CN108957967A - The concentration management device of developer solution and the developing system of substrate - Google Patents

The concentration management device of developer solution and the developing system of substrate Download PDF

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Publication number
CN108957967A
CN108957967A CN201711234540.6A CN201711234540A CN108957967A CN 108957967 A CN108957967 A CN 108957967A CN 201711234540 A CN201711234540 A CN 201711234540A CN 108957967 A CN108957967 A CN 108957967A
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CN
China
Prior art keywords
developer solution
concentration
substrate
liquid
processing apparatus
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CN201711234540.6A
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Chinese (zh)
Inventor
中川俊元
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Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
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Hirama Rika Kenkyusho Ltd
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Publication of CN108957967A publication Critical patent/CN108957967A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0025—Devices or apparatus characterised by means for coating the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

The present invention provides the developing system of the concentration management device and substrate that are most suitable for the developer solution for the service that developer solution management used in the development by substrate is optimal state.In base plate processing system, the concentration management device (B) of developer solution, development processing apparatus (A), modulate developer solution new liquid modulating device (E), carry out regenerated regenerating unit (F) to the developer solution after using and connected by piping.The physical property or constituent concentration and the stoste or new liquid, regenerated liquid that supply developer solution of the developer solution of concentration management device (A) measurement development processing apparatus (B) of developer solution, to be optimal concentration by developer solution management.The replenisher supplied is measured by the flow quantity recorder (151,152,153,154,155) for being set to piping.The expense of the concentration management of developer solution or the development treatment expense of substrate can be calculated based on the integrated flow of the replenisher measured by flow quantity recorder (151,152,153,154,155).

Description

The concentration management device of developer solution and the developing system of substrate
Technical field
The present invention relates to the concentration management device of developer solution and the developing systems of substrate, especially in semiconductor or The developing procedure of circuit substrate in person's liquid crystal display panel is medium in order to develop to photoresist film and Reusability is shown The concentration management device of the developer solution of existing alkalinity and the developing system of substrate.
Background technique
In photolithographic developing procedure of the fine wiring processing for realizing semiconductor or liquid crystal display panel etc., as general The medical fluid of photoresist dissolution after being film-made on substrate uses the developer solution (also referred to as " alkaline development below for showing alkalinity Liquid ").Alkaline-based developer is maintained management to use according to the defined concentration of needs so that its performance to the maximum extent by It plays.The concentration management of developer solution passes through the monitoring of the constituent concentration of developer solution and the benefit of the replenisher based on the concentration determined To come carry out.As the replenisher of supply, other than the stoste of developer solution or pure water, also using the alkaline development newly modulated Liquid (following to be also referred to as " new liquid ") or regeneration treatment are the alkaline-based developer (below also referred to as " regenerated liquid ") etc. that can be recycled.
In addition, alkaline-based developer absorbs the carbon dioxide in air and generates carbonate and be easy deterioration.In addition, alkalinity is aobvious Shadow liquid generates photoresist salt because of the dissolution of photoresist, and the effective alkali composition for development treatment is caused to be disappeared Consumption.Therefore, the alkaline-based developer of Reusability become not only containing alkali composition also containing photoresist, carbon dioxide mostly at Divide and is.Moreover, these ingredients are made expenditure and are had an impact to developing performance with different respectively.Thus, in order to accurately right The developing performance of developer solution carries out maintenance management, and needing to comprehensively consider these ingredients influences developing performance bring to show Shadow liquid pipe reason.
In the past, in order to maintain management alkaline-based developer concentration, the people of substrate is handled using alkaline-based developer (below Referred to as " substrate manufacture person ") it buys and using the concentration management device of developer solution.Substrate manufacture person must deploy the original of developer solution Liquid, new liquid etc. are as the replenisher fed to manage the concentration of alkaline-based developer.In addition, being modulated in substrate manufacture person itself When new liquid, it is necessary to buy the modulating device being automatically modulated to alkaline-based developer with its raw material and use the modulating device. In addition, substrate manufacture person in order to itself prepares regenerated liquid and must buy the developer solution regeneration treatment after using be can be sharp again Regenerating unit.
As the managing device of alkaline-based developer, for example, following patent documents 1 records following content: measurement and alkali Property developer solution constituent concentration have associated multiple characteristic values, based on the multiple measured values determined and utilize multivariate analysis Method calculates the constituent concentration of alkaline-based developer, based on the measured value and calculated value conveys replenisher to developer solution.
In addition, patent document 2 records following developer solution managing device: measuring the density of developer solution, use developer solution Density value and absorbing carbon dioxide concentration value between corresponding relationship so that the absorbing carbon dioxide concentration of developer solution become rule Fixed management value or management are worth mode below and supply replenisher to developer solution.Patent document 3 records following developer solution Managing device: having data store, which is stored with conductivity data, and the conductivity data is according to developer solution Dissolution photoresist concentration and absorbing carbon dioxide concentration be index and determination region, having, which confirmed, realizes regulation Developing performance developer solution conductivity values, will according to developer solution dissolution photoresist concentration measured value and absorption The conductivity values for being stored in data store of the measured value of gas concentration lwevel and the concentration range of determination are as control target Value feeds replenisher to developer solution.
Citation
Patent document 1: Japanese Unexamined Patent Publication 2017-28089 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2017-28090 bulletin
Patent document 3: Japanese Unexamined Patent Publication 2017-28091 bulletin
However, as in the past, in the mode for buying and using concentration management device, modulating device, regenerating unit, base Plate producer needs to buy concentration management device, regenerating unit, operates these devices and carries out maintenance management.In addition, for For people's (below also referred to as " device sellers ") of concentration management device, modulating device, regenerating unit is sold in manufacture, also only have Just there is the chance for the return for obtaining these devices in device point-of-sale.
Therefore, substrate manufacture person must be born by for buying the temporary of concentration management device, modulating device, regenerating unit Enormous expenditure is born and the operating after buying and maintaining manage involved in various energy, burden.In addition, there is also as follows Problem: if device sellers do not look for the substrate manufacture person for wishing to buy device repeatedly among limited market and sell dress It sets, is then difficult to earn enough interests.
Summary of the invention
Subject to be solved by the invention
The present invention is completed in view of above-mentioned each project.Inventors herein propose is not sale device but to substrate system The person of making, which provides, maintains management for developer solution using concentration management device, modulating device, regenerating unit to be most suitable for processing substrate The technical solution of the service of expectation state.In the new business mode, can not making substrate manufacture, person undertakes burden as described above And the developer solution for being maintained optimum state always is used, and device sellers can be made persistently to earn interests.Of the invention It is designed to provide a kind of concentration management device of developer solution, above-mentioned clothes are provided in the new business mode of above-mentioned technical proposal The use when people of business provides its service.In addition, the purpose of the present invention is to provide by concentration management device, modulating device, regeneration Device and substrate manufacture person with development processing apparatus connect and the substrate for being most suitable for providing above-mentioned service constructed it is aobvious Shadow processing system.
Solution for solving the problem
In order to reach the purpose, the concentration management device of developer solution of the invention has: measuring means, to repeatedly Using and show alkalinity developer solution constituent concentration have associated developer solution multiple characteristic values be measured；Calculating machine Structure, the ingredient that developer solution is calculated based on the multiple characteristic values determined by measuring means and using multiple-regression analysis are dense Degree；Control mechanism, the constituent concentration value based on the developer solution calculated by arithmetical organ, so that the constituent concentration of developer solution becomes Defined management value or defined management are worth mode below and supply replenisher to developer solution；And flow quantity recorder, meter Survey the integrated flow of the replenisher supplied by control mechanism.
According to the present invention, due to utilizing the alkaline-based developer for using the arithmetical organ of multiple-regression analysis to multicomponent system Constituent concentration is calculated, so even also can accurately be counted according to multiple characteristic values influenced by developer solution ingredient Calculate the constituent concentration of developer solution.Based on the constituent concentration of the developer solution calculated, so that the constituent concentration of developer solution becomes regulation Management value or defined management value mode below supply replenisher, thus, it is possible to be accurately proceed the concentration of developer solution Management.
In addition, by have measurement replenisher integrated flow flow quantity recorder, can according to the rules during (for example, One week or one month etc.) and hold the amount of replenisher.Thus, for example, can will be added to supply cost every based on other The amount of money after the basic charge of funds etc. is calculated as " expense of the concentration management of developer solution ", which is by the regulation phase The supply amount of interior replenisher is multiplied by obtained from per unit expense.It then, can be by the expense calculated to substrate Producer's request.
In order to reach the purpose, the concentration management device of developer solution of the invention has: densimeter；Control mechanism, Based on the density of the developer solution for showing alkalinity determined by densimeter, according to the density of developer solution and absorbing carbon dioxide concentration Between corresponding relationship so that the absorbing carbon dioxide concentration of developer solution become defined management value or defined management value with Under mode to developer solution supply replenisher；And flow quantity recorder, the replenisher that measurement is supplied by control mechanism add up Flow.
According to the present invention, according to the corresponding relationship between the density of developer solution and absorbing carbon dioxide concentration (referring to patent Fig. 1 of document 2), due to the amount according to the knowable replenisher to be supplied of density value of developer solution determined by densimeter, because This can by make developer solution absorbing carbon dioxide concentration become defined management value or defined management value it is below in a manner of It supplies replenisher and is managed.
In addition, by have measurement replenisher integrated flow flow quantity recorder, can according to the rules during (for example, One week or one month etc.) hold the amount of replenisher.Thus, for example, can will be added to supply cost every based on other The amount of money after the basic charge of funds etc. is calculated as " expense of the concentration management of developer solution ", which is by the regulation phase The supply amount of interior replenisher is multiplied by obtained from per unit expense.It then, can be by the expense calculated to substrate Producer's request.
In order to reach the purpose, the concentration management device of developer solution of the invention has: measuring means, to making repeatedly With and show alkalinity developer solution conductivity, dissolution photoresist concentration and absorbing carbon dioxide concentration be measured； Control mechanism has data store and control unit, and data store is stored with conductivity data, which presses According to using dissolve photoresist concentration and absorbing carbon dioxide concentration as index the concentration range of determination, have in advance confirmation The conductivity values of the developer solution of developing performance as defined in realizing, control unit will be stored in the conductivity data of data store , according to the dissolution photoresist concentration of the developer solution determined by measuring means and the measurement of absorbing carbon dioxide concentration Value and the conductivity values of concentration range determined are as control target value, so that the conductivity of developer solution becomes control target value Mode supplies replenisher to developer solution；And flow quantity recorder, measure the integrated flow of the replenisher supplied by control mechanism.
According to the present invention, no matter developer solution is dense as what kind of dissolution photoresist concentration and absorbing carbon dioxide Degree, acting on active ingredient to development and be maintained constant in developer solution, therefore can be realized and can remain desired Developing performance and the development treatment that desired line width and residual film thickness can be maintained.
In addition, by have measurement replenisher integrated flow flow quantity recorder, can according to the rules during (for example, One week or one month etc.) hold the amount of replenisher.Thus, for example, can will be added to supply cost every based on other The amount of money after the basic charge of funds etc. is calculated as " expense of the concentration management of developer solution ", which is by the regulation phase The supply amount of interior replenisher is multiplied by obtained from per unit expense.It then, can be by the expense calculated to substrate Producer's request.
In order to reach the purpose, the developing system of substrate of the invention has: development processing apparatus, using aobvious Shadow liquid handles substrate；The concentration management device of developer solution manages the development of the Reusability in development processing apparatus The concentration of liquid；Piping, connect with development processing apparatus, will be delivered to from concentration management device to the replenisher that developer solution supplies Development processing apparatus；And flow quantity recorder, it is set to piping, concentration management device has: measuring means, measurement and development The constituent concentration of liquid has associated multiple characteristic values；Arithmetical organ, based on the multiple characteristic values determined by measuring means And the constituent concentration of developer solution is calculated using multiple-regression analysis；And control mechanism, based on what is calculated by arithmetical organ The constituent concentration value of developer solution, so that the constituent concentration of developer solution becomes defined management value or defined management value is below Mode supplies replenisher to developer solution.
In order to reach the purpose, the developing system of substrate of the invention has: development processing apparatus, using aobvious Shadow liquid handles substrate；The concentration management device of developer solution manages the development of the Reusability in development processing apparatus The concentration of liquid；Piping, connect with development processing apparatus, will be delivered to from concentration management device to the replenisher that developer solution supplies Development processing apparatus；And flow quantity recorder, it is set to piping, concentration management device has: densimeter；And control mechanism, Its density based on the developer solution determined by densimeter, according to pair between the density of developer solution and absorbing carbon dioxide concentration Should be related to, by make developer solution absorbing carbon dioxide concentration become defined management value or defined management value it is below in a manner of Replenisher is supplied to developer solution.
In order to reach the purpose, the developing system of substrate of the invention has: development processing apparatus, using aobvious Shadow liquid handles substrate；The concentration management device of developer solution manages the development of the Reusability in development processing apparatus The concentration of liquid；Piping, connect with development processing apparatus, will be delivered to from concentration management device to the replenisher that developer solution supplies Development processing apparatus；And flow quantity recorder, be set to piping, concentration management device has: measuring means measures developer solution Conductivity, dissolution photoresist concentration and absorbing carbon dioxide concentration；And control mechanism, have data store And control unit, data store are stored with conductivity data, the conductivity data according to dissolve photoresist concentration with And absorbing carbon dioxide concentration is the concentration range of index and determination, has the aobvious of developing performance as defined in confirmed to realize in advance The conductivity values of shadow liquid, control unit will be stored in the conductivity data of data store, basis and determined by measuring means Developer solution dissolution photoresist concentration and the measured value of absorbing carbon dioxide concentration and leading for the concentration range of determination Electric rate value is supplied to developer solution in a manner of making the conductivity of developer solution become control target value and is supplemented as control target value Liquid.
According to the present invention, due in the piping that replenisher is delivered to development processing apparatus equipped with flow quantity recorder, Therefore can according to the rules during (for example, one week or one month etc.) and hold the replenisher supplied to development processing apparatus Amount.Thus, for example, supply cost will can be added the amount of money after the basic charge based on other every funds etc. be calculated as Carry out development treatment and the offer of the service of developer solution management that provides involved in expense i.e. " development treatment expense ", the confession It is by the supply amount of the replenisher in the specified time limit multiplied by obtained from per unit expense to expense.Then, it can incite somebody to action The expense calculated is requested to substrate manufacture person.
In another way of the invention, it is preferable that the developing system of substrate is also equipped with: the modulation dress of developer solution It sets, developer solution is modulated to new liquid；And new liquid piping, it connect, passes through with development processing apparatus and modulating device Concentration management device supplies the new liquid modulated by modulating device to the developer solution of the Reusability in development processing apparatus, new Equipped with flow quantity recorder in liquid piping.
According to which, due to the new liquid piping supplied in the new liquid to the developer solution modulated by modulating device In equipped with flow quantity recorder, therefore can according to the rules during (for example, one week or one month etc.) come hold supply to show The amount of the new liquid of the developer solution of shadow processing unit.Thus, for example, can will be added to supply cost based on other every funds etc. Basic charge after amount of money service that the developer solution management provided to carry out development treatment is provided offer involved by Expense be " development treatment expense ", which is the supply amount by the new liquid in the specified time limit multiplied by per unit Obtained from expense.Then, the expense calculated can be requested to substrate manufacture person.
