CN205681690U - A kind of high line direct current hollow-cathode plasma source - Google Patents
A kind of high line direct current hollow-cathode plasma source Download PDFInfo
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- CN205681690U CN205681690U CN201620458331.4U CN201620458331U CN205681690U CN 205681690 U CN205681690 U CN 205681690U CN 201620458331 U CN201620458331 U CN 201620458331U CN 205681690 U CN205681690 U CN 205681690U
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- coreless armature
- striking
- plasma source
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Abstract
The utility model discloses a kind of high line direct current hollow-cathode plasma source, including seal pipe, coreless armature, minus plate, connecting plate, first anode plate, second plate plate, striking spacer and control power supply；Coreless armature is arranged on minus plate；Seal pipe be connected with minus plate and coreless armature is inserted in wherein；Seal pipe top to be provided with for by the gas introduction port in gas input to coreless armature；Connecting plate is for realizing being tightly connected of minus plate and first anode plate, and makes to be formed therebetween electrical potential difference；Form high-density plasma line between second plate plate and coreless armature；Striking spacer is located between coreless armature and second plate plate；Control power supply has positive pole, negative pole and striking pole, and positive pole connects second plate plate, and negative pole connects minus plate, and striking pole connects first anode plate.The utility model can meet the use of multiple gases, it is possible to produces the plasma line of high ionization level, thus effectively increases the transformation efficiency of energy.
Description
Technical field
The utility model relates to lower temperature plasma technology field, particularly relates to a kind of high line direct current hollow cathode
Plasma source.
Background technology
Owing to global energy requirements sharply increases, magnetic confinement nuclear fusion in numerous new forms of energy can be considered as most potential
One of sustainable clean energy resource.And during magnetic confinement device stable operation, plasma and the first wall and divertor material
The problem that material interacts then becomes fusion reactor and realizes that commercialization needs science and the engineering roadblock solving.Due to magnetic confinement device fortune
The high complexity of row environment, carries out online scrutiny difficulty greatly, current commonly used laboratory linear plasma
Can device simulates fusion facility stack operation operating mode, thus provide high intensity, the plasma of stable plasma output to send out
Raw device becomes as key.
At present, it is applied to microwave and the rf (discharge) plasma source of linear plasma body device, due to the coupling of its energy
Inefficient cause plasma flux density too low, it is difficult to the requirement of high flux density in the researchs such as simulation fusion reactor.Three is cloudy
Pole cascade arcs plasma source can produce high-throughout plasma line by arc discharge, but its structure is complicated, gas consumption
Amount is big, need to be equipped with difference cavity and big pumping speed pump group to get rid of neutral gas, be costly and difficult to for expensive gases.
Utility model content
For above-mentioned the deficiencies in the prior art, the utility model provides a kind of high line direct current hollow cathode plasma
Source, it can produce the plasma line of high ionization level, and improve energy conversion efficiency.
For achieving the above object, the technical solution adopted in the utility model is as follows:
A kind of high line direct current hollow-cathode plasma source, including seal pipe, coreless armature, minus plate, connecting plate, the
One positive plate, second plate plate, striking spacer and control power supply, wherein:
Described coreless armature is arranged on minus plate and can front and back regulation move；
The described pipe that seals is connected with minus plate, and is inserted in coreless armature wherein, with the sealing to coreless armature for the realization, and
The pre-made allowance of movement for coreless armature；This sealing pipe top is additionally provided with for leading the gas in gas input to coreless armature
Entrance；
Described first anode plate is used as the arc electrode of plasma source, and described connecting plate is used for realizing minus plate and the first sun
Being tightly connected of pole plate, and make to be formed therebetween electrical potential difference；
Described second plate plate is used as the working electrode of plasma source, itself and first anode plate bottom interval 30～50 lis
Rice, and and coreless armature between formed high-density plasma line；
Described striking spacer is arranged between coreless armature and second plate plate, for controlling the size in striking region, full
The striking of foot gas with various；
Described control power supply has positive pole, negative pole and striking pole, and wherein, positive pole is connected with second plate plate, negative pole and the moon
Pole plate connects, and striking pole is connected with first anode plate.
Further, it is further opened with in described minus plate for being passed through cool down water to cool down coreless armature first
Bosh.
Yet further, it is further opened with in described first anode plate for being passed through cooling water to prevent coreless armature from burning
Lose and damage the second bosh of minus plate.
Further, described first anode plate is additionally provided with insulating barrier.
As preferably, described coreless armature is tantalum pipe or tantalum alloy pipe, and it is arranged on the central axis of minus plate, and leads to
Cross screw lock.
Compared with prior art, the utility model has the advantages that
(1) the utility model simple in construction, reasonable in design, easy to maintenance, low processing cost, it is by sealing pipe, sky
Heart electrode, minus plate, first anode plate, the setting of second plate plate, can meet the use of multiple gases, and achieve high from
The generation of rate plasma line, and then it is effectively improved the transformation efficiency of energy, not only meet the need of scientific research
Want, and for realizing that commercialization provides guarantee.
(2) utilizing the regulation of control power supply and second plate plate, the utility model can in very large range regulate power,
Thus the use meeting different occasion requires, and the plasma beam spot size in the utility model can by negative electrode internal diameter and
Magnetic field configuration is regulated, and therefore range of application is extremely wide.
(3) coreless armature in the utility model is not only convenient for changing, and by movable adjustment mode, also has
The utilization rate that effect improves coreless armature is high.
(4), in the utility model, the distance between second plate plate and coreless armature can select according to actual conditions, typically
It is tens centimetres, second plate plate so can be made to have enough spaces and come the electron temperature of plasma bundle, density etc.
The spatial distribution of parameter diagnoses, thus facilitates scientific research and Process Exploration.
Brief description
Fig. 1 is structural representation of the present utility model.
Wherein, reference is corresponding entitled:
1-seals pipe, 2-gas introduction port, 3-coreless armature, 4-minus plate, 5-the first bosh, 6-connecting plate, 7-
First anode plate, 8-the second bosh, 9-insulating barrier, 10-striking spacer, 11-second plate plate, 12-controls power supply.
Detailed description of the invention
The utility model is described in further detail with embodiment in explanation below in conjunction with the accompanying drawings, and mode of the present utility model includes
But it is not limited only to following example.
Embodiment
As it is shown in figure 1, the utility model to provide a kind of high line for material modification in straight line high-intensity magnetic field device straight
Stream hollow-cathode plasma source, it can produce the plasma line of high ionization level.The utility model includes sealing pipe the 1st,
Coreless armature the 3rd, minus plate the 4th, connecting plate the 6th, first anode plate the 7th, second plate plate the 11st, striking spacer 10 and control power supply 12.Institute
Stating coreless armature 3 to be arranged on minus plate 4, it can be selected for tantalum pipe or tantalum alloy pipe, and by screw lock in minus plate 4 center
On axis.Described sealing pipe 1 is connected with minus plate 4, and is inserted in coreless armature 3 wherein, to realize the sealing to coreless armature,
This sealing pipe top is additionally provided with for by the gas in gas (the such as multiple gases such as Ar, He, N2, H2) input to coreless armature 3
Body introducing port 2.In the present embodiment, in use, coreless armature 3 starts ablation from front end, therefore, in coreless armature front end
After ablation, can slightly deal with regulation coreless armature forward and be continuing with, described sealing pipe 1 is then hollow electricity in length
Certain spatial margin is reserved in the movement of pole.
It additionally, be further opened with the first bosh 5 in described minus plate 4, is used for being passed through cooling water, with to coreless armature
Cool down, prevent coreless armature from excessive ablation occurring because temperature is too high.
Described first anode plate 7 is used as the arc electrode of plasma source, and described connecting plate 6 is used for realizing minus plate 4 and the
Being tightly connected of one positive plate 7, and make to be formed therebetween electrical potential difference.In the present embodiment, described connecting plate 6 uses high temperature resistant
Insulating materials make, realize seal while, minus plate 4 and the insulation of first anode plate 7 can also be realized.Further, institute
The second bosh 8 being further opened with in the first anode plate 7 stated, this bosh 8 is opened near the bottom of first anode plate 7
Mouthful, it is equally used for being passed through cooling water, to prevent from nozzle, ablation occurring because plasma temperature is too high and damaging negative electrode
Plate, it is ensured that the plasma discharge of long-time stable.
In addition, be additionally provided with insulating barrier 9 on described first anode plate 7, this insulating barrier 9 is positioned at first anode plate 7 He
Between vacuum linear magnetic field device, for the insulation between the utility model and vacuum linear magnetic field device, it is ensured that this practicality is new
Impact will not be produced on vacuum linear magnetic field device during type work.
Described second plate plate 11 is used as the working electrode of plasma source, and it is certain with first anode plate 7 bottom interval
Distance (30～50 centimetres), and and coreless armature between formed high-density plasma line.Described striking spacer 10 is then
It is arranged between coreless armature 3 and second plate plate 11, for controlling the size in striking region, meet the striking of gas with various,
In the present embodiment, striking spacer 10 uses the high-temperature insulation material of pottery or congruence property to make.
Described control power supply 12 has positive pole, negative pole and striking pole, and wherein, positive pole is connected with second plate plate 11, negative pole
Being connected with minus plate 4, striking pole is connected with first anode plate 7.
Main operational principle of the present utility model is: utilize gas introduction port 2 to lead in coreless armature 3 via sealing pipe 1
Enter multiple gases, now, between minus plate 4 and first anode plate 7, load certain voltage by controlling power supply 12, make gas
Form the form of arc discharge.Striking of the present utility model uses the striking mode of high-frequency and high-voltage, striking voltage and hollow cathode 2
With the spacing of the first anode, and vacuum pressure be related to, the general striking duration was at several seconds.
After arc discharge, in coreless armature, produce stable plasma, and by effusion bottom first anode plate 7, so
(second plate plate is positioned at the center of vacuum linear magnetic field device to be transported to second plate plate 11 by vacuum linear magnetic field device afterwards
Axial location), thus form the plasma line of high ionization level.
