CN207498515U - A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient - Google Patents

A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient Download PDF

Info

Publication number
CN207498515U
CN207498515U CN201721350705.1U CN201721350705U CN207498515U CN 207498515 U CN207498515 U CN 207498515U CN 201721350705 U CN201721350705 U CN 201721350705U CN 207498515 U CN207498515 U CN 207498515U
Authority
CN
China
Prior art keywords
heat block
fixed
heating unit
cage body
block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201721350705.1U
Other languages
Chinese (zh)
Inventor
尤晓磊
黄邦秋
肖延华
张�浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TIANHE LIGHT ENERGY (SUQIAN) TECHNOLOGY Co.,Ltd.
Original Assignee
Hefei Trina Solar Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hefei Trina Solar Technology Co Ltd filed Critical Hefei Trina Solar Technology Co Ltd
Priority to CN201721350705.1U priority Critical patent/CN207498515U/en
Application granted granted Critical
Publication of CN207498515U publication Critical patent/CN207498515U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Silicon Compounds (AREA)

Abstract

The utility model discloses a kind of thermal field structures for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient, are related to polycrystalline silicon ingot or purifying furnace technical field.Including heating unit, insulation cage body, silica crucible and graphite block;Heating unit includes the first heat block, the second heat block, third heat block, fixed plate and fixed column;One surface of fixed plate is fixed with several heating plates;Another surface of fixed plate is fixed with fixed column;One end of fixed column coordinates with insulation cage body;Insulation cage body inner surface is fixed with side heater;Having heaters is fixed on one surface of silica crucible;One surface of heater is fixed with several support columns;One surface of graphite block is provided with thermal insulation board;One surface of thermal insulation board is fixed with several graphite pillars.The utility model is by the effect of the first heat block of heating unit, the second heat block and third heat block, and the temperature gradient for solving existing crucible side and center is larger, during causing length brilliant the problem of defect proliferation.

Description

A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient
Technical field
The utility model belongs to polycrystalline silicon ingot or purifying furnace technical field, more particularly to a kind of polysilicon for adjusting temperature gradient The thermal field structure of ingot furnace.
Background technology
In fast-developing photovoltaic industry, crystal silicon cell occupies part of the overwhelming majority by its high efficiency and stability Volume, wherein polycrystal silicon cell have higher cost performance and competitive advantage with advantages such as its low cost, high efficiency, low light attenuations, because And become the photovoltaic cell that share maximum is occupied on Vehicles Collected from Market.
It is the main production process of current solar energy photovoltaic material using directional solidification method production solar energy polycrystalline silicon, more In crystal silicon ingot production process, polycrystalline silicon raw material in the silica crucible in existing ingot furnace is melted, is then reduced by temperature, Make melted silicon nucleating growth, form polycrystal silicon ingot.In the growth course of silicon ingot, the mode of heat-insulation cage is either lifted up, Or heat insulation bottom board, to the mode of decline, heat mainly scatters and disappears outward from the surrounding of heat-conducting block and center, but this radiating mode The temperature gradient that can cause crucible side and center is larger, and the silicon ingot crystals stress grown is larger, easily causes length Defect is proliferated during crystalline substance, silicon ingot cracking and a series of influence such as silicon chip fragment in slicing processes during evolution, this A little yield rates for significantly reducing ingot casting, increase production cost.
Utility model content
The purpose of this utility model is to provide a kind of thermal field structures for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient, pass through The effect of first heat block of heating unit, the second heat block and third heat block solves existing crucible side and center The problem of temperature gradient is larger, and defect is proliferated during causing length brilliant.
In order to solve the above technical problems, the utility model is achieved through the following technical solutions:
The utility model is a kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient, including heating unit, is protected The heat-insulated cage body of temperature, silica crucible and graphite block;
The heating unit includes the first heat block, the second heat block, third heat block, fixed plate and fixed column;It is described One surface of fixed plate is fixed with several heating plates;Several heating plates be built-in with respectively the first heat block, the second heat block and Third heat block;
Another surface of fixed plate is fixed with fixed column;Described fixed column one end is fixed with a disk;The fixed column The through hole of one end and insulation cage body coordinate;
The insulation cage body is half cage body structure;One surface of insulation cage body is provided with through hole;The guarantor Surface is fixed with side heater in warm heat-insulation cage body;
Silica crucible is placed with below the heating unit;The silica crucible is cylindrical structure;The silica crucible one Having heaters is fixed on surface;One surface of heater is fixed with several support columns;
One surface of graphite block is provided with thermal insulation board;One surface of thermal insulation board is fixed with several graphite pillars.
Further, the heating power difference of the first heat block of the heating unit, the second heat block, third heat block It is controlled by different systems.
Further, the heat block that several heating plates in the heating unit set several independent respectively;It is described The heating power of heat block is controlled respectively by different systems.
Further, the clearance distance of the first heat block of the heating unit and the second heat block is 50mm~200mm; Second heat block of the heating unit and the clearance distance of third heat block are 50mm~200mm.
Further, the heat block in the heating unit is arranged to adding on identical horizontal line according to different demands Heat block heating power is equal;Or the heat block heating power being arranged in identical heating plate is equal;Or it is arranged to each heat block Heating power all controlled by independent system;The heating unit can be adjusted according to different demands in ingot furnace Temperature gradient and temperature change.
The utility model has the advantages that:
1st, the utility model passes through the effect of the first heat block of heating unit, the second heat block and third heat block, tool The advantages of having the heating speed for adjusting ingot furnace and providing more stable temperature gradient, solves existing crucible side and center The problem of temperature gradient is larger, and defect is proliferated during causing length brilliant.
2nd, the utility model is according to different demands, it can be provided the heat block heating power phase on identical horizontal line Deng;Or the heat block heating power being arranged in identical heating plate is equal;Or be arranged to the heating power of each heat block by Independent system control;I.e. heating unit can be according to different demands, and the temperature gradient and temperature that adjust in ingot furnace become Change;There is the polycrystal silicon ingot that high quality, high finished product rate are produced with stable temperature gradient and more precise control.
3rd, the heating plate in heating unit can be replaced with heating annulus by the utility model according to different demands;Add Hot annulus is built-in with different heat blocks, and heat block is set according to different demands;The temperature in ingot furnace can be adjusted Gradient and temperature change;With the polycrystalline that high quality, high finished product rate are produced with stable temperature gradient and more precise control The advantages of silicon ingot.
Certainly, any product for implementing the utility model does not necessarily require achieving all the advantages described above at the same time.
Description of the drawings
In order to illustrate more clearly of the technical solution of the utility model embodiment, make required for being described below to embodiment Attached drawing is briefly described, it should be apparent that, the accompanying drawings in the following description is only some embodiments of the utility model, For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings Other attached drawings.
Fig. 1 is to disclose a kind of thermal field structure figure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient;
In attached drawing, parts list represented by the reference numerals are as follows:
1- heating units, 2- insulation cage bodies, 3- silica crucibles, 4- graphite blocks, 5- heaters, 101- first are heated Block, the second heat blocks of 102-, 103- third heat blocks, 104- fixed plates, 105- fixed columns, 106- heating plates, 107- disks, 201- through holes, 202- sides heater, 401- thermal insulation boards, 402- graphite pillars, 501- support columns.
Specific embodiment
The following is a combination of the drawings in the embodiments of the present utility model, and the technical scheme in the embodiment of the utility model is carried out It clearly and completely describes, it is clear that the described embodiments are only a part of the embodiments of the utility model rather than whole Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are without creative efforts The all other embodiment obtained, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be appreciated that term " trepanning ", " on ", " under ", " thickness ", " top ", " in ", " length ", " interior ", indicating positions or the position relationship such as " surrounding ", be for only for ease of description the utility model and simplification Description rather than instruction imply that signified component or element must have specific orientation, with specific azimuth configuration and behaviour Make, therefore it is not intended that limitation to the utility model.
Refering to Figure 1, the utility model is a kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient, packet Include heating unit 1, insulation cage body 2, silica crucible 3 and graphite block 4;
Heating unit 1 includes the first heat block 101, the second heat block 102, third heat block 103, fixed plate 104 and consolidates Fixed column 105;104 1 surface of fixed plate is fixed with four heating plates 106;Four heating plates 106 be built-in with respectively the first heat block 101, Second heat block 102 and third heat block 103;
104 another surface of fixed plate is fixed with fixed column 105;105 one end of fixed column is fixed with a disk 107;Fixed column 105 one end and the through hole 201 of insulation cage body 2 coordinate;
Insulation cage body 2 is half cage body structure;2 one surface of insulation cage body is provided with through hole 201;Insulation cage 2 inner surface of body is fixed with side heater 202;
1 lower section of heating unit is placed with silica crucible 3;Silica crucible 3 is cylindrical structure;3 one surface of silica crucible is fixed Having heaters 5;5 one surface of heater is fixed with two support columns 501;
4 one surface of graphite block is provided with thermal insulation board 401;401 1 surface of thermal insulation board is fixed with two graphite pillars 402.
Wherein, the heating power point of the first heat block 101 of heating unit 1, the second heat block 102, third heat block 103 It is not controlled by different systems.
Wherein, four heating plates 106 in heating unit 1 set three independent heat blocks respectively;The heating of heat block Power is controlled respectively by different systems.
Wherein, the clearance distance of the first heat block 101 of heating unit 1 and the second heat block 102 is 50mm~200mm; Second heat block 102 of heating unit 1 and the clearance distance of third heat block 103 are 50mm~200mm.
Wherein, the heat block in heating unit 1 is according to different demands, the heat block heating being arranged on identical horizontal line Power is equal;Or the heat block heating power being arranged in identical heating plate 106 is equal;Or it is arranged to the heating of each heat block Power is all controlled by independent system;Heating unit can according to different demands, adjust ingot furnace in temperature gradient and Temperature change.
Wherein, the heating plate 106 in heating unit 1 can also be replaced with heating annulus;Heating annulus is built-in with different Heat block, heat block are set according to different demands.
In the description of this specification, the description of reference term " one embodiment ", " example ", " specific example " etc. means At least one of the utility model is contained in reference to the embodiment or example particular features, structures, materials, or characteristics described In embodiment or example.In the present specification, schematic expression of the above terms be not necessarily referring to identical embodiment or Example.Moreover, particular features, structures, materials, or characteristics described can be in any one or more embodiments or example In combine in an appropriate manner.
The preferred embodiment in the utility model disclosed above is only intended to help to illustrate the utility model.Preferred embodiment is simultaneously There is no the details that detailed descriptionthe is all, it is only the specific embodiment also not limit the utility model.Obviously, according to this theory The content of bright book can make many modifications and variations.This specification is chosen and specifically describes these embodiments, is in order to preferably The principle and practical application of the utility model is explained, so as to which skilled artisan be enable to be best understood by and utilize this Utility model.The utility model is limited only by the claims and their full scope and equivalents.

