CN205643980U - Electrochromic device including metal lines - Google Patents
Electrochromic device including metal lines Download PDFInfo
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- CN205643980U CN205643980U CN201620118689.2U CN201620118689U CN205643980U CN 205643980 U CN205643980 U CN 205643980U CN 201620118689 U CN201620118689 U CN 201620118689U CN 205643980 U CN205643980 U CN 205643980U
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Abstract
The utility model provides an electrochromic device including metal lines, wherein electrochromic device including metal lines includes: the basement reaches and the right second face of first facial features including first face, first conducting layer is located the first face of basement, the functional layer that discolours is located first conducting layer surface, the second conducting layer is located the functional layer surface of discolouing, and the second conducting layer is separated for the first isolation region of mutual electrical isolation and first conducting region, the first electrode, be located the second conducting layer first isolation region, and pass that electrochromic layer and first conducting layer are electric to be connected, the second electrode, the first conducting region that is located the second conducting layer is surperficial, is connected with the second conducting layer electricity of first conducting region, first light shield layer for shelter from first isolation region. To summer up, the utility model discloses a setting is used for sheltering from the first light shield layer of light to shelter from first isolation region, it is back to discolour at electrochromic glass, shelters from the light leak of first isolation region, thereby is favorable to improving electrochromic glass's the homogeneity of discolouing, improves electrochromic glass's performance.
Description
Technical field
This utility model relates to glass technology field, particularly to a kind of electrochromic structure.
Background technology
Electrochromism refers under the effect of extra electric field, and the characteristic such as the reflectance of material, absorbance and absorbance can occur reversible change according to the size of electric field with polarity.Electrochromic structure is set at glass surface and forms electrochomeric glass, it is possible to realize the control to glass transmission performance by Control of Voltage.
Reporting according to USGBC, the energy expenditure of building accounts for nearly the 40% of overall energy resource consumption: the heat that the bad window of isolation performance is lost accounts for the 10%～30% of building heat loss in winter；And penetrate window summer and enter the light of interior of building, then increase the energy required for indoor refrigeration.It is estimated that the energy loss that the U.S. causes due to glass of building window every year is worth about 20,000,000,000 dollars.
Electrochomeric glass can control light transmission capacity and the dazzle amount of glass, can be optimized by the heat to the light transmission capacity of glass and through glass, keeps indoor conditions comfortable such that it is able to reduce the energy expenditure maintaining Indoor environment temperature.Therefore, along with developing rapidly of material technology, electrochomeric glass has begun to progressively to be applied to the fields such as the cladding glass of automobile anti-dazzle light reflection mirror, vehicle dormer window, window of high speed railway, aircraft windows, high-grade mansion.And gradually reducing along with comprehensive use cost, electrochomeric glass can progressively substitute Low-e glass, be widely used in the intelligent building of energy-conserving and environment-protective.
But, after pressurization variable color, often there is leakage problem in electrochomeric glass of the prior art.
Utility model content
The problem that this utility model solves is to provide a kind of electrochromic structure, to improve the performance improving electrochomeric glass.
For solving the problems referred to above, this utility model provides a kind of electrochromic structure, including:
Substrate, including first and with described first relative second；First conductive layer, is positioned at first of described substrate；Colour change function layer, is positioned at described first conductive layer surface；Second conductive layer, is positioned at described colour change function layer surface, and described second conductive layer is separated into the first isolation area and the first conducting region being electrically isolated from each other；First electrode, is positioned at the first isolation area of the second conductive layer and electrically connects with described first conductive layer through described electrochromic layer；Second electrode, is positioned at the first conducting region surface of the second conductive layer, electrically connects with described second conductive layer of the first conducting region；First light shield layer, is used for blocking the first isolation area.
Optionally, described first light shield layer covers described first electrode and the second conductive layer of described first isolation area.
Optionally, described first light shield layer cover second of described substrate, part that position is corresponding with described first isolation area.
Optionally, described first light shield layer is more than described first isolation area projected area at described substrate surface in the projected area of described substrate surface.
Optionally, described electrochromic structure also includes: run through the first groove of described second conductive layer, and described second conductive layer is divided into the first isolation area and the first conducting region by described first groove；Described first light shield layer also blocks described first groove.
Optionally, described first light shield layer covers described first electrode and the second conductive layer of described first isolation area, and fills described first groove.
Optionally, described first light shield layer cover second of described substrate, part that position is corresponding with described first isolation area and described first groove.
Optionally, the first conductive layer includes the second isolation area and the second conducting region being electrically isolated from each other；Described electrochromic structure also includes: the second light shield layer, is used for blocking the second isolation area.
Optionally, the position of described second electrode is corresponding with the position of described second isolation area, and described second light shield layer covers described second electrode, and cover described first conducting region the second conductive layer, part that position is corresponding with described second isolation area.
Optionally, described second light shield layer cover second of described substrate, part that position is corresponding with described second isolation area.
Optionally, described second light shield layer is more than described second isolation area projected area at described substrate surface in the projected area of described substrate surface.
Optionally, described electrochromic structure also includes: run through the second groove of described first conductive layer, and described first conductive layer is divided into the second isolation area and the second conducting region by described second groove；Described second light shield layer also blocks described second groove.
Optionally, the position of described second electrode is corresponding with the position of described second isolation area, described second light shield layer cover described second electrode and cover described first conducting region the second conductive layer, part that position is corresponding with described second isolation area and described second groove.
Optionally, described second light shield layer cover second of described substrate, part that position is corresponding with described second isolation area and described second groove.
Optionally, the width range of described first isolation area and described second isolation area is 1 micron～500 microns, and the width range of described first conducting region and described second conducting region is 1 centimetre～500 centimetres.
Optionally, described substrate includes light-transparent substrate.
Optionally, described electrochromic structure also includes the barrier layer between described substrate and described first conductive layer.
Compared with prior art, the technical solution of the utility model has the advantage that
This utility model is by being provided for the first light shield layer shut out the light, to block the first isolation area, it is possible to after electrochomeric glass variable color, block the light leak of the first isolation area, thus be conducive to improving the variable color uniformity of electrochomeric glass, improve the performance of electrochomeric glass.
In alternative of the present utility model, described first conductive layer also includes the second isolation area and the second conducting region being electrically isolated from each other, the most described electrochomeric glass also includes the second light shield layer blocking described second isolation area, to block the light leak of the second isolation area, be conducive to improving the variable color uniformity of electrochomeric glass, thus improve electrochromic performance.
In alternative of the present utility model, described first light shield layer and described second light shield layer are respectively greater than described first isolation area and the described second isolation area projected area at described substrate surface in described substrate surface projected area, the light leak caused due to light diffraction can be reduced, improve the shading performance of electrochomeric glass further.
Accompanying drawing explanation
Fig. 1 is the cross-sectional view of a kind of electrochromic structure；
Fig. 2 to Fig. 3 is the structural representation of this utility model electrochromic structure one embodiment；
Fig. 4 is the sectional structure schematic diagram of this utility model electrochromic structure another embodiment of forming method.
Detailed description of the invention
From background technology, the problem that electrochomeric glass of the prior art exists light leak.In conjunction with the reason of its leakage problem of structural analysis of electrochromic structure in electrochomeric glass in prior art:
With reference to Fig. 1, it is shown that the cross-sectional view of a kind of electrochromic structure.
As it is shown in figure 1, described electrochomeric glass includes substrate 10 and is sequentially located at first conductive layer 11 on substrate 10 surface, electrochromic layer 12 and the second conductive layer 13；The the first electrode 14a sequentially passing through the second conductive layer 13 and electrochromic layer 12 and the second electrode 14b being positioned at the second conductive layer 13 surface electrically connects with the first conductive layer 11 and the second conductive layer 13 respectively, to described first conductive layer 11 and the second conductive layer 13 on-load voltage signal, make to form electric field between the first conductive layer 11 and the second conductive layer 13 to control the color of electrochromic layer 12.
In order to avoid short circuit phenomenon occurring between the first electrode 14a and the second electrode 14b, described second conductive layer 13 is divided into the first isolation area 13i and the first conducting region 13t being electrically isolated from each other, described first electrode 14a is positioned at the first isolation area 13i, described second electrode 14b and is positioned at the first conducting region 13t.
Owing to the first electrode 14a is positioned at the first isolation area 13i, therefore the current potential between the second conductive layer 13 and first conductive layer 11 respective regions of the first isolation area 13i is equal, electric field cannot be formed, therefore when pressurization variable color, electrochromic layer 12 between second conductive layer 13 and first conductive layer 11 respective regions of the first isolation area 13i will not variable color, thus light leak occurs.
Below in conjunction with the accompanying drawings specific embodiment of the utility model is described in detail.
Fig. 2 to Fig. 3 is the structural representation of this utility model electrochromic structure one embodiment, and wherein Fig. 2 is the schematic top plan view of described electrochromic structure, and Fig. 3 is the sectional view in Fig. 2 along AA line.
Described electrochromic structure includes: substrate 100, described substrate 100 include first and with described first relative second.
Described substrate 100 be used for providing physical support platform, concrete described substrate 100 can be flexible substrates can also be rigid basement.Described substrate 100 can be light transmissive material.In certain embodiments, described substrate 100 is glass.
In certain embodiments, the material of described substrate 100 is glass, can directly in the electrochromic structure formed pressing glass constitute electrochomeric glass, it is possible to simplify electrochomeric glass structure, reduce electrochomeric glass weight.
The quantity of described electrochromic structure does not limits, and in further embodiments, by described electrochromic structure clamping is formed between two blocks of glass electrochromic structure, thus can reduce the requirement to technique board, reduce manufacturing cost.
It is positioned at the first conductive layer 110 on first of described substrate 100 and at least one face of second.
Described first conductive layer 110 is formed on first or second of described substrate 100, and described first conductive layer 110 is used for on-load voltage to form electric field.The material of described first conductive layer 110 includes transparent conductive oxide (Transparent Conductive Oxide, TCO).Concrete, described first conductive layer 110 can be that tin indium oxide (ITO), zinc-tin oxide (IZO), zinc oxide aluminum (AZO), fluorine mix one or more in the material such as stannum oxide (FTO), gallium doped stannum oxide (GTO)；Can also be that the transparent nitride conducted electricity includes one or more in the materials such as titanium nitride, titanium oxynitrides, tantalum nitride and tantalum nitride oxide；It can also be the grapheme material of electrically conducting transparent；Can also is that other transparent metal or alloy materials.The thickness range of described first conductive layer 110 is 10 nanometers～1000 nanometers.Optionally, in certain embodiments, the thickness range of described first conductive layer 110 is 300 nanometers～600 nanometers.
It should be noted that, in order to avoid foreign ion diffuses into described first conductive layer 110, thus affect the electric conductivity of described first conductive layer 110, the most described electrochromic structure also includes the barrier layer 101 between described substrate 100 and described first conductive layer 110, so described forming method can also include: before forming the first conductive layer 110, form the barrier layer 101 covering substrate 100 surface.
In certain embodiments, described substrate 100 is soda-lime glass, making the electrical conductivity of described first conductive layer 110 reduce in order to avoid the sodium ion in soda-lime glass diffuses into the first conductive layer 110, described barrier layer 101 is the sodium ion barrier layer of one or more in the materials such as silicon dioxide, silicon nitride, silicon oxynitride, aluminium oxide.
It should be noted that, in order to improve the first conductive layer 110 and the follow-up electric isolution formed between the second electrode, avoid the occurrence of electric leakage or the problem of short circuit, described first conductive layer 110 includes the second isolation area and the second conducting region that the first conductive layer being electrically isolated from each other includes being electrically isolated from each other, the quantity of described second isolation area is one or more, and the quantity of described second conducting region is one or more.
For simplifying device architecture, reduce technology difficulty, in some embodiments of this utility model, between described second isolation area and described second conducting region, realize isolation by the second groove.Concrete, referring to figs. 2 and 3, described electrochromic structure also includes: run through the lower groove 111 of the first conductive layer 110, and the first conductive layer 110 is divided into lower isolation area 110i and lower conducting region 110t by described lower groove 111.Described lower groove 111 constitutes the second groove, and described lower isolation area 110i constitutes the second isolation area, described lower conducting region 110t groove the second conducting region.
The width range of described lower isolation area 110i is 1 micron～500 microns, and the width range of described lower conducting region 110t is 1 centimetre～500 centimetres.In order to improve variable color uniformity and the color change of described electrochromic structure, optionally, the width range of described lower isolation area 110i is 5 microns～50 microns, and the width range of described lower conducting region 110t is 5 centimetres～50 centimetres.
Specifically, described lower groove 111 can be to extend along " several " font, between the multiple lower isolation area 110i so formed, connection forms pectination, between multiple lower conducting region 110t, connection forms pectination, and the comb of the pectination that the pectination that the plurality of lower conducting region 110t is formed is formed with multiple lower isolation area 110i mutually compensates for.Described lower isolation area 110i width (comb width) scope is 5 centimetres～50 centimetres, is lower conducting region 110t between adjacent fingers, and the width range of lower conducting region 110t is 5 centimetres～50 centimetres.The width range of described lower groove 111 is 1 micron～50 microns.Optionally, the width range of described lower groove 111 be 2 microns～10 microns to improve the insulating properties between described lower isolation area 110i and lower conducting region 110t.
It is positioned at the colour change function layer 120 on described first conductive layer 110 surface.
Described colour change function layer 120 is for changes colour under Control of Voltage.Described colour change function layer 120 includes that one or more functional layer, described functional layer include electrochromic layer, ion storage and the ion conducting layer between electrochromic layer and ion storage.
Wherein, for there is redox reaction in described electrochromic layer under DC Electric Field, color changes, and can be the metal-oxide that color changes after cathodic electrochromic metal-oxide, i.e. ion implanting, such as oxygen debt tungsten oxide (WOx, 2.7 < x < 3), titanium oxide (TiO2), vanadium oxide (V2O5), niobium oxide (Nb2O5), molybdenum oxide (MoO3), tantalum oxide (Ta2O5) etc. one or more in material；Can also be lithium, sodium, potassium, vanadium or titanium doped cathodic electrochromic metal-oxide.Concrete, the thickness range of described electrochromic layer is 10 nanometers～1000 nanometers.Optionally, the thickness range of described electrochromic layer is 300 nanometers～600 nanometers.
Described ion conducting layer is used for transmitting ion, can be Li2O、Li2O2、Li3N、LiI、LiF、 SiO2、Al2O3、Nb2O3、LiTaO3、LiNbO3、La2TiO7、Li2WO4, oxygen-rich oxide tungsten (WOx, 3 < x < 3.5), HWO3、ZrO2、HfO2、LaTiO3、SrTiO3、BaTiO3、LiPO3Deng one or more in material.Concrete, the thickness range of described ion conducting layer is 10 nanometers～300 nanometers.Optionally, the thickness range of described ion conducting layer is 20 nanometers～150 nanometers.
Described ion storage is used for storing the most corresponding ion, keeps the charge balance of whole system, can be the metal-oxide that color changes after anode electrochromic metal oxides, i.e. elemental release, such as vanadium oxide (V2O5), chromium oxide (Cr2O3), manganese oxide (Mn2O3), ferrum oxide (Fe2O3), cobalt oxide (Co2O3), nickel oxide (Ni2O3), yttrium oxide (IrO2), nickel-tungsten oxide, nickel oxide vanadium, one or more in the oxidation material such as NiTi, nickel oxide niobium, nickel oxide molybdenum, nickel oxide tantalum；Can also be mixed-metal oxides LixNiyMzOa, wherein 0 < x < 10,0 < y < 1,0 < z < 10, (0.5x+1+0.5y+z) < a < (0.5x+1+0.5y+3.5z), wherein M can be the metallic elements such as Al, Cr, Zr, W, V, Nb, Hf, Y, Mn.Concrete, described ion storage thickness range is 10 nanometers～1000 nanometers.Optionally, described ion storage thickness range is 100 nanometers～300 nanometers.
It should be noted that described colour change function layer 120 also fills up in described lower groove 111.
It is positioned at second conductive layer 130 on described colour change function layer 120 surface.
Described second conductive layer 130 is used for on-load voltage to form electric field.The material of described second conductive layer 130 also includes transparent conductive oxide (Transparent Conductive Oxide, TCO).Concrete, described second conductive layer 130 can be that tin indium oxide (ITO), zinc-tin oxide (IZO), zinc oxide aluminum (AZO), fluorine mix one or more in the material such as stannum oxide (FTO), gallium doped stannum oxide (GTO)；Can also be that the transparent nitride conducted electricity includes one or more in the materials such as titanium nitride, titanium oxynitrides, tantalum nitride and tantalum nitride oxide；It can also be the grapheme material of electrically conducting transparent；Can also is that other transparent metal or alloy materials.The thickness range of described second conductive layer 130 is 10 nanometers～1000 nanometers.Optionally, in certain embodiments, the thickness range of described second conductive layer 130 is the first isolation area that includes being electrically isolated from each other of the second conductive layer described in 100 nanometers～600 nanometers and the first conducting region, the quantity of described first isolation area is one or more, and the quantity of described first conducting region is one or more.In some embodiments of this utility model, the second conductive layer of described first isolation area and the first conducting region realizes electric isolution by the first groove.
Concrete, as shown in Figures 2 and 3, described electrochromic structure also includes the upper groove 132 running through described second conductive layer 130, and described second conductive layer 130 is divided into upper isolation area 110i and upper conducting region 110t by described upper groove 132.Described upper groove 132 constitutes described first groove, and described upper isolation area 110i constitutes described first isolation area, and described upper conducting region 110t constitutes described first conducting region.
Described upper groove 132 can be to extend along " several " font, between the multiple upper isolation area 130i so formed, connection forms pectination, between multiple upper conducting region 130t, connection forms pectination, the comb of the pectination that the pectination that the plurality of upper conducting region 130t is formed is formed with multiple upper isolation area 130i mutually compensates for, described upper isolation area 130i width (the comb width of comb) scope is 5 microns～50 microns, it is upper conducting region 130t between adjacent fingers, in the width range of upper conducting region 130t is 5 centimetres～50 cm range.
It should be noted that, to avoid the occurrence of the circuit problems such as electric leakage, short circuit, described upper isolation area 130i and the described lower isolation area 110i projection on described substrate 100 surface are mutually staggered, it is to say, described upper isolation area 130i and the described lower isolation area 110i projection on described substrate 100 surface are the most overlapping.
The width range of described upper groove 132 is 1 micron～50 microns.Optionally, the width range of described upper groove 132 be 2 microns～10 microns to improve the insulating properties between described upper isolation area 130i and upper conducting region 130t.
First electrode 141, is positioned at the first isolation area of the second conductive layer and electrically connects with described first conductive layer through described electrochromic layer；Second electrode 142, is positioned at the first conducting region surface of the second conductive layer, electrically connects with described second conductive layer of the first conducting region.Concrete, the first electrode 141 being positioned at isolation area 130i on the second conductive layer 130 passes described electrochromic layer 120, electrically connects with the first conductive layer 110；Second electrode 142 on described upper conducting region 130t surface being positioned at the second conductive layer 130 electrically connects with second conductive layer 130 of described upper conducting region 130t.
Described first electrode 141 and described second electrode 142 are for respectively to described first conductive layer 110 and the second conductive layer 130 on-load voltage signal, so that forming electric field between the first conductive layer 110 and the second conductive layer 130, to realize the control to colour change function layer 120 color.
Electric isolution between described upper isolation area 130i and described upper conducting region 130t achieves the electric isolution between described first electrode 141 and the second electrode 142, make the first electrode 141 and the second electrode 142 all can be positioned at the surface of described second conductive layer 130, described first electrode 141 and described second electrode 142 is made to can be uniformly distributed in described electrochromic structure surface, it is thus possible to improve the uniformity coefficient of electric field between the first conductive layer 110 and the second conductive layer 130, improve the variable color uniformity of described colour change function layer 120, improve the problem that electrochromic structure color change is slow, and then be conducive to expanding the area of electrochomeric glass, make the variable color of large area electrochomeric glass faster, evenly.
Simultaneously, electric isolution between described lower isolation area 110i and described lower conducting region 110t, the electric isolution between described first electrode 141 and described first conductive layer 110 of lower isolation area 110i can be improved, reduce the possibility that the circuit problem such as electric leakage, short circuit occurs, improve the yields manufacturing described electrochromic structure, improve the performance of described electrochromic structure, extend the service life of described electrochromic structure.
Additionally, described second electrode 142 and 110i position, described lower isolation area are the most corresponding, and lower isolation area 110i and lower conducting region 110t isolates, and can improve electric isolution here further, reduces and punctures risk.
The material of described first electrode 141 and the second electrode 142 can be metal.Described first electrode 141 or described second electrode 142 can be formed by modes such as silk screen printing, vacuum thermal evaporation plated film, vacuum magnetron sputtering coating film, vacuum ionic source plated film, inkjet printings.
In order to simplify device architecture, improving and manufacture yields, in some embodiments of this utility model, the first electrode 141 formed can be parallel to each other with described upper groove 132, and described second electrode 142 can be parallel to each other with described lower groove 111.Additionally, can also be parallel to each other between described first electrode 141 and described second electrode 142.
When the quantity of described first electrode 141 is more than 1, can be parallel to each other between described first electrode 141；When the quantity of described second electrode 142 is more than 1, can also be parallel to each other between described second electrode 142.
In addition, in order to improve the uniformity of electric field between the first electrode 141 and the second electrode 142, cross arrangement between described second electrode 142 and the first electrode 141, i.e. when described electrochromic structure includes multiple first electrodes 141 or multiple second electrode 142, described first electrode 141 is uniformly distributed between adjacent second electrode 142, or described second electrode 142 is uniformly distributed between adjacent first electrode 141.
