CN106873252A - Colored filter substrate and preparation method thereof - Google Patents
Colored filter substrate and preparation method thereof Download PDFInfo
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- CN106873252A CN106873252A CN201710254617.XA CN201710254617A CN106873252A CN 106873252 A CN106873252 A CN 106873252A CN 201710254617 A CN201710254617 A CN 201710254617A CN 106873252 A CN106873252 A CN 106873252A
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- counterbore
- auxiliary air
- color blocking
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
Abstract
The invention provides a kind of colored filter substrate, including substrate, also include black matrix", color blocking layer, transparent electrode layer, main gap particle and auxiliary air gap particle, it is located on black matrix" or color blocking layer at auxiliary air gap particle position and is respectively equipped with the first counterbore, make to form the second counterbore on transparent electrode layer, auxiliary air gap particle is in the second counterbore.Present invention also offers a kind of preparation method of colored filter substrate, comprise the following steps：One substrate is provided；Black matrix", color blocking layer are sequentially formed on substrate；It is located on black matrix" or color blocking layer and the first counterbore is formed at auxiliary air gap particle；Transparent electrode layer is formed in color blocking layer and the first counterbore, is located on the transparent electrode layer on the first counterbore and is formed the second counterbore；Auxiliary air gap particle is formed in the second counterbore and main gap particle is formed on transparent electrode layer.Compared with prior art, the purpose of product cost is reduced.
Description
Technical field
The present invention relates to a kind of LCD plate technique, particularly a kind of colored filter substrate and preparation method thereof.
Background technology
With the development of Display Technique, liquid crystal display has become most commonly seen display device.Wherein colorized optical filtering
Piece (CF) substrate is the important component of liquid crystal display, for liquid crystal display provides color.
Gap particles in current technology in colored filter are divided into main gap particle and auxiliary air gap particle, major-minor gap grain
Can there is difference in height in son, difference in height generally uses half-tone (gray-scale photomask) or gray-tone in 0.4-0.6um or so
(gray tone) mask plate is obtained by gold-tinted processing procedure, because the manufacture difficulty of half-tone and gray-tone mask plates is larger,
Costly, price is generally 3~4 times of common mask plate price.Product cost can be so caused to be difficult to reduce.
The content of the invention
To overcome the deficiencies in the prior art, the present invention provides a kind of colored filter substrate and preparation method thereof, so as to drop
The purpose of low product cost.
The invention provides a kind of colored filter substrate, including substrate, also including black matrix", color blocking layer, transparent electricity
Pole layer, main gap particle and auxiliary air gap particle, are located at auxiliary air gap particle position on black matrix" or color blocking layer and set respectively
There is the first counterbore, make to form the second counterbore on transparent electrode layer, auxiliary air gap particle is in the second counterbore, so that auxiliary air gap grain
Difference in height is formed between son and main gap particle.
Further, it is located on the black matrix" at auxiliary air gap particle position and is respectively equipped with the first counterbore.
Further, it is located in the color blocking layer at auxiliary air gap particle position and is respectively equipped with the first counterbore.
Further, it is located on the black matrix" at auxiliary air gap particle and is additionally provided with the 3rd counterbore.
Further, higher than the height of black matrix", two neighboring color is identical and is located at for the height of the color blocking layer
Color blocking layer in same row is connected with each other to form strip.
Further, every eight auxiliary air gap particles are on the direction in length and breadth of transparent electrode layer one main gap grain is set
Son.
Present invention also offers a kind of preparation method of colored filter substrate, comprise the following steps：
One substrate is provided；
Black matrix" is formed on substrate；
It is located on black matrix" and the first counterbore is formed at auxiliary air gap particle；
Color blocking layer is formed on black matrix"；
The color blocking layer in the first counterbore is removed by gold-tinted processing procedure using mask；
Transparent electrode layer is formed in color blocking layer and the first counterbore, shape on the first counterbore is located on the transparent electrode layer
Into the second counterbore；
Auxiliary air gap particle is formed in the second counterbore and main gap particle is formed on transparent electrode layer, make auxiliary air gap grain
Difference in height is formed between son and main gap particle.
Present invention also offers a kind of preparation method of colored filter substrate, comprise the following steps：
One substrate is provided；
Black matrix" and color blocking layer are sequentially formed on substrate；
It is located in color blocking layer and the first counterbore is formed at auxiliary air gap particle；
Transparent electrode layer is formed in color blocking layer and the first counterbore, shape on the first counterbore is located on the transparent electrode layer
Into the second counterbore；
Auxiliary air gap particle is formed in the second counterbore and main gap particle is formed on transparent electrode layer, make auxiliary air gap grain
Difference in height is formed between son and main gap particle.
Further, it is located at auxiliary air gap particle on black matrix" and is also formed with the 3rd counterbore.
Further, the aperture of second counterbore is 10-15um, and depth is 0.4-0.6um.
The present invention compared with prior art, first is set by being located on black matrix" or color blocking layer at auxiliary air gap particle
Covering transparent electrode layer after counterbore, is located at transparent electrode layer and the second counterbore is formed at the first counterbore, and auxiliary air gap particle is set
In the second counterbore, make to form difference in height between auxiliary air gap particle and main gap particle, being solved with this is carrying out gap particles
Price high half-tone (gray-scale photomask) or gray-tone (ash is used in (Photo Spacer, abbreviation PS) processing procedure
Tone) mask plate making gap particles, so as to reduce the purpose of product cost.