In another way of the invention, it is preferable that the developing system of substrate is also equipped with: the regeneration dress of developer solution It sets, the developer solution after the use in development processing apparatus is regenerated as to the regenerated liquid that can be recycled；And regenerated liquid is with matching Pipe, connect with development processing apparatus and regenerating unit, is made repeatedly by concentration management device in development processing apparatus Developer solution supply is by the regenerated regenerated liquid of regenerating unit, equipped with flow quantity recorder in regenerated liquid piping.
According to which, due in the regenerated liquid supplied to the regenerated liquid by the regenerated developer solution of regenerating unit with matching Equipped with flow quantity recorder in pipe, thus can according to the rules during (for example, one week or one month etc.) come hold supply extremely The amount of the regenerated liquid of the developer solution of development processing apparatus.It is passed through thus, for example, can will be added to supply cost based on other items The amount of money after the basic charge of expense etc. is calculated as the offer institute of the service of the developer solution management provided to carry out development treatment The expense being related to i.e. " development treatment expense ", which is by the supply amount of the regenerated liquid in the specified time limit multiplied by every list Obtained from the expense of position amount.Then, the expense calculated can be requested to substrate manufacture person.
Invention effect
According to the present invention, due to have the integrated flow of the replenisher of opposite developer solution supply, new liquid or regenerated liquid into The flow quantity recorder of row measurement, therefore the supply of the replenisher, new liquid or regenerated liquid that supply in during the prescribed period can be held Amount, can calculate the reasonable expense generated based on the supply amount.Therefore, it can be realized and provide to substrate manufacture person by developer solution Maintaining management is to be most suitable for the new quotient no so far of the industry as the service of the expectation state of development treatment of substrate Industry method.Therefore, according to the present invention, compared with the previous sale device the case where, even if providing the people of the service not limited Market among repeatedly look for the people for wishing to buy device, can also continuously ensure that stable income.
According to the present invention, substrate manufacture person do not undertake buy the concentration management device that the concentration of developer solution is managed, Re-modulate the modulating device of developer solution, regenerating unit of regeneration treatment etc. is carried out to developer solution or operates these devices, Perhaps it maintains the burden for managing these devices and only pays based on replenisher, new liquid or the regenerated liquid supplied to developer solution The expense that the service of integrated flow and the developer solution management that generates provides, it will be able to using being managed always as desired state Developer solution.
Detailed description of the invention
Fig. 1 is the schematic diagram of the developing system of the substrate of first embodiment.
Fig. 2 is the schematic diagram of the developing system of the substrate of second embodiment.
Fig. 3 is the schematic diagram of the developing system of the substrate of third embodiment.
Fig. 4 is the schematic diagram of the developing system of the substrate of the 4th embodiment.
Fig. 5 is the schematic diagram of the developing system of the substrate of the 5th embodiment.
Description of symbols:
The concentration management device of A ... developer solution, B ... development processing apparatus, C ... replenisher reservoir, D ... circulation stirring machine Structure, E ... modulating device, F ... regenerating unit；
1 ... measuring means, 2 ... arithmetical organs, 3,22 ... control mechanisms, 11 ... first detectors, 12 ... second detectors, 13 ... third detectors, 14 ... sampling pumps, 15 ... sampling pipings, 16 ... return to piping, 21,24 ... computing modules, 23 ... data Storage unit, 31,32 ... control modules, 33 ... control units, 41,42,43,44,45 ... control valves, 46,47 ... gas-pressurized valves Door, 48,49 ... valves, 51,52,53 ... determination datas signal wire (signal wire), 54 ... operational datas signal wire (signal Line), 55,56,57,58,59 ... control signals are with signal wire (signal wire), 61 ... developer solution storagetanks, 62 ... overflow launders, and 63 ... Liquid level meter, 64 ... developing room shields, 65 ... roller conveyors, 66 ... substrates, 67 ... developer solution spray nozzles, 71 ... waste drains pumps, 72, 74 ... circulating pumps, 73,75 ... filters, 76,77,78 ... delivery pumps, 80 ... development liquid pipelines, 81,82,83 ... pipings, 84 ... New liquid piping, the piping of 85 ... regenerated liquids, 86 ... developer solution stoste supplying tubings, 87 ... pure water supplying tubings, 88 ... use Finish developer solution conveying piping, 89 ... interflow pipelines, 90 ... circulation lines, 91 ... developer solution stoste hold-up vessels, 92 ... developments The new liquid hold-up vessel of liquid, the piping of 93 ... nitrogen, 151,152,153,154,155 ... flow quantity recorders, 301 ... new liquid modulation Slot, 302 ... new liquid storagetanks, 311 ... densimeters, 312,322 ... liquid level meters, 331 ... control devices, 341,342,343 ... controls Valve processed, 351,352,353,354 ... signal wires, 371,372 ... circulating pumps, 373 ... delivery pumps, 380 ... communicating pipes, 381, 382 ... circulation lines, 431 ... control devices, 441 ... control valves, 451,452 ... signal wires, 461,462,463 ... filters, 471 ... delivery pumps, 493 ... regenerated liquid storagetanks.
Specific embodiment
Hereinafter, suitably the preferred embodiment of the present invention is described in detail referring to attached drawing.Wherein, as long as no spy It does not record not explicitly, shape, size, size ratio, its relative configuration of device documented by these embodiments etc. etc. are just not only Only it is defined in the illustrated illustration of the scope of the present invention.These illustrations be merely possible to illustrate example and schematically illustrated and ?.
In addition, in the following description, as the concrete example of developer solution, appropriate use is in semiconductor or base plate of liquid crystal panel Manufacturing process in main 2.38wt% (hereinafter, wt% is only recorded as %) to be used tetramethylammonium hydroxide aqueous solution (hereinafter, tetramethylammonium hydroxide is referred to as TMAH.) and be illustrated.
Wherein, developer solution applied by the present invention is not limited thereto.Concentration management as developer solution of the invention fills It sets, the example for other developer solutions that the developing system of substrate can be applied, potassium hydroxide, sodium hydroxide, phosphorus can be enumerated The organic compounds such as the aqueous solution or trimethyl monoethanol base ammonium hydroxide (choline) of the inorganic compounds such as sour sodium, sodium metasilicate Aqueous solution etc..
In the past, the substrate manufacture person for carrying out development treatment to substrate using alkaline-based developer and manufacturing substrate buys developer solution Concentration management device, modulating device, regenerating unit, and these devices are connect with development processing apparatus, transport these devices Then used the development treatment of the substrate of developer solution.Therefore, substrate manufacture person must be born by buying the concentration of developer solution Replenisher or necessary former when the operating of temporary enormous expenditure burden, device when managing device, modulating device, regenerating unit The burden of the allotment of material, to the operating of device, maintain management relevant other various energy, burden.
In addition, in the business of previous sale device itself, only being sold in device in terms of the device sellers Time point just has the chance for the return for obtaining device, wishes to buy the people of device if not looking for repeatedly and sells device, is difficult to obtain Take enough interests.
The present inventor proposes new business method in view of these points.That is, being to provide the business serviced as follows: using aobvious The concentration management device of shadow liquid, modulating device, regenerating unit and the concentration management of developer solution for using substrate manufacture person is rule Fixed concentration.To this, new business method is illustrated.
Firstly, being illustrated to the business for the service for providing management developer solution.
The development that the ISP of developer solution management is used substrate manufacture person using the concentration management device of developer solution Liquid pipe reason is concentration or defined concentration range as defined in substrate manufacture person is desired.The concentration management of developer solution pass through to Developer solution supplies replenisher to carry out.The concentration management device of developer solution is repeatedly measured and monitors always the concentration of developer solution, and The control valve being equipped in the piping of supply replenisher is controlled, so that the replenisher appropriate of supply requirement.One Replenisher is supplied on one side while being measured by the flow quantity recorder being equipped in the piping of supply replenisher to integrated flow.Service Supplier passes through the integrated flow for monitoring supplied replenisher, based on period according to the rules (for example, one week or one month Deng) integrated flow, calculate the concentration management of developer solution service provide involved in expense, and according to the specified time limit to base Plate producer requests the expense.This is to provide the summary of the business of the service of the concentration of management medical fluid.
Manage institute of the concentration management device of developer solution used in the service of the concentration of developer solution as ISP There is object and is operated by ISP and maintained to manage and for concentration management.Therefore, substrate manufacture person is without purchase Enter concentration management device, without operating, the maintenance management for carrying out the concentration management device.Only pipe is obtained from ISP Manage the concentration of developer solution.
The factory of the concentration management device for the developer solution that ISP has oneself is set to substrate manufacture person, and with The development processing apparatus connection that substrate manufacture person is used.
The replenisher that concentration management is carried out by the concentration mensuration of developer solution and the concentration based on the developer solution determined Supply realize.As replenisher used in concentration management, the stoste of developer solution or new liquid, pure water etc. are used.But not office It is limited to this.For example, it is also possible to which regeneration treatment of the developer solution after being applied in combination etc. carries out concentration management.
For example, will be used as developer solution and in the case where concentration that the more TMAH aqueous solution management used is 2.38%, For example, carrying out following concentration management.That is, the concentration management device of developer solution is repeatedly measured and monitors alkali composition concentration always (TMAH concentration), dissolution photoresist concentration and absorbing carbon dioxide concentration, so that alkali composition concentration becomes about 2.38% concentration and make to dissolve photoresist concentration and be no more than defined setting concentration, and keeps absorbing carbon dioxide dense Degree becomes defined management value or management value mode below feeds replenisher and carries out concentration management.
In this case, the stoste of developer solution, the new liquid of developer solution, pure water etc. are fed as replenisher.Developer solution Stoste refer to the dense developer solution of concentration, such as 20%~25% or so TMAH aqueous solution.The new liquid of developer solution refers to and does not make In other words developer solution is free from the fresh developer solution that dissolving resin etc. does not need substance.For example, not used 2.38%TMAH aqueous solution.Dissolving resin etc. can also will be removed in developer solution after using not need to show obtained from substance The regenerated liquid of shadow liquid is used as replenisher.
In concentration mensuration, in development processing apparatus the developer solution of Reusability be sampled, and by developer solution The determination part of concentration management device carries out.Alkali composition concentration is measured to carry out by the conductivity to developer solution, dissolution Photoresist concentration is carried out by being measured to the absorbance under the specific wavelength of developer solution, in addition, absorbing titanium dioxide Concentration of carbon is measured to carry out by the density to developer solution.These constituent concentrations and the physics value of corresponding developer solution it Between, it is known that there are good correlativity, (correlativity between the absorbing carbon dioxide concentration and density of developer solution is referring to specially Fig. 1 of sharp document 2).If using such correlativity alkali composition concentration can be exported from the conductivity values determined, from The absorbance value export dissolution photoresist concentration determined, exports absorbing carbon dioxide concentration from the density determined.
When the result of concentration mensuration is that alkali composition concentration is lower than 2.38%, the concentration management device of developer solution feeds development The stoste of liquid is as replenisher.Conversely, the concentration management device of developer solution feeds pure water when alkali composition concentration is higher than 2.38% Or the new liquid of developer solution is as replenisher.Equally when dissolving photoresist concentration more than defined setting concentration, development The new liquid of the managing device supply developer solution of liquid is as replenisher.Also it can replace the new liquid of developer solution and supplied together with new liquid Regenerated liquid.In addition, when absorbing carbon dioxide concentration exceeds defined management value, the managing device supply developer solution of developer solution New liquid is as replenisher.It should be noted that the method for the supply of control replenisher is in addition to so that alkali concentration, dissolution are photic anti- The mode that erosion agent concentration, absorbing carbon dioxide concentration become defined value supplies other than replenisher, can also be led based on following Electric rate data, by make conductivity values become control target value in a manner of to developer solution supply replenisher, the conductivity data according to Using dissolve photoresist concentration and absorbing carbon dioxide concentration as index the concentration range of determination, have confirmed to realize The conductivity values of defined developing performance.The method for determining the supply amount of replenisher is explained below.
Via piping from the hold-up vessel of storage replenisher, the modulating device modulating new liquid and supplying or supply regenerated liquid Regenerating unit to the development processing apparatus of substrate manufacture person convey replenisher.It is provided in the piping of supply replenisher accumulative Flowmeter and the control valve controlled by the concentration management device of developer solution.If having preset and having controlled according to each control valve The flow that valve circulates per unit time when opening, then concentration management device is by will be arranged in what the replenisher that should be supplied was circulated Control valve in piping opens the stipulated time, and can supply suitable replenisher.When supplying replenisher, flow quantity recorder pair The integrated flow of replenisher is measured.This is the supply amount of the replenisher supplied to development processing apparatus.
ISP was according to such as one month equal specified time limit, based on the replenisher determined by flow quantity recorder Integrated flow (supply amount) and the development treatment expense for calculating substrate.ISP requests calculated base to substrate manufacture person The return for the service that the development treatment expense of plate is managed as developer solution used in the development treatment provided to substrate.
Substrate manufacture person pays the development treatment expense of substrate by period according to the rules, without concentration management device Buy, operate and maintain management can be persistently using the developer solution after concentration management.On the other hand, with sale device phase Than ISP can continue to earn stable income.
Here, the medical fluid administration fee as substrate, can adopt in various manners.Hereinafter, exemplifying the aobvious of several substrates The concrete example of shadow processing cost.But the calculation method of the development treatment expense of substrate is not limited to these.With phase of the present invention The calculation method of the development treatment expense of associated substrate includes the integrated flow (supply amount) based on replenisher and calculates each Kind fee calculation procedure.
First, as the development treatment expense of substrate, sometimes with the supply cost of the interior replenisher supplied during the prescribed period On the basis of and calculate expense.This is obtained based on form of thinking as sale replenisher.
For example, will be set as specified time limit one month.Due to measuring the integrated flow of replenisher using flow quantity recorder, because This by from this month table look-up time point integrated flow subtract before table look-up the moon time point integrated flow come find out this month feed supplement The supply amount of liquid.The supply amount of the replenisher of this month supply is set as Q (the L/ month).By the supply unit price of replenisher be set as A (member/ L).Then, the supply cost of the replenisher of this month is found out as Q × A (member/moon).In the case where replenisher is a variety of, respectively Supply amount is set as Q for a variety of replenishers1、Q2、Q3, (the L/ month), will supply unit price be set as A1、A2、A3、··· (member/L), the supply cost of replenisher are found out as ∑ Qi×Ai(i=1,2,3) (member/L).As this month The development treatment expense of substrate and to substrate manufacture person request.
As the variation, the supply cost of the replenisher calculated as described above will be obtained plus various expenses sometimes Development treatment expense of the expense out as substrate monthly.As the representative expense for the various expenses to be added, there is base This expense.When contract involved in providing in the service for signing developer solution management, basic charge monthly is determined, regardless of whether for To replenisher, all the basic charge is included in the development treatment expense of substrate and is made requests.It is of course also possible to without concerning Item as basic charge, and maintain administration fee or the labour cost of device operator, material allocation to take equipment, other are various Funds etc. are included in the expense to be added.If the expense (such as basic charge) that will add up is set as Z (member/moon), monthly The development treatment expense of substrate is Q × A+Z (member/moon).Replenisher be it is a variety of and be added expense be the sum of various expenses Z= ∑ZjWhen, the development treatment expense of substrate monthly is ∑ Qi×Ai+∑Zj(i, j=1,2,3) (member/moon).