The quantity of described first electrode 141 is 2, and the quantity of described second electrode 142 is 3.One the first electrode 141 is set between adjacent second electrode 142, and described first electrode 141 is equal to the distance of adjacent second electrode 142；One the second electrode 142 is set between adjacent first electrode 141, and described second electrode 142 is equal to the distance of adjacent first electrode 141.
In other are implemented, the quantity of electrode can arrange according to the size of actual electrochromic structure.In certain embodiments, a pair first electrodes and the second electrode can be set within the specific limits.The most in the above-described embodiments, described first conductive layer and the second conductive layer can be divided into multiple isolation areas of correspondence and multiple conducting region, actually, if area is little, they can the most only be set to one, first electrode of i.e. only 1 pair and the second electrode, but the first electrode and the second electrode are respectively positioned on the side of electrochromic layer.In certain embodiments, described first conductive layer even can not be isolated, and the only second conductive layer is divided into multiple isolation area and multiple conducting region, can solve the uniform problem of electrochromism under large area.
Described electrochromic structure also includes the first light shield layer 151 blocking isolation area 130i, is used for shutting out the light.
When pressurizeing variable color, owing to electric field cannot be formed between upper isolation area 130i and corresponding first conductive layer 110, so the colour change function layer 120 of respective regions cannot realize variable color, so there will be light leak.First light shield layer 151 is i.e. for, after pressurization variable color, blocking the light of isolation area 130i, to improve the variable color uniformity of described electrochromic structure.
In certain embodiments, the material of described first light shield layer 151 is black, according to visual law, compared with white lines under black background, black lines under white background is easier to be ignored by people, therefore the setting of the first light shield layer 151 can be effectively improved the variable color uniformity of electrochromic structure, improves the performance of electrochomeric glass.
In some embodiments of this utility model, described first light shield layer 151 covers described first electrode 141 and second conductive layer 130 of described upper isolation area 130i.
Additionally, be also formed with groove 132 (as shown in Figure 2) in described second conductive layer 130.Therefore, described first light shield layer 151 can also block described upper groove 132.Concrete, described first light shield layer 151 covers described first electrode 141 and second conductive layer 130 of described upper isolation area 130i, and fills described upper groove 132.
Further, existence due to light diffraction phenomenon, in certain embodiments, described first light shield layer 151 projected area on described substrate 100 surface is more than the 130i projected area on described substrate 100 surface in isolation area on described, to avoid the first light shield layer 151 edge light leak occur.
In some embodiments of this utility model, in described first conductive layer 110, it is additionally provided with lower isolation area 110i and lower conducting region 110t.Isolation area 130i upper with the second conductive layer 130 is similar, when pressurization variable color, the colour change function layer 120 in 110i corresponding region, lower isolation area also cannot variable color, there will be light leak at respective regions.So described electrochromic structure also includes: block second light shield layer 152 of lower isolation area 110i, be used for shutting out the light.
In some embodiments of this utility model, the position of described second electrode 142 is corresponding with the position of described lower isolation area 110i, described second light shield layer 152 covers described second electrode 142, and cover described upper conducting region 130t the second conductive layer 130, position and described lower part corresponding for isolation area 110i.
Additionally, described first conductive layer 110 is also formed with lower groove 111 (as shown in Figure 4).Described lower groove 111 is also blocked in described second shading 152.Concrete, the position of described second electrode 141 is corresponding with the position of described lower isolation area 110i, described second light shield layer 152 cover described second electrode 142 and cover described upper conducting region 130t the second conductive layer 130, part that position is corresponding with described lower isolation area 110i and described lower groove 111.
Further, existence due to diffraction, in certain embodiments, described second light shield layer 152 projected area on described substrate 100 surface is more than the lower isolation area 110i projected area on described substrate 100 surface, to avoid 110i edge, described lower isolation area light leak occur.
Described first light shield layer 151 or described second light shield layer 152 can pass through the various ways such as silk screen printing, vacuum thermal evaporation plated film, vacuum magnetron sputtering coating film, vacuum ionic source plated film, inkjet printing and be formed.
With reference to Fig. 4, it is shown that the sectional structure schematic diagram of this utility model another embodiment of electrochromic structure.
Repeat no more with previous embodiment something in common, be with the difference of previous embodiment: described first light shield layer 251 is positioned at described substrate 200 and is formed without in the one side of the first conductive layer 210, colour change function layer the 220, second conductive layer 230 and the first electrode 241 and the second electrode 242 side.
