CN206854240U - Alternate oscillation mega sonic wave cleaning device for photoelectricity parts - Google Patents
Alternate oscillation mega sonic wave cleaning device for photoelectricity parts Download PDFInfo
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- CN206854240U CN206854240U CN201720369998.1U CN201720369998U CN206854240U CN 206854240 U CN206854240 U CN 206854240U CN 201720369998 U CN201720369998 U CN 201720369998U CN 206854240 U CN206854240 U CN 206854240U
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- rinse bath
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Abstract
The utility model discloses the alternate oscillation mega sonic wave cleaning device for photoelectricity parts, including frame, rinse bath, supersonic generator, main transducer, auxiliary transducer, timer, energy supply control module, rinse bath is installed on frame, supersonic generator, timer are installed on frame side and connected with energy supply control module, supersonic generator connection main transducer, auxiliary transducer, the main transducer, auxiliary transducer are arranged at rinse bath outer wall, and the working frequency of main transducer is 1200kHz；The cleaning device also includes drainage arrangement, and drainage arrangement includes magnetic valve, discharge outlet and the drainpipe positioned at bottom of rinse bath, and the magnetic valve controls its keying by energy supply control module.The utility model is simple to operation, and mega sonic wave and low-mid-frequency ultrasonic ripple can make 60nm micronic dust clearance reach more than 99% according to combination operation is alternately opened and closed under optimum state, and make 40nm, and 20nm micronic dust clearance is remarkably improved.
Description
Technical field
The utility model belongs to photoelectricity cleaning technique field, clear in particular for the alternate oscillation mega sonic wave of photoelectricity parts
Wash instrument.
Background technology
The parts that field of photoelectric technology uses, often the requirement to cleannes is higher, and small impurity and dust all can
Influence the performance of semiconductor.Therefore cleaning, clean technologies are a series of very important technologies in photoelectric field, many techniques
To be completed in toilet.Cleaned by ultrasonic vibration mainly passes through transducer, and ultrasonic transducer is a kind of energy conversion device,
Its function is that the electrical power of input is converted into mechanical output（That is ultrasonic wave）Pass again, and autophage it is seldom one
Partial Power, the high energy oscillator signal sent using supersonic generator, high frequency machinery vibration is converted into by transducer to pass
It is multicast to value, ultrasonic wave density interphase forward directed radiation in media as well, makes media flow, produce thousands of micro-bubble,
Vibrated in the presence of the sound intensity, after acoustic pressure reaches certain value, bubble is increased rapidly, then closure suddenly, and impact is produced during closure
Ripple, thousands of atmospheric pressures is produced around it, destroy insoluble soil dispersion into medium, reach cleaning purpose.This is a kind of
The cleaning method of the cleaning of non-secondary pollution, it is not necessary to use chemical solvent, as long as and water as medium.
Ultrasonic washing instrument of the prior art is usually to be cleaned using unit unifrequency, can be aided with heating, or
Part more to dirt and obstinate first tentatively cleans in the ultrasonic washing instrument of low frequency, then at tiny dirt concentration
Cleaned into high-frequency ultrasonic cleaning device.It so can also carry out advanced treating, it is simply less efficient, cost is higher.To photoelectricity portion
For part, multiple operation transfer can inherently influence its cleannes, it is therefore preferred that a step is disposed, to meet wanting for dust free room
Ask.General traditional 40kHz single-frequency ultrasonic washing instruments, 80 ~ 90% clearance, highest can be reached for 0.3 μm of micronic dust
Can be then lower for 0.1 μm of more fine grit close to 91%.
Just become mega sonic wave when ultrasonic frequency is higher, the mechanism of mega sonic wave cleaning is shaken effect by high frequency (850kHz)
The chemical reaction that or should combine chemical is cleaned to workpiece.In cleaning, wavelength is sent as 1 μm by transducer
Frequency is the higher sound wave of 0.8 megahertz of high energy sound wave or the shorter frequency of wavelength.Mega sonic wave compares the ultrasonic wave of low frequency/intermediate frequency
The advantages of be it is efficient remove more molecule, the more small advantage compared to ultrasonic wave of particle is bigger, in photovoltaic industry, 0.1 μm
And the particle of the above can be removed by low frequency/intermediate frequency or the combination of the ultrasonic wave of multiple frequencies, effect is preferable；And working as needs to remove
During particle below 60nm sizes, low frequency/mid-frequency ultrasonic ripple remove after cleanliness factor, it is impossible to meet large scale wafer（12 cun）
The requirement of processing procedure；In addition for being provided with the part in ultra-fine hole（0.1 μm of hole）, low frequency/mid-frequency ultrasonic ripple is difficult to remove in ultra-fine hole
Micronic dust, therefore, it is necessary to develop by mega sonic wave clean based on cleaning device to meet the needs of technique.
Utility model content
Purpose of utility model：In order to improve the structure of existing ultrasonic wave/mega sonic wave cleaning device so as to fit in cleaning photoelectricity
Part, and improve cleaning performance, the utility model provides a kind of simple in construction, performance optimization and using flexible is used for photoelectricity zero
The alternate oscillation mega sonic wave cleaning device of part, to solve problems of the prior art.
Utility model content：For the alternate oscillation mega sonic wave cleaning device of photoelectricity parts, including it is frame, rinse bath, super
Sonic generator, main transducer, auxiliary transducer, timer, energy supply control module, some rinse baths are installed in frame,
The supersonic generator, timer are installed on frame side and connected with energy supply control module, supersonic generator connection
Main transducer, auxiliary transducer, the main transducer, auxiliary transducer are arranged at rinse bath outer wall, and the working frequency of main transducer is
1200kHz；The cleaning device also includes drainage arrangement, drainage arrangement include the magnetic valve positioned at bottom of rinse bath, discharge outlet and
Drainpipe, the magnetic valve control its keying by energy supply control module.
The working frequency of the auxiliary transducer is 40kHz, and the crystal oscillation material in the main transducer, auxiliary transducer is
PZT Quito one-component system piezoelectric ceramics.Common low-mid-frequency ultrasonic ripple 40kHz is applied to routine and removes micronic dust, and it, which combines mega sonic wave, to occur
Cooperative effect, the micronic dust that mega sonic wave washes down are adhered in parts walls, and low-mid-frequency ultrasonic ripple can help it to depart from parts walls；PZT
Piezoelectric ceramics mechanical-electric coupling excellent performance, temperature stability is good, easily modified, and it has had going through for many decades as transducer material
History；It is the defects of ceramic performance is single that polynary system PZT piezoelectric ceramics, which can make up low member, possesses piezoelectricity, dielectric and mechanical performance
Than more comprehensive advantage, application field is more extensive than single PZT piezoelectric ceramics.
Preferably, the cleaning device also includes being arranged at the heating module inside rinse bath, the heating module connection
In energy supply control module.Because ultrasonic wave cleaning is typically in 30 ~ 40 DEG C of best results, and photoelectricity parts also may be selected one and add
Thermal power controls a treatment temperature, simply efficient by way of control panel adjusts heating power.
Preferably, the quantity of the main transducer and auxiliary transducer is 2 or 3, each main transducer, auxiliary transducer are simultaneously
Row connect same supersonic generator, and each main transducer or auxiliary transducer are also associated with selecting switch, selecting switch and electricity
Source control module connection.The quantity of general supporting ultrasonic transducer has certain rule, such as 1,4,6,12, is advised according to industry
Rule, most suitable configuration can be 4/6 transducer here；Selecting switch is easy to stable and reliably selects work or non-work
The transducer of work, neatly to meet cleaning demand.
Preferably, the top of the rinse bath is closely covered with one layer of dust suction guard.Because cleaning requires high, not only
Ensure the cleanliness inside rinse bath, also to exclude extraneous floating dust pollution rinse water, cause secondary pollution, therefore dust suction guard rises
Good protection effect is arrived, in general cover plate is likely difficult to play a part of the extraneous micronic dust of isolation.
Compared to the prior art, the beneficial effects of the utility model are：It is of the present utility model for photoelectricity parts
Alternate oscillation mega sonic wave cleaning device, it is simple in construction, easy to operate.Supersonic generator and its selectively triggering main transducer/
The mode of auxiliary transducer is easily realized, and mega sonic wave/low-mid-frequency ultrasonic ripple binary alternatively is convenient, and transducer frequency is chosen
Position, it is with strong applicability；The setting of drainage arrangement is easy to remove by the water of dust pollution in time, supplements fresh pure water so that this is super
Sound wave cleaning device possesses good endurance；Heating module can further lift the effect of this alternate oscillation ultrasonication；
Dust suction guard serves good extraneous micronic dust insulating effect.The utility model alternate oscillation can realize that mode is various, simple easy
Operation, especially suitable for the washing and cleaning operation of opto-electronics, mega sonic wave and low-mid-frequency ultrasonic ripple are according to combination operation is alternately opened and closed, most
60nm micronic dust clearance can be made to reach more than 99% under good state, and make 40nm, 20nm micronic dust clearance is also significantly carried
It is high.
Brief description of the drawings
Fig. 1 is the structural representation of the utility model embodiment.
1- frames, 2- rinse baths, 3- supersonic generators, 4- main transducers, the auxiliary transducers of 5-, 6- timers, 7- power supplys
Control module, 8- drainage arrangements, 81- magnetic valves, 82- discharge outlet, 83- drainpipes, 9- heating modules, 10- dust suction guards.
Embodiment
, below will be to embodiment or existing in order to illustrate more clearly of the embodiment of the present application or technical scheme of the prior art
There is the required accompanying drawing used in technology description to be briefly described, drawings in the following description are only described in the application
Some embodiments, for those of ordinary skill in the art, on the premise of not paying creative work, can also be according to this
A little accompanying drawings obtain other accompanying drawings.
With reference to Fig. 1 and specific embodiment, the utility model is furtherd elucidate.
Such as Fig. 1, sent out for the alternate oscillation mega sonic wave cleaning device of photoelectricity parts, including frame 1, rinse bath 2, ultrasonic wave
Raw device 3, main transducer 4, auxiliary transducer 5, timer 6, energy supply control module 7, energy supply control module 7 are based on PLC circuit
Control system, main transducer 4 and auxiliary transducer 5 have 3 respectively, and 2 ~ 4 rinse baths 2 are installed in frame 1 side by side, described
Supersonic generator 3, timer 6 are installed on the side of frame 1, are connected with energy supply control module 7, main transducer 4, auxiliary transducer
5 connect same supersonic generator 3 side by side, and each transducer is also associated with selecting switch, selecting switch and power supply mould
Block 7 connects, and the main transducer 4, auxiliary transducer 5 are arranged at the outer wall of rinse bath 2, and the working frequency of main transducer 4 is
1200kHz, the working frequency of auxiliary transducer 5 are 40kHz, and the crystal oscillation material in the main transducer 4, auxiliary transducer 5 is
PZT Quito one-component system piezoelectric ceramics, the energy supply control module 7 are rendered as exercisable control panel, chain of command outside frame 1
Plate has frequency selection display, temperature display, water level to show and operation button etc., facilitate manually set in a manner of button, knob etc.,
Control cleaning device；
The cleaning device also includes drainage arrangement 8, and the drainage arrangement 8 includes the electromagnetism positioned at the bottom side of rinse bath 2
Valve 81, discharge outlet 82 and drainpipe 83, the magnetic valve 81 control its keying by energy supply control module 7；Cleaning device also includes setting
The heating module 9 and dust suction guard 10 being placed in inside rinse bath 2, the heating module 9 are connected with energy supply control module 7, dust suction
Guard 10 closely covers on the top of rinse bath 2.
Operation principle：Energy supply control module 7 is responsible for the on/off of whole cleaning device, and supersonic generator, transducing
Device, draining and the control of heating.The rinse bath 2 plus appropriate amount of deionized water of cleaning device（Or according to cleaning need select clear water,
The specification of the water such as pure water, ultra-pure water）With cleaned optoelectronic components, switch on power；Manual operation control panel, open ultrasonic wave
Generator 3, heating module 9 is opened if necessary and adjusts power, timer 6 has set master according to program set in advance and changed
Can device 4 and the opening time of auxiliary transducer 5 and the time point of switching transducer；All auxiliary transducers 5 are connected under original state, when
When 40kHz ultrasonic times are 10t, energy supply control module 7 switches to main transducer 4, closes auxiliary transducer 5 by selecting switch,
It is about 3-5t that 1200kHz, which continues ultrasonic time, and now an alternate oscillation end cycle, such circulating ultrasonic are multiple；Close
Heating module 9, energy supply control module 7 control magnetic valve 81 to open（It is under normal circumstances closing）, cleaned deionized water row
Go out, now a cleaning frequency terminate, continue plus water or remove cleaned optoelectronic components.Timer 6 selects main transducer 4
Or the prioritization scheme that auxiliary transducer 5 works is 40kHz ultrasonic time：1200kHz ultrasonic time=10:3-5, it is sequentially elder generation
40kHz, rear 1200kHz.
Finally, it is also necessary to illustrate, term " comprising ", "comprising" or its any other variant are intended to nonexcludability
Comprising so that process, method, article or equipment including a series of elements not only include those key elements, but also wrapping
Include the other element being not expressly set out, or also include for this process, method, article or equipment intrinsic want
Element.
Claims (5)
1. the alternate oscillation mega sonic wave cleaning device for photoelectricity parts, it is characterised in that including frame, rinse bath, ultrasonic wave
Generator, main transducer, auxiliary transducer, timer, energy supply control module, some rinse baths are installed in frame, described
Supersonic generator, timer are installed on frame side and connected with energy supply control module, and supersonic generator connection master changes
Energy device, auxiliary transducer, the main transducer, auxiliary transducer are arranged at rinse bath outer wall, and the working frequency of main transducer is
1200kHz；The cleaning device also includes drainage arrangement, drainage arrangement include the magnetic valve positioned at bottom of rinse bath, discharge outlet and
Drainpipe, the magnetic valve control its keying by energy supply control module.
2. the alternate oscillation mega sonic wave cleaning device according to claim 1 for photoelectricity parts, it is characterised in that described
The working frequency of auxiliary transducer is 40kHz, and the crystal oscillation material in the main transducer, auxiliary transducer is PZT base polynary systems
Piezoelectric ceramics.
3. the alternate oscillation mega sonic wave cleaning device according to claim 1 for photoelectricity parts, it is characterised in that described
Cleaning device also includes being arranged at the heating module inside rinse bath, and the heating module is connected to energy supply control module.
4. the alternate oscillation mega sonic wave cleaning device according to claim 1 for photoelectricity parts, it is characterised in that described
The quantity of main transducer and auxiliary transducer is 2 or 3, and each main transducer, auxiliary transducer connect same ultrasonic wave hair side by side
Raw device, each main transducer or auxiliary transducer are also associated with selecting switch, and selecting switch is connected with energy supply control module.
5. the alternate oscillation mega sonic wave cleaning device according to claim 1 for photoelectricity parts, it is characterised in that described
The top of rinse bath is closely covered with one layer of dust suction guard.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720369998.1U CN206854240U (en) | 2017-04-11 | 2017-04-11 | Alternate oscillation mega sonic wave cleaning device for photoelectricity parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720369998.1U CN206854240U (en) | 2017-04-11 | 2017-04-11 | Alternate oscillation mega sonic wave cleaning device for photoelectricity parts |
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| CN206854240U true CN206854240U (en) | 2018-01-09 |
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| CN201720369998.1U Active CN206854240U (en) | 2017-04-11 | 2017-04-11 | Alternate oscillation mega sonic wave cleaning device for photoelectricity parts |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111701947A (en) * | 2020-07-23 | 2020-09-25 | 安徽富乐德科技发展股份有限公司 | Ultrasonic and megasonic cleaning system for semiconductor silicon wafer |
| CN114207205A (en) * | 2019-08-22 | 2022-03-18 | 夏普株式会社 | Ultrasonic cleaner |
-
2017
- 2017-04-11 CN CN201720369998.1U patent/CN206854240U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114207205A (en) * | 2019-08-22 | 2022-03-18 | 夏普株式会社 | Ultrasonic cleaner |
| CN114207205B (en) * | 2019-08-22 | 2024-03-29 | 夏普株式会社 | Ultrasonic cleaner |
| CN111701947A (en) * | 2020-07-23 | 2020-09-25 | 安徽富乐德科技发展股份有限公司 | Ultrasonic and megasonic cleaning system for semiconductor silicon wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Alternating oscillation megasonic cleaner for photoelectric components Effective date of registration: 20210330 Granted publication date: 20180109 Pledgee: Chizhou Jiuhua Hengxin financing Company limited by guarantee Pledgor: ANHUI GAOXIN ZHONGKE SEMICONDUCTOR Co.,Ltd. Registration number: Y2021980002274 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20220826 Granted publication date: 20180109 Pledgee: Chizhou Jiuhua Hengxin financing Company limited by guarantee Pledgor: ANHUI GAOXIN ZHONGKE SEMICONDUCTOR CO.,LTD. Registration number: Y2021980002274 |