CN107449411A - Nanometer grating disresonance type tri-axis angular rate sensor - Google Patents

Nanometer grating disresonance type tri-axis angular rate sensor Download PDF

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Publication number
CN107449411A
CN107449411A CN201710752116.4A CN201710752116A CN107449411A CN 107449411 A CN107449411 A CN 107449411A CN 201710752116 A CN201710752116 A CN 201710752116A CN 107449411 A CN107449411 A CN 107449411A
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CN
China
Prior art keywords
grating
light source
laser light
rate sensor
dynamic
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CN201710752116.4A
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Chinese (zh)
Inventor
李孟委
梁洲鑫
耿浩
吴倩楠
李秀源
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North University of China
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North University of China
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Priority to CN201710752116.4A priority Critical patent/CN107449411A/en
Publication of CN107449411A publication Critical patent/CN107449411A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5642Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams
    • G01C19/5656Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams the devices involving a micromechanical structure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness

Abstract

A kind of nanometer grating disresonance type tri-axis angular rate sensor, primary structure includes upper substrate, dynamic grating layer, determine grating layer, infrabasal plate, photodetector, detect beam, coupling block, mass, dynamic grating, boss, LASER Light Source, wire forms, 4 photodetectors are set in upper substrate, wire, dynamic grating layer sets support frame, mass with dynamic grating, detect beam, coupling block, determine grating layer setting 4 and determine grating, 4 LASER Light Sources are set in infrabasal plate, wire, this device is without driving, the angular rate sensor has range big, it is simple in construction, orthogonal coupling error is small, the advantages of by foreign impacts or small vibration effect.

Description

Nanometer grating disresonance type tri-axis angular rate sensor
Technical field
The invention belongs to micro-inertial navigation technology association area, and in particular to a kind of shaft angle of nanometer grating disresonance type three speed Rate sensor.
Background technology
Micromachine electronic type angular rate sensor is the new high-tech product to grow up nineteen nineties, main Be used for the attitude measurement of aerospace flight vehicle, be important Primary Component military, that civil aircraft is essential, always by To the great attention of Global Aerospace sciemtifec and technical sphere.
At present, angular rate sensor is typically made up of driving structure, sensitive-mass, testing agency and conversion line etc., by In error being in process of production inevitably present so that angular rate sensor is unable to reach symmetry during initial design, Driven-mode energy coupling caused by structural failure can directly make output produce larger noise to sensed-mode, and compensate by processing The error brought is generally gauge outfit and places detection module by the corresponding compensation of secondary circuit output, so gives secondary treatment circuit design Bring huge difficult problem, cost is higher.In addition, resonance type micromechanical angular rate sensor is by the interference of external vibration is larger and mesh It is preceding not occur solution in effective piece.The design produces motion, using receiving without driving using centrifugal force driving mass Micro-displacement caused by the mass motion of rice Grating examinations, using difference output mode, effectively reduces orthogonal coupling error, reduces As caused by external vibration or impact export problem of dtmf distortion DTMF.
Nanometer grating carries out the advantages of detection is with high resolution, low noise to micro-displacement, and resolving power is up to femtometre level. Proof-Of Principle has been obtained in range measurement and acceleration transducer, but has had no that nanometer grating is used in angular rate sensor.
In the prior art, a kind of micromechanics centrifugal-type gyroscope (application number based on capacitance detecting mode: CN201110190016.X), the present invention compares using nanometer grating detection mode therewith, the subdivision multiple of grating subdivision circuit and Tracking velocity still has very big room for promotion, and the resolution ratio of the interface circuit of capacitance detecting has been in detectable limit, and precision is very It is difficult up to be lifted;The detection combination beam that the other present invention designs can reduce detection error by the design of cleverly girder construction, tie Structure is simple, and anchor point is provided with its center, and four masses are connected by four groups of spring beams, entirely different in structure, can To find out that the practicality of the present invention and prospect are broader.
The content of the invention
Goal of the invention:
The purpose of the present invention is aiming at the deficiency of background technology, a kind of disresonance type detected using nanometer grating of design Angular rate sensor, so that the orthogonal coupling error of micro-angular sensor is greatly lowered, reduces and is produced by external vibration or impact Raw output distortion, detection resolving power is improved, make detection data more accurate, reliable.
Technical scheme:
Primary structure of the present invention by:Upper substrate 1, dynamic grating layer 2, determine grating layer 3, infrabasal plate 4, photodetector 10, inspection Survey beam 2041, coupling block 2042, mass 203, dynamic grating 200, upper and lower base plate boss 11,41, LASER Light Source 401, wire group Into;Upper substrate 1 is firmly bonded by upper substrate boss 11 and dynamic grating layer 2, and dynamic grating layer 2 is by support frame 21 and determines grating 3 upper surface of layer are firmly bonded, and are determined the lower surface of grating layer 3 and are firmly bonded with infrabasal plate 4 by infrabasal plate boss 41.
The upper substrate 1 is square, and material is silicon, is all around symmetrical arranged four photodetectors 10, and bond jail Gu setting wire respectively in photodetector 10 or so, wire is set respectively before and after photodetector 10.
The dynamic grating layer 2 is square, including support frame 21 and testing agency, support frame 21 pass through coupling block 2042 It is connected with testing agency, testing agency is provided with testing agency 204,205, mass 203, moves grating 200, testing agency 204, 205 by detecting beam 2041, coupling with mass 203, and the center of mass 203 sets dynamic grating 200, and dynamic grating passes through dry Method lithographic technique generates.
The testing agency 204,205 is provided with coupling block 2042, detects beam 2041, wherein detection beam 2041, coupling block 2042 folding girder constructions in series.
For the testing agency is compared with conventional resonance formula Vibratory Wheel Micromechanical Gyroscope, no drive mechanism is simple in construction, just Friendship coupling error is small, and range is big, and can effectively avoid exporting distortion as caused by external vibration using difference output mode.
It is described to determine grating layer 3 to be square, determine grating 301,302 determining all around being symmetrical arranged for grating layer 3, determine grating Generated by dry etching technology.
Described infrabasal plate 4 is square, and material is silicon, and four are all around symmetrical arranged in the upper surface of infrabasal plate 4 and is swashed Radiant 40, and be firmly bonded, the both positive and negative polarity of LASER Light Source 40 is drawn by wire.
Beneficial effect:
The present invention has obvious advance compared with background technology, and this detection means is to use overall construction design, inspection The sensitive mechanism in survey X, Y, Z axis direction is integrated to be made in same support frame, reasonable in design, is adapted to the miniature of device Change;Using nanometer grating detection mode, sensitive-mass block is provided with dynamic grating, be right against determine to set in grating layer determine grating, Resolving power is high, is not affected by temperature, and angular rate sensor of the invention is without driving, and orthogonal coupling error is small, by extraneous vibration Or impact influences small, simple in construction, good reliability, easy single-chip integration, suitable for the angular rate measurement of high speed rotating object.
Brief description of the drawings
Fig. 1 is the overall structure partial sectional view of the present invention
Fig. 2 is overall structure diagram of the present invention
Fig. 3 is the overall front view of the present invention
Fig. 4 is upper substrate structure schematic diagram of the present invention
Fig. 5 is upper substrate upward view of the present invention
Fig. 6 is the dynamic grating layer structural representation of the present invention
Fig. 7 is the dynamic grating layer top view of the present invention
Fig. 8 determines grating layer structural representation for the present invention
Fig. 9 determines grating layer top view for the present invention
Figure 10 is lower substrate structure schematic diagram of the present invention
Figure 11 is infrabasal plate top view of the present invention;
Figure 12 is sensitive mechanism structural representation of the present invention
Figure 13 is sensitive mechanism top view of the present invention
Figure 14 is testing agency's top view of the present invention
Figure 15 is nanometer grating structural representation of the present invention
Figure 16 is nanometer grating sectional view of the present invention
Shown in figure, list of numerals is as follows:
1- upper substrates;2- moves grating layer;3- determines grating layer;4- infrabasal plates;10- photodetectors;11- upper substrate boss; 21- support frames;40- LASER Light Sources;41- infrabasal plate boss;The photodetectors of 101- first;101a- detectors first input Wire;The output lead of 101b- detectors first;The photodetectors of 102- second;The input lead of 102a- detectors second;102b- The output lead of detector second;200- moves grating;The sensitive mechanisms of 201- first;The sensitive mechanisms of 202- second;203- masses; The testing agencies of 204- first;The testing agencies of 205- second;301- first determines grating;302- second determines grating;401- first lasers Light source;The input lead of 401a- light sources first;The output lead of 401b- light sources first;402- second laser light sources;402a- light sources Two input leads;The output lead of 402b- light sources second;2001- moves grating grid;3001- determines grating grid;2041- detects beam; 2042- coupling blocks;A- moves grating grid slit;B- determines grating grid slit;C- gratings gap.
Embodiment
Embodiments of the invention are described below in detail, the example of the embodiment is shown in the drawings, wherein from beginning to end Same or similar label represents same or similar element or the element with same or like function.Below with reference to attached The embodiment of figure description is exemplary, is only used for explaining the present invention, and is not considered as limiting the invention.
In the description of the invention, it is to be understood that term " " center ", " on ", " under ", "front", "rear", " left side ", The orientation or position relationship of instructions such as " right sides " are based on orientation shown in the drawings or position relationship, are for only for ease of and describe this hair It is bright and simplify description, rather than instruction or imply that signified combination or element must have specific orientation, with specific orientation Construction and operation, therefore be not considered as limiting the invention.In addition, during the description of the embodiment of the present invention, Suo Youtu In " on ", " under ", "front", "rear", the device position relation such as "left", "right", using Fig. 1 as standard.
In the description of the invention, it is necessary to which explanation, unless otherwise clearly defined and limited, term " connected ", " connects Connect " it should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or it is integrally connected;It can be machine Tool connects or electrical connection;Can be joined directly together, can also be indirectly connected by intermediary, can be two members Connection inside part.For the ordinary skill in the art, above-mentioned term can be understood in the present invention with concrete condition Concrete meaning.
Below in conjunction with accompanying drawing, the present invention will be further described:
As shown in figure 1, be nanometer grating disresonance type tri-axis angular rate sensor provided by the present invention, three shaft angle Rate sensor determines grating layer 3 and an infrabasal plate 4, the upper base including the dynamic grating layer 2, one of a upper substrate 1, one Plate 1, dynamic grating layer 2, determining grating layer 3 and infrabasal plate 4, lamination is set successively from top to bottom;
The tri-axis angular rate sensor is in integrally square build, but be not limited to square build;
As shown in Figure 2,3, it is specially:The upper substrate 1 generally rectangle tabular structure, or square platy structure, The present invention is adopted as square platy structure, and four corners of the upper substrate 1 towards prolonging on the side of dynamic grating layer 2 respectively Upper substrate boss 11 is stretched out, the quantity of the upper substrate boss 11 is four, and the upper substrate boss 11 is by the upper substrate 11 It is supported on the upper side of dynamic grating layer 2;
The dynamic grating layer 2 is consistent with the global shape of the upper substrate 1, four corners tool of the dynamic grating layer 2 There is the support frame 21 extended downwardly, the support frame 21 and the position of the upper substrate boss 11 are mutually corresponding;
The infrabasal plate 4 and to determine grating layer 3 consistent with the global shape of the upper substrate 1, at four of the infrabasal plate Corner is towards each extending over out infrabasal plate boss 41, the infrabasal plate boss 41 and the support on the side for determining grating layer 3 The position of framework 21 is mutually corresponding, and the quantity of the infrabasal plate boss 41 is 4, and four corners for determining grating layer 3 are simultaneously Support frame 21 and infrabasal plate boss 41 are in clamping shape corresponding to mutual, and fix;
It is adhesively fixed in above-mentioned tie point or fixed point using surface;
The side of the upper substrate 1 towards dynamic grating 2 is provided with multiple photodetectors 10;
The side for determining grating 3 is provided with multiple LASER Light Sources 40 in the infrabasal plate 4;
The quantity of the photodetector 10 and the LASER Light Source 40 is four, and position is mutually corresponding;It is described to swash The laser that radiant 40 is launched, which passes sequentially through, determines grating layer 3, dynamic grating layer 2, and is received by the photodetector 10.
As shown in Figure 4,5, the respectively schematic perspective view and front view of upper substrate 1, the photodetector of the upper substrate 1 10 include the first photodetector 101 on two excessively central axial directions, and two first photodetectors 101 are vertical Direction is mutually correspondingly arranged, and is separately positioned on the center of the avris of upper substrate 1;
The photodetector 10 also includes the second photodetector 102, and two photodetectors 102 are in level side Mutually it is correspondingly arranged upwards, and the line and two first photodetectors 101 of two second photodetectors 102 Line be mutually perpendicular to;Two second photodetectors 102 are equally separately positioned on the centre bit of the avris of upper substrate 1 Put place, however the avris of the avris and the first photodetector 101 intersect it is adjacent.
First photodetector 101 connects detector the first input lead 101a respectively, and detector first exports Wire 101b, the input and outgoing position are replaceable;
Second photodetector 102 connects detector the second input lead 102a respectively, and detector second exports Wire 102b, the input and outgoing position are replaceable;
As shown in Figure 6,7, the schematic perspective view and front view of respectively dynamic grating layer 2, the dynamic grating layer 2 it is any one Organize and the first sensitive mechanism 201 is respectively arranged with relative both sides, and another set is sensitive with respect to being respectively arranged with second on both sides Mechanism 202;
The quantity of the sensitive mechanism 202 of first sensitive mechanism 201 and second is two, and first sensitive mechanism 201 is relative up and down with the position of first photodetector 101;Second sensitive mechanism 202 is visited with second photoelectricity The position for surveying device 102 is relative up and down.
As shown in Figure 8,9, the schematic perspective view and front view of grating layer 3, determine grating 3 any one group are respectively determined Determine grating 301 with respect to being respectively arranged with first on both sides, and another set determines grating with respect to being respectively arranged with second on both sides 302;
Described first to determine grating 301 and the second quantity for determining grating 302 be two, and described first determine grating 301 with The position of first sensitive mechanism 201 is relative up and down, and described second determines the position of grating 302 and second sensitive mechanism 202 Put relative up and down.
As shown in Figure 10,11, the respectively schematic perspective view and front view of infrabasal plate 4, the LASER Light Source of the infrabasal plate 4 40 include the first laser light source 401 on two excessively central axial directions, and two first laser light sources 401 are in vertical direction Mutually it is correspondingly arranged, and is separately positioned on the center of the avris of infrabasal plate 4;
The LASER Light Source 40 also includes second laser light source 402, two LASER Light Sources 402 phase in the horizontal direction Mutually it is correspondingly arranged, and the line of the line of two second laser light sources 402 and two first laser light sources 401 is mutual Vertically;Two second laser light sources 402 are equally separately positioned on the center position of the avris of infrabasal plate 2, but should The avris of avris and first laser light source 401 intersects adjacent.
The first laser light source 401 connects light source the first input lead 401a, and the output lead of light source first respectively 401b, the input and outgoing position are replaceable;
The second laser light source 402 connects light source the second input lead 402a, and the output lead of light source second respectively 402b, the input and outgoing position are replaceable;
First photodetector 101, the first sensitive mechanism 201, first corresponding to mutually determine grating 301 and first and swashed Radiant 401 is on same vertical curve, is corresponded to up and down successively.
As shown in Figure 12,13, it is the detailed schematic of first and second sensitive mechanism 201,202 on the dynamic grating layer 2, First and second sensitive mechanism 201,202 includes dynamic grating 200, and the dynamic grating 200 is arranged on a mass 203, And be specifically located on the center position of the mass 203, the upper and lower ends of mass 203 pass through the first detection respectively Structure 204 and second detects structure 205 and is connected on the dynamic grating layer 2;
Specially described dynamic grating 200 and upper and lower LASER Light Source, determine grating and photoelectric sensor is in same vertical curve On.
As shown in figure 14, it is the schematic perspective view of the detection structure, the detection structure includes multiple detection beams 2041 And coupling block 2042, detection beam 2041 connects to be formed by coupling block 2042 folds girder construction, and can be multiple with serial or parallel connection To realize different rigidity requirements, it is in parallel the characteristics of be fixing end and power end that all single-beams play the role of oneself;Series connection Feature is the effect end that all single-beams share a fixing end and a power.The length of coupling beam is identical, and total lateral dimension increases Greatly, stiffness coefficient becomes big;The lateral dimension of series connection is constant, and total length increase, stiffness coefficient diminishes.
For the testing agency is compared with conventional resonance formula Vibratory Wheel Micromechanical Gyroscope, no drive mechanism is simple in construction, just Friendship coupling error is small, and range is big, and can effectively avoid exporting distortion as caused by external vibration using difference output mode.
As shown in Figure 15,16, the dynamic grating 200 determines arranged in parallel above and below grating (301,302), i.e., dynamic light with described The each dynamic grating grid 2001 of grid 200 respectively positioned at determine the top of grating grid 3001, dynamic grating with determine grating collectively form it is more Individual slit, grating gap c are less than the optical wavelength of LASER Light Source 40, and LASER Light Source 40 and photodetector 10 are respectively positioned at dynamic light Grid 200 and the underface and surface for determining grating (301,302) center.
The dynamic grating is generated with determining grating by dry etching technology.
Inventive principle is:
When angular rate sensor sensitivity is to X-axis turning rate input two dynamic gratings of front and rear part can be driven to move out, and Light intensity change is detected by two phototube detectors of front and rear part, exports a pair of difference mode signals.Angular rate sensor sensitivity arrives Y Axis angular rate can drive two dynamic gratings in left and right portion to move out when inputting, and be detected by two photodetectors in left and right portion Change to light intensity, export a pair of difference mode signals.When angular rate sensor sensitivity arrives Z axis turning rate input, being total in X-axis and Y-axis Four sensitive-mass blocks, which are moved out by centrifugal action and detect light intensity by four photodetectors in portion all around, to be become Change, export two pairs of difference mode signals.
Core Sensitive Apparatus of the present invention is nanometer grating, and the cycle is close to or smaller than optical wavelength, is coupled based near field optic former Reason, belong to Vector Diffraction Theory.General principle be for:When light is propagated in uniform dielectric (such as air), it shows as a series of The plane wave carried out along the direction of propagation.When plane wave runs into obstacle, it will change because of the influence of barrier.If Barrier is a slit, there is two main regions, i.e. near-field region and far-field region around slit.If barrier includes more Individual slit, the ripple that diffraction comes out are interacted to obtain by each slit.When the size of slit changes, pass through slit The light intensity that diffraction comes out will change therewith.
According to one embodiment of present invention, the centre wavelength scope of LASER Light Source 40 can swash in 600nm to 850nm Radiant 40 and photodetector 10 are located at dynamic grating and determine the underface and surface of raster center, i.e. LASER Light Source 40 respectively The light wave sent can be irradiated to photodetector 10 by determining grating with dynamic grating, when there is turning rate input, move grating phase Pair and relative position changes between determining grating, irradiate nanometer grating with LASER Light Source, the change of relative position will cause to irradiate To the reflected light of the input light of nanometer grating and the energy change of transmitted light, become the light intensity for projecting photodetector Change, the change of relative position will cause projection light intensity that violent change occurs.Thus can be a faint centrifugation force signal A larger optical signalling is converted into, electrical signal can be converted optical signals into by photodetector.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " illustrative examples ", The description of " example ", " specific example " or " some examples " etc. means to combine specific features, the knot that the embodiment or example describe Structure, material or feature are contained at least one embodiment or example of the present invention.In this manual, to above-mentioned term Schematic representation is not necessarily referring to identical embodiment or example.Moreover, specific features, structure, material or the spy of description Point can combine in an appropriate manner in any one or more embodiments or example.
Although an embodiment of the present invention has been shown and described, it will be understood by those skilled in the art that not In the case of departing from the principle and objective of the present invention a variety of change, modification, replacement and modification can be carried out to these embodiments, this The scope of invention is limited by claim and its equivalent.

Claims (8)

1. nanometer grating disresonance type tri-axis angular rate sensor, it is characterised in that the angular rate sensor includes:Upper base Plate, dynamic grating layer, determine grating layer and infrabasal plate, the upper substrate, dynamic grating layer, determine grating layer and infrabasal plate lamination cloth successively Put;
The angular rate sensor also includes nanometer grating detection unit, and the nanometer grating detection unit includes:Photodetection Device, dynamic grating, determine grating and LASER Light Source, the photodetector, move grating, determine grating and LASER Light Source is separately positioned on The upper substrate, dynamic grating layer, determine on grating layer and infrabasal plate, in same nanometer grating detection unit, the photodetection Device, dynamic grating, determine grating and LASER Light Source is placed on same vertical curve;
The dynamic grating is arranged on mass, and the mass is connected on the dynamic grating layer by folding girder construction.
2. nanometer grating disresonance type tri-axis angular rate sensor according to claim 1, it is characterised in that the angle speed Rate sensor is in integrally cube structure;
The quantity of the nanometer grating detection unit is four, is respectively placed on four sides of the cube structure.
3. nanometer grating disresonance type tri-axis angular rate sensor according to claim 1, it is characterised in that the upper base Towards upper substrate boss is each extended over out on the side of dynamic grating layer, the quantity of the upper substrate boss is four corners of plate Four, the upper substrate is supported on the dynamic grating layer upper side by the upper substrate boss;
The photodetector of the upper substrate includes the first photodetector on two excessively central axial directions, two described the One photodetector is mutually correspondingly arranged in vertical direction, and is separately positioned on the center of upper substrate avris;
The photodetector also includes the second photodetector, and two photodetectors are mutually corresponding in the horizontal direction Set, and the line of the line of two second photodetectors and two first photodetectors is mutually perpendicular to;Two Individual second photodetector is equally separately positioned on the center position of the upper substrate avris;
First photodetector connects the input lead of detector first, and the output lead of detector first respectively, described defeated Enter and outgoing position is replaceable;
Second photodetector connects the input lead of detector second, and the output lead of detector second respectively, described defeated Enter and outgoing position is replaceable.
4. nanometer grating disresonance type tri-axis angular rate sensor according to claim 3, it is characterised in that the dynamic light Gate layer is consistent with the global shape of the upper substrate, and four corners of the dynamic grating layer have the carriage extended downwardly Frame, the support frame and the position of the upper substrate boss are mutually corresponding;
Any one group of the dynamic grating layer is respectively arranged with the first sensitive mechanism, and another set with respect to both sides on relative both sides On be respectively arranged with the second sensitive mechanism;
The quantity of first sensitive mechanism and the second sensitive mechanism is two, and first sensitive mechanism and described first The position of photodetector is relative up and down;Second sensitive mechanism is relative up and down with the position of second photodetector.
5. nanometer grating disresonance type tri-axis angular rate sensor according to claim 4, it is characterised in that described to determine light First is respectively arranged with any one group of grid relative both sides and determines grating, and another set on both sides with respect to being respectively arranged with second Determine grating;
Described first to determine grating and the second quantity for determining grating be two, and described first determines grating machine sensitive with described first The position of structure is relative up and down, and described second to determine grating relative up and down with the position of second sensitive mechanism.
6. nanometer grating disresonance type tri-axis angular rate sensor according to claim 5, it is characterised in that the lower base Plate and determine that grating layer is consistent with the global shape of the upper substrate, in four corners of the infrabasal plate towards determining grating layer Infrabasal plate boss is each extended over out on side, the infrabasal plate boss and the support frame position are mutually corresponding, and it is described under The quantity of substrate boss is 4, and support frame and infrabasal plate are convex corresponding to mutual simultaneously in four corners for determining grating layer Platform is fixed in clamping shape;
The LASER Light Source of the infrabasal plate includes the first laser light source on two excessively central axial directions, and two described first are swashed Radiant is mutually correspondingly arranged in vertical direction, and is separately positioned on the center of infrabasal plate avris;
The LASER Light Source also includes second laser light source, and two LASER Light Sources are mutually correspondingly arranged in the horizontal direction, And the line of the line of two second laser light sources and two first laser light sources is mutually perpendicular to;Two described second LASER Light Source is equally separately positioned on the center position of the infrabasal plate avris, but the side of the avris and first laser light source Side intersects adjacent;
The first laser light source connects the input lead of light source first, and the output lead of light source first respectively, the input and defeated Go out replaceable;
The second laser light source connects the input lead of light source second, and the output lead of light source second respectively, the input and defeated Go out replaceable.
7. nanometer grating disresonance type tri-axis angular rate sensor according to claim 1, it is characterised in that the folding Girder construction includes multiple detection beams, coupling block, and the detection beam connects to form folding girder construction with the coupling block;
The folding girder construction forms at least one inflection structure.
8. nanometer grating disresonance type tri-axis angular rate sensor according to claim 1, it is characterised in that the laser The centre wavelength scope of light source is near infrared band.
CN201710752116.4A 2017-08-28 2017-08-28 Nanometer grating disresonance type tri-axis angular rate sensor Pending CN107449411A (en)

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Cited By (6)

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CN108195366A (en) * 2017-12-26 2018-06-22 东南大学 A kind of micro-nano gyroscope and its processing method based on double-layer nanometer grating
CN108709549A (en) * 2018-05-29 2018-10-26 东南大学 A kind of single-chip integration gyroscope and its processing method based on nanometer grating
CN111156906A (en) * 2020-01-10 2020-05-15 中北大学 Two-dimensional micro-displacement sensor based on four-quadrant grating and detector
CN111551165A (en) * 2020-06-03 2020-08-18 中北大学 Three-axis gyroscope structure based on orthogonal grating and four-quadrant detector
CN111595243A (en) * 2020-06-03 2020-08-28 中北大学 Three-dimensional micro-displacement sensor structure based on four-quadrant grating
CN112710302A (en) * 2020-12-11 2021-04-27 中北大学南通智能光机电研究院 Non-resonant type nano-grating six-axis MEMS inertial measurement unit measuring device

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