CN205450030U - Device of normal position microscopic mechanics , micro -structure, composition integration research carries out in scanning electron microscope - Google Patents
Device of normal position microscopic mechanics , micro -structure, composition integration research carries out in scanning electron microscope Download PDFInfo
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- CN205450030U CN205450030U CN201520896619.5U CN201520896619U CN205450030U CN 205450030 U CN205450030 U CN 205450030U CN 201520896619 U CN201520896619 U CN 201520896619U CN 205450030 U CN205450030 U CN 205450030U
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Abstract
The utility model provides a device of normal position microscopic mechanics, micro -structure, composition integration research carries out in scanning electron microscope belongs to material micro -structure and the former bit map field of levying of performance. This device adopts two trapezoidal lead screw drive systems, and device rigidity is big, and the measuring accuracy is high, operate steadily in scanning electron microscope, mechanical noise is little, and the formation of image is disturbed lowly to scanning electron microscope, trapezoidal lead screw has the auto -lock performance, can and start the test in the test of arbitrary time -out constantly, and the test data continuity is good, specimen grip has rotation function, can satisfy scanning beam formation of image, EDS and EBSD integration test in same microdomain territory in material drawing / the compression mechanical properties measuring while, the anchor clamps support frame of testing arrangement design, the specimen grip utensil has had full symmetrical structure with the sample, guarantees drawing / the compression stress action who receives complete symmetry of sample, and the geometric centre of sample warp under the center is located the electron beam all the time promptly, and dynamic research and the acquisition of high quality microcosmic scan imagery is tracked to the normal position of being convenient for.
Description
Technical field:
This utility model relates to a kind of carrying out in situ Micromechanics, micro structure, the device of composition Study on Integration in scanning electron microscope, belongs to material microstructure and performance in-situ representational field.
Background technology
No matter it is functional material, or structural material, the microstructure and the composition information that form these materials are to determine material physical property and the deciding factor of mechanical property expression behaviour.But, for a long time, material mechanical performance measurement and microstructure and component distributing sign are always independently carried out.Even if there being minority Experiments of Machanics can carry out under the diffraction conditions such as X-ray, synchrotron radiation, also lack original position, real-time, the real space high-resolution microstructure image information.And material preparation process to be understood in depth and different machining process are formed corresponding microstructure, relation between component distributing feature and material property, it is necessary for three being characterized and test organically combine.Scanning electron microscope is one of main tool of microstructure test, scanning electron microscope can to macroscopic view-to microcosmic, the even material of nano-scale carries out microstructure across yardstick measurement, it it is the important means disclosing the multistage organizational structure of material microcosmic (such as crystallite dimension, mutually distribution, interface feature, Impurity Distribution etc.).Scanning electron microscope configuration X-ray energy dispersive spectrometry-energy disperse spectroscopy (EnergyDispersiveX-raySpectroscopy) is called for short EDS and EBSD instrument (ElectronElectronBack-scatteringDiffraction), it is called for short EBSD, the microstructure of material and the data such as film micro area composition information and crystalline orientation can be set up contact.Study on Integration.
Place some chargers in scanning electron microscope sample chamber the most progressively to grow up simultaneously, material Characteristics of Evolution of microstructure under stretching/compressing iso-stress alternating load effect can be carried out on-spot study, the product of typical commercial has the in-situ scanning Electronic Speculum drawing stand of German Kammrath-Weiss company, Deben company of Britain, MTI company of the U.S..Utilizing these scanning electron microscope home position drawing stands, people, to material microstructure Changeement under the service state of bearing stress, achieve many important achievements in research.But, the SEM original position stretching platform of these commercializations existing, design volume is the biggest, can only be flat in scanning electron microscope sample holder, it is impossible in scanning electron microscope sample room, sample is carried out wide-angle and verts.So when drawing stand works, typically can only meet the collection carrying out during original position stretching or compression-loaded the scanning electron microscopy image signal to sample domain structure.Compatible scanning electron microscope EDS energy disperse spectroscopy and EBSD diffractometer the composition crystal structure information of same film micro area can not be carried out signals collecting simultaneously.Cause the characterization parameter that the many relevant to microstructure and mechanical property is important: such as the differentiation of material crystals orientation, deformation twin under stress effect, interfacial structure feature, phase transformation, component distributing and Elements Diffusion etc., measurement and the sign of real-time in-situ can not be carried out, make people that some key projects and the problem in science of material behavior and performance cannot be goed deep into.
