CN207601008U - The detection device of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe - Google Patents
The detection device of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe Download PDFInfo
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Abstract
The utility model is related to a kind of detection devices of flow pattern of gas-liquid two-phase flow in micro-pipe.The utility model includes fluid injection runner, recycling fluid channel and hermetic seal channel.At equal intervals recycle fluid channel both sides be respectively arranged three pairs of ultrasonic signal transmitter units and receiving end signal processing unit come when realizing gas-liquid recycling in pipe flow pattern real-time monitoring, then immersion liquid supply unit, sealing gas supply unit and gas-liquid recovery unit is coordinated to carry out cooperative self-adapted control.Immersion flow field is made constantly in dynamic balance state, to realize the scleronomic constraint on immersion flow field boundary, slug flow flow pattern in recycling fluid channel is eliminated, is vibrated caused by effectively controlling the fluid behavior in immersion liquid removal process.The utility model is started with from operating mode, it avoids due to being submerged outside unit caused by structure present situation to generating biphase gas and liquid flow between reclaiming chamber, it is vibrated caused by fluid behavior effectively in control immersion liquid removal process, in fundamentally elimination recycling fluid channel the problem of biphase gas and liquid flow mixing.
Description
Technical field
The utility model belongs to ultrasonic detection technology field, is related to a kind of detection dress of flow pattern of gas-liquid two-phase flow in micro-pipe
It puts.
Background technology
Modern lithographic equipment is based on optical lithography, using optical system the figure of mask plate accurately projection exposure
To being covered with the substrate of photoresist (such as：Silicon chip) on.It is including a ultraviolet source, an optical system, one piece by graphics chip
The projection mask plate of composition, a substrate to Barebone and a covering photosensitive photoresist.
Liquid immersion lithography (Immersion Lithography) equipment is by last between a piece of projection objective and silicon chip
The liquid of certain high refractive index is filled, relative to the dry lithography machine that intermediate medium is gas, improves the numerical value of projection objective
Aperture (NA), so as to improve the resolution ratio of lithographic equipment and depth of focus.At present frequently with scheme be local immersion method, i.e., by liquid
Body is limited in the regional area above silicon chip between the lower surface of last a piece of projection objective, and keeps the liquid of steady and continuous
Body flows.In stepping-scan-type lithographic equipment, silicon chip carries out the scanning motion of high speed, this athletic meeting in exposure process
Liquid in exposure area is taken away into flow field, so as to cause leakage, the liquid of leakage can form water mark on a photoresist, influence to expose
Light quality.In current existing solution, immersion liquid is limited to certain circle by hermetic seal using high pressure annular air curtain
In region, sweep speed can be significantly improved, is a kind of important seal means.But hermetic seal can cause sealing gas to be returned in liquid
It is inhaled while receipts by volume, forms biphase gas and liquid flow and enter in reclaiming chamber, thus cause vibration.Vibration brings change line width, reduces
A series of problems, such as picture contrast, reduction process window and CD homogenieities, so as to seriously affect exposure quality.Therefore, it submerges
Necessary emphasis solves the vibration problem as caused by biphase gas and liquid flow in removal process in formula photoetching technique.
