CN206480598U - It is a kind of to wash machine cleaning speed and the device of quality for improving wafer - Google Patents
It is a kind of to wash machine cleaning speed and the device of quality for improving wafer Download PDFInfo
- Publication number
- CN206480598U CN206480598U CN201720006216.8U CN201720006216U CN206480598U CN 206480598 U CN206480598 U CN 206480598U CN 201720006216 U CN201720006216 U CN 201720006216U CN 206480598 U CN206480598 U CN 206480598U
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- CN
- China
- Prior art keywords
- casing
- quality
- air inlet
- wafer
- inlet pipe
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- Expired - Fee Related
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Abstract
A kind of to wash machine cleaning speed and the device of quality for improving wafer, it includes being provided with belt hole support frame, electrothermal tube, temperature control probe, air inlet pipe in casing, casing；Removably wafer rack is provided with the belt hole support frame；The air inlet pipe top stretches out in casing upper end and air inlet pipe top is provided with pressure gauge, flow control valve, and the air inlet pipe end is provided with escape pipe；Controller is provided with outside the casing, the controller is connected with temperature control probe, electrothermal tube.The purpose of this utility model be to provide it is a kind of be used to improve wafer and wash machine cleaning speed and the device of quality, it is simple in construction, the efficiency and quality of cleaning can be improved.
Description
Technical field
The utility model belongs to wafer manufacture field, is specially that one kind washes machine cleaning speed and quality for improving wafer
Device.
Background technology
Silicon wafer（Abbreviation wafer）, it is the stock for manufacturing semiconductor chip；Because of surface attachment before wafer processing
The protective layer and some impurity for having very thin one layer can be used after need to being cleaned；The conventional cleaning way of wafer is to wash；It is existing
Some wafers wash machine cleaning way wafer is positioned in wafer rack, are soaked in cleaning solution, treat wafer
The attachment on surface chemically reacts with cleaning solution, departs from its attachment, completes cleaning；Cleaning efficiency is low and quality
It is not high.
Utility model content
The purpose of this utility model is to be directed to problem above to wash machine cleaning speed and matter for improving wafer there is provided one kind
The device of amount, is manipulated simply, convenient；Machine is washed for improving existing wafer, the operating efficiency height that existing wafer washes machine is improved
And improve cleaning quality.
To realize object above, the technical solution adopted in the utility model is：It includes casing（1）, the casing（1）It is interior
It is provided with belt hole support frame（2）, electrothermal tube（3）, temperature control probe（4）, air inlet pipe（5）；The belt hole support frame（2）On removably set
It is equipped with wafer rack（6）；Cleaning solution is filled in casing, cleaning solution liquid level is higher than wafer rack（6）, it is described enter
Tracheae（5）Top stretches out in casing（1）Upper end and air inlet pipe（5）Top is provided with pressure gauge（7）, flow control valve（8）, it is described
Air inlet pipe（5）End is provided with escape pipe（9）, the escape pipe（9）It is arranged at belt hole support frame（2）Lower end, the escape pipe（9）
On be provided with multiple nozzles（10）；The casing（1）It is provided with controller outside（11）, the controller（11）Include processor
And operating desk, the controller（11）With temperature control probe（4）, electrothermal tube（3）Connection.
Further, the casing（1）It is made up of stainless steel material.
Further, the electrothermal tube（3）It is arranged in belt hole support frame（2）Two ends.
Further, the casing（1）Lower end is provided with devil liquor recovery pipe（101）, the devil liquor recovery pipe（101）On set
It is equipped with valve（102）.
The beneficial effects of the utility model：It is simple for structure, it is with low cost, by original static cleaning, it is changed into current and stirs
With cleaning, cleaning speed is accelerated, scavenging period is reduced, cleaning quality is improved.
Brief description of the drawings
Fig. 1 is the utility model structural representation.
Fig. 2 is that wafer rack places top view.
Label character is expressed as described in figure：1st, casing；2nd, belt hole support frame；3rd, electrothermal tube；4th, temperature control probe；5th, air inlet
Pipe；6th, wafer rack；7th, pressure gauge；8th, flow control valve；9th, escape pipe；10th, nozzle；11st, controller；101st, devil liquor recovery
Pipe；102nd, valve.
Embodiment
In order that those skilled in the art more fully understand the technical solution of the utility model, below in conjunction with the accompanying drawings to this reality
Be described in detail with new, the description of this part be only it is exemplary and explanatory, should not be to protection domain of the present utility model
There is any restriction effect.
As Figure 1-Figure 2, concrete structure of the present utility model is：It includes being provided with band in casing 1, the casing 1
Hole support 2, electrothermal tube 3, temperature control probe 4, air inlet pipe 5；Wafer rack 6 removably is provided with the belt hole support frame 2, it is brilliant
Multiple wafers are placed with circle rack 6；Cleaning solution is filled in casing, cleaning solution liquid level is higher than wafer rack 6,
The top of air inlet pipe 5 stretches out in the upper end of casing 1 and the top of air inlet pipe 5 and is provided with pressure gauge 7, flow control valve 8, the air inlet
The end of pipe 5 is provided with escape pipe 9, and the escape pipe 9 is arranged on the lower end of belt hole support frame 2, the escape pipe 9 and is provided with multiple sprays
Mouth 10；Controller 11 is provided with outside the casing 1, the controller 11 includes processor and operating desk, the controller 11
It is connected with temperature control probe 4, electrothermal tube 3.
Further, the casing 1 is made up of stainless steel material.
Further, the electrothermal tube 3 is arranged in the two ends of belt hole support frame 2.
Further, the lower end of casing 1 is provided with devil liquor recovery pipe 101, the devil liquor recovery pipe 101 and is provided with valve
Door 102.
When specifically used：Warm temperature and warm-up time are set by controller 11, pass through pressure gauge 7 and Flow-rate adjustment
Valve 8 carrys out adjusting gas flow to suitable, and gas sprays through nozzle 10, stirs with cleaning solution, increases cleaning dynamics, reach cleaning mesh
's.
It should be noted that herein, term " comprising ", "comprising" or its any other variant are intended to non-row
His property is included, so which key element process, method, article or equipment including a series of key elements not only include, and
And also including other key elements being not expressly set out, or also include for this process, method, article or equipment institute inherently
Key element.
Specific case used herein is set forth to principle of the present utility model and embodiment, above example
Illustrate that being only intended to help understands method of the present utility model and its core concept.Described above is only of the present utility model preferred
Embodiment, it is noted that due to the finiteness of literal expression, and objectively there is unlimited concrete structure, for this technology
For the those of ordinary skill in field, on the premise of the utility model principle is not departed from, some improvement, retouching can also be made
Or change, above-mentioned technical characteristic can also be by rights combined；These improve retouching, change or combined, or not
It is improved that the design of utility model and technical scheme are directly applied into other occasions, it is regarded as protection of the present utility model
Scope.
Claims (4)
1. a kind of wash machine cleaning speed and the device of quality for improving wafer, it includes casing（1）, it is characterised in that institute
State casing（1）Inside it is provided with belt hole support frame（2）, electrothermal tube（3）, temperature control probe（4）, air inlet pipe（5）；The belt hole support frame（2）
On be placed with wafer rack（6）；The air inlet pipe（5）Top stretches out in casing（1）Upper end and air inlet pipe（5）Top is provided with
Pressure gauge（7）, flow control valve（8）, the air inlet pipe（5）End is provided with escape pipe（9）, the escape pipe（9）It is arranged at
Belt hole support frame（2）Lower end, the escape pipe（9）On be provided with multiple nozzles（10）；The casing（1）It is provided with controller outside
（11）, the controller（11）Include processor and operating desk, the controller（11）With temperature control probe（4）, electrothermal tube（3）
Connection.
2. it is according to claim 1 it is a kind of be used to improve wafer and wash machine cleaning speed and the device of quality, its feature exists
In the casing（1）It is made up of stainless steel material.
3. it is according to claim 1 it is a kind of be used to improve wafer and wash machine cleaning speed and the device of quality, its feature exists
In the electrothermal tube（3）It is arranged in belt hole support frame（2）Two ends.
4. it is according to claim 1 it is a kind of be used to improve wafer and wash machine cleaning speed and the device of quality, its feature exists
In the casing（1）Lower end is provided with devil liquor recovery pipe（101）, the devil liquor recovery pipe（101）On be provided with valve（102）.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720006216.8U CN206480598U (en) | 2017-01-04 | 2017-01-04 | It is a kind of to wash machine cleaning speed and the device of quality for improving wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720006216.8U CN206480598U (en) | 2017-01-04 | 2017-01-04 | It is a kind of to wash machine cleaning speed and the device of quality for improving wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206480598U true CN206480598U (en) | 2017-09-08 |
Family
ID=59749888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720006216.8U Expired - Fee Related CN206480598U (en) | 2017-01-04 | 2017-01-04 | It is a kind of to wash machine cleaning speed and the device of quality for improving wafer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206480598U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110379733A (en) * | 2019-06-03 | 2019-10-25 | 厦门通富微电子有限公司 | Remove the cleaning device of photoresist on wafer |
-
2017
- 2017-01-04 CN CN201720006216.8U patent/CN206480598U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110379733A (en) * | 2019-06-03 | 2019-10-25 | 厦门通富微电子有限公司 | Remove the cleaning device of photoresist on wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170908 Termination date: 20190104 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |