CN207502917U - The concentration management device of developer solution and the developing system of substrate - Google Patents

The concentration management device of developer solution and the developing system of substrate Download PDF

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Publication number
CN207502917U
CN207502917U CN201721635816.7U CN201721635816U CN207502917U CN 207502917 U CN207502917 U CN 207502917U CN 201721635816 U CN201721635816 U CN 201721635816U CN 207502917 U CN207502917 U CN 207502917U
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China
Prior art keywords
developer solution
concentration
substrate
liquid
processing apparatus
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Expired - Fee Related
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CN201721635816.7U
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Chinese (zh)
Inventor
中川俊元
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Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
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Hirama Rika Kenkyusho Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0025—Devices or apparatus characterised by means for coating the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

It is the concentration management device of developer solution of service of best state and the developing system of substrate that the utility model offer, which is most suitable for developer solution management used in the development of substrate,.In base plate processing system, the concentration management device (B) of developer solution, development processing apparatus (A), modulate developer solution new liquid modulating device (E), regenerated regenerating unit (F) carried out to the developer solution after using connected by piping.The physical property or constituent concentration of the developer solution of concentration management device (A) the measure development processing apparatus (B) of developer solution simultaneously supply the stoste of developer solution or new liquid, regenerated liquid, so as to be best concentration by developer solution management.The replenisher supplied is measured by the flow quantity recorder (151,152,153,154,155) for being set on piping.Can the development treatment expense of the expense of the concentration management of developer solution or substrate be calculated based on the integrated flow of replenisher measured by flow quantity recorder (151,152,153,154,155).

Description

The concentration management device of developer solution and the developing system of substrate
Technical field
The utility model is related to the concentration management device of developer solution and the developing systems of substrate, are especially partly leading The developing procedure of circuit board in body or liquid crystal display panel is medium in order to be developed and Reusability to photoresist film Show alkalinity the concentration management device of developer solution and the developing system of substrate.
Background technology
In the photolithographic developing procedure of fine wiring processing for being used to implement semiconductor or liquid crystal display panel etc., as general The liquid of photoresist dissolving after being film-made on substrate uses the developer solution (also referred to as " alkaline development below for showing alkalinity Liquid ").Alkaline-based developer be maintained management used for the defined concentration according to needs so that its performance to the maximum extent by It plays.The monitoring for the constituent concentration that the concentration management of developer solution passes through developer solution and the benefit of replenisher based on the concentration determined To come carry out.As the replenisher of supply, other than the stoste of developer solution or pure water, also using the alkaline development newly modulated Liquid (following to be also referred to as " new liquid ") or regeneration treatment are alkaline-based developer (below also referred to as " regenerated liquid ") that can be recycled etc..
In addition, alkaline-based developer absorbs the carbon dioxide in air and generates carbonate and easily deteriorate.In addition, alkalinity is aobvious Shadow liquid generates photoresist salt due to the dissolving of photoresist, and the effective alkali composition for development treatment is caused to be disappeared Consumption.Therefore, the alkaline-based developer of Reusability become not only containing alkali composition also containing photoresist, carbon dioxide mostly into Divide and be.Moreover, these ingredients are made expenditure and developing performance are had an impact with different respectively.Thus, in order to accurately right The developing performance of developer solution carries out maintenance management, needs to consider the influence that these ingredients bring developing performance to show Shadow liquid pipe is managed.
In the past, in order to maintain the concentration of management alkaline-based developer, the people of substrate is handled using alkaline-based developer (below Referred to as " substrate manufacture person ") it buys and using the concentration management device of developer solution.Substrate manufacture person must allocate the original of developer solution Liquid, new liquid etc. are as the replenisher fed to manage the concentration of alkaline-based developer.In addition, it is modulated in substrate manufacture person itself During new liquid, it is necessary to buy the modulating device being automatically modulated with its raw material to alkaline-based developer and use the modulating device. In addition, substrate manufacture person is in order to which itself prepares regenerated liquid and must buy the developer solution regeneration treatment after using as can be sharp again Regenerating unit.
As the managing device of alkaline-based developer, for example, following patent documents 1 records following content：Measure and alkali Property developer solution constituent concentration there are associated multiple characteristic values, based on the multiple measured values determined and using multivariate analysis Method calculates the constituent concentration of alkaline-based developer, conveys replenisher to developer solution based on the measured value and calculated value.
In addition, patent document 2 records following developer solution managing device：The density of developer solution is measured, uses developer solution Density value and absorbing carbon dioxide concentration value between correspondence so that the absorbing carbon dioxide concentration of developer solution become rule Fixed management value or management are worth following mode and supply replenisher to developer solution.Patent document 3 records following developer solution Managing device：Has data store, which is stored with conductivity data, and the conductivity data is according to developer solution Dissolving photoresist agent concentration and a concentration of index of absorbing carbon dioxide and determining region, have and confirmed to realize regulation Developing performance developer solution conductivity values, will according to developer solution dissolving photoresist agent concentration measured value and absorption The measured value of gas concentration lwevel and the conductivity values for being stored in data store of determining concentration range are as control targe Value feeds replenisher to developer solution.
Citation
Patent document 1：Japanese Unexamined Patent Publication 2017-28089 bulletins
Patent document 2：Japanese Unexamined Patent Publication 2017-28090 bulletins
Patent document 3：Japanese Unexamined Patent Publication 2017-28091 bulletins
However, as in the past, in buying and using the mode of concentration management device, modulating device, regenerating unit, base Plate producer needs to buy concentration management device, regenerating unit, operates these devices and carries out maintenance management.In addition, for For people's (below also referred to as " device sellers ") of concentration management device, modulating device, regenerating unit is sold in manufacture, also only have Just there is the chance for the return for obtaining these devices in device point-of-sale.
Therefore, substrate manufacture person must be born by buying the temporary of concentration management device, modulating device, regenerating unit Enormous expenditure bear and the operating after buying and maintain management involved various energy, burden.In addition, also exist as follows Problem：Wish the substrate manufacture person for buying device if device sellers do not look for repeatedly among limited market and sell dress It puts, is then difficult to earn enough interests.
Utility model content
The utility model subject to be solved
The utility model be in view of above-mentioned each subject and complete.Inventors herein propose is not sale device but to base Plate producer provides maintains management to be most suitable at substrate using concentration management device, modulating device, regenerating unit by developer solution The technical solution of the service of the expectation state of reason.In the new business mode, the person that can not make substrate manufacture undertakes as described above It bears and uses the developer solution for being maintained optimum state always, and device sellers can be made persistently to earn interests.This reality With a kind of novel concentration management device for being designed to provide developer solution, carried in the new business mode of above-mentioned technical proposal It is used when providing its service for the people of above-mentioned service.In addition, the purpose of this utility model is to provide by concentration management device, adjust Development processing apparatus connection that device processed, regenerating unit and substrate manufacture person are used and that constructs be most suitable for providing above-mentioned service Substrate developing system.
Solution for solving the problem
In order to reach the purpose, the concentration management device of the developer solution of the utility model has：Measuring means, pair with Reusability and show alkalinity developer solution constituent concentration have associated developer solution multiple characteristic values be measured；Operation It is dense to calculate the ingredient of developer solution based on the multiple characteristic values determined by measuring means and using multiple-regression analysis for mechanism Degree；Control mechanism, the constituent concentration value based on the developer solution calculated by arithmetical organ, so that the constituent concentration of developer solution becomes Defined management value or defined management are worth following mode and supply replenisher to developer solution；And flow quantity recorder, meter Survey the integrated flow of replenisher supplied by control mechanism.
According to the utility model, due to utilizing alkaline development of the arithmetical organ using multiple-regression analysis to multicomponent system The constituent concentration of liquid is calculated, so even also being capable of high-precision according to multiple characteristic values influenced by developer solution ingredient Ground calculates the constituent concentration of developer solution.Based on the constituent concentration of the developer solution calculated, so that the constituent concentration of developer solution becomes Defined management value or the following mode of defined management value supply replenisher, and thus, it is possible to be accurately proceed developer solution Concentration management.
In addition, by have measurement replenisher integrated flow flow quantity recorder, can according to the rules during (for example, One week or one month etc.) and hold the amount of replenisher.Thus, for example, supply cost will can be added every based on other The amount of money after the basic charge of funds etc. is calculated as " expense of the concentration management of developer solution ", which is by the regulation phase The supply amount of interior replenisher is multiplied by obtained from per unit expense.It then, can be by the expense calculated to substrate Producer asks.
In order to reach the purpose, the concentration management device of the developer solution of the utility model has：Densimeter；Control machine Structure, based on the density for the developer solution for showing alkalinity determined by densimeter, according to the density of developer solution with absorbing titanium dioxide Correspondence between concentration of carbon, so that the absorbing carbon dioxide concentration of developer solution becomes defined management value or defined pipe Reason is worth following mode and supplies replenisher to developer solution；And flow quantity recorder, measure the replenisher supplied by control mechanism Integrated flow.
According to the utility model, according to the correspondence (reference between the density of developer solution and absorbing carbon dioxide concentration Fig. 1 of patent document 2), due to according to the density value can be known replenisher to be supplied of developer solution determined by densimeter Amount, therefore can be so that the absorbing carbon dioxide concentration of developer solution becomes below defined management value or defined management value Mode supplies replenisher and is managed.
In addition, by have measurement replenisher integrated flow flow quantity recorder, can according to the rules during (for example, One week or one month etc.) hold the amount of replenisher.Thus, for example, supply cost will can be added every based on other The amount of money after the basic charge of funds etc. is calculated as " expense of the concentration management of developer solution ", which is by the regulation phase The supply amount of interior replenisher is multiplied by obtained from per unit expense.It then, can be by the expense calculated to substrate Producer asks.
In order to reach the purpose, the concentration management device of the developer solution of the utility model has：Measuring means, to anti- Conductivity, dissolving photoresist agent concentration and the absorbing carbon dioxide concentration of the multiple developer solution for using and showing alkalinity are surveyed It is fixed；Control mechanism has data store and control unit, and data store is stored with conductivity data, the conductivity number According to according to the determining concentration range to dissolve photoresist agent concentration and a concentration of index of absorbing carbon dioxide, have advance It confirmed the conductivity values of the developer solution of developing performance as defined in realizing, the conductivity number that control unit will be stored in data store It is in, according to the dissolving photoresist agent concentration of the developer solution determined by measuring means and absorbing carbon dioxide concentration The conductivity values of measured value and determining concentration range are as control targe value, so that the conductivity of developer solution becomes control targe The mode of value supplies replenisher to developer solution；And flow quantity recorder, the replenisher that measurement is supplied by control mechanism add up Flow.
According to the utility model, no matter developer solution becomes what kind of dissolving photoresist agent concentration and absorbing carbon dioxide Concentration, the active ingredient that acts on development in developer solution is maintained constant, therefore can realize and can maintain it is expected Developing performance and desired line width and the development treatment of residual film thickness can be maintained.
In addition, by have measurement replenisher integrated flow flow quantity recorder, can according to the rules during (for example, One week or one month etc.) hold the amount of replenisher.Thus, for example, supply cost will can be added every based on other The amount of money after the basic charge of funds etc. is calculated as " expense of the concentration management of developer solution ", which is by the regulation phase The supply amount of interior replenisher is multiplied by obtained from per unit expense.It then, can be by the expense calculated to substrate Producer asks.
In order to reach the purpose, the developing system of the substrate of the utility model has：Development processing apparatus makes Substrate is handled with developer solution；The concentration management device of developer solution, management Reusability in development processing apparatus The concentration of developer solution；Piping is connect with development processing apparatus, and the replenisher supplied from concentration management device to developer solution is defeated It send to development processing apparatus；And flow quantity recorder, piping is set on, concentration management device has：Measuring means, measure with The constituent concentration of developer solution has associated multiple characteristic values；Arithmetical organ, based on the multiple spies determined by measuring means Property value and the constituent concentration that developer solution is calculated using multiple-regression analysis；And control mechanism, it is based on being calculated by arithmetical organ The constituent concentration value of the developer solution gone out so that the constituent concentration of developer solution become defined management value or defined management value with Under mode to developer solution supply replenisher.
In order to reach the purpose, the developing system of the substrate of the utility model has：Development processing apparatus makes Substrate is handled with developer solution；The concentration management device of developer solution, management Reusability in development processing apparatus The concentration of developer solution；Piping is connect with development processing apparatus, and the replenisher supplied from concentration management device to developer solution is defeated It send to development processing apparatus；And flow quantity recorder, piping is set on, concentration management device has：Densimeter；And control machine Structure, based on the density of the developer solution determined by densimeter, according between the density of developer solution and absorbing carbon dioxide concentration Correspondence so that the absorbing carbon dioxide concentration of developer solution becomes below defined management value or defined management value Mode supplies replenisher to developer solution.
In order to reach the purpose, the developing system of the substrate of the utility model has：Development processing apparatus makes Substrate is handled with developer solution；The concentration management device of developer solution, management Reusability in development processing apparatus The concentration of developer solution；Piping is connect with development processing apparatus, and the replenisher supplied from concentration management device to developer solution is defeated It send to development processing apparatus；And flow quantity recorder, piping is set on, concentration management device has：Measuring means measures aobvious Conductivity, dissolving photoresist agent concentration and the absorbing carbon dioxide concentration of shadow liquid；And control mechanism, have data and deposit Storage portion and control unit, data store are stored with conductivity data, and the conductivity data is according to dense to dissolve photoresist Degree and a concentration of index of absorbing carbon dioxide and determining concentration range have and confirmed to realize defined developing performance in advance Developer solution conductivity values, control unit will be stored in it is in the conductivity data of data store, according to being surveyed by measuring means The dissolving photoresist agent concentration for the developer solution made and the measured value of absorbing carbon dioxide concentration and determining concentration range Conductivity values as control targe value, supply and mend to developer solution in a manner that the conductivity for making developer solution becomes control targe value Filling liquid.
According to the utility model, since replenisher is being delivered in the piping of development processing apparatus equipped with integrated flow Meter, thus can according to the rules during (for example, one week or one month etc.) and hold supply to development processing apparatus supplement The amount of liquid.Thus, for example, supply cost will can be calculated plus the amount of money after the basic charge based on other every funds etc. To provide involved expense i.e. " development treatment expense " in order to carry out the service of developer solution management that development treatment provides, The supply cost is that the supply amount of the replenisher in the specified time limit is multiplied by obtained from per unit expense.Then, energy It is enough to ask the expense calculated to substrate manufacture person.
In the another way of the utility model, it is preferable that the developing system of substrate is also equipped with：The modulation of developer solution Developer solution is modulated to new liquid by device；And new liquid piping, it connect, leads to development processing apparatus and modulating device Over-richness managing device supplies the new liquid modulated by modulating device to the developer solution of the Reusability in development processing apparatus, Equipped with flow quantity recorder in new liquid piping.
According to which, due to the new liquid piping supplied in the new liquid of the developer solution to being modulated by modulating device In equipped with flow quantity recorder, therefore can according to the rules during (for example, one week or one month etc.) come hold supply to show The amount of the new liquid of the developer solution of shadow processing unit.Thus, for example, supply cost will can be added based on other every funds etc. Basic charge after the amount of money be calculated as involved by the offer of the service of developer solution management provided to carry out development treatment Expense be " development treatment expense ", the supply cost be the supply amount of the new liquid in the specified time limit is multiplied by it is per unit Obtained from expense.Then, the expense calculated can be asked to substrate manufacture person.