To mitigate the influence that is brought to liquid immersion lithography of vibration, current existing solution mainly using passive vibration isolation and
The technology of gas-liquid separation recycling.Passive vibration isolation is isolated by generation vibration of the damper by motion parts and exposure system, suppression
During step-scan processed, since the subsystems such as work stage and mask platform have higher acceleration of motion and movement velocity, fortune
The large inertia and other external factor that dynamic component generates cause fluid power impact to be fluctuated with flow field, cause litho machine working centre portion
Point --- the vibration of exposure system.Gas-liquid separation recycling is by filling porous Jie of hydrophobe in the reclaiming chamber of immersion system
Matter realizes gas-liquid two-phase separation, reduces pulsatile impact caused by gas-liquid interface rupture in gas-liquid mixing process.But exist with
Lower deficiency：
Passive vibration isolation only considered by designing buffer structure, inhibit step-scan in the process due to the variation of motion state
The stability of caused immersion liquid supply, gas-liquid separation recycling only considered the gas-liquid two-phase recycling due to being brought using hermetic seal
In the process, the pulsatile impact caused by gas-liquid two-phase interfacial rupture in reclaiming chamber, by above two vibration damping mode, reduces light
The quarter overwhelming majority vibration that occurs in the process of running of machine, but have ignored using during negative pressure withdrawal liquid, due to
Gas-liquid flow velocity is relatively low, recycles in microchannel and easily forms slug flow, refers to the gas-liquid two that one section of air column, one section of fluid column are alternately present
Phase flow regime.However photoetching technique needs to reach high operating accuracy, it is increasingly deep with the exploitation and research of new material,
Precision is gradually promoted, and the requirement to vibration is also gradually promoted, then the interior microvibration brought due to slug flow of recycling fluid channel
It is also required to draw attention.Slug flow brings vibration, and when slug flow occurs, instantaneous liquid flow increases in pipe, and gas flow
Almost it is reduced to 0；When liquid plug by after, moment gas flow can equally increase sharply in pipe.The big ups and downs of flow and pressure, shadow in pipe
Ring the steady operation of exposure system.This is because to generation gas-liquid two between reclaiming chamber outside submergence unit caused by structure present situation
Phase stream can not avoid, so only starting with from operating mode, by increasing the flow pattern detected and controlled in device realization recycling fluid channel
The problem of maintaining the state of annular flow, fundamentally eliminating biphase gas and liquid flow mixing in recycling fluid channel, reduces vibration.
Invention content
The purpose of this utility model is just to provide a kind of detection device of flow pattern of gas-liquid two-phase flow in micro-pipe.
The utility model includes fluid injection runner, recycling fluid channel and hermetic seal channel.The fluid injection runner, recycling miniflow
Road and hermetic seal channel are arranged in submergence unit.Submergence unit center is circular platform type projection lens set projection objective placing groove,
Set gradually fluid injection runner, recycling fluid channel and hermetic seal channel outward using projection objective placing groove central axes as the center of circle.Fluid injection
Runner is looped around projection objective placing groove surrounding.Fluid channel and hermetic seal channel are recycled including multiple with projection objective placing groove
Central axes are the equally distributed miniature circular column type channel micro-pipe in the center of circle, and each micro-pipe is each perpendicular to silicon chip setting.Fluid injection runner returns
It is gap flow field to receive the gap between fluid channel and silicon chip；It is close to recycle the gap between fluid channel, hermetic seal channel and silicon chip
Seal gas passage.Silicon chip bottom is provided with silicon chip strain detection sensor array.
The fluid injection runner is connect with fluid injection volume control device, and fluid injection volume control device includes liquid-supplying system, surpasses
Pure water processor and liquid flow controller, for providing immersion fluid for immersion flow field；Fluid channel is recycled to fill with vacuum pump
Connection is put, vacuum pump apparatus includes vacuum pump and its preposition water collector, for recycling the fluid in fluid channel；It is airtight
Envelope channel is connect with gas sealing mechanism, and hermetic seal channel includes air compressor machine and gas flow controller, for hermetic seal channel
Interior injection sealing gas.
It is both provided at ultrasonic signal transmitting module and receiving end signal in each micro-pipe in the recycling fluid channel
Manage module；The ultrasonic wave that ultrasonic signal transmitting module and receiving end signal processing module are set for three pairs of difference along micro-pipe successively
Signal transmitter unit and receiving end signal processing unit, three pairs of ultrasonic signal transmitter units and receiving end signal processing unit pair
Claim to be mounted on the both sides for recycling each micro-pipe in fluid channel, be equidistantly positioned along journey.
Preferably, the ultrasonic signal transmitting and receiving unit in recycling fluid channel lower port setting, distance
Recycle fluid channel bottom surface at least 1mm distances.In the ultrasonic signal transmitting close to the upper port setting of recycling fluid channel and receive
Unit side, apart from reclaiming chamber bottom at least 3mm distances.
The utility model detects liquid plug by arranging ultrasonic detection device on recycling fluid channel side, obtains in runner and flows
The variation of type.Then fluid injection, gas flow are changed according to this signal in real time and adjusts recycling negative pressure, realized by feedback control
Ensure litho machine stable operation simultaneously, immersion flow field constantly in dynamic balance state, realizes the stabilization on immersion flow field boundary about
Beam, while eliminate slug flow flow pattern in recycling fluid channel.The detection of flow pattern in the recycling fluid channel that ultrasonic detection device obtains
Value inputs in the control unit of fluid injection volume control device, gas sealing mechanism, vacuum pump apparatus, San Zheyi as feedback signal
Signal carries out changing fluid injection, gas flow in real time respectively and adjusts recycling negative pressure accordingly, is ensureing that immersion flow field is completely and anti-
Under the premise of non-return receipts negative pressure causes excessive silicon chip strain, avoid liquid plug in the recycling fluid channel of immersion liquid control unit and pass through
When, cause the big ups and downs of flow and pressure, so as to form stable annular flow in pipe.Start with from operating mode, realize and avoid
Due to being submerged caused by structure present situation to biphase gas and liquid flow is generated between reclaiming chamber outside unit, immersion liquid recycling is effectively controlled
It is vibrated caused by fluid behavior in the process, is fundamentally eliminating the problem of biphase gas and liquid flow mixes in recycling fluid channel, reducing
Vibration.
Description of the drawings
Fig. 1 is submergence unit and the rough schematic view of projection lens set assembling in immersed photoetching machine；
Fig. 2 is the sectional view that unit is submerged in Fig. 1；
Fig. 3 is the vertical view that unit is submerged in Fig. 1；
Fig. 4 is Liquid Flow state when recycling fluid channel micro-pipe aneroid plug；
Fig. 5 is Liquid Flow state when recycling fluid channel micro-pipe liquid plug；
Fig. 6 is variations in flow patterns schematic diagram in recycling fluid channel.
Specific embodiment
As shown in Figure 1, the submergence unit 2 of immersed photoetching machine is arranged among projection lens set 1 and silicon chip 3；Projection is saturating
1 bottom surface of microscope group is touched with immersion fluid in submergence unit 2, and there are gaps between submergence 2 lower surface of unit and silicon chip 3.For cooperation
Projection lens set 1 uses, and submergence unit 2 is cylindrical type.In exposure process, the light sent out from light source 4 is (such as：ArF quasi-molecules swash
Light) by being aligned between the mask plate 6 being placed in mask stage 5, projection lens set 1 and lens-substrate full of immersion liquid
Gap flow field is exposed the photoresist on 3 surface of silicon chip.
As shown in Figures 2 and 3, in a kind of micro-pipe flow pattern of gas-liquid two-phase flow detection device, including fluid injection runner 7A, recycling it is micro-
Runner 7B and hermetic seal channel 7C.Fluid injection runner 7A, recycling fluid channel 7B and hermetic seal channel 7C are arranged in submergence unit 2.
It is circular platform type projection lens set projection objective placing groove 7D to submerge 2 center of unit, using projection objective placing groove 7D central axes as circle
The heart sets gradually fluid injection runner 7A, recycling fluid channel 7B and hermetic seal channel 7C outward.Fluid injection runner 7A is looped around projection objective
Placing groove surrounding.Fluid channel 7B and hermetic seal channel 7C is recycled including multiple using projection objective placing groove 7D central axes as the center of circle
Equally distributed miniature circular column type channel (micro-pipe), each micro-pipe are each perpendicular to silicon chip setting.Fluid injection runner 7A, recycling fluid channel
Gap between 7B and silicon chip 3 is gap flow field 10；Gap between recycling fluid channel 7B, hermetic seal channel 7C and silicon chip 3 is
Sealed gas passageway 11.3 bottom of silicon chip is provided with silicon chip strain detection sensor array 17.
Fluid injection runner 7A is connect with fluid injection volume control device 12, and fluid injection volume control device 12 includes liquid-supplying system, surpasses
Pure water processor and liquid flow controller, for providing immersion fluid for immersion flow field；Recycle fluid channel 7B and vacuum pump
Device 13 connects, and vacuum pump apparatus 13 includes vacuum pump and its preposition water collector, for recycling in recycling fluid channel 7B
Fluid；Hermetic seal channel 7C is connect with gas sealing mechanism 14, and hermetic seal channel 7C includes air compressor machine and gas flow controller, is used
In injecting sealing gas into hermetic seal channel 7C.
Ultrasonic signal transmitting module 15 and receiving end signal processing are both provided in recycling fluid channel 7B in each micro-pipe
Module 16；Ultrasonic signal transmitting module 15 and receiving end signal processing module 16 surpass difference for three along micro-pipe setting successively
Acoustic signals transmitter unit 15A, 15B, 15C and receiving end signal processing unit 16A, 16B, 16C, three pairs of ultrasonic signal transmittings
Unit and receiving end signal processing unit are symmetrically mounted on the both sides of each micro-pipe in recycling fluid channel 7B, are set along journey is equidistant
It puts.
In recycling fluid channel 7B lower ports, because of the effect of hermetic seal, there are stronger gas by immersion liquid flow field boundary 10A
The shear action of stream so that immersion liquid is difficult to overflow from submergence unit bottom.Recovery channel is mixed into the position of runner mouth
Sealing gas and immersion liquid is not sufficiently mixed develops into stable biphase gas and liquid flow, set here ultrasonic signal emit and
Reception device, measured result are inaccurate, should at least distance 1mm and more than distance.Close to recycling fluid channel 7B upper ports one
Side, ultrasonic signal transmitter-receiver device should also keep at a distance, the reason is that since ultrasound signal receipt device perceives out
Slug flow occurs, and temporal prolongs there are one to changing fluid injection, gas flow and adjusting the coordinated of recycling negative pressure three
Late, it is if excessively near from the reclaiming chamber of rear end, can cause slug flow do not eliminate also be just directly entered in reclaiming chamber cause vibration etc. ask
Topic, influences exposure quality.Therefore, the positional distance reclaiming chamber bottom 3mm of sensor and more than distance are suitable.
The course of work is as follows：Vacuum pump apparatus 13 and gas sealing mechanism 14 should be first opened before litho machine opens work,
The situation that immersion flow field 10 leaks immediately will not occur when liquid injects in guarantee, therefore should be to fluid injection volume control device
12 reservoir quantity anticipation.
Fluid is entered by fluid injection runner 7A in gap flow field 10, then is flowed out by recycling fluid channel 7B, completes the update in flow field.
Sealing gas is injected by hermetic seal channel 7C, plays the role of sealing flow field.
Ultrasonic signal transmitting module 15 generates high-frequency ultrasonic signal, transmission recycling fluid channel 7B；Since ultrasonic wave is believed
Number there is different transmission rates in gas and liquid, ultrasonic signal passes through in gap flow field 10 and sealed gas passageway 11
Signal attenuation occurs for gas-liquid medium, if fluid injection runner micro-pipe fluid cross-section liquid holdup is higher, ultrasonic signal attenuation is bigger；
If fluid injection runner micro-pipe fluid cross-section is liquid filled, ultrasonic signal attenuation reaches maximum.
16 receiving attenuation signal of receiving end signal processing module, is amplified signal shaping filter, analog-to-digital conversion process,
Whether decayed suddenly according to ultrasonic signal, whether have liquid plug 10B in real-time judge recycling fluid channel 7B, and fill by vacuum pump
Put 13 and fluid injection volume control device 12 come realize recycling fluid channel in slug flow flow pattern elimination.Ultrasonic wave receiving end signal
The judging result of flow pattern represents fluid injection runner micro-pipe as feedback signal with 0 to 1 in the recycling fluid channel that processing unit 16 obtains
For fluid cross-section liquid holdup from 0% to 100%, receiving end signal processing unit judges that flow pattern obtains feedback signal and transmits backward
Feedback result；By in feedback signal input fluid injection volume control device 12, vacuum pump apparatus 13 and gas sealing mechanism 14, respectively fill
It puts and carries out changing fluid injection, gas flow in real time respectively according to this signal and adjust recycling negative pressure.
What three receiving end signal processing unit 16A, 16B, 16C processing obtained in intersection comparison step two believes along journey attenuation
Number value, detect along journey thickness of liquid film consistency.Explanation has good consistent along journey thickness of liquid film when three signal value differences are smaller
Property；Explanation flow pattern and unstable in recycling fluid channel 7B at this time when three signal values difference is more apparent；It realizes to recycling fluid channel
Whether flow pattern is the monitoring for stablizing annular flow in 7B.If wherein a certain signal close to when in micro-pipe no liquid by signal value when
Illustrate that recycling fluid channel 7B occurs immersion flow field missing.It recycles fluid channel 7B and immersion flow field missing occurs, then increase fluid injection flow,
And negative pressure is adjusted according to the above method, until flow field is complete, and maintain stable annular flow flow pattern.
As shown in figure 4, in aneroid plug, stable annular flow is maintained in flowing in recycling fluid channel 7B, is presented intermediate
Gaseous core, uniformly attached wall is upward for withdrawal liquid, intersects and compares three receiving end signal processing units 16 and handle decaying along journey of obtaining
It is smaller and without apparent attenuation can to obtain difference for signal value.
As shown in figure 5, when liquid plug 10B occurs, recycle flow pattern in fluid channel 7B and slug flow hair is flowed to by the ring-type stablized
Exhibition, when liquid plug 10B is appeared in equipped among ultrasonic detection device, ultrasonic signal can significantly decay, so as to receiving terminal
To signal have notable difference earlier above.When liquid plug 10B occurs more frequent in recycling fluid channel, signal frequency of fadings is higher,
It is vibrated caused by biphase gas and liquid flow in removal process more apparent；By being equidistantly positioned ultrasound along journey in recycling fluid channel 7B
Wave signal emits and receiving unit, the flow regime variation in the fluid channel 7B of detection recycling in real time, and according to this Signal Regulation with
Reduce in removal process and vibrated caused by biphase gas and liquid flow.
When ultrasonic signal, which is shown, to be stablized, just illustrate to recycle no liquid plug in fluid channel 7B and pass through；Work as ultrasonic signal
When display reduces suddenly, illustrating to recycle in fluid channel 7B has liquid plug 10B to pass through, and realizes to slug flow flow pattern in recycling fluid channel 7B
Detection, judge recycle negative pressure or fluid injection flow it is whether appropriate.If liquid plug 10B occurs in recycling fluid channel 7B, increase gas injection rate
With recycling negative pressure, so as to increase gas flow rate to destroy liquid plug, fluid channel is realized while ensureing that immersion flow field boundary is complete
Interior flow pattern flows to the conversion of annular flow from slug.Continue to increase gas injection rate and recycle negative pressure, and continue to intersect and compare three receptions
The processing of end signal processing unit 16 obtain along journey deamplification value, when three signals differences are smaller, until reaching good edge
Journey thickness of liquid film consistency.
Silicon chip strain detection sensor array 17 is detected in the litho machine course of work, and silicon chip becomes in immersion flow field lower stress
It is strained caused by changing.When the strain variation detected illustrates that litho machine operating status is suitable in the reasonable scope, holding submerges
Flow field is constant, to fluid injection volume control device, gas sealing mechanism and vacuum pump apparatus without adjusting control, maintains original work
Make state.
If the strain variation detected is more than the threshold value that silicon chip can be born, illustrate that silicon chip deformation at this time is serious, and silicon
Piece deformation can lead to a series of serious exposure problems such as line defect, and homepage volume control device should be controlled to reduce note at this time
Flow quantity reduces the strain of silicon chip.It repeats step 1 and the flow pattern recycled in fluid channel 7B is rationally adjusted to three.This method is being protected
Card immersion flow field completely and prevents recycling negative pressure from causing under the premise of excessive silicon chip strains, and recycling miniflow is adjusted with the mode of control
Flow regime in road 7B is vibrated caused by effectively controlling the fluid behavior (slug flow) in immersion liquid removal process.
Using the negative pressure value and gas flow of vacuum pump setting, fluid channel is calculated with reference to the structure size of recycling fluid channel 7B
Interior superficial gas flow velocity, it is desired to be kept in runner with reference to gas-liquid flow velocity as shown in Figure 6 and corresponding flow pattern curve
Stable annular flow flow pattern is indicated in figure by right scribing line, judges currently to return according to the superficial gas flow velocity precalculated
Corresponding suitable fluid flow in the case of negative pressure and gas flow is received, and the fluid injection of fluid injection flow controlling unit is adjusted with this
Amount.Later flow pattern in regulation pipe, effectively control submergence are realized further according to the detection method of flow pattern of gas-liquid two-phase flow in the micro-pipe of front
It is vibrated caused by slug flow in liquid recovery process.
The size that vacuum pump apparatus 13 adjusts negative pressure passes through the rotational speed regulation of vacuum pump, the automatic adjustment rotating speed, side
Method is that vacuum cavity is made to be pressed onto vacuum state from air, measures and records the vacuum degree parameter during this in vacuum cavitations list
Member, 0 represents atmospheric pressure, and 1 represents vacuum, and centre is transition state；Vacuum cavitations unit receives 5 signal processing of ultrasonic wave receiving terminal
The target vacuum index sent out afterwards, completes parameter setting, and reading has been deposited frequency signal close in vacuum degree parameter and has been sent to
Frequency converter；Frequency converter makes vacuum cavity reach target vacuum by the change to motor speed, control vacuum revolution speed,
Realize rotational speed regulation.
Gas sealing mechanism 14 changes gas flow by gas flow controller to the sealing control of immersion flow field and realizes.This
The flow automatic regulation at place, it may be that vacuum cavitations unit receives the target vacuum sent out after the processing of ultrasonic wave receiving end signal
Index, completes parameter setting, and reading has deposited frequency signal close in vacuum degree parameter and has been sent to frequency converter；It is right that frequency converter passes through
The change of motor speed controls vacuum revolution speed, vacuum cavity is made to reach target vacuum.Flow automatic regulation herein,
When recycling fluid channel generation immersion flow field missing, current recycling negative pressure feelings are judged according to gas-liquid flow velocity and corresponding flow pattern curve
Corresponding maximum fluid flow adjusts the reservoir quantity of fluid injection flow controlling unit under condition, realizes flow-rate adjustment.
Claims (2)
1. a kind of detection device of flow pattern of gas-liquid two-phase flow in micro-pipe, including fluid injection runner, recycling fluid channel and hermetic seal channel；
It is characterized in that：Fluid injection runner, recycling fluid channel and the hermetic seal channel is arranged in submergence unit；Submerge unit center
For circular platform type projection lens set projection objective placing groove, fluid injection is set gradually outward using projection objective placing groove central axes as the center of circle
Runner, recycling fluid channel and hermetic seal channel；Fluid injection runner is looped around projection objective placing groove surrounding；Recycle fluid channel and airtight
Seal channel including multiple using projection objective placing groove central axes as the equally distributed miniature circular column type channel micro-pipe in the center of circle, each
Micro-pipe is each perpendicular to silicon chip setting；Gap between fluid injection runner, recycling fluid channel and silicon chip is gap flow field；Recycle miniflow
Gap between road, hermetic seal channel and silicon chip is sealed gas passageway；Silicon chip bottom is provided with silicon chip strain detection sensor
Array；
The fluid injection runner is connect with fluid injection volume control device, and fluid injection volume control device includes liquid-supplying system, ultra-pure water
Processing unit and liquid flow controller, for providing immersion fluid for immersion flow field；Fluid channel is recycled with vacuum pump apparatus to connect
It connects, vacuum pump apparatus includes vacuum pump and its preposition water collector, for recycling the fluid in fluid channel；Hermetic seal is led to
Road is connect with gas sealing mechanism, and hermetic seal channel includes air compressor machine and gas flow controller, for being noted into hermetic seal channel
Enter sealing gas；
Ultrasonic signal transmitting module and receiving end signal processing mould are both provided in the recycling fluid channel in each micro-pipe
Block；The ultrasonic signal that ultrasonic signal transmitting module and receiving end signal processing module are set for three pairs of difference along micro-pipe successively
Transmitter unit and receiving end signal processing unit, three pairs of ultrasonic signal transmitter units and receiving end signal processing unit are symmetrically pacified
The both sides of each micro-pipe, are equidistantly positioned along journey in recycling fluid channel.
2. the detection device of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe as described in claim 1, it is characterised in that：It is described
Recycle ultrasonic signal transmitting and the receiving unit of fluid channel lower port setting, distance recycling fluid channel bottom surface at least 1mm away from
From；In the ultrasonic signal transmitting set close to recycling fluid channel upper port and receiving unit side, apart from reclaiming chamber bottom extremely
Few 3mm distances.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201721804043.0U CN207601008U (en) | 2017-12-21 | 2017-12-21 | The detection device of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201721804043.0U CN207601008U (en) | 2017-12-21 | 2017-12-21 | The detection device of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe |
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| CN207601008U true CN207601008U (en) | 2018-07-10 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107991384A (en) * | 2017-12-21 | 2018-05-04 | 浙江启尔机电技术有限公司 | The detection device and method of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe |
-
2017
- 2017-12-21 CN CN201721804043.0U patent/CN207601008U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107991384A (en) * | 2017-12-21 | 2018-05-04 | 浙江启尔机电技术有限公司 | The detection device and method of flow pattern of gas-liquid two-phase flow in a kind of micro-pipe |
| CN107991384B (en) * | 2017-12-21 | 2023-10-13 | 浙江启尔机电技术有限公司 | Device and method for detecting flow pattern of gas-liquid two-phase flow in microtubule |
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