CN205662589U - Coating by vaporization source and coating by vaporization device - Google Patents
Coating by vaporization source and coating by vaporization device Download PDFInfo
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- CN205662589U CN205662589U CN201620444993.6U CN201620444993U CN205662589U CN 205662589 U CN205662589 U CN 205662589U CN 201620444993 U CN201620444993 U CN 201620444993U CN 205662589 U CN205662589 U CN 205662589U
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Abstract
An embodiment of the utility model provides a coating by vaporization source and coating by vaporization device relates to vacuum evaporation coating film field. The time of nozzle can be sparingly changed in evaporation process, coating by vaporization efficiency is improved. The crucible that is used for holding evaporation material is drawn together to this coating by vaporization source packet, and the upper surface of crucible is provided with the crucible opening, and the last surface contact of nozzle holder, nozzle holder and crucible is installed to crucible open -ended top. The last N spout that is provided with of nozzle holder, nozzle holder are used for rotating or removing for the crucible to make an overlapping in crucible opening and the N spout, N >= 1, N is the positive integer.
Description
Technical field
This utility model relates to vacuum vapor plating field, particularly relates to a kind of vapor deposition source and evaporation coating device.
Background technology
Vacuum evaporation refers in vacuum environment, after material heating evaporation to be filmed or distillation so that it is at low temperature workpiece
Or substrate surface condenses or deposition, the technique forming coating.In organic display field, the coating process quality of organic display device
It is to affect the key factor that organic display device function is good and bad.
Due to during evaporation, in order to adapt to different evaporation substrates and different evaporation requirements, it is often necessary to steaming
The nozzle of the difformity specification in vapor deposition source exit is changed during plating, in the prior art, when nozzle changed by needs, must
Must shut down and open vacuum chamber, after manual teardown changes nozzle, then evacuation evaporation of starting shooting again, change nozzle frequently
The evaporation time of evaporation coating device can be extended, reduce evaporation efficiency.
Utility model content
This utility model embodiment provides a kind of vapor deposition source and evaporation coating device, it is possible to saves and changes nozzle during evaporation
Time, improve evaporation efficiency.
For reaching above-mentioned purpose, embodiment of the present utility model adopts the following technical scheme that
The one side of this utility model embodiment, it is provided that a kind of vapor deposition source, including the crucible for accommodating deposition material, earthenware
The upper surface of crucible is provided with crucible opening, the upper surface being arranged above nozzle holder, nozzle holder and crucible of crucible opening
Contact.Being provided with N number of spout on nozzle holder, nozzle holder is for rotating relative to crucible or mobile, so that crucible opening
Overlapping with in N number of spout, N >=1, N is positive integer.
Preferably, crucible is provided with gathering sill, nozzle holder is provided with the guide pad matched with gathering sill；Or,
It is provided with guide pad on crucible, nozzle holder is provided with the gathering sill matched with guide pad.
Preferably, crucible is provided with support shaft, nozzle holder is provided with the installing hole matched with support shaft；Or,
It is provided with installing hole on crucible, nozzle holder is provided with the support shaft matched with installing hole.
Preferably, crucible is provided with support shaft, when nozzle holder is provided with the installing hole matched with support shaft,
Being also equipped with bearing on support axle, the outer ring of bearing is fixed in installing hole.
Further, also including the shutter being fixed on crucible, shutter includes overhead gage, be used for blocking not with crucible
The upper surface of the spout of superposition of end gap.
Further, shutter also includes lower baffle plate, for block not with the lower surface of the spout of crucible superposition of end gap.
Preferably, nozzle is set in spout.
The another aspect of this utility model embodiment, it is provided that a kind of evaporation coating device, including above-mentioned vapor deposition source.
Preferably, when described nozzle holder can move relative to described crucible, described evaporation coating device also includes straight line
Motor, the secondary of described linear electric motors connects described guide pad.
Preferably, when being provided with support shaft on crucible, evaporation coating device also includes electric rotating machine, the output shaft of electric rotating machine
It is connected with support shaft.
Further, also include the detector being arranged at crucible overthe openings, for detecting the evaporation that vapor deposition source is deposited with out
The speed of material.
This utility model embodiment provides a kind of vapor deposition source and evaporation coating device, including the crucible for accommodating deposition material,
The upper surface of crucible is provided with crucible opening, the upper table being arranged above nozzle holder, nozzle holder and crucible of crucible opening
Face contacts.Being provided with N number of spout on nozzle holder, nozzle holder is for rotating relative to crucible or mobile, so that crucible leaves
Mouth is overlapping with in N number of spout, and N >=1, N is positive integer.By arranging on crucible opening and crucible upper surface
Including the nozzle holder of at least one spout, nozzle holder can rotate relative to crucible or mobile, with by change spout with
Overlapping area between crucible opening regulates the evaporation rate of vapor deposition source, or makes it possible to for different by changing spout
Evaporation requires to use different spouts.
Accompanying drawing explanation
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art, below will be to embodiment
Or the required accompanying drawing used is briefly described in description of the prior art, it should be apparent that, the accompanying drawing in describing below is only
It is embodiments more of the present utility model, for those of ordinary skill in the art, in the premise not paying creative work
Under, it is also possible to other accompanying drawing is obtained according to these accompanying drawings.
The structural representation of a kind of vapor deposition source that Fig. 1 provides for this utility model embodiment；
The another kind of of a kind of vapor deposition source that Fig. 2 provides for this utility model embodiment implements situation；
The structural representation of the another kind of vapor deposition source that Fig. 3 provides for this utility model embodiment；
The another kind of of the another kind of vapor deposition source that Fig. 4 provides for this utility model embodiment implements situation；
Fig. 5 has the situation of gathering sill and guide pad for a kind of vapor deposition source that this utility model embodiment provides；
Fig. 6 is the top view of crucible in Fig. 5；
Fig. 7 is the upward view of nozzle holder in Fig. 5；
Fig. 8 is the another kind of situation of the upward view of nozzle holder in Fig. 5；
Fig. 9 has in the situation of support shaft and installing hole for a kind of vapor deposition source that this utility model embodiment provides, crucible
Top view；
Figure 10 has in the situation of support shaft and installing hole for a kind of vapor deposition source that this utility model embodiment provides, nozzle
The upward view of support；
The situation of bearing is installed in the support shaft of a kind of vapor deposition source that Figure 11 provides for this utility model embodiment；
The situation of overhead gage it is provided with for this utility model embodiment on the nozzle holder of a kind of vapor deposition source that Figure 12 provides；
Figure 13 is the top view of Figure 12；
The feelings of lower baffle plate it are additionally provided with for this utility model embodiment on the nozzle holder of a kind of vapor deposition source that Figure 14 provides
Shape；
Figure 15 is the top view (overhead gage and lower baffle plate are the most not shown) of Figure 14；
Figure 16 is provided with the structural representation of linear electric motors for a kind of evaporation coating device that this utility model embodiment provides；
Figure 17 is provided with the structural representation of electric rotating machine for a kind of evaporation coating device that this utility model embodiment provides；
Figure 18 is additionally provided with the structural representation of detector for a kind of evaporation coating device that this utility model embodiment provides；
In the detector of a kind of evaporation coating device that Figure 19 provides for this utility model embodiment, processor is arranged on vacuum chamber
The structural representation of outdoor situation.
Reference:
1-crucible；2-nozzle holder；3-gathering sill；4-guide pad；5-support shaft；6-bearing；7-shutter；The upper gear of 71-
Plate；72-lower baffle plate；8-nozzle；9-linear electric motors；91-level；92-is primary；10-electric rotating machine；11-detector；111-visits
Head；112-processor；A-crucible opening；B-spout；C-installing hole.
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out
Clearly and completely describe, it is clear that described embodiment is only a part of embodiment of this utility model rather than whole
Embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art are not under making creative work premise
The every other embodiment obtained, broadly falls into the scope of this utility model protection.
This utility model embodiment provides a kind of vapor deposition source, as it is shown in figure 1, include the crucible 1 for accommodating deposition material,
What the upper surface of crucible 1 was provided with crucible opening a, crucible opening a is arranged above nozzle holder 2, nozzle holder 2 and crucible 1
Upper surface.Being provided with N number of spout b on nozzle holder 2, nozzle holder 2 is used for rotating relative to crucible 1 or mobile, with
Making crucible opening a overlapping with in N number of spout b, N >=1, N is positive integer.