In the another way of the utility model, it is preferable that the developing system of substrate is also equipped with：The regeneration of developer solution Device, the regenerated liquid that the developer solution after the use in development processing apparatus is regenerated as to recycle；And regenerated liquid is used Piping is connect with development processing apparatus and regenerating unit, by concentration management device in development processing apparatus repeatedly The developer solution used is supplied by the regenerated regenerated liquid of regenerating unit, equipped with flow quantity recorder in regenerated liquid piping.
According to which, due to the regenerated liquid that the regenerated liquid by the regenerated developer solution of regenerating unit is supplied with matching Equipped with flow quantity recorder in pipe, thus can according to the rules during (for example, one week or one month etc.) come hold supply extremely The amount of the regenerated liquid of the developer solution of development processing apparatus.It is passed through thus, for example, can will be added to supply cost based on other items The amount of money after the basic charge of expense etc. is calculated as the offer of the service of the developer solution management institute provided to carry out development treatment The expense being related to i.e. " development treatment expense ", the supply cost are that the supply amount of the regenerated liquid in the specified time limit is multiplied by every list Obtained from the expense of position amount.Then, the expense calculated can be asked to substrate manufacture person.
Utility model effect
According to the utility model, due to having the replenisher of opposite developer solution supply, new liquid or the accumulative stream of regenerated liquid The flow quantity recorder that is measured is measured, therefore the replenisher of interior supply, new liquid or regenerated liquid during the prescribed period can be held Supply amount, the reasonable expense that can be calculated based on the supply amount and generate.It provides and will show therefore, it is possible to realize to substrate manufacture person The maintenance management of shadow liquid is that the industry as the service of the expectation state for the development treatment for being most suitable for substrate is no so far New business method.Therefore, according to the utility model, compared with the situation of previous sale device, even if providing the people of the service It is not looked for repeatedly among limited market and wishes the people for buying device, can also continuously ensure that stable income.
According to the utility model, substrate manufacture person does not undertake to buy and the concentration management that the concentration of developer solution is managed is filled It puts, re-modulate the modulating device of developer solution, regenerating unit that regeneration treatment is carried out to developer solution etc. or transport these devices Turn or maintain to manage the burden of these devices, and only pay based on the replenisher, new liquid or regenerated liquid supplied to developer solution Integrated flow and the developer solution management that generates the expense that provides of service, it will be able to using being managed always as desired state Developer solution.
Description of the drawings
Fig. 1 is the schematic diagram of the developing system of the substrate of first embodiment.
Fig. 2 is the schematic diagram of the developing system of the substrate of second embodiment.
Fig. 3 is the schematic diagram of the developing system of the substrate of third embodiment.
Fig. 4 is the schematic diagram of the developing system of the substrate of the 4th embodiment.
Fig. 5 is the schematic diagram of the developing system of the substrate of the 5th embodiment.
Reference sign：
The concentration management device of A ... developer solutions, B ... development processing apparatus, C ... replenisher reservoirs, D ... circulation stirring machines Structure, E ... modulating devices, F ... regenerating units；
1 ... measuring means, 2 ... arithmetical organs, 3,22 ... control mechanisms, 11 ... first detectors, 12 ... second detectors, 13 ... third detectors, 14 ... sampling pumps, 15 ... sampling pipings, 16 ... return to piping, 21,24 ... computing modules, 23 ... data Storage part, 31,32 ... control modules, 33 ... control units, 41,42,43,44,45 ... control valves, 46,47 ... gas-pressurized valves Door, 48,49 ... valves, 51,52,53 ... determination datas signal wire (signal wire), 54 ... operational datas signal wire (signal Line), 55,56,57,58,59 ... control signals are with signal wire (signal wire), 61 ... developer solution storagetanks, 62 ... overflow launders, and 63 ... Liquid level meter, 64 ... developing room shields, 65 ... roller conveyors, 66 ... substrates, 67 ... developer solution spray nozzles, 71 ... waste drains pumps, 72, 74 ... circulating pumps, 73,75 ... filters, 76,77,78 ... delivery pumps, 80 ... development liquid pipelines, 81,82,83 ... pipings, 84 ... New liquid piping, 85 ... regenerated liquid pipings, 86 ... developer solution stoste supplying tubings, 87 ... pure water supplying tubings, 88 ... use Finish developer solution conveying piping, 89 ... interflow pipelines, 90 ... circulation lines, 91 ... developer solution stoste hold-up vessels, 92 ... developments The new liquid hold-up vessel of liquid, 93 ... nitrogen pipings, 151,152,153,154,155 ... flow quantity recorders, 301 ... new liquid modulation Slot, 302 ... new liquid storagetanks, 311 ... densimeters, 312,322 ... liquid level meters, 331 ... control devices, 341,342,343 ... controls Valve processed, 351,352,353,354 ... signal wires, 371,372 ... circulating pumps, 373 ... delivery pumps, 380 ... communicating pipes, 381, 382 ... circulation lines, 431 ... control devices, 441 ... control valves, 451,452 ... signal wires, 461,462,463 ... filters, 471 ... delivery pumps, 493 ... regenerated liquid storagetanks.
Specific embodiment
Hereinafter, suitably the utility model preferred embodiment is described in detail with reference to attached drawing.Wherein, as long as not having There is shape, size, size ratio, its relative configuration of especially specific record, the device recorded in these embodiments etc. etc. just It is not only limited to the illustrated illustration of the scope of the utility model.These illustrations be merely possible to illustrate example and schematically into Row diagram.
In addition, in the following description, as the concrete example of developer solution, appropriate use is in semiconductor or base plate of liquid crystal panel Manufacturing process in main 2.38wt% (hereinafter, wt% is only recorded as %) to be used tetramethylammonium hydroxide aqueous solution (hereinafter, tetramethylammonium hydroxide is referred to as TMAH.) and illustrate.
Wherein, the developer solution that the utility model is applied is not limited thereto.Developer solution as the utility model it is dense It spends managing device, the example of other developer solutions that the developing system of substrate can be applied, potassium hydroxide, hydrogen-oxygen can be enumerated It is organic to change aqueous solution or the trimethyl monoethanol base ammonium hydroxide (choline) of the inorganic compounds such as sodium, sodium phosphate, sodium metasilicate etc. Aqueous solution of compound etc..
In the past, the substrate manufacture person for carrying out development treatment to substrate using alkaline-based developer and manufacturing substrate buys developer solution Concentration management device, modulating device, regenerating unit, and these devices with development processing apparatus are connect, transport these devices Then used the development treatment of the substrate of developer solution.Therefore, substrate manufacture person must be born by buying the concentration of developer solution Replenisher or necessary former during the operating of temporary enormous expenditure burden, device when managing device, modulating device, regenerating unit The burden of the allotment of material manages relevant other various energy, burdens with the operating of device, maintenance.
In addition, in terms of the device sellers, in the business of previous sale device in itself, only sold in device Time point just has the chance for the return for obtaining device, wishes the people for buying device if not looking for repeatedly and sells device, is difficult to obtain Take fully enough interests.
The present inventor is in view of these are put and propose new business method.That is, it is to provide the business serviced as follows：Using aobvious The concentration management device of shadow liquid, modulating device, regenerating unit and the concentration management of developer solution that uses substrate manufacture person is rule Fixed concentration.To this, new business method illustrates.
First, the business of the service to providing management developer solution illustrates.
The development that the ISP of developer solution management is used substrate manufacture person using the concentration management device of developer solution Liquid pipe reason is the desired defined concentration of substrate manufacture person or defined concentration range.The concentration management of developer solution pass through to Developer solution supplies replenisher to carry out.The concentration management device of developer solution is repeatedly measured and monitors the concentration of developer solution always, and The control valve being equipped in the piping of supply replenisher is controlled, so that the appropriate replenisher of supply requirement.One While measurement supply replenisher on one side is carried out to integrated flow by the flow quantity recorder being equipped in the piping of supply replenisher.Service Supplier by monitoring the integrated flow of supplied replenisher, based on during according to the rules (for example, one week or one month Deng) integrated flow, the service for calculating the concentration management of developer solution provides involved expense, and according to the specified time limit to base Plate producer asks the expense.This is to provide the summary of the business of the service of the concentration of management liquid.
Manage institute of the concentration management device of developer solution used in the service of the concentration of developer solution as ISP There is object and operated by ISP and maintained to manage and be used for concentration management.Therefore, substrate manufacture person is without purchase Enter concentration management device, without operating, the maintenance management for carrying out the concentration management device.Only pipe is obtained from ISP Manage the concentration of developer solution.
The factory of the concentration management device for the developer solution that ISP has oneself is set to substrate manufacture person, and with The development processing apparatus connection that substrate manufacture person is used.
Concentration mensuration of the concentration management by developer solution and the concentration based on the developer solution determined are and the replenisher that carries out Supply realize.As replenisher used in concentration management, the stoste of developer solution or new liquid, pure water etc. are used.But not office It is limited to this.For example, it is also possible to regeneration treatment of developer solution after being applied in combination etc. carries out concentration management.
For example, will be used as developer solution and in the case of concentration that the more TMAH aqueous solutions management used is 2.38%, For example, carry out following concentration management.That is, the concentration management device of developer solution is repeatedly measured and monitors alkali composition concentration always (TMAH concentration), dissolving photoresist agent concentration and absorbing carbon dioxide concentration, so that alkali composition concentration becomes about 2.38% concentration and dissolving photoresist agent concentration is made to be no more than defined setting concentration, and make absorbing carbon dioxide dense Degree feeds replenisher and carries out concentration management as the following mode of defined management value or management value.
In this case, the stoste of developer solution, the new liquid of developer solution, pure water etc. are fed as replenisher.Developer solution Stoste refer to the dense developer solution of concentration, such as 20%~25% or so TMAH aqueous solutions.The new liquid of developer solution refers to not make In other words developer solution is free from the fresh developer solution that dissolving resin etc. does not need to substance.It is for example, not used 2.38%TMAH aqueous solutions.Dissolving resin etc. can also will be removed in developer solution after using not need to show obtained from substance The regenerated liquid of shadow liquid is used as replenisher.
In concentration mensuration, in development processing apparatus the developer solution of Reusability be sampled, and by developer solution The determination part of concentration management device carries out.Alkali composition concentration is measured to carry out by the conductivity to developer solution, dissolving Photoresist agent concentration is carried out by being measured to the absorbance under the specific wavelength of developer solution, in addition, absorbing titanium dioxide Concentration of carbon is measured to carry out by the density to developer solution.These constituent concentrations and corresponding developer solution physics value it Between, it is known that there are good correlativity, (correlativity between the absorbing carbon dioxide concentration and density of developer solution is with reference to specially Fig. 1 of sharp document 2).If using such correlativity, alkali composition concentration can be exported from the conductivity values determined, from The absorbance value export dissolving photoresist agent concentration determined, absorbing carbon dioxide concentration is exported from the density determined.
When the result of concentration mensuration is less than 2.38% for alkali composition concentration, the concentration management device supply development of developer solution The stoste of liquid is as replenisher.Conversely, when alkali composition concentration is higher than 2.38%, the concentration management device supply pure water of developer solution Or the new liquid of developer solution is as replenisher.Equally when dissolving photoresist agent concentration more than defined setting concentration, development The new liquid of the managing device supply developer solution of liquid is as replenisher.It can also replace the new liquid of developer solution and be supplied together with new liquid Regenerated liquid.In addition, when absorbing carbon dioxide concentration exceeds defined management value, the managing device supply developer solution of developer solution New liquid is as replenisher.It should be noted that the method for the supply of control replenisher is in addition to so that alkali concentration, dissolving are photic anti- The mode that erosion agent concentration, absorbing carbon dioxide concentration become defined value is supplied other than replenisher, can also be led based on following Electric rate data, by make conductivity values become control targe value in a manner of to developer solution supply replenisher, the conductivity data according to The determining concentration range to dissolve photoresist agent concentration and a concentration of index of absorbing carbon dioxide has and confirmed to realize The conductivity values of defined developing performance.The method for the supply amount for determining replenisher is explained below.
Via piping from the hold-up vessel, the modulating device modulated new liquid and supplied or supply regenerated liquid for storing replenisher Development processing apparatus from regenerating unit to substrate manufacture person convey replenisher.It is provided in the piping of supply replenisher accumulative Flowmeter and the control valve controlled by the concentration management device of developer solution.If it presets and has controlled according to each control valve The flow that valve circulates per unit time when opening, then concentration management device is by will be arranged on what the replenisher that should be supplied was circulated Control valve in piping opens the stipulated time, and can supply suitable replenisher.When supplying replenisher, flow quantity recorder pair The integrated flow of replenisher is measured.This is the supply amount of the replenisher supplied to development processing apparatus.
The specified time limit that ISP waited according to such as one month, based on the replenisher determined by flow quantity recorder Integrated flow (supply amount) and the development treatment expense for calculating substrate.ISP asks calculated base to substrate manufacture person The development treatment expense of plate is used as the return of service for providing and being managed to developer solution used in the development treatment of substrate.
Substrate manufacture person pays the development treatment expense of substrate by period according to the rules, without concentration management device Buy, operate and maintain management just can be persistently using the developer solution after concentration management.On the other hand, with sale device phase Than ISP can continue to earn stable income.
Here, the liquid administration fee as substrate, can adopt in various manners.Hereinafter, exemplify the aobvious of several substrates The concrete example of shadow processing cost.But the computational methods of the development treatment expense of substrate are not limited to these.It is new with this practicality The computational methods of the development treatment expense of the associated substrate of type include the integrated flow (supply amount) based on replenisher and calculate Various fee calculation procedures.
First, as the development treatment expense of substrate, sometimes with the supply cost of the replenisher of interior supply during the prescribed period On the basis of and computational costs.This is obtained based on form of thinking as sale replenisher.
For example, it will be set as specified time limit one month.Due to measuring the integrated flow of replenisher using flow quantity recorder, because This by from this month table look-up time point integrated flow subtract before table look-up the moon time point integrated flow come be obtained this month feed supplement The supply amount of liquid.The supply amount of the replenisher of this month supply is set as Q (the L/ months).By the supply unit price of replenisher be set as A (member/ L).Then, the supply cost of the replenisher of this month is obtained as Q × A (member/moon).In the case where replenisher is a variety of, respectively Supply amount is set as Q for a variety of replenishers1、Q2、Q3, (the L/ months), will supply unit price be set as A1、A2、A3、··· (member/L), the supply cost of replenisher are obtained as ∑ Qi×Ai(i=1,2,3) (member/L).As this month The development treatment expense of substrate and to substrate manufacture person ask.
As the variation, the supply cost of replenisher calculated as described above will be obtained plus various expenses sometimes Development treatment expense of the expense gone out as substrate monthly.As the representative expense for the various expenses to be added, there is base This expense.When the service for signing developer solution management provides involved contract, basic charge monthly is determined, regardless of whether for To replenisher, all the basic charge is included in the development treatment expense of substrate and is made requests on.It is of course also possible to without concerning Item as basic charge, and the labour cost of administration fee or device operator, material allocation is maintained to take equipment, other are various Funds etc. are included in the expense to be added.If the expense (such as basic charge) that will add up is set as Z (member/moon), monthly The development treatment expense of substrate is Q × A+Z (member/moon).Replenisher be it is a variety of and be added expense be the sum of various expenses Z= ∑ZjWhen, the development treatment expense of substrate monthly is ∑ Qi×Ai+∑Zj(i, j=1,2,3) (member/moon).
In addition, as other variations, the amount of money obtained from the supply cost of replenisher also is multiplied by subsidy rate B sometimes It is set as the development treatment expense of substrate monthly.For example, the dimension of the every funds, device involved by the allotment of the raw material of replenisher It holds administration fee etc. and is considered relevant with the supply amount of replenisher (also there is relationship in the duration of runs of this and device) and be reasonable. Under such circumstances, subsidy rate B is multiplied by supply cost Q × A (member/moon) of replenisher, the development treatment of substrate monthly is taken With being obtained as Q × A × B (member/moon).Subsidy rate B can also be contained in the supply unit price A (member/L) of replenisher.In addition, In addition in the case of basic charge etc., the development treatment expense of substrate monthly becomes Q × A × B+Z (member/moon).More generally come It says, the development treatment expense of substrate monthly is obtained as (∑ Qi×Ai)×B+∑Zj(i, j=1,2,3) (member/ Month).
Second, as the development treatment expense of substrate, will be shown to substrate manufacture person request because what is provided in during the prescribed period The service of shadow liquid pipe reason and the economic interests brought to substrate manufacture person be multiplied by as defined in the amount of money obtained from ratio.This is based on will The economic interests that the person that makes substrate manufacture due to the offer of the service of developer solution management generates give substrate manufacture person and service provide Form of thinking as person and obtain.This is preferably applied to for example provide to no substrate manufacture person for implementing developer solution management Situation of service of development management etc..
In the case where being managed without developer solution, substrate manufacture person is whole after developer solution to have been used to stipulated number It discards and is changed to new developer solution.Therefore, in the replacement of each liquid large variation all occurs for the liquid properties of developer solution.Separately On the one hand, in the concentration management for implementing developer solution, substrate manufacture person can enjoy various effects as following.It is that is, aobvious The usage amount of shadow liquid is substantially cut down.The waste liquid amount of developer solution is also substantially cut down.In addition, the liquid properties of developer solution are permanent always It is fixed, therefore the manufacture stay in grade of semiconductor, crystal liquid substrate, fabrication yield improve.Without stopping manufacture due to liquid is replaced Device, the running rate of manufacturing device improve, the manufacture increase of semiconductor, crystal liquid substrate.
The concrete example of the calculating of development treatment expense as substrate under such circumstances, can enumerate will be because of developer solution The number of the reduction amount of money for the cost of developer solution that the subduction zone of usage amount comes is into the development treatment expense of the substrate as specified time limit Situation.
For example, it will be set as specified time limit one month.It will receive the developer solution involved by the utility model substrate manufacture person Before the offer of the service of management, each month that i.e. substrate manufacture person buys in the concentration management for not implementing developer solution it is aobvious The amount of buying of shadow liquid is set as R (the L/ months), and is bought unit price and be set as C (member/L).In the big feelings of the variation of the developer solution amount of buying R Under condition, by it is past it is appropriate in a period of the average value of the developer solution amount of buying be set as R.
It, will be because of the clothes of the developer solution management involved by the utility model according to the integrated flow determined by flow quantity recorder The offer of business and the supply amount of replenisher that supplies are obtained as Q (the L/ months).The supply unit price A (member/L) of replenisher is multiplied by, monthly The supply cost of replenisher be obtained as Q × A (member/moon).
Then, substrate manufacture person by receive the developer solution involved by the utility model concentration management service provide and The reduction amount of money for the cost of developer solution that can be obtained becomes R × C-Q × A (member/moon).Using D as ratio, the development of substrate monthly Processing cost is obtained as (R × C-Q × A) × D (member/moon).It is of course also possible to along with basic charge etc..As ratio D, For example, one one-tenth (0.1), twenty percent (0.2), three one-tenth (0.3) etc..
It, can also be by the reduction amount of money for the treatment cost of waste liquor come by the subduction zone of the waste liquid amount of developer solution as variation Number into the substrate for being set as specified time limit development treatment expense.
The liquid waste processing expense monthly of developer solution before the concentration management of developer solution is implemented is set as S (member/moon), will When liquid waste processing expense monthly after the concentration management implementation of developer solution is set as T (member/moon) (wherein, S ＞ T), because of concentration pipe The reduction amount of money of liquid waste processing expense managed and cut down is S-T (member/moon).Substrate manufacture person pays monthly Q due to concentration management The supply cost of the replenisher of × A (member/moon), therefore the waste liquid amount of substrate manufacture person cuts down the amount of money of involved economic interests As (S-T)-Q × A (member/moon).The development treatment expense of substrate monthly be multiplied by ratio D on this basis and be obtained for ((S-T)-Q × A) × D (member/moon).Basic charge etc. can also be added.
As other variations, for the amount of money of the economic interests of substrate manufacture person, can also replace developer solution into This reduction amount of money, the reduction amount of money of liquid waste processing expense, and use because yield rate raising, the raising of product quality, device are transported Raising of rate of rotation etc. and the income in terms of the substrate manufacture person that brings increases amount of money etc..Alternatively, it is also possible to will be from cost of developer solution The reduction amount of money, the reduction amount of money of liquid waste processing expense, substrate manufacture person the total amount of money of income increase volume etc. subtract supplement The total brought due to the concentration management of developer solution of the amount of money after supply cost Q × A (member/moon) of liquid is regarded as substrate manufacture person The amount of money of economic interests, to calculate the development treatment expense of substrate monthly.In this case, if by phases such as income increase volumes The amount of money obtained from adding is set as U (member/moon), then the development treatment expense of substrate becomes (U-Q × A) × D (member/moon).It can also Along with basic charge etc..
It is new by providing this practicality to the substrate manufacture person for the concentration management for having been carried out developer solution as another variation The service of the concentration management of developer solution involved by type, can making substrate manufacture, person generates various economic interests.Equally by these Calculation of economic benefits for substrate monthly development treatment expense and asked to substrate manufacture person.
Even if in the case where having been carried out the concentration management of developer solution, most substrate manufacture person still buys developer solution Concentration management device and oneself operating, maintenance management, so as to carry out the concentration management of developer solution.Therefore, substrate manufacture person is aobvious The expenses such as every funds of the allotment of raw material or goods, materials and equipments, the labour cost of device operator are undertaken in the concentration management of shadow liquid.In addition, Still using old developer solution managing device or using the concentration all not optimized fully based on the ingredient for developer solution Measuring principle and the situation of developer solution managing device that is managed is also more.
In this case, the development liquid pipe by being replaced into previous developer solution management involved by the utility model The service of reason can be brought and cost of developer solution, the reduction of waste liquid cost, yield rate raising, product quality to substrate manufacture person Raising and the associated economic interests such as stabilization, the raising of operation rate, the raising of product manufacturing quantity.In such situation Under, it also in the same manner as described above, can be by the number of the amount of money of economic interests obtained from the integrated flow based on replenisher into calculating It is asked for the development treatment expense of substrate, and to substrate manufacture person.
It should be noted that in the above description, although the description of the concentration management relative to developer solution service and based on The development treatment expense for substrate and the method asked to substrate manufacture person are calculated, but the concentration management of developer solution can also be calculated as Expense is simultaneously asked to substrate manufacture person.
Next, come illustrate to provide supply as one of replenisher the developer solution regeneration treatment after using be can be again Regenerated liquid is come the business of service that is managed to developer solution obtained from.
Supply regenerated liquid removed the ISP of service that is managed to developer solution using regenerating unit by That is accumulated in the developer solution after development processing apparatus use does not need to ingredient, by the developer solution after the use in development processing apparatus Concentration or defined concentration range as defined in the person that is adjusted to substrate manufacture is desired, so as to be regenerated as can recycling.Again Raw processing removed by using technologies such as filtering, electrolysis, partial crystallization, UF membranes accumulated do not need to ingredient (regenerate The mode of processing is not limited to these.It is properly selected according to the liquid as object or the ingredient that should be removed and applies conjunction Suitable technology.).The control valve that regenerating unit is equipped with by opening in the piping of the developer solution (regenerated liquid) after supply regenerates, Regenerated liquid is supplied to development processing apparatus.It is measured on one side using the flow quantity recorder being equipped in the piping of supply regenerated liquid Integrated flow supplies regenerated liquid on one side.ISP is by monitoring the integrated flow of supplied regenerated liquid, based on according to rule Integrated flow (for example, one week or one month etc.) between periodically and calculate the clothes for supplying regenerated liquid to be managed to developer solution The service of business provides involved expense, and ask the expense to substrate manufacture person according to the specified time limit.This is to provide supply Regenerated liquid is come the general of the business of service that is managed to developer solution obtained from carrying out regeneration treatment to the developer solution after using It will.
Supplying what regenerated liquid obtained from the developer solution progress regeneration treatment after using was managed developer solution The regenerating unit used in service is operated by ISP and is maintained to manage as all objects of ISP And for the regeneration treatment of developer solution.Therefore, substrate manufacture person need not buy regenerating unit, without carrying out the regenerating unit Operating maintains management.The regeneration treatment of developer solution is only carried out by ISP.
ISP by the factory of the regenerating unit that oneself the has person that is set to substrate manufacture, and with substrate manufacture person institute The development processing apparatus connection of utilization.
Technology is separated off by using filtering, electrolysis, partial crystallization, UF membrane etc. and removes from developer solution to make because of developer solution With and that accumulates in developer solution do not need to substance and realize regeneration treatment.It can also be adjusted by suitably feeding replenisher etc. Save each ingredient of developer solution.But isolation technics is not limited to these used in regeneration treatment.It accumulates in developer solution It does not need to substance to refer to, such as resist ingredient dissolved out from substrate due to development treatment etc..
The regenerated liquid of developer solution after regeneration is conveyed via piping to the development processing apparatus of substrate manufacture person.In supply again The piping of raw liquid is provided with control valve and flow quantity recorder.If preset what is circulated per unit time when control valve is opened Flow then by the way that the control valve is opened the stipulated time, can supply suitable regenerated liquid.When supplying regenerated liquid, add up stream Gauge is measured the integrated flow of regenerated liquid.This is the supply amount of the regenerated liquid supplied to development processing apparatus.
ISP waited specified time limits according to such as one month, tired based on the regenerated liquid determined by flow quantity recorder It counts flow (supply amount) and calculates the development treatment expense for supplying associated substrate with regenerated liquid.ISP is to substrate system The person of making asks the development treatment expense of calculated substrate to be used as and provides the developer solution management that the supply based on regenerated liquid is realized Service return.
The development treatment expense for the associated substrate of supply that substrate manufacture person passes through period Zhi Fuyu regenerated liquids according to the rules, It buys, operate and maintains management can just obtain the liquid after regeneration treatment without regenerating unit and be used at substrate Reason.On the other hand, compared with when sale device, ISP can continue to earn stable income.
Here, the development treatment expense as the substrate associated with the supply of regenerated liquid, can adopt in various manners.With Under, exemplify the concrete example of the development treatment expense of several substrates.But the computational methods of the development treatment expense of substrate are simultaneously It is not limited to these.The computational methods of the development treatment expense of the substrate of the utility model include the integrated flow based on regenerated liquid (supply amount) and calculate various fee calculation procedures.
First, as the regeneration treatment expense of the substrate associated with the supply of regenerated liquid, sometimes with interior confession during the prescribed period Computational costs on the basis of the supply cost for the regenerated liquid given.This is obtained based on the form of thinking for selling regenerated liquid.
For example, it will be set as specified time limit one month.Due to measuring the integrated flow of regrowth liquid medicine using flow quantity recorder, Therefore by from this month table look-up time point integrated flow subtract before table look-up the moon time point integrated flow come be obtained this month supply again The supply amount of raw liquid.The supply amount of the regenerated liquid of this month supply is set as K (the L/ months).The supply unit price of regenerated liquid is set as E (member/L).Then, the supply cost of the regenerated liquid of this month is obtained as K × E (member/moon).As this month and regenerated liquid The development treatment expense of the associated substrate of supply asked to substrate manufacture person.
As its variation, the supply cost of regenerated liquid calculated as described above will be obtained plus various expenses sometimes Development treatment expense of the expense gone out as the substrate associated with the supply of regenerated liquid monthly.As the various expenses to be added Representative expense, have basic charge.It is carried in the service for signing the developer solution management that the regeneration treatment based on developer solution is realized During for involved contract, basic charge monthly is determined, regardless of whether the supply of regenerated liquid is carried out, all by the basic charge packet It is contained in the development treatment expense of substrate and makes requests on.It is of course also possible to without concerning item as basic charge, and will set Standby labour cost, material allocation expense, other various funds for maintaining administration fee or device operator etc. are included in the expense to be added It is interior.If the expense (such as basic charge) that will add up is set as Z (member/moon), the development treatment expense of substrate monthly become K × E+Z (member/moon).It is the sum of various expenses Z=∑s Z in the expense of additionjWhen, the development treatment expense of substrate monthly becomes K ×E+∑Zj(j=1,2,3) (member/moon).
In addition, as other variations, the amount of money obtained from the supply cost of regenerated liquid also is multiplied by subsidy rate F sometimes It is set as the development treatment expense of the substrate associated with the supply of regenerated liquid monthly.For example, the goods, materials and equipments of regenerated liquid or the tune of raw material Maintenance administration fee with involved every funds, device is when being considered with the supply amount of regenerated liquid (during this operating with device Between also have relationship) relevant be reasonable.In this case, subsidy rate F is multiplied by supply cost K × E of regenerated liquid (member/moon), the development treatment expense of substrate monthly are obtained as K × E × F (member/moon).Subsidy rate F can also be contained in The supply unit price E (member/L) of regenerated liquid.In addition, in the case of plus basic charge etc., the development treatment of substrate monthly is taken With as K × E × F+Z (member/moon).For more generally, the development treatment expense of substrate monthly is obtained as (K × E) × F+ ∑Zj(j=1,2,3 ...) (member/moon).
Second, as the development treatment expense of the associated substrate of supply with regenerated liquid, to substrate manufacture person request by because During the prescribed period the service for the developer solution management that the regeneration treatment based on developer solution of interior offer is realized and to substrate manufacture person with The economic interests come are multiplied by the amount of money obtained from defined ratio.This based on will caused by the regeneration treatment because of developer solution development The service of liquid pipe reason provide and economic interests that the person that makes substrate manufacture the generates person that gives substrate manufacture and ISP as Form of thinking and obtain.This is preferably applied to for example provide base to the substrate manufacture person of no regeneration treatment for implementing developer solution In situation of service of developer solution management that the regeneration treatment of developer solution is realized etc..
In the case of the regeneration treatment without developer solution, substrate manufacture person by developer solution used stipulated number it It all discards afterwards and is changed to new developer solution.Therefore, the waste liquid amount of developer solution is very more, and new developer solution must also be adjusted in large quantities Match.On the other hand, if carrying out regeneration treatment to developer solution and making its recycling, substrate manufacture person can enjoy as follows Various effects.That is, the usage amount of new developer solution is substantially cut down.The waste liquid amount of developer solution is also substantially cut down.
The calculating of development treatment expense as substrate associated with the supply of regenerated liquid under such circumstances it is specific Example can enumerate the number of the reduction amount of money for the cost of developer solution that will come by the subduction zone of developer solution usage amount into as specified time limit Substrate development treatment expense situation.
For example, it will be set as specified time limit one month.By substrate manufacture person receive involved by the utility model based on aobvious The service for the developer solution management that the regeneration treatment of shadow liquid is realized provide before, i.e. the substrate in the regeneration treatment for not implementing developer solution The amount of buying of the developer solution for each month that producer buys is set as M (the L/ months), and is bought unit price and be set as G (member/L). In the case that the variation of the developer solution amount of buying M is big, by it is past it is appropriate in a period of the average value of the developer solution amount of buying be set as M。
According to the integrated flow determined by flow quantity recorder, by because involved by the utility model based on developer solution again The supply amount of regenerated liquid that the service for the developer solution management that raw processing is realized is provided and supplied is obtained as K (the L/ months).It is multiplied by supplement The supply unit price E (member/L) of liquid, the supply cost of regenerated liquid monthly are obtained as K × E (member/moon).
Then, substrate manufacture person is by receiving the aobvious of the realization of the regeneration treatment based on developer solution involved by the utility model The reduction amount of money of cost of developer solution that the service of shadow liquid pipe reason is provided and can be obtained becomes M × G-K × E (member/moon).Using F as Ratio, the development treatment expense of substrate monthly are obtained as (M × G-K × E) × F (member/moon).It is of course also possible to it adds Basic charge etc..As ratio F, for example, one one-tenth (0.1), twenty percent (0.2), three one-tenth (0.3) etc..
It, can also be by the reduction amount of money for the treatment cost of waste liquor come by the subduction zone of the waste liquid amount of developer solution as variation Number into the associated substrate of the regeneration treatment with developer solution for being set as specified time limit development treatment expense.
The liquid waste processing expense monthly of developer solution before regeneration treatment is implemented is set as N (member/moon), by regeneration treatment When liquid waste processing expense monthly after implementation is set as P (member/moon) (wherein, N ＞ P), cut down due to the regeneration treatment of developer solution Liquid waste processing expense the reduction amount of money be N-P (member/moon).Substrate manufacture person pays monthly K due to the regeneration treatment of developer solution The supply cost of the regenerated liquid of × E (member/moon), therefore the waste liquid amount of substrate manufacture person cuts down the amount of money of involved economic interests As (N-P)-K × E (member/moon).The development treatment expense of the associated substrate of the regeneration treatment with developer solution monthly is in this base Ratio F is multiplied by plinth and is obtained as ((N-P)-K × E) × F (member/moon).Basic charge etc. can also be added.
As other variations, the amount of money of the economic interests of substrate manufacture person can also use the reduction gold of manufacture liquid cost The total amount of money for reducing the amount of money etc. of volume and liquid waste processing expense.Can also will from manufacture liquid cost the reduction amount of money and waste liquid at The total amount of money of the reduction amount of money of reason expense etc. subtracts the amount of money after supply cost K × E (member/moon) of replenisher and is regarded as substrate system The amount of money of total economic interests brought by the regeneration treatment of developer solution for the person of making, to calculate the development treatment expense of substrate monthly With.In this case, if cost of developer solution is reduced the amount of money and the total amount of money for reducing the amount of money etc. of liquid waste processing expense V (member/moon) is set as, then the development treatment expense of substrate becomes (V-K × E) × F (member/moon).Basic charge can also be added Deng.
It is new by providing this practicality to the substrate manufacture person for the regeneration treatment for having been carried out developer solution as another variation The service of the regeneration treatment of developer solution involved by type, can making substrate manufacture, person generates various economic interests.Equally by these Calculation of economic benefits for substrate monthly development treatment expense and asked to substrate manufacture person.
Even if in the case where having been carried out the regeneration treatment of developer solution, most substrate manufacture person still buys developer solution Regenerating unit and oneself operating, maintenance management, so as to carry out the regeneration treatment of developer solution.Therefore, substrate manufacture person is in developer solution Regeneration treatment in undertake the expenses such as every funds of allotment of raw material or goods, materials and equipments, the labour cost of device operator.In addition, still exist Situation using old regenerating treater is also more.
In this case, by by previous regeneration treatment be replaced into involved by the utility model based on developer solution The service of developer solution management realized of regeneration treatment, can be brought to substrate manufacture person and cost of developer solution, waste liquid cost The associated economic interests such as reduction.It in this case, also in the same manner as described above, can be by the integrated flow based on replenisher Obtained from economic interests the amount of money number into the development treatment expense being calculated as with the associated substrate of supply of regenerated liquid, and to Substrate manufacture person asks.
It is used about the new liquid for using modulating device modulation developer solution and as one of replenisher to substrate manufacture person Development processing apparatus supplies the business of the service to provide developer solution management, the developer solution also realized with the supply based on regenerated liquid The situation of the service of management similarly considers, the raw material of above-mentioned modulating device developer solution automatically modulates substrate manufacture person institute The developer solution of desired constituent concentration and as developer solution new liquid supply.Development treatment about substrate in this case is taken With, regenerated liquid is replaced into new liquid and is similarly considered, due to illustrating to repeat, omission specific description.
Next, to the concentration management device of the developer solution involved by the utility model and the developing system of substrate It illustrates.For realize provide developer solution concentration management service business for, can measured concentration management required for Replenisher it is supply amount, replenisher supplying tubing be equipped with flow quantity recorder be indispensable.Hereinafter, with reference to attached Figure illustrates the developing system for having the concentration management device of the developer solution of this flow quantity recorder and substrate.
(first embodiment)
Fig. 1 is the development treatment system for illustrating the substrate of the concentration management device A for having developer solution of present embodiment The schematic diagram of system.
In development process, developer solution dissolves the unnecessary portion of the photoresist film after exposure-processed, by This develops.Photoresist salt can be generated by being dissolved between the photoresist of developer solution and the alkali composition of developer solution.Cause This, if not being managed suitably to developer solution, with the progress of development treatment, has developing activity in developer solution Alkali composition is consumed and deteriorates, and developing performance deteriorates.Meanwhile it is dissolved in the photoresist in developer solution and is sent out with alkali composition Life is reacted and is constantly accumulated in the form of photoresist salt.
The photoresist for being dissolved in developer solution shows interfacial activity effect in developer solution.Therefore, it is dissolved in developer solution Photoresist can improve the wellability relative to developer solution of the photoresist film for being used to development treatment so that development The compatibility of liquid and photoresist film improves.Thus, in the developer solution moderately containing photoresist, developer solution is good Ground spreads all in the fine recess portion of photoresist film, so as to implement to have fine concave-convex photoresist well The development treatment of agent film.
In addition, in development treatment in recent years, with the enlargement of substrate, a large amount of developer solution of Reusability, therefore it is aobvious The chance that shadow liquid is exposed to air increases.However, alkaline-based developer can absorb the carbon dioxide in air if air is exposed to. Carbonate can be generated between absorbed carbon dioxide and the alkali composition of developer solution.Therefore, if inadequately managing developer solution, The absorbed carbon dioxide-depleted of the alkali composition with developing activity in developer solution and reduce.Meanwhile absorbed in developer solution Carbon dioxide is reacted with alkali composition and is constantly accumulated in the form of carbonate.
Carbonate in developer solution has development effect due to showing alkalinity in developer solution.Such as 2.38% In the case of TMAH aqueous solutions, if carbon dioxide in developer solution be about 0.4wt% or so hereinafter, if can develop.
In this way, different from " carbon dioxide that photoresist, the developed liquid dissolved in developer solution absorbs is in development treatment In be unwanted substance " as existing cognition, in fact, the photoresist dissolved in developer solution or developed liquid absorb Carbon dioxide contribute to the developing performance of developer solution.Therefore, be not into be about to dissolve photoresist, absorb dioxy Change carbon developer solution management as exclusion completely, but need to carry out following developer solution management, that is, allow in developer solution slightly Slightly soluble has dissolving photoresist, absorbing carbon dioxide and they is maintained management into best concentration.
In addition, the photoresist salt or a part for carbonate that generate in developer solution dissociate, and generate photic Various dissociated ion such as resist ion or carbonate ions, carbonic acid hydrogen ion.Also, these dissociated ions are with various Activity ratio has an impact the conductivity of developer solution.
The constituent concentration analysis and utilization of previous alkaline-based developer is the alkali composition concentration of developer solution and leading for developer solution The absorbance value of dissolving photoresist agent concentration and developer solution of the electric rate value with good linear relation and developer solution is with good Good this principle of linear relation is (hereinafter, these are referred to as " existing method ".).
The conductivity values of developer solution are to depend on charged particles number and its quantities of electric charge such as ion contained in developer solution Physics value.In developer solution, as described above, there is only alkali compositions, also there is the photoresist dissolved in developer solution The various dissociated ions of carbon dioxide that agent, developed liquid absorb.Therefore, it in order to improve the analysis precision of constituent concentration, needs Use the operation method for taking into account these dissociated ions to the influence that the conductivity values of developer solution are brought.
The absorbance value of developer solution is that have between the concentration of the special component of the light of the measure wavelength with selectively absorbing There is the physics value (lambert Bill rule) of linear relation.But in multicomponent system, although difference of its degree because measuring wavelength And it is different, but the extinction spectrum of usually object component can be Chong Die with the extinction spectrum of other compositions.Therefore, it is dense in order to improve ingredient The analysis precision of degree needs the absorbance value of developer solution is brought using the photoresist dissolved in not only consideration developer solution The operation method influence, also taken into account other compositions to the influence that the absorbance value of developer solution is brought.
In the present embodiment, operation method uses multiple-regression analysis (for example, multiple regression analysis method).By using Multiple-regression analysis (for example, multiple regression analysis method), compared with the conventional method, can accurately calculate developer solution it is each into The concentration divided.In addition, absorbing carbon dioxide concentration can be measured.If using multiple-regression analysis is passed through (for example, multiple regression point Analysis method) calculate developer solution constituent concentration, then can be dense by dissolving photoresist agent concentration, the absorbing carbon dioxide of developer solution Degree maintains management as good state.
First, as the example of multiple-regression analysis, multiple regression analysis is illustrated.Multiple regression analysis includes school Just with prediction two stages.In the multiple regression analysis of n ingredients system, prepare m calibration standard solution.It will be present in i-th The concentration of j-th of ingredient in solution is expressed as Cij.Here, i=1~m, j=1~n.For m standard solution, measure respectively P characteristic value (for example, the physics values such as absorbance or conductivity under a certain wavelength) Aik(k=1~p).Concentration data and spy Property data be able to summarize and with a matrix type (C, A) represent.
[formula 1]
It will be known as correction matrix to matrix obtained from these matrix opening relationships, herein with symbol S (Skj；K=1~p, j =1~n) it represents.
[formula 2]
C=AS
(can be not only the measured value of homogeneity or heterogeneous survey for the content of A according to known C and A Definite value mixes.For example, conductivity, absorbance and density.) and calculate the stage of S as calibration phase using matrix operation. Now it is necessary to it is p >=n and m >=np.The all unknown numbers of each element of S, it is therefore desirable for m ＞ np, in this case, with as follows Mode carries out least square operation.
[formula 3]
S=(ATA)-4(ATC)
Here, upper target T represents transposed matrix, upper target -1 represents inverse matrix.
P characteristic value is measured for the unknown sample liquid of concentration, if they are set as Au (Auk；K=1~p), then will Its concentration C u (Cu that can obtain requiring out that are multiplied with Sj；J=1~n).
[formula 4]
Cu=AuS
This is forecast period.
In the 2.38%TMAH aqueous solutions shown in an example as alkaline-based developer, it is considered as by alkali composition, dissolving The multicomponent system (n=3) of photoresist and absorbing carbon dioxide these three ingredients composition, according to the characteristic as the developer solution Three characteristic values (p=3) of value, i.e., the absorbance value under the conductivity values of developer solution, specific wavelength and density value simultaneously utilize more First regression analysis calculates each constituent concentration.
Multiple-regression analysis (such as multiple regression analysis method) is for operation and the concentration of multiple ingredients is obtained is effective. Can measure multiple characteristic value a, b of developer solution, c ..., according to the measured value of these characteristic values and utilize multiple-regression analysis (such as multiple regression analysis method) come be obtained constituent concentration A, B, C ....At this point, for the constituent concentration to be each obtained, at least With the constituent concentration there is associated characteristic value to need at least to be measured one and be used for operation.
Here, refer to that the characteristic value has with the constituent concentration with the characteristic value of constituent concentration " with associated " developer solution Relationship changes such relationship according to the variation of the constituent concentration in characteristic value.For example, with the constituent concentration of developer solution At least constituent concentration A have associated developer solution characteristic value a refer to, by the use of using constituent concentration as variable function come When characteristic value a is obtained, one in variable includes at least constituent concentration A.Characteristic value a can be only relevant with constituent concentration A Function, but the multi-variable function other than constituent concentration A also using constituent concentration B or C etc. as variable is usually become, at this point, It is just very big using the meaning of multiple-regression analysis (such as multiple regression analysis method).
In addition, constituent concentration is to represent scale of the ingredient relative to whole relative quantity.The developer solution being used repeatedly The constituent concentration of mixed liquor that such ingredient increases and decreases as time goes by is not determined individually by the ingredient, usually becomes it The function of the concentration of his ingredient.Therefore, the relationship of the characteristic value of developer solution and constituent concentration be difficult to mostly with the chart of plane come It represents.In this case, in operation method for using calibration curve etc., can not ingredient be calculated according to the characteristic value of developer solution Concentration.
However, according to multiple-regression analysis (such as multiple regression analysis method), prepare one group and the constituent concentration to be calculated Measured value with associated multiple characteristic values, and they are calculated into one group of constituent concentration for operation.Based on multivariable solution Analysis method (such as multiple regression analysis method) in the component concentration measuring that carries out, can obtain following remarkable result：Even first It is difficult to the constituent concentration measured at a glance, it can also be by measuring characteristic value come measuring component concentration.
As described above, by using multiple-regression analysis (for example, multiple regression analysis method), it being capable of the spy based on developer solution The measured value of property value (for example, absorbance and density under conductivity, specific wavelength) calculates the alkali composition concentration of developer solution, molten Solve photoresist agent concentration and absorbing carbon dioxide concentration.Therefore, compared with the conventional method, each ingredient can accurately be calculated Concentration.
In addition, due to the use of multiple-regression analysis (such as multiple regression analysis method), thus calculate developer solution into The characteristic value of the developer solution not in linear relation with the specific constituent concentration of developer solution can also be used by dividing in the operation of concentration. As the characteristic value of the developer solution suitable for use, except under the conductivity of developer solution, specific wavelength absorbance, in addition to density, energy Enough enumerate refractive index, ultrasonic propagation velocity, viscosity, pH, titration end-point of the light of developer solution etc..
Next, the developing system of substrate is illustrated using Fig. 1.Fig. 1 is the base for having concentration management device The developing system of plate, the concentration management device measure the concentration of three kinds of ingredients of developer solution (for example, alkali composition concentration, molten Solution photoresist agent concentration, absorbing carbon dioxide concentration) and the control valve being equipped in the piping of supply replenisher is controlled System.The developing system of substrate is mainly from the concentration management device A of developer solution, development processing apparatus B, by replenisher to development Processing unit B conveying piping 81,82,83, be provided to piping 81,82,83 flow quantity recorder 151,152,153 and control Valve 41,42,43 is formed.In addition, development processing apparatus B also with the developer solution stoste hold-up vessel of the hold-up vessel as replenisher 91st, the connections such as new liquid hold-up vessel 92 of developer solution.
First, simple declaration development processing apparatus B.
Development processing apparatus B mainly by developer solution storagetank 61, overflow launder 62, developing room shield 64, roller conveyor 65, 67 grade of developer solution spray nozzle is formed.Developer solution is stored in developer solution storagetank 61.Developer solution is carried out by supplementing replenisher Composition management.Developer solution storagetank 61 has liquid level meter 63 and overflow launder 62, the increase to liquid measure caused by supply replenisher It is managed.Developer solution storagetank 61 and developer solution spray nozzle 67 are connected by development liquid pipeline 80, are stored in developer solution storagetank Developer solution in 61 is under the action of the circulating pump 72 set on development liquid pipeline 80 via filter 73 to developer solution spray nozzle 67 Conveying.Roller conveyor 65 is provided to the top of developer solution storagetank 61, for carrying the substrate for making and having photoresist film 66.Developer solution drips from developer solution spray nozzle 67, and the substrate 66 conveyed by roller conveyor 65 passes through among the developer solution that drips And developed liquid infiltration.Later, the developed liquid storagetank 61 of developer solution is recycled and is stored again.In this way, developer solution is in development work It recycles and is used repeatedly in sequence.It should be noted that in the developing room of small-sized glass substrate, also sometimes through full of nitrogen The modes such as gas are handled to implement to prevent to absorb as the carbon dioxide in air.It should be noted that the developer solution deteriorated It is discarded (discharge) by acting waste drains pump 71.
In addition, it is connected with to stir following for the developer solution being stored in developer solution storagetank 61 in development processing apparatus B Ring rabbling mechanism D.Circulation stirring mechanism D is made of the circulation line 90 that circulating pump 74 and filter 75 are equipped in midway, is followed Endless tube road 90 is connect with the bottom of developer solution storagetank 61 and side.When circulating pump 74 is made to work, it is stored in developer solution storage The developer solution of slot 61 is recycled via circulation line 90.Carry out being stored in the developer solution of developer solution storagetank 61 as a result, Purification and stirring.
Next, the concentration management device A of the developer solution of present embodiment is illustrated.The concentration pipe of present embodiment Reason device A has measuring means 1, arithmetical organ 2 and control mechanism 3.
Assuming that the concentration management device for the developer solution for the service for being adapted to provide for concentration management being connect with development processing apparatus B A is preferably also to be connect with supplying the piping 81,82,83 of replenisher, in this of the inside of the concentration management device by developer solution Have the control valve 41,42,43 controlled by control mechanism 3 in a little pipings 81,82,83 and the integrated flow of replenisher is counted Internal part of the flow quantity recorder 151,152,153 of survey as the concentration management device of developer solution.
However, the concentration management device A as the developer solution for forming developing system, it is not necessary to have control valve 41st, 42,43,151,152,153 internal part as concentration management device A of flow quantity recorder.As shown in Figure 1, concentration management Device A and control valve 41,42,43 and flow quantity recorder 151,152,153 can also be separately formed and form development treatment system System.
It is in each of the following embodiments and identical.
The concentration management device A of developer solution is connected by sampling piping 15 and returning to piping 16 with developer solution storagetank 61 It connects.Measuring means 1 and arithmetical organ 2 are connected by determination data signal wire 51,52,53.
Measuring means 1 has sampling pump 14, the first detector 11, the second detector 12 and third detector 13 (sometimes First detector 11, the second detector 12 and third detector 13 are referred to as characteristic value testing agency.In addition, " first ... ", The terms such as " second ... ", " third ... " are not intended to limit the measure sequence of each detector in measuring means 1.It is used for the purpose of It is used convenient for distinguishing each detector.It is in the following description and identical.).Characteristic value testing agency 11,12,13 The back segment with sampling pump 14 is connect in series.Measuring means 1 further preferably has to improve measurement accuracy and makes sampling Developer solution stabilization is in the thermoregulation mechanism (not shown) of set point of temperature.Sampling piping 15 and the sampling pump 14 of measuring means 1 connect It connects, return piping 16 is connect with the piping of characteristic value testing agency end.
Characteristic value testing agency 11,12,13 be for pair with the ingredient for the developer solution wanted to be measured and managed Concentration has the measuring device that the characteristic value of associated developer solution is detected.For example, wanting to measure and manage developer solution In the case of alkali composition concentration, dissolving photoresist agent concentration and absorbing carbon dioxide concentration, the conductivity of developer solution is detected The conductivity meter of value, the extinction photometer for detecting absorbance value under the specific wavelength (such as 560nm) of developer solution, detection development Densimeter of the density value of liquid etc. becomes characteristic value testing agency 11,12,13.
In Fig. 1, measuring means 1 is depicted to be integrally formed with arithmetical organ 2, control mechanism 3 and form concentration management dress It puts A and developer solution is sampled and is measured the mode of the characteristic value of developer solution, however, it is not limited to this.Characteristic value detection machine The measuring principle or it is expected as the characteristic value of the developer solution of detection object that each detector of structure 11,12,13 is used according to it It is equipped with best set-up mode.For example, it can be detector is directly mounted at the developer solution storage of development processing apparatus B Slot 61, detector probe portion be impregnated in developer solution storagetank 61 or detector is installed on development liquid pipeline 80.At this point, Measuring means 1 is sometimes also separately formed with arithmetical organ 2, control mechanism 3.
Arithmetical organ 2 contains the computing module 21 based on multiple-regression analysis.Arithmetical organ 2 can also further include based on The computing module of the different operation method of multiple-regression analysis.For example, it is according to the characteristic value of developer solution and utilization detected Calibration curve method calculates computing module of the constituent concentration of corresponding developer solution etc..Computing module 21 based on multiple-regression analysis It is connect with the first detector 11 being provided in measuring means 1 with signal wire 51 by determination data, is used by determination data Signal wire 52 and connect with the second detector 12 being provided in measuring means 1 and by determination data with signal wire 53 and It is connect with the third detector 13 being provided in measuring means 1.
Next, the measure of the characteristic value of the developer solution of the concentration management device A progress by developer solution is acted and shown The operation action of the constituent concentration of shadow liquid illustrates.
By sampling pump 14 developer solution is directed to by sampling piping 15 from the developer solution that developer solution storagetank 61 samples Concentration management device A measuring means 1 in.Then, in the case where having thermoregulation mechanism, the developer solution quilt that is sampled Thermoregulation mechanism is delivered to, and is maintained at defined measuring temperature (such as 25 DEG C), and then is transported to characteristic value detection Mechanism 11,12,13.Developer solution after measure is back to developer solution storagetank 61 by returning to piping 16.
The measured value of the characteristic value of developer solution determined by characteristic value testing agency 11,12,13 is respectively via measure number According to the computing module 21 that multiple-regression analysis is transported to signal wire 51,52,53.Computing module 21 utilizes multivariate analysis Method calculates the progress operation of these measured values the constituent concentration of developer solution.So, it is filled using the concentration management of developer solution A is put to measure the constituent concentration of developer solution.
Arithmetical organ 2 is connect by operational data with signal wire 54 with control mechanism 3.Arithmetical organ and control mechanism It can be integrally constituted for example, by computer etc..
Control mechanism 3 includes control module 31.Control module 31 is by controlling signal with signal wire 55,56,57 and with setting It is connected in the control valve 41,42,43 of the piping 81,82,83 of replenisher supply.Control mechanism 3 is calculated according to by arithmetical organ 2 The concentration of developer solution determine to supplement how much which kind of replenisher is measured, and the control valve to being set in the piping of conveying replenisher Control is opened and closed.
The accumulative stream for measuring supplied replenisher is also respectively equipped in the piping 81,82,83 of replenisher supply The flow quantity recorder 151,152,153 of amount.Sometimes it is not provided with flow quantity recorder in the piping 83 of pure water supply.
The new liquid hold-up vessel 92 of developer solution stoste hold-up vessel 91, developer solution is pressurizeed by nitrogen, and control mechanism 3 is to control valve 41st, it 42,43 is opened and closed, thus replenisher is fed by collaborating pipeline 89 to developer solution.The replenisher supplied is by following Ring pump 74 is simultaneously back to developer solution storagetank 61 via circulation line 90 and is stirred.
It should be noted that replenisher refers to the stoste such as developer solution, new liquid, pure water.Sometimes also include regenerated liquid. Stoste refers to the dense not used developer solution of alkali composition concentration (such as 20~25%TMAH aqueous solutions).New liquid refers to alkali composition Concentration and a concentration of identical concentration used in developing procedure and not used developer solution (such as 2.38%TMAH is water-soluble Liquid).Regenerated liquid refer to from removal is used in the developer solution finished not need to substance (such as photoresist ingredient) and can be again The developer solution utilized.Their purposes and effect difference as replenisher.For example, stoste is for improving alkali composition concentration Replenisher, and reduce dissolving photoresist agent concentration and absorbing carbon dioxide concentration.New liquid is for maintaining alkali composition concentration Or alkali composition concentration is made slowly to increase and decrease and reduces the supplement of dissolving photoresist agent concentration and absorbing carbon dioxide concentration Liquid.Pure water is for reducing the replenisher of each constituent concentration.Regenerated liquid is for reducing the supplement of dissolving photoresist agent concentration Liquid.It is also identical in the explanation of following embodiment.
Control mechanism 3 is to the constituent concentration of developer solution and the pipe of pre-stored constituent concentration that are calculated by arithmetical organ 2 Reason desired value is compared.Control mechanism 3 carries out needing the supplement fed in order to which constituent concentration is maintained management objectives value The selection of liquid, the calculating of the supply amount of replenisher or should by be arranged on conveying replenisher piping on control valve open when Between calculating.Control mechanism 3 via control signal signal wire 55,56,57 and to be arranged on replenisher supply piping 81, 82nd, any appropriate control valve of the control valve 41,42,43 in 83 sends the signal of open and close control.
Flow path is opened the stipulated time by the control valve for receiving control signal based on the control signal.Control valve is preset There is flow during opening.Therefore, the replenisher of specified amount is supplied by the way that flow path is opened the stipulated time.
It is for example, the control that the alkali composition concentration management of TMAH aqueous solutions (developer solution) is 2.38% is as described below.By When the concentration for the alkali composition that arithmetical organ 2 calculates is less than 2.38%, piping (developer solution stoste supplying tubing) 81 will be set to Control valve 41 opens the stipulated time, feeds preprepared in developer solution stoste hold-up vessel (replenisher hold-up vessel) 91 The stoste (20%TMAH aqueous solutions) of developer solution.When the concentration of alkali composition is higher than 2.38%, being set to piping, (pure water supplies Piping) 83 control valve 43 opens the stipulated time and feeds pure water.
Equally, it is as described below for the control below defined management concentration that photoresist concentration management will be dissolved.By When the dissolving photoresist agent concentration that arithmetical organ 2 calculates is higher than defined management value, being set to piping, (the new liquid of developer solution supplies To piping) 82 control valve 42 opens the stipulated time, it feeds in the new liquid hold-up vessel of developer solution (replenisher hold-up vessel) 92 The new liquid (not used 2.38%TMAH aqueous solutions) of preprepared developer solution.For regenerated liquid can be fed as supplement In the system structure of liquid, regenerated liquid can also be fed.
About the absorbing carbon dioxide concentration management of developer solution is similarly as follows for the control below defined management value It is described.When the absorbing carbon dioxide concentration of the developer solution calculated by arithmetical organ 2 is higher than defined management value, match being set to The control valve 42 for managing (the new liquid supply piping of developer solution) 82 opens the stipulated time, feeds and (is mended in the new liquid hold-up vessel of developer solution Filling liquid hold-up vessel) the new liquid (not used 2.38%TMAH aqueous solutions) of preprepared developer solution in 92.
Replenisher is stored in the new liquid hold-up vessel 92 of developer solution stoste hold-up vessel 91, developer solution of replenisher reservoir C In.The new liquid hold-up vessel 92 of developer solution stoste hold-up vessel 91, developer solution is connected with the nitrogen for having gas-pressurized valve 46,47 Gas pipeline, and the nitrogen pressurization supplied via the pipeline.In addition, developer solution stoste hold-up vessel 91, the new liquid of developer solution Hold-up vessel 92 is connected separately with the piping 81,82 of replenisher, and replenisher is conveyed via the valve 48,49 of normally open. In the piping 81,82 of replenisher and the piping 83 of pure water equipped with control valve 41,42,43, control valve 41,42,43 by The control opening and closing of control mechanism 3.By making control valve events, it is stored in the new liquid storage of developer solution stoste hold-up vessel 91, developer solution The replenisher of container 92 is conveyed by pressure, and conveys pure water.Then, replenisher via interflow pipeline 89 and with circulation stirring machine Structure D collaborates, and feeds and is stirred to developer solution storagetank 61.
Cause to be stored in developer solution stoste hold-up vessel 91 and in the new liquid hold-up vessel 92 of developer solution because of supply Replenisher reduce when, interior drops and supply amount is made to become unstable, therefore correspondingly suitably opened with the reduction of replenisher Gas-pressurized supplies nitrogen with valve 46,47, so as to maintain to ensure that the new liquid storage of developer solution stoste hold-up vessel 91, developer solution is held The internal pressure of device 92.When developer solution stoste hold-up vessel 91, the new liquid hold-up vessel 92 of developer solution are emptying, valve 48,49 is closed, more It is changed to the new replenisher storagetank full of replenisher or the replenisher separately allocated is refilled in emptying developer solution The new liquid hold-up vessel 92 of stoste hold-up vessel 91, developer solution.
So, the alkali composition concentration of TMAH aqueous solutions is 2.38% by concentration management, dissolves photoresist agent concentration With absorbing carbon dioxide concentration by concentration management for below defined management value.Concentration management is for example, by PID control (Proportional-Integral-Differential Control) etc. is carried out.
Flow quantity recorder 151,152,153 is equipped in the piping 81,82,83 of replenisher supply.Flow quantity recorder 151, 152nd, 153 pairs of pipings 81,82,83 via replenisher supply and the integrated flow of replenisher that supplies is measured.From aobvious The replenisher of the concentration management device A supplies of shadow liquid is after flow quantity recorder 151,152,153 has been passed through, in interflow pipeline 89 Collaborate and fed via circulation line 90 to developer solution storagetank 61.The expectation of flow quantity recorder 151,152,153 has communication Function.It, can be by flow quantity recorder and network connection if having communication function.It can hold what is determined via network The measured value of integrated flow.
Flow quantity recorder 151,152,153 is not limited to direct situation connected to the network, can also indirectly with net Network connects.For example, flow quantity recorder 151,152,153 can also be in the concentration management device A of developer solution with undertaking developer solution Concentration management device A operation, control function computer connection, and with the concentration management device A and network of developer solution The mode of connection indirectly with network connection.
In addition, the network connected for flow quantity recorder 151,152,153 can be LAN in factory or because The wide area networks such as spy's net.
As described above, the concentration management device of the developer solution of present embodiment and the developing system of substrate are utilized Realize the concentration management of developer solution, substrate manufacture person can use be managed developer solution for optimum state always and to substrate Carry out development treatment.At this point, utilize the flow quantity recorder 151,152,153 being equipped in the piping 81,82,83 of supply replenisher To measure the integrated flow of supplied replenisher.Due to measuring the integrated flow of replenisher, can calculate based on supplement The reasonable expense of the supply amount of liquid.
The concentration management device of the developer solution of present embodiment shown in FIG. 1 and the developing system of substrate are only It is to illustrate, it is not limited to which.In the concentration management device A of the developer solution of Fig. 1, although showing replenisher supply The device that the splits such as piping 81,82,83, control valve 41,42,43 are formed, but the piping 81 of replenisher supply, 82,83, control Valve 41,42,43 etc. can also be the device being integrally formed with concentration management device A.Also the not office such as internal structure of measuring means 1 It is limited to Fig. 1, and can be adopted in various manners according to type of developer solution etc..
As the flow quantity recorder for having communication function, for example, as it is known that there is the Coriolis-type digital stream of KEYENCE companies Quantity sensor FD-S series etc..By installing communication unit, can by the various data such as the integrated flow data determined with People's computer etc. communicates.Therefore, it is possible to remotely monitor integrated flow.
(second embodiment)
Fig. 2 is the schematic diagram for illustrating the developing system of substrate.The developing system of the substrate has：This reality Apply concentration management device A, development processing apparatus B and the modulating device E of the developer solution of mode；It is aobvious to development processing apparatus B supplies The stoste of shadow liquid as the piping 81 of replenisher, to the piping 83 of development processing apparatus B supply pure water, to development processing apparatus B It supplies by the new liquid piping 84 of the new liquid of the modulating device E developer solutions modulated；It is arranged respectively in these pipings and by dense Spend the control valve 41,43,44 and flow quantity recorder 151,153,154 of managing device A controls.
In fig. 2, the new liquid of the developer solution supplied as replenisher is used the developer solution as its raw material by modulating device E Stoste and pure water automatically modulate and supplied.Modulating device E is connected via new liquid with piping 84 with development processing apparatus B It connects.New liquid piping 84 has control valve 44 and flow quantity recorder 154.
In addition, in fig. 2 it is shown that the side of developer solution stoste is supplied from developer solution stoste hold-up vessel 91 by delivery pump 77 Formula.The conveying of liquid is not limited to the method pressurizeed using gas, can also be carried out by delivery pump.
In addition, the structure of concentration management device A and development processing apparatus B about developer solution, action, implement with first Mode is identical, therefore omits its repeat description.
Modulating device E mainly has the new liquid preparation vessel 301 of the new liquid of modulation developer solution, stores the new liquid modulated in advance New liquid storagetank 302 and the control device (such as computer) 331 that is controlled the action of modulating device E.Modulation dress E is put to connect with developer solution stoste hold-up vessel 91 via developer solution stoste supplying tubing 86.Developer solution stoste is stored and is held For device 91, a shared appearance is portrayed as by the container being connect with modulating device E and with the development processing apparatus B containers connecting Device, but can also prepare respectively.In addition, modulating device E is connect with pure water supplying tubing 87.
New liquid preparation vessel 301 is connect via developer solution stoste supplying tubing 86 with developer solution stoste hold-up vessel 91, from And receive the supply of the stoste of developer solution.New liquid preparation vessel 301 is connect with pure water supplying tubing 87, so as to receive the confession of pure water It gives.In developer solution stoste supplying tubing 86 and pure water supplying tubing 87 equipped with control valve 341,342.Control valve 341,342 By 331 control action of control device.In addition, in developer solution stoste supplying tubing 86 equipped with for conveying the defeated of developer solution stoste Send pump 78.
New liquid preparation vessel 301 has densimeter 311 and liquid level meter 312.Densimeter 311 and liquid level meter 312 respectively via Signal wire 351,352 and connect with control device 331, and concentration information, the liquid level position of new liquid preparation vessel 301 that will be determined Information is sent to control device 331.In addition, new liquid preparation vessel 301 and new liquid storagetank 302 are connected by communicating pipe 380.Newly Liquid storagetank 302 has liquid level meter 322.Liquid level meter 322 is connect by signal wire 353 with control device 331, by new liquid storagetank 302 liquid level position information is sent to control device 331.New liquid storagetank 302 can also be further provided with densimeter.
In the new liquid for modulating developer solution, suitably the action of control valve 341 and 342 is controlled using control device 331 System, stoste, pure water to new liquid preparation vessel 301 supply developer solution.In new liquid preparation vessel 301, by the stoste of developer solution with it is pure Water mixes, and modulates the developer solution of normal concentration.Densimeter 311 monitors that is modulated in new liquid preparation vessel 301 shows always The concentration of shadow liquid.
To the concentration of new liquid preparation vessel 301 monitored as a result, for example, the concentration in the developer solution modulated is diluter When, the control valve 342 for being provided to pure water supplying tubing 87 is closed using control device 331, therefore, the confession of the stoste of developer solution To relative increase, the concentration of the developer solution in new liquid preparation vessel 301 rises.In addition, for example, the developer solution modulated concentration When denseer, the control valve 341 for being provided to developer solution stoste supplying tubing 86 is closed using control device 331, is diluted by pure water The concentration of developer solution in new liquid preparation vessel 301.Concentration information of the control device 331 based on densimeter 311 makes to modulate in new liquid The developer solution that slot 301 modulates becomes defined concentration.
When liquid level position in new liquid preparation vessel 301 is less than defined lower limiting value, control device 331 opens control valve 341st, 342, and increase developer solution stoste and the supply amount of pure water, realize the recovery of liquid level position.In new liquid preparation vessel 301 Liquid level position be higher than defined upper limit value when, 331 closing control valve 341 and 342 of control device, so as to stop developer solution stoste And the supply of pure water.Liquid level position about new liquid storagetank 302 is also the same.The liquid level of two slots by by the new liquid modulated to Development processing apparatus B is supplied and is reduced.Control device 331 is adjusted based on the liquid level position information of liquid level meter 312,322 to control The liquid measure of the developer solution of system, so that the liquid level position of two slots is in defined range.
The circulating pump 371 that a part for developer solution in new liquid preparation vessel 301 is provided to circulation line 381 take out and again Secondary return, so as to by circulation stirring.Similarly, part of it is provided to circulation pipe to developer solution in new liquid storagetank 302 The circulating pump 372 on road 382 takes out and again returns to, so as to by circulation stirring.
It is conveyed in the developer solution that new liquid preparation vessel 301 modulates by communicating pipe 380 to new liquid storagetank 302.According to new The situation of the liquid measure reduction of developer solution in liquid storagetank 302, the developer solution in new liquid preparation vessel 301 are stored naturally to new liquid Slot 302 conveys.Communicating pipe 380 has appropriate internal diameter and length, and having makes the concentration change in new liquid preparation vessel 301 not to new The effect of the level for the concentration change that liquid storagetank 302 affects.
The new liquid of the developer solution in new liquid storagetank 302 is stored under the action of delivery pump 373 via new liquid piping 84 convey to development processing apparatus B.It is at this point, new to what is supplied using the flow quantity recorder 154 for being provided to new liquid piping 84 The integrated flow of liquid is measured.The control valve 343 of new liquid piping 84 is connect via signal wire 354 with control device 331, is controlled 343 controlled device of valve, 331 control action processed.In the new liquid of developer solution that conveying modulates, control device 331 makes control valve 343 open.
For example, control device 331 is connect with development processing apparatus B in advance.In this case, it is filled from development treatment When putting B and having received new liquid supply request signal, control device 331 can open control valve 343.It if in addition, in advance will development The concentration management device A of liquid is connect with control device 331, then feeds new liquid as supplement in the concentration management device A of developer solution The opportunity of liquid can also supply the new liquid of developer solution from modulating device E to development processing apparatus B.In this case, due to New liquid has control valve 44, therefore can also omit control valve 343 with piping 84.
The developing system of the substrate of present embodiment shown in Fig. 2 only illustrates.Present embodiment has Development processing apparatus, the concentration management device of developer solution, modulating device and flow quantity recorder substrate developing system It is not limited to which.
In the developing system of the substrate of second embodiment, the concentration management of developer solution, substrate can be also realized Producer can use the developer solution being managed always as optimum state and carry out development treatment to substrate.At this point, using supplying Piping 81 to replenisher, 83, new liquid measure supplied benefit with the flow quantity recorder 151,153,154 being equipped in piping 84 The integrated flow of filling liquid.Due to measuring the integrated flow of replenisher, can expense reasonably be calculated based on the supply amount of replenisher With.
(third embodiment)
Fig. 3 is for illustrating the concentration management device A for having developer solution of present embodiment, development processing apparatus B, regeneration The schematic diagram of the developing system of the substrate of device F and flow quantity recorder 151,152,153,155.
In figure 3, the developer solution in development processing apparatus B after use is regenerated as to recycle by regenerating unit F.By Regenerated liquid after regenerating unit F regeneration is supplied as one of replenisher to development processing apparatus B.Regenerating unit F is via regeneration Liquid is connect with piping 85 with development processing apparatus B.Regenerated liquid piping 85 has control valve 45 and flow quantity recorder 155.
In addition, the concentration management device A of the developer solution of Fig. 3 is that have control valve in the concentration management device A of developer solution 41st, 42,43, the 45, mode of piping 81,82,83 and regenerated liquid piping 85.In addition, about developer solution stoste hold-up vessel 91 and the new liquid hold-up vessel 92 of developer solution, it is to be pressurizeed and conveyed by using nitrogen in the same manner as first embodiment The mode of the stoste of developer solution and the new liquid of developer solution.
It should be noted that it in figure 3, depicts flow quantity recorder 151,152,153,155 and is provided in concentration management dress The mode of the outside of A is put, however, it is not limited to this.It can also be in the same manner as control valve 41,42,43,45, by flow quantity recorder 151st, it 152,153,155 is provided in concentration management device A as its internal part.
In addition, the structure of concentration management device A and development processing apparatus B about developer solution, action, implement with first Mode is identical, therefore omits its repeat description.
Regenerating unit F mainly has：Developer solution removal after using does not need to substance and developer solution is carried out regenerated Filter 461,462,463；The regenerated liquid storagetank 493 of storage regenerated liquid in advance；And the control of the action of control regenerating unit F Device (such as computer) 431 processed.Regenerating unit F via use finish developer solution conveying piping 88 and with for storing from development The use that processing unit A discards the developer solution of (discharge) finishes developer solution hold-up vessel 99 and connects.To finish developer solution defeated using Delivery pipe 88 is equipped with delivery pump 76, and regenerating unit F is transported to using the developer solution finished in developer solution hold-up vessel 99.
Filter 461,462,463 finishes developer solution conveying piping 88 with use and connect, to being discarded from development processing apparatus B The developer solution of (discharge) is conveyed.Filter 461,462,463 will not need to substance, for example in developer solution in developer solution The removals such as the resist residue of suspension.Developer solution after being regenerated by filter 461,462,463 is stored in regenerated liquid storagetank 493。
Be stored in the regenerated liquid of regenerated liquid storagetank 493 under the action of delivery pump 471 by control valve 441 to will regenerate The regenerated liquid piping 85 that device F is connect with development processing apparatus B conveys, and is filled via regenerated liquid with piping 85 to development treatment Put B conveyings.At this point, using accumulative stream of the flow quantity recorder 155 of regenerated liquid pipeline 85 to the regenerated liquid supplied is provided to Amount is measured.
Control valve 441 and delivery pump 471 are connect respectively by signal wire 451,452 with control device 431.Control valve 441 and 471 controlled device of delivery pump, 431 control action.When conveying regenerated liquid, control device 431 drive delivery pump 471 and Open control valve 441.
For example, control device 431 is connect with development processing apparatus B in advance.In this case, it is filled from development treatment Put B have received regenerated liquid supply request signal when, control device 431 can open control valve 441.It if in addition, in advance will be aobvious The concentration management device A of shadow liquid is connect with control device 431, then feeds regenerated liquid conduct in the concentration management device A of developer solution The opportunity of replenisher can also supply regenerated liquid from regenerating unit F to development processing apparatus B.In this case, due to again Raw liquid has control valve 45, therefore can also omit control valve 441 with piping 85.
The developing system of the substrate of present embodiment shown in Fig. 3 only illustrates.Present embodiment has Development processing apparatus, the concentration management device of developer solution, regenerating unit and flow quantity recorder substrate developing system It is not limited to which.
In addition, for the regenerated principle of developer solution to be made to be not limited to the filtering based on filter.For example, base can be replaced In the filtering of filter, and use partial crystallization, electrolysis, UF membrane etc..It is expected according to liquid, the property for not needing to substance that should be detached Deng appropriate to use the equipment based on suitable principle.
In addition, in figure 3, mode of the connection side by side there are three filter is depicted, but the number of filter is not limited to In three.It may be one.Filter due to the use of and change with time and block sometimes, accordingly, it is considered to till that time Repair situation, it is expected to be equipped with multiple filters side by side.
In the developing system of the substrate of third embodiment, the concentration management of developer solution, substrate can be also realized Producer can use the developer solution being managed always as optimum state and carry out development treatment to substrate.At this point, using supplying It is counted to the piping 81,82,83 and regenerated liquid of replenisher with the flow quantity recorder 151,153,153,155 being equipped in piping 85 Survey the integrated flow of supplied replenisher.It, being capable of the supply based on replenisher due to measuring the integrated flow of replenisher Amount and reasonably computational costs.
It should be noted that, although respectively illustrate the development for the substrate for having modulating device E in this second embodiment Processing system and have in the third embodiment regenerating unit F substrate developing system but it is also possible to be have adjust The structure of both device E and regenerating unit F processed.
(the 4th embodiment)
Fig. 4 is the base for illustrating the concentration management device A and development processing apparatus B that have developer solution of present embodiment The schematic diagram of the developing system of plate.The concentration management device A of the developer solution of the developing system of substrate shown in Fig. 4 shows Go out to be configured with control valve 41,42,43, the piping 81,82,83 of replenisher supply in the concentration management device A of developer solution Mode.But, it is not limited to this or control valve 41,42,43, piping 81,82,83 are present in the concentration of developer solution Mode other than managing device A.As long as control mechanism 3 and control valve 41,42,43 are got in touch with, so as to control valve 41, 42nd, 43 action is controlled and feeds replenisher to developer solution.
The concentration management device A of developer solution involved by 4th embodiment and the developing system of substrate are to utilize Obtain relatively better correspondence (straight line between absorbing carbon dioxide concentration and the density value of developer solution in developer solution Relationship) (with reference to Fig. 1 of patent document 2.) this principle, it is dense based on the density value determined or the absorbing carbon dioxide of calculating Angle value is managed the absorbing carbon dioxide concentration of developer solution by the supply of replenisher.It should be noted that about development The structure identical with first embodiment of processing unit A, replenisher reservoir C etc., the description thereof will be omitted sometimes.
Measuring means 1 has：Sampling pump 14；First detector 11, the second detector 12 and third detector 13 are (sometimes First detector 11, the second detector 12 and third detector 13 are referred to as characteristic value testing agency)；And for that will sample Temperature is adjusted to thermostat (not shown) of defined measuring temperature (such as 25 DEG C) etc. to developer solution afterwards before the assay.
Only measured by measuring means 1 density can in the case of, for example, having density as the first detector 11 Instrument does not need to measure the detector (such as 12,13) of other characteristic values.However, the composition measurement of alkaline-based developer is most Not only to measure absorbing carbon dioxide concentration, also measuring the concentration of alkali composition, be dissolved in the photoresist agent concentration of developer solution.Cause This, in Fig. 4, describes and further includes to measure other required inspections such as alkali composition concentration, dissolving photoresist agent concentration Survey the characteristic value testing agency 11,12,13 including device.One of them is densimeter.It is filled in the concentration management of following developer solution It puts in the explanation of A, the detector 11 in the characteristic value testing agency 11,12,13 of Fig. 4 is set as densimeter.
Arithmetical organ 2 have according to the density value that determines and using developer solution density and absorbing carbon dioxide concentration it Between correspondence and calculate the computing module 24 of absorbing carbon dioxide concentration value.Developer solution is pre-entered to computing module 24 Correspondence between density and absorbing carbon dioxide concentration.Computing module 24 has according to the density value of developer solution determined The function of corresponding absorbing carbon dioxide concentration value is obtained.
In addition, arithmetical organ 2 can also have the constituent concentration progress to other developer solutions other than absorbing carbon dioxide The computing module of calculating.E.g. utilize alkali composition concentration of the multiple-regression analysis to developer solution, dissolving photoresist agent concentration Computing module calculated etc..
Next, the component concentration measuring methods realized of the concentration management device A based on developer solution are illustrated.It measures Mechanism 1 is connect by sampling piping 15 with developer solution storagetank 61.Developer solution is transported to measuring machine by sampling pump 14 In structure 1.It is transported to the developer solution of measuring means 1 and defined measuring temperature (such as 25 is adjusted to by temperature in thermostat first ℃).Densimeter 11 is measured the density of developer solution.Other detectors 12,13 also respectively carry out the characteristic value of developer solution It measures.Developer solution after measure discharges to outside the concentration management device A of developer solution from return piping 16 and is back to developer solution storage Deposit slot 61.
Densimeter 11 is connect by signal wire 51 and the computing module 24 with arithmetical organ 2.It is determined by densimeter 11 The density value of developer solution is sent via signal wire 51 to computing module 24.
Detector 12,13 is connect by signal wire 52,53 with arithmetical organ 2.The development determined by detector 12,13 The characteristic value of liquid is sent via signal wire 52,53 to arithmetical organ 2.
Receive the determination data of the density value of developer solution computing module 24 calculated based on the determination data of density it is aobvious The absorbing carbon dioxide concentration of shadow liquid.The absorbing carbon dioxide concentration of developer solution uses the density and absorbing carbon dioxide of developer solution Correspondence between concentration and calculate.That is, according to the correspondence between the density of developer solution and absorbing carbon dioxide concentration, The corresponding absorbing carbon dioxide concentration value of density value of the developer solution with determining is obtained, and is set to the absorption two of developer solution Aoxidize the measured value of concentration of carbon.
So, the concentration management device A of the developer solution of present embodiment being capable of the measure based on the density of developer solution Value and the absorption titanium dioxide that developer solution is measured according to the correspondence between the density of developer solution and absorbing carbon dioxide concentration Concentration of carbon.
It should be noted that arithmetical organ 2 calculates absorbing carbon dioxide concentration in addition to having according to the measured value of density Computing module 24 other than, can also have the alkali composition concentration to developer solution, the dissolving other compositions such as photoresist agent concentration The computing module that concentration is calculated.So, alkali composition concentration, the dissolving photoresist agent concentration of developer solution can be measured And absorbing carbon dioxide concentration.
Based on use densimeter and the density value of developer solution that determines and according to the density of developer solution with absorbing dioxy Change the correspondence between concentration of carbon come when realizing the concentration management of the absorbing carbon dioxide concentration of control developer solution, it is not necessary to Calculate the absorbing carbon dioxide concentration of developer solution.It, also can be so that aobvious even if not calculating the absorbing carbon dioxide concentration of developer solution The absorbing carbon dioxide concentration of shadow liquid is controlled as the following mode of defined management value or defined management value.
As shown in Fig. 1 of patent document 2, it is known that exist between the density of developer solution and absorbing carbon dioxide concentration good Correspondence (if absorbing carbon dioxide concentration increase density also increased linear relation).Therefore, it is possible to according to the correspondence Relationship obtains the management value of density corresponding with the defined management value of absorbing carbon dioxide concentration.Therefore, so that developer solution The control that the mode that absorbing carbon dioxide concentration becomes defined management value carries out with so that the density of developer solution as corresponding The control that the mode of defined density value carries out is identical.So that the absorbing carbon dioxide concentration of developer solution becomes defined management value The control that following mode carries out is with being carried out in a manner of the density of developer solution is made to become below corresponding defined density value It controls identical.Thus, according to the density value of the developer solution determined come calculate the absorbing carbon dioxide concentration of developer solution this Mode is not when by the control of the absorbing carbon dioxide concentration of developer solution for below defined management value or defined management value It is necessary.
This means that the arithmetical organ 2 of Fig. 4, computing module 24 can not also be set.In this case, densimeter 11 is logical It crosses determination data signal wire 51 and is connect with control mechanism 3.By the measure number for the density of developer solution that densimeter 11 determines According to being sent directly to control mechanism 3.
Control mechanism 3 has control module 32, and the control module 32 is based on the absorbing carbon dioxide calculated by arithmetical organ 2 Concentration, to developer solution in a manner that the absorbing carbon dioxide concentration for making developer solution becomes defined management value or management value is following It feeds replenisher and is controlled.It is managed by the absorbing carbon dioxide concentration of developer solution by the density of corresponding developer solution In the case of, control module 32 be set with the correspondence between the density based on developer solution and absorbing carbon dioxide concentration and The management of the absorbing carbon dioxide concentration of decision is worth the management value of corresponding density.Control mechanism 3 is calculated according to by arithmetical organ 2 Developer solution absorbing carbon dioxide concentration or carried out such as from the measured value of the density of developer solution that densimeter 11 receives Lower control.
So that the absorbing carbon dioxide concentration of developer solution becomes defined management value or as corresponding defined close In the case that the mode of the management value of degree is managed, following management is carried out.That is, the so that absorption dioxy of the developer solution calculated Changing concentration of carbon value becomes defined management value or the density value of the developer solution determined is made to become and absorbing carbon dioxide concentration The management mode of management value that is worth corresponding density feed replenisher to developer solution.If without concentration management, developer solution It is intended to absorbing carbon dioxide and increases absorbing carbon dioxide concentration and density, in consideration of it, for the replenisher to be fed For, feed the replenisher to play a role in a manner of the absorbing carbon dioxide concentration of dilute development liquid.
So that the gas concentration lwevel of developer solution becomes below defined management value or as corresponding defined close In the case that the following mode of the management value of degree is managed, following management is carried out.That is, density and absorption due to developer solution Correspondence between gas concentration lwevel is the relationship being increased monotonically, therefore so that the density value of the developer solution determined becomes Management with the corresponding density of management value of absorbing carbon dioxide concentration is worth following mode and feeds replenisher to developer solution.For For the replenisher to be fed, the replenisher to play a role in a manner of the absorbing carbon dioxide concentration of dilute development liquid is fed i.e. It can.
Here, " defined management value " refers to, absorbing carbon dioxide during best developing performance is played as developer solution Concentration value and the management value known in advance.Such as to be commented by development treatment to be formed in the line width of substrate, residual film thickness It is the suction for the developer solution for referring to that these line widths, residual film thickness is made to become desired optimum value during the liquid properties of valency developer solution Receive carbon dioxide concentration value.It is in the following description and identical.
The management of absorbing carbon dioxide concentration as developer solution, for example, using 2.38%TMAH as developer solution In the case of aqueous solution, the absorbing carbon dioxide concentration preferred administration of developer solution for 0.40 (wt%) below.It more preferably manages and is 0.25 (wt%) is below.
As the replenisher fed to developer solution, such as stoste with developer solution or new liquid, pure water etc..These replenishers For the absorbing carbon dioxide concentration of dilute development liquid.These replenishers can also in order to manage the alkali composition concentration of developer solution, It dissolves photoresist agent concentration and is fed.
Flow quantity recorder 151,152,153 is equipped in the piping 81,82,83 of replenisher supply.Flow quantity recorder 151, 152nd, 153 pairs of pipings 81,82,83 via replenisher supply and the integrated flow of replenisher that supplies measures.It can Integrated flow based on the replenisher measured and reasonably computational costs.
It should be noted that the developing system about substrate shown in Fig. 4, although not recording the modulation of developer solution The regenerating unit of device and developer solution, but electricity can be had in the modulating device of developer solution and the regenerating unit of developer solution Either one or two sides structure.The structure of the regenerating unit of modulating device and developer solution about developer solution, respectively with Second embodiment and third embodiment are common, therefore the description thereof will be omitted.
(the 5th embodiment)
Fig. 5 is the base for illustrating the concentration management device A and development processing apparatus B that have developer solution of present embodiment The schematic diagram of the developing system of plate.The concentration management device A tools of the developer solution of the developing system of substrate shown in fig. 5 Standby internal part of the control valve 41,42,43 as the concentration management device A of developer solution.Control mechanism 22 and control valve 41,42, 43 contacts, so as to be controlled the action of control valve 41,42,43 and feed replenisher to developer solution.Control valve 41st, 42,43 can also be the mode being present in other than the concentration management device A of developer solution.It should be noted that at about development The structure identical with first embodiment of device B, replenisher reservoir C etc. are managed, the description thereof will be omitted sometimes.
The invention of the concentration management device A of developer solution involved by 5th embodiment and the developing system of substrate People assumes to carry out the situation of the management of the TMAH aqueous solutions as developer solution, makes dissolving photoresist agent concentration, absorbs titanium dioxide Concentration of carbon various change, so as to find out the opposite of the developer solution in the dissolving photoresist agent concentration and absorbing carbon dioxide concentration Relationship between the developing performance of photoresist and the conductivity values of developer solution.
Inventor modulates absorbing carbon dioxide concentration of sening as an envoy to and changes between 0.0~1.3 (wt%) and make dissolving photic anti- Agent concentration is lost in 0.0~0.40 (wt%) (being equivalent to the absorbance 0.0~1.3 (abs) under wavelength 560nm) (hereinafter, sometimes same Be denoted as concentration and absorbance together to sample) between variation gained TMAH aqueous solutions developer solution sample.Inventor is directed to this A little samples have carried out following experiment：The conductivity, absorbing carbon dioxide concentration and dissolving photoresist for measuring developer solution are dense Degree, and confirm related between developing performance and conductivity, absorbing carbon dioxide concentration and dissolving photoresist concentration components Property.Make using absorbing carbon dioxide concentration it is vertical or horizontal as a project arrange and will dissolve photoresist agent concentration The matrix (combination table) transversely or longitudinally arranged as sundry item.According to absorbing carbon dioxide concentration and dissolving light Each combination of agent concentration against corrosion is caused, satisfaction leading relative to the developer solution of the defined developing performance of photoresist is obtained Electric rate, and each column is included in, complete matrix.
Here, development when defined developing performance refers to realize the line width to be realized in developing procedure, residual film thickness The developing performance of liquid.
Exemplify absorbing carbon dioxide concentration, dissolving photoresist agent concentration and the conductivity of representative each sample Measurement result.It (is equivalent in absorbing carbon dioxide a concentration of 0.0 (wt%), dissolving photoresist a concentration of 0.0 (wt%) 0.0 (abs)) in the case of (so-called new liquid), can play as defined in developing performance developer solution conductivity be 54.58 (mS/cm)。
It (is equivalent in absorbing carbon dioxide a concentration of 0.0 (wt%) and dissolving photoresist a concentration of 0.25 (wt%) 0.8abs is suitable) in the case of, the conductivity that can play the developer solution of defined developing performance is 54.55 (mS/cm), molten In the case of solving photoresist a concentration of 0.40 (wt%) (being equivalent to 1.3abs), the conductivity of developer solution is 54.53 (mS/ cm)。
In addition, dissolving photoresist a concentration of 0.0 (wt%) (being equivalent to 0.0 (abs)) and absorbing carbon dioxide it is dense In the case of spending for 0.6 (wt%), the conductivity of developer solution is 54.60 (mS/cm), in absorbing carbon dioxide a concentration of 1.3 (wt%) in the case of, the conductivity of developer solution is 54.75 (mS/cm).
In addition, in absorbing carbon dioxide a concentration of 0.6 (wt%) and dissolving photoresist a concentration of 0.22 (wt%) (phase When in 0.7abs) in the case of, the conductivity of developer solution is 54.60 (mS/cm), in dissolving photoresist a concentration of 0.40 (wt%) in the case of (being equivalent to 1.3abs), the conductivity of developer solution is 54.58 (mS/cm).
In addition, in absorbing carbon dioxide a concentration of 1.3 (wt%) and dissolving photoresist a concentration of 0.22 (wt%) (phase When in 0.7abs) in the case of, the conductivity of developer solution is 54.75 (mS/cm), in dissolving photoresist a concentration of 0.40 (wt%) in the case of (being equivalent to 1.3abs), the conductivity of developer solution is 54.75 (mS/cm).
It should be noted that it is found in above-mentioned experiment：In certain concentration range, if absorbing carbon dioxide concentration becomes Greatly, then the management value of conductivity is intended to become larger, if dissolving photoresist agent concentration becomes larger, the management value of conductivity is intended to Become smaller.
In above-mentioned experiment, the conductivity of the developer solution of each sample has used the value determined using conductivity meter.It inhales It receives gas concentration lwevel and has used the value determined using analysis by titration.Dissolving photoresist agent concentration has used weight modulation Value.Titration is the acid-base titration using hydrochloric acid as titer reagent.As titration outfit, analytical technology company of Mitsubishi Chemical has been used The automatic titration device GT-200 of system.
It should be noted that above-mentioned conductivity, absorbing carbon dioxide concentration are looked for dissolving photoresist agent concentration Go out conductivity, absorbing carbon dioxide concentration and dissolving photoresist agent concentration and developing performance between relevance, do not limit to In each numerical value.
As discussed above, it should be understood that it is that can play the conductivity of developing performance according to absorbing carbon dioxide concentration and molten Solve photoresist agent concentration and it is various.In this way, in the management of developer solution, photic comprising absorbing carbon dioxide and dissolving In the developer solution of resist, by measuring absorbing carbon dioxide concentration and dissolving photoresist using conductivity as management value Concentration makes the management value of conductivity different based on each measurement result, and thus, it is possible to play defined developing performance.
That is, storage conductivity data (matrix), the conductivity data (matrix) is according to the dissolving photoresist of developer solution Agent concentration and a concentration of index of absorbing carbon dioxide and determining concentration range have and confirmed to realize defined developability in advance The conductivity values of the developer solution of energy, by using conductivity data (matrix), and can realize can play defined developing performance Developer solution management.
The concentration management device A of developer solution has measuring means 1 and control mechanism 22.The concentration management device A of developer solution It is connect by sampling piping 15 and returning to piping 16 with developer solution storagetank 61.In addition, in fig. 5, it is shown that equipped with control The piping 81,82,83 of the replenisher supply of valve 41,42,43 processed is configured at the mode in the concentration management device A of developer solution, The piping 81,82,83 of replenisher supply is connect via interflow pipeline 89 with the circulation line 90 of circulation stirring mechanism D.
Measuring means 1 has sampling pump 14, the first detector 11, the second detector 12 and third detector 13 (sometimes First detector 11, the second detector 12 and third detector 13 are referred to as characteristic value testing agency).In present embodiment In, by the use of photoresist agent concentration and absorbing carbon dioxide concentration will be dissolved as index and the conductivity data that uses, come Carry out the management of developer solution.Characteristic value testing agency 11,12,13 becomes conductivity meter, measures dissolving photoresist agent concentration Measuring device (including the calculation function that dissolving photoresist agent concentration is calculated according to detected characteristic value) measures absorption The measuring device of gas concentration lwevel (includes the operation work(that absorbing carbon dioxide concentration is calculated according to detected characteristic value Can).
The measuring means 1 of the concentration management device A of present embodiment in each detector to include to the ingredient of developer solution The mode that concentration carries out the function of operation illustrates, and however, it is not limited to this.The concentration management device A of present embodiment can also As the concentration management device A of first embodiment, concentration management device A has arithmetical organ, uses detection developer solution The characteristic value of developer solution that each detector of characteristic value is determined is dense to dissolving photoresist agent concentration, absorbing carbon dioxide The constituent concentrations such as degree are calculated.
