CN207095577U - The used group device of the centrifugal 3 axis MEMS of nanometer grating - Google Patents
The used group device of the centrifugal 3 axis MEMS of nanometer grating Download PDFInfo
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Abstract
The used group device of the centrifugal 3 axis MEMS of nanometer grating, primary structure includes upper substrate, dynamic grating layer, determine grating layer, infrabasal plate, photodetector, detect beam, coupling block, mass, dynamic grating, boss, LASER Light Source, wire forms, photodetector is set in upper substrate, wire, dynamic grating layer sets support frame, center is provided with the mass of dynamic grating, detect beam, coupling block, determine grating layer setting and determine grating, LASER Light Source is set in infrabasal plate, wire, this device is without driving, the used group device has range big, it is simple in construction, orthogonal coupling error is small, the advantages of lateral error is small.
Description
Technical field
It the utility model is related to the used group device of the centrifugal 3 axis MEMS of nanometer grating, the related neck of category micro-inertial navigation technology
Domain.
Background technology
The conventional mode of inertial measurement cluster is strapdown and platform-type, and strapdown sensitivity improves and depends on each deviding device
The sensitivity of part improves, and assembling and design error can not meet microthrust test and the orthogonal assembling of micro-acceleration gauge on three axial directions, make
Modulate circuit complexity is high, debugging is difficult, it is platform-type due to volume be unfavorable for minimizing greatly it is integrated.
Micromechanical gyro main flow type of drive is to drive mass humorous by capacitor plate in the used group device of micromechanics at present
Shake, because processing has error so that gyro is unable to reach symmetry during initial design, mechanical couplings caused by structural failure
Output can be made to produce larger noise, and compensate the error brought by processing and be generally gauge outfit placement detection module, secondary circuit is defeated
Go out corresponding compensation, so bring huge difficult problem to secondary treatment circuit design, cost is higher.Resonant-type micro-mechanical optic fiber gyroscope is by outer
Portion vibrates or can make the output distortion of gyro when impacting, and does not occur solution in effective piece, the design microthrust test at present
Structure produces motion using centrifugal force driving mass, using micro-displacement caused by nanometer grating detection mass motion, uses
Difference output mode, orthogonal coupling error is effectively reduced, reduce as caused by mismachining tolerance series of noise and by outside
Distortion is exported caused by vibration or impact.
Nanometer grating detects to micro-displacement, has the advantages of high-resolution, low noise, its resolution ratio is up to femtometre
Level, Proof-Of Principle, the use nanometer that this patent proposes are obtained in displacement measurement and the acceleration transducer sensitive to displacement
The micro-inertia measuring component of Grating examinations, intend solving by the approach of principle innovation in micro- inertia component acceleration and it is faint from
Mental and physical efforts detect, it is contemplated that ratio of precision capacitance detecting mode formula is compared to one to two orders of magnitude of raising.
Utility model content
Purpose of utility model
The purpose of this utility model is aiming at the deficiency of background technology, and design is using the centrifugal used of nanometer grating detection
Group device, so that orthogonal coupling error, lateral error is greatly lowered, reduce by external vibration or impact caused by output distortion,
Detection resolving power is improved, makes detection data more accurate, reliable.
Technical scheme
The utility model primary structure by：Upper substrate, dynamic grating layer, determine grating layer, infrabasal plate, photodetector, used group
Sensitive mechanism, LASER Light Source composition；Upper substrate 1 is firmly bonded by upper substrate boss 5 and dynamic grating layer 2, and dynamic grating layer 2 passes through
Dynamic grating boss 6 is firmly bonded with determining the upper surface of grating layer 3, is determined the lower surface of grating layer 3 and is passed through infrabasal plate boss 7 with infrabasal plate 4
It is firmly bonded.
The upper substrate 1 is square, all around and centrally disposed photodetector 101,102,103, and is firmly bonded,
The positive pole of photodetector 101,102,103 by wire 101a, 102a, 103a draw, the negative pole of photodetector 101,102,103 by
Wire 101b, 102b, 103b.
