CN205473995U - Liquid device is rolled to chain etching machine - Google Patents
Liquid device is rolled to chain etching machine Download PDFInfo
- Publication number
- CN205473995U CN205473995U CN201620293256.0U CN201620293256U CN205473995U CN 205473995 U CN205473995 U CN 205473995U CN 201620293256 U CN201620293256 U CN 201620293256U CN 205473995 U CN205473995 U CN 205473995U
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- CN
- China
- Prior art keywords
- cell body
- silicon chip
- roller
- etching machine
- conveying roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model discloses a liquid device is rolled to chain etching machine, include first cell body, the second cell body of interval setting and be used for first cell body with a plurality of transmission roller of transmission silicon chip between the second cell body, transmission roller's top, correspond respectively first cell body with second cell body department is provided with two sets of spray set, and is two sets of be provided with between the spray set be used for to the silicon chip of the last transmission of transmission roller carries out dry drying device, drying device includes sponge gyro wheel and cold wind sword at least, just the sponge gyro wheel with the cold wind sword is along the traffic direction setting of silicon chip. This liquid device is rolled to chain etching machine can thoroughly clean the surperficial chemical liquid of silicon chip to prevent the chemical liquid entering of carrying on the silicon chip and pollute next cell body.
Description
Technical field
This utility model relates to solar energy manufacturing technology field, particularly relates to a kind of chain type etching machine and rolls liquid dress
Put.
Background technology
In conventional solar energy crystal silicon battery produces, liquid mode rolled by chain type etching machine typically has sponge to roll
Wheel, hard roller or cold knife are several, but this several ways all can not be by silicon chip surface when being used alone
Chemical liquid roll dry, so that the chemical liquids remaining in silicon chip surface is brought into next cell body
In, the next working procedure processing of impact.As it is shown in figure 1, it is a kind of mode being used alone sponge roller,
In figure, this device includes the first cell body 1 for previous operation, for the second groove of later operation
Body 2, is provided with conveying roller 3, by conveying roller 3 by silicon between the first cell body 1 and the second cell body 2
Sheet is delivered to the second cell body 2 position, the first cell body 1 and the second cell body 2 from the first cell body 1 position
The top of corresponding conveying roller 3 be provided with spray equipment 4, the first cell body 1 and the second cell body 2 it
Between the top of conveying roller 3 be provided with sponge roller 5, during work, silicon chip is logical at the first cell body 1
Crossing chemical liquids processed, this can make the remained on surface of silicon chip have chemical liquids, and silicon chip is rolled by transmission
When wheel 3 towards second cell bodies 2 carry, then the chemical liquids of silicon chip surface can be sponged by sponge roller 5
A part, but, due to the water absorption character of sponge roller 5 itself, it is after absorbing chemical liquids, it is impossible to
Reach the water suction of bigger pressure, thus silicon chip surface always remains a certain amount of chemical liquids.Therefore, in order to
Guaranteeing the clean level of silicon chip, these roll liquid mode not only can increase making of water in next cell body or medicinal liquid
Consumption, also can increase the processing cost of sewage.
Utility model content
The purpose of this utility model is that proposing a kind of chain type etching machine rolls liquid device, it is possible to thoroughly clean silicon
The chemical liquids on sheet surface, to prevent the chemical liquids carried on silicon chip from entering and to pollute next cell body.
For reaching this purpose, this utility model by the following technical solutions:
Liquid device rolled by a kind of chain type etching machine, including spaced first cell body, the second cell body and
For transmitting multiple conveying rollers of silicon chip, described biography between described first cell body and described second cell body
Two groups of spray dresses it are provided with at the top of defeated roller, the most corresponding described first cell body and described second cell body
Put, be provided with between spray equipment described in two groups for the silicon chip of transmission on described conveying roller is carried out
The drying device being dried, described drying device at least includes sponge roller and cold knife, and the rolling of described sponge
Wheel is arranged along the traffic direction of silicon chip with described cold knife.
Wherein, described first cell body and described second cell body are rinse bath, described sponge roller and described cold
Air knife is arranged at the top of described conveying roller corresponding to described first cell body or described second cell body correspondence
The top of described conveying roller or the described first cell body institute corresponding with at the interval of described second cell body
State the top of conveying roller.
Wherein, described first cell body is rinse bath, and described second cell body is technology groove, described sponge roller
The top or described first of described conveying roller corresponding to described first cell body it is arranged at described cold knife
The top of the described conveying roller that cell body is corresponding with at the interval of described second cell body.
Wherein, described first cell body is technology groove, and described second cell body is rinse bath, described sponge roller
The described biography that described first cell body is corresponding with at the interval of described second cell body it is arranged at described cold knife
The top of defeated roller or the top of described conveying roller corresponding to described second cell body.
Wherein, described sponge roller is arranged side by side on same level direction with described cold knife, described sea
Continuous roller and described cold knife interval are arranged.
Wherein, the horizontal range between described sponge roller and described first cell body less than described cold knife with
Horizontal range between described first cell body.
Wherein, the bottom minimum point of described sponge roller is fitted mutually with the top peak of described conveying roller
Should, the distance of the top peak of the bottom of described cold knife to described conveying roller is 5～20mm.
Wherein, described cold knife includes cold wind chamber, and the cold wind of the side end being arranged on described cold wind chamber connects
Mouthful, and it is arranged on the cold wind edge of a knife of the bottom in described cold wind chamber.
Wherein, described cold knife is strip, and the bottom of described cold knife is provided with in a level pressure
Spraying compressed-air actuated gap under power, described gap correspondence silicon chip is arranged.
Wherein, the width in described gap is 0.01～0.1mm, and described compressed-air actuated pressure is
0.1～0.3Mpa.
The beneficial effects of the utility model are:
Liquid device rolled by chain type etching machine of the present utility model, its operationally, silicon chip is logical at the first cell body
After crossing chemical liquids processed, silicon chip is carried towards the second cell body, at course of conveying by conveying roller
In, first pass through sponge roller and the chemical liquids of silicon chip surface is sponged a part, be then passed through cold knife
Further another part chemical liquids of the residual of silicon chip surface is dried up, now, the change of silicon chip surface
Learn liquid and pass through sponge roller and twice effect of cold knife, the chemical liquids of silicon chip surface can be cleared up dry
Only, then silicon chip continues to be transmitted roller and is delivered to the second cell body, to carry out the processing of next operation；
And then just also would not be able to increase without increasing the usage amount of water therein or medicinal liquid in the second cell body
The processing cost of sewage.
Accompanying drawing explanation
Fig. 1 is the structural representation that liquid device rolled by chain type etching machine of the prior art.
Fig. 2 is the structural representation that liquid device rolled by chain type etching machine of the present utility model.
In figure: 1-the first cell body；2-the second cell body；3-conveying roller；4-spray equipment；5-sponge roller；
6-cold knife.
Detailed description of the invention
Further illustrate technical side of the present utility model below in conjunction with the accompanying drawings and by detailed description of the invention
Case.
As in figure 2 it is shown, liquid device rolled by a kind of chain type etching machine, including spaced first cell body 1,
Second cell body 2 and for transmitting silicon chip between described first cell body 1 and described second cell body 2
Multiple conveying rollers 3, the top of described conveying roller 3, the most corresponding described first cell body 1 and described
Be provided with two groups of spray equipments 4 at second cell body 2, be provided with between spray equipment 4 described in two groups for
The drying device being dried the silicon chip of transmission on described conveying roller 3, described drying device is at least
Including sponge roller 5 and cold knife 6, and described sponge roller 5 and described cold knife 6 are along silicon chip
Traffic direction is arranged.
Therefore, in the present embodiment, one group of corresponding first cell body 1 of spray equipment 4 is positioned at the first cell body 1
Top, and another group corresponding second cell body 2 of spray equipment 4 is positioned at the top of the second cell body 2.
As a kind of preferred implementation of the present utility model, described first cell body 1 and described second cell body
2 is rinse bath, and at this moment, described sponge roller 5 and described cold knife 6 can be arranged at described simultaneously
The top of the described conveying roller 3 of one cell body 1 correspondence or to be arranged at described second cell body 2 corresponding simultaneously
The top of described conveying roller 3 or be arranged at described first cell body 1 and described second cell body 2 simultaneously
Interval at the top of corresponding described conveying roller 3；Can also be that sponge roller 5 is arranged on described
The top of the described conveying roller 3 of one cell body 1 correspondence, and cold knife 6 is arranged on described first cell body 1
The top of the described conveying roller 3 corresponding with at the interval of described second cell body 2；It can also be sponge rolling
Wheel 5 is arranged on the described conveying roller that described first cell body 1 is corresponding with at the interval of described second cell body 2
The top of 3, and cold knife 6 is arranged on the top of described conveying roller 3 of described second cell body 2 correspondence；
It is to say, when described first cell body 1 and described second cell body 2 are the rinse bath as cleaning
Time, sponge roller 5 and/or cold knife 6 can be correspondingly arranged at described first cell body 1 and/or described
The top of the corresponding described conveying roller 3 of two cell bodies 2.