Claims (3)

1. a kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient, it is characterised in that:Including heating unit (1), protect The heat-insulated cage body (2) of temperature, silica crucible (3) and graphite block (4);
The heating unit (1) includes the first heat block (101), the second heat block (102), third heat block (103), fixed plate (104) and fixed column (105);(104) one surface of fixed plate is fixed with several heating plates (106);Several heating plates (106) it is built-in with the first heat block (101), the second heat block (102) and third heat block (103) respectively;
Another surface of the fixed plate (104) is fixed with fixed column (105);Described fixed column (105) one end is fixed with a disk (107);One end of the fixed column (105) coordinates with the through hole (201) of insulation cage body (2);
The insulation cage body (2) is half cage body structure;(2) one surface of insulation cage body is provided with through hole (201); Insulation cage body (2) inner surface is fixed with side heater (202);
Silica crucible (3) is placed with below the heating unit (1);The silica crucible (3) is cylindrical structure;The quartz earthenware Having heaters (5) is fixed on (3) one surface of crucible;(5) one surface of heater is fixed with several support columns (501);
(4) one surface of graphite block is provided with thermal insulation board (401);(401) one surface of thermal insulation board is fixed with several graphite Pillar (402).
2. a kind of thermal field structure of polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient according to claim 1, which is characterized in that The first heat block (101) of the heating unit (1), the second heat block (102), third heat block (103) heating power point It is not controlled by different systems.
3. a kind of thermal field structure of polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient according to claim 1, which is characterized in that The first heat block (101) of the heating unit (1) and the clearance distance of the second heat block (102) are 50mm~200mm;It is described The second heat block (102) of heating unit (1) and the clearance distance of third heat block (103) are 50mm~200mm.
CN201721350705.1U 2017-10-19 2017-10-19 A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient Active CN207498515U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201721350705.1U CN207498515U (en) 2017-10-19 2017-10-19 A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201721350705.1U CN207498515U (en) 2017-10-19 2017-10-19 A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient

Publications (1)

Publication Number Publication Date
CN207498515U true CN207498515U (en) 2018-06-15

Family

ID=62501160

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201721350705.1U Active CN207498515U (en) 2017-10-19 2017-10-19 A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient

Country Status (1)

Country Link
CN (1) CN207498515U (en)

Similar Documents

Publication Publication Date Title
CN101775641B (en) Follow-up heat insulation ring thermal field structure for vertical oriented growth of polysilicon
CN102776554B (en) A kind of polycrystal silicon ingot and preparation method thereof and polysilicon chip
CN102289235B (en) Heating control system and method based on top separated control polycrystalline silicon ingot casting furnace
CN102162125B (en) Thermal field structure of polysilicon ingot casting furnace
CN102330148A (en) Polysilicon ingot casting method with low defect and high output and thermal field structure thereof
CN104195634B (en) Large scale silicon ingot polycrystalline ingot furnace thermal field structure
CN102108544A (en) Thermal field structure used in polycrystalline silicon ingot furnace for controlling crystal growth interface
RU2011101453A (en) SYSTEMS AND METHODS OF GROWING SINGLE CRYSTAL SILICON BARS BY DIRECTIONAL CURING
CN102140673A (en) Polycrystalline silicon ingot furnace heating device with separately controlled top and side
CN102877129A (en) Crystalline silicon and preparation method thereof
CN102242392A (en) Method for producing quasi-single crystal silicon with casting method and stabilizing crystal seed at furnace bottom after melting in ingot furnace
CN102477581A (en) Crucible platform for polycrystalline silicon ingot casting furnace
CN103628127A (en) DSS (directional solidification system) quasi-monocrystal silicon growth furnace and growth method of quasi-monocrystal silicon
CN202164380U (en) Thermal field structure of high-yield polycrystalline silicon ingot casting furnace
CN207498515U (en) A kind of thermal field structure for the polycrystalline silicon ingot or purifying furnace for adjusting temperature gradient
CN102242390B (en) Heating method for producing similar single crystal silicon ingot materials by using casting method
CN103849931A (en) Polycrystalline silicon ingoting process for bottom compensated boron element
CN104294358B (en) The preparation method and polycrystal silicon ingot of a kind of polycrystal silicon ingot
CN103628126A (en) Manufacturing method for monocrystalloid crystalline silica ingot and polysilicon ingot furnace
Yang et al. Single-step directional solidification technology for solar grade polysilicon preparation
CN202175745U (en) Heating control system of polycrystalline silicon ingot furnace based on separate control at the top
CN204111924U (en) A kind of large size silicon ingot polycrystalline ingot furnace Novel hot field structure
CN102912416A (en) Novel polycrystalline furnace heating device
CN202022993U (en) Heating device of polysilicon ingot furnace with split-control top
CN102242391B (en) Heater improvement apparatus in ingot furnace producing quasi-single crystal silicon with casting method

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20201224

Address after: 223800 Tianhe Road, Suqian Economic and Technological Development Zone, Suqian City, Jiangsu Province

Patentee after: TIANHE LIGHT ENERGY (SUQIAN) TECHNOLOGY Co.,Ltd.

Address before: 230000 Rainbow (Hefei) photovoltaic Co., Ltd. at the intersection of Kuihe road and Tushan Road, Xinzhan District, Hefei City, Anhui Province

Patentee before: HEFEI TRINASOLAR TECHNOLOGY Co.,Ltd.