The dynamic grating layer 2 is square, including sensitive mechanism 201,202, Z accelerometers 203, support frame 21, sensitive
Mechanism is connected firmly with support frame support frame, sensitive mechanism 201,202 include folded beam 205,206, mass 204, in
Centre is provided with the mass 204 of dynamic grating 200, and Z axis accelerometer sensitive mechanism 203 sets spring beam 2031,2032, center to be provided with
The mass 2033 of dynamic grating 2034.
It is described to determine grating layer 3 to be square, including determine grating 301,302,303,5 altogether, determine grating 301,302 and dynamic light
Grid 200 are correspondingly arranged, and are determined grating 303 and are correspondingly arranged with dynamic grating 2034.
The dynamic grating is generated with determining grating by dry etching technology.
For the infrabasal plate 4 to be square, material is silicon, in the upper surface of infrabasal plate 4 all around and center symmetric setting swashs
Radiant 1,402,403, and be firmly bonded, the positive pole of LASER Light Source 1,402,403 is drawn by wire 401a, 402a, 403a, laser
The negative pole of light source 1,402,403 is drawn by wire 401b, 402b, 403b.
Beneficial effect
The utility model has obvious advance compared with background technology, and this detection means is set using overall structure
The sensitive mechanism of meter, detection X, Y, Z axis angular speed and acceleration is integrated to be made in same support frame, reasonable in design,
It is adapted to the miniaturization of device；Using nanometer grating detection mode, mass is provided with dynamic grating in dynamic grating layer, moves grating face
In the grating of determining for determining to set in grating layer, resolving power is high, is not affected by temperature, and used group of device of the present utility model need not drive,
Orthogonal coupling error is small, and lateral error is small, and small, simple in construction, good reliability, easy monolithic collection are influenceed by extraneous vibration or impact
Into suitable for the attitude measurement of high speed rotating object.
Brief description of the drawings
Fig. 1 is the utility model overall structure diagram
Fig. 2 is the utility model entirety front view
Fig. 3 is the utility model upper substrate upward view
Fig. 4 is the utility model upper substrate structure schematic diagram
Fig. 5 is that the utility model moves grating layer top view
Fig. 6 is that the utility model moves grating layer structural representation
Fig. 7 is that the utility model determines grating layer top view
Fig. 8 is that the utility model determines grating layer structural representation
Fig. 9 is the utility model infrabasal plate top view
Figure 10 is the utility model lower substrate structure schematic diagram
Figure 11 is the utility model sensitive mechanism top view
Figure 12 is the utility model sensitive mechanism structural representation
Figure 13 is the utility model folded beam top view
Figure 14 is the utility model folded beam structural representation
Figure 15 is the utility model Z axis accelerometer sensitive mechanism top view
Figure 16 is the utility model Z axis accelerometer sensitive mechanism structure schematic diagram
Figure 17 is the utility model nanometer grating structural representation
Figure 18 is the utility model nanometer grating sectional view
Shown in figure, list of numerals is as follows：
1st, upper substrate, 2, dynamic grating layer, 3, determine grating layer, 4, infrabasal plate, 5, upper substrate boss, 6, move grating layer boss,
7th, infrabasal plate boss, 21, dynamic grating support frame, 101, first laser detector, 101a, first laser detector positive pole are led
Line, 101b, first laser detector cathode conductor, 102, second laser detector, 102a, second laser detector positive pole are led
Line, 102b, second laser detector cathode conductor, the 103, the 3rd laser detector, 103a, the 3rd laser detector positive pole are led
Line, 103b, the 3rd laser detector cathode conductor, 200, dynamic grating, the 201, first sensitive mechanism, the 202, second sensitive mechanism,
203rd, Z axis accelerometer sensitive mechanism, 204, mass, the 205, first folded beam, the 206, second folded beam, the 2031, first bullet
Property beam, the 2032, second spring beam, 2033, mass, 2034, dynamic grating, 2051, spring beam, 2052, coupling block, 301, first
Determine grating, 302, second determines grating, and the 303, the 3rd determines grating, and 401, first laser light source, 401a, first laser light source positive pole are led
Line, 401b, first laser light source cathode conductor, 402, second laser light source, 402a, second laser light source positive wire, 402b,
Second radiant cathode conductor, the 403, the 3rd LASER Light Source, 403a, the 3rd LASER Light Source positive wire, 403b, the 3rd laser light
Source cathode conductor, 61, dynamic grating grid, 62, determine grating grid, a, grating grid slit is moved, b, determine grating grid slit, c, light
Grid gap.
Embodiment
Embodiment of the present utility model is described below in detail, the example of the embodiment is shown in the drawings, wherein from beginning
Same or similar element is represented to same or similar label eventually or there is the element of same or like function.Below by ginseng
The embodiment for examining accompanying drawing description is exemplary, is only used for explaining the utility model, and it is not intended that to of the present utility model
Limitation.
In description of the present utility model, it is to be understood that term " " center ", " on ", " under ", "front", "rear",
The orientation or position relationship of the instructions such as "left", "right" are based on orientation shown in the drawings or position relationship, are for only for ease of and retouch
State the utility model and simplify and describe, rather than instruction or imply signified combination or element must have specific orientation, with
Specific azimuth configuration and operation, therefore it is not intended that to limitation of the present utility model.In addition, the utility model embodiment
During description, the device position relation such as " on ", " under ", "front", "rear", "left", "right" in all figures, using Fig. 1 as mark
It is accurate.
, it is necessary to illustrate in description of the present utility model, unless otherwise clearly defined and limited, term " phase
Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or be integrally connected；Can
To be mechanical connection or electrical connection；Can be joined directly together, can also be indirectly connected by intermediary, Ke Yishi
The connection of two element internals.For the ordinary skill in the art, with concrete condition above-mentioned term can be understood at this
Concrete meaning in utility model.
The utility model is described further below in conjunction with accompanying drawing：
As shown in figure 1, it is used to group device, three axle for the centrifugal 3 axis MEMS of nanometer grating provided by the utility model
The used group devices of MEMS determine grating layer 3 and an infrabasal plate 4 including the dynamic grating layer 2, one of a upper substrate 1, one, it is described on
Substrate 1, dynamic grating layer 2, determining grating layer 3 and infrabasal plate 4, lamination is set successively from top to bottom；
The used group device of the 3 axis MEMS is in integrally square build, but be not limited to square build；
As shown in Fig. 2 the specially described generally rectangle tabular structure, or square platy structure of upper substrate 1, this reality
Square platy structure is adopted as with new, and four corners of the upper substrate 1 towards prolonging on the side of dynamic grating layer 2 respectively
Upper substrate boss 5 is stretched out, the quantity of the upper substrate boss 5 is four, and the upper substrate boss 5 supports the upper substrate 11
In the dynamic upper side of grating layer 2；
The dynamic grating layer 2 is consistent with the global shape of the upper substrate 1, four corners tool of the dynamic grating layer 2
There is a dynamic grating support frame 21 extended downwardly, the position of the dynamic grating support frame 21 and the upper substrate boss 5 is mutual
It is corresponding；
As shown in Figure 3,4, the respectively schematic perspective view and front view of upper substrate 1, the infrabasal plate 4 and determines grating layer 3
It is consistent with the global shape of the upper substrate 1, the infrabasal plate four corners towards on the side for determining grating layer 3 respectively
Extend infrabasal plate boss 7, the infrabasal plate boss 7 and the dynamic position of grating support frame 21 are mutually corresponding, and it is described under
The quantity of substrate boss 7 is 4, and grating support frame 21 is moved in four corners for determining grating layer 3 corresponding to mutually simultaneously
And infrabasal plate boss 7 is in clamping shape, and it is fixed；
It is adhesively fixed in above-mentioned tie point or fixed point using surface；
The side of the upper substrate 1 towards dynamic grating 2 is provided with multiple laser detectors；
The side for determining grating 3 is provided with multiple LASER Light Sources in the infrabasal plate 4；
The quantity of the laser detector and the LASER Light Source is 5, is correspondingly arranged at the 3 axis MEMS respectively
At the surrounding of used group device and the opening position of middle, the laser that the LASER Light Source is launched pass sequentially through determine grating layer 3,
Dynamic grating layer 2, and received by the laser detector.
