CN206931575U - The silicon chip support plate of plated film on solar cell - Google Patents

The silicon chip support plate of plated film on solar cell Download PDF

Info

Publication number
CN206931575U
CN206931575U CN201720701392.3U CN201720701392U CN206931575U CN 206931575 U CN206931575 U CN 206931575U CN 201720701392 U CN201720701392 U CN 201720701392U CN 206931575 U CN206931575 U CN 206931575U
Authority
CN
China
Prior art keywords
silicon chip
support plate
support
plated film
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201720701392.3U
Other languages
Chinese (zh)
Inventor
蔡新兴
孙铁囤
姚伟忠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou EGing Photovoltaic Technology Co Ltd
Original Assignee
Changzhou EGing Photovoltaic Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou EGing Photovoltaic Technology Co Ltd filed Critical Changzhou EGing Photovoltaic Technology Co Ltd
Priority to CN201720701392.3U priority Critical patent/CN206931575U/en
Application granted granted Critical
Publication of CN206931575U publication Critical patent/CN206931575U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

It the utility model is related to field, a kind of more particularly to silicon chip support plate for plated film on solar cell, compared with the upper plated film support plate of routine, the side of silicon chip four is leaned against on the medium position on support inclined-plane, it can ensure that silicon chip to be processed only exists four sidelines with support plate and contacted, change original face contact form;Sloping platform face can ensure slide downward trend in silicon chip feeding be present, and more stable leans against on support plate, ensure that the stability in technique transmitting procedure, reduce shake and fragmentation figures;Support horizontal plane can reach around plating situation existing for the upper plated film of stop, as protection panel assembly.

