CN205608393U - Coaxial mask alignment device and photoetching equipment - Google Patents
Coaxial mask alignment device and photoetching equipment Download PDFInfo
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- CN205608393U CN205608393U CN201620267531.1U CN201620267531U CN205608393U CN 205608393 U CN205608393 U CN 205608393U CN 201620267531 U CN201620267531 U CN 201620267531U CN 205608393 U CN205608393 U CN 205608393U
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Abstract
The utility model discloses a coaxial mask alignment device and photoetching equipment. Coaxial mask alignment device includes lighting module, provides the alignment light beam, projection objective is located mask version below, the benchmark board is located the work piece bench bears benchmark reference mark, and image detection and processing module, be located benchmark board below, along with the work piece platform removes, just the benchmark reference mark be located in image detection and processing module's the view field range, the image is surveyed and processing module is used for the receipt to pass through in proper order mask alignment mark, projection objective and benchmark reference mark's alignment light beam obtains the mask alignment mark with benchmark reference mark's formation of image obtains after handling the mask alignment mark with benchmark reference mark's relative position information is used for the mask version with the work piece pair of stations is accurate. The utility model discloses a from area stand alone type illumination, simple structure, the simple operation has improved alignment efficiency.
Description
Technical field
This utility model relates to semi-conductor device technology field, particularly relates to a kind of coaxial mask alignment equipment
And lithographic equipment.
Background technology
During IC Chip Production, in order to realize the desired precision index of litho machine, need accurately to build
Relation between vertical each coordinate system of litho machine, enables mask, mask platform, object lens, silicon chip, work stage to build
Vertical unified position relationship.Generally litho machine can will be divided into mask alignment system and workpiece pair to Barebone
Barebone two kinds.Wherein, in the design of mask alignment system, such as Advanced Packaging litho machine, class light
Quarter machine, and on defect detection equipment, the principles using machine vision more.Configured mask markers align fills
Put many layouts mask (mask labelling) top, by certain thickness glass, mask labelling is carried out
Imaging detection；Also or by mask markers align device layout in mask (mask labelling) lower section, directly
To labelling imaging detection.
In existing equipment, layout is when mask (mask labelling) top, needs sensor to possess necessarily
Depth of focus, adapts to the uncertain out of focus that mask plate-making thickness deviation brings, may result in as meeting depth of focus
Demand and sacrifice alignment precision, or increase the vertical focus adjusting mechanism of camera lens, cause structure to complicate；For cloth
Office, when mask (mask labelling) lower section, needs mask platform to reserve installing space so that mask platform volume
Increasing, constructive difficulty strengthens.
Existing TFT litho machine uses exposure light source be masked alignment, and encapsulate the exposure light of litho machine
Source lighting dosage is relatively big, if still using exposure light source to be masked alignment, detector can be caused to damage and measure
Precision reduces；Meanwhile, existing TFT litho machine uses two set imaging lens and detectors pair in work stage
Mask labelling carries out imaging and detection, and structure is complicated, relatively costly.
Utility model content
The purpose of this utility model is, it is provided that a kind of coaxial mask alignment equipment and lithographic equipment, solves to cover
Masterplate thickness deviation adaptability problem, improves alignment efficiency further and reduces repeatedly the measurement between alignment by mistake
Difference.
For solving above-mentioned technical problem, this utility model provides a kind of coaxial mask alignment equipment, is used for realizing
Mask and the alignment of work stage, including:
Lighting module, it is provided that collimated light beam is irradiated and is positioned at the mask alignment mark on described mask；
Projection objective, is positioned at below described mask, for by described mask alignment mark imaging；
Datum plate, is positioned in described work stage, is used for carrying reference labelling；
And image detection and processing module, it is positioned at below described datum plate, along with described work stage moves,
And described reference labelling is positioned at the field range of described image detection and processing module, described image is visited
Survey and processing module sequentially passes through described mask alignment mark, projection objective and reference labelling for reception
To collimated light beam, obtain the imaging of described mask alignment mark and described reference labelling, after treatment
Obtain the relative position information of described mask alignment mark and described reference labelling, for described mask
It is directed at described work stage.
Optionally, for described coaxial mask alignment equipment, described mask includes one or more groups institute
State mask alignment mark, and the corresponding described lighting module of mask alignment mark described in a group.
Optionally, for described coaxial mask alignment equipment, the described mask alignment mark of many groups shares an institute
State reference labelling and image detection and processing module, described image detection and processing module along with described work
Part platform moves, receive through described projection objective to collimated light beam, respectively obtain and often organize described mask registration mark
Note and the relative position information of described reference labelling.
Optionally, for described coaxial mask alignment equipment, described image detection and processing module are arranged on
In described work stage.
Optionally, for described coaxial mask alignment equipment, described reference labelling is positioned at described image
At the optimal focal plane of detection and processing module.
Optionally, for described coaxial mask alignment equipment, described image detection includes into processing module
As battery of lens, detector and processing unit.
Optionally, for described coaxial mask alignment equipment, described detector is CCD or CMOS.
Optionally, for described coaxial mask alignment equipment, described reference is labeled as reflective contact metal
Labelling.
Optionally, for described coaxial mask alignment equipment, each described lighting module provide to quasi-optical
The wavelength of bundle is identical.
Optionally, for described coaxial mask alignment equipment, described lighting module provides ultraviolet wavelength light wave
To collimated light beam.
This utility model also provides for a kind of lithographic equipment, including a coaxial mask alignment equipment, for mask
With being directed between exposure object, described coaxial mask alignment equipment uses structure as above.
This utility model also provides for a kind of mask registration method, including:
Step 1, the first lighting module send first pair of collimated light beam and irradiate the first mask registration being positioned on mask
Labelling, travelling workpiece platform, make to incide through first pair of collimated light beam of projection objective to be positioned in described work stage
Reference labelling；
Step 2, it is positioned at the image detection below described reference labelling and processing module and receives and sequentially pass through institute
State first pair of collimated light beam of the first mask alignment mark, projection objective and reference labelling, obtain described
One mask alignment mark and the imaging of described reference labelling, obtain described first mask pair after treatment
Fiducial mark note and the relative position information of described reference labelling；
Step 3, afterwards, the second lighting module sends second pair of collimated light beam and irradiates the be positioned on described mask
Two mask alignment mark, then move described work stage, make second pair of collimated light beam through described projection objective enter
It is mapped to described reference labelling；
Step 4, described image detection and processing module receive and sequentially pass through described second mask alignment mark, throwing
Shadow object lens and second pair of collimated light beam of reference labelling, obtain described second mask alignment mark and described base
The imaging of quasi-reference marker, obtains described second mask alignment mark and described reference mark after treatment
The relative position information of note, and it is relative with described reference labelling to combine described first mask alignment mark
Positional information, carries out being directed at of described mask and described work stage.
This utility model also provides for another kind of mask registration method, including:
Step 1, the first lighting module send first pair of collimated light beam and irradiate the first mask registration being positioned on mask
Labelling, meanwhile, the second lighting module sends the second pair of collimated light beam and irradiates second be positioned on described mask and cover
Mould alignment mark, and travelling workpiece platform, make to incide through first pair of collimated light beam of projection objective to be positioned at benchmark
Reference labelling on plate；
Step 2, it is positioned at the image detection below described reference labelling and processing module and receives and sequentially pass through institute
State first pair of collimated light beam of the first mask alignment mark, projection objective and reference labelling, obtain described
One mask alignment mark and the imaging of described reference labelling, obtain described first mask pair after treatment
Fiducial mark note and the relative position information of described reference labelling；
Step 3, move described work stage again, make second pair of collimated light beam through described projection objective incide institute
State reference labelling；
Step 4, described image detection and processing module receive and sequentially pass through described second mask alignment mark, throwing
Shadow object lens and second pair of collimated light beam of reference labelling, obtain described second mask alignment mark and described base
The imaging of quasi-reference marker, obtains described second mask alignment mark and described reference mark after treatment
The relative position information of note, and it is relative with described reference labelling to combine described first mask alignment mark
Positional information, carries out being directed at of described mask and described work stage.
Optionally, for described mask registration method, in step 1, as the first couple through projection objective
When collimated light beam incides the reference labelling being positioned in described work stage, described second alignment BEAM SQUINT institute
State datum plate.