The laser detector of the upper substrate 1 includes the first laser detector 101 on two excessively central axial directions, and two
The individual first laser detector 101 is mutually correspondingly arranged in vertical direction, and is separately positioned on the centre bit of the avris of upper substrate 1
Put；
The laser detector also includes second laser detector 102, and two laser detectors 2 are in the horizontal direction
Mutually it is correspondingly arranged, and the company of the line of two second laser detectors 102 and two first laser detectors 101
Line is mutually perpendicular to；Two second laser detectors 102 are equally separately positioned on the center of the avris of upper substrate 1
Place, however the avris of the avris and first laser detector 101 intersect it is adjacent；
The laser detector also includes the 3rd laser detector 103, and the 3rd laser detector 103 is arranged on described
The middle position of the used group device of 3 axis MEMS；
The first laser detector 101 connects first laser detector positive wire 101a respectively, and first laser is visited
Device cathode conductor 101b is surveyed, the input and outgoing position are replaceable；
The second laser detector 102 connects second laser detector positive wire 102a respectively, and second laser is visited
Device cathode conductor 102b is surveyed, the input and outgoing position are replaceable；
3rd laser detector 3 connects the 3rd laser detector positive wire 103a, and the 3rd laser acquisition respectively
Device cathode conductor 103b, the input and outgoing position are replaceable；
As shown in Figure 5,6, the schematic perspective view and top view of respectively dynamic grating layer 2, the dynamic grating layer 2 it is any one
Organize and the first sensitive mechanism 201 is respectively arranged with relative both sides, and another set is sensitive with respect to being respectively arranged with second on both sides
Mechanism 202, the centre position setting Z axis accelerometer 203 of the grating layer 2, the four of the Z axis accelerometer 203
Periphery is connected with each other by second spring beam 2032 and first spring beam 2031, is fixed in the grating layer 2
Between position.
The quantity of the sensitive mechanism 202 of first sensitive mechanism 201 and second is two, and first sensitive mechanism
201 is relative up and down with the position of the first laser detector 101；Second sensitive mechanism 202 is visited with the second laser
The position for surveying device 102 is relative up and down.
As shown in Figure 7,8, the schematic perspective view and top view of grating layer 3 are respectively determined, it is described to determine any one of grating layer 3
First is respectively arranged with the relative both sides of group and determines grating 301, and another set determines grating with respect to being respectively arranged with second on both sides
302；The 3rd is set to determine grating 303 in the center for determining grating layer 3；
Described first to determine grating 301 and the second quantity for determining grating 302 be two, and described first determine grating 301 with
The position of first sensitive mechanism 201 is relative up and down, and described second determines the position of grating 302 and second sensitive mechanism 202
Put relative up and down.
As shown in Fig. 9,10, the respectively schematic perspective view and front view of infrabasal plate 4, the LASER Light Source of the infrabasal plate 4
Including the first laser light source 401 on two excessively central axial directions, two first laser light sources 401 are in vertical direction phase
Mutually it is correspondingly arranged, and is separately positioned on the center of the avris of infrabasal plate 4；The LASER Light Source also includes second laser light source
402, two LASER Light Sources are mutually correspondingly arranged in the horizontal direction, and the line of two second laser light sources 402
It is mutually perpendicular to the line of two first laser light sources 401；Two second laser light sources 2 are equally separately positioned on institute
State the center position of the avris of infrabasal plate 4, however the avris of the avris and first laser light source 1 intersect it is adjacent.
The LASER Light Source also includes the 3rd LASER Light Source 403, and the 3rd LASER Light Source 403 is arranged on the infrabasal plate
2 center position, it is understood that be in the line of the second laser light source 402 and two first laser light sources
The infall of 401 line；
The first laser light source 401 connects light source first laser light source positive wire 401a respectively, and light source first swashs
Radiant cathode conductor 401b, the input and outgoing position are replaceable；The second laser light source 402 connects light source respectively
Dual-laser light source positive wire 402a, and light source second laser light source cathode conductor 402b, the input and outgoing position can be put
Change；3rd LASER Light Source 403 connects the LASER Light Source positive wire 403a of light source the 3rd, and the LASER Light Source of light source the 3rd respectively
Cathode conductor 403b, the input and outgoing position are replaceable；
The first laser detector 101, the first sensitive mechanism 201, first corresponding to mutually determine grating 301 and first and swashed
Radiant 401 is on same vertical curve, is corresponded to up and down successively.
As shown in Figure 11,12, be the first sensitive mechanism 201 on the dynamic grating layer 2, the second sensitive mechanism 202 it is thin
Schematic diagram is saved, first sensitive mechanism 201, the second sensitive mechanism 202 include dynamic grating 200, and the dynamic grating 200 is set
On a mass 204, and it is specifically located on the center position of the mass 204, the mass is two about 204
End is connected on the dynamic grating layer 2 by the first folded beam 205 and the second folded beam 206 respectively；
Specially described dynamic grating 200 and upper and lower LASER Light Source, determine grating and photoelectric sensor is in same vertical curve
On；
The 3 axis MEMS is used to assembling and is set to centrifugal-type gyroscope structure chart, the first folded beam 205, the second folded beam 206 with
Mass 204 is connected firmly, the centrally disposed dynamic grating 200 of mass 204, and dynamic grating 200 is generated by dry etching technology.
Figure 13, it is folded beam structure chart shown in 14, the formation of being connected with coupling block 2052 of spring beam 2051 folds girder construction,
And different rigidity requirements can be repeatedly realized with serial or parallel connection, it is in parallel the characteristics of be fixing end that all single-beams have oneself
With the effect end of power；The characteristics of series connection is the effect end that all single-beams share a fixing end and a power.The length of coupling beam
Identical, total lateral dimension increase, stiffness coefficient become big；The lateral dimension of series connection is constant, and total length increase, stiffness coefficient becomes
It is small.
Figure 15, it is Z axis accelerometer sensitive mechanism structure figure, the center of the first spring beam 2031 and the second elasticity shown in 16
The outside of beam 2032 is connected firmly, and the inner side of the second spring beam 2032 is connected firmly with mass 2033, and the center of mass 2033 is set
Dynamic grating 2034, dynamic grating 2034 are generated by dry etching technology.
Figure 17, be optical grating construction figure shown in 18, dynamic grating is generated with determine grating by dry etching technology, dynamic grating and
Described determining is arranged in parallel above and below grating, i.e., each dynamic grating grid 61 of dynamic grating is located at respectively determines the top of grating grid 62,
Dynamic grating and determine grating and collectively form multiple slits, grating gap c less than first laser light source 401, second laser light source 402,
The optical wavelength of 3rd LASER Light Source 403, first laser light source 401, second laser light source 402, the 3rd LASER Light Source 403 and
One laser detector 101, second laser detector 102, the 3rd laser detector 103 positioned at dynamic grating and determine raster center respectively
Underface and surface.
Utility model principle is：
When gyro sensitivity is to X-axis turning rate input two dynamic gratings of front and rear part can be driven to move out, and by front and rear part
Two phototube detectors detect light intensity change, export a pair of difference mode signals.Meeting when gyro sensitivity arrives Y-axis turning rate input
Drive two dynamic gratings in left and right portion to move out, and light intensity change, output are detected by two photodetectors in left and right portion
A pair of difference mode signals.When gyro sensitivity arrives Z axis turning rate input, totally four sensitive-mass blocks in X-axis and Y-axis are by centrifugation masterpiece
Changed with moving out and detecting light intensity by four photodetectors in portion all around, export two pairs of difference mode signals.
Gyro sensitive mechanism sensitivity can drive two dynamic gratings in left and right portion to do in face in the same direction when being inputted to X-axis acceleration
Motion, and the light intensity detected by two photodetectors in left and right portion changes, and exports a pair of common-mode signals.Gyro sensitive mechanism
Sensitivity can drive two dynamic gratings of front and rear part to do in-plane moving in the same direction when being inputted to Y-axis acceleration, and by the two of front and rear part
The light intensity change that individual photodetector detects, exports a pair of common-mode signals.Used group device Z axis accelerometer sensitive mechanism is sensitive
The dynamic grating in center can be driven to do off-plane movement when being inputted to Z axis acceleration, and detected by centrally located electric explorer
Light intensity changes, output signal.It is to be appreciated that the girder construction that mass connection framework is formed can repeatedly reach reduction with inflection
Detect the purpose of the rigidity of girder construction.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " illustrative examples ",
The description of " example ", " specific example " or " some examples " etc. means to combine specific features, the knot that the embodiment or example describe
Structure, material or feature are contained at least one embodiment or example of the present utility model.In this manual, to above-mentioned art
The schematic representation of language is not necessarily referring to identical embodiment or example.Moreover, description specific features, structure, material or
Person's feature can combine in an appropriate manner in any one or more embodiments or example.
While there has been shown and described that embodiment of the present utility model, it will be understood by those skilled in the art that
These embodiments can be carried out with a variety of changes, modification in the case where not departing from principle and objective of the present utility model, replaced
And modification, the scope of the utility model are limited by claim and its equivalent.
Claims (6)
1. the used group device of the centrifugal 3 axis MEMS of nanometer grating, it is characterised in that the used group devices of the MEMS include：Upper substrate,
Dynamic grating layer, determine grating layer and infrabasal plate, the upper substrate, dynamic grating layer, determining grating layer and infrabasal plate, lamination is arranged successively；
The used group devices of the MEMS also include nanometer detection unit, and the nanometer detection element number is multiple, is arranged respectively
At avris and center；
The nanometer detection unit includes：Laser detector, move grating, determine grating and LASER Light Source, the laser detector,
Dynamic grating, determine grating and LASER Light Source is separately positioned on the upper substrate, moves grating layer, determines on grating layer and infrabasal plate, it is same
In individual nanometer grating detection unit, the laser detector, dynamic grating, grating is determined and LASER Light Source is placed on same vertical curve；
The dynamic grating is arranged on centroplasm gauge block and avris mass, and the avris mass is connected by folding girder construction
On the dynamic grating layer, the centroplasm gauge block is connected on the dynamic grating layer by spring beam.
2. the used group device of the centrifugal 3 axis MEMS of nanometer grating according to claim 1, it is characterised in that the upper substrate
Four corners towards upper substrate boss is each extended over out on the side of dynamic grating layer, the quantity of the upper substrate boss is four
Individual, the upper substrate is supported on the dynamic grating layer upper side by the upper substrate boss；
The laser detector of the upper substrate includes the first laser detector on two excessively central axial directions, two described the
One laser detector is mutually correspondingly arranged in vertical direction, and is separately positioned on the center of upper substrate avris；
The laser detector also includes second laser detector, and two laser detectors are mutually corresponding in the horizontal direction
Set, and the line of the line of two second laser detectors and two first laser detectors is mutually perpendicular to；Two
The individual second laser detector is equally separately positioned on the center position of the upper substrate avris；
The laser detector also includes the 3rd laser detector being arranged at upper substrate center；
The first laser detector connects the input lead of detector first, and the output lead of detector first respectively, described defeated
Enter and outgoing position is replaceable；
The second laser detector connects the input lead of detector second, and the output lead of detector second respectively, described defeated
Enter and outgoing position is replaceable；
3rd laser detector connects the input lead of detector the 3rd, and the output lead of detector the 3rd respectively, described defeated
Enter and outgoing position can replace.