In addition, as other variations, sometimes also by the supply cost of replenisher multiplied by the amount of money obtained from subsidy rate B It is set as the development treatment expense of substrate monthly.For example, the dimension of items funds, device involved in the allotment of the raw material of replenisher It is reasonable for holding administration fee etc. to be considered relevant with the supply amount of replenisher (also there is relationship in the duration of runs of this and device).? Under such circumstances, by subsidy rate B multiplied by supply cost Q × A (member/moon) of replenisher, the development treatment of substrate monthly is taken With being found out as Q × A × B (member/moon).Subsidy rate B can also be contained in the supply unit price A (member/L) of replenisher.In addition, In addition the development treatment expense of substrate monthly becomes Q × A × B+Z (member/moon) in the case where basic charge etc..More generally come It says, the development treatment expense of substrate monthly is found out as (∑ Qi×Ai)×B+∑Zj(i, j=1,2,3) (member/ Month).
Second, as the development treatment expense of substrate, will be shown to substrate manufacture person request because what is provided in during the prescribed period Shadow liquid pipe reason service and to substrate manufacture person bring economic interests multiplied by the amount of money obtained from defined ratio.This is based on will The economic interests that the person that makes substrate manufacture because of the offer of the service of developer solution management generates give substrate manufacture person and service provide Form of thinking as person and obtain.This is preferably applied to for example provide to no substrate manufacture person for implementing developer solution management The case where service of development management etc..
In the case where managing without developer solution, substrate manufacture person is whole after developer solution to have been used to stipulated number It discards and is changed to new developer solution.Therefore, in the replacement of each liquid large variation all occurs for the liquid properties of developer solution.Separately On the one hand, when implementing the concentration management of developer solution, substrate manufacture person can enjoy various effects as following.That is, aobvious The usage amount of shadow liquid is substantially cut down.The waste liquid amount of developer solution is also substantially cut down.In addition, the liquid properties of developer solution are permanent always It is fixed, therefore the manufacture stay in grade of semiconductor, crystal liquid substrate, fabrication yield improve.Without stopping manufacture because of liquid replacement The running rate of device, manufacturing device improves, the manufacture increase of semiconductor, crystal liquid substrate.
The concrete example of the calculating of development treatment expense as substrate under such circumstances, can enumerate will be because of developer solution The reduction bring cost of developer solution of usage amount reduction the amount of money number at the substrate as specified time limit development treatment expense The case where.
For example, will be set as specified time limit one month.It will receive developer solution management according to the present invention in substrate manufacture person Service offer before, the developer solution of each month that i.e. substrate manufacture person buys when not implementing the concentration management of developer solution The amount of buying be set as R (the L/ month), and bought unit price and be set as C (member/L).In the big situation of the variation of the developer solution amount of buying R Under, by it is past it is appropriate during the average value of the developer solution amount of buying be set as R.
It, will be because of the service of developer solution management according to the present invention according to the integrated flow determined by flow quantity recorder The supply amount of the replenisher of offer and supply found out as Q (the L/ month).Multiplied by the supply unit price A (member/L) of replenisher, benefit monthly The supply cost of filling liquid is found out as Q × A (member/moon).
Then, substrate manufacture person can by receiving the service offer of the concentration management of developer solution according to the present invention The reduction amount of money of obtained cost of developer solution becomes R × C-Q × A (member/moon).Using D as ratio, the development treatment of substrate monthly Expense is found out as (R × C-Q × A) × D (member/moon).It is of course also possible to along with basic charge etc..As ratio D, such as For one one-tenth (0.1), twenty percent (0.2), three one-tenth (0.3) etc..
It, can also will be because of the reduction amount of money of the reduction bring treatment cost of waste liquor of the waste liquid amount of developer solution as variation Number at the substrate for being set as specified time limit development treatment expense.
The liquid waste processing expense monthly of developer solution before implementing the concentration management of developer solution is set as S (member/moon), will When liquid waste processing expense monthly after the concentration management implementation of developer solution is set as T (member/moon) (wherein, S > T), because of concentration pipe Reason and cut down liquid waste processing expense the reduction amount of money be S-T (member/moon).Substrate manufacture person pays monthly Q because of concentration management The supply cost of the replenisher of × A (member/moon), therefore the waste liquid amount of substrate manufacture person cuts down the amount of money of involved economic interests As (S-T)-Q × A (member/moon).The development treatment expense of substrate monthly found out on this basis multiplied by ratio D for ((S-T)-Q × A) × D (member/moon).It can also be along with basic charge etc..
As other variations, for the amount of money of the economic interests of substrate manufacture person, also can replace developer solution at This reduction amount of money for reducing the amount of money, liquid waste processing expense, and use because yield rate raising, the raising of product quality, device are transported Raising of rate of rotation etc. and income in terms of bring substrate manufacture person increases amount of money etc..Alternatively, it is also possible to will be from cost of developer solution The reduction amount of money, the reduction amount of money of liquid waste processing expense, substrate manufacture person the total amount of money of income increase volume etc. subtract supplement The bring due to concentration management of developer solution of the amount of money after supply cost Q × A (member/moon) of liquid is regarded as substrate manufacture person amounts to The amount of money of economic interests, to calculate the development treatment expense of substrate monthly.In this case, if by phases such as income increase volumes The amount of money obtained from adding is set as U (member/moon), then the development treatment expense of substrate becomes (U-Q × A) × D (member/moon).It can also be with Along with basic charge etc..
As another variation, by providing institute of the present invention to the substrate manufacture person for the concentration management for having been carried out developer solution The service of the concentration management for the developer solution being related to, can making substrate manufacture, person generates various economic interests.Equally by these economy Interests are calculated as the development treatment expense of substrate monthly and request to substrate manufacture person.
Even if most substrate manufacture person still buys developer solution in the case where having been carried out the concentration management of developer solution Concentration management device and oneself operating, maintenance management, to carry out the concentration management of developer solution.Therefore, substrate manufacture person is aobvious The expenses such as every funds of the allotment of raw material or goods, materials and equipments, the labour cost of device operator are undertaken in the concentration management of shadow liquid.In addition, Still in the concentration all not optimized sufficiently using old developer solution managing device or use based on the ingredient for developer solution Measuring principle and the case where developer solution managing device being managed it is also more.
In this case, by the way that previous developer solution management is replaced into developer solution management according to the present invention Service can bring to substrate manufacture person and mention with cost of developer solution, the reduction of waste liquid cost, yield rate raising, product quality The associated economic interests such as high and stabilization, the raising of operation rate, the raising of product manufacturing quantity.In this case, It also in the same manner as described above, can be by the number of the amount of money of economic interests obtained from the integrated flow based on replenisher at being calculated as base The development treatment expense of plate, and requested to substrate manufacture person.
It should be noted that in the above description, although the description of relative to the service of the concentration management of developer solution and based on The method for being the development treatment expense of substrate and requesting to substrate manufacture person is calculated, but also may be calculated the concentration management of developer solution Expense is simultaneously requested to substrate manufacture person.
Next, supplying as one of replenisher the developer solution regeneration treatment after using to illustrate to provide as can be again Regenerated liquid is obtained from come the business for the service being managed to developer solution.
Supply regenerated liquid removed come the ISP for the service being managed to developer solution using regenerating unit by That accumulates in the developer solution after development processing apparatus use does not need ingredient, by the developer solution after the use in development processing apparatus Concentration as defined in the person that is adjusted to substrate manufacture is desired or defined concentration range, to be regenerated as to recycle.Again Raw processing removed by using technologies such as filtering, electrolysis, partial crystallization, UF membranes accumulated do not need ingredient to carry out (regeneration The mode of processing is not limited to these.It is properly selected according to the medical fluid as object or the ingredient that should be removed and applies conjunction Suitable technology.).The control valve that regenerating unit is equipped in the piping of the developer solution (regenerated liquid) after supply regeneration by opening, Regenerated liquid is supplied to development processing apparatus.The flow quantity recorder being equipped in the piping of supply regenerated liquid is utilized to measure on one side Integrated flow supplies regenerated liquid on one side.ISP is based on by the integrated flow of the supplied regenerated liquid of monitoring according to rule Integrated flow (for example, one week or one month etc.) between periodically and calculate the clothes for supplying regenerated liquid to be managed to developer solution The service of business provides related expense, and requests the expense to substrate manufacture person according to the specified time limit.This is to provide supply Regenerated liquid obtained from regeneration treatment is carried out come the general of the business for the service being managed to developer solution to the developer solution after using It wants.
Regenerated liquid obtained from regeneration treatment is carried out to the developer solution after using in supply to be managed developer solution Regenerating unit used in service, as ISP all objects and operated by ISP and maintained to manage And it is used for the regeneration treatment of developer solution.Therefore, substrate manufacture person is without buying regenerating unit, without carrying out the regenerating unit Operating maintains management.The regeneration treatment of developer solution is only carried out by ISP.
The factory of the regenerating unit that ISP has oneself is set to substrate manufacture person, and with substrate manufacture person institute The development processing apparatus of utilization connects.
Being separated off technology by using filtering, electrolysis, partial crystallization, UF membrane etc. and removed from developer solution makes because of developer solution With and that accumulates in developer solution do not need substance and realize regeneration treatment.It can also be adjusted ands suitably feeding replenisher etc. Save each ingredient of developer solution.But isolation technics used in regeneration treatment is not limited to these.It accumulates in developer solution It does not need substance to refer to, such as the resist ingredient etc. dissolved out due to development treatment from substrate.
The regenerated liquid of developer solution after regeneration is conveyed via piping to the development processing apparatus of substrate manufacture person.It is feeding again The piping of raw liquid is provided with control valve and flow quantity recorder.It per unit time circulates if having preset when control valve is opened Flow can supply suitable regenerated liquid then by the way that the control valve is opened the stipulated time.When supplying regenerated liquid, add up stream Meter is measured the integrated flow of regenerated liquid.This is the supply amount of the regenerated liquid supplied to development processing apparatus.
ISP is tired based on the regenerated liquid determined by flow quantity recorder according to such as one month equal specified time limits It counts flow (supply amount) and calculates the development treatment expense for supplying associated substrate with regenerated liquid.ISP is to substrate system The person of making requests the development treatment expense of calculated substrate as the developer solution management that the supply based on regenerated liquid is realized is provided Service return.
Substrate manufacture person passes through the development treatment expense for supplying associated substrate of period Zhi Fuyu regenerated liquid according to the rules, It buys, operate and maintains management can obtain the medical fluid after regeneration treatment without regenerating unit and be used at substrate Reason.On the other hand, compared with when sale device, ISP can continue to earn stable income.
Here, the development treatment expense as the substrate associated with the supply of regenerated liquid, can adopt in various manners.With Under, exemplify the concrete example of the development treatment expense of several substrates.But the calculation method of the development treatment expense of substrate is simultaneously It is not limited to these.The calculation method of the development treatment expense of substrate of the invention includes that the integrated flow based on regenerated liquid (supplies To amount) and the various fee calculation procedures of calculating.
First, as the regeneration treatment expense of the substrate associated with the supply of regenerated liquid, supplied sometimes with interior during the prescribed period Expense is calculated on the basis of the supply cost for the regenerated liquid given.This is obtained based on the form of thinking for selling regenerated liquid.
For example, will be set as specified time limit one month.Due to measuring the integrated flow of regrowth liquid medicine using flow quantity recorder, Therefore by from this month table look-up time point integrated flow subtract before table look-up the moon time point integrated flow come find out this month supply again The supply amount of raw liquid.The supply amount of the regenerated liquid of this month supply is set as K (the L/ month).The supply unit price of regenerated liquid is set as E (member/L).Then, the supply cost of the regenerated liquid of this month is found out as K × E (member/moon).As this month and regenerated liquid The development treatment expense of the associated substrate of supply requested to substrate manufacture person.
As its variation, the supply cost of the regenerated liquid calculated as described above will be obtained plus various expenses sometimes Development treatment expense of the expense out as the substrate associated with the supply of regenerated liquid monthly.As the various expenses to be added Representative expense, have basic charge.It is mentioned in the service for signing the developer solution management that the regeneration treatment based on developer solution is realized When for related contract, basic charge monthly is determined, regardless of whether the supply of regenerated liquid is carried out, all by the basic charge packet It is contained in the development treatment expense of substrate and makes requests.It is of course also possible to without concerning item as basic charge, and will set Standby labour cost, material allocation expense, other various funds for maintaining administration fee or device operator etc. are included in the expense to be added It is interior.If the expense (such as basic charge) that will add up is set as Z (member/moon), the development treatment expense of substrate monthly become K × E+Z (member/moon).It is the sum of various expenses Z=∑ Z in the expense of additionjWhen, the development treatment expense of substrate monthly becomes K ×E+∑Zj(j=1,2,3) (member/moon).
In addition, as other variations, sometimes also by the supply cost of regenerated liquid multiplied by the amount of money obtained from subsidy rate F It is set as the development treatment expense of the substrate associated with the supply of regenerated liquid monthly.For example, the goods, materials and equipments of regenerated liquid or the tune of raw material It is considered with the supply amount of regenerated liquid (when this operating with device with related every funds, maintenance administration fee of device etc. Between also have relationship) it is relevant be reasonable.In this case, by subsidy rate F multiplied by supply cost K × E of regenerated liquid (member/moon), the development treatment expense of substrate monthly are found out as K × E × F (member/moon).Subsidy rate F can also be contained in The supply unit price E (member/L) of regenerated liquid.In addition, the development treatment of substrate monthly is taken plus basic charge etc. With as K × E × F+Z (member/moon).For more generally, the development treatment expense of substrate monthly is found out as (K × E) × F+ ∑Zj(j=1,2,3 ...) (member/moon).
Second, as the development treatment expense of the associated substrate of supply with regenerated liquid, to substrate manufacture person request by because The service for the developer solution management that the regeneration treatment based on developer solution provided in during the prescribed period is realized and to substrate manufacture person with The economic interests come are multiplied by the amount of money obtained from defined ratio.This based on will brought by the regeneration treatment because of developer solution develop The service of liquid pipe reason provide and economic interests that the person that makes substrate manufacture the generates person that gives substrate manufacture and ISP as Form of thinking and obtain.This is preferably applied to for example provide base to the substrate manufacture person of no regeneration treatment for implementing developer solution In developer solution regeneration treatment realize developer solution management service the case where etc..
In the case where the regeneration treatment without developer solution, substrate manufacture person by developer solution used stipulated number it It all discards afterwards and is changed to new developer solution.Therefore, the waste liquid amount of developer solution is very more, and new developer solution must also be adjusted in large quantities Match.On the other hand, if carrying out regeneration treatment to developer solution and making its recycling, substrate manufacture person can be enjoyed as follows Various effects.That is, the usage amount of new developer solution is substantially cut down.The waste liquid amount of developer solution is also substantially cut down.
The calculating of development treatment expense as substrate associated with the supply of regenerated liquid under such circumstances it is specific Example, can enumerate will be because the number of the reduction amount of money of the reduction bring cost of developer solution of developer solution usage amount be at as specified time limit Substrate development treatment expense the case where.
For example, will be set as specified time limit one month.It will receive in substrate manufacture person according to the present invention based on developer solution The service offer of developer solution management realized of regeneration treatment before, i.e. the substrate manufacture when not implementing the regeneration treatment of developer solution The amount of buying of the developer solution for each month that person buys is set as M (the L/ month), and is bought unit price and be set as G (member/L).Developing In the case that the variation of the liquid amount of buying M is big, by it is past it is appropriate during the average value of the developer solution amount of buying be set as M.
