CN205374936U - Mask plate, chromatic filter layer, display substrates and display device - Google Patents
Mask plate, chromatic filter layer, display substrates and display device Download PDFInfo
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- CN205374936U CN205374936U CN201620045000.8U CN201620045000U CN205374936U CN 205374936 U CN205374936 U CN 205374936U CN 201620045000 U CN201620045000 U CN 201620045000U CN 205374936 U CN205374936 U CN 205374936U
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- mask plate
- chock insulator
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- colored filter
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Abstract
The utility model provides a mask plate, chromatic filter layer, display substrates and display device forms manyly to the bulge through the bilateral symmetry in mask plate lightproof district, shelter from the planting zone of dottle pin thing on the black matrix, so that utilize the color filter of mask plate preparation and the regional zero lap of the formation in advance of dottle pin thing, the utility model discloses a mask plate that does not set up the bulge is distinguished for present lightproof to the mask plate, and the color filter's who produces edge can not shelter from the in advance formation of dottle pin thing on black matrix regional (the planting zone of dottle pin thing on deceiving the matrix promptly) to eliminate dottle pin thing planting zone's on the black matrix that exposure machine precision difference band comes the inconsistent problem of thickness, improve the uniformity of dottle pin object height degree, promote the product yield.
Description
Technical field
This utility model belongs to technical field of liquid crystal display, is specifically related to a kind of mask plate, chromatic filter layer, display base plate and display device.
Background technology
As shown in Figure 1a; chromatic filter layer mainly includes substrate 1, black matrix (BM) 2, colored filter, protection rete (OC layer) 3 and chock insulator matter (PS) 4, and colored filter includes: Red lightscreening plate R, green color filter G, blue color filter B.The technique of existing chromatic filter layer is as follows: form black matrix 2 first on the base 1, then sequentially forms red, green, blue colored filter and flatness layer (i.e. protection rete 3), finally forms chock insulator matter 4 on protection rete 3.
Making the structure of good colored filter as shown in Figure 1a, the edge of red, green, blue colored filter just splices in black matrix 2 so that protect the highly consistent of rete 3, thus ensureing the highly consistent of each chock insulator matter 4.
But, when making colored filter, owing to exposure machine equipment precision is poor, cause that the edge of red, green, blue colored filter rides over the width heterogeneity in black matrix, occur between colored filter, overlapping phenomenon that is not tight or that repeat overlap joint.As shown in Figure 1 b; the width that the edge of red, green, blue colored filter rides in black matrix 2 is less; white space is there is between adjacent color optical filter; the height of the protection rete 3 on white space is low; the height of the protection rete 3 in non-blank-white region is high, causes that the height protecting the chock insulator matter 4 on rete 3 is inconsistent.As illustrated in figure 1 c; the width that the edge of red, green, blue colored filter rides in black matrix 2 is bigger; adjacent colored filter has overlap in black matrix 2; the height of the protection rete 3 of overlapping region is high; the height of the protection rete 3 of Non-overlapping Domain is low, causes that the height protecting the chock insulator matter 4 on rete 3 is inconsistent.
Owing to cannot ensure just to overlap between each colored filter so that the caliper uniformity in the region planting chock insulator matter 4 in black matrix 2 is poor, and then causes that the high level of homogeneity of chock insulator matter 4 is poor, affects product yield.
Utility model content
Technical problem to be solved in the utility model includes, for the above-mentioned problem that existing colored filter exists, it is provided that a kind of mask plate, chromatic filter layer, display base plate and display device.
This utility model provides a kind of mask plate, for making colored filter, including multiple row alternatively non-transparent district, the lateral symmetry in each column alternatively non-transparent district forms the multipair protuberance protruded to direction, adjacent column alternatively non-transparent district, the position of every pair of protuberance is corresponding with the pre-formed region of chock insulator matter, so that utilizing the colored filter that described mask plate makes non-overlapping with the pre-formed region of described chock insulator matter.
Preferably, described mask plate includes one of: for making the mask plate of Red lightscreening plate, for making the mask plate of green color filter, for making the mask plate of blue color filter.
This utility model also provides for a kind of chromatic filter layer, including being arranged on above substrate and spaced colored filter, the lateral symmetry of each colored filter forms the multipair depressed part caved inward, and the position of every pair of depressed part is corresponding with the position of preformed chock insulator matter；Described colored filter is non-overlapping with the pre-formed region of chock insulator matter.
Preferably, the pre-formed region of the depressed part of described colored filter and chock insulator matter is spliced mutually, or, there is gap between depressed part and the pre-formed region of chock insulator matter of described colored filter.
Preferably, described colored filter includes: Red lightscreening plate, green color filter and blue color filter.
Preferably, the projection on the substrate of the depressed part of described colored filter is tetragon or hexagon.
This utility model also provides for a kind of display base plate, including aforesaid chromatic filter layer.
Preferably, described display base plate includes color membrane substrates or COA substrate.
This utility model also provides for a kind of display device, including aforesaid display base plate.
Further, described display device also includes box substrate, is provided with chock insulator matter between box substrate and described display base plate.
Utility model this utility model has the advantages that
Mask plate provided by the utility model, chromatic filter layer, display base plate and display device, by forming multipair protuberance in the lateral symmetry in mask plate alternatively non-transparent district, the planting area of chock insulator matter in black matrix is blocked, so that utilizing the colored filter that described mask plate makes non-overlapping with the pre-formed region of chock insulator matter, mask plate of the present utility model is not provided with the mask plate of protuberance relative to existing alternatively non-transparent district, the edge of the colored filter produced will not block the chock insulator matter pre-formed region (i.e. the planting area of chock insulator matter in black matrix) in black matrix, thus eliminating the problem that in the black matrix that exposure machine low precision brings, the variable thickness of chock insulator matter planting area causes, improve the concordance of chock insulator matter height, improving product yield.
Accompanying drawing explanation
Fig. 1 a is one of structure chart of existing colored filter；
Fig. 1 b is the two of the structure chart of existing colored filter；
Fig. 1 c is the three of the structure chart of existing colored filter；
Fig. 2 is the schematic diagram of the mask plate of embodiment 1 of the present utility model；
Fig. 3 a is the structural representation of the chromatic filter layer of embodiment 2 of the present utility model；
Fig. 3 b is the structural representation of colored filter in embodiment 2；
Fig. 4 is in this utility model embodiment 2, when chock insulator matter is arranged on the position in the cross point of longitudinal string black matrix and horizontal a line black matrix, and the structural representation of chromatic filter layer；
Fig. 5 is the structural representation of the chromatic filter layer of embodiment 3 of the present utility model.
Accompanying drawing labelling:
1, substrate；2, black matrix；3, protection rete；4, chock insulator matter；5, mask plate；6, protuberance；51, alternatively non-transparent district；52, transparent area；71, depressed part；
W1, Red lightscreening plate the degree of depth of depressed part on right side；The degree of depth of the depressed part on the left of w2, green color filter；W ', the projection in black matrix of the preformed chock insulator matter width；
W, depressed part the degree of depth.
Detailed description of the invention
For making those skilled in the art be more fully understood that the technical solution of the utility model, below in conjunction with the drawings and specific embodiments, this utility model is described in further detail.Description of the present utility model reconstructs colored filter first being constituted black matrix in substrate, and, the black matrix of the strip that multiple row be arranged in parallel is example explanation.
Embodiment 1:
As in figure 2 it is shown, the present embodiment provides a kind of mask plate 5, being used for making colored filter, mask plate includes multiple row alternatively non-transparent district 51 and transparent area 52, alternatively non-transparent district 51 and transparent area 52 interval and arranges.The lateral symmetry in each column alternatively non-transparent district 51 forms multipair protuberance 6, and protuberance 6 protrudes to the direction in adjacent column alternatively non-transparent district 51, and namely protuberance 6 protrudes to the direction of transparent area 52.The position of every pair of protuberance 6 is corresponding with the pre-formed region of chock insulator matter, so that utilizing the colored filter that described mask plate makes non-overlapping with the pre-formed region of described chock insulator matter.
Mask plate of the present utility model is by forming multipair protuberance in the lateral symmetry in alternatively non-transparent district, the planting area of chock insulator matter in black matrix is blocked, so that utilizing the colored filter that described mask plate makes non-overlapping with the pre-formed region of chock insulator matter, mask plate of the present utility model is not provided with the mask plate of protuberance relative to existing alternatively non-transparent district, the edge of the colored filter produced will not block the chock insulator matter pre-formed region (i.e. the planting area of chock insulator matter in black matrix) in black matrix, thus eliminating the problem that in the black matrix that exposure machine low precision brings, the variable thickness of chock insulator matter planting area causes, improve the concordance of chock insulator matter height, improving product yield.
Described mask plate includes one of: for making the mask plate of Red lightscreening plate, for making the mask plate of green color filter, for making the mask plate of blue color filter.It is to say, for making the mask plate of Red lightscreening plate, for making the mask plate of green color filter and for making the shape of the mask plate of blue color filter and structure all as it was previously stated, three kinds of mask plates complement each other to form pattern by patterning processes.
Embodiment 2:
The present embodiment provides a kind of chromatic filter layer, as shown in Figure 3 a, this chromatic filter layer includes being arranged on above substrate 1 and spaced colored filter and be arranged on the black matrix 2 between two adjacent colored filters, colored filter includes: Red lightscreening plate R, green color filter G and blue color filter B, wherein, Red lightscreening plate R and green color filter G, green color filter G is adjacent with blue color filter B, and blue color filter B is adjacent with Red lightscreening plate R.
Shown in Fig. 3 b, the lateral symmetry of each colored filter forms the multipair depressed part 71 caved inward, and the position of every pair of depressed part 71 is corresponding with the position of preformed chock insulator matter 4；Described colored filter is non-overlapping with the pre-formed region of chock insulator matter 4, that is, the edge of colored filter will not block the chock insulator matter 4 pre-formed region (i.e. the planting area of chock insulator matter in black matrix) in black matrix 2, thus eliminating the problem that in the black matrix that exposure machine low precision brings, the variable thickness of chock insulator matter planting area causes, improve the concordance of chock insulator matter height, improving product yield.
Preferably, as shown in Figure 3 b, the projection on the base 1 of the depressed part 71 of colored filter is tetragon or hexagon.
Described colored filter is non-overlapping with the pre-formed region of chock insulator matter 4 comprises two kinds of situations: the first situation, the depressed part 71 of colored filter splices mutually with the pre-formed region of chock insulator matter 4, namely the depressed part 71 of colored filter and the lucky split in pre-formed region of chock insulator matter 4, be absent from therebetween white space；, there is gap between depressed part 71 and the pre-formed region of chock insulator matter 4 of colored filter, namely there is therebetween white space in the second situation.
It is described in detail for above-mentioned two situations individually below.
For the first situation, as shown in Figure 3 a, the degree of depth sum of the depressed part 71 of adjacent colored filter is equal to the width of preformed chock insulator matter projection in black matrix.As shown in Figure 3 b, the degree of depth of described depressed part 71 refers to the degree of depth w of depression.
Concrete, the width of the degree of depth of the depressed part on the left of the degree of depth of the depressed part on the right side of the Red lightscreening plate R+green color filter G=preformed chock insulator matter 4 projection in black matrix 2.The width of the degree of depth of the depressed part on the left of the degree of depth of the depressed part on the right side of the green color filter G+blue color filter B=preformed chock insulator matter 4 projection in black matrix 2.The width of the degree of depth of the depressed part on the left of the degree of depth of the depressed part on the right side of the blue color filter B+Red lightscreening plate R=preformed chock insulator matter 4 projection in black matrix 2.
Illustrate for adjacent Red lightscreening plate R and green color filter G, as shown in Figure 3 a, the degree of depth of the depressed part on the right side of Red lightscreening plate R is w1, the degree of depth of the depressed part on the left of green color filter G is w2, the width of the preformed chock insulator matter 4 projection in black matrix 2 is w ', therefore, w1+w2=w '.Adjacent green color filter G and blue color filter B, and adjacent blue color filter B and Red lightscreening plate R also meets above-mentioned relation, does not repeat them here.
It should be noted that except the black matrix of the strip be arrangeding in parallel except the multiple row cited by this utility model embodiment, black matrix can also be latticed, and latticed black matrix is intersected to form in length and breadth by multiple row black matrix and multirow black matrix.For latticed black matrix, chock insulator matter can be arranged on the position in the cross point of longitudinal string black matrix and horizontal a line black matrix, it is also possible to is arranged on the position of non crossover point.When chock insulator matter is arranged on the position in the cross point of longitudinal string black matrix and horizontal a line black matrix, the structure of chromatic filter layer as shown in Figure 4, the width w ' of the preformed chock insulator matter 4 of degree of depth w2=of the depressed part on the left of the degree of depth w1+ green color filter G of the depressed part on the right side of Red lightscreening plate R projection in black matrix 2.Adjacent green color filter G and blue color filter B, and adjacent blue color filter B and Red lightscreening plate R also meets above-mentioned relation, does not repeat them here.
For the non-overlapping the second situation in pre-formed region of colored filter Yu chock insulator matter 4, it is described in detail by embodiment 3 and with Fig. 5.
Embodiment 3
The present embodiment provides a kind of chromatic filter layer, and the present embodiment is identical with the structure of the chromatic filter layer that embodiment 2 provides and shape, is distinctive in that, there is gap between depressed part 71 and the pre-formed region of chock insulator matter 4 of colored filter.
As it is shown in figure 5, the degree of depth sum of the depressed part 71 of adjacent colored filter is less than the width of the preformed chock insulator matter 4 projection in black matrix.
Concrete, the degree of depth < width of the preformed chock insulator matter 4 projection in black matrix 2 of the depressed part on the left of the degree of depth of the depressed part on the right side of Red lightscreening plate R+green color filter G.The degree of depth < the width of the preformed chock insulator matter 4 projection in black matrix 2 of the depressed part on the left of the degree of depth of the depressed part on the right side of green color filter G+blue color filter B.The degree of depth < the width of the preformed chock insulator matter 4 projection in black matrix 2 of the depressed part on the left of the degree of depth of the depressed part on the right side of blue color filter B+Red lightscreening plate R.
Illustrate for adjacent Red lightscreening plate R and green color filter G, as it is shown in figure 5, the degree of depth of the depressed part on the right side of Red lightscreening plate R is w1, the degree of depth of the depressed part on the left of green color filter G is w2, the width of the preformed chock insulator matter 4 projection in black matrix 2 is w ', therefore, and w1+w2 < w '.Adjacent green color filter G and blue color filter B, and adjacent blue color filter B and Red lightscreening plate R also meets above-mentioned relation, does not repeat them here.In other words, for the degree of depth of the depressed part on the right side of Fig. 5 Red lightscreening plate R for w1, the degree of depth of the depressed part on the left of green color filter G is the BM region between w2 for exposing.It should be noted that the view field that the depressed part of colored filter in this utility model embodiment is on the base 1 is positioned at BM view field on the base 1, so it can be avoided that light leakage phenomena.
Embodiment 4
The present embodiment provides a kind of display base plate, and this display base plate includes above-mentioned chromatic filter layer.Described display base plate can be color membrane substrates or COA substrate.
Owing to the display base plate of the present embodiment includes above-mentioned chromatic filter layer, therefore, the edge of the colored filter in chromatic filter layer will not block the chock insulator matter pre-formed region (i.e. the planting area of chock insulator matter in black matrix) in black matrix, thus eliminating the problem that in the black matrix that exposure machine low precision brings, the variable thickness of chock insulator matter planting area causes, improve the concordance of chock insulator matter height, improving product yield.
Embodiment 5
The present embodiment provides a kind of display device, the above-mentioned display base plate of this display device.Described display device can also include box substrate, is provided with chock insulator matter between box substrate and described display base plate.
Above-mentioned chromatic filter layer is included owing to the display of the present embodiment shows, therefore, the edge of the colored filter in chromatic filter layer will not block the chock insulator matter pre-formed region (i.e. the planting area of chock insulator matter in black matrix) in black matrix, thus eliminating the problem that in the black matrix that exposure machine low precision brings, the variable thickness of chock insulator matter planting area causes, improve the concordance of chock insulator matter height, improving product yield.
It should be noted that, adopt the chromatic filter layer that the mask plate that this utility model provides makes, owing to the edge of colored filter will not block the chock insulator matter 4 pre-formed region in black matrix 2, after black matrix 2 arranges chock insulator matter 4, the whole height of chock insulator matter 4 can reduce relative to existing scheme, therefore, it can increase the height of chock insulator matter 4 by increasing the thickness of chock insulator matter coated film, so that chock insulator matter 4 reaches the height needed.
It is understood that embodiment of above is merely to illustrate that principle of the present utility model and the illustrative embodiments that adopts, but this utility model is not limited thereto.For those skilled in the art, when without departing from spirit of the present utility model and essence, it is possible to make various modification and improvement, these modification and improvement are also considered as protection domain of the present utility model.
Claims (10)
1. a mask plate, for making colored filter, including multiple row alternatively non-transparent district, it is characterized in that, the lateral symmetry in each column alternatively non-transparent district forms the multipair protuberance protruded to direction, adjacent column alternatively non-transparent district, the position of every pair of protuberance is corresponding with the pre-formed region of chock insulator matter, so that utilizing the colored filter that described mask plate makes non-overlapping with the pre-formed region of described chock insulator matter.
2. mask plate as claimed in claim 1, it is characterised in that described mask plate includes one of: for making the mask plate of Red lightscreening plate, for making the mask plate of green color filter, for making the mask plate of blue color filter.
3. a chromatic filter layer, including being arranged on above substrate and spaced colored filter, it is characterized in that, the lateral symmetry of each colored filter forms the multipair depressed part caved inward, and the position of every pair of depressed part is corresponding with the position of preformed chock insulator matter；Described colored filter is non-overlapping with the pre-formed region of chock insulator matter.
4. chromatic filter layer as claimed in claim 3, it is characterised in that the pre-formed region of the depressed part of described colored filter and chock insulator matter is spliced mutually, or, there is gap between depressed part and the pre-formed region of chock insulator matter of described colored filter.
5. chromatic filter layer as claimed in claim 3, it is characterised in that described colored filter includes: Red lightscreening plate, green color filter and blue color filter.
6. chromatic filter layer as claimed in claim 3, it is characterised in that the projection on the substrate of the depressed part of described colored filter is tetragon or hexagon.
7. a display base plate, it is characterised in that include the chromatic filter layer as described in any one of claim 3-6.
8. display base plate as claimed in claim 7, it is characterised in that described display base plate includes color membrane substrates or COA substrate.
9. a display device, it is characterised in that include display base plate as claimed in claim 7 or 8.
10. display device as claimed in claim 9, it is characterised in that also include box substrate, be provided with chock insulator matter between box substrate and described display base plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201620045000.8U CN205374936U (en) | 2016-01-18 | 2016-01-18 | Mask plate, chromatic filter layer, display substrates and display device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201620045000.8U CN205374936U (en) | 2016-01-18 | 2016-01-18 | Mask plate, chromatic filter layer, display substrates and display device |
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| CN205374936U true CN205374936U (en) | 2016-07-06 |
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| CN107132705A (en) * | 2017-07-18 | 2017-09-05 | 京东方科技集团股份有限公司 | Spacer material, the preparation method of spacer material, display panel and display device |
| CN108441816A (en) * | 2018-04-12 | 2018-08-24 | 京东方科技集团股份有限公司 | A kind of mask and evaporation coating device |
| WO2019024131A1 (en) * | 2017-08-02 | 2019-02-07 | 深圳市华星光电技术有限公司 | Color filer and display panel |
| CN111034167A (en) * | 2017-08-29 | 2020-04-17 | 索尼半导体解决方案公司 | Image forming apparatus and method of manufacturing the same |
| WO2021164354A1 (en) * | 2020-02-22 | 2021-08-26 | 长鑫存储技术有限公司 | Mask pattern applied to semiconductor photolithography process and method for photolithography process |
| CN114122230A (en) * | 2021-11-01 | 2022-03-01 | 深圳市华星光电半导体显示技术有限公司 | Mask plate, display panel and manufacturing method |
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2016
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| CN107132705A (en) * | 2017-07-18 | 2017-09-05 | 京东方科技集团股份有限公司 | Spacer material, the preparation method of spacer material, display panel and display device |
| WO2019024131A1 (en) * | 2017-08-02 | 2019-02-07 | 深圳市华星光电技术有限公司 | Color filer and display panel |
| CN111034167A (en) * | 2017-08-29 | 2020-04-17 | 索尼半导体解决方案公司 | Image forming apparatus and method of manufacturing the same |
| US11296136B2 (en) | 2017-08-29 | 2022-04-05 | Sony Semiconductor Solutions Corporation | Imaging apparatus and manufacturing method for imaging apparatus |
| CN108441816A (en) * | 2018-04-12 | 2018-08-24 | 京东方科技集团股份有限公司 | A kind of mask and evaporation coating device |
| CN108441816B (en) * | 2018-04-12 | 2020-11-20 | 京东方科技集团股份有限公司 | Mask plate and evaporation device |
| WO2021164354A1 (en) * | 2020-02-22 | 2021-08-26 | 长鑫存储技术有限公司 | Mask pattern applied to semiconductor photolithography process and method for photolithography process |
| CN114122230A (en) * | 2021-11-01 | 2022-03-01 | 深圳市华星光电半导体显示技术有限公司 | Mask plate, display panel and manufacturing method |
| CN114122230B (en) * | 2021-11-01 | 2023-08-22 | 深圳市华星光电半导体显示技术有限公司 | Mask plate, display panel and manufacturing method |
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