3. the used group device of the centrifugal 3 axis MEMS of nanometer grating according to claim 2, it is characterised in that the dynamic grating
Layer is consistent with the global shape of the upper substrate, and four corners of the dynamic grating layer have the support frame extended downwardly,
The support frame and the position of the upper substrate boss are mutually corresponding；
Any one group of the dynamic grating layer is respectively arranged with the first sensitive mechanism, and another set with respect to both sides on relative both sides
On the Z axis accelerometer sensitive mechanism that is respectively arranged with the second sensitive mechanism and is arranged at dynamic grating layer center；
The quantity of first sensitive mechanism and the second sensitive mechanism is two, and first sensitive mechanism and described first
The position of laser detector is relative up and down；Second sensitive mechanism is relative up and down with the position of the second laser detector；
The Z axis accelerometer sensitive mechanism is relative up and down with the position of the 3rd laser detector.
4. the used group device of the centrifugal 3 axis MEMS of nanometer grating according to claim 3, it is characterised in that described to determine grating
First is respectively arranged with any one group of relative both sides of layer and determines grating, and another set on both sides with respect to being respectively arranged with second
Determine grating and be arranged on to determine the 3rd of grating layer center position and determine grating；
Described first to determine grating and the second quantity for determining grating be two, and described first determines grating machine sensitive with described first
The position of structure is relative up and down, and described second to determine grating relative up and down with the position of second sensitive mechanism；
Described 3rd to determine grating relative up and down with the position of the Z axis accelerometer sensitive mechanism.
5. the used group device of the centrifugal 3 axis MEMS of nanometer grating according to claim 4, it is characterised in that the infrabasal plate
And determine that grating layer is consistent with the global shape of the upper substrate, in four corners of the infrabasal plate towards determining the one of grating layer
Infrabasal plate boss is each extended over out on side, the infrabasal plate boss and the support frame position are mutually corresponding, and the lower base
The quantity of plate boss is 4, and four corners for determining grating layer are simultaneously by mutual corresponding support frame and infrabasal plate boss
In clamping shape, and fix；
The LASER Light Source of the infrabasal plate includes the first laser light source on two excessively central axial directions, and two described first are swashed
Radiant is mutually correspondingly arranged in vertical direction, and is separately positioned on the center of infrabasal plate avris；
The LASER Light Source also includes second laser light source, and two LASER Light Sources are mutually correspondingly arranged in the horizontal direction,
And the line of the line of two second laser light sources and two first laser light sources is mutually perpendicular to；Two described second
LASER Light Source is equally separately positioned on the center position of the infrabasal plate avris, but the side of the avris and first laser light source
Side intersects adjacent；
The LASER Light Source also includes being arranged on the 3rd LASER Light Source at the infrabasal plate center；
The first laser light source connects the input lead of light source first, and the output lead of light source first respectively, the input and defeated
Go out replaceable；
The second laser light source connects the input lead of light source second, and the output lead of light source second respectively, the input and defeated
Go out replaceable；
3rd LASER Light Source connects the input lead of light source the 3rd, and the output lead of light source the 3rd respectively, the input and defeated
Go out replaceable.
6. the used group device of the centrifugal 3 axis MEMS of nanometer grating according to claim 1, it is characterised in that the folded beam
Structure includes multiple detection beams, coupling block, and the detection beam connects to form folding girder construction with the coupling block；
The folding girder construction forms at least one inflection structure.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107449423A (en) * | 2017-08-28 | 2017-12-08 | 中北大学 | The used group device of the centrifugal 3 axis MEMS of nanometer grating |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107449423A (en) * | 2017-08-28 | 2017-12-08 | 中北大学 | The used group device of the centrifugal 3 axis MEMS of nanometer grating |
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