitride stiffening layer are identical or small
In the thickness of the first nitride stiffening layer and/or the second nitride stiffening layer.Meanwhile being made by the way that thicknesses of layers appropriate is arranged
The mean transmissivity and chromaticity coordinates of monolithic film membrane laminated construction including substrate layer meet above-described mean transmissivity
With chromaticity coordinates standard.
The foregoing is merely the embodiments of the utility model, and it does not limit the scope of the patent of the present invention, all
It is equivalent structure or equivalent flow shift made based on the specification and figures of the utility model, directly or indirectly uses
In other related technical areas, it is equally included in the patent within the scope of the utility model.
Claims (17)
1. a kind of transparent panel, which is characterized in that the transparent panel includes panel body and is formed in the panel body
Surface on pellicular cascade structure, the pellicular cascade structure includes being stacked gradually outward from the surface of the panel body
The antireflection layer and stiffening layer of setting；
Wherein, the thickness range of the stiffening layer is 8nm-35nm.
2. transparent panel according to claim 1, which is characterized in that the refractive index of the antireflection layer is less than the stiffened
Layer, and the hardness of the stiffening layer is higher than the antireflection layer.
3. transparent panel according to claim 1, which is characterized in that the antireflection layer is in 380nm-780nm wave-length coverages
Interior refractive index is 1.48-1.44, and refractive index of the stiffening layer in 380nm-780nm wave-length coverages is 2.04-2.01.
4. transparent panel according to claim 1, which is characterized in that the Mohs' hardness of the antireflection layer is 6-7, described to add
The Mohs' hardness of hard formation is 9-9.5.
5. transparent panel according to claim 1, which is characterized in that the antireflection layer in 380nm-780nm wavelength models
Absorption coefficient in enclosing is less than 0.001, and absorption coefficient of the stiffening layer in 380nm-780nm wave-length coverages is
0.0068-0.0066。
6. transparent panel according to claim 1, which is characterized in that the antireflection layer is oxide antireflection layer, described to add
Hard formation is one kind in nitride stiffening layer and diamond-like-carbon stiffening layer.
7. transparent panel according to claim 6, which is characterized in that the antireflection layer is silica antireflection layer, aluminium oxide
One kind in antireflection layer, oxidation sial antireflection layer, the stiffening layer is silicon nitride stiffening layer, aluminium nitride stiffening layer, titanium nitride add
Hard formation, chromium nitride stiffening layer, tantalum nitride stiffening layer, zirconium nitride stiffening layer, aluminium silicon nitride stiffening layer, TiAlN stiffening layer, nitrogen
Change chromium aluminium stiffening layer, chromium nitride titanium aluminum stiffening layer, nitridation chromium-silicon-aluminium stiffening layer, titanium silicon nitride aluminium stiffening layer, boron nitride stiffening layer,
Nitrogen titanium boride stiffening layer, nitrogen chromium boride stiffening layer, nitrogen titanium boride aluminium stiffening layer, nitrogen titanium boride silicon stiffening layer, nitrogen silicon boride titanium aluminium
One kind in stiffening layer, TiCN stiffening layer, nitrogen chromium carbide stiffening layer, nitrogen zirconium carbide stiffening layer, nitrogen tungsten carbide stiffening layer.
8. transparent panel according to claim 1, which is characterized in that the antireflection layer is oxide antireflection layer, thickness
Ranging from 8nm-150nm, the stiffening layer are nitride stiffening layer.
9. transparent panel according to claim 8, which is characterized in that the thickness range of the antireflection layer is 8nm-90nm.
10. transparent panel according to claim 1, which is characterized in that the antireflection layer and the stiffening layer stack gradually
In on the surface of the panel body, and the outermost layer of the pellicular cascade structure is the stiffening layer.
11. transparent panel according to claim 1, which is characterized in that by contact with each other one antireflection layer and an institute
It states stiffening layer and forms a lamination period, the pellicular cascade structure includes the one or more lamination period.
12. panel according to claim 1, which is characterized in that the pellicular cascade structure setting is at making the film
Mean transmissivity of the laminated construction in 380nm-780nm visible-ranges is not less than 85%.
13. panel according to claim 1, which is characterized in that the pellicular cascade structure setting is at making in natural ring
Coordinate value of the transmitted light in the CIE LAB colour spaces through the panel under border be：39≤L≤53, -2.5≤A≤- 0.5, and -
2.0≤B≤- 3.0 or 35≤L≤45,4.5≤A≤7.0, and -2.5≤B≤- 4.5.
14. a kind of display screen, which is characterized in that the display screen includes the transparent area described in claim 1-13 any one
Plate, the transparent panel are set to the outermost of display screen.
15. a kind of terminal, which is characterized in that the terminal includes the display screen described in claim 14.
16. a kind of windshield, which is characterized in that the windshield includes transparent described in claim 1-13 any one
Panel.
17. a kind of mobile traffic, which is characterized in that including the windshield described in claim 16.
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| CN2016112600528 | 2016-12-30 | ||
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| CN201710543551.6A Pending CN107417133A (en) | 2016-12-30 | 2017-07-05 | A kind of panel |
| CN201710543549.9A Pending CN107522409A (en) | 2016-12-30 | 2017-07-05 | Transparent panel and its manufacture method and application |
| CN201710543548.4A Pending CN107445490A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543972.9A Pending CN107382090A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201720808097.8U Active CN207671933U (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
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| CN201710543549.9A Pending CN107522409A (en) | 2016-12-30 | 2017-07-05 | Transparent panel and its manufacture method and application |
| CN201710543548.4A Pending CN107445490A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543972.9A Pending CN107382090A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201720808097.8U Active CN207671933U (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
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| CN107522409A (en) * | 2016-12-30 | 2017-12-29 | 深圳市晟砡科技有限公司 | Transparent panel and its manufacture method and application |
| CN109270622A (en) * | 2018-10-22 | 2019-01-25 | 东莞市银泰丰光学科技有限公司 | A kind of processing method changing glass light guide plate surface tension and water droplet angle |
| WO2019129110A1 (en) * | 2017-12-28 | 2019-07-04 | 华为技术有限公司 | Mobile terminal housing and mobile terminal |
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| CN108191260B (en) * | 2018-02-13 | 2019-12-13 | 江苏奥蓝工程玻璃有限公司 | High-temperature-resistant low-radiation coated glass |
| CN116299791A (en) * | 2018-03-02 | 2023-06-23 | 康宁公司 | Antireflective coatings and articles and methods of forming antireflective coatings and articles |
| CN108490514A (en) * | 2018-07-03 | 2018-09-04 | 佛山王氏航空光学科技有限公司 | A kind of antifog transparent face mask of aspheric curve plastics heat conduction |
| CN109650740A (en) * | 2018-12-17 | 2019-04-19 | 佛山市易晟达科技有限公司 | A kind of cover board |
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- 2017-07-05 CN CN201720809527.8U patent/CN207669894U/en active Active
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| CN107522409A (en) * | 2016-12-30 | 2017-12-29 | 深圳市晟砡科技有限公司 | Transparent panel and its manufacture method and application |
| WO2019129110A1 (en) * | 2017-12-28 | 2019-07-04 | 华为技术有限公司 | Mobile terminal housing and mobile terminal |
| CN109270622A (en) * | 2018-10-22 | 2019-01-25 | 东莞市银泰丰光学科技有限公司 | A kind of processing method changing glass light guide plate surface tension and water droplet angle |
Also Published As
| Publication number | Publication date |
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| CN207671933U (en) | 2018-07-31 |
| CN107522409A (en) | 2017-12-29 |
| CN107417133A (en) | 2017-12-01 |
| CN207581671U (en) | 2018-07-06 |
| CN107445490A (en) | 2017-12-08 |
| CN207347401U (en) | 2018-05-11 |
| CN107382090A (en) | 2017-11-24 |
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