CN205861564U - Substrate imperfection detection device - Google Patents
Substrate imperfection detection device Download PDFInfo
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- CN205861564U CN205861564U CN201620578394.3U CN201620578394U CN205861564U CN 205861564 U CN205861564 U CN 205861564U CN 201620578394 U CN201620578394 U CN 201620578394U CN 205861564 U CN205861564 U CN 205861564U
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Abstract
The open a kind of substrate imperfection detection device of this utility model, in order to detect a base material.Substrate imperfection detection device includes a conveyer device, a light-source generation device, an image acquiring device, control device and a dust collect plant.Conveyer device includes the first and second conveyer devices.Light-source generation device includes one for producing the first light source generation unit and of a first detection light source being radiated on the base material being positioned at one first detection region for producing the secondary light source generation unit of a second detection light source being radiated on the base material being positioned at one second detection region.Image acquiring device includes one first image acquisition unit and one second image acquisition unit.First image acquisition unit is positioned at one first image information in the first detection region for obtaining.Second image acquisition unit is positioned at one second image information in the second detection region for obtaining.Whereby, substrate imperfection disclosed in the utility model detection device can improve substrate surface defect identification rate.
Description
Technical field
This utility model relates to a kind of defect detecting device, particularly relates to a kind of scarce by judging whether substrate surface has
The existence fallen into is to reach to promote the substrate imperfection detection device of base material detection speed and accuracy.
Background technology
Product now mostly reduces production cost with a large amount of productions, and the while of mass-produced, detection device how
Can effectively detect one of problem of becoming important, and before production, making the material needed for product mostly must be first through inspection
Survey, use and eliminate tool defective material, and then improve the qualification rate of product and reduce production cost.
Many products produce with base material manufacture, and therefore, base material detection has very important shadow for the qualification rate produced
Ringing, wherein, the detection of base material often needs to confirm or positive and negative two surfaces of base material are the most defective, such as: depression, protruding, damaged,
The problems such as scratch or scratch.
Therefore to provide quality preferably base material, it will usually by manually carrying out visual detection, by base material is arranged
On a conveyer belt, and it is observed with human eye, detects whether these base materials have flaw, and note down those defect areas.But,
Carry out the mode detected above by human eye, easily because eyes produce fatigue or erroneous judgement under observation for a long time, start
Produce substrate imperfection and distinguish the situation that rate declines, and the defect dipoles standard for single product also can be inconsistent.Additionally, also by
Then passing through human eye to detect, therefore base material speed on the conveyor belt can not be the fastest.Furthermore, it is understood that when defect is the least
Time, human eye just cannot be carried out identification, is also required to be observed by image amplifier to identification, but, before still producing
State problem.
Further, the detection of base material often needs to confirm that positive and negative two surfaces of base material are the most defective, and existing measuring tool
The most first detect a surface of base material, then base material is overturn the detection carrying out another surface, whereby, and reach the two-sided detection of base material
Effect.But, base material upset is carried out the mode of two-sided detection by existing measuring tool, for frangible or pliable base material
The inconvenience in detection and problem certainly will be caused.
Therefore, how to provide one can improve substrate surface defect identification rate, and avoid turning up base material, with
Overcome above-mentioned defect, become one of the sector important topic to be solved already.
Utility model content
Technical problem to be solved in the utility model is, provides a kind of substrate imperfection inspection for the deficiencies in the prior art
Survey device, to reach quickly detect base material and avoid stirring the effect of base material.
In order to solve above-mentioned technical problem, the wherein technical scheme that this utility model is used is to provide a kind of base
Material defect detecting device, in order to detect a first surface of a base material and relative to the second surface of described first surface, its
In, described substrate imperfection detection device includes a conveyer device, a light-source generation device, an image acquiring device, a control dress
Put and a dust collect plant.Described conveyer device includes one first supply unit and one second supply unit.Described first conveying
Unit has one first loading end, and wherein said base material is arranged on described first loading end, and described base material passes through described first
Supply unit is to transmit.Described second supply unit and described first supply unit correspond to each other setting, wherein said
Second supply unit has one second loading end, and described first supply unit transmits described base material to described second supply unit
On described second loading end.Described light-source generation device includes one first light source generation unit and a secondary light source generation unit.