According to the integrated flow determined by flow quantity recorder, at because of the regeneration according to the present invention based on developer solution The service for managing the developer solution management realized provides and the supply amount of the regenerated liquid of supply found out as K (the L/ month).Multiplied by replenisher It supplies unit price E (member/L), the supply cost of regenerated liquid monthly is found out as K × E (member/moon).
Then, the developer solution that substrate manufacture person is realized by receiving the regeneration treatment according to the present invention based on developer solution The reduction amount of money of the cost of developer solution that services offer and can obtain of management becomes M × G-K × E (member/moon).Using F as ratio, The development treatment expense of substrate monthly is found out as (M × G-K × E) × F (member/moon).It is of course also possible to take along with basic With etc..As ratio F, for example, one one-tenth (0.1), twenty percent (0.2), three one-tenth (0.3) etc..
It, can also will be because of the reduction amount of money of the reduction bring treatment cost of waste liquor of the waste liquid amount of developer solution as variation Number at the associated substrate of the regeneration treatment with developer solution for being set as specified time limit development treatment expense.
The liquid waste processing expense monthly of developer solution before implementing regeneration treatment is set as N (member/moon), by regeneration treatment When liquid waste processing expense monthly after implementation is set as P (member/moon) (wherein, N > P), cut down because of the regeneration treatment of developer solution Liquid waste processing expense the reduction amount of money be N-P (member/moon).Substrate manufacture person pays monthly K because of the regeneration treatment of developer solution The supply cost of the regenerated liquid of × E (member/moon), therefore the waste liquid amount of substrate manufacture person cuts down the amount of money of involved economic interests As (N-P)-K × E (member/moon).The development treatment expense of the associated substrate of the regeneration treatment with developer solution monthly is in this base It is found out on plinth multiplied by ratio F as ((N-P)-K × E) × F (member/moon).It can also be along with basic charge etc..
As other variations, the reduction gold of manufacture liquid cost is also can be used in the amount of money of the economic interests of substrate manufacture person The total amount of money for reducing amount of money etc. of volume and liquid waste processing expense.Can also will from manufacture liquid cost the reduction amount of money and waste liquid from The total amount of money of the reduction amount of money of reason expense etc. subtracts the amount of money after supply cost K × E (member/moon) of replenisher and is regarded as substrate system The person of making because developer solution regeneration treatment bring amount to economic interests the amount of money, to calculate the development treatment expense of substrate monthly With.In this case, if by the total amount of money of the reduction amount of money for reducing the amount of money and liquid waste processing expense of cost of developer solution etc. It is set as V (member/moon), then the development treatment expense of substrate becomes (V-K × E) × F (member/moon).Basic charge can also be added Deng.
As another variation, by providing institute of the present invention to the substrate manufacture person for the regeneration treatment for having been carried out developer solution The service of the regeneration treatment for the developer solution being related to, can making substrate manufacture, person generates various economic interests.Equally by these economy Interests are calculated as the development treatment expense of substrate monthly and request to substrate manufacture person.
Even if most substrate manufacture person still buys developer solution in the case where having been carried out the regeneration treatment of developer solution Regenerating unit and oneself operating, maintenance management, to carry out the regeneration treatment of developer solution.Therefore, substrate manufacture person is in developer solution Regeneration treatment in undertake the expenses such as every funds of allotment of raw material or goods, materials and equipments, the labour cost of device operator.In addition, still existing The case where using old regenerating treater, is also more.
In this case, by by previous regeneration treatment be replaced into it is according to the present invention based on developer solution again The service for the developer solution management that raw processing is realized, can bring and the reduction of cost of developer solution, waste liquid cost to substrate manufacture person Etc. associated economic interests.In this case, also in the same manner as described above, it can will be obtained based on the integrated flow of replenisher To economic interests the amount of money number at the development treatment expense being calculated as with the associated substrate of supply of regenerated liquid, and to substrate Producer's request.
It is used about the new liquid for using modulating device modulation developer solution and as one of replenisher to substrate manufacture person Development processing apparatus supplies to provide the business of the service of developer solution management, the developer solution also realized with the supply based on regenerated liquid The case where service of management similarly considers, the raw material of above-mentioned modulating device developer solution automatically modulates substrate manufacture person institute The developer solution of desired constituent concentration is simultaneously supplied as the new liquid of developer solution.Development treatment about substrate in this case is taken With, regenerated liquid is replaced into new liquid and is similarly considered, due to illustrating to repeat, omission specific description.
Next, the developing system of concentration management device and substrate to developer solution according to the present invention carries out Explanation.For realizing the business for the service of concentration management that developer solution is provided, it can measure and be mended required for concentration management The supply amount of filling liquid, replenisher supplying tubing be equipped with flow quantity recorder be indispensable.Hereinafter, referring to attached drawing pair The developing system of the concentration management device and substrate that have the developer solution of this flow quantity recorder is illustrated.
(first embodiment)
Fig. 1 is the development treatment system for the substrate for illustrating the concentration management device A for having developer solution of present embodiment The schematic diagram of system.
In development process, developer solution dissolves the unnecessary portion of the photoresist film after exposure-processed, by This develops.Photoresist salt can be generated by being dissolved between the photoresist of developer solution and the alkali composition of developer solution.Cause This, if not being managed suitably to developer solution, with the progress of development treatment, in developer solution with developing activity Alkali composition is consumed and deteriorates, and developing performance deteriorates.Meanwhile being dissolved in the photoresist in developer solution and alkali composition hair Life is reacted and is constantly accumulated in the form of photoresist salt.
The photoresist for being dissolved in developer solution shows interfacial activity effect in developer solution.Therefore, it is dissolved in developer solution Photoresist can improve the wellability relative to developer solution of the photoresist film for being used to development treatment so that development The compatibility of liquid and photoresist film improves.Thus, in the developer solution moderately containing photoresist, developer solution is good Ground is in the fine recess portion for arriving photoresist film, so as to implement the concave-convex photoresist for having fine well The development treatment of agent film.
In addition, in development treatment in recent years, with the enlargement of substrate, a large amount of developer solution of Reusability, therefore it is aobvious The chance that shadow liquid is exposed to air increases.However, alkaline-based developer can absorb the carbon dioxide in air if being exposed to air. Carbonate can be generated between absorbed carbon dioxide and the alkali composition of developer solution.Therefore, if inadequately managing developer solution, The absorbed carbon dioxide-depleted of the alkali composition with developing activity in developer solution and reduce.Meanwhile being absorbed in developer solution Carbon dioxide is reacted with alkali composition and is constantly accumulated in the form of carbonate.
Carbonate in developer solution has development effect due to showing alkalinity in developer solution.Such as 2.38% In the case where TMAH aqueous solution, if carbon dioxide in developer solution be about 0.4wt% or so hereinafter, if can develop.
In this way, different from " carbon dioxide that photoresist, the developed liquid dissolved in developer solution absorbs is in development treatment In be unwanted substance " as existing cognition, in fact, the photoresist dissolved in developer solution or developed liquid absorb Carbon dioxide contribute to the developing performance of developer solution.It therefore, is not to carry out that photoresist will be dissolved, absorb dioxy Change carbon and exclude such developer solution management completely, but need to carry out following developer solution management, that is, allows in developer solution slightly Slightly soluble has dissolution photoresist, absorbing carbon dioxide and maintains management at optimal concentration them.
In addition, a part of the photoresist salt or carbonate that generate in developer solution dissociates, and generate photic The dissociated ion of the multiplicity such as resist ion or carbonate ions, carbonic acid hydrogen ion.Also, these dissociated ions are with various Activity ratio has an impact the conductivity of developer solution.
The constituent concentration analysis and utilization of previous alkaline-based developer is the alkali composition concentration of developer solution and leading for developer solution The absorbance value of dissolution photoresist concentration and developer solution of the electric rate value with good linear relation and developer solution has good Good this principle of linear relation is (hereinafter, be referred to as " existing method " for these.).
The conductivity values of developer solution are to depend on charged particles number and its quantities of electric charge such as ion contained in developer solution Physics value.In developer solution, as described above, there is only alkali compositions, there is also the photoresists dissolved in developer solution The various dissociated ions for the carbon dioxide that agent, developed liquid absorb.Therefore, it in order to improve the analysis precision of constituent concentration, needs The operation method taken into account is influenced on the conductivity values bring of developer solution using by these dissociated ions.
The absorbance value of developer solution is that have between the concentration of the special component for the light for selectively absorbing the measurement wavelength There is the physics value (lambert Bill rule) of linear relation.But in multicomponent system, although difference of its degree because measuring wavelength And it is different, but the extinction spectrum of usually object component can be Chong Die with the extinction spectrum of other compositions.Therefore, dense in order to improve ingredient The analysis precision of degree needs the absorbance value bring using the photoresist for not only considering to dissolve in developer solution to developer solution The operation method for influencing, also taking into account other compositions on the influence of the absorbance value bring of developer solution.
In the present embodiment, operation method uses multiple-regression analysis (for example, multiple regression analysis method).By using Multiple-regression analysis (for example, multiple regression analysis method), compared with the conventional method, can accurately calculate developer solution it is each at The concentration divided.In addition, absorbing carbon dioxide concentration can be measured.If using multiple-regression analysis is passed through (for example, multiple regression point Analysis method) calculate developer solution constituent concentration, then can be dense by the dissolution photoresist concentration of developer solution, absorbing carbon dioxide It is good state that degree, which maintains management,.
Firstly, the example as multiple-regression analysis, is illustrated multiple regression analysis.Multiple regression analysis includes school Just with prediction two stages.In the multiple regression analysis of n ingredient system, prepare m calibration standard solution.It will be present in i-th The concentration of j-th of ingredient in solution is expressed as Cij.Here, i=1~m, j=1~n.For m standard solution, measure respectively P characteristic value (for example, the physics values such as absorbance or conductivity under a certain wavelength) Aik(k=1~p).Concentration data and spy Property data be able to summarize and (C, A) is indicated with a matrix type.
[formula 1]
It will be known as correction matrix to matrix obtained from these matrix opening relationships, and use symbol S (S hereinkj；K=1~p, j =1~n) it indicates.
[formula 2]
C=AS
(it for the content of A, not only can be the measured value of homogeneity according to known C and A, be also possible to heterogeneous survey Definite value mixes.For example, conductivity, absorbance and density.) and calculate the stage of S using matrix operation as calibration phase. Now it is necessary to be p >=n and m >=np.The all unknown numbers of each element of S, it is therefore desirable for m > np, in this case, with as follows Mode carries out least square operation.
[formula 3]
S=(ATA)-1(ATC)
Here, upper target T indicates transposed matrix, upper target -1 indicates inverse matrix.
P characteristic value is measured for the unknown sample liquid of concentration, if they are set as Au (Auk；K=1~p), then will Its concentration C u (Cu that can obtain requiring out that is multiplied with Sj；J=1~n).
[formula 4]
Cu=AuS
This is forecast period.
In the 2.38%TMAH aqueous solution that an example as alkaline-based developer is shown, it is considered as by alkali composition, dissolution The multicomponent system (n=3) that photoresist and these three ingredients of absorbing carbon dioxide are constituted, according to the characteristic as the developer solution Three characteristic values (p=3), the i.e. conductivity values of developer solution, the absorbance value under specific wavelength and the density value of value simultaneously utilize more First regression analysis calculates each constituent concentration.
Multiple-regression analysis (such as multiple regression analysis method) is for operation and to find out the concentration of multiple ingredients be effective. Can measure multiple characteristic value a, b of developer solution, c ..., according to the measured value of these characteristic values and utilize multiple-regression analysis (such as multiple regression analysis method) come find out constituent concentration A, B, C ....At this point, being directed to the constituent concentration each to be found out, at least With the constituent concentration there is associated characteristic value to need at least to be measured one and is used for operation.
Here, referring to that the characteristic value has with the constituent concentration with the characteristic value of constituent concentration " with associated " developer solution Relationship changes such relationship according to the variation of the constituent concentration in characteristic value.For example, with the constituent concentration of developer solution At least constituent concentration A have associated developer solution characteristic value a refer to, using using constituent concentration as the function of variable come When finding out characteristic value a, one in variable includes at least constituent concentration A.Characteristic value a can be only relevant to constituent concentration A Function, but the multi-variable function other than constituent concentration A also by constituent concentration B or C etc. as variable is usually become, at this point, It is just very big using the meaning of multiple-regression analysis (such as multiple regression analysis method).
In addition, constituent concentration is the scale for indicating the ingredient relative to whole relative quantity.The developer solution being used repeatedly The constituent concentration for the mixed liquor that such ingredient increases and decreases as time goes by is not determined individually by the ingredient, usually becomes it The function of the concentration of his ingredient.Therefore, the relationship of the characteristic value of developer solution and constituent concentration be difficult to mostly with the chart of plane come It indicates.In this case, in using operation method of calibration curve etc., ingredient can not be calculated according to the characteristic value of developer solution Concentration.
However, preparing one group and the constituent concentration to be calculated according to multiple-regression analysis (such as multiple regression analysis method) Measured value with associated multiple characteristic values, and they are used for operation, calculate one group of constituent concentration.It is being based on multivariable solution Analysis method (such as multiple regression analysis method) in the component concentration measuring that carries out, can obtain following remarkable result: even first It is difficult to the constituent concentration measured at a glance, constituent concentration can also be measured by measurement characteristic value.
As described above, by using multiple-regression analysis (for example, multiple regression analysis method), it can be based on the spy of developer solution The measured value of property value (for example, absorbance and density under conductivity, specific wavelength) calculates the alkali composition concentration, molten of developer solution Solve photoresist concentration and absorbing carbon dioxide concentration.Therefore, compared with the conventional method, each ingredient can accurately be calculated Concentration.
In addition, due to having used multiple-regression analysis (such as multiple regression analysis method), calculate developer solution at Divide in the operation of concentration the characteristic value that can also use the developer solution not in linear relation with the specific constituent concentration of developer solution. As the characteristic value for the developer solution for being suitable for using, except under the conductivity of developer solution, specific wavelength absorbance, in addition to density, energy Enough enumerate refractive index, ultrasonic propagation velocity, viscosity, pH, the titration end-point etc. of the light of developer solution.
Next, being illustrated using developing system of the Fig. 1 to substrate.Fig. 1 is the base for having concentration management device The developing system of plate, the concentration management device measure the concentration of three kinds of ingredients of developer solution (for example, alkali composition concentration, molten Solution photoresist concentration, absorbing carbon dioxide concentration) and the control valve being equipped in the piping of supply replenisher is controlled System.The developing system of substrate is mainly from the concentration management device A of developer solution, development processing apparatus B, by replenisher to development The piping 81 of processing unit B conveying, 82,83, be provided to flow quantity recorder 151,152,153 and the control of piping 81,82,83 Valve 41,42,43 is constituted.In addition, development processing apparatus B also with the developer solution stoste hold-up vessel of the hold-up vessel as replenisher 91, new liquid hold-up vessel 92 of developer solution etc. connects.
Firstly, simple declaration development processing apparatus B.