Control mechanism 22 has data store 23 and control unit 33.Data store 23 and control unit 33 are in control mechanism It is connected in 22 by signal wire 54.Conductivity data is stored in data store 23, the conductivity data is according to show alkali Property the dissolving photoresist agent concentration of developer solution and a concentration of index of absorbing carbon dioxide and determining concentration range, have It confirmed to realize defined developing performance, developer solution to be used conductivity values in advance.
Control mechanism 22 is connected by signal wire 51,52,53 with the characteristic value testing agency 11,12,13 of measuring means 1 It connects.The conductivity values that are determined from measuring means 1, dissolving photoresist concentration value and absorbing carbon dioxide concentration value are by control Mechanism 22 processed is sent.
The control unit 33 of control mechanism 22 is by signal wire 55,56,57 and with conveying matching for replenisher set on to developer solution The control valve 41,42,43 of pipe 81,82,83 connects.
Next, the action of the concentration management device A of the developer solution of present embodiment is illustrated.
It is conveyed into measuring means 1 from the developer solution that developer solution storagetank 61 samples and is adjusted by temperature.Later, develop Liquid is conveyed to characteristic value testing agency 11,12,13, to measure conductivity, dissolving photoresist agent concentration and absorb titanium dioxide Concentration of carbon.Each determination data is sent to control mechanism 22.
The management value of conductivity corresponding with the conductivity values of conductivity data, the conductivity are set in control unit 33 Data determining concentration range according to dissolving photoresist agent concentration and a concentration of index of absorbing carbon dioxide with developer solution, Conductivity values with the developer solution that confirmed to realize defined developing performance in advance.Control unit 33 connects according to from measuring means 1 The determination data of receipts carries out control as follows.
Control unit 33 is asked based on the dissolving photoresist agent concentration and absorbing carbon dioxide concentration that are received from measuring means 1 Go out to be stored in it is in the conductivity data of data store 23, according to the dissolving photoresist agent concentration determined and determine The conductivity values of absorbing carbon dioxide concentration and determining concentration range.The conductivity values being obtained are set as to the conduction of developer solution The control targe value of rate.
Control unit 33 by the conductivity determined received from measuring means 1 and be set as the conductivity of control targe value into Row compares, and is managed as follows according to comparison result.That is, in the conductivity for being set as control targe value and the conduction determined In the case that rate is identical, substantially replenisher is not added to developer solution.In addition, it is more than in the conductivity for being set as control targe value In the case of the conductivity determined, the benefit to play a role in a manner of the conductivity for improving developer solution can be fed to developer solution Filling liquid.In addition, in the case where the conductivity for being set as control targe value is less than the conductivity determined, can be mended to developer solution Give to reduce the replenisher that the mode of the conductivity of developer solution plays a role.
Here, as the replenisher fed to developer solution, for example, stoste of developer solution or new liquid, pure water etc..
Control for supplying the control valve 41,42,43 of replenisher for example carries out as follows.When being opened to adjustment control valve The flow flowed through then by being managed to the time for opening control valve, and can feed the replenisher of liquid measure for needing to feed. Control unit 33 is based on the conductivity determined received from measuring means 1 and the conductivity for being set as control targe value, to control Valve processed sends control signal so that control valve opens the stipulated time, so as to flow through the replenisher of liquid measure for needing to feed.
Various control methods used in the control for making controlled quentity controlled variable consistent with desired value may be used in the mode of control.Especially It is preferred proportion control (P controls) (Proportional Control), integration control (I controls) (Integral Control), differential control (D controls) (Differential Control) and control (the PI controls for being composed them (Proportional-Integral Control) etc.).More preferably applicable PID control.
In the present embodiment, although the description of such a way, however, it is not limited to this.Which is：Measure development Conductivity, dissolving photoresist agent concentration and the absorbing carbon dioxide concentration of liquid, will be according to the dissolving photoresist determined Conductivity values in the preprepared conductivity data that agent concentration value and absorbing carbon dioxide concentration value determine are as control Desired value processed feeds replenisher in a manner that the conductivity values for making measured developer solution become the control targe value to developer solution And manage developer solution.
For example, in the case where developer solution is TMAH aqueous solution, near a concentration of the 2.38% of alkali composition, know to develop The conductivity of liquid is with alkali composition concentration in the absorbance under the specific wavelength of good linear relation and developer solution and dissolving light It is in good linear relation to cause agent concentration against corrosion.
Therefore, in the range of such relationship is obtained, it can realize that the conductivity of present embodiment is replaced into this leads Dissolving photoresist agent concentration is replaced by corresponding alkali composition concentration in the linear relation between electric rate and alkali composition concentration Under the corresponding specific wavelength in the linear relation between absorbance and dissolving photoresist agent concentration under the specific wavelength The concentration management of the developer solution of absorbance.That is, measure alkali composition concentration, the absorbance under specific wavelength and the absorption of developer solution Gas concentration lwevel, will be determining according to the absorbance value under the specific wavelength determined and absorbing carbon dioxide concentration value Alkali composition concentration value in preprepared alkali composition concentration data is as control targe value, so that the developer solution measured The mode that alkali composition concentration value becomes the control targe value feeds replenisher to developer solution and manages developer solution, such mode It is identical with the developer solution management of present embodiment.
According to the above, the concentration management device A of involved developer solution according to the present embodiment, no matter developer solution into For what kind of dissolving photoresist agent concentration and absorbing carbon dioxide concentration, the conductivity in developer solution can be utilized to aobvious Shadow liquid is managed, and thus maintains to act on active ingredient to development, therefore can be realized and can be maintained desired development Performance and desired line width and the development treatment of residual film thickness can be maintained.
In addition, the concentration management device A of involved developer solution according to the present embodiment, using confirmed developability in advance Can developer solution conductivity values conductivity data and set control targe management value, even if thus the dissolving of developer solution is photic Resist a concentration of 0.0~0.40 (wt%) (being equivalent to 0.0~1.3 (abs)) and absorbing carbon dioxide a concentration of 0.0~ 1.3 (wt%), can be used as the developer solution with desired developing activity and use.It is that is, involved according to the present embodiment Developer solution managing device A, even if more than the dissolving photoresist a concentration of 0.25 (wt%) of developer solution (being equivalent to 0.8 (abs)) and more than absorbing carbon dioxide a concentration of 0.6 (wt%), it can not also discard developer solution and use, so as to Reduce the waste liquid amount of developer solution.
The piping 81,82,83 of replenisher supply is provided with flow quantity recorder 151,152,153.Flow quantity recorder 151st, 152,153 pairs of pipings 81,82,83 via replenisher supply and the integrated flow of replenisher that supplies measures. It being capable of the integrated flow based on the replenisher that this is measured and reasonably computational costs.
It should be noted that the developing system about substrate shown in fig. 5, although not recording the modulation of developer solution The diagram of the regenerating unit of device and developer solution is but it is also possible to be the regeneration of modulating device and developer solution with developer solution The structure of either one or two sides in device.The structure of the regenerating unit of modulating device and developer solution about developer solution, It is common with second embodiment and third embodiment respectively, therefore the description thereof will be omitted.
More than, according to the utility model, substrate manufacture person need not undertake the concentration management device for buying developer solution, modulation dress It puts, regenerating unit or the burden that they maintain with management, the only concentration management expense or substrate by paying developer solution Development treatment expense, it will be able to using the developer solution being managed as desirable concentration, new liquid or regenerated liquid can be obtained and It is used.Therefore, substrate manufacture person can enjoy and the reduction of the cost for buying or maintaining management involved of device, development The reduction of cost involved by the allotment of liquid or liquid waste processing, the raising of the running rate of production line or yield rate, manufactured base The associated diversified economy advantage such as the raising of the quality of plate.
In addition, according to the utility model, ISP is by can be by business method of the utility model, with pin The situation of device is sold compared to continuous and stable income can be obtained.

Claims (12)

1. a kind of concentration management device of developer solution, which is characterized in that
The concentration management device of the developer solution has：
Measuring means, pair has the associated developer solution with Reusability and the constituent concentration of developer solution that shows alkalinity Multiple characteristic values are measured；
Arithmetical organ is counted based on the multiple characteristic value determined by the measuring means and using multiple-regression analysis Calculate the constituent concentration of the developer solution；
Control mechanism, the constituent concentration value based on the developer solution calculated by the arithmetical organ so that the developer solution into Concentration is divided to be worth following mode as defined management value or defined management and supplies replenisher to the developer solution；And
Flow quantity recorder measures the integrated flow of replenisher supplied by the control mechanism.
2. a kind of concentration management device of developer solution, which is characterized in that
The concentration management device of the developer solution has：
Densimeter；
Control mechanism, based on the density for the developer solution for showing alkalinity determined by the densimeter, according to the developer solution Density and absorbing carbon dioxide concentration between correspondence so that the absorbing carbon dioxide concentration of the developer solution become rule Fixed management value or defined management are worth following mode and supply replenisher to the developer solution；And
Flow quantity recorder measures the integrated flow of replenisher supplied by the control mechanism.
3. a kind of concentration management device of developer solution, which is characterized in that
The concentration management device of the developer solution has：
Measuring means to Reusability and shows the conductivity of alkaline developer solution, dissolves photoresist agent concentration and suction Gas concentration lwevel is received to be measured；
Control mechanism has data store and control unit, and the data store is stored with conductivity data, the conduction Rate data according to the dissolving photoresist agent concentration and a concentration of index of absorbing carbon dioxide and determining concentration range, Conductivity values with the developer solution that confirmed to realize defined developing performance in advance, the control unit will be stored in described It is in the conductivity data of data store, photic according to the dissolving of the developer solution determined by the measuring means The measured value of agent concentration and absorbing carbon dioxide concentration against corrosion and the conductivity values of determining concentration range are as control targe Value supplies replenisher in a manner that the conductivity for making the developer solution becomes the control targe value to the developer solution；And
Flow quantity recorder measures the integrated flow of replenisher supplied by the control mechanism.
4. a kind of developing system of substrate, which is characterized in that
The developing system of the substrate has：
Development processing apparatus is handled substrate using developer solution；
The concentration management device of developer solution, management in the development processing apparatus developer solution of Reusability it is dense Degree；
Piping is connect with the development processing apparatus, the supplement that will be supplied from the concentration management device to the developer solution Liquid is delivered to the development processing apparatus；And
Flow quantity recorder is set on the piping,
The concentration management device has：
Measuring means, measure has associated multiple characteristic values with the constituent concentration of the developer solution；
Arithmetical organ is counted based on the multiple characteristic value determined by the measuring means and using multiple-regression analysis Calculate the constituent concentration of the developer solution；And
Control mechanism, the constituent concentration value based on the developer solution calculated by the arithmetical organ so that the developer solution into Concentration is divided to be worth following mode as defined management value or defined management and supplies replenisher to the developer solution.
5. the developing system of substrate according to claim 4, which is characterized in that
The developing system of the substrate is also equipped with：
The developer solution is modulated to new liquid by the modulating device of developer solution；And
New liquid piping, connect with the development processing apparatus and the modulating device, passes through the concentration management device The new liquid modulated by the modulating device is supplied to the developer solution of the Reusability in the development processing apparatus,
Equipped with flow quantity recorder in the new liquid piping.
6. the developing system of substrate according to claim 4, which is characterized in that
The developing system of the substrate is also equipped with：
The regenerating unit of developer solution, the developer solution after the use in the development processing apparatus is regenerated as can be sharp again Regenerated liquid；And
Regenerated liquid piping is connect with the development processing apparatus and the regenerating unit, is filled by the concentration management It puts and is supplied to the developer solution of the Reusability in the development processing apparatus by the regenerated regenerated liquid of the regenerating unit,
Equipped with flow quantity recorder in the regenerated liquid piping.
7. a kind of developing system of substrate, which is characterized in that
The developing system of the substrate has：
Development processing apparatus is handled substrate using developer solution；
The concentration management device of developer solution, management in the development processing apparatus developer solution of Reusability it is dense Degree；
Piping is connect with the development processing apparatus, the supplement that will be supplied from the concentration management device to the developer solution Liquid is delivered to the development processing apparatus；And
Flow quantity recorder is set on the piping,
The concentration management device has：
Densimeter；And
Control mechanism, based on the density of the developer solution determined by the densimeter, according to the density of the developer solution With the correspondence between absorbing carbon dioxide concentration so that the absorbing carbon dioxide concentration of the developer solution become defined pipe Reason value or defined management are worth following mode and supply replenisher to the developer solution.
8. the developing system of substrate according to claim 7, which is characterized in that
The developing system of the substrate is also equipped with：
The developer solution is modulated to new liquid by the modulating device of developer solution；And
New liquid piping, connect with the development processing apparatus and the modulating device, passes through the concentration management device The new liquid modulated by the modulating device is supplied to the developer solution of the Reusability in the development processing apparatus,
Equipped with flow quantity recorder in the new liquid piping.
9. the developing system of substrate according to claim 7, which is characterized in that
The developing system of the substrate is also equipped with：
The regenerating unit of developer solution, the developer solution after the use in the development processing apparatus is regenerated as can be sharp again Regenerated liquid；And
Regenerated liquid piping is connect with the development processing apparatus and the regenerating unit, is filled by the concentration management It puts and is supplied to the developer solution of the Reusability in the development processing apparatus by the regenerated regenerated liquid of the regenerating unit,
Equipped with flow quantity recorder in the regenerated liquid piping.
10. a kind of developing system of substrate, which is characterized in that
The developing system of the substrate has：
Development processing apparatus is handled substrate using developer solution；
The concentration management device of developer solution, management in the development processing apparatus developer solution of Reusability it is dense Degree；
Piping is connect with the development processing apparatus, the supplement that will be supplied from the concentration management device to the developer solution Liquid is delivered to the development processing apparatus；And
Flow quantity recorder is set on the piping,
The concentration management device has：
Measuring means measures conductivity, dissolving photoresist agent concentration and the absorbing carbon dioxide concentration of the developer solution； And
Control mechanism has data store and control unit, and the data store is stored with conductivity data, the conduction Rate data according to the dissolving photoresist agent concentration and a concentration of index of absorbing carbon dioxide and determining concentration range, Conductivity values with the developer solution that confirmed to realize defined developing performance in advance, the control unit will be stored in described It is in the conductivity data of data store, photic according to the dissolving of the developer solution determined by the measuring means The measured value of agent concentration and absorbing carbon dioxide concentration against corrosion and the conductivity values of determining concentration range are as control targe Value supplies replenisher in a manner that the conductivity for making the developer solution becomes the control targe value to the developer solution.
11. the developing system of substrate according to claim 10, which is characterized in that
The developing system of the substrate is also equipped with：
The developer solution is modulated to new liquid by the modulating device of developer solution；And
New liquid piping, connect with the development processing apparatus and the modulating device, passes through the concentration management device The new liquid modulated by the modulating device is supplied to the developer solution of the Reusability in the development processing apparatus,
Equipped with flow quantity recorder in the new liquid piping.
12. the developing system of substrate according to claim 10, which is characterized in that
The developing system of the substrate is also equipped with：
The regenerating unit of developer solution, the developer solution after the use in the development processing apparatus is regenerated as can be sharp again Regenerated liquid；And
Regenerated liquid piping is connect with the development processing apparatus and the regenerating unit, is filled by the concentration management It puts and is supplied to the developer solution of the Reusability in the development processing apparatus by the regenerated regenerated liquid of the regenerating unit,
Equipped with flow quantity recorder in the regenerated liquid piping.
CN201721635816.7U 2017-05-26 2017-11-29 The concentration management device of developer solution and the developing system of substrate Expired - Fee Related CN207502917U (en)

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