As it is shown in figure 1, be the situation being provided with 1 spout b on nozzle holder 2, by nozzle holder 2 relative to crucible 1
Movement or rotation, the spout b on nozzle holder 2 is different from the overlapping area between crucible opening a, is illustrated in figure 1 completely
Overlap, is illustrated in figure 2 and partly overlaps, and, according to evaporation needs, to regulate the same crucible 1 evaporation rate when evaporation with this.
As it is shown on figure 3, be the situation being provided with N number of spout b (N=2) on nozzle holder 2, first on nozzle holder 2
Spout b is completely overlapped with crucible opening a；As shown in Figure 4, by nozzle holder 2 relative to the movement of crucible 1 or rotation, nozzle
Second spout b on support 2 is completely overlapped with crucible opening a, changes the spout b overlapping with crucible opening a.
It should be noted that nozzle holder 2 is installed on the top of crucible opening a, and the upper table of nozzle holder 2 and crucible 1
Face contacts, i.e. nozzle holder 2 is seamless with the laminating of the upper surface of crucible 1, it is to avoid the deposition material in crucible 1 is by nozzle holder 2
And spill between crucible 1.
Additionally, nozzle holder 2 rotates relative to crucible 1 or moves, so that in crucible opening a and N number of spout b
Overlap, refers to nozzle holder 2 and the movement of position can occur in modes such as linear motion, rotations relative to crucible 1, so that
Any one in N number of spout b of arranging on nozzle holder 2, it is possible to completely overlapped with crucible opening a or partly overlap, make
Obtain the deposition material in crucible 1 by the lap ejection of crucible opening a and spout b.
By arranging the nozzle holder 2 including at least one spout b with crucible 1 upper surface on crucible opening a,
Nozzle holder 2 can rotate relative to crucible 1 or mobile, with next by changing the overlapping area between spout b and crucible opening a
The evaporation rate of regulation vapor deposition source, or make it possible to require to use different spouts for different evaporations by changing spout b
b。
Owing to when only having a spout b on nozzle holder 2, be only capable of between change spout b and crucible opening a is overlapping
Area, and when on nozzle holder 2 by least two spout b, can not only change between spout b with crucible opening a is overlapping
Area, it is also possible to change spout b overlapping or partly overlapping with crucible opening a, therefore, the most all to arrange on nozzle holder 2
Illustrate as a example by having two spout b.
Concrete, as shown in Figure 6, crucible 1 is provided with gathering sill 3, as it is shown in fig. 7, be provided with on nozzle holder 2
The guide pad 4 matched with gathering sill 3, as it is shown in figure 5, guide pad 4 slides in gathering sill 3.In the case, such as Fig. 7 institute
Showing, nozzle holder 2 is rectangular strip.
So, when needing to change due to spout b blocking, by promoting the guide pad 4 on nozzle holder 2 at crucible
Move in gathering sill 3 on 1 so that nozzle holder 2 moves linearly relative to crucible 1, the later spout b on nozzle holder 2
Proceed overlapping with crucible opening a of previous spout b can be replaced be deposited with.
As shown in Figure 8, when the openings of sizes of the spout b arranged on nozzle holder 2 differs, it is also possible to according to evaporation need
Want, by moving in promoting the gathering sill 3 on crucible 1 of the guide pad 4 on nozzle holder 2, change spout b, or by mobile
Change the overlapping area between crucible opening a and spout b, change evaporation rate.
Or guide pad 4 can be set on crucible 1, nozzle holder 2 arranges the gathering sill matched with guide pad 4
3.This mounting means arranges gathering sill 3 with above-mentioned on crucible 1, arranges and leading that gathering sill 3 matches on nozzle holder 2
Mode to block 4 is compared, and the difference is that only so that guide pad 4 maintains static, and is provided with the spray of gathering sill 3 by promotion
Mouth support 2 so that nozzle holder 2 moves linearly relative to crucible 1, its principle is identical with aforesaid way, the most no longer with effect
Repeat.
Concrete, as it is shown in figure 9, be provided with support shaft 5 on crucible 1, (with in figure below, prop up with nozzle as shown in Figure 10
As a example by being provided with 3 spout b on frame 2), nozzle holder 2 is provided with the installing hole c matched with support shaft 5, such as Figure 11 institute
Showing, the upper end of support shaft 5 is installed in installing hole c, it is possible to relatively rotate with installing hole c.In the case, such as Figure 10 institute
Showing, nozzle holder 2 is discoid, and installing hole c is arranged at the home position of nozzle holder 2.