Development processing apparatus B mainly by developer solution storagetank 61, overflow launder 62, developing room shield 64, roller conveyor 65, Developer solution spray nozzles 67 etc. are constituted.Developer solution is stored in developer solution storagetank 61.Developer solution is carried out by supplement replenisher Composition management.Developer solution storagetank 61 has liquid level meter 63 and overflow launder 62, the increase to liquid measure caused by supply replenisher It is managed.Developer solution storagetank 61 and developer solution spray nozzle 67 are connected by development liquid pipeline 80, are stored in developer solution storagetank Developer solution in 61 is under the action of being set to circulating pump 72 of development liquid pipeline 80 via filter 73 to developer solution spray nozzle 67 Conveying.Roller conveyor 65 is provided to the top of developer solution storagetank 61, the substrate for having photoresist film for carrying production 66.Developer solution drips from developer solution spray nozzle 67, and the substrate 66 conveyed by roller conveyor 65 passes through among the developer solution to drip And developed liquid infiltration.Later, the developed liquid storagetank 61 of developer solution is recycled and is stored again.In this way, developer solution is in development work It recycles and is used repeatedly in sequence.It should be noted that in the developing room of small-sized glass substrate, also sometimes through full of nitrogen To implement, the carbon dioxide prevented absorbing in air is such to be handled the modes such as gas.It should be noted that the developer solution deteriorated (discharge) is discarded and acting waste drains pump 71.
In addition, being connected in development processing apparatus B for stirring following for the developer solution being stored in developer solution storagetank 61 Ring rabbling mechanism D.Circulation stirring mechanism D is made of the circulation line 90 for being equipped with circulating pump 74 and filter 75 in midway, is followed Endless tube road 90 is connect with the bottom of developer solution storagetank 61 and side.When making circulating pump 74 work, it is stored in developer solution storage The developer solution of slot 61 is recycled via circulation line 90.The developer solution for being stored in developer solution storagetank 61 is carried out as a result, Purification and stirring.
Next, being illustrated to the concentration management device A of the developer solution of present embodiment.The concentration pipe of present embodiment Reason device A has measuring means 1, arithmetical organ 2 and control mechanism 3.
Assuming that the concentration management device of the developer solution for the service for being adapted to provide for concentration management being connect with development processing apparatus B A is preferably also to connect with the piping 81,82,83 of supply replenisher, in this of the inside of the concentration management device by developer solution Have the control valve 41,42,43 controlled by control mechanism 3 in a little pipings 81,82,83 and the integrated flow of replenisher is counted Internal part of the flow quantity recorder 151,152,153 of survey as the concentration management device of developer solution.
However, the concentration management device A as the developer solution for constituting developing system, it is not necessary to have control valve 41,42,43, internal part of the flow quantity recorder 151,152,153 as concentration management device A.As shown in Figure 1, concentration management Device A and control valve 41,42,43 and flow quantity recorder 151,152,153 can also be separately formed and constitute development treatment system System.
It is in each of the following embodiments and identical.
The concentration management device A of developer solution is by sampling piping 15 and returns to piping 16 and the company of developer solution storagetank 61 It connects.Measuring means 1 and arithmetical organ 2 are connected by determination data signal wire 51,52,53.
Measuring means 1 has sampling pump 14, the first detector 11, the second detector 12 and third detector 13 (sometimes First detector 11, the second detector 12 and third detector 13 are referred to as characteristic value testing agency.In addition, " first ... ", The terms such as " second ... ", " third ... " are not intended to limit the measurement sequence of each detector in measuring means 1.It is used for the purpose of It is used convenient for distinguishing each detector.It is in the following description and identical.).Characteristic value testing agency 11,12,13 It is connect in series with the back segment of sampling pump 14.Measuring means 1 in order to improve measurement accuracy further preferably have make sampling Developer solution stablizes the thermoregulation mechanism (not shown) in predetermined temperature.Sampling piping 15 and the sampling pump 14 of measuring means 1 connect It connects, return piping 16 is connect with the piping of characteristic value testing agency end.
Characteristic value testing agency 11,12,13 is for the ingredient with the developer solution for wanting to be measured and manage The measuring device that there is concentration the characteristic value of associated developer solution to be detected.For example, wanting to measure and managing developer solution In the case where alkali composition concentration, dissolution photoresist concentration and absorbing carbon dioxide concentration, the conductivity of developer solution is detected The conductivity meter of value, the extinction photometer for detecting absorbance value under the specific wavelength (such as 560nm) of developer solution, detection development Densimeter of the density value of liquid etc. becomes characteristic value testing agency 11,12,13.
In Fig. 1, depicts measuring means 1 and arithmetical organ 2, control mechanism 3 are integrally formed and constitute concentration management dress It sets A and developer solution is sampled and is measured the mode of the characteristic value of developer solution, however, it is not limited to this.Characteristic value detection machine Measuring principle that each detector of structure 11,12,13 is used according to it or as the developer solution of test object characteristic value and it is expected With the outfit of optimal set-up mode.For example, it can be detector is directly mounted at the developer solution storage of development processing apparatus B Slot 61, detector probe portion be impregnated in developer solution storagetank 61 or detector is installed on development liquid pipeline 80.At this point, Measuring means 1 is sometimes also separately formed with arithmetical organ 2, control mechanism 3.
Arithmetical organ 2 contains the computing module 21 based on multiple-regression analysis.Arithmetical organ 2 can also further include based on The computing module of the different operation method of multiple-regression analysis.For example, being the characteristic value of the developer solution according to detecting and utilization Calibration curve method calculates the computing module etc. of the constituent concentration of corresponding developer solution.Computing module 21 based on multiple-regression analysis It is connect by determination data signal wire 51 with the first detector 11 being provided in measuring means 1, is used by determination data Signal wire 52 and connect with the second detector 12 being provided in measuring means 1, and pass through determination data signal wire 53 It is connect with the third detector 13 being provided in measuring means 1.
Next, the measurement of the characteristic value of the developer solution of the concentration management device A progress by developer solution is acted and is shown The operation movement of the constituent concentration of shadow liquid is illustrated.
The developer solution sampled by sampling pump 14 from developer solution storagetank 61 is directed to developer solution by sampling piping 15 Concentration management device A measuring means 1 in.Then, in the case where having thermoregulation mechanism, the developer solution quilt that is sampled It is delivered to thermoregulation mechanism, and is maintained at defined measuring temperature (such as 25 DEG C), and then is transported to characteristic value detection Mechanism 11,12,13.Developer solution after measurement is back to developer solution storagetank 61 by returning to piping 16.
The measured value of the characteristic value of the developer solution determined by characteristic value testing agency 11,12,13 is respectively via measurement number According to the computing module 21 for being transported to multiple-regression analysis with signal wire 51,52,53.Computing module 21 utilizes multivariate analysis Method calculates the constituent concentration of developer solution to the progress operation of these measured values.So, it is filled using the concentration management of developer solution A is set to measure the constituent concentration of developer solution.
Arithmetical organ 2 is connect with signal wire 54 with control mechanism 3 by operational data.Arithmetical organ and control mechanism It can be integrally constituted for example, by computer etc..
Control mechanism 3 includes control module 31.Control module 31 is by controlling signal signal wire 55,56,57 and setting It is connected in the control valve 41,42,43 of the piping 81,82,83 of replenisher supply.Control mechanism 3 is calculated according to by arithmetical organ 2 The concentration of developer solution determine to supplement how much which kind of replenisher is measured, and to the control valve being arranged in the piping of conveying replenisher Control is opened and closed.
The accumulative stream for measuring supplied replenisher is also respectively equipped in the piping 81,82,83 of replenisher supply The flow quantity recorder 151,152,153 of amount.Sometimes flow quantity recorder is not provided in the piping 83 of pure water supply.
The new liquid hold-up vessel 92 of developer solution stoste hold-up vessel 91, developer solution is pressurizeed by nitrogen, and control mechanism 3 is to control valve 41, it 42,43 is opened and closed, thus replenisher is fed by interflow pipeline 89 to developer solution.The replenisher supplied is by following Ring pump 74 is simultaneously back to developer solution storagetank 61 via circulation line 90 and is stirred.
It should be noted that replenisher refers to such as the stoste of developer solution, new liquid, pure water.It sometimes also include regenerated liquid. Stoste refers to the dense not used developer solution of alkali composition concentration (such as 20~25%TMAH aqueous solution).New liquid refers to alkali composition Concentration and the concentration used in developing procedure are that (such as 2.38%TMAH is water-soluble for identical concentration and not used developer solution Liquid).Regenerated liquid refer to from use in the developer solution finished removal not need substance (such as photoresist ingredient) and can be again The developer solution utilized.Their purposes and effect difference as replenisher.For example, stoste is for improving alkali composition concentration Replenisher, and reduce dissolution photoresist concentration and absorbing carbon dioxide concentration.New liquid is for maintaining alkali composition concentration Or increases and decreases alkali composition concentration slowly and reduce the supplement of dissolution photoresist concentration and absorbing carbon dioxide concentration Liquid.Pure water is for reducing the replenisher of each constituent concentration.Regenerated liquid is for reducing the supplement of dissolution photoresist concentration Liquid.It is also identical in the explanation of embodiment below.
Control mechanism 3 is to the constituent concentration of the developer solution calculated by arithmetical organ 2 and the pipe of pre-stored constituent concentration Reason target value is compared.Control mechanism 3 carries out the supplement for needing to feed in order to which constituent concentration is maintained management objectives value The selection of liquid, the calculating of the supply amount of replenisher or should by be arranged in conveying replenisher piping on control valve open when Between calculating.Control mechanism 3 via control signal with signal wire 55,56,57 and to be arranged in replenisher supply piping 81, 82, any control valve appropriate of the control valve 41,42,43 in 83 sends the signal of open and close control.
The control valve for receiving control signal is based on the control signal and flow path is opened the stipulated time.Control valve is preset There is flow when opening.Therefore, the replenisher of specified amount is supplied by the way that flow path is opened the stipulated time.
For example, the alkali composition concentration management of TMAH aqueous solution (developer solution) is as described below for 2.38% control.By When the concentration for the alkali composition that arithmetical organ 2 calculates is lower than 2.38%, piping (developer solution stoste supplying tubing) 81 will be set to Control valve 41 opens the stipulated time, feeds preprepared in developer solution stoste hold-up vessel (replenisher hold-up vessel) 91 The stoste (20%TMAH aqueous solution) of developer solution.When the concentration of alkali composition is higher than 2.38%, piping (pure water supply will be set to Piping) 83 control valve 43 opens and the stipulated time and feeds pure water.
It equally, is that the control below of defined management concentration is as described below by dissolution photoresist concentration management.By When the dissolution photoresist concentration that arithmetical organ 2 calculates is higher than defined management value, being set to piping, (the new liquid of developer solution is supplied To piping) 82 control valve 42 open the stipulated time, feed in the new liquid hold-up vessel of developer solution (replenisher hold-up vessel) 92 The new liquid (not used 2.38%TMAH aqueous solution) of preprepared developer solution.Supplement is being used as regenerated liquid can be fed In the system structure of liquid, regenerated liquid can also be fed.
About the absorbing carbon dioxide concentration management of developer solution is also the same as follows for the control below of defined management value It is described.When the absorbing carbon dioxide concentration of the developer solution calculated by arithmetical organ 2 is higher than defined management value, match being set to The control valve 42 of pipe (the new liquid supply piping of developer solution) 82 is opened the stipulated time, and supply (is mended in the new liquid hold-up vessel of developer solution Filling liquid hold-up vessel) the new liquid (not used 2.38%TMAH aqueous solution) of preprepared developer solution in 92.
Replenisher is stored in the new liquid hold-up vessel 92 of developer solution stoste hold-up vessel 91, developer solution of replenisher reservoir C In.The new liquid hold-up vessel 92 of developer solution stoste hold-up vessel 91, developer solution is connected with the nitrogen for having gas-pressurized valve 46,47 Gas pipeline, and the nitrogen pressurization supplied via the pipeline.In addition, developer solution stoste hold-up vessel 91, the new liquid of developer solution Hold-up vessel 92 is connected separately with the piping 81,82 of replenisher, conveys replenisher via the valve 48,49 of normally open. In the piping 81,82 of replenisher and the piping 83 of pure water equipped with control valve 41,42,43, control valve 41,42,43 by The control opening and closing of control mechanism 3.By making to control valve events, it is stored in the new liquid storage of developer solution stoste hold-up vessel 91, developer solution The replenisher of container 92 is conveyed by pressure, and conveys pure water.Then, replenisher via interflow pipeline 89 and with circulation stirring machine The interflow structure D, feeds to developer solution storagetank 61 and is stirred.
Cause to be stored in developer solution stoste hold-up vessel 91 and in the new liquid hold-up vessel 92 of developer solution because of supply When replenisher is reduced, interior drops and so that supply amount is become unstable, therefore correspondingly suitably opened with the reduction of replenisher Gas-pressurized supplies nitrogen with valve 46,47, to maintain to ensure that the new liquid storage of developer solution stoste hold-up vessel 91, developer solution is held The internal pressure of device 92.When developer solution stoste hold-up vessel 91, the new liquid hold-up vessel 92 of developer solution are emptying, valve 48,49 is closed, more The replenisher that is changed to the new replenisher storagetank full of replenisher or will separately deploy is refilled in emptying developer solution The new liquid hold-up vessel 92 of stoste hold-up vessel 91, developer solution.
So, the alkali composition concentration of TMAH aqueous solution is 2.38% by concentration management, dissolves photoresist concentration With absorbing carbon dioxide concentration by concentration management for below defined management value.Concentration management is for example, by PID control (Proportional-Integral-Differential Control) etc. is carried out.
Flow quantity recorder 151,152,153 is equipped in the piping 81,82,83 of replenisher supply.Flow quantity recorder 151, 152, the integrated flow of the replenisher of 153 pairs of pipings 81,82,83 via replenisher supply and supply is measured.From aobvious The replenisher of the concentration management device A supply of shadow liquid is after having passed through flow quantity recorder 151,152,153, in interflow pipeline 89 Collaborate and is fed via circulation line 90 to developer solution storagetank 61.The expectation of flow quantity recorder 151,152,153 has communication Function.It, can be by flow quantity recorder and network connection if having communication function.It can hold and to be determined via network The measured value of integrated flow.
Flow quantity recorder 151,152,153 is not limited to direct situation connected to the network, can also indirectly with net Network connection.For example, flow quantity recorder 151,152,153 can also in the concentration management device A of developer solution with undertake developer solution Concentration management device A operation, control function computer connection, and with the concentration management device A and network of developer solution The mode of connection indirectly with network connection.
In addition, for flow quantity recorder 151,152,153 connect network can be the local area network in factory, be also possible to because The wide area networks such as spy's net.
As described above, the concentration management device of the developer solution of present embodiment and the developing system of substrate are utilized Realize the concentration management of developer solution, substrate manufacture person is able to use is managed developer solution for optimum state and to substrate always Carry out development treatment.At this point, utilizing the flow quantity recorder 151,152,153 being equipped in the piping 81,82,83 of supply replenisher To measure the integrated flow of supplied replenisher.Due to measuring the integrated flow of replenisher, can calculate based on supplement The reasonable expense of the supply amount of liquid.
The developing system of the concentration management device of the developer solution of present embodiment shown in FIG. 1 and substrate is only It is to illustrate, it is not limited to which.In the concentration management device A of the developer solution of Fig. 1, although showing replenisher supply Piping 81,82,83, the seperated device constituted such as control valve 41,42,43, but the piping 81 of replenisher supply, 82,83, control Valve 41,42,43 etc. is also possible to the device being integrally formed with concentration management device A.Also the not office such as internal structure of measuring means 1 It is limited to Fig. 1, and can be adopted in various manners according to the type etc. of developer solution.
As the flow quantity recorder for having communication function, for example, as it is known that there is the Coriolis-type digital stream of KEYENCE company Quantity sensor FD-S series etc..By install communication unit, can by the various data such as the integrated flow data determined and People's computer etc. communicates.Therefore, integrated flow can be remotely monitored.
(second embodiment)
Fig. 2 is the schematic diagram for illustrating the developing system of substrate.The developing system of the substrate has: this reality Apply concentration management device A, development processing apparatus B and the modulating device E of the developer solution of mode；It is aobvious to development processing apparatus B supply The stoste of shadow liquid as the piping 81 of replenisher, to the piping 83 of development processing apparatus B supply pure water, to development processing apparatus B Supply is piped 84 by the new liquid of the new liquid of the modulating device E developer solution modulated；It is arranged respectively in these pipings and by dense Spend the control valve 41,43,44 and flow quantity recorder 151,153,154 of managing device A control.
In Fig. 2, the new liquid of the developer solution supplied as replenisher is used the developer solution as its raw material by modulating device E Stoste and pure water automatically modulate and supplied.Modulating device E is connected with piping 84 with development processing apparatus B via new liquid It connects.New liquid piping 84 has control valve 44 and flow quantity recorder 154.
In addition, in fig. 2 it is shown that the side of developer solution stoste is supplied from developer solution stoste hold-up vessel 91 by delivery pump 77 Formula.The conveying of liquid is not limited to the method pressurizeed using gas, can also be carried out by delivery pump.
In addition, the structure of concentration management device A and development processing apparatus B about developer solution, movement, implement with first Mode is identical, therefore omits its repeat description.
Modulating device E mainly has the new liquid preparation vessel 301 of the new liquid of modulation developer solution, stores the new liquid modulated in advance New liquid storagetank 302 and control device (such as computer) 331 that the movement of modulating device E is controlled.Modulation dress E is set to connect via developer solution stoste supplying tubing 86 with developer solution stoste hold-up vessel 91.Developer solution stoste is stored and is held For device 91, a shared appearance is portrayed as by the container connecting with modulating device E and with the development processing apparatus B container connecting Device, but can also prepare respectively.In addition, modulating device E is connect with pure water supplying tubing 87.
New liquid preparation vessel 301 is connect via developer solution stoste supplying tubing 86 with developer solution stoste hold-up vessel 91, from And receive the supply of the stoste of developer solution.New liquid preparation vessel 301 is connect with pure water supplying tubing 87, to receive the confession of pure water It gives.In developer solution stoste supplying tubing 86 and pure water supplying tubing 87 equipped with control valve 341,342.Control valve 341,342 By 331 control action of control device.In addition, in developer solution stoste supplying tubing 86 equipped with for conveying the defeated of developer solution stoste Send pump 78.
New liquid preparation vessel 301 has densimeter 311 and liquid level meter 312.Densimeter 311 and liquid level meter 312 respectively via Signal wire 351,352 and connect with control device 331, and by concentration information, the liquid level position of the new liquid preparation vessel 301 determined Information is sent to control device 331.In addition, new liquid preparation vessel 301 and new liquid storagetank 302 are connected by communicating pipe 380.Newly Liquid storagetank 302 has liquid level meter 322.Liquid level meter 322 is connect by signal wire 353 with control device 331, by new liquid storagetank 302 liquid level position information is sent to control device 331.New liquid storagetank 302 can also be further provided with densimeter.
When modulating the new liquid of developer solution, suitably the movement of control valve 341 and 342 is controlled using control device 331 System, stoste, pure water to new liquid preparation vessel 301 supply developer solution.In new liquid preparation vessel 301, by the stoste of developer solution with it is pure Water mixing, and modulate the developer solution of normal concentration.Densimeter 311 monitors that is modulated in new liquid preparation vessel 301 shows always The concentration of shadow liquid.
To the concentration of new liquid preparation vessel 301 monitored as a result, for example, the concentration in the developer solution modulated is diluter When, the control valve 342 for being provided to pure water supplying tubing 87 is closed using control device 331, therefore, the confession of the stoste of developer solution To relative increase, the concentration of the developer solution in new liquid preparation vessel 301 rises.In addition, for example, the developer solution modulated concentration When denseer, the control valve 341 for being provided to developer solution stoste supplying tubing 86 is closed using control device 331, is diluted by pure water The concentration of developer solution in new liquid preparation vessel 301.Control device 331 makes to modulate in new liquid based on the concentration information of densimeter 311 The developer solution that slot 301 modulates becomes defined concentration.
When liquid level position in new liquid preparation vessel 301 is lower than defined lower limit value, control device 331 opens control valve 341,342, and increase developer solution stoste and the supply amount of pure water, realize the recovery of liquid level position.In new liquid preparation vessel 301 Liquid level position be higher than defined upper limit value when, control device 331 close control valve 341 and 342, to stop developer solution stoste And the supply of pure water.Liquid level position about new liquid storagetank 302 is also the same.The liquid level of two slots by will the new liquid that modulate to Development processing apparatus B is supplied and is reduced.Control device 331 is adjusted based on the liquid level position information of liquid level meter 312,322 to control The liquid measure of the developer solution of system, so that the liquid level position of two slots is in the range of regulation.
The circulating pump 371 that a part of developer solution in new liquid preparation vessel 301 is provided to circulation line 381 take out and again Secondary return, thus by circulation stirring.Similarly, part of it is provided to circulation pipe to developer solution in new liquid storagetank 302 The circulating pump 372 on road 382 takes out and again returns to, thus by circulation stirring.
It is conveyed by communicating pipe 380 to new liquid storagetank 302 in the developer solution that new liquid preparation vessel 301 modulates.According to new The case where liquid measure of developer solution in liquid storagetank 302 is reduced, the developer solution in new liquid preparation vessel 301 are stored to new liquid naturally Slot 302 conveys.Communicating pipe 380 has internal diameter appropriate and length, and having makes the concentration change in new liquid preparation vessel 301 not to new The effect of the level for the concentration change that liquid storagetank 302 affects.
The new liquid for being stored in the developer solution in new liquid storagetank 302 is piped under the action of delivery pump 373 via new liquid 84 convey to development processing apparatus B.At this point, being supplied using 154 Duis of flow quantity recorder that are provided to new liquid piping 84 new The integrated flow of liquid is measured.New liquid is connect via signal wire 354 with control device 331 with the control valve 343 of piping 84, is controlled 343 controlled device of valve, 331 control action processed.In the new liquid for the developer solution that conveying modulates, control device 331 makes control valve 343 open.
For example, control device 331 is connect with development processing apparatus B in advance.In this case, it is filled from development treatment When setting B and having received new liquid supply request signal, control device 331 can be such that control valve 343 opens.In addition, if in advance will development The concentration management device A of liquid is connect with control device 331, then feeds new liquid as supplement in the concentration management device A of developer solution It the opportunity of liquid, also can be from modulating device E to the new liquid of development processing apparatus B supply developer solution.In this case, due to New liquid has control valve 44 with piping 84, therefore also can be omitted control valve 343.
The developing system of the substrate of present embodiment shown in Fig. 2 only illustrates.Present embodiment has Development processing apparatus, the concentration management device of developer solution, modulating device and flow quantity recorder substrate developing system It is not limited to which.
In the developing system of the substrate of second embodiment, the concentration management of developer solution, substrate also can be realized Producer is able to use the developer solution being managed always as optimum state and carries out development treatment to substrate.At this point, using supplying To replenisher piping 81,83, new liquid measure supplied benefit with the flow quantity recorder 151,153,154 being equipped in piping 84 The integrated flow of filling liquid.Due to measure replenisher integrated flow, can the supply amount based on replenisher and reasonably calculate expense With.
(third embodiment)
Fig. 3 is for illustrating the concentration management device A for having developer solution of present embodiment, development processing apparatus B, regeneration The schematic diagram of the developing system of the substrate of device F and flow quantity recorder 151,152,153,155.
In Fig. 3, the developer solution in development processing apparatus B after use is regenerated as to recycle by regenerating unit F.By Regenerated liquid after regenerating unit F regeneration is supplied as one of replenisher to development processing apparatus B.Regenerating unit F is via regeneration Liquid is connect with piping 85 with development processing apparatus B.Regenerated liquid piping 85 has control valve 45 and flow quantity recorder 155.
In addition, the concentration management device A of the developer solution of Fig. 3 is that have control valve in the concentration management device A of developer solution 41,42,43,45, piping 81,82,83 and the regenerated liquid mode for being piped 85.In addition, about developer solution stoste hold-up vessel 91 and the new liquid hold-up vessel 92 of developer solution in the same manner as first embodiment conveyed and being pressurizeed using nitrogen The mode of the new liquid of the stoste and developer solution of developer solution.
It should be noted that depicting flow quantity recorder 151,152,153,155 in Fig. 3 and being provided in concentration management dress The mode of the outside of A is set, however, it is not limited to this.It can also be in the same manner as control valve 41,42,43,45, by flow quantity recorder 151, it 152,153,155 is provided in concentration management device A as its internal part.
In addition, the structure of concentration management device A and development processing apparatus B about developer solution, movement, implement with first Mode is identical, therefore omits its repeat description.
Regenerating unit F mainly has: the developer solution removal after using does not need substance and carries out to developer solution regenerated Filter 461,462,463；The regenerated liquid storagetank 493 of storage regenerated liquid in advance；And the control of the movement of control regenerating unit F Device (such as computer) 431 processed.Regenerating unit F via use finish developer solution conveying piping 88 and with for storing from development The use that processing unit A discards the developer solution of (discharge) finishes the connection of developer solution hold-up vessel 99.It is defeated that developer solution is finished in use Delivery pipe 88 is equipped with delivery pump 76, is transported to regenerating unit F using the developer solution finished in developer solution hold-up vessel 99.
Filter 461,462,463 finishes developer solution conveying piping 88 with use and connect, to discarded from development processing apparatus B The developer solution of (discharge) is conveyed.Filter 461,462,463 will not need substance, for example in developer solution in developer solution The removal such as resist residue of suspension.Developer solution after being regenerated by filter 461,462,463 is stored in regenerated liquid storagetank 493。
Be stored in the regenerated liquid of regenerated liquid storagetank 493 under the action of delivery pump 471 by control valve 441 to will regenerate The regenerated liquid that device F is connect with development processing apparatus B 85 conveying of piping, and filled with piping 85 to development treatment via regenerated liquid Set B conveying.At this point, utilizing the accumulative stream of the 155 pairs of regenerated liquids supplied of flow quantity recorder for being provided to regenerated liquid pipeline 85 Amount is measured.
Control valve 441 and delivery pump 471 are connect by signal wire 451,452 with control device 431 respectively.Control valve 441 and 471 controlled device of delivery pump, 431 control action.When conveying regenerated liquid, control device 431 drive delivery pump 471 and Open control valve 441.
For example, control device 431 is connect with development processing apparatus B in advance.In this case, it is filled from development treatment Set B have received regenerated liquid supply request signal when, control device 431 can make control valve 441 open.In addition, if will show in advance The concentration management device A of shadow liquid is connect with control device 431, then feeds regenerated liquid conduct in the concentration management device A of developer solution The opportunity of replenisher also can supply regenerated liquid from regenerating unit F to development processing apparatus B.In this case, due to again Raw liquid has control valve 45 with piping 85, therefore also can be omitted control valve 441.
The developing system of the substrate of present embodiment shown in Fig. 3 only illustrates.Present embodiment has Development processing apparatus, the concentration management device of developer solution, regenerating unit and flow quantity recorder substrate developing system It is not limited to which.
In addition, for making the regenerated principle of developer solution be not limited to the filtering based on filter.For example, can replace base In the filtering of filter, and use partial crystallization, electrolysis, UF membrane etc..It is expected that according to medical fluid, the property for not needing substance that should be separated Deng appropriate to use the equipment based on suitable principle.
In addition, depicting the mode connected side by side there are three filter, but the number of filter is not limited in Fig. 3 In three.It may be one.Filter changes with time and blocks sometimes due to using, accordingly, it is considered to till that time Maintenance the case where, it is expected that being equipped with multiple filters side by side.
In the developing system of the substrate of third embodiment, the concentration management of developer solution, substrate also can be realized Producer is able to use the developer solution being managed always as optimum state and carries out development treatment to substrate.At this point, using supplying Piping 81,82,83 and regenerated liquid to replenisher are counted with the flow quantity recorder 151,153,153,155 being equipped in piping 85 Survey the integrated flow of supplied replenisher.It, can be based on the supply of replenisher due to measuring the integrated flow of replenisher It measures and reasonably calculates expense.
It should be noted that, although respectively illustrating the development for having the substrate of modulating device E in this second embodiment Processing system and have in the third embodiment regenerating unit F substrate developing system but it is also possible to be have adjust The structure of both device E and regenerating unit F processed.
(the 4th embodiment)
Fig. 4 is for illustrating the concentration management device A for having developer solution of present embodiment and the base of development processing apparatus B The schematic diagram of the developing system of plate.The concentration management device A of the developer solution of the developing system of substrate shown in Fig. 4 shows Out configured with control valve 41,42,43, the piping 81,82,83 of replenisher supply in the concentration management device A of developer solution Mode.But is not limited thereto, be also possible to control valve 41,42,43, piping 81,82,83 be present in the concentration of developer solution Mode other than managing device A.As long as control mechanism 3 and control valve 41,42,43 are got in touch with, so as to control valve 41, 42,43 movement is controlled and feeds replenisher to developer solution.
The concentration management device A of developer solution involved in 4th embodiment and the developing system of substrate are to utilize Obtain relatively better corresponding relationship (straight line between absorbing carbon dioxide concentration and the density value of developer solution in developer solution Relationship) (referring to Fig. 1 of patent document 2.) this principle, the absorbing carbon dioxide based on the density value or calculating that determine is dense Angle value is managed the absorbing carbon dioxide concentration of developer solution by the supply of replenisher.It should be noted that about development The structure same as the first embodiment of processing unit A, replenisher reservoir C etc., the description thereof will be omitted sometimes.
Measuring means 1 has: sampling pump 14；First detector 11, the second detector 12 and third detector 13 are (sometimes First detector 11, the second detector 12 and third detector 13 are referred to as characteristic value testing agency)；And for that will sample Temperature is adjusted to the thermostat (not shown) etc. of defined measuring temperature (such as 25 DEG C) to developer solution afterwards before the assay.
Only measured by measuring means 1 density can in the case where, for example, having density as the first detector 11 Instrument does not need the detector (such as 12,13) for measuring other characteristic values.However, the composition measurement of alkaline-based developer is most Not only to measure the concentration of absorbing carbon dioxide concentration, also measurement alkali composition, being dissolved in the photoresist concentration of developer solution.Cause This, in Fig. 4, describing further includes other inspections required in order to measure alkali composition concentration, dissolution photoresist concentration etc. Survey the characteristic value testing agency 11,12,13 including device.One of them is densimeter.It is filled in the concentration management of developer solution below It sets in the explanation of A, the detector 11 in the characteristic value testing agency 11,12,13 of Fig. 4 is set as densimeter.
Arithmetical organ 2 have according to the density value that determines and using the density of developer solution and absorbing carbon dioxide concentration it Between corresponding relationship and calculate the computing module 24 of absorbing carbon dioxide concentration value.Developer solution is pre-entered to computing module 24 Corresponding relationship between density and absorbing carbon dioxide concentration.Computing module 24 has the density value according to the developer solution determined To find out the function of corresponding absorbing carbon dioxide concentration value.
In addition, arithmetical organ 2 can also have the constituent concentration progress to other developer solutions other than absorbing carbon dioxide The computing module of calculating.Alkali composition concentration, dissolution photoresist concentration e.g. using multiple-regression analysis to developer solution The computing module etc. calculated.
Next, being illustrated to the component concentration measuring method realized of the concentration management device A based on developer solution.Measurement Mechanism 1 is connect by sampling piping 15 with developer solution storagetank 61.Developer solution is transported to measuring machine by sampling pump 14 In structure 1.It is transported to the developer solution of measuring means 1 and defined measuring temperature (such as 25 is adjusted to by temperature in thermostat first ℃).Densimeter 11 is measured the density of developer solution.Other detectors 12,13 also respectively carry out the characteristic value of developer solution Measurement.Developer solution after measurement is discharged to outside the concentration management device A of developer solution from return piping 16 and is back to developer solution storage Deposit slot 61.
Densimeter 11 is connect by signal wire 51 with the computing module 24 of arithmetical organ 2.It is determined by densimeter 11 The density value of developer solution is sent via signal wire 51 to computing module 24.
Detector 12,13 is connect by signal wire 52,53 with arithmetical organ 2.The development determined by detector 12,13 The characteristic value of liquid is sent via signal wire 52,53 to arithmetical organ 2.
The computing module 24 for receiving the determination data of the density value of developer solution is calculated aobvious based on the determination data of density The absorbing carbon dioxide concentration of shadow liquid.The absorbing carbon dioxide concentration of developer solution uses the density and absorbing carbon dioxide of developer solution Corresponding relationship between concentration and calculate.That is, according to the corresponding relationship between the density of developer solution and absorbing carbon dioxide concentration, Absorbing carbon dioxide concentration value corresponding with the density value of the developer solution determined is obtained, and is set to the absorption two of developer solution Aoxidize the measured value of concentration of carbon.
So, the concentration management device A of the developer solution of present embodiment can be based on the measurement of the density of developer solution Value and the absorption titanium dioxide that developer solution is measured according to the corresponding relationship between the density of developer solution and absorbing carbon dioxide concentration Concentration of carbon.
It should be noted that arithmetical organ 2 calculates absorbing carbon dioxide concentration in addition to having according to the measured value of density Computing module 24 other than, can also have the alkali composition concentration to developer solution, the dissolution other compositions such as photoresist concentration The computing module that concentration is calculated.So, alkali composition concentration, the dissolution photoresist concentration of developer solution can be measured And absorbing carbon dioxide concentration.
The density value of developer solution that determines and according to the density of developer solution and dioxy is being absorbed based on densimeter is used Change concentration of carbon between corresponding relationship come realize control developer solution absorbing carbon dioxide concentration concentration management when, it is not necessary to Calculate the absorbing carbon dioxide concentration of developer solution.It, also can be so that aobvious even if not calculating the absorbing carbon dioxide concentration of developer solution The absorbing carbon dioxide concentration of shadow liquid becomes defined management value or defined management value mode below is controlled.
As shown in Fig. 1 of patent document 2, it is known that exist between the density and absorbing carbon dioxide concentration of developer solution good Corresponding relationship (if absorbing carbon dioxide concentration increase density also increased linear relation).It therefore, can be according to the correspondence The defined management that relationship obtains with absorbing carbon dioxide concentration is worth the management value of corresponding density.Therefore, so that developer solution The control that the mode that absorbing carbon dioxide concentration becomes defined management value carries out with so that the density of developer solution as corresponding The control that the mode of defined density value carries out is identical.So that the absorbing carbon dioxide concentration of developer solution becomes defined management value The control that mode below carries out with by make the density of developer solution become corresponding defined density value it is below in a manner of carry out It controls identical.Thus, calculated according to the density value of the developer solution determined developer solution absorbing carbon dioxide concentration this Mode is not when controlling the absorbing carbon dioxide concentration of developer solution for below defined management value or defined management value It is necessary.
This means that the arithmetical organ 2 of Fig. 4, computing module 24 can also be not provided with.In this case, densimeter 11 is logical It crosses determination data signal wire 51 and is connect with control mechanism 3.The measurement number of the density of the developer solution determined by densimeter 11 According to being sent directly to control mechanism 3.
Control mechanism 3 has control module 32, and the control module 32 is based on the absorbing carbon dioxide calculated by arithmetical organ 2 Concentration, by make the absorbing carbon dioxide concentration of developer solution become defined management value or management value it is below in a manner of to developer solution It feeds replenisher and is controlled.It is managed by the absorbing carbon dioxide concentration of developer solution by the density of corresponding developer solution In the case where, control module 32 be set with the corresponding relationship between the density based on developer solution and absorbing carbon dioxide concentration and The management of the absorbing carbon dioxide concentration of decision is worth the management value of corresponding density.Control mechanism 3 is calculated according to by arithmetical organ 2 Developer solution absorbing carbon dioxide concentration or the developer solution received from densimeter 11 density measured value and carry out such as Lower control.
So that the absorbing carbon dioxide concentration of developer solution becomes defined management value or becomes corresponding defined close In the case that the mode of the management value of degree is managed, following management is carried out.That is, so that the absorption dioxy of the developer solution calculated Changing concentration of carbon value becomes defined management value or becomes the density value of the developer solution determined and absorbing carbon dioxide concentration Management be worth corresponding density management value mode to developer solution feed replenisher.If without concentration management, developer solution It is intended to absorbing carbon dioxide and increases absorbing carbon dioxide concentration and density, in consideration of it, for the replenisher to be fed For, feed the replenisher to play a role in a manner of the absorbing carbon dioxide concentration of dilute development liquid.
So that the gas concentration lwevel of developer solution becomes defined management value or less or becomes corresponding defined close In the case that the management value mode below of degree is managed, following management is carried out.That is, due to the density and absorption of developer solution Corresponding relationship between gas concentration lwevel is the relationship being increased monotonically, therefore so that the density value of the developer solution determined becomes The management value mode below for being worth corresponding density with the management of absorbing carbon dioxide concentration feeds replenisher to developer solution.For For the replenisher to be fed, the replenisher to play a role in a manner of the absorbing carbon dioxide concentration of dilute development liquid is fed i.e. It can.
Here, " defined management value " refers to, absorbing carbon dioxide when optimal developing performance is played as developer solution Concentration value and the management value known in advance.Such as it is commented to be formed in line width, the residual film thickness of substrate by development treatment It is the suction for referring to the developer solution for making these line widths, residual film thickness become desired optimum value when the liquid properties of valence developer solution Receive carbon dioxide concentration value.It is in the following description and identical.
The management of absorbing carbon dioxide concentration as developer solution, for example, using 2.38%TMAH as developer solution In the case where aqueous solution, the absorbing carbon dioxide concentration preferred administration of developer solution be 0.40 (wt%) below.It more preferably manages and is 0.25 (wt%) is below.
Stoste or new liquid, pure water as the replenisher fed to developer solution, such as with developer solution etc..These replenishers Absorbing carbon dioxide concentration for dilute development liquid.These replenishers may be manage developer solution alkali composition concentration, It dissolves photoresist concentration and is fed.
Flow quantity recorder 151,152,153 is equipped in the piping 81,82,83 of replenisher supply.Flow quantity recorder 151, 152, the integrated flow of the replenisher of 153 pairs of pipings 81,82,83 via replenisher supply and supply measures.It can Integrated flow based on the replenisher measured and reasonably calculate expense.
It should be noted that the developing system about substrate shown in Fig. 4, although not recording the modulation of developer solution The regenerating unit of device and developer solution is but it is also possible to be in the regenerating unit of modulating device and developer solution with developer solution Either or two sides structure.The structure of the regenerating unit of modulating device and developer solution about developer solution, respectively with Second embodiment and third embodiment are common, and the description thereof is omitted.
(the 5th embodiment)
Fig. 5 is for illustrating the concentration management device A for having developer solution of present embodiment and the base of development processing apparatus B The schematic diagram of the developing system of plate.The concentration management device A of the developer solution of the developing system of substrate shown in fig. 5 has Standby internal part of the control valve 41,42,43 as the concentration management device A of developer solution.Control mechanism 22 and control valve 41,42, 43 contacts, so as to be controlled the movement of control valve 41,42,43 and feed replenisher to developer solution.Control valve 41,42,43 are also possible to be present in the mode other than the concentration management device A of developer solution.It should be noted that at about development The structure same as the first embodiment of device B, replenisher reservoir C etc. are managed, the description thereof will be omitted sometimes.
The invention of the developing system of the concentration management device A and substrate of developer solution involved in 5th embodiment People assumes the case where carrying out the management as the TMAH aqueous solution of developer solution, makes to dissolve photoresist concentration, absorbs titanium dioxide Concentration of carbon various change, so as to find out the opposite of the developer solution in the dissolution photoresist concentration and absorbing carbon dioxide concentration Relationship between the developing performance of photoresist and the conductivity values of developer solution.
Inventor modulates absorbing carbon dioxide concentration of sening as an envoy to and changes between 0.0~1.3 (wt%) and make to dissolve photic anti- Agent concentration is lost in 0.0~0.40 (wt%) (being equivalent to the absorbance 0.0~1.3 (abs) under wavelength 560nm) (hereinafter, sometimes same Be denoted as concentration and absorbance together to sample) between change resulting TMAH aqueous solution developer solution sample.Inventor is directed to this A little samples have carried out following experiment: the conductivity, absorbing carbon dioxide concentration and dissolution photoresist for measuring developer solution are dense Degree, and confirm related between developing performance and conductivity, absorbing carbon dioxide concentration and dissolution photoresist concentration components Property.Absorbing carbon dioxide concentration is arranged vertical or horizontally as a project and will dissolve photoresist concentration by production Matrix made of transversely or longitudinally being arranged as sundry item (combination table).According to absorbing carbon dioxide concentration and dissolution light Each combination of resist concentration is caused, meets the developer solution of the defined developing performance relative to photoresist to find out and leads Electric rate, and it is included in each column, complete matrix.
Here, defined developing performance refers to development when realizing the line width to be realized in developing procedure, residual film thickness The developing performance of liquid.
Exemplify the absorbing carbon dioxide concentration, dissolution photoresist concentration and conductivity of representative each sample Measurement result.Absorbing carbon dioxide concentration be 0.0 (wt%), dissolution photoresist concentration be that 0.0 (wt%) (is equivalent to 0.0 (abs)) in the case where (so-called new liquid), can play as defined in developing performance developer solution conductivity be 54.58 (mS/cm)。
In absorbing carbon dioxide concentration be 0.0 (wt%) and dissolution photoresist concentration is that 0.25 (wt%) (is equivalent to 0.8abs is suitable) in the case where, the conductivity that can play the developer solution of defined developing performance is 54.55 (mS/cm), molten In the case where photoresist concentration is solved as 0.40 (wt%) (being equivalent to 1.3abs), the conductivity of developer solution is 54.53 (mS/ cm)。
In addition, dissolution photoresist concentration be 0.0 (wt%) (being equivalent to 0.0 (abs)) and absorbing carbon dioxide it is dense In the case that degree is 0.6 (wt%), the conductivity of developer solution is 54.60 (mS/cm), is 1.3 in absorbing carbon dioxide concentration (wt%) in the case where, the conductivity of developer solution is 54.75 (mS/cm).
In addition, absorbing carbon dioxide concentration be 0.6 (wt%) and dissolution photoresist concentration be 0.22 (wt%) (phase When in 0.7abs) in the case where, the conductivity of developer solution is 54.60 (mS/cm), is 0.40 in dissolution photoresist concentration (wt%) in the case where (being equivalent to 1.3abs), the conductivity of developer solution is 54.58 (mS/cm).
In addition, absorbing carbon dioxide concentration be 1.3 (wt%) and dissolution photoresist concentration be 0.22 (wt%) (phase When in 0.7abs) in the case where, the conductivity of developer solution is 54.75 (mS/cm), is 0.40 in dissolution photoresist concentration (wt%) in the case where (being equivalent to 1.3abs), the conductivity of developer solution is 54.75 (mS/cm).
It should be noted that being found in above-mentioned experiment: in certain concentration range, if absorbing carbon dioxide concentration becomes Greatly, then the management value of conductivity is intended to become larger, if dissolution photoresist concentration becomes larger, the management value of conductivity is intended to Become smaller.
In above-mentioned experiment, the conductivity of the developer solution of each sample has used the value determined using conductivity meter.It inhales It receives gas concentration lwevel and has used the value determined using analysis by titration.Dissolution photoresist concentration has used weight modulation Value.Titration is using hydrochloric acid as the acid-base titration of titer reagent.As titration outfit, analytical technology company of Mitsubishi Chemical has been used The automatic titration device GT-200 of system.
It should be noted that above-mentioned conductivity, absorbing carbon dioxide concentration are to dissolve photoresist concentration for looking for Relevance between conductivity, absorbing carbon dioxide concentration and dissolution photoresist concentration and developing performance out, does not limit to In each numerical value.
As discussed above, it should be understood that being that can play the conductivity of developing performance according to absorbing carbon dioxide concentration and molten Solve photoresist concentration and it is various.In this way, in the management of developer solution, photic comprising absorbing carbon dioxide and dissolution In the developer solution of resist, by using conductivity as management value and measure absorbing carbon dioxide concentration and dissolution photoresist Concentration makes the management value of conductivity different based on each measurement result, and thus, it is possible to play defined developing performance.
That is, storage conductivity data (matrix), the conductivity data (matrix) is according to the dissolution photoresist of developer solution Agent concentration and absorbing carbon dioxide concentration are the concentration range of index and determination, and have confirmed to realize defined developability in advance The conductivity values of the developer solution of energy, by utilizing conductivity data (matrix), and can be realized can play defined developing performance Developer solution management.
The concentration management device A of developer solution has measuring means 1 and control mechanism 22.The concentration management device A of developer solution It is connect by sampling piping 15 and return piping 16 with developer solution storagetank 61.In addition, in fig. 5, it is shown that equipped with control The piping 81,82,83 of the replenisher supply of valve 41,42,43 processed is configured at the mode in the concentration management device A of developer solution, The piping 81,82,83 of replenisher supply is connect via interflow pipeline 89 with the circulation line 90 of circulation stirring mechanism D.
Measuring means 1 has sampling pump 14, the first detector 11, the second detector 12 and third detector 13 (sometimes First detector 11, the second detector 12 and third detector 13 are referred to as characteristic value testing agency).In present embodiment In, using the conductivity data that will be dissolved photoresist concentration and absorbing carbon dioxide concentration and be used as index, come Carry out the management of developer solution.Characteristic value testing agency 11,12,13 becomes conductivity meter, photoresist concentration is dissolved in measurement Measuring device (calculation function comprising calculating dissolution photoresist concentration according to detected characteristic value), measurement absorb Measuring device (the operation function comprising calculating absorbing carbon dioxide concentration according to detected characteristic value of gas concentration lwevel Can).
The measuring means 1 of the concentration management device A of present embodiment in each detector to include the ingredient to developer solution The mode that concentration carries out the function of operation illustrates, and however, it is not limited to this.The concentration management device A of present embodiment can also be with As the concentration management device A of first embodiment, concentration management device A has arithmetical organ, uses detection developer solution The characteristic value for the developer solution that each detector of characteristic value is determined is dense to dissolution photoresist concentration, absorbing carbon dioxide The constituent concentrations such as degree are calculated.
Control mechanism 22 has data store 23 and control unit 33.Data store 23 and control unit 33 are in control mechanism It is connected in 22 by signal wire 54.It is stored with conductivity data in data store 23, the conductivity data is according to show alkali Property developer solution dissolution photoresist concentration and absorbing carbon dioxide concentration be index and determination concentration range, have It confirmed to realize defined developing performance, developer solution to be used conductivity values in advance.
Control mechanism 22 is connected by signal wire 51,52,53 and the characteristic value testing agency 11,12,13 of measuring means 1 It connects.The conductivity values that are determined from measuring means 1, dissolution photoresist concentration value and absorbing carbon dioxide concentration value are by control Mechanism 22 processed is sent.
The control unit 33 of control mechanism 22 conveys matching for replenisher with set on to developer solution by signal wire 55,56,57 The control valve 41,42,43 of pipe 81,82,83 connects.
Next, being illustrated to the movement of the concentration management device A of the developer solution of present embodiment.
The developer solution sampled from developer solution storagetank 61 is conveyed into measuring means 1 and is adjusted by temperature.Later, develop Liquid is conveyed to characteristic value testing agency 11,12,13, to measure conductivity, dissolution photoresist concentration and absorb titanium dioxide Concentration of carbon.Each determination data is sent to control mechanism 22.
The management value of conductivity corresponding with the conductivity values of conductivity data, the conductivity are set in control unit 33 Data according to the dissolution photoresist concentration and absorbing carbon dioxide concentration using developer solution as index the concentration range of determination, Conductivity values with the developer solution that confirmed to realize defined developing performance in advance.Control unit 33 connects according to from measuring means 1 The determination data of receipts carries out control as follows.
Control unit 33 is based on asking from the received dissolution photoresist concentration of measuring means 1 and absorbing carbon dioxide concentration Be stored in out it is in the conductivity data of data store 23, according to the dissolution photoresist concentration that determines and determine The conductivity values of absorbing carbon dioxide concentration and the concentration range of determination.The conductivity values found out are set as to the conduction of developer solution The control target value of rate.
Control unit 33 by from the received conductivity determined of measuring means 1 be set as control target value conductivity into Row compares, and is managed as follows according to comparison result.That is, being set as controlling the conductivity of target value and the conduction determined In the identical situation of rate, substantially replenisher is not added to developer solution.In addition, being greater than in the conductivity for being set as controlling target value In the case where the conductivity determined, the benefit to play a role in a manner of the conductivity for improving developer solution can be fed to developer solution Filling liquid.In addition, can be mended to developer solution in the case where being set as controlling the conductivity of target value less than the conductivity determined Give to reduce the replenisher that the mode of the conductivity of developer solution plays a role.
Here, as the replenisher fed to developer solution, for example, stoste of developer solution or new liquid, pure water etc..
Control for supplying the control valve 41,42,43 of replenisher for example carries out as follows.When being opened to adjustment control valve The flow flowed through then by being managed to the time for opening control valve, and can feed the replenisher for needing the liquid measure fed. Control unit 33 based on from the received conductivity determined of measuring means 1 and be set as control target value conductivity, to control Valve processed sends control signal so that control valve opens the stipulated time, to flow through the replenisher for needing the liquid measure fed.
The mode of control, which can use, makes various control methods used in control amount and the consistent control of target value.Especially It is preferred proportion control (P control) (Proportional Control), integration control (I control) (Integral Control), differential control (D control) (Differential Control) and the control for being composed them (PI control (Proportional-Integral Control) etc.).More preferably applicable PID control.
In the present embodiment, although the description of following mode, however, it is not limited to this.Which is: measurement development Conductivity, dissolution photoresist concentration and the absorbing carbon dioxide concentration of liquid, will be according to the dissolution photoresist determined The conductivity values in preprepared conductivity data that agent concentration value and absorbing carbon dioxide concentration value determine are as control Target value processed feeds replenisher to developer solution in a manner of making the conductivity values of measured developer solution become the control target value And manage developer solution.
For example, being to know to develop near 2.38% in the concentration of alkali composition in the case where developer solution is TMAH aqueous solution The conductivity and alkali composition concentration of liquid are in the absorbance and dissolution light under the specific wavelength of good linear relation and developer solution Causing resist concentration is in good linear relation.
Therefore, in the range of obtaining such relationship, it can be realized and the conductivity of present embodiment is replaced into this leads Dissolution photoresist concentration is replaced by corresponding alkali composition concentration in the linear relation between electric rate and alkali composition concentration Under the corresponding specific wavelength in the linear relation between absorbance and dissolution photoresist concentration under the specific wavelength The concentration management of the developer solution of absorbance.That is, alkali composition concentration, the absorbance and absorption under specific wavelength of measurement developer solution Gas concentration lwevel, by the determination according to the absorbance value and absorbing carbon dioxide concentration value under the specific wavelength that determines Alkali composition concentration value in preprepared alkali composition concentration data is used as control target value, so that the developer solution measured The mode that alkali composition concentration value becomes the control target value feeds replenisher to developer solution and manages developer solution, such mode It is identical as the developer solution management of present embodiment.
According to the above, according to the present embodiment involved in developer solution concentration management device A, no matter developer solution at It, can be using the conductivity in developer solution to aobvious for what kind of dissolution photoresist concentration and absorbing carbon dioxide concentration Shadow liquid is managed, and thus maintains to act on development active ingredient, therefore be can be realized and can be maintained desired development Performance and the development treatment that desired line width and residual film thickness can be maintained.
In addition, the concentration management device A of developer solution involved according to the present embodiment, confirmed developability using preparatory Can developer solution conductivity values conductivity data and set control objective management value, even if thus the dissolution of developer solution is photic Resist concentration be 0.0~0.40 (wt%) (being equivalent to 0.0~1.3 (abs)) and absorbing carbon dioxide concentration be 0.0~ 1.3 (wt%), can be used as the developer solution with desired developing activity and use.That is, involved according to the present embodiment Developer solution managing device A, even if the dissolution photoresist concentration of developer solution be 0.25 (wt%) or more (be equivalent to 0.8 (abs)) and absorbing carbon dioxide concentration is 0.6 (wt%) or more, can not also discard developer solution and use, so as to Reduce the waste liquid amount of developer solution.
The piping 81,82,83 of replenisher supply is provided with flow quantity recorder 151,152,153.Flow quantity recorder 151, the integrated flow of the replenisher of 152,153 pairs of pipings 81,82,83 via replenisher supply and supply measures. Can the integrated flow based on the replenisher that this is measured and reasonably calculate expense.
It should be noted that the developing system about substrate shown in fig. 5, although not recording the modulation of developer solution Regeneration of the diagram of the regenerating unit of device and developer solution but it is also possible to be modulating device and developer solution with developer solution Either in device or the structure of two sides.The structure of the regenerating unit of modulating device and developer solution about developer solution, Common with second embodiment and third embodiment respectively, the description thereof is omitted.
More than, according to the present invention, substrate manufacture person without undertake the concentration management device for buying developer solution, modulating device, Regenerating unit or the burden that they maintain with management only pass through the concentration management expense of payment developer solution or showing for substrate Shadow processing cost, it will be able to using being managed as the developer solution of desired concentration, new liquid or regenerated liquid can be obtained and carried out It uses.Therefore, substrate manufacture person can enjoy with device buy or maintain to manage involved in the reduction of cost, developer solution The reduction of cost involved in allotment or liquid waste processing, the raising of the running rate of production line or yield rate, manufactured substrate The associated diversified economy advantage such as the raising of quality.
In addition, according to the present invention, ISP passes through the business method that can be realized by the present invention, with sale device Situation, which is compared, can obtain continuous and stable income.

Claims (12)

1. a kind of concentration management device of developer solution, wherein
The concentration management device of the developer solution has:
Measuring means, to Reusability and the constituent concentration of developer solution that shows alkalinity has the associated developer solution Multiple characteristic values are measured；
Arithmetical organ, by the multiple characteristic value determined by the measuring means and using multiple-regression analysis come based on Calculate the constituent concentration of the developer solution；
Control mechanism, the constituent concentration value based on the developer solution calculated by the arithmetical organ so that the developer solution at Divide concentration to become defined management value or defined management value mode below and supplies replenisher to the developer solution；And
Flow quantity recorder measures the integrated flow of the replenisher supplied by the control mechanism.
2. a kind of concentration management device of developer solution, wherein
The concentration management device of the developer solution has:
Densimeter；
Control mechanism, based on the density of the developer solution for showing alkalinity determined by the densimeter, according to the developer solution Density and absorbing carbon dioxide concentration between corresponding relationship so that the absorbing carbon dioxide concentration of the developer solution become rule Fixed management value or defined management are worth mode below and supply replenisher to the developer solution；And
Flow quantity recorder measures the integrated flow of the replenisher supplied by the control mechanism.
3. a kind of concentration management device of developer solution, wherein
The concentration management device of the developer solution has:
Measuring means to Reusability and shows the conductivity of alkaline developer solution, dissolves photoresist concentration and suction Gas concentration lwevel is received to be measured；
Control mechanism has data store and control unit, and the data store is stored with conductivity data, the conduction Rate data according to using the dissolution photoresist concentration and absorbing carbon dioxide concentration as index the concentration range of determination, Conductivity values with the developer solution that confirmed to realize defined developing performance in advance, the control unit will be stored in described It is in the conductivity data of data store, photic according to the dissolution of the developer solution determined by the measuring means The conductivity values conduct control target of the measured value of resist concentration and absorbing carbon dioxide concentration and the concentration range of determination Value supplies replenisher to the developer solution in a manner of making the conductivity of the developer solution become the control target value；And
Flow quantity recorder measures the integrated flow of the replenisher supplied by the control mechanism.
4. a kind of developing system of substrate, wherein
The developing system of the substrate has:
Development processing apparatus is handled substrate using developer solution；
The concentration management device of developer solution, management in the development processing apparatus developer solution of Reusability it is dense Degree；
Piping, connect, the supplement that will be supplied from the concentration management device to the developer solution with the development processing apparatus Liquid is delivered to the development processing apparatus；And
Flow quantity recorder is set to the piping,
The concentration management device has:
Measuring means, measurement and the constituent concentration of the developer solution have associated multiple characteristic values；
Arithmetical organ, by the multiple characteristic value determined by the measuring means and using multiple-regression analysis come based on Calculate the constituent concentration of the developer solution；And
Control mechanism, the constituent concentration value based on the developer solution calculated by the arithmetical organ so that the developer solution at Divide concentration to become defined management value or defined management value mode below and supplies replenisher to the developer solution.
5. the developing system of substrate according to claim 4, wherein
The developing system of the substrate is also equipped with:
The developer solution is modulated to new liquid by the modulating device of developer solution；And
New liquid piping, connect with the development processing apparatus and the modulating device, passes through the concentration management device The new liquid modulated by the modulating device is supplied to the developer solution of the Reusability in the development processing apparatus,
Equipped with flow quantity recorder in the new liquid piping.
6. the developing system of substrate according to claim 4, wherein
The developing system of the substrate is also equipped with:
The regenerating unit of developer solution, the developer solution after the use in the development processing apparatus is regenerated as can be sharp again Regenerated liquid；And
Regenerated liquid piping, connect with the development processing apparatus and the regenerating unit, is filled by the concentration management It sets and supplies to the developer solution of the Reusability in the development processing apparatus by the regenerated regenerated liquid of the regenerating unit,
Equipped with flow quantity recorder in regenerated liquid piping.
7. a kind of developing system of substrate, wherein
The developing system of the substrate has:
Development processing apparatus is handled substrate using developer solution；
The concentration management device of developer solution, management in the development processing apparatus developer solution of Reusability it is dense Degree；
Piping, connect, the supplement that will be supplied from the concentration management device to the developer solution with the development processing apparatus Liquid is delivered to the development processing apparatus；And
Flow quantity recorder is set to the piping,
The concentration management device has:
Densimeter；And
Control mechanism, based on the density of the developer solution determined by the densimeter, according to the density of the developer solution With the corresponding relationship between absorbing carbon dioxide concentration so that the absorbing carbon dioxide concentration of the developer solution become defined pipe Reason value or defined management are worth mode below and supply replenisher to the developer solution.
8. the developing system of substrate according to claim 7, wherein
The developing system of the substrate is also equipped with:
The developer solution is modulated to new liquid by the modulating device of developer solution；And
New liquid piping, connect with the development processing apparatus and the modulating device, passes through the concentration management device The new liquid modulated by the modulating device is supplied to the developer solution of the Reusability in the development processing apparatus,
Equipped with flow quantity recorder in the new liquid piping.
9. the developing system of substrate according to claim 7, wherein
The developing system of the substrate is also equipped with:
The regenerating unit of developer solution, the developer solution after the use in the development processing apparatus is regenerated as can be sharp again Regenerated liquid；And
Regenerated liquid piping, connect with the development processing apparatus and the regenerating unit, is filled by the concentration management It sets and supplies to the developer solution of the Reusability in the development processing apparatus by the regenerated regenerated liquid of the regenerating unit,
Equipped with flow quantity recorder in regenerated liquid piping.
10. a kind of developing system of substrate, wherein
The developing system of the substrate has:
Development processing apparatus is handled substrate using developer solution；
The concentration management device of developer solution, management in the development processing apparatus developer solution of Reusability it is dense Degree；
Piping, connect, the supplement that will be supplied from the concentration management device to the developer solution with the development processing apparatus Liquid is delivered to the development processing apparatus；And
Flow quantity recorder is set to the piping,
The concentration management device has:
Measuring means measures the conductivity, dissolution photoresist concentration and absorbing carbon dioxide concentration of the developer solution； And
Control mechanism has data store and control unit, and the data store is stored with conductivity data, the conduction Rate data according to using the dissolution photoresist concentration and absorbing carbon dioxide concentration as index the concentration range of determination, Conductivity values with the developer solution that confirmed to realize defined developing performance in advance, the control unit will be stored in described It is in the conductivity data of data store, photic according to the dissolution of the developer solution determined by the measuring means The conductivity values conduct control target of the measured value of resist concentration and absorbing carbon dioxide concentration and the concentration range of determination Value supplies replenisher to the developer solution in a manner of making the conductivity of the developer solution become the control target value.
11. the developing system of substrate according to claim 10, wherein
The developing system of the substrate is also equipped with:
The developer solution is modulated to new liquid by the modulating device of developer solution；And
New liquid piping, connect with the development processing apparatus and the modulating device, passes through the concentration management device The new liquid modulated by the modulating device is supplied to the developer solution of the Reusability in the development processing apparatus,
Equipped with flow quantity recorder in the new liquid piping.
12. the developing system of substrate according to claim 10, wherein
The developing system of the substrate is also equipped with:
The regenerating unit of developer solution, the developer solution after the use in the development processing apparatus is regenerated as can be sharp again Regenerated liquid；And
Regenerated liquid piping, connect with the development processing apparatus and the regenerating unit, is filled by the concentration management It sets and supplies to the developer solution of the Reusability in the development processing apparatus by the regenerated regenerated liquid of the regenerating unit,
Equipped with flow quantity recorder in regenerated liquid piping.
CN201711234540.6A 2017-05-26 2017-11-29 The concentration management device of developer solution and the developing system of substrate Pending CN108957967A (en)

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Application publication date: 20181207