As another kind of preferred implementation of the present utility model, described first cell body 1 is rinse bath, institute
Stating the second cell body 2 is technology groove, and at this moment, described sponge roller 5 and described cold knife 6 are arranged at simultaneously
The top of the described conveying roller 3 of described first cell body 1 correspondence or be simultaneously arranged at described first cell body
The top of the 1 described conveying roller 3 corresponding with at the interval of described second cell body 2.In the present embodiment,
Owing to the second cell body 2 is technology groove, thus sponge roller 5 and/or cold knife 6 can not be directly arranged at
The top of technology groove, to prevent drying device from destroying the moisture film protective layer above silicon chip, and causes etching solution
Pollute the bad phenomenon of silicon chip upper surface.
As yet another preferred form of the present utility model, described first cell body 1 is technology groove, institute
Stating the second cell body 2 is rinse bath, and described sponge roller 5 and described cold knife 6 are arranged at described first groove
The top or described second of the described conveying roller 3 that body 1 is corresponding with at the interval of described second cell body 2
The top of the described conveying roller 3 of cell body 2 correspondence.In the present embodiment, it is work due to the second cell body 2
Skill groove, thus sponge roller 5 and/or cold knife 6 can not be directly arranged at the top of technology groove, in case
Only drying device destroys the moisture film protective layer above silicon chip, and causes etching solution to pollute silicon chip upper surface not
Good phenomenon.
Especially, in this utility model, described sponge roller 5 and described cold knife 6 are in same level
Being arranged side by side on direction, described sponge roller 5 and described cold knife 6 interval are arranged.And, silicon chip be from
First cell body 1 transmits to the second cell body 2, thus sponge roller 5 and cold knife 6 are also along the first groove
Body 1 is arranged to interval, the direction of the second cell body 2, and, specifically, sponge roller 5 and cold knife 6
It is disposed on the top of the first cell body 1 conveying roller 3 corresponding with at the interval of the second cell body 2, this
Time, the horizontal range between described sponge roller 5 and described first cell body 1 less than described cold knife 6 with
Horizontal range between described first cell body 1.It is thereby achieved that first sponge roller 5 absorbs chemistry
Liquid, then the two step operations dried up by cold knife.
So that sponge roller 5 can do one's best draws the chemical liquids of silicon chip surface, in this enforcement
In example, the top peak of the bottom minimum point of described sponge roller 5 and described conveying roller 3 is fitted mutually
Should, and similarly, so that silicon chip surface can be dried in the range of certain distance by cold knife
Process, it is preferred that the distance of the top peak of the bottom of described cold knife 6 to described conveying roller 3
It is 5～20mm.
In this utility model, preferred as one, described cold knife 6 includes cold wind chamber, is arranged on institute
State the cold wind interface of a side end in cold wind chamber, and be arranged on the cold wind edge of a knife of the bottom in described cold wind chamber.
Can be directly facing silicon chip by the cold wind edge of a knife, for blowing cold air, it is achieved be dried.Excellent as another kind
Choosing, described cold knife 6 is strip, and the bottom of described cold knife 6 is provided with at certain pressure
The lower compressed-air actuated gap of ejection, described gap correspondence silicon chip is arranged.Wherein, the width in described gap is
0.01～0.1mm, described compressed-air actuated pressure is 0.1～0.3Mpa.So arrange, can be the suitableeest
Answering the width of silicon chip so that at same width position, cold knife can carry out drying up process simultaneously.
Liquid device rolled by chain type etching machine of the present utility model, its operationally, silicon chip is logical at the first cell body
After crossing chemical liquids processed, silicon chip is carried towards the second cell body, at course of conveying by conveying roller
In, first pass through sponge roller and the chemical liquids of silicon chip surface is sponged a part, be then passed through cold knife
Further another part chemical liquids of the residual of silicon chip surface is dried up, now, the change of silicon chip surface
Learn liquid and pass through sponge roller and twice effect of cold knife, the chemical liquids of silicon chip surface can be cleared up dry
Only, then silicon chip continues to be transmitted roller and is delivered to the second cell body, to carry out the processing of next operation；
And then just also would not be able to increase without increasing the usage amount of water therein or medicinal liquid in the second cell body
The processing cost of sewage.
Know-why of the present utility model is described above in association with specific embodiment.These descriptions are intended merely to
Explain principle of the present utility model, and can not be construed to by any way this utility model protection domain
Limit.Based on explanation herein, those skilled in the art need not pay performing creative labour and can join
Expecting other detailed description of the invention of the present utility model, these modes fall within protection of the present utility model
Within the scope of.
Claims (10)
1. a liquid device rolled by chain type etching machine, including spaced first cell body (1), the second groove
Body (2) and between described first cell body (1) and described second cell body (2) transmission silicon chip
Multiple conveying rollers (3), it is characterised in that the top of described conveying roller (3), respectively correspondence
Described first cell body (1) and described second cell body (2) place are provided with two groups of spray equipments (4), two groups
It is provided with between described spray equipment (4) for the silicon chip in the upper transmission of described conveying roller (3) is entered
The drying device that row is dried, described drying device at least includes sponge roller (5) and cold knife (6),
And described sponge roller (5) is arranged along the traffic direction of silicon chip with described cold knife (6).
Liquid device rolled by chain type etching machine the most according to claim 1, it is characterised in that
Described first cell body (1) and described second cell body (2) are rinse bath, described sponge roller (5)
It is arranged at described conveying roller (3) corresponding to described first cell body (1) with described cold knife (6)
The top or described first of the described conveying roller (3) of top or described second cell body (2) correspondence
The top of the described conveying roller (3) that cell body (1) is corresponding with at the interval of described second cell body (2).
Liquid device rolled by chain type etching machine the most according to claim 1, it is characterised in that
Described first cell body (1) is rinse bath, and described second cell body (2) is technology groove, described sponge
Roller (5) and described cold knife (6) are arranged at the described transmission rolling that described first cell body (1) is corresponding
Top or described first cell body (1) of wheel (3) are corresponding with at the interval of described second cell body (2)
The top of described conveying roller (3).
Liquid device rolled by chain type etching machine the most according to claim 1, it is characterised in that
Described first cell body (1) is technology groove, and described second cell body (2) is rinse bath, described sponge
Roller (5) and described cold knife (6) are arranged at described first cell body (1) and described second cell body (2)
Interval at the top of corresponding described conveying roller (3) or institute corresponding to described second cell body (2)
State the top of conveying roller (3).
5. rolling liquid device according to the chain type etching machine described in any one of claim 2 to 4, its feature exists
In, described sponge roller (5) is arranged side by side on same level direction with described cold knife (6), institute
State sponge roller (5) and described cold knife (6) interval is arranged.
Liquid device rolled by chain type etching machine the most according to claim 5, it is characterised in that described sea
Horizontal range between continuous roller (5) and described first cell body (1) less than described cold knife (6) and
Horizontal range between described first cell body (1).
Liquid device rolled by chain type etching machine the most according to claim 6, it is characterised in that described sea
The continuous bottom minimum point of roller (5) adapts with the top peak of described conveying roller (3), described
The bottom of cold knife (6) is 5～20mm to the distance of the top peak of described conveying roller (3).
8. rolling liquid device according to the chain type etching machine described in any one of Claims 1-4, its feature exists
In, described cold knife (6) includes cold wind chamber, and the cold wind of the side end being arranged on described cold wind chamber connects
Mouthful, and it is arranged on the cold wind edge of a knife of the bottom in described cold wind chamber.
9. rolling liquid device according to the chain type etching machine described in any one of Claims 1-4, its feature exists
In, described cold knife (6) is strip, and the bottom of described cold knife (6) is provided with for one
Spraying compressed-air actuated gap under constant-pressure, described gap correspondence silicon chip is arranged.
Liquid device rolled by chain type etching machine the most according to claim 9, it is characterised in that described seam
The width of gap is 0.01～0.1mm, and described compressed-air actuated pressure is 0.1～0.3Mpa.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620293256.0U CN205473995U (en) | 2016-04-08 | 2016-04-08 | Liquid device is rolled to chain etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620293256.0U CN205473995U (en) | 2016-04-08 | 2016-04-08 | Liquid device is rolled to chain etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205473995U true CN205473995U (en) | 2016-08-17 |
Family
ID=56645088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620293256.0U Expired - Fee Related CN205473995U (en) | 2016-04-08 | 2016-04-08 | Liquid device is rolled to chain etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205473995U (en) |
-
2016
- 2016-04-08 CN CN201620293256.0U patent/CN205473995U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160817 Termination date: 20170408 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |