CN112684666B - Immersion liquid supply recovery device for inhibiting pressure pulsation and vibration of gas-liquid two-phase flow - Google Patents
Immersion liquid supply recovery device for inhibiting pressure pulsation and vibration of gas-liquid two-phase flow Download PDFInfo
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Abstract
The present invention relates to a liquid immersion supply and recovery device that suppresses pressure pulsation and vibration of a gas-liquid two-phase flow. The sealed pumping cavity is communicated with the sealed pumping port, the sealed pumping cavity is also communicated with the sealed pumping flow path, the sealed pumping system is communicated with the sealed pumping flow path and provides a vacuum source for the sealed pumping flow path, and the sealed pumping port extracts the immersion liquid from the third gap and simultaneously extracts gas outside the radial direction of the immersion liquid; the auxiliary air supply flow path is communicated with the sealed pumping cavity, and wet gas is supplied to the sealed pumping cavity through the auxiliary air supply flow path. The invention can adapt to the influence of the ratio change of the gas and the liquid extracted by the sealed pumping outlet on the flow pattern of the gas and the liquid two-phase flow, and inhibit the pressure pulsation and vibration in the sealed pumping cavity and the sealed pumping flow path; the wet gas is supplied to the sealed pumping cavity through the auxiliary gas supply flow path, so that the temperature drop generated by the evaporation of the liquid is restrained, and the temperature stability of the immersion liquid and the photoetching machine is improved; thereby improving the exposure quality of the photoetching machine.
Description
Technical Field
The invention belongs to the technical field and relates to a device for supplying and recovering immersion liquid for inhibiting pressure pulsation and vibration of a gas-liquid two-phase flow.
Background
A photolithography machine is one of the core equipment for manufacturing very large scale integrated circuits, which precisely projects a circuit pattern on a reticle onto a photoresist-coated substrate using an optical system and modifies the photoresist exposure, thereby leaving circuit pattern information on the substrate. It includes a laser light source, a projection objective system, a projection reticle containing a circuit pattern, and a substrate coated with a photosensitive photoresist.
In contrast to a dry lithographic apparatus in which the intermediate medium is a gas, an immersion lithographic (Immersion Lithography) apparatus increases the resolution and depth of focus of the lithographic apparatus by filling the gap between the last projection objective and the substrate with a liquid of a certain high refractive index, and by increasing the refractive index (n) of the gap liquid medium to increase the Numerical Aperture (NA) of the projection objective. In the current mainstream lithography technology, immersion lithography is widely used because of its good inheritance from earlier dry lithography. For filling with immersion liquid, however, the solution widely used is the local immersion method, i.e. the use of an immersion liquid supply and recovery device to confine the liquid to a local area between the lower surface of the last projection objective and the upper surface of the substrate. Maintaining the optical consistency and transparency of the immersion liquid in the exposure area is critical to ensuring the quality of immersion lithography exposure. Therefore, in the prior art, the immersion flow field is updated in real time through liquid injection and recovery, and photochemical pollutants, local heat, micro-nano bubbles and the like are timely taken away from the core exposure area, so that the high purity and uniformity of the immersion liquid are ensured.
As shown in fig. 1 and 2, the projection objective system in the immersion lithography machine has a terminal objective 1 nearest to a substrate 2, and a first gap 11 is formed between the terminal objective 1 and the substrate 2; an immersion liquid supply and recovery device 3 is provided around the end objective lens 1, the immersion liquid supply and recovery device 3 supplying an immersion liquid LQ into the first gap 11, the immersion liquid supply and recovery device 3 having a center through hole 31 for passing the exposure laser beam from the end objective lens 1; when the exposure laser beam carrying the circuit pattern information passes through the end objective lens 1, the exposure laser beam enters the immersion liquid LQ, passes through the immersion liquid LQ and then is projected on the substrate 2; for an exposure laser beam with a wavelength of 193nm commonly used in an immersion lithography machine, the immersion liquid LQ may use ultrapure water, and the refractive index of the ultrapure water for 193nm laser is greater than that of air, so that, compared with a dry lithography machine, the exposure laser beam of the immersion lithography machine can be converged into a smaller-scale exposure target area after passing through the end objective lens 1 and the immersion liquid LQ, thereby forming a smaller-scale circuit pattern on a substrate, and improving the exposure resolution of the lithography machine. In order to avoid that the immersion liquid supply and recovery device 3 transmits vibrations and thermal disturbances to the end objective 1 to disturb its optical properties, the immersion liquid supply and recovery device 3 is arranged not to be in contact with the end objective 1, so that a second gap 12 is formed between the end objective 1 and the immersion liquid supply and recovery device 3. Since existing immersion lithography machines move the substrate 3 relative to the end objective 1 according to the scanning stepping principle during exposure, the exposure laser beam scanningly projects a single circuit pattern into a single target area of the substrate 2 and stepwisely projects the same circuit pattern into multiple target areas of the substrate 2; since the substrate 2 moves relative to the end objective 1 and the immersion liquid supply and recovery device 3 is stationary relative to the end objective 1, the substrate 2 moves relative to the immersion liquid supply and recovery device 3, and a third gap 13 exists between the substrate 2 and the immersion liquid supply and recovery device 3.
Since the laser beam heats the immersion liquid LQ during exposure, the photoresist on the substrate 2 undergoes a photochemical reaction that may produce a release of contaminants into the immersion liquid LQ, and a change in the temperature and cleanliness of the immersion liquid LQ will result in a change in its optical properties; the immersion liquid supply and recovery device 3 is thus arranged to drive the continuous flow of immersion liquid LQ for maintenance of its temperature and cleanliness, in particular, a main liquid injection port 4 is arranged in the immersion liquid supply and recovery device 3 towards the second gap 12, the immersion liquid LQ being supplied to the second gap 12 via the main liquid injection port 4 using the immersion liquid supply system LS; a main pumping outlet 5 facing the second gap 12 and located at the opposite side of the main liquid injection port 4 is provided in the immersion liquid supply and recovery device 3, and the main pumping system VM is used to pump the immersion liquid LQ through the main pumping outlet 5; most of the immersion liquid LQ flows from the main liquid injection port 4 into the second gap 12 and then into the first gap 11, and then the immersion liquid in the first gap 11 and the second gap 12 is pumped out by the main pumping port 5; a part of the immersion liquid LQ flows into the third gap 13, and in order to avoid that a large amount of immersion liquid LQ remains on the surface of the substrate 2 to cause a photolithography defect of the substrate 2 and avoid that the immersion liquid LQ wets other components to cause damage, the immersion liquid supply and recovery device 3 is provided with a sealing pumping port 6 on the surface facing the substrate 2, and the sealing pumping port 6 can be a circle of uniformly arranged small holes or annular gaps, and the immersion liquid LQ in the third gap 13 is pumped out through the sealing pumping port 6 by using the sealing pumping system VC. In order to avoid that the substrate 2 pulls the immersion liquid LQ during the scanning and stepping movement, and to avoid that the substrate 2 is separated from the constraint of the sealing pump drainage port 6 due to excessive pulling of the immersion liquid LQ during the high-speed movement, an airtight seal 7 is arranged on the radial outer side of the sealing pump drainage port 6 in the immersion liquid supply and recovery device 3, a gas supply system AS is used for supplying a gas flow to the third gap 13 through the airtight seal 7, and under the action of the increased pressure and the purging of the gas flow, the constraint capacity of the sealing pump drainage port 6 on the immersion liquid LQ is also enhanced. The main pumping port 5 and the sealing pumping port 6 completely pump out the immersion liquid LQ, a meniscus 20 is formed between the immersion liquid LQ and the peripheral gas, and an immersion liquid space surrounded by the meniscus 20 is an immersion flow field.