So, when needing to change due to spout b blocking, by promoting nozzle holder 2 so that be fixed on crucible 1
On support shaft 5 and the installing hole c on nozzle holder 2 between relatively rotate so that nozzle holder 2 rotates relative to crucible 1, if
Put the later spout b on the circumference of nozzle holder 2 and can replace that previous spout b is overlapping with crucible opening a to be proceeded
Evaporation.
Same, as shown in Figure 10, when the openings of sizes of the spout b arranged on nozzle holder 2 differs, it is also possible to root
Need according to evaporation, by promoting nozzle holder 2 to make installing hole c rotate centered by support shaft 5, change spout b, or by turning
The dynamic overlapping area changed between crucible opening a and spout b, changes evaporation rate.
Or installing hole c can be set on crucible 1, nozzle holder 2 arranges the support shaft matched with installing hole c
5.This mounting means arranges support shaft 5 with above-mentioned on crucible 1, arranges the peace matched with support shaft 5 on nozzle holder 2
The mode of dress hole c is compared, and the difference is that only, by promoting nozzle holder 2 so that support shaft 5 turns centered by installing hole c
Dynamic so that nozzle holder 2 rotates relative to crucible 1, its principle is identical with aforesaid way with effect, and here is omitted.
Further, as shown in figure 11, when being provided with support shaft 5 on crucible 1, nozzle holder 2 is provided with and props up
During the installing hole c that support axle 5 matches, support shaft 5 being also equipped with bearing 6, the outer ring of bearing 6 is fixed in installing hole c.
Relatively rotated by bearing 6 between support shaft 5 and installing hole c, so on the one hand can reduce support shaft 5 with
Between installing hole c rotate time frictional force, on the other hand, it is also possible to ensure rotate precision.
Further, as shown in Figure 12 and Figure 13 (Figure 13 is the top view of Figure 12), the screening being fixed on crucible 1 is also included
Baffle plate 7, shutter 7 includes overhead gage 71, for blocking the upper surface of not overlapping with crucible opening a spout b.With equal in figure below
With nozzle holder 2 for discoid, it is described in detail as a example by nozzle holder is provided with 3 spout b.
Overhead gage 71 is fixedly mounted on crucible 1, and covers the upper surface of not overlapping with crucible opening a spout b, makes
Must be avoided being deposited on the upper surface of other untapped spout b by the deposition material being deposited with out in crucible 1, it is ensured that other do not make
The upper surface of spout b do not have deposition material deposition to affect use before use.
Further, as shown in figure 14, shutter 7 also includes lower baffle plate 72, is used for blocking not overlapping with crucible opening a
The lower surface of spout b.
Lower baffle plate 72 is fixedly mounted on crucible 1, and covers the lower surface of not overlapping with crucible opening a spout b, makes
Must be avoided being deposited on the lower surface of other untapped spout b by the deposition material being deposited with out in crucible 1, it is ensured that other do not make
The lower surface of spout b do not have deposition material deposition to affect use before use.Preferably, overhead gage 71 and lower baffle plate 72
The shutter 7 being structure as a whole, so can in case with the shutter 7 fixing and overhead gage 71 on crucible 1 and lower baffle plate 72
Para-position with the upper and lower surface of untapped spout b.
For the ease of the processing of the spout b on nozzle holder 2 and nozzle holder 2, further, such as Figure 14 and Figure 15 institute
Show, nozzle 8 is set in the spout b of nozzle holder 2.
So, multiple spout b can be processed as identical dimensions when working nozzle support 2, work as needs
It is deposited with to different directions, or when being deposited with different openings size, it is only necessary to different nozzles 8 is installed in spout b.Additionally,
When nozzle 8 blocking during evaporation, it is also possible to spout b need not be cleaned, directly change nozzle 8.
This utility model embodiment provides a kind of evaporation coating device, including above-mentioned vapor deposition source.
When manually changing nozzle 8, needing to open vacuum chamber, nozzle 8 has been changed, more again just can weigh after evacuation
New evaporation, wastes the working time, simultaneously repeatedly to extracting vacuum in vacuum chamber, also causes the wasting of resources.
Therefore, as shown in figure 16, when nozzle holder 2 can move relative to crucible 1, evaporation coating device also includes straight-line electric
Machine 9, the primary 92 of linear electric motors 9 is installed in gathering sill 3, and the secondary 91 of linear electric motors 9 connects guide pad 4.
So, when nozzle 8 changed by needs, drive guide pad 4 at gathering sill 3 by the secondary 91 of linear electric motors 9
Move linearly in the primary 92 of interior linear electric motors 9 so that nozzle holder 2 moves relative to crucible 1, i.e. exchangeable nozzle 8, and
Need not open vacuum chamber, when effectively saving evaporation, change the time of nozzle 8.Preferably, can be by the beginning of linear electric motors 9
Level 91 directly processing is with in gathering sill 3, and the secondary of linear electric motors 9 92 and guide pad 4 are connected as a single entity or by the secondary of linear electric motors 9
92 replace guide pad 4, drive nozzle holder 2 to move to change nozzle 8 relative to crucible 1 by linear electric motors 9, save evaporation dress
The number of parts put the connective stability ensureing between part.
Additionally, as shown in figure 17, when being provided with support shaft 5 on crucible 1, evaporation coating device also includes electric rotating machine 10, rotation
The output shaft of rotating motor 10 is connected with support shaft 5.
So, when nozzle 8 changed by needs, support shaft 5 is driven to rotate by the output shaft of electric rotating machine 10 so that
Nozzle holder 2 rotates relative to crucible 1, i.e. exchangeable nozzle 8, without opening vacuum chamber, effectively saves evaporation
The time of Shi Genghuan nozzle 8.Preferably, the output shaft of electric rotating machine 10 and support shaft 5 can be connected as a single entity or use electric rotating machine
The output shaft of 10 replaces support shaft 5, drives nozzle holder 2 to rotate to change nozzle 8 relative to crucible 1 by electric rotating machine 10,
Save the number of parts of evaporation coating device and ensure the connective stability between part.
Further, as shown in figure 18, evaporation coating device of the present utility model also includes being arranged at the spy above crucible opening a
Surveying device 11, detector 11 is connected with linear electric motors 9 or electric rotating machine 10 by data wire, for detecting the steaming that vapor deposition source is deposited with out
The speed of plating material.
Detector 11 include popping one's head in 111 and processor 112 (in figure 18, probe 111 and processor 112 become one
The detector 11 of structure), detector 11 is arranged at above crucible opening a, for the speed of the deposition material that detection is sprayed by nozzle 8
Rate, when the speed recorded is obviously reduced, illustrates that shower nozzle 8 in use there occurs blocking, affects the ejection of deposition material, then
Processor controls linear electric motors 9 by data wire or electric rotating machine 10 starts, and changes nozzle 8.
Or it is when in the operation of same once evaporation, when needing injection rate or the injection direction that nozzle 8 is changed in timing, permissible
First being arranged on nozzle holder 2 by the nozzle 8 meeting injection rate and injection direction requirement, the processor 112 of detector 11 exists
When arriving replacing construction, send a signal to control linear electric motors 9 or electric rotating machine 10 by data wire, by linear electric motors 9 or
Electric rotating machine 10 is changed nozzle 8 or changes the overlapping area between nozzle 8 and crucible opening a, to change the size of jet exit.
Preferably, in evaporation coating device of the present utility model, the probe 111 of the detector 11 used is quartz crystal,
Processor 112 is single-chip microcomputer.Use the evaporation rate at quartz crystal detection nozzle 8, and result of detection is transmitted to monolithic
Machine, by the work of Single-chip Controlling motor, so on the one hand, quartz crystal and the small volume of single-chip microcomputer, at earthenware
The space taken at crucible opening a top position is less, can ignore the stop of its evaporation material to being deposited with out in nozzle 8, another
Aspect, the detection good stability of quartz crystal, precision is high, and the processing speed of single-chip microcomputer is fast, working stability.
Further, as shown in figure 19, it is also possible to the probe 111 of detector 11 is provided separately with processor 112 and leads to
Crossing data wire to be connected, wherein, probe 111 is arranged at above crucible opening a, and processor 112 is arranged at outside vacuum chamber, this
Sample one can reduce the space that probe 111 takies at crucible opening a top position further, and, when for needs regularly
When changing the situation of nozzle 8, can be not provided with popping one's head in 111, only regularly pass through data by the processor 112 vacuum chamber outside
Line sends a signal to control linear electric motors 9 or electric rotating machine 10, changes nozzle 8 or changes the weight between nozzle 8 and crucible opening a
Folded area.