Concrete, described first conductive layer 210, colour change function layer the 220, second conductive layer 230 and the first electrode 241 and the second electrode 242 are positioned on first of described substrate 200, so in some embodiments, described first light shield layer 251 cover second of described substrate 200, position with described on corresponding for isolation area 230i part.
Additionally, in certain embodiments, being also formed with groove 232 in described second conductive layer 230, the most described first light shield layer 251 also blocks described upper groove 232.Concrete, part that described first light shield layer 251 covers second of described substrate 200, that position is corresponding with described upper isolation area 230i and described upper groove 232.
Owing to the first light shield layer 251 is positioned on second of substrate 200, therefore the first light shield layer 251 can't affect the electric isolution performance on the second conductive layer 230 between isolation area 230i and upper conducting region 230t, so in the present embodiment, described first light shield layer 251 can be that metal material is formed, but this is not limited by the present invention, described first light shield layer 251 can also be opaque nonmetal.
Further, in certain embodiments, the first conductive layer 210 includes the lower isolation area 210i that is electrically isolated from each other and lower conducting region 210t.Described second light shield layer 252 covers second of described substrate 200, position and described lower part corresponding for isolation area 210i.
In certain embodiments, by thinking that groove realizes lower electric isolution between isolation area 210i and lower conducting region 210t, so described second light shield layer 252 also blocks described lower groove in described first conductive layer 210.Part that described second light shield layer 252 covers second of described substrate 200, that position is corresponding with described lower isolation area 210i and described lower groove, it is to say, on second of described substrate, the position part corresponding with described lower isolation area 210i and described lower groove form described second light shield layer 252.
It should be noted that form described first light shield layer and the second light shield layer in the side of described substrate, it is possible to make described first light shield layer of formation and described second light shield layer of formation carry out simultaneously, beneficially Simplified flowsheet step, improves and manufactures yields.But this utility model forms described first light shield layer to whether in substrate side and the second light shield layer does not limit.In other embodiments of this utility model, described first light shield layer and the second light shield layer can be formed respectively in described substrate both sides.
To sum up, this utility model is by being provided for the first light shield layer shut out the light, to block the first isolation area, can be after electrochomeric glass variable color, block the light leak of the first isolation area, thus be conducive to improving the variable color uniformity of electrochomeric glass, improve the performance of electrochomeric glass.
Although this utility model discloses as above, but this utility model is not limited to this.Any those skilled in the art, without departing from spirit and scope of the present utility model, all can make various changes or modifications, and protection domain the most of the present utility model should be as the criterion with claim limited range.
Claims (17)
1. an electrochromic structure, it is characterised in that including:
Substrate, including first and with described first relative second；
First conductive layer, is positioned at first of described substrate；
Colour change function layer, is positioned at described first conductive layer surface；
Second conductive layer, is positioned at described colour change function layer surface, and described second conductive layer is separated into mutually
First isolation area of electric isolution and the first conducting region；
First electrode, be positioned at the second conductive layer the first isolation area and through described electrochromic layer with
Described first conductive layer electrical connection；
Second electrode, is positioned at the first conducting region surface of the second conductive layer, with described the of the first conducting region
Two conductive layer electrical connections；
First light shield layer, is used for blocking the first isolation area.
2. electrochromic structure as claimed in claim 1, it is characterised in that described first light shield layer covers institute
State the first electrode and the second conductive layer of described first isolation area.
3. electrochromic structure as claimed in claim 1, it is characterised in that described first light shield layer covers
Second of described substrate, part that position is corresponding with described first isolation area.
4. electrochromic structure as claimed in claim 1, it is characterised in that described first light shield layer is described
The projected area of substrate surface is more than described first isolation area projected area at described substrate surface.
5. electrochromic structure as claimed in claim 1, it is characterised in that described electrochromic structure is also wrapped
Including: run through the first groove of described second conductive layer, described second conductive layer is divided by described first groove
It is the first isolation area and the first conducting region；
Described first light shield layer also blocks described first groove.
6. electrochromic structure as claimed in claim 5, it is characterised in that described first light shield layer covers institute
State the first electrode and the second conductive layer of described first isolation area, and fill described first groove.
7. electrochromic structure as claimed in claim 5, it is characterised in that described first light shield layer covers institute
State second of substrate, portion that position is corresponding with described first isolation area and described first groove
Point.
8. electrochromic structure as claimed in claim 1, it is characterised in that the first conductive layer includes mutual electricity
Second isolation area of isolation and the second conducting region；
Described electrochromic structure also includes: the second light shield layer, is used for blocking the second isolation area.
9. electrochromic structure as claimed in claim 8, it is characterised in that the position of described second electrode with
The position of described second isolation area is corresponding, and described second light shield layer covers described second electrode, and
Cover described first conducting region the second conductive layer, portion that position is corresponding with described second isolation area
Point.
10. electrochromic structure as claimed in claim 8, it is characterised in that described second light shield layer covers institute
State second of substrate, part that position is corresponding with described second isolation area.
11. electrochromic structure as claimed in claim 8, it is characterised in that described second light shield layer is described
The projected area of substrate surface is more than described second isolation area projected area at described substrate surface.
12. electrochromic structure as claimed in claim 8, it is characterised in that described electrochromic structure is also wrapped
Including: run through the second groove of described first conductive layer, described first conductive layer is divided by described second groove
It is the second isolation area and the second conducting region；
Described second light shield layer also blocks described second groove.
13. electrochromic structure as claimed in claim 12, it is characterised in that the position of described second electrode with
The position of described second isolation area is corresponding, described second light shield layer cover described second electrode and
Cover described first conducting region the second conductive layer, position and described second isolation area and described second
The part that groove is corresponding.
14. electrochromic structure as claimed in claim 12, it is characterised in that described second light shield layer covers institute
State second of substrate, part that position is corresponding with described second isolation area and described second groove.
15. electrochromic structure as claimed in claim 8, it is characterised in that described first isolation area and described
The width range of the second isolation area is 1 micron～500 microns, and described first conducting region and described second passes
The width range leading district is 1 centimetre～500 centimetres.
16. electrochromic structure as claimed in claim 1, it is characterised in that described substrate includes light-transparent substrate.
17. electrochromic structure as claimed in claim 1, it is characterised in that described electrochromic structure is also wrapped
Include the barrier layer between described substrate and described first conductive layer.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620118689.2U CN205643980U (en) | 2016-02-06 | 2016-02-06 | Electrochromic device including metal lines |
| PCT/CN2016/081232 WO2017133105A1 (en) | 2016-02-06 | 2016-05-06 | Electrochromic structure and method of forming same |
| US16/075,587 US10732478B2 (en) | 2016-02-06 | 2016-05-06 | Electrochromic structure and method of forming same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620118689.2U CN205643980U (en) | 2016-02-06 | 2016-02-06 | Electrochromic device including metal lines |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205643980U true CN205643980U (en) | 2016-10-12 |
Family
ID=57078138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620118689.2U Withdrawn - After Issue CN205643980U (en) | 2016-02-06 | 2016-02-06 | Electrochromic device including metal lines |
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| Country | Link |
|---|---|
| CN (1) | CN205643980U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106873281A (en) * | 2017-04-21 | 2017-06-20 | 安徽鑫昊等离子显示器件有限公司 | Electrochromic device component, electrochromic device and preparation method thereof |
| CN107045243A (en) * | 2016-02-06 | 2017-08-15 | 合肥威迪变色玻璃有限公司 | Electrochromic structure and forming method thereof |
| CN110045559A (en) * | 2018-01-16 | 2019-07-23 | 大陆汽车有限公司 | Multistage scheduling and changeable glazing unit for flat glazing unit |
-
2016
- 2016-02-06 CN CN201620118689.2U patent/CN205643980U/en not_active Withdrawn - After Issue
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107045243A (en) * | 2016-02-06 | 2017-08-15 | 合肥威迪变色玻璃有限公司 | Electrochromic structure and forming method thereof |
| CN107045243B (en) * | 2016-02-06 | 2020-11-13 | 合肥威迪变色玻璃有限公司 | Electrochromic structure and forming method thereof |
| CN106873281A (en) * | 2017-04-21 | 2017-06-20 | 安徽鑫昊等离子显示器件有限公司 | Electrochromic device component, electrochromic device and preparation method thereof |
| CN110045559A (en) * | 2018-01-16 | 2019-07-23 | 大陆汽车有限公司 | Multistage scheduling and changeable glazing unit for flat glazing unit |
| US11161396B2 (en) | 2018-01-16 | 2021-11-02 | Continental Automotive Gmbh | Multilayer arrangement for a flat switchable glazing unit, switchable glazing unit and vehicle |
| CN110045559B (en) * | 2018-01-16 | 2022-05-24 | 大陆汽车有限公司 | Multi-layer arrangement for flat glazing units and switchable glazing units |
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