Summary of the invention:
The problem existed for prior art, the purpose of this utility model is to provide and a kind of material can carry out structural scan Electronic Speculum in situ Micromechanics, micro structure, the device of composition Study on Integration.In the part large sample room scanning electron microscopes such as this utility model apparatus structure is compact, in that context it may be convenient to install the most existing FEIQuanta series of scans ultramicroscope, and NEC JEOL, Hitachi Hitachi, Zeiss Zeiss.Relative to business-like scanning electron microscope drawing stand, feature of the present utility model is that in the case of agent set may be mounted at and keeps horizontal motionless in scanning electron microscope, wherein sample clamping part can realize 70 ° of wide-angles and verts.So can realize scanning beam in scanning electron microscope easily load sample in situ imaging is dynamically observed, obtain same observation film micro area sample EDS composition information spectrum and EBSD crystal structure information figure speckle simultaneously.Can realize developing the material domain domain structure of load effect, integrated testing in situ such as composition information and crystal orientation, distribution etc., this device is the important scientific method of research material structure-composition-performance relation each other.
Above-mentioned purpose of the present utility model is implemented by the following technical programs.
A kind of in scanning electron microscope, carry out in situ Micromechanics, micro structure, the device of composition Study on Integration, it is characterized in that this device includes direct current micromotor driver 1, driving gear 3 and driven gear 4, worm and gear, trapezoidal screw, sample clamping system, load-measuring device and displacement measuring device and the fine vacuum counter flange being connected with scanning electron microscope, signal input and output joint, external driving, kinetic control system, data Collection & Processing System.
Described direct current micromotor driver 1, by decelerator 2, drives driving gear 3 to coordinate transmission with driven gear 4；Driven gear 4 drives worm screw 5 and the first worm gear 6, the second worm gear 7；First worm gear 6 drives the first trapezoidal screw 9 to realize rotary motion, and the second worm gear 7 drives the second trapezoidal screw 8 to realize rotary motion.
Trapezoidal screw rotational movement is fastened on the first sample clamp bracing frame 10 and the second sample clamp bracing frame 11 screw pair above realizes linear reciprocating motion, it is fixed on the first sample clamp bracing frame 10 the second sample clamp 17 above to move back and forth together with sample clamp support, move back and forth together with sample clamp support with the first sample clamp 16 being fixed on the second sample clamp bracing frame 11, it is achieved stretching and the Compressive Mechanical experiment to the sample 18 being clamped on the first sample clamp 16 and the second sample clamp 17.
First sample clamp bracing frame 10 end respectively with the first precise guide rail slide block 19, connect with the first guide rail 21, realize linear motion accurately to guide, second sample clamp bracing frame 11 end respectively with the second precise guide rail slide block 20, connect with the second guide rail 22, realizing linear motion accurately to guide, the first guide rail 21 and the second guide rail 22 are arranged on sample stage base 23.
First guide rail 21 and the second guide rail 22 can also strengthen bending rigidity and the non-deformability of sample stage base 23, in the case of ensureing sample stage non-deformability safety, the installation of the first guide rail 21 and the second guide rail 22 can reduce the design thickness of sample stage base 23, alleviates the overall weight of drawing stand.
Described load-measuring device 24 is fixed on load transducer pedestal 25, and load-measuring device 24 and the second sample clamp 17 realize being rigidly connected, and when the second sample clamp 17 under tension or pressure effect, directly transfer force on load-measuring device 24.
Described displacement measuring device 26 is on the first sample clamp bracing frame 10 and the second sample clamp bracing frame 11, when the first sample clamp 16 and the second sample clamp 17 clamp sample move back and forth in the axial direction time, displacement measuring device 26 directly measures the deflection of sample 18.
Fix seat one end at trapezoidal screw, sample clamp bracing frame lead limit switch 25 is installed.
Described direct current micromotor driver 1, driving power supply, control signal and the data acquisition signal of load-measuring device 24 and displacement measuring device 26 is connected with scanning electron microscope by wire respectively, scanning electron microscope is crossed vacuum flange and is fixed on scanning electron microscope example chamber body 28 side by vacuum sealing rubber ring, crosses the input of difference fixed power source and control signal input port 29 and data acquisition signal output connection port 30 on vacuum flange 27 both sides.
Drawing stand and external controller 31 are coupled together with control signal input port 29 and data acquisition signal output connection port 30 by power supply input.Applied by controller 31 and send instruction, it is achieved drawing stand stretches or compresses the control of motion mode, it is possible to achieve constant strain rate, constant stress controlled and simultaneously gather dynamic test data signal.
The first described sample clamp 16 and the second sample clamp 17, can install with uniaxial loading system level, make sample 18 surface normal direction parallel with electron beam 32 incident direction；First sample clamp 16 and the second sample clamp 17 can also rotate 70 ° along tensile axis alignment EBSD detector 33 direction, sample surfaces normal is made to tilt 70 ° relative to the incident direction of electron beam 32, it is simple to the most efficiently to collect while EDS eds detector 34, EBSD diffracted probe device 33 and secondary electron image detector 35 signal.
The described uniaxial loading system being placed in scanning electron microscope chamber, design compact conformation, the height of testing sample 18 and trapezoidal screw axis are maintained at same level position, when sample is loaded by loading system, ensure the first sample clamp bracing frame 10 and the second sample clamp bracing frame 11 and the first sample clamp 16, second sample clamp 17 is only by axial stress effect, avoid owing to stress surface is different, loading system is by moment of torsion effect, farthest reduce the stress deformation amount of loading system self, improve loading system sample 18 is deformed displacement measurement precision.
Described loading system whole height 45mm, in loading system is arranged on scanning electron microscope chamber, in the case of without impinging on scanning electron microscope lens barrel pole shoe 36, can coordinate sample platform of scanning electronic microscope to realize lift in height.In position during integrated testing work, the general distance tried one's best between holding sample 18 sightingpiston and pole shoe 36 is scanning imagery best effort distance (WD, scanning electron microscope parameter), it is possible to obtain high-quality scanning secondary electron image.
Generally flat or the cylindric sample of described sample 18, and sample has full symmetric structure, the geometric center of sample is designed as circular arc row gap structure, as shown in Figure 3.
First sample clamp bracing frame 10 and the second sample clamp bracing frame 11, first sample clamp 16 and the second sample clamp 17 and clamped tested sample 18, there is full symmetric structure, and after being clamped on the first sample clamp 16 and the second sample clamp 17 of sample 18, geometric center is positioned at immediately below electron beam 33, when installing sample 18, can be adjusted by the hole, location 37 of sample stage base, make sample 18 geometric center position hole on an axis with beam axis and uniaxial loading system.
When sample is stretched or compressed deformation, the geometric center of tested sample 18 is minimum due to sectional area, is first deformed by maximum stress effect；Simultaneously, the structure of sample 18 and the first sample clamp 16 and the second sample clamp 17, fixture bracing frame 10 and 11 have symmetrical structure, when loading system works, sample 18 both sides are by full symmetric stress effect, the center of deformation making sample 18 keeps transverse shifting, ensure that sample geometric center i.e. maximum distortion region remains at immediately below electron beam 33 viewing area, it is simple to microscopic events follows the trail of dynamic process research in situ.The design structure that loading system is full symmetric, can farthest avoid sample 18 being stretched or during compression stress effect, observed film micro area generation lateral drift, within result causes observing field range beyond electron beam 33, then loses the meaning of dynamic studies in situ.
Compared with prior art, this utility model has the following advantages and highlights effect: this utility model volume is little, compact conformation；Using double trapezoid Leadscrew drive system, device rigidity is big, and measuring accuracy is high；Operating steadily in scanning electron microscope, mechanical noise is little, low to scanning electron microscope imaging interference；Trapezoidal screw has self-locking property, can suspend test at any time and start test, and test data continuity is good；Sample clamp has spinfunction, can meet scanning beam imaging, EDS and EBSD integrated testing at same film micro area while material stretching/compressing mechanics performance measurement；The fixture bracing frame of test device design, sample clamp and sample have full symmetric structure, ensure sample by full symmetric stretching/compressing stress effect, the geometric center of sample, i.e. center of deformation is always positioned at immediately below electron beam, it is simple to follow the trail of dynamic studies in situ and high-quality microcosmic scanogram obtains.In a word, this utility model device combines and scans present microscope can be advanced material test, the important equipment guarantee of R and D to material realization Micromechanics, micro structure, composition Study on Integration in situ.
Accompanying drawing illustrates:
Fig. 1 this utility model overall appearance structure chart
Fig. 2 load application system location diagram in scanning electron microscope chamber
Fig. 3 load application system sample clamp and sample vert schematic diagram
Fig. 4 sample and fixture partial enlarged drawing
Detailed description of the invention
Below in conjunction with the accompanying drawings and detailed description of the invention further describes this utility model.
One carries out Micromechanics in situ in scanning electron microscope, micro structure, the device of composition Study on Integration, it is according to FEIQuanta650 Flied emission environmental scanning electron microscope, FEIQuanta250 tungsten filament environmental scanning electron microscope and JEOLJSM6500F field emission scanning electron microscope design, the a height of 140mm*110mm*45mm of length and width of this device, it is easily installed in scanning electron microscope sample room, load loading range 0～2000N, load precision 0.1%FSO, displacement stroke scope 0～25mm, displacement accuracy 0.02um, test rate scope 0～40um/s.In experiment in FEIQuanta250 tungsten filament environmental scanning electron microscope, test pure Ni metal extension evolution process of microdeformation process and microfissure during simple tension in position under scanning electron microscopy imaging pattern, obtain the power displacement curve of pure Ni metal simultaneously.
Whole experimentation is: sample 1) is first processed into the uniaxial tension sample 18 of length, width and height 20*2*1 (mm), then it is separately fixed on stretching clamp 16 and 17, adjust sample position, it is allowed to be in uniaxial tension state, and by band tooth wedge shape tabletting up and down, sample clamping is tight by soket head cap screw force, and put into scanning electron microscope example room；2) adjustment sample platform of scanning electronic microscope tilt angle is to 40 °, stretching device fixture tilt angle 30 °, makes sample observation surface relative to beam axis tilt angle at about 70 °.3) adjust scanning electron microscope detecting system, make sample be in imaging region Scanning Detction state, and by displacement, strain gauge zero；4) set stretching device Mechanics Performance Testing parameter, loading speed 2um/s, carry out pure Ni test button loading stretching experiment, utilize pure Ni metal process of microstructure change in drawing process of scanning electron microscope secondary electron image system record.
Claims (1)
1. one kind carries out Micromechanics, micro structure, the device of composition Study on Integration in situ in scanning electron microscope, it is characterized in that this device includes direct current micromotor driver, driving gear and driven gear, worm and gear, trapezoidal screw, sample clamping system, what load-measuring device, displacement measuring device were connected with scanning electron microscope crosses vacuum flange, signal input and output joint, data Collection & Processing System；
Described direct current micromotor driver, by decelerator, drives driving gear to coordinate transmission with driven gear；Driven gear drives worm screw and the first worm gear, the second worm gear；First worm gear drives the first trapezoidal screw to realize rotary motion, and the second worm gear drives the second trapezoidal screw to realize rotary motion；
The screw pair that trapezoidal screw rotational movement is fastened on above the first sample clamp bracing frame and the second sample clamp bracing frame realizes linear reciprocating motion, it is fixed on the second sample clamp above the first sample clamp bracing frame to move back and forth together with sample clamp support, move back and forth together with sample clamp support with the first sample clamp being fixed on the second sample clamp bracing frame
First sample clamp bracing frame end respectively with the first precise guide rail slide block, and the first guide rail connect, the second sample clamp bracing frame end respectively with the second precise guide rail slide block, and the second guide rail connect, the first guide rail and the second guide rails assembling are on sample stage base；
Described load-measuring device is fixed on load transducer pedestal, and load-measuring device and the second sample clamp realize being rigidly connected, and when the second sample clamp under tension or pressure effect, directly transfer force on load-measuring device；
Described displacement measuring device is on the first sample clamp bracing frame and the second sample clamp bracing frame, and when the first sample clamp and the second sample clamp clamping sample move back and forth in the axial direction, displacement measuring device directly measures the deflection of sample；Fix seat one end at trapezoidal screw, sample clamp bracing frame lead limit switch is installed；
Described direct current micromotor driver, driving power supply, control signal and the data acquisition signal of load-measuring device and displacement measuring device is connected with scanning electron microscope by wire respectively, scanning electron microscope is crossed vacuum flange and is fixed on limit, scanning electron microscope example chamber side by vacuum sealing rubber ring, crosses the input of difference fixed power source and control signal input port and data acquisition signal output connection port on vacuum flange both sides；
Drawing stand and external controller are coupled together with control signal input port and data acquisition signal output connection port by power supply input；
The first described sample clamp and the second sample clamp, install with uniaxial loading system level, make sample surfaces normal direction parallel with electron beam incident direction；Or the first sample clamp and the second sample clamp rotate 70 ° along tensile axis alignment EBSD detector direction, sample surfaces normal is made to tilt 70 ° relative to the incident direction of electron beam；
First sample clamp bracing frame and the second sample clamp bracing frame, first sample clamp and the second sample clamp and clamped tested sample, there is full symmetric structure, and after being clamped on the first sample clamp and the second sample clamp of sample, geometric center is positioned at immediately below electron beam, when installing sample, adjusted by the hole, location of sample stage base, make sample geometric center position hole on an axis with beam axis and uniaxial loading system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520896619.5U CN205450030U (en) | 2015-11-11 | 2015-11-11 | Device of normal position microscopic mechanics , micro -structure, composition integration research carries out in scanning electron microscope |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520896619.5U CN205450030U (en) | 2015-11-11 | 2015-11-11 | Device of normal position microscopic mechanics , micro -structure, composition integration research carries out in scanning electron microscope |
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| Publication Number | Publication Date |
|---|---|
| CN205450030U true CN205450030U (en) | 2016-08-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520896619.5U Withdrawn - After Issue CN205450030U (en) | 2015-11-11 | 2015-11-11 | Device of normal position microscopic mechanics , micro -structure, composition integration research carries out in scanning electron microscope |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110487628A (en) * | 2019-08-23 | 2019-11-22 | 杭州源位科技有限公司 | A kind of miniature mechanical test platform in original position |
| CN112083195A (en) * | 2019-06-13 | 2020-12-15 | 卡尔蔡司显微镜有限责任公司 | Method for operating a particle beam device and particle beam device for carrying out the method |
| CN112379129A (en) * | 2020-11-16 | 2021-02-19 | 付学文 | High-space-time resolution multi-mode carrier dynamics measurement system and measurement method |
| CN115394620A (en) * | 2022-10-27 | 2022-11-25 | 中铝材料应用研究院有限公司 | Scanning electron microscope sample stage |
-
2015
- 2015-11-11 CN CN201520896619.5U patent/CN205450030U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112083195A (en) * | 2019-06-13 | 2020-12-15 | 卡尔蔡司显微镜有限责任公司 | Method for operating a particle beam device and particle beam device for carrying out the method |
| CN110487628A (en) * | 2019-08-23 | 2019-11-22 | 杭州源位科技有限公司 | A kind of miniature mechanical test platform in original position |
| CN112379129A (en) * | 2020-11-16 | 2021-02-19 | 付学文 | High-space-time resolution multi-mode carrier dynamics measurement system and measurement method |
| CN115394620A (en) * | 2022-10-27 | 2022-11-25 | 中铝材料应用研究院有限公司 | Scanning electron microscope sample stage |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20160810 Effective date of abandoning: 20180518 |
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| AV01 | Patent right actively abandoned |