The utility model, by a kind of plasma source of design, can be passed through multiple gases simultaneously, and produce high ionization level
Plasma line, thus improve the transformation efficiency of energy.The utility model is by the tune of control power supply and second plate plate
Joint, the use that can meet different occasion requires, therefore, its scope of application is quite extensive, is very suitable for popularization and application.
Above-described embodiment is only one of preferred embodiment of the present utility model, should not be taken to limit of the present utility model
Protection domain, all in body design thought of the present utility model and the change having no essential meaning made mentally or polishing,
It is solved the technical problem that still consistent with the utility model, all should be included in protection domain of the present utility model it
In.
Claims (5)
1. one kind high line direct current hollow-cathode plasma source, it is characterised in that include seal pipe (1), coreless armature (3),
Minus plate (4), connecting plate (6), first anode plate (7), second plate plate (11), striking spacer (10) and control power supply (12),
Wherein:
Described coreless armature (3) is arranged on minus plate (4) and above and can front and back regulation move；
The described pipe (1) that seals is connected with minus plate (4), and is inserted in coreless armature (3) wherein, with close to coreless armature of realization
Envelope, and be the pre-made allowance of movement of coreless armature；This sealing pipe top is additionally provided with for by gas input to coreless armature
Gas introduction port (2)；
Described first anode plate (7) is used as the arc electrode of plasma source, and described connecting plate (6) is used for realizing minus plate and first
Being tightly connected of positive plate, and make to be formed therebetween electrical potential difference；
Described second plate plate (11) is used as the working electrode of plasma source, its with first anode plate (7) bottom interval 30～
50 centimetres, and and coreless armature between formed high-density plasma line；
Described striking spacer (10) is arranged between coreless armature (3) and second plate plate (11), for controlling striking region
Size, meets the striking of gas with various；
Described control power supply (12) has positive pole, negative pole and striking pole, and wherein, positive pole is connected with second plate plate, negative pole and the moon
Pole plate connects, and striking pole is connected with first anode plate.
2. one according to claim 1 high line direct current hollow-cathode plasma source, it is characterised in that described negative electrode
It is further opened with in plate (4) for being passed through cooling the first bosh (5) to cool down coreless armature for the water.
3. one according to claim 2 high line direct current hollow-cathode plasma source, it is characterised in that described first
It is further opened with in positive plate (7) for being passed through cooling water to prevent coreless armature generation ablation and to damage the second cold of minus plate
But tank (8).
4. one according to claim 3 high line direct current hollow-cathode plasma source, it is characterised in that described first
It is additionally provided with insulating barrier (9) on positive plate (7).
5. the high line of the one according to any one of Claims 1 to 4 direct current hollow-cathode plasma source, its feature exists
In described coreless armature (3) is tantalum pipe or tantalum alloy pipe, and it is arranged on the central axis of minus plate (4), and is locked by screw
Tightly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620458331.4U CN205681690U (en) | 2016-05-19 | 2016-05-19 | A kind of high line direct current hollow-cathode plasma source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620458331.4U CN205681690U (en) | 2016-05-19 | 2016-05-19 | A kind of high line direct current hollow-cathode plasma source |
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| Publication Number | Publication Date |
|---|---|
| CN205681690U true CN205681690U (en) | 2016-11-09 |
Family
ID=57436036
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620458331.4U Withdrawn - After Issue CN205681690U (en) | 2016-05-19 | 2016-05-19 | A kind of high line direct current hollow-cathode plasma source |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105764227A (en) * | 2016-05-19 | 2016-07-13 | 中国工程物理研究院材料研究所 | High-beam direct-current hollow cathode plasma source |
| CN106678007A (en) * | 2016-11-17 | 2017-05-17 | 上海空间推进研究所 | Intelligent cathode moving device |
| CN108932982A (en) * | 2017-05-22 | 2018-12-04 | 成都达信成科技有限公司 | A kind of high line plasma array source for straight line high-intensity magnetic field device |
| CN109600895A (en) * | 2018-11-15 | 2019-04-09 | 合肥聚能电物理高技术开发有限公司 | High density hot cathode plasma source |
-
2016
- 2016-05-19 CN CN201620458331.4U patent/CN205681690U/en not_active Withdrawn - After Issue
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105764227A (en) * | 2016-05-19 | 2016-07-13 | 中国工程物理研究院材料研究所 | High-beam direct-current hollow cathode plasma source |
| CN106678007A (en) * | 2016-11-17 | 2017-05-17 | 上海空间推进研究所 | Intelligent cathode moving device |
| CN108932982A (en) * | 2017-05-22 | 2018-12-04 | 成都达信成科技有限公司 | A kind of high line plasma array source for straight line high-intensity magnetic field device |
| CN109600895A (en) * | 2018-11-15 | 2019-04-09 | 合肥聚能电物理高技术开发有限公司 | High density hot cathode plasma source |
| CN109600895B (en) * | 2018-11-15 | 2020-11-10 | 合肥聚能电物理高技术开发有限公司 | High density hot cathode plasma source |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20161109 Effective date of abandoning: 20190115 |