During additionally, need to use angle board regulation evaporation scope during evaporation, angle board can be fixedly mounted on
On the overhead gage 71 of crucible 1 upper surface or shutter 7.Same, for need during evaporation with the use of miscellaneous part,
All may be installed the relevant position of this utility model vapor deposition source or evaporation coating device, do not affect evaporation work of the present utility model.
When needs use line style vapor deposition source or face type vapor deposition source to carry out being deposited with operation, it is also possible to by by this utility model
Some vapor deposition source be combined as line style vapor deposition source or face type vapor deposition source with line style or face type.
The above, detailed description of the invention the most of the present utility model, but protection domain of the present utility model does not limit to
In this, any those familiar with the art, in the technical scope that this utility model discloses, can readily occur in change
Or replace, all should contain within protection domain of the present utility model.Therefore, protection domain of the present utility model should be with described power
The protection domain that profit requires is as the criterion.
Claims (11)
1. a vapor deposition source, it is characterised in that include the crucible for accommodating deposition material, the upper surface of described crucible is provided with
Crucible opening, the upper surface being arranged above nozzle holder, described nozzle holder and described crucible of described crucible opening；
Being provided with N number of spout on described nozzle holder, described nozzle holder is for rotating relative to crucible or mobile, so that institute
Stating crucible opening overlapping with in described N number of spout, N >=1, N is positive integer.
Vapor deposition source the most according to claim 1, it is characterised in that be provided with gathering sill on described crucible, described nozzle props up
The guide pad matched with described gathering sill it is provided with on frame；Or, described crucible is provided with guide pad, on described nozzle holder
It is provided with the gathering sill matched with described guide pad.
Vapor deposition source the most according to claim 1, it is characterised in that be provided with support shaft on described crucible, described nozzle props up
The installing hole matched with described support shaft it is provided with on frame；Or, described crucible is provided with installing hole, on described nozzle holder
It is provided with the support shaft matched with described installing hole.
Vapor deposition source the most according to claim 3, it is characterised in that when being provided with support shaft, described nozzle on described crucible
When being provided with the installing hole matched with described support shaft on support, described support shaft is also equipped with bearing, described bearing
Outer ring is fixed in installing hole.
Vapor deposition source the most according to claim 1, it is characterised in that also include the shutter being fixed on described crucible, institute
State shutter and include overhead gage, for block not with the upper surface of the spout of described crucible superposition of end gap.
Vapor deposition source the most according to claim 5, it is characterised in that described shutter also includes lower baffle plate, is used for blocking not
Lower surface with the spout of described crucible superposition of end gap.
Vapor deposition source the most according to claim 1, it is characterised in that in described spout, nozzle is set.
8. an evaporation coating device, it is characterised in that include the vapor deposition source described in any one of claim 1～7.
Evaporation coating device the most according to claim 8, it is characterised in that when being provided with gathering sill, described spray on described crucible
The guide pad matched with described gathering sill it is provided with on mouth support；Or, described crucible is provided with guide pad, described nozzle props up
When being provided with the gathering sill matched with described guide pad on frame, described evaporation coating device also includes linear electric motors, described straight-line electric
The secondary of machine connects described guide pad.
Evaporation coating device the most according to claim 8, it is characterised in that when being provided with support shaft on described crucible, described
Evaporation coating device also includes that electric rotating machine, the output shaft of described electric rotating machine are connected with described support shaft.
11. evaporation coating devices according to Claim 8～described in 10 any one, it is characterised in that also include being arranged at crucible opening
The detector of top, for detecting the speed of the deposition material that described vapor deposition source is deposited with out.
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| CN201620444993.6U CN205662589U (en) | 2016-05-16 | 2016-05-16 | Coating by vaporization source and coating by vaporization device |
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| CN201620444993.6U CN205662589U (en) | 2016-05-16 | 2016-05-16 | Coating by vaporization source and coating by vaporization device |
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| CN106756807A (en) * | 2017-01-23 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of vapor deposition source, evaporation coating device and its evaporation coating method |
| CN106929804A (en) * | 2017-04-26 | 2017-07-07 | 昆山国显光电有限公司 | Vapor deposition source and evaporated device |
| CN107012431A (en) * | 2017-05-04 | 2017-08-04 | 京东方科技集团股份有限公司 | A kind of vapor deposition source, evaporation coating device and evaporation coating method |
| CN107267919A (en) * | 2017-06-28 | 2017-10-20 | 武汉华星光电半导体显示技术有限公司 | The evaporation source of evaporation |
| CN107794500A (en) * | 2017-12-08 | 2018-03-13 | 合肥鑫晟光电科技有限公司 | Crucible and evaporation coating device |
| CN108048800A (en) * | 2018-01-26 | 2018-05-18 | 武汉华星光电半导体显示技术有限公司 | Crucible and evaporated device is deposited |
| CN110029311A (en) * | 2019-03-29 | 2019-07-19 | 新冶高科技集团有限公司 | A kind of evaporation coating device and method |
| CN110106475A (en) * | 2019-05-22 | 2019-08-09 | 深圳市华星光电技术有限公司 | The control method of evaporation coating device and its driving assembly |
| CN111108230A (en) * | 2018-06-08 | 2020-05-05 | 株式会社爱发科 | Evaporation source for vacuum evaporation device |
| CN112359324A (en) * | 2020-10-29 | 2021-02-12 | 京东方科技集团股份有限公司 | Evaporation crucible |
| WO2021052591A1 (en) * | 2019-09-19 | 2021-03-25 | Applied Materials, Inc. | Evaporation source, evaporation system, and evaporation method |
| CN114182210A (en) * | 2021-11-04 | 2022-03-15 | 昆山国显光电有限公司 | Crucible for evaporation |
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| CN106929804A (en) * | 2017-04-26 | 2017-07-07 | 昆山国显光电有限公司 | Vapor deposition source and evaporated device |
| CN107012431A (en) * | 2017-05-04 | 2017-08-04 | 京东方科技集团股份有限公司 | A kind of vapor deposition source, evaporation coating device and evaporation coating method |
| CN107012431B (en) * | 2017-05-04 | 2022-08-26 | 京东方科技集团股份有限公司 | Evaporation source, evaporation device and evaporation method |
| CN107267919A (en) * | 2017-06-28 | 2017-10-20 | 武汉华星光电半导体显示技术有限公司 | The evaporation source of evaporation |
| WO2019000491A1 (en) * | 2017-06-28 | 2019-01-03 | 武汉华星光电半导体显示技术有限公司 | Evaporation source device for vapor deposition |
| CN107267919B (en) * | 2017-06-28 | 2019-08-16 | 武汉华星光电半导体显示技术有限公司 | The evaporation source of vapor deposition |
| CN107794500B (en) * | 2017-12-08 | 2019-10-25 | 合肥鑫晟光电科技有限公司 | Crucible and evaporation coating device |
| CN107794500A (en) * | 2017-12-08 | 2018-03-13 | 合肥鑫晟光电科技有限公司 | Crucible and evaporation coating device |
| CN108048800A (en) * | 2018-01-26 | 2018-05-18 | 武汉华星光电半导体显示技术有限公司 | Crucible and evaporated device is deposited |
| CN111108230A (en) * | 2018-06-08 | 2020-05-05 | 株式会社爱发科 | Evaporation source for vacuum evaporation device |
| CN110029311B (en) * | 2019-03-29 | 2022-03-18 | 新冶高科技集团有限公司 | Evaporation device and method |
| CN110029311A (en) * | 2019-03-29 | 2019-07-19 | 新冶高科技集团有限公司 | A kind of evaporation coating device and method |
| CN110106475A (en) * | 2019-05-22 | 2019-08-09 | 深圳市华星光电技术有限公司 | The control method of evaporation coating device and its driving assembly |
| WO2021052591A1 (en) * | 2019-09-19 | 2021-03-25 | Applied Materials, Inc. | Evaporation source, evaporation system, and evaporation method |
| CN112359324A (en) * | 2020-10-29 | 2021-02-12 | 京东方科技集团股份有限公司 | Evaporation crucible |
| CN112359324B (en) * | 2020-10-29 | 2023-02-28 | 京东方科技集团股份有限公司 | Evaporation crucible |
| CN114182210A (en) * | 2021-11-04 | 2022-03-15 | 昆山国显光电有限公司 | Crucible for evaporation |
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