As shown in fig. 1, 2 and 3, the immersion liquid in the third gap 13 is pumped out through the sealed pumping port 6 and then enters the sealed pumping chamber 61, the sealed pumping chamber 61 communicates with a plurality of sealed pumping ports 6, for example, in fig. 2 the sealed pumping chamber 61 is an annular chamber, and the sealed pumping chamber 61 also communicates with the sealed pumping flow path 62; the immersion liquid in the sealed pumping chamber 61 is pumped out to the sealed pumping system VC via a sealed pumping flow path 62. The gas supplied from the gas supply system AS is pumped into the seal pumping port 6 and the subsequent flow path together with the immersion liquid, forming a gas-liquid two-phase flow. The gas-liquid two-phase flow can cause remarkable vibration, and the vibration intensity of the gas-liquid two-phase flow is different according to the ratio of the gas to the liquid; as shown in fig. 3, as the volume flow rate of the gas to the liquid in the flow path is larger and the volume ratio of the gas is higher, the flow pattern of the gas-liquid two-phase flow gradually changes from the bubble flow shown in fig. 3 (a) to the bullet flow shown in fig. 3 (b) and even to the annular flow shown in fig. 3 (c); the gas-liquid two-phase flow of different flow patterns has different vibration characteristics, generally, bubble flow with a remarkably high liquid phase volume ratio and annular flow with a remarkably high gas phase ratio have more stable pressure characteristics, and the elastic flow with a small gas-liquid phase ratio difference vibrates more severely. In an immersion lithography machine, since the substrate 2 moves relative to the immersion liquid supply and recovery device 3, pulling the immersion liquid by the substrate 2 may cause a change in the amount of immersion liquid extracted by the seal pump outlet 6, a situation may occur in which the seal pump outlet 6 pumps only a small amount of immersion liquid and pumps a large amount of gas, or the seal pump outlet 6 pumps substantially all of the immersion liquid, such a change in the pumping capacity of the immersion liquid may cause a severe flow pattern of pressure pulsation and vibration in the seal pump outlet cavity 61, and an additional fluid pressure pulsation and vibration may be introduced during the transition of the gas-liquid two-phase flow pattern in the seal pump outlet cavity 61. The fluid pressure pulsations in the sealed pumping chamber 61 and in the sealed pumping channel 62 can affect the negative pressure in the vicinity of the sealed pumping port 6, resulting in a reduced confinement capacity for the meniscus 20, vibrations can affect the positioning accuracy of the immersion liquid supply and recovery device 3, vibrations can also be transmitted to the projection objective and the substrate, which ultimately will lead to a reduced exposure quality.
Disclosure of Invention
The invention aims to provide an immersion liquid supply recovery device for inhibiting pressure pulsation and vibration of a gas-liquid two-phase flow, which is used for inhibiting the pressure pulsation and vibration of the gas-liquid two-phase flow in a sealed pumping cavity and a sealed pumping flow path.
The invention surrounds the radial outer side of the terminal objective lens, the bottom surface of the immersion liquid supply and recovery device faces the substrate and forms a third gap with the substrate, and the third gap comprises a sealed pumping port, a sealed pumping cavity and a sealed pumping flow path; the sealing pumping port is positioned on the bottom surface of the immersion liquid supply and recovery device, which faces the substrate; the sealed pumping cavity is communicated with the sealed pumping port; the sealed pumping cavity is also communicated with the sealed pumping flow path; the sealed pumping system is communicated with the sealed pumping flow path and provides a vacuum source for the sealed pumping flow path; the sealing pumping port is used for pumping the immersion liquid from the third gap and simultaneously pumping gas radially outside the immersion liquid; the air pump further comprises an auxiliary air supply flow path, wherein the auxiliary air supply flow path is communicated with the sealed pumping cavity, and air is supplied to the sealed pumping cavity through the auxiliary air supply flow path.
The volume flow of the gas provided by the auxiliary gas supply flow path to the sealed pumping cavity is 10 times greater than the volume flow of the immersed liquid pumped and discharged through the sealed pumping port.
And the flow rate of the gas provided by the auxiliary gas supply flow path to the sealed pumping cavity is more than 10SLPM.
At least two sealed drainage flow paths are communicated with the sealed drainage cavity, and the communication position of the auxiliary air supply flow path and the sealed drainage cavity is at the middle position of the communication position of the two adjacent sealed drainage flow paths.
The two sealing pumping flow paths are respectively communicated with the sealing pumping cavity at two ends of the diameter of the sealing pumping cavity, which is parallel to the scanning direction, and the two auxiliary air supply flow paths are respectively communicated with the sealing pumping cavity at two ends of the diameter of the sealing pumping cavity, which is perpendicular to the scanning direction.
The four sealing pumping flow paths are respectively communicated with the sealing pumping cavity at two ends of the diameter of the sealing pumping cavity parallel to and vertical to the scanning direction, and an auxiliary air supply flow path is respectively arranged at the middle position of two adjacent sealing pumping flow paths and is communicated with the sealing pumping cavity.
The auxiliary gas cavity is communicated with the auxiliary gas supply flow path, and gas is supplied to the auxiliary gas supply flow path and the sealed pumping cavity through the auxiliary gas cavity.
The auxiliary gas cavity is annular similar to the sealed pumping cavity, and the auxiliary gas supply flow path is a plurality of through holes which are uniformly distributed.
The air supply cavity is communicated with the airtight seal, is also communicated with the sealed pumping drainage flow path and provides air for the auxiliary air supply flow path and the sealed pumping drainage cavity through the air supply cavity.
The auxiliary supply flow path provides a humid gas containing immersion liquid vapour.
The air supplied to the sealed pumping chamber through the auxiliary air supply flow path is humid air with relative humidity of more than 80 percent.
The auxiliary air supply flow path is arranged to supply air to the sealed pumping cavity, the volume ratio of the air in the sealed pumping cavity is increased, so that the flow pattern of the gas-liquid two-phase flow in the sealed pumping cavity is more stable, the influence of the ratio change of the gas-liquid extracted by the sealed pumping port on the flow pattern of the gas-liquid two-phase flow can be adapted, the pressure pulsation and vibration in the sealed pumping cavity and the sealed pumping flow path are restrained, and the exposure quality of the photoetching machine is further improved; the wet gas is supplied to the sealed pumping cavity through the auxiliary gas supply flow path, so that the gas humidity of the gas-liquid two-phase flow in the sealed pumping cavity can be improved, the temperature drop generated by liquid evaporation is inhibited, the temperature stability of the immersion liquid and the photoetching machine is improved, and the exposure quality of the photoetching machine is further improved.
Drawings
FIG. 1 is a schematic longitudinal cross-sectional view of an immersion liquid supply recovery device and an immersion flow field;
FIG. 2 is a schematic bottom view of the immersion liquid supply and recovery apparatus;
FIG. 3 is a schematic flow pattern of a gas-liquid two-phase flow;
FIG. 4 is a schematic diagram of a first embodiment of the present invention;
FIG. 5 is a schematic diagram of a second embodiment of the present invention;
FIG. 6 is a schematic structural diagram of a third embodiment of the present invention;
FIG. 7 is a schematic diagram of a fourth embodiment of the present invention;
fig. 8 is a schematic structural diagram of a fifth embodiment of the present invention.
Detailed description of the preferred embodiments
Example 1
As shown in fig. 4, in the immersion liquid supply/recovery device for suppressing pressure pulsation and vibration of a gas-liquid two-phase flow, the immersion liquid supply/recovery device 3 surrounds the radial outside of the end objective lens 1, and the bottom surface of the immersion liquid supply/recovery device 3 faces the substrate 2 and forms a third gap 13 with the substrate 2; the immersion liquid supply and recovery device 3 comprises a sealed pumping outlet 6, a sealed pumping cavity 61 and a sealed pumping flow path 62; the sealing pumping port 6 is positioned on the bottom surface of the immersion liquid supply and recovery device 3 facing the substrate 2, and the sealing pumping port 6 can be a gap or a plurality of small holes; the sealed pumping cavity 61 is communicated with one or more sealed pumping ports 6; the sealed pumping chamber 61 is also communicated with a sealed pumping flow path 62; the sealed drainage system VC communicates with the sealed drainage flow path 62 and provides a vacuum source to the sealed drainage flow path 62; the seal extraction port 6 extracts the immersion liquid from the third gap 13, while extracting the gas radially outside the immersion liquid; the immersion liquid and the gas are pumped out by the sealed pumping outlet 6 at the same time, enter the sealed pumping cavity 61, and are pumped out by the sealed pumping system VC through the sealed pumping flow path 62; the immersion liquid supply and recovery device 3 further comprises an auxiliary air supply flow path 63, an auxiliary air source 64 supplies air to the auxiliary air supply flow path 63, and the auxiliary air supply flow path 63 is communicated with the sealed pumping cavity 61; the auxiliary air supply flow path 63 continuously supplies air to the seal pumping chamber 61, so that even if the amounts of liquid and air drawn by the seal pumping port 6 are changed, the volume ratio of the liquid and the air in the seal pumping chamber 61 tends to be maintained, and it is desirable to maintain the volume ratio of the air in the seal pumping chamber 61 significantly exceeding the volume ratio of the liquid, so that the gas and the liquid in the seal pumping chamber 61 tend to flow in layers, the gas tends to occupy the inner core of the chamber and the liquid tends to occupy the wall surface of the chamber, and the layered flow of the gas and the liquid is advantageous in suppressing pressure pulsation and vibration caused by mutual impact of the gas and the liquid. Therefore, with the immersion liquid supply and recovery device of the present invention, when the substrate 2 moves relative to the immersion liquid supply and recovery device 3 and the ratio of the gas to the liquid extracted by the seal pump discharge port 6 is changed by pulling the immersion liquid, the flow pattern of the gas-liquid two-phase flow in the seal pump discharge cavity 61 is still stable, which is beneficial to suppressing pressure pulsation and vibration caused in the seal pump discharge process and improving the exposure quality.