Described first light source generation unit is for producing first inspection being radiated on the described base material being positioned at one first detection region
Light-metering source.Described secondary light source generation unit is radiated on the described base material being positioned at one second detection region for producing one
Second detection light source, wherein said second detection region is between described first supply unit and described second supply unit.
The setting corresponding with described light-source generation device of described image acquiring device, described image acquiring device includes that one first image obtains
Take unit and one second image acquisition unit.Described first image acquisition unit is relative to each other with described first light source generation unit
Should arrange, described first image acquisition unit is for obtaining one first figure of the described base material being positioned at described first detection region
As information.Described second image acquisition unit and described secondary light source generation unit correspond to each other setting, described second image
Acquiring unit is for obtaining one second image information of the described base material being positioned at described second detection region.Described control device
It is electrically connected at described first image acquisition unit and described second image acquisition unit, to receive described first Image Acquisition list
Described first image information accessed by unit and described second image information accessed by described second image acquisition unit.
Described dust collect plant is neighboringly arranged at the side of described first supply unit.Wherein, described first image information and described
Two image informations are by the computing of described control device, to obtain the one first of one first defect areas being positioned on described base material
Flaw information and one second flaw information of one second defect areas.
Further, described base material is Copper Foil substrate.
Further, described substrate imperfection detection device may further comprise: a support means, described support means bag
Including a guide wheel being arranged between described first supply unit and described second supply unit, wherein said guide wheel holds
Carry the described base material between described first supply unit and described second supply unit.
Further, described support means is used for being carried through described first supply unit and described second supply unit
Between the side of described base material.
Further, described substrate imperfection detection device may further comprise: that a bogey, described bogey set
Being placed between described first supply unit and described second supply unit, described bogey has a load plane, described in hold
Carry plane in the face of described first loading end and described second loading end, and described load plane and described first loading end and described
Second loading end is at a distance of a preset space length.
Further, described substrate imperfection detection device may further comprise: a support means, described support means bag
Include one for providing the gas feed unit of a gas, between described first supply unit and described second supply unit
Described base material by the support of described gas, with by described base material pressing on described load plane.
Further, described bogey also has a roller, and described roller drives the movement of described load plane, institute
State base material to be moved with the direction towards described second supply unit by the drive of described load plane.
Further, described first supply unit still further comprises one first delivery wheel and one first conveyer belt, institute
Stating the first loading end to be positioned on described first conveyer belt, described second supply unit still further comprises one second delivery wheel and
Second conveyer belt, described second loading end is positioned on described second conveyer belt.
Further, the first detection region that described first image acquisition unit is projected is positioned at the described of described base material
First surface, the second detection region that described second image acquisition unit is projected is positioned at the described second surface of described base material.
Further, described first detection light source and the second detection light source are linear light sorurce.
The beneficial effects of the utility model can be, the substrate imperfection detection device that this utility model embodiment is provided
Can by secondary light source generation unit produced one be radiated at be positioned at one second detection region second detect light source so that
Second image acquisition unit can obtain one second image information of the base material being positioned at the second detection region, and then judges base material
Second surface whether there is defect.Additionally, by second image acquisition unit detection base material second surface, base material need not into
Row turn-over, therefore base material to be detected is not limited by frangible or pliable, therefore, type of substrate that can be examined is wider.Further, logical
Cross coherent flow process to detect, can quickly obtain the testing result on upper and lower two surfaces of base material.
It is further understood that feature of the present utility model and technology contents for enabling, refers to below in connection with this utility model
Detailed description and accompanying drawing, but the accompanying drawing provided only provide with reference to and explanation use, be not used for this utility model in addition
Limit.
Accompanying drawing explanation
Fig. 1 is the schematic perspective view of the substrate imperfection detection device of this utility model first embodiment.
Fig. 2 is a wherein front-view schematic diagram of the substrate imperfection detection device of this utility model first embodiment.
Fig. 3 is an other front-view schematic diagram of the substrate imperfection detection device of this utility model first embodiment.
Fig. 4 is the defect schematic diagram of the base material of this utility model embodiment.
Fig. 5 is the front-view schematic diagram of the substrate imperfection detection device of this utility model the second embodiment.
Fig. 6 is the schematic top plan view of the substrate imperfection detection device of this utility model the second embodiment.
Fig. 7 is a wherein front-view schematic diagram of the substrate imperfection detection device of this utility model the 3rd embodiment.
Fig. 8 is an other front-view schematic diagram of the substrate imperfection detection device of this utility model the 3rd embodiment.
Fig. 9 is another front-view schematic diagram of the substrate imperfection detection device of this utility model the 3rd embodiment.
Detailed description of the invention
The following is, by specific instantiation, relevant " substrate imperfection detection device " disclosed in this utility model is described
Embodiment, those skilled in the art can be understood advantage of the present utility model and effect by content disclosed in this specification.
This utility model can be implemented by other different specific embodiments or be applied, and the every details in this specification also can base
In different viewpoints and application, under not departing from spirit of the present utility model, carry out various modification and change.It addition, this utility model
Accompanying drawing be only the most schematically illustrate, not according to the description of actual size, stated.Following embodiment will be the most detailed
Describe bright correlation technique content of the present utility model in detail, but disclosure of that be not used to limit technology model of the present utility model
Enclose.
First embodiment
First, referring to shown in Fig. 1 to Fig. 3, this utility model first embodiment provides a kind of substrate imperfection detection device
Q, in order to detect a first surface B1 (such as: upper surface) and a second surface B2 relative to first surface B1 of a base material B
(such as: lower surface).Substrate imperfection detection device Q can include conveyer device 1, light-source generation device 2, Image Acquisition dress
Put 3 and one and control device 4.Whereby, base material B can be obtained by the image of the irradiation of light-source generation device 2 and image acquiring device 3
Take, whether there is flaw with the surface (first surface B1 and second surface B2) or inside judging base material B.For example, with this
For utility model embodiment, base material B to be detected, it may be that transmitting substrate or alternatively non-transparent base material, e.g. has light transmission
Thin film or sheet material, or the thin film of non-light transmittance or sheet material, right this utility model is not limited.Preferably, it is also possible to
It is applicable to the detection of Copper Foil substrate (copper clad laminate, CCL).It addition, flaw can be protruding flaw, the depression flaw
Defect, impurity flaw, (having impurity in base material B) or bright spot (undissolved micelle in Copper Foil substrate) exist.Whereby, can lead to
Cross image information accessed by image acquiring device 3, and by image information by controlling the computing of device 4, and obtain being positioned at base
One flaw information of the defect areas on material B.
According to above-mentioned, specifically, conveyer device 1 include one first supply unit 11 and one and first supply unit 11 that
Second supply unit 12 of this corresponding setting.Base material B can be transported to the second supply unit 12 by the first supply unit 11
On.First supply unit 11 has one first loading end 1121, and base material B may be disposed on the first loading end 1121, with by first
Supply unit 11 is sent to the second supply unit 12.It is other that second supply unit 12 is neighboringly arranged at the first supply unit 11, with
Receive the base material B transmitted by the first supply unit 11.Second supply unit 12 has one second loading end 1221, the first conveying
Unit 11 transmits base material B and puts on the second loading end 1221.It is noted that conveyer device 1 can be electrically connected at control device
4, so that the first supply unit 11 and the second supply unit 12 are controlled by control device 4 respectively.
According to above-mentioned, the first supply unit 11 can include one first delivery wheel 111 and one first conveyer belt 112, and first holds
Section 1121 is positioned on the first conveyer belt 112.Second supply unit 12 can include one second delivery wheel 121 and one second conveyer belt
122, the second loading end 1221 is positioned on the second conveyer belt 122.Whereby, base material B can be transported to first by the first supply unit 11
On detection region Z1, to detect the first surface B1 of base material B, and the upper surface of detection base material B.It addition, the second supply unit 12
Base material B can be transported on one second detection region Z2, to detect the second surface B2 of base material B, and the following table of detection base material B
Face.For this utility model embodiment, the second detection region Z2 can be located at the first supply unit 11 and the second supply unit 12
Between.
According to above-mentioned, light-source generation device 2 can include one first light source generation unit 21 and a secondary light source generation unit
22.First light source generation unit 21 can be used for producing first inspection being radiated on the base material B being positioned at the first detection region Z1
Light-metering source L1.Secondary light source generation unit 22 can be used for producing one and is radiated on the base material B being positioned at the second detection region Z2
Second detection light source L2.For example, the first light source generation unit 21 and secondary light source generation unit 22 can be by multiple
The luminous lamp strip that near-infrafed photodiodes (Light-Emitting Diode, LED) is formed so that the first light source generation unit 21 and
The first detection light source L1 and the second detection light source L2 that secondary light source generation unit 22 projects respectively are linear light sorurce, so this reality
It is not limited with novel.
According to above-mentioned, seeing also shown in Fig. 1, Fig. 3 and Fig. 4, image acquiring device 3 can be with light-source generation device 2 phase
It is correspondingly arranged, with the light source by light-source generation device 2 be projeced into base material B, and detects the defect of base material B.New with this practicality
For type embodiment, image acquiring device 3 can include one first image acquisition unit 31 and one second image acquisition unit 32.The
One image acquisition unit 31 and the first light source generation unit 21 correspond to each other setting, with the first table by being incident upon base material B
The first detection light source L1 on the B1 of face, and whether the first surface B1 detecting base material B has one first defect areas F1, and obtain
The first flaw information in first defect areas F1.It addition, the second image acquisition unit 32 and secondary light source generation unit 22 that
This corresponding setting, with the second detection light source L2 by being incident upon on the second surface B2 of base material B, and detects the of base material B
Whether two surface B2 have one second defect areas F2, and obtain the second flaw information in the second defect areas F2.In other words
Saying, the first detection region Z1 that the first image acquisition unit 31 is projected is positioned at the first surface B1 of base material B, the second Image Acquisition
The second detection region Z2 that unit 32 is projected is positioned at the second surface B2 of base material B.
For example, as shown in Figures 2 to 4, the first light source generation unit 21 and the first image acquisition unit 31 can be arranged
In the top of the first supply unit 11, whereby to detect the first surface B1 by the base material B on the first detection region Z1.Separately
Outward, secondary light source generation unit 22 and the second image acquisition unit 32 can be arranged at the first supply unit 11 and the second conveying is single
Between unit 12, or it is arranged at below the first supply unit 11 or the second supply unit 12, whereby with detection by the second inspection
The second surface B2 of the base material B on survey region Z2.Specifically, in order to detect the second surface B2 of base material B and in order to avoid turning over
Turn base material B and cause the damage of base material B, when base material B is moved to second defeated by the first loading end 1121 of the first supply unit 11
During sending on the second loading end 1221 of unit 12, base material B will be because of the first supply unit 11 and the second supply unit 12
It is separated from each other, and makes the second surface B2 of base material B can be exposed and go out.Whereby, the first light source generation unit 21 can produce
One the second detection light source L2 being incident upon on the second surface B2 of base material B, meanwhile, the second image acquisition unit 32 can also obtain
The second defect areas F2 by the second surface B2 of the base material B on the second detection region Z2.
According to above-mentioned, control device 4 and can be electrically connected at the first image acquisition unit 31 and the second image acquisition unit 32,
To receive accessed by the first image information accessed by the first image acquisition unit 31 and the second image acquisition unit 32
Second image information.Whereby, the first image information and the second image information can be by controlling the computing of device 4, to be positioned at
One first flaw information of one first defect areas F1 on base material B and one second flaw information of one second defect areas F2.
According to above-mentioned, for this utility model embodiment, the first image acquisition unit 31 and the second image acquisition unit
32 can include CMOS (Complementary Metal-Oxide-Semiconductor,
CMOS) wafer or a charge coupled cell (Charge-coupled Device, CCD) wafer, and the first image acquisition unit 31
And second image acquisition unit 32 be one-dimensional linear image acquiring unit, with in base material B formed scan line.It addition, control
Device 4 can be a computer or a microcontroller (Microcontroller Unit, MCU), with control conveyer device 1 and
Image acquiring device 3.What deserves to be explained is, if base material B to be detected has a predetermined length, can be by an electric connection
In recording the length information of base material B to be detected in the code unit (not shown) of counting controlling device 4, and this length information is passed
Deliver to control in device 4.Whereby, controlling device 4 can be according to this length information, the first image information and the second image information
Judge the first flaw information and the second flaw information of every a collection of base material B to be detected, can record simultaneously base material B what section, what
What defect position has, and these the first flaw information and the second flaw information is recorded in control device 4, in order to follow-up makes
With.
What deserves to be explained is, in order to avoid dust affects the first surface B1 on base material B and second surface B2, and cause
One image acquisition unit 31 and the second image acquisition unit 32 to the first defect areas F1 and the erroneous judgement of the second defect areas F2, and
First image information of transmission mistake and the second image information, this utility model embodiment can further include a dust dress
Putting 5, dust collect plant 5 can neighboringly be arranged at the first supply unit 11 side.Whereby, can be at base material B by the first detection zone
Before the Z1 of territory, first pass through dust collect plant 5 and the first surface B1 of base material B is carried out dust suction, will be located in the first surface B1 of base material B
Dust or Impurity removal.Preferably, it is also possible to before the second detection region Z2, a dust collect plant 5 is set (in figure further
Not shown), before at base material B by the second detection region Z2, the dust or the impurity that will be located in the second surface B2 of base material B go
Remove.
Second embodiment
First, referring to shown in Fig. 5 and Fig. 6, this utility model the second embodiment provides a kind of substrate imperfection detection device
Q ', from the comparison of Fig. 5 and Fig. 2, the second embodiment is with the difference of first embodiment maximum: the second embodiment is provided
Substrate imperfection detection device Q ' still further comprise a support means 6, support means 6 can include that one is arranged at the first conveying list
Guide wheel 61 between unit 11 and the second supply unit 12.Whereby, guide wheel 61 can be carried through the first supply unit 11
And the side of the base material B that second between supply unit 12, the second surface B2 of base material B is obtained in order to the second image acquisition unit 32
On the second defect areas F2.
Specifically, base material B by the transmission of the first supply unit 11, and can be sent to the end of the first supply unit 11
Not-go-end, and can be the most unsettled towards the base material B of the second supply unit 12, it is sent to the most again on guide wheel 61 for second
Image acquisition unit 32 obtains image.Should be noted that, although in Fig. 5, the second detection light source is radiated at one and is positioned at two guide wheel lists
In the second detection region between unit 61, but, in other embodiments, the second detection light source is radiated at by the first conveying single
Unit 11 transmit and on the second surface B2 of unsettled base material B outside so that the second image acquisition unit 32 can obtain unsettled
And the base material B image of the second detection region Z2 gone out.In other words, the second detection region Z2 may be located at the first supply unit 11
And between guide wheel 61, or between guide wheel 61 and the second supply unit 12.
It addition, should be noted that, first supply unit 11 of substrate imperfection that the second embodiment is provided detection device Q ',
Second supply unit the 12, first light source generation unit 21, secondary light source generation unit the 22, first image acquisition unit 31, second
Image acquisition unit 32, control device 4 and dust collect plant 5 are similar with the structure described in aforementioned first embodiment, hold not at this
Repeat again.
3rd embodiment
First, referring to shown in Fig. 7 to Fig. 9, this utility model the 3rd embodiment provides a kind of substrate imperfection detection device
Q ", from the comparison of Fig. 7 and Fig. 2, the 3rd embodiment is with the difference of first embodiment maximum: the 3rd embodiment is provided
Substrate imperfection detection device Q " still further comprise a support means 6, support means 6 includes one for providing a gas G's
Gas feed unit 62, whereby, the 3rd embodiment is applicable to detect base material B that is relatively thin and that have bend somewhat.Supplied by gas
To unit 62, gas is brushed towards base material B so that gas G is provided that a support force, to support by the first supply unit 11
And the base material B that second between supply unit 12 so that base material B can soar.
Preferably, in the third embodiment, it is also possible to further provide for a bogey 7, bogey 7 may be disposed at
Between one supply unit 11 and the second supply unit 12.Specifically, bogey has load plane 71 and a roller 72,
Roller 72 can drive the movement of load plane 71.First loading end 1121 and the second loading end 1221 faced by load plane 71, and
Load plane 71 and the first loading end 1121 and the second loading end 1221 are at a distance of a preset space length D.Subsidiary one carries, preset space length D
Can adjust according to the distance between the first surface B1 of base material B to second surface B2, say, that can be according to base material B
Thickness degree and adjust.
According to above-mentioned, by gas feed unit 62, gas is brushed towards base material B so that gas G is provided that a support
Power, to support by the base material B between the first supply unit 11 and the second supply unit 12.Meanwhile, so that the first image
Acquiring unit 31 can obtain the second surface B2 of smooth base material B, the gas provided by gas feed unit 62, and executes
Add support force on base material B so that base material B is pressed on load plane 71.Then, roller 72 can drive the shifting of load plane 71
Dynamic, to drive base material B to move towards the direction of the second supply unit 12 indirectly by load plane 71.
It addition, should be noted that, substrate imperfection that the 3rd embodiment is provided detection device Q " the first supply unit 11,
Second supply unit the 12, first light source generation unit 21, secondary light source generation unit the 22, first image acquisition unit 31, second
Image acquisition unit 32, control device 4 and dust collect plant 5 are similar with the structure described in aforementioned first embodiment, hold not at this
Repeat again.
The beneficial effect of embodiment
In sum, the beneficial effects of the utility model can be, the base material that this utility model embodiment is provided lacks
Fall into detection device (Q, Q ', Q ") one to be produced by secondary light source generation unit 22 and be radiated at and be positioned at one second and detect region Z2
The second interior detection light source L2, so that the second image acquisition unit 32 can obtain the base material being positioned at the second detection region Z2
One second image information of B, and then judge whether the second surface B2 of base material B has defect.Additionally, by the second Image Acquisition
Unit 32 detects base material B second surface B2, and base material is made without turn-over, therefore base material B to be detected is not by frangible or pliable
Limiting, therefore, base material B type that can be examined is wider.Further, detected by coherent flow process, can quickly obtain base material B
The testing result on upper and lower two surfaces.
The foregoing is only preferred possible embodiments of the present utility model, not thereby limit to right of the present utility model and want
Ask, so the equivalence techniques change all using this utility model description and accompanying drawing content to be done, be both contained in this practicality new
In the claim of type.
Claims (10)
1. a substrate imperfection detection device, in order to detect a first surface and of a base material relative to described first surface
Second surface, it is characterised in that described substrate imperfection detection device includes:
One conveyer device, described conveyer device includes:
One first supply unit, described first supply unit has one first loading end, and wherein said base material is arranged at described
On one loading end, described base material passes through described first supply unit to transmit；And
One second supply unit, described second supply unit and described first supply unit correspond to each other setting, wherein said
Second supply unit has one second loading end, and described first supply unit transmits described base material to described second supply unit
On described second loading end；
One light-source generation device, described light-source generation device includes:
One first light source generation unit, described first light source generation unit is radiated at for generation one and is positioned at one first detection region
The first detection light source on interior described base material；And
One secondary light source generation unit, described secondary light source generation unit is radiated at for generation one and is positioned at one second detection region
In described base material on the second detection light source, wherein said second detection region is positioned at described first supply unit and described the
Between two supply units；
One image acquiring device, the setting corresponding with described light-source generation device of described image acquiring device, described Image Acquisition
Device includes:
One first image acquisition unit, described first image acquisition unit corresponds to each other with described first light source generation unit and sets
Putting, described first image acquisition unit is for obtaining one first image letter of the described base material being positioned at described first detection region
Breath；And
One second image acquisition unit, described second image acquisition unit corresponds to each other with described secondary light source generation unit and sets
Putting, described second image acquisition unit is for obtaining one second image letter of the described base material being positioned at described second detection region
Breath；
One controls device, and described control device is electrically connected at described first image acquisition unit and described second Image Acquisition list
Unit, to receive described first image information accessed by described first image acquisition unit and described second image acquisition unit
Accessed described second image information；And
One dust collect plant, described dust collect plant is neighboringly arranged at the side of described first supply unit；
Wherein, described first image information and the computing by described control device of described second image information, to be positioned at
One first flaw information of one first defect areas on described base material and one second flaw information of one second defect areas.
2. substrate imperfection detection device as claimed in claim 1, it is characterised in that described base material is Copper Foil substrate.
3. substrate imperfection detection device as claimed in claim 1, it is characterised in that described substrate imperfection detection device also enters
Step includes: a support means, and described support means includes that one is arranged at described first supply unit and described second supply unit
Between guide wheel, wherein said guide wheel is carried through between described first supply unit and described second supply unit
Described base material.
4. substrate imperfection detection device as claimed in claim 3, it is characterised in that described support means is used for being carried through institute
State the side of described base material between the first supply unit and described second supply unit.
5. substrate imperfection detection device as claimed in claim 1, it is characterised in that described substrate imperfection detection device also enters
Step includes: a bogey, and described bogey is arranged between described first supply unit and described second supply unit, institute
Stating bogey and have a load plane, described load plane is in the face of described first loading end and described second loading end, and institute
State load plane and described first loading end and a described second loading end preset space length apart.
6. substrate imperfection detection device as claimed in claim 5, it is characterised in that described substrate imperfection detection device also enters
Step includes: a support means, and described support means includes one for providing the gas feed unit of a gas, through described first
The support by described gas of the described base material between supply unit and described second supply unit, with by described base material pressing in
On described load plane.
7. substrate imperfection detection device as claimed in claim 6, it is characterised in that described bogey also has a roller,
Described roller drive described load plane movement, described base material by the drive of described load plane with towards described second carry
The direction of unit is moved.
8. substrate imperfection detection device as claimed in claim 1, it is characterised in that described first supply unit wraps the most further
Including one first delivery wheel and one first conveyer belt, described first loading end is positioned on described first conveyer belt, described second conveying
Unit still further comprises one second delivery wheel and one second conveyer belt, and described second loading end is positioned at described second conveyer belt
On.
9. substrate imperfection detection device as claimed in claim 1, it is characterised in that described first image acquisition unit is projected
The first detection region be positioned at the described first surface of described base material, the second detection that described second image acquisition unit is projected
Region is positioned at the described second surface of described base material.
10. substrate imperfection detection device as claimed in claim 1, it is characterised in that described first detection light source and the second inspection
Light-metering source is linear light sorurce.
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| CN201620578394.3U CN205861564U (en) | 2016-06-14 | 2016-06-14 | Substrate imperfection detection device |
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| CN201620578394.3U CN205861564U (en) | 2016-06-14 | 2016-06-14 | Substrate imperfection detection device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113670818A (en) * | 2021-07-29 | 2021-11-19 | 永天机械设备制造(深圳)有限公司 | Equipment for simultaneously detecting surface defects of copper-clad plate on double surfaces |
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2016
- 2016-06-14 CN CN201620578394.3U patent/CN205861564U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113670818A (en) * | 2021-07-29 | 2021-11-19 | 永天机械设备制造(深圳)有限公司 | Equipment for simultaneously detecting surface defects of copper-clad plate on double surfaces |
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