Optionally, for described mask registration method, described image detection and processing module are arranged on described
In work stage, and with described datum plate marginal point at a distance of the distance of at least d*M+ φ/2, wherein d represents described
First mask alignment mark and the spacing of the second mask alignment mark, M is the multiplying power of described projection objective, φ
For light beam diameter of the diffusion hot spot on its focal plane after described projection objective.
Compared with prior art, in the coaxial mask alignment equipment of this utility model offer and lithographic equipment, adopt
With carrying stand alone type illumination, it is achieved that miniaturization, can imbed inside work stage, both solve mask thick
The adaptability problem of degree tolerance, it also avoid the complication of mask alignment equipment structure.Meanwhile, benchmark is joined
Examine labelling imaging being gathered by image detection and processing module together with mask alignment mark, it is achieved that mask pair
Measure while fiducial mark note and reference labelling, further increase alignment efficiency, decrease and be repeatedly directed at
Between measurement error.
Accompanying drawing explanation
Fig. 1 is the structural representation of the coaxial mask alignment equipment of one embodiment of this utility model；
Fig. 2 is datum plate and the structural representation of image-forming module in Fig. 1；
Fig. 3 is the flow chart of mask registration method in another embodiment of this utility model；
Fig. 4 is the flow chart of mask registration method in another embodiment of this utility model.
Detailed description of the invention
Below in conjunction with schematic diagram, coaxial mask alignment equipment of the present utility model and lithographic equipment are carried out more detailed
Thin description, which show preferred embodiment of the present utility model, it should be appreciated that those skilled in the art can
To revise this utility model described here, and still realize advantageous effects of the present utility model.Therefore, under
Row describe be appreciated that for those skilled in the art widely known, and are not intended as to this practicality newly
The restriction of type.
In order to clear, whole features of practical embodiments are not described.In the following description, it is not described in detail public affairs
The function known and structure, because they can make this utility model chaotic due to unnecessary details.Should recognize
For in the exploitation of any practical embodiments, it is necessary to make a large amount of implementation detail to realize the specific mesh of developer
Mark, such as, according to about system or about the restriction of business, changed into another embodiment by an embodiment.
Additionally, it should it is complicated and time-consuming to think that this development is probably, but for art technology
It it is only routine work for personnel.
Referring to the drawings this utility model the most more particularly described below in the following passage.According to following theory
Bright and claims, advantage of the present utility model and feature will be apparent from.It should be noted that, accompanying drawing is all adopted
By the form simplified very much and all use non-ratio accurately, only in order to convenient, aid in illustrating this reality lucidly
By the purpose of new embodiment.
It is exemplified below described coaxial mask alignment equipment and the preferred embodiment of lithographic equipment, with clear explanation originally
The content of utility model, it is understood that, content of the present utility model is not restricted to following example,
Other by the improvement of the routine techniques means of those of ordinary skill in the art also at thought model of the present utility model
Within enclosing.
Refer to the structural representation of the coaxial mask alignment equipment that Fig. 1, Fig. 1 are one embodiment of this utility model
Figure.As it is shown in figure 1, described coaxial mask alignment equipment, for realizing the right of mask 5 and work stage 12
Standard, including: lighting module A, B, it is provided that collimated light beam is irradiated and is positioned at the mask registration on described mask 5
Labelling 6,7；Projection objective 8, is positioned at below described mask 5, for by described mask alignment mark 6,
7 imagings；Datum plate 9, is positioned in described work stage 12, is used for carrying reference labelling 10；And figure
As detection and processing module 11, it is positioned at below described datum plate 9, along with described work stage 12 moves, and institute
State reference labelling 10 and be positioned at described image detection and the field range of processing module 11, described image
Detection and processing module 11 sequentially pass through described mask alignment mark 6,7, projection objective 8 and base for reception
Quasi-reference marker 10 to collimated light beam, obtain described mask alignment mark 6,7 and described reference labelling
The imaging of 10, obtains described mask alignment mark 6,7 and described reference labelling 10 after treatment
Relative position information, is directed at described work stage 12 for described mask 5.
One or more groups described mask alignment mark, and mask registration described in one group is included on described mask 5
The corresponding described lighting module of labelling.Such as in preferable selection of the present utility model, as it is shown in figure 1,
Including two groups of mask alignment mark, the i.e. first mask alignment mark 6 and the second mask alignment mark 7, accordingly,
Also include two lighting modules, the i.e. first lighting module A and the second lighting module B.
Described first lighting module A includes light source 1, illuminating mirror group 2, light source 1 light sent is through over-illumination
After the process of mirror group 2, generation first is to collimated light beam, and same, described second lighting module B includes light source 3,
Illuminating mirror group 4, light source 3 light sent, after the process of illuminating mirror group 4, produces second to collimated light beam.
Preferably, the wavelength to collimated light beam that the first lighting module A and the second lighting module B provides is identical.
For example, it is possible to be to provide ultraviolet wavelength light wave to collimated light beam.
Further, in order to realize the generation to collimated light beam and use, described lighting module can also include one
Beam Control shutter (not shown), opens when needed so that collimated light beam illuminates mask 5 parts such as grade.
The described mask alignment mark of described many groups shares reference labelling 10 described in one and image detection and process
Module 11, described image detection and processing module 11 move along with described work stage 12, receive through described
Projection objective 8 to collimated light beam, respectively obtain and often organize described mask alignment mark 6,7 and described reference
The relative position information of labelling 10.
Preferably, in described image detection and processing module 11 are arranged on described work stage 12.Such as Fig. 2 institute
Showing, described image detection and processing module 11 include imaging lens group 111, detector 112 and processing unit
113.Described detector 112 is CCD or CMOS, it is possible to achieve the Real-time Collection to imaging.Described place
Reason unit 113 runs in a single processor, and the imaging collected is processed by described processor,
Obtain mask alignment mark 6,7 and the reference labelling 10 location of pixels in visual field, utilize an image
Transition matrix obtains being directed at position, it is achieved mask 5 is directed at work stage 12.
Described reference labelling 12 can be such as reflective contact metal labelling.In preferably selecting, described base
Quasi-reference marker 12 is arranged on a datum plate 10, described datum plate 9 and described image detection and process mould
Block 11 integrates, and is positioned at directly over described image detection and processing module 11.Further, as
Shown in Fig. 2, described reference labelling 10 is positioned at described image detection and the optimal focal plane of processing module 11
Place.
Described datum plate 9 is arranged in described work stage 12 with described image detection and processing module 11, from
And can realize and being synchronized with the movement of work stage 12, further, described work stage 12 can be arranged on
(if present) on catenary motion platform, it is possible to achieve described datum plate 9 and described image detection and processing module
The regulation of 11 positions.Further, so in the phase obtaining reference labelling 10 and mask alignment mark 6,7
Para-position postpones, it becomes possible to obtain the position of work stage 12, and then the product to be processed being arranged in work stage 12
The position of product 14 can be guaranteed.Meanwhile, described coaxial mask alignment equipment also includes being positioned at described object lens
The off-axis alignment camera lens 13 of 8 sides, described benchmark version 9 additionally provides and matches with off-axis alignment camera lens 13
Off-axis reference marker, described off-axis reference marker is similarly provided in described benchmark version 9, can be benchmark
Reference marker 10, or can also be the reference marker being arranged on other positions in benchmark version 9.
On the basis of this, this utility model provides a kind of lithographic equipment, including a coaxial mask alignment equipment,
For being directed between mask with exposure object, described coaxial mask alignment equipment uses knot as above
Structure.
Below the mask registration method in another embodiment of this utility model is described in detail.Refer to Fig. 1
And Fig. 3, including:
Step S11, the first lighting module A send first pair of collimated light beam irradiation and are positioned at first on mask 5
Mask alignment mark 6, travelling workpiece platform 12, make first pair of collimated light beam through projection objective 8 incide position
Reference labelling 10 in described work stage 12；
Step S12, it is positioned at the image detection below described reference labelling 10 and processing module 11 and receives and depend on
Secondary the first couple through described first mask alignment mark 6, projection objective 8 and reference labelling 10 is quasi-optical
Bundle, obtains the imaging of described first mask alignment mark 6 and described reference labelling 10, after treatment
Obtain the relative position information of described first mask alignment mark 6 and described reference labelling 10；
Step S13, afterwards, the second lighting module B sends second pair of collimated light beam and irradiates and be positioned at described mask 5
On the second mask alignment mark 7, then move described work stage 12, make through described projection objective 8
Two pairs of collimated light beams incide described reference labelling 10；
Step S14, described image detection and processing module 11 receive and sequentially pass through described second mask registration mark
Note 7, projection objective 8 and second pair of collimated light beam of reference labelling 10, obtain described second mask registration
Labelling 7 and the imaging of described reference labelling 10, obtain described second mask alignment mark after treatment
7 with the relative position information of described reference labelling 10, and combine described first mask alignment mark 7 with
The relative position information of described reference labelling 10, carries out described mask 5 and described work stage 12
Alignment.
Below, the mask registration method in another embodiment of this utility model is described in detail.Refer to
Fig. 1 and Fig. 4, including:
Step S21, the first lighting module A send first pair of collimated light beam irradiation and are positioned at first on mask 5
Mask alignment mark 6, meanwhile, the second lighting module B sends second pair of collimated light beam irradiation and is positioned at described mask
The second mask alignment mark 7 on 5, and travelling workpiece platform 12, make the first couple through projection objective 8 quasi-optical
Bundle incides the reference labelling 10 being positioned on datum plate 12；In this step 1, when through projection objective
When first pair of collimated light beam of 8 incides the reference labelling 10 being positioned in described work stage 12, described second
Datum plate 9 described in alignment BEAM SQUINT.
Step S22, it is positioned at the image detection below described reference labelling 10 and processing module 11 and receives and depend on
Secondary the first couple through described first mask alignment mark 6, projection objective 8 and reference labelling 10 is quasi-optical
Bundle, obtains the imaging of described first mask alignment mark 6 and described reference labelling 10, after treatment
Obtain the relative position information of described first mask alignment mark 6 and described reference labelling 10；
Step S23, move described work stage 12 again, make second pair of collimated light beam through described projection objective 8
Incide described reference labelling 10；
Step S24, described image detection and processing module 11 receive and sequentially pass through described second mask registration mark
Note 7, projection objective 8 and second pair of collimated light beam of reference labelling 10, obtain described second mask registration
Labelling 7 and the imaging of described reference labelling 10, obtain described second mask alignment mark after treatment
7 with the relative position information of described reference labelling 10, and combine described first mask alignment mark 7 with
The relative position information of described reference labelling 10, carries out described mask 5 and described work stage 12
Alignment.
In view of carry out a wherein road to collimated light beam on time, another road also can be through projection thing to collimated light beam
In the work stage 12 that mirror 8 is irradiated to.In order to avoid processed product 14 is by collimated light beam (such as ultraviolet light)
Irradiation and there is exposure reaction, need when coaxial mask alignment equipment layout, pay special attention to avoid alignment
Light beam is irradiated on processed product 14.The position of this layout is by work stage stroke, the first mask registration mark
Note 6 and spacing d of the second mask alignment mark 7, multiplying power M three's joint effect of projection objective.First
The space projection of mask alignment mark 6 and the second mask alignment mark 7 in projection objective focal plane to quasi-optical
Beam center distance is D=d*M, and additionally in view of alignment beam collimation degree constraint, it projects to projection objective
After on focal plane, there is certain diffusion, remember that its diffusion spot diameter is φ, the most described image detection and process mould
Block 11 and the described datum plate 9 marginal point distance at a distance of at least d*M+ φ/2.
Compared with prior art, in the coaxial mask alignment equipment of this utility model offer and lithographic equipment, adopt
With carrying stand alone type illumination, it is achieved that miniaturization, can imbed inside work stage, both solve mask thick
The adaptability problem of degree tolerance, it also avoid the complication of mask alignment equipment structure.Meanwhile, benchmark is joined
Examine labelling imaging being gathered by image capture module together with mask alignment mark, it is achieved that mask alignment mark
Measure with while reference labelling, further increase alignment efficiency, decrease repeatedly between alignment
Measurement error.
Obviously, those skilled in the art this utility model can be carried out various change and modification without deviating from
Spirit and scope of the present utility model.So, if these amendments of the present utility model and modification belong to this reality
Within the scope of novel claim and equivalent technologies thereof, then this utility model is also intended to comprise these changes
With including modification.
Claims (11)
1. a coaxial mask alignment equipment, for realizing the alignment of mask and work stage, it is characterised in that
Including:
Lighting module, it is provided that collimated light beam is irradiated and is positioned at the mask alignment mark on described mask；
Projection objective, is positioned at below described mask, for by described mask alignment mark imaging；
Datum plate, is positioned in described work stage, is used for carrying reference labelling；
And image detection and processing module, it is positioned at below described datum plate, along with described work stage moves,
And described reference labelling is positioned at the field range of described image detection and processing module, described image is visited
Survey and processing module sequentially passes through described mask alignment mark, projection objective and reference labelling for reception
To collimated light beam, obtain the imaging of described mask alignment mark and described reference labelling, after treatment
Obtain the relative position information of described mask alignment mark and described reference labelling, for described mask
It is directed at described work stage.
2. coaxial mask alignment equipment as claimed in claim 1, it is characterised in that wrap on described mask
Include one or more groups described mask alignment mark, and the corresponding described illumination of mask alignment mark described in a group
Module.
3. coaxial mask alignment equipment as claimed in claim 2, it is characterised in that the described mask pair of many groups
Fiducial mark note shares reference labelling described in one and image detection and processing module, described image detection and process
Module moves along with described work stage, receive through described projection objective to collimated light beam, respectively obtain often group
Described mask alignment mark and the relative position information of described reference labelling.
4. mask alignment equipment as claimed in claim 1 coaxial, it is characterised in that described image detection and
Processing module is arranged in described work stage.
5. coaxial mask alignment equipment as claimed in claim 1, it is characterised in that described reference mark
Note is positioned at the optimal focal plane of described image detection and processing module.
6. mask alignment equipment as claimed in claim 1 coaxial, it is characterised in that described image detection and
Processing module includes imaging lens group, detector and processing unit.
7. coaxial mask alignment equipment as claimed in claim 6, it is characterised in that described detector is CCD
Or CMOS.
8. coaxial mask alignment equipment as claimed in claim 1, it is characterised in that described reference mark
It is designated as reflective contact metal labelling.
9. coaxial mask alignment equipment as claimed in claim 2, it is characterised in that each described illumination mould
The wavelength to collimated light beam that block provides is identical.
10. coaxial mask alignment equipment as claimed in claim 9, it is characterised in that described lighting module
There is provided ultraviolet wavelength light wave to collimated light beam.
11. 1 kinds of lithographic equipments, it is characterised in that include a coaxial mask alignment equipment, for mask
With being directed between exposure object, described coaxial mask alignment equipment uses such as any one of claim 1 to 10
Described structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620267531.1U CN205608393U (en) | 2016-03-31 | 2016-03-31 | Coaxial mask alignment device and photoetching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620267531.1U CN205608393U (en) | 2016-03-31 | 2016-03-31 | Coaxial mask alignment device and photoetching equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205608393U true CN205608393U (en) | 2016-09-28 |
Family
ID=56964148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620267531.1U Withdrawn - After Issue CN205608393U (en) | 2016-03-31 | 2016-03-31 | Coaxial mask alignment device and photoetching equipment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106733543A (en) * | 2017-03-20 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of uv curing machine |
| WO2017167260A1 (en) * | 2016-03-31 | 2017-10-05 | 上海微电子装备（集团）股份有限公司 | Coaxial mask alignment device, photolithography apparatus and alignment method |
-
2016
- 2016-03-31 CN CN201620267531.1U patent/CN205608393U/en not_active Withdrawn - After Issue
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017167260A1 (en) * | 2016-03-31 | 2017-10-05 | 上海微电子装备（集团）股份有限公司 | Coaxial mask alignment device, photolithography apparatus and alignment method |
| CN107290943A (en) * | 2016-03-31 | 2017-10-24 | 上海微电子装备（集团）股份有限公司 | Coaxial mask alignment equipment, lithographic equipment and alignment methods |
| CN107290943B (en) * | 2016-03-31 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | Coaxial mask alignment equipment, lithographic equipment and alignment methods |
| US10901331B2 (en) | 2016-03-31 | 2021-01-26 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Coaxial mask alignment device, photolithography apparatus and alignment method |
| CN106733543A (en) * | 2017-03-20 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of uv curing machine |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20160928 Effective date of abandoning: 20190129 |