CN206133503U - Prevent static etching device - Google Patents
Prevent static etching device Download PDFInfo
- Publication number
- CN206133503U CN206133503U CN201620831883.5U CN201620831883U CN206133503U CN 206133503 U CN206133503 U CN 206133503U CN 201620831883 U CN201620831883 U CN 201620831883U CN 206133503 U CN206133503 U CN 206133503U
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- overlay film
- antistatic
- component
- rotating shaft
- etching solution
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Abstract
The utility model relates to a prevent static etching device is equipped with etching subassembly, tectorial membrane subassembly, buffering subassembly in proper order and receives the material subassembly, the tectorial membrane subassembly includes tectorial membrane pivot subassembly and driven spindle, tectorial membrane pivot subassembly includes first tectorial membrane pivot, the pivot of second tectorial membrane and auxiliary rotating shaft, the pivot of second tectorial membrane is passed through auxiliary rotating shaft drives first tectorial membrane pivot is rotated for carry out the film -coating processing operation, the tectorial membrane subassembly is located the etching subassembly and between the buffering subassembly. The utility model discloses a prevent static etching device can eliminate because of the contact effectively or separate produced static at the in -process of processing production, has solved the problem that causes the circuit puncture because static piles up.
Description
Technical field
This utility model is related to etching and processing equipment technical field, more particularly to a kind of antistatic Etaching device.
Background technology
With constantly developing for electron trade, the production of handset touch panel has been increasingly becoming the pillar of the economy of China
Industry.
In the production process of existing touch screen, due to Film products etching production process in generally comprise dyestripping,
The process such as overlay film and winding.Inevitably result from electrostatic to a certain extent in above process, and the electrostatic for producing
If can not eliminate in time, accumulation will be produced on ITO circuits, when electrostatic reaches certain intensity, it is possible at this
Electrostatic breakdown phenomenon is produced on ITO circuits, so as to cause the problem of ITO line impairments, the total quality of touch screen is have impact on.
Based on this, it is necessary to design a kind of Etaching device that can effectively prevent electrostatic, by effective minimizing electrostatic
Produce and farthest protect ITO circuits not breakdown to ensure the overall quality of production of touch screen.
Utility model content
Based on this, the purpose of this utility model is to provide a kind of Etaching device that can effectively prevent electrostatic, by effective
The generation of minimizing electrostatic and farthest ensure ITO circuits not because electrostatic breakdown produces damage, so as to improve on the whole
The quality of touch screen.
To solve above-mentioned technical problem, this utility model provides a kind of antistatic Etaching device, the antistatic etching dress
Etch component, overlay film component, Buffer Unit and rewinding component are sequentially provided with putting, the overlay film component includes overlay film rotating shaft group
Part and driven spindle, the overlay film rotating assembly include the first overlay film rotating shaft, the second overlay film rotating shaft and auxiliary rotating shaft, described
Second overlay film rotating shaft drives the first overlay film rotating shaft to be rotated by auxiliary rotating shaft, for carrying out overlay film processing behaviour
Make, the overlay film component is located between the etch component and the Buffer Unit.
Antistatic Etaching device of the present utility model effectively can be eliminated because of contact during production is processed
Or the electrostatic produced by separating, solve the problems, such as to cause circuit to puncture because of static buildup.
Above-mentioned antistatic Etaching device, wherein, the etch component includes etching solution spray equipment and actuating device, institute
Etching solution spray equipment is stated positioned at the surface of the actuating device.
Above-mentioned antistatic Etaching device, wherein, the top of the etching solution spray equipment is provided with rotary shaft, the etching solution
The inside of spray equipment is provided with etching solution storage tank, conduit and spray post, and the conduit is housed for connecting the etching solution
Groove and the spray post.
Above-mentioned antistatic Etaching device, wherein, in cylinder, the spray post is equal in a ring for the etching solution spray equipment
The even bottom located at the etching solution spray equipment.
Above-mentioned antistatic Etaching device, wherein, the moving direction of the etching solution spray equipment is parallel to the transmission dress
Put.
Above-mentioned antistatic Etaching device, wherein, the direct of travel of the actuating device is near the one of the overlay film component
Side.
Above-mentioned antistatic Etaching device, wherein, the Buffer Unit is located at the overlay film component and the rewinding component
Between.
Above-mentioned antistatic Etaching device, wherein, the Buffer Unit includes buffering rotating shaft, the quantity model of the buffering rotating shaft
Enclose for 3 to 6.
Above-mentioned antistatic Etaching device, wherein, one group of Destaticizing device, the Destaticizing device are provided with the overlay film component
To destatic ion bar.
Above-mentioned antistatic Etaching device, wherein, the material in the overlay film component for overlay film is Antistatic protective film.
Description of the drawings
Fig. 1 be the utility model proposes a kind of antistatic Etaching device overall structure diagram；
Schematic enlarged-scale views of the Fig. 2 for etch component in the antistatic Etaching device shown in Fig. 1；
Schematic enlarged-scale views of the Fig. 3 for overlay film component in the antistatic Etaching device shown in Fig. 1；
Schematic enlarged-scale views of the Fig. 4 for Buffer Unit in the antistatic Etaching device shown in Fig. 1.
Primary symbols explanation：
| Etch component | 11 | Antistatic protective film | 123 |
| Overlay film component | 12 | Destaticizing device | 124 |
| Buffer Unit | 13 | Buffering rotating shaft | 131 |
| Rewinding component | 14 | Etching solution storage tank | 1121 |
| Etching solution spray equipment | 110 | Conduit | 1122 |
| Rotary shaft | 111 | Spray post | 1123 |
| Spray assemblies | 112 | First overlay film rotating shaft | 1211 |
| Actuating device | 113 | Auxiliary rotating shaft | 1212 |
| Overlay film rotating assembly | 121 | Second overlay film rotating shaft | 1213 |
| Driven spindle | 122 |
Specific embodiment
For the ease of understanding this utility model, this utility model is more fully retouched below with reference to relevant drawings
State.First-selected embodiment of the present utility model is given in accompanying drawing.But, this utility model can come real in many different forms
It is existing, however it is not limited to embodiment described herein.On the contrary, the purpose for providing these embodiments is made to public affairs of the present utility model
Open content more thorough comprehensive.
It should be noted that when element is referred to as " being fixedly arranged on " another element, it can directly on another element
Or can also there is element placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or may be simultaneously present centering elements.Term as used herein " vertical ", " level ", " left side ",
" right side " and similar statement are for illustrative purposes only.
Unless otherwise defined, all of technology used herein and scientific terminology and the technical field for belonging to the present invention
The implication that technical staff is generally understood that is identical.The term for being used in the description of the invention herein is intended merely to description tool
The purpose of the embodiment of body, it is not intended that of the invention in limiting.Term as used herein " and/or " including one or more phases
The arbitrary and all of combination of the Listed Items of pass.
Refer to Fig. 1 to Fig. 4, Fig. 1 be the utility model proposes a kind of overall structure of antistatic Etaching device illustrate
Figure, schematic enlarged-scale views of the Fig. 2 for etch component 11 in the antistatic Etaching device shown in Fig. 1, Fig. 3 is the antistatic shown in Fig. 1
The schematic enlarged-scale view of overlay film component 12 in Etaching device, knots of the Fig. 4 for Buffer Unit 13 in the antistatic Etaching device shown in Fig. 1
Structure enlarged drawing, is sequentially provided with etch component 11, overlay film component 12, Buffer Unit 13 and rewinding in the antistatic Etaching device
Component 14, the overlay film component 12 include overlay film rotating assembly 121 and driven spindle 122, and the overlay film rotating assembly 121 is wrapped
The first overlay film rotating shaft 1211, the second overlay film rotating shaft 1213 and auxiliary rotating shaft 1212 are included, second overlay film rotating shaft 1213 passes through
Auxiliary rotating shaft 1212 drives first overlay film rotating shaft 1211 to be rotated, for carrying out overlay film process operation, described to cover
Membrane module 12 is located between the etch component 11 and the Buffer Unit 13.
Wherein, the etch component 11 includes etching solution spray equipment 110 and actuating device 113, the etching solution spray
Shower device 110 is located at the surface of the actuating device 113.The Film of processing to be etched is placed with the actuating device 113
Product, the etching solution spray equipment 110 for spraying etching solution on the Film products to be processed, consequently facilitating being lost
Carve processing.
The top of the etching solution spray equipment 110 is provided with rotary shaft 111, the inside of the etching solution spray equipment 110
Spray assemblies 112 are provided with, the spray assemblies 112 include etching solution storage tank 1121, conduit 1122 and spray post 1123, institute
Conduit 1122 is stated for connecting the etching solution storage tank 1121 and the spray post 1123.The etching solution spray equipment
110 is in cylinder, and the spray post 1123 is in a ring uniformly located at the bottom of the etching solution spray equipment 110, the etching
The moving direction of liquid spray equipment 110 is parallel to the actuating device 113.The rotary shaft 111 can cause the etching solution spray
Shower device 110 is circled in the horizontal direction, further, since the spray post 1123 is uniformly located at the etching in a ring
The bottom of liquid spray equipment 110, the setting at utmost can ensure that the spray area of etching solution is maximum in Shangdi, and be conducive to
Sprinkling is uniform, it is to avoid because the uneven etching and processing problem for causing of sprinkling.
The direct of travel of the actuating device 113 is near the side of the overlay film component 12, after etching and processing
Film products be sent in overlay film component 12 by the actuating device 113 and carry out overlay film processing.The Buffer Unit 13 sets
Between the overlay film component 12 and the rewinding component 14, the Buffer Unit 13 includes buffering rotating shaft 131, the buffering
The quantitative range of rotating shaft 131 is 3 to 6.In the present embodiment, the quantity of buffering rotating shaft 131 is 5, the Buffer Unit 13
It is provided with beneficial to follow-up rewinding operation.
Additionally, one group of Destaticizing device 124 is provided with the overlay film component 12, it is in the present embodiment, described to destatic dress
124 are put to destatic ion bar.The Film products of the processing to be etched successively will be through medicinal liquid in the etch component 11
The operations such as erosion is washed, pure water cleaning, the demoulding and drying, due to before baking wet of the Film products in the etch component 11
Degree is still larger, therefore the electrostatic produced between roller is relatively small.When the Film products in the etch component 11
After baking operation, as humidity drastically declines, cause to be easy to produce phase during friction between the Film products and roller
To higher electrostatic, and can not eliminate in the short period of time, it is breakdown that this would potentially result in ITO circuits.Therefore, in this reality
Apply in example, we the Film products just will enter the overlay film component 12 in position at arrange one group described in destatic dress
124 are put, the Destaticizing device 124 is to destatic ion bar.The Destaticizing device 124 can effectively eliminate Film products with rolling
When rubbing between wheel, produced electrostatic, prevents the ITO circuits in Film products breakdown.
After above-mentioned Destaticizing device 124 is provided with, it is ensured that the Film products are having just enter into the overlay film
There is no electrostatic when in component 12, but the inevitably generation between roller in subsequent process due to the Film products
Rubbing action, therefore also may proceed to produce a certain amount of electrostatic.For this technical problem, in the present embodiment, in the overlay film
One Antistatic protective film 123 is set in component 12, as the Antistatic protective film 123 is present containing partially electronically conductive microgranule itself,
Therefore most electric current all can be derived, eliminates electrostatic to a great extent.The Antistatic protective film 123 coordinates above-mentioned
Destaticizing device 124, at utmost can eliminate to the electrostatic produced by rubbing between Film products and roller Shangdi, from
And avoid the breakdown problem to ITO circuits because caused by static buildup electric discharge.
In actual use, Film products to be processed are positioned on the actuating device 113, the etching solution
Spray equipment 110 along on the direction parallel to the actuating device 113 can be moved freely and can be made in the horizontal direction
Uniform circular motion so that the etching solution on the spray Film products to be processed is more uniformly distributed.Operation journey is etched when completing
After sequence, Film products are sent in the overlay film component 12 by the actuating device 113 and carry out aluminum coated steel.At overlay film
The Antistatic protective film 123 is posted on the surface of the Film products (such as DES lines) after reason, and the Antistatic protective film 123 is by ITO
Circuit is all protected, so as to ensure that ITO circuits will not be breakdown because of static discharge.
Embodiment described above only expresses first-selected embodiment of the present utility model, and its description is more concrete and detailed,
But therefore can not be interpreted as the restriction to this utility model the scope of the claims.It should be pointed out that common for this area
For technical staff, without departing from the concept of the premise utility, some deformations and improvement can also be made, these all belong to
In protection domain of the present utility model.Therefore, the protection domain of this utility model patent should be defined by claims.
Claims (10)
1. a kind of antistatic Etaching device, it is characterised in that be sequentially provided with etch component, overlay film in the antistatic Etaching device
Component, Buffer Unit and rewinding component, the overlay film component include overlay film rotating assembly and driven spindle, and the overlay film turns
Shaft assembly includes the first overlay film rotating shaft, the second overlay film rotating shaft and auxiliary rotating shaft, and second overlay film rotating shaft is by the auxiliary
Rotating shaft drives the first overlay film rotating shaft to be rotated, and for carrying out overlay film process operation, the overlay film component is located at the erosion
Carve between component and the Buffer Unit.
2. antistatic Etaching device according to claim 1, it is characterised in that the etch component includes that etching solution is sprayed
Device and actuating device, the etching solution spray equipment are located at the surface of the actuating device.
3. antistatic Etaching device according to claim 2, it is characterised in that the top of the etching solution spray equipment sets
The inside for having rotary shaft, the etching solution spray equipment is provided with etching solution storage tank, conduit and spray post, and the conduit is used for
Connect the etching solution storage tank and the spray post.
4. antistatic Etaching device according to claim 3, it is characterised in that the etching solution spray equipment is in cylinder
Body, the spray post is in a ring uniformly located at the bottom of the etching solution spray equipment.
5. antistatic Etaching device according to claim 2, it is characterised in that the mobile side of the etching solution spray equipment
To parallel to the actuating device.
6. antistatic Etaching device according to claim 5, it is characterised in that the direct of travel of the actuating device be by
The side of the nearly overlay film component.
7. antistatic Etaching device according to claim 1, it is characterised in that the Buffer Unit is located at the overlay film component
And between the rewinding component.
8. antistatic Etaching device according to claim 7, it is characterised in that the Buffer Unit includes buffering rotating shaft,
The quantitative range of buffering rotating shaft is 3 to 6.
9. antistatic Etaching device according to claim 1, it is characterised in that a group is provided with the overlay film component except quiet
Electric installation, the Destaticizing device are to destatic ion bar.
10. antistatic Etaching device according to claim 1, it is characterised in that for being covered in the overlay film component
The material of film is Antistatic protective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620831883.5U CN206133503U (en) | 2016-08-03 | 2016-08-03 | Prevent static etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620831883.5U CN206133503U (en) | 2016-08-03 | 2016-08-03 | Prevent static etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206133503U true CN206133503U (en) | 2017-04-26 |
Family
ID=58562702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620831883.5U Active CN206133503U (en) | 2016-08-03 | 2016-08-03 | Prevent static etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206133503U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112735991A (en) * | 2021-01-28 | 2021-04-30 | 上海华力微电子有限公司 | Wet etching base and wet processing chemical table |
-
2016
- 2016-08-03 CN CN201620831883.5U patent/CN206133503U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112735991A (en) * | 2021-01-28 | 2021-04-30 | 上海华力微电子有限公司 | Wet etching base and wet processing chemical table |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220218 Address after: 321000 building 10, No. 528, Jiuding Road, Yongkang Economic Development Zone, Jinhua City, Zhejiang Province (self declaration) Patentee after: Zhejiang lianxinkang Technology Co.,Ltd. Address before: 330096 No.59, Chuangxin 1st Road, high tech Development Zone, Nanchang City, Jiangxi Province Patentee before: JIANGXI UNITED THOUGHT TOUCH TECHNOLOGY CO.,LTD. |
|
| TR01 | Transfer of patent right |