Description

The silicon chip support plate of plated film on solar cell
Technical field
It the utility model is related to field, more particularly to a kind of silicon chip support plate for plated film on solar cell.
Background technology
What upper plated film support plate used at present design for step-like recesses, it is silicon chip film-coated place up deposit SINx (or ALOx), down, the upper plated film support plate of this kind of step existing with silicon chip is that face contacts (as shown in Figure 1) to non-coated surface, easily Cell piece after cleaning is polluted;The SINx deposited after support plate is using long period use etc. is thickening, silicon chip and support plate Contact site easily occurs that plated film is uneven, places the problems such as out-of-flatness, and due to the unobstructed part of current support plate, can cause compared with Around plating situation, (winding degree is exactly mainly than if desired for back side coating film, but understands some and bypasses backside deposition to positive side more Edge region), produce edge effect.
Utility model content
The technical problems to be solved in the utility model is:In order to improve silicon chip contacted with support plate and plated film caused by asked around plating Topic, reduces pollution silicon chip situation, and the utility model provides a kind of silicon chip support plate for plated film on solar cell.
Technical scheme is used by the utility model solves its technical problem:It is a kind of to be used for plated film on solar cell Silicon chip support plate, including the support plate body in frame-like, support plate inner body wall have support inclined-plane and support horizontal plane, support level The bottom on face and support inclined-plane is connected, support inclined-plane from lower to upper gradually outward-dipping, support horizontal plane and support inclined-plane Between the angle [alpha] that is formed be 100-150 °, the width L2 of the bottom on the support plate body interior edge support inclined-plane is less than to be processed The width L1 of silicon chip.
Preferably, the α is 120 °.
To improve the stability that silicon chip is placed, the length L3 of bottom of the support plate body along support inclined-plane is less than to be processed The length L4 of silicon chip.
The beneficial effects of the utility model are the silicon chip support plates of the present utility model for plated film on solar cell, with Conventional upper plated film support plate is compared, and the side of silicon chip four is leaned against on the medium position on support inclined-plane, it is ensured that silicon chip to be processed is with carrying Plate only exists the contact of four sidelines, changes original face contact form;Sloping platform face can ensure exist downwards in silicon chip feeding Tendency toward sliding, more stable leans against on support plate, ensure that the stability in technique transmitting procedure, reduces shake and fragment feelings Condition;Support horizontal plane can reach around plating situation existing for the upper plated film of stop, as protection panel assembly.
Brief description of the drawings
The utility model is further illustrated with reference to the accompanying drawings and examples.
Fig. 1 is the structural representation of silicon chip support plate in the prior art.
Fig. 2 is the dimensional structure diagram that the utility model is used for the silicon chip support plate of plated film on solar cell.
Fig. 3 is the top view that the utility model is used for the silicon chip support plate of plated film on solar cell.
Fig. 4 is the A-A sectional views that silicon chip to be processed is put in Fig. 3.
The top view of Fig. 5 silicon chips to be processed.
In figure:1st, support plate body, 11, support inclined-plane, 12, support horizontal plane, 10, silicon chip to be processed.
Embodiment
The utility model is described in further detail presently in connection with accompanying drawing.These accompanying drawings are simplified schematic diagram, Only illustrate basic structure of the present utility model in a schematic way, therefore it only shows the composition relevant with the utility model.
As shown in Figure 2-5, it is the utility model optimum embodiment, a kind of silicon chip for plated film on solar cell carries Plate, including the support plate body 1 in frame-like, the inwall of support plate body 1 have support inclined-plane 11 and support horizontal plane 12, support level The bottom on face 12 and support inclined-plane 11 is connected, support inclined-plane 11 from lower to upper gradually outward-dipping, the He of support horizontal plane 12 The angle [alpha] formed between support inclined-plane 11 is 100-150 ° (preferably 120 °), the bottom of 1 interior edge support inclined-plane of support plate body 11 Width L2 is less than the width L1 of silicon chip 10 to be processed.The length L3 of the bottom of 1 interior edge support inclined-plane of support plate body 11 is less than to be processed The length L4 of silicon chip 10.
As shown in figure 4, the utility model silicon chip uses gaseous state plated film, the optimum position that silicon chip 10 to be processed is placed is to hold The middle part on inclined-plane 11 is held in the palm, ensures that silicon chip 10 to be processed only exists four sidelines with support plate and contacted, improvement silicon chip contacts with support plate to be caused Contamination, be effectively improved due to graphite boat adsorb caused by edge aberration situation, silicon chip 10 and support horizontal plane to be processed A determining deviation is kept between 12, increase support horizontal plane 12 can preferably stop that air-flow deposits to silicon chip edge around support plate, In improvement plated film support plate generally existing around plating situation, improve due to silicon chip place it is unstable caused by shake and fragmentation figures.
Using it is above-mentioned according to desirable embodiment of the present utility model as enlightenment, pass through above-mentioned description, related work people Member can carry out various changes and amendments in the range of without departing from this item utility model technological thought completely.This item is real The content being not limited to new technical scope on specification, it is necessary to which its technology is determined according to right Property scope.

Claims (3)

1. a kind of silicon chip support plate for plated film on solar cell, including the support plate body (1) in frame-like, its feature exist In:Support plate body (1) inwall has support inclined-plane (11) and support horizontal plane (12), support horizontal plane (12) and support inclined-plane (11) bottom is connected, support inclined-plane (11) from lower to upper gradually outward-dipping, support horizontal plane (12) and support inclined-plane (11) angle [alpha] formed between is 100-150 °, the width L2 of the bottom of support plate body (1) the interior edge support inclined-plane (11) Less than the width L1 of silicon chip to be processed (10).
2. the silicon chip support plate for plated film on solar cell as claimed in claim 1, it is characterised in that:The α is 120 °.
3. the silicon chip support plate for plated film on solar cell as claimed in claim 1, it is characterised in that:The support plate body (1) the length L3 of the bottom of interior edge support inclined-plane (11) is less than the length L4 of silicon chip to be processed (10).
CN201720701392.3U 2017-06-15 2017-06-15 The silicon chip support plate of plated film on solar cell Active CN206931575U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720701392.3U CN206931575U (en) 2017-06-15 2017-06-15 The silicon chip support plate of plated film on solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720701392.3U CN206931575U (en) 2017-06-15 2017-06-15 The silicon chip support plate of plated film on solar cell

Publications (1)

Publication Number Publication Date
CN206931575U true CN206931575U (en) 2018-01-26

Family

ID=61344870

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201720701392.3U Active CN206931575U (en) 2017-06-15 2017-06-15 The silicon chip support plate of plated film on solar cell

Country Status (1)

Country Link
CN (1) CN206931575U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111668344A (en) * 2020-06-29 2020-09-15 浙江晶科能源有限公司 Manufacturing method of solar cell
CN113851559A (en) * 2021-10-28 2021-12-28 常州时创能源股份有限公司 Preparation method of TOPCon battery
CN114054419A (en) * 2021-11-17 2022-02-18 新美光(苏州)半导体科技有限公司 Silicon electrode cleaning device and cleaning method
CN116014034A (en) * 2023-03-24 2023-04-25 中润新能源(徐州)有限公司 Carrier plate for solar cell coating equipment
WO2023246141A1 (en) * 2022-06-22 2023-12-28 中威新能源(成都)有限公司 Chemical vapor deposition method, carrier, battery piece and heterojunction battery

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111668344A (en) * 2020-06-29 2020-09-15 浙江晶科能源有限公司 Manufacturing method of solar cell
CN111668344B (en) * 2020-06-29 2021-12-14 浙江晶科能源有限公司 Manufacturing method of solar cell
CN113851559A (en) * 2021-10-28 2021-12-28 常州时创能源股份有限公司 Preparation method of TOPCon battery
CN113851559B (en) * 2021-10-28 2023-02-28 常州时创能源股份有限公司 Preparation method of TOPCon battery
CN114054419A (en) * 2021-11-17 2022-02-18 新美光(苏州)半导体科技有限公司 Silicon electrode cleaning device and cleaning method
WO2023246141A1 (en) * 2022-06-22 2023-12-28 中威新能源(成都)有限公司 Chemical vapor deposition method, carrier, battery piece and heterojunction battery
CN116014034A (en) * 2023-03-24 2023-04-25 中润新能源(徐州)有限公司 Carrier plate for solar cell coating equipment

Similar Documents

Publication Publication Date Title
CN206931575U (en) The silicon chip support plate of plated film on solar cell
CN105369348A (en) Wafer carrier plate for MOCVD reaction system
CN203530421U (en) Shielding tray for solar cell
TWI460305B (en) Apparatus for chemical bath deposition
CN105170560A (en) Ultrasonic cleaning tank with settling tanks
TWI458546B (en) Chemical bath deposition (cbd) apparatus
CN203266427U (en) Condensed water containing tray of silicon wafer polishing machine
CN212026469U (en) Overflow tank structure of water tank
CN210022538U (en) Flow size adjustable watering lorry shower nozzle
CN205028914U (en) Silicon chip holds basket of flowers
CN207959384U (en) A kind of list slot sink
CN203820885U (en) Novel PECVD (plasma enhanced chemical vapor deposition) coating support plate
CN203426865U (en) Non-contact brush waterproof device
CN221433498U (en) Spray head
CN206530185U (en) A kind of removable rail
CN206325879U (en) Nozzle structure is used on a kind of cleaning machine
CN206843584U (en) A kind of New-type plate PECVD hooks
CN204570032U (en) The spray equipment of chemical vapor depsotition equipment
CN203270028U (en) PECVD (Plasma Enhanced Chemical Vapor Deposition) plate type coating film plate frame
CN212237804U (en) Water-saving shower head
CN209917340U (en) Crawler-type waste water treatment sedimentation tank
CN205760499U (en) A kind of gravity type liquid distributor
CN208099611U (en) A kind of fine etching machines of glass
CN204356400U (en) Deposition substrate in a kind of PECVD device
CN206624914U (en) A kind of graphite mount structure

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant