CN205750277U - Double-side membrane exposure structure - Google Patents
Double-side membrane exposure structure Download PDFInfo
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- CN205750277U CN205750277U CN201620464559.4U CN201620464559U CN205750277U CN 205750277 U CN205750277 U CN 205750277U CN 201620464559 U CN201620464559 U CN 201620464559U CN 205750277 U CN205750277 U CN 205750277U
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- coquille
- exposure
- ultraviolet light
- exposure station
- double
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Abstract
This utility model relates to flexible electronic product applied technical field, especially double-side membrane exposure structure, has: an exposure station, and this exposure station can realize upper and lower surface exposure；One upper end coquille and a lower end coquille are separately positioned on the upper and lower side of exposure station, and correspondingly ultraviolet light is projected the upper surface of exposure station by this upper end coquille, and correspondingly ultraviolet light is projected the lower surface of exposure station by lower end coquille；The ultraviolet light that upper end coquille and lower end coquille projection same light source send, upper end coquille and lower end coquille use the mode of operation of successively projection.This utility model realizes double-side membrane exposure, it is not necessary to upset repeats one side exposure work, optimizes technique, promotes work efficiency and work quality.Simple in construction, cost of investment is low, uses and easy maintenance, meets industry and utilizes, the operation effect of significant increase machinery equipment, and reduces operating cost.
Description
Technical field
This utility model relates to thin film is overlying on ITO Film and metal mantle surface, by exposure, develop and etch making mantle circuit, extensively application touch screen Senser, the accurate flexible electronic product applied technical field such as FPC and soft battery, especially volume to volume make the exposure structure on double-faced flexible electronic circuit.
Background technology
In recent years, technological progress along with basic industries such as materials, the design and the production technology that make circuit obtain large development, various new design concepts are widely used and promote, the market trend of electronic product all moves towards to pursue lightening, the base material using circuit is turned to the flexible materials such as thinning glass, metal forming and plastic substrate to replace by traditional glass, Silicon Wafer, that is the soft electronic (or bendable electronics) of general term now.Process equipment, owing to answering the difference of flexible material, needs to import the transmission equipment of volume to volume (RTR), makes electronic circuit and has the advantages that distribution density is high, lightweight, thickness is thin.At double-sided PCB when producing; need to use laminating machine by dry film laminating at surfaces of conductive substrates; then, after ultraviolet light is to MASK irradiation exposure, see that the dry film of light decomposes, dissolve in alkalescence shows liquid; surfaces of conductive substrates leaves the pattern as MASK; then spraying conductive base by etching solution, the conductive layer not having dry film to protect is etched, then removes the residual dry film on base material; making conducting channel exposed out, this is to make circuitry processes.And existing be that single-sided conductive substrate carries out one side film machine, use overlay film, expose, develop, etch and membrane removal, complete the conducting channel work of A face, same method, making B face conducting channel by another wound membrane, be grouped together into double-sided circuit by A, B face conducting channel, operation is loaded down with trivial details, inefficiency, fraction defective is high.
Summary of the invention
The purpose of this utility model is to overcome the defect of prior art, it is provided that a kind of double-side membrane exposure structure, it is achieved two-sided overlay film exposes, it is not necessary to upset repeats one side work, optimizes technique, promotes work efficiency and work quality.
For reaching above-mentioned purpose, this utility model adopts the following technical scheme that
Double-side membrane exposure structure, this structure has:
One exposure station, this exposure station can realize upper and lower surface exposure；
One upper end coquille and a lower end coquille are separately positioned on the upper and lower side of exposure station, and correspondingly ultraviolet light is projected the upper surface of exposure station by this upper end coquille, and correspondingly ultraviolet light is projected the lower surface of exposure station by lower end coquille.
Such scheme is further: the ultraviolet light that described upper end coquille and lower end coquille projection same light source send, upper end coquille and lower end coquille use the mode of operation of successively projection.
Such scheme is further: have optics module guide-lighting between light source and upper end coquille, lower end coquille, optics module at least includes: reflection shield, the first Cold Mirrors, the second Cold Mirrors, compound eye, the ultraviolet light formation light beam that light source sends collected by reflection shield, first Cold Mirrors guides the boundling ultraviolet light that reflection shield sends, project upper end coquille by compound eye and the second Cold Mirrors, or project lower end coquille by compound eye；Second Cold Mirrors is arranged between compound eye and upper end coquille and lower end coquille, and the second Cold Mirrors can move horizontally.
Being compared with the prior art, this utility model provides a kind of double-side membrane exposure structure, it is achieved double-side membrane exposes, it is not necessary to upset repeats one side exposure work, optimizes technique, promotes work efficiency and work quality.Simple in construction, cost of investment is low, uses and easy maintenance, meets industry and utilizes, the operation effect of significant increase machinery equipment, and reduces operating cost.
Accompanying drawing illustrates:
Accompanying drawing 1 is this utility model preferred embodiment structural representation.
Detailed description of the invention:
Below with reference to accompanying drawing, the technique effect of design of the present utility model, concrete structure and generation is described further, to be fully understood from the purpose of this utility model, feature and effect.
Refering to shown in Fig. 1, it is preferred embodiment schematic diagram of the present utility model, the relevant a kind of double-side membrane exposure structure of this utility model, this structure has an exposure station 1, constructed by corresponding station on double-side membrane exposure structure 100, this exposure station 1 can realize top and bottom exposure, after light-sensitive surface has been covered in i.e. corresponding base material top and bottom, horizontally enters into exposure station 1, top and bottom exposure can be realized, repeat one side work without upset, optimize technique, promote work efficiency and work quality.One upper end coquille 2 and a lower end coquille 3 are separately positioned on the upper and lower side of exposure station 1, correspondingly ultraviolet light is projected above exposure station 1 by this upper end coquille 2, and lower end coquille 3 correspondingly ultraviolet light projects below exposure station 1, it is achieved double-side membrane exposure work.
Shown in Fig. 1, in the present embodiment, described upper end coquille 2 and lower end side coquille 3 project the ultraviolet light that same light source 9 sends, upper end coquille 2 and lower end coquille 3 and use the mode of operation of successively projection.The i.e. top and bottom of exposure station 1 separately exposure, makes full use of same light source 9, simple in construction, and cost of investment is low.The present embodiment the most further, has optics module guide-lighting between light source 9 and upper end coquille 2, lower end coquille 3, and optics module at least includes reflection shield the 4, first Cold Mirrors 5, compound eye 7 and the second Cold Mirrors 6.Second Cold Mirrors 6 is arranged between compound eye 7 and upper end coquille 2 and lower end coquille 3, and the second Cold Mirrors 6 can move horizontally.During work, this ultraviolet light formation light beam that light source 9 sends collected by reflection shield 4, and ultraviolet light beam is when the first Cold Mirrors 5, and wherein part infrared light Cold Mirrors 5, remaining most of pure ultraviolet light changes direction, reflexes on the shutter 8 before compound eye 7；When shutter 8 is opened, and the second Cold Mirrors 6 moves on to side, and ultraviolet light beam dissipates multi beam light through compound eye 7, is incident upon on lower end coquille 3, reflects to form directional light and is radiated at below exposure station 1, the photosensitive dry film below base material is exposed operation.When the second Cold Mirrors 6 moves on to middle position, (when the second Cold Mirrors 6 moves, shutter 8 is first closed, open again etc. moving into place rear shutter 8), ultraviolet light beam dissipates multi beam light through compound eye 7, it is incident upon on the second Cold Mirrors 6, reflect on upper end coquille 2 again, form directional light to be radiated at above exposure station 1, the photosensitive dry film above base material is exposed operation.Lower end coquille 3 quits work simultaneously, reaches switch operating between upper end coquille 2 and lower end coquille 3, so circulates.
Above in association with embodiment, this utility model is elaborated; only for technology of the present utility model design and feature are described; its object is to allow person skilled in the art understand content of the present utility model and to be carried out; protection domain of the present utility model can not be limited with this; therefore all according to this utility model spirit done equivalence change or modify, all should contain in protection domain of the present utility model.
Claims (3)
1. double-side membrane exposure structure, it is characterised in that: this structure has:
One exposure station (1), this exposure station (1) can realize upper and lower surface exposure；
One upper end coquille (2) and a lower end coquille (3) are separately positioned on the upper and lower side of exposure station (1), this upper end coquille (2) correspondingly will project the upper surface exposing station (1) by ultraviolet light, and lower end coquille (3) correspondingly will project the lower surface exposing station (1) by ultraviolet light.
Double-side membrane exposure structure the most according to claim 1, it is characterized in that: the ultraviolet light that described upper end coquille (2) and lower end coquille (3) projection same light source (9) send, upper end coquille (2) and lower end coquille (3) use the mode of operation of successively projection.
Double-side membrane exposure structure the most according to claim 2, it is characterized in that: at light source (9) and upper end coquille (2), there is optics module guide-lighting between lower end coquille (3), optics module at least includes: reflection shield (4), first Cold Mirrors (5), second Cold Mirrors (6), compound eye (7), the ultraviolet light formation light beam that light source (9) sends collected by reflection shield (4), first Cold Mirrors (5) guides the boundling ultraviolet light that reflection shield (4) sends, upper end coquille (2) is projected by compound eye (7) and the second Cold Mirrors (6), or project lower end coquille (3) by compound eye (7)；Second Cold Mirrors (6) is arranged between compound eye (7) and upper end coquille (2) and lower end coquille (3), and the second Cold Mirrors (6) can move horizontally.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620464559.4U CN205750277U (en) | 2016-05-22 | 2016-05-22 | Double-side membrane exposure structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620464559.4U CN205750277U (en) | 2016-05-22 | 2016-05-22 | Double-side membrane exposure structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205750277U true CN205750277U (en) | 2016-11-30 |
Family
ID=57361464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620464559.4U Expired - Fee Related CN205750277U (en) | 2016-05-22 | 2016-05-22 | Double-side membrane exposure structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205750277U (en) |
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2016
- 2016-05-22 CN CN201620464559.4U patent/CN205750277U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161130 |
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| CF01 | Termination of patent right due to non-payment of annual fee |