The total flow of immersion liquid drawn from the third gap 13 via the one or more sealing drains 6 is typically in the range 0.5SLPM to 1.5SLPM (SLPM, standard liters per minute), and gas, which typically provides a volume flow of immersion liquid of 20 to 40 times radially outward of the meniscus 20, is pumped along with the immersion liquid by the sealing drains 6, ensuring that the gas provides a sufficiently large barrier force to the meniscus 20 in a stationary state of the substrate 2 without excessively purging the meniscus 20; when the substrate 2 moves, the immersion liquid is pulled to cause the meniscus 20 to move to the radial inner side or the radial outer side, so that the coverage area of the immersion liquid on the sealing pumping port 6 is too small or too large, and the ratio of the gas to the liquid pumped by the sealing pumping port 6 is changed; the auxiliary gas supply flow path 63 supplies gas with a volume flow rate greater than 10 times that of the immersion liquid to the sealed pumping chamber 61, preferably gas with a flow rate greater than 5SLPM, more preferably gas with a flow rate greater than 10SLPM, and increases the volume ratio of the gas in the sealed pumping chamber 61, so that the gas-liquid two-phase flow in the sealed pumping chamber 61 can better maintain stable flow patterns when the ratio of the gas to the liquid extracted by the sealed pumping port 6 changes, and the gas and the liquid in the sealed pumping chamber 61 are promoted to tend to flow in a layered manner, thereby suppressing pressure pulsation and vibration.
Example two
As shown in fig. 5, during the projection of the exposure laser beam onto the substrate, the substrate is subjected to a scanning movement 21 in the up-down direction in the drawing, and the substrate has a high movement speed in the scanning movement 21; since the meniscus 20 is subjected to the greatest liquid squeezing force at both ends of the diameter parallel to the scanning direction, the nearby meniscus 20 is more likely to break; the provision of the seal pump drainage passages 62a and 62b, which communicate with the seal pump drainage chamber 61 at both ends of the diameter of the seal pump drainage chamber 61 parallel to the scanning direction, respectively, can provide the adjacent seal pump drainage port 6 with a stronger pumping capacity and a restraining capacity for the meniscus 20.
The auxiliary gas flow paths 63a and 63b are respectively communicated with the sealed pumping cavity 61 at two ends of the diameter of the sealed pumping cavity 61 perpendicular to the scanning direction, and the auxiliary gas flow can be better guided to completely flow through the sealed pumping cavity 61 by matching with the arrangement of the sealed pumping flow paths 62a and 62b so as to adapt to the condition of the change of pumping liquid proportion of the sealed pumping ports 6 at different positions.
The rest of the implementation is the same as in example one.
Example III
As shown in fig. 6, in addition to the scanning movement 21, the substrate is subjected to a stepping movement 22 in the left-right direction in the figure during the non-exposure time; the step movement 22 of the substrate causes the meniscus 20 to be subjected to a greater liquid squeezing force at the ends of the diameter parallel to the step direction, and the nearby meniscus 20 is more prone to fracture; the provision of the seal-pumping flow paths 62a, 62b, 62c and 62d communicating with the seal-pumping chamber 61 at both ends of the diameter of the seal-pumping chamber 61 parallel and perpendicular to the scanning direction, respectively, can provide the adjacent seal-pumping port 6 with a stronger pumping capacity and a restraining capacity for the meniscus 20.
The auxiliary gas flow paths 63a, 63b, 63c and 63d are arranged, and the middle positions of the two adjacent sealing pumping flow paths 62 are communicated with the sealing pumping cavity 61, so that the auxiliary gas can be better guided to completely flow through the sealing pumping cavity 61, and the condition that the pumping liquid ratio of the sealing pumping ports 6 at different positions is changed can be adapted.
The rest of the implementation is the same as in example one.
Example IV
As shown in fig. 7, an assist gas chamber 65 is provided, and an assist gas source 64 communicates with the assist gas chamber 65 via an assist gas source flow path 66 and supplies assist gas into the chamber; the auxiliary gas chamber 65 communicates with the sealed pumping chamber 61 through the auxiliary gas supply flow path 63. Preferably, the auxiliary gas chamber 65 is formed in a ring shape similar to the sealed pumping chamber 61, and the auxiliary gas supply flow path 63 may be an annular slit or a plurality of uniformly arranged through holes. In this embodiment, the auxiliary gas is first substantially uniformly dispersed into the auxiliary gas cavity 65, and then substantially uniformly flows into the vicinity of each seal pumping port 6 of the seal pumping cavity 61, so as to be timely mixed with the gas and the liquid pumped by the seal pumping port 6, and timely adjust the flow pattern of the gas-liquid two-phase flow in the seal pumping cavity 61, so as to better suppress pressure pulsation and vibration caused by the change of the flow pattern of the two-phase flow.
The rest of the implementation is the same as in example one.
Example five
AS shown in fig. 8, the immersion liquid supply/recovery device 3 has a gas supply chamber 71, the gas supply chamber 71 communicates with the airtight seal 7, and the gas supply system AS supplies a seal gas to the gas supply chamber 71 through the seal gas supply passage 67; the air supply chamber 71 communicates with the sealed suction chamber 61 through the auxiliary air supply flow path 63. The auxiliary air supply flow path 63 may be an annular slit or a plurality of through holes uniformly arranged. The gas supply system AS is used for simultaneously supplying gas to the third gap and the sealed pumping cavity 61, so that the number of gas sources can be reduced and the complexity of a flow path can be reduced while the effect of stabilizing the flow pattern of the gas-liquid two-phase flow is realized.
Example six
The assist gas supplied to the seal pumping chamber 61 via the assist gas supply flow path 63 is a wet gas containing the immersion liquid vapor, preferably a wet gas saturated with the immersion liquid vapor, for example, when ultrapure water is used as the immersion liquid, saturated wet air or air having a relative humidity of more than 80% is used as the assist gas to be supplied to the seal pumping chamber 61. The auxiliary air supply flow path 63 provides wet air to the sealed pumping cavity 61, so that the relative humidity of air in the sealed pumping cavity 61 and the downstream sealed pumping flow path 62 can be improved, evaporation of liquid in the gas-liquid two-phase flow is restrained, and accordingly temperature reduction caused by liquid evaporation is restrained, the temperature stability of other components such as immersion liquid, immersion liquid supply and recovery device 3 and a substrate is improved, and exposure quality is guaranteed. Preferably, the auxiliary gas supplied to the sealed pumping chamber 61 via the auxiliary gas supply flow path 63 is a wet gas containing the immersion liquid vapor, and the wet gas containing the immersion liquid vapor is also supplied to the third gap via the airtight seal 7; it is further preferred that the third gap is also supplied with wet gas saturated with the immersion liquid vapour via the hermetic seal 7, for example saturated wet air or air with a relative humidity of more than 80% via the hermetic seal 7. Preferably, the wet auxiliary gas supplied to the sealed pumping chamber 61 through the auxiliary gas supply flow path 63 has a flow rate of more than 10SLPM to better increase the gas humidity in the sealed pumping chamber 61 to suppress evaporation of the liquid.
The foregoing and construction describes the basic principles, principal features and advantages of the present invention product, as will be appreciated by those skilled in the art. The foregoing examples and description are provided to illustrate the principles of the invention and to provide various changes and modifications without departing from the spirit and scope of the invention as defined by the appended claims. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (11)
1. An immersion liquid supply and recovery device for suppressing pressure pulsation and vibration of a gas-liquid two-phase flow, which surrounds the radial outer side of a terminal objective lens, wherein the bottom surface of the immersion liquid supply and recovery device faces a substrate and forms a third gap with the substrate, and the immersion liquid supply and recovery device is characterized in that: comprises a sealed pumping port, a sealed pumping cavity and a sealed pumping flow path; the sealing pumping port is positioned on the bottom surface of the immersion liquid supply and recovery device, which faces the substrate; the sealed pumping cavity is communicated with the sealed pumping port; the sealed pumping cavity is also communicated with the sealed pumping flow path; the sealed pumping system is communicated with the sealed pumping flow path and provides a vacuum source for the sealed pumping flow path; the sealing pumping port is used for pumping the immersion liquid from the third gap and simultaneously pumping gas radially outside the immersion liquid; the air pump further comprises an auxiliary air supply flow path, wherein the auxiliary air supply flow path is communicated with the sealed pumping cavity, and air is supplied to the sealed pumping cavity through the auxiliary air supply flow path.
2. The apparatus according to claim 1, wherein: the volume flow of the gas provided by the auxiliary gas supply flow path to the sealed pumping cavity is 10 times greater than the volume flow of the immersed liquid pumped and discharged through the sealed pumping port.
3. The apparatus according to claim 1, wherein: and the flow rate of the gas provided by the auxiliary gas supply flow path to the sealed pumping cavity is more than 10SLPM.
4. The apparatus according to claim 1, wherein: at least two sealed drainage flow paths are communicated with the sealed drainage cavity, and the communication position of the auxiliary air supply flow path and the sealed drainage cavity is at the middle position of the communication position of the two adjacent sealed drainage flow paths.
5. The apparatus according to claim 3, wherein: the two sealing pumping flow paths are respectively communicated with the sealing pumping cavity at two ends of the diameter of the sealing pumping cavity, which is parallel to the scanning direction, and the two auxiliary air supply flow paths are respectively communicated with the sealing pumping cavity at two ends of the diameter of the sealing pumping cavity, which is perpendicular to the scanning direction.
6. The apparatus according to claim 3, wherein: the four sealing pumping flow paths are respectively communicated with the sealing pumping cavity at two ends of the diameter of the sealing pumping cavity parallel to and vertical to the scanning direction, and an auxiliary air supply flow path is respectively arranged at the middle position of two adjacent sealing pumping flow paths and is communicated with the sealing pumping cavity.
7. The apparatus according to claim 1, wherein: the auxiliary gas cavity is communicated with the auxiliary gas supply flow path, and gas is supplied to the auxiliary gas supply flow path and the sealed pumping cavity through the auxiliary gas cavity.
8. The apparatus according to claim 7, wherein: the auxiliary gas cavity is annular similar to the sealed pumping cavity, and the auxiliary gas supply flow path is a plurality of through holes which are uniformly distributed.
9. The apparatus according to claim 1, wherein: the air supply cavity is communicated with the airtight seal, is also communicated with the sealed pumping drainage flow path and provides air for the auxiliary air supply flow path and the sealed pumping drainage cavity through the air supply cavity.
10. The apparatus according to any one of claims 1 to 9, wherein: the auxiliary supply flow path provides a humid gas containing immersion liquid vapour.
11. The apparatus according to claim 10, wherein: the air supplied to the sealed pumping chamber through the auxiliary air supply flow path is humid air with relative humidity of more than 80 percent.
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| CN202011563605.3A CN112684666B (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for inhibiting pressure pulsation and vibration of gas-liquid two-phase flow |
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| CN202011563605.3A CN112684666B (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for inhibiting pressure pulsation and vibration of gas-liquid two-phase flow |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| EP1528432A1 (en) * | 2003-10-28 | 2005-05-04 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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| US20110222031A1 (en) * | 2010-03-12 | 2011-09-15 | Nikon Corporation | Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium |
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