Brief description of the drawings
Fig. 1 is the profile of black matrix" in the embodiment of the present invention 1；
Fig. 2 is the location diagram of RGB color resistance layer and black matrix" in the embodiment of the present invention 1；
Fig. 3 is the profile for setting the second counterbore in the embodiment of the present invention 1 on transparent electrode layer；
Fig. 4 be in the embodiment of the present invention 1 in the second counterbore and transparency electrode layer surface forms the section of gap particles
Figure；
Fig. 5 is the location diagram of the embodiment of the present invention 1；
Fig. 6 is the profile of black matrix" in the embodiment of the present invention 2；
Fig. 7 is the location diagram of RGB color resistance layer and black matrix" in the embodiment of the present invention 2；
Fig. 8 is the profile for setting the second counterbore in the embodiment of the present invention 2 on nesa coating；
Fig. 9 is to carry in the embodiment of the present invention 2 in second counterbore and transparency electrode layer surface forms the section of gap particles
Figure；
Figure 10 is the location diagram of the embodiment of the present invention 2；
Figure 11 is the profile of black matrix" in the embodiment of the present invention 3；
Figure 12 is the location diagram of RGB color resistance layer and black matrix" in the embodiment of the present invention 3；
Figure 13 is the profile for setting the second counterbore in the embodiment of the present invention 3 on nesa coating；
Figure 14 is to carry in the embodiment of the present invention 3 in second counterbore and transparency electrode layer surface forms the section of gap particles
Figure.
Specific embodiment
The present invention is described in further detail with reference to the accompanying drawings and examples.
Its main improvement of colored filter substrate is the setting of major and minor gap particles in the present invention, and remainder is equal
Structure with colored filter substrate in the prior art is identical, and the basic structure to colored filter substrate of the invention is entered below
Row simple declaration, as shown in Fig. 4 and Fig. 9, colored filter substrate of the invention includes substrate 1, is sequentially formed on substrate 1
Black matrix" 2, color blocking layer 3 and transparent electrode layer (ITO) 5, the main gap of array arrangement is formed with transparent electrode layer 5
Particle 7 and auxiliary air gap particle 6, are located on the black matrix" 2 or color blocking layer 3 and are respectively equipped with first at the position of auxiliary air gap particle 6 and sink
Hole 4, is located on transparent electrode layer 5 and the second counterbore 8 is formed with first counterbore 4, and auxiliary air gap particle 6 is located in the second counterbore 8,
So that difference in height is formed between auxiliary air gap particle 6 and main gap particle 7, in the present invention, by the position of auxiliary air gap particle 6
Counterbore is set and counterbore is not provided with the position of main gap particle 7, substituted with this and pass through half-tone (GTGs in the prior art
Photomask) or gray-tone (gray tone) mask plate making gap particles.
The present invention can not use half-tone (gray-scale photomask) or gray-tone (gray tone) mask plates to make simultaneously
Decide, the colored filter substrate of auxiliary air gap particle, product cost can be substantially reduced.
The set location of the first counterbore 4 has two kinds of forms in the present invention, is described in detail below for both forms.
It is located at as shown in figure 4, in the embodiment of the present invention 1, on black matrix" 2 at the position of auxiliary air gap particle 6 and is respectively equipped with the
One counterbore 4, in this embodiment, color blocking layer 3 forms island structure respectively, and this scheme is applied to rounded projections arranged, square row
RGB the or RGBW color blocking layers of row or mosaic arrangement.
The preparation method of embodiment 1, comprises the following steps：
One substrate 1 is provided；
Form black matrix" 2 on substrate 1 (shown in Fig. 1)；
Be located on black matrix" 2 and the first counterbore 4 is formed at auxiliary air gap particle 6 (shown in Fig. 1)；
Color blocking layer 3 is formed on black matrix" 2 (shown in Fig. 2)；In prepared by general color blocking layer, color blocking layer is not only filled with
The grid of black matrix" 2 can also be covered in the color blocking accommodating cavity of black matrix" 2；
The color blocking layer 3 in the first counterbore 4 is removed by gold-tinted processing procedure using mask；
Transparent electrode layer 5 is formed on the counterbore 4 of color blocking layer 3 and first, the first counterbore is located on the transparent electrode layer 5
The second counterbore 8 is formed on 4 (shown in Fig. 3)；
Auxiliary air gap particle 6 is formed in the second counterbore 8 and main gap particle 7 is formed on transparent electrode layer 5, between making pair
Difference in height is formed between gap particle 6 and main gap particle 7 (shown in Fig. 4 and Fig. 5).
In above-mentioned preparation method, color blocking layer 3 forms island structure respectively.
As shown in figure 9, embodiment 2 is that the position of auxiliary air gap particle 6 is located in color blocking layer 3 with the maximum difference of embodiment 1
Place is respectively equipped with the first counterbore 4, and the height of the height higher than black matrix" 2 of color blocking layer 3 makes two neighboring color identical and position
Color blocking layer 3 in same row is connected with each other to form strip.This scheme is applied to the RGB color resistance layer of stripe-arrangement.
The preparation method of embodiment 2, comprises the following steps：
One substrate 1 is provided；
Sequentially form black matrix" 2 (shown in Fig. 6) and color blocking layer 3 on substrate 1 (shown in Fig. 7)；
Be located in color blocking layer 3 and the first counterbore 4 is formed at auxiliary air gap particle 6 (shown in Fig. 7)；
Transparent electrode layer 5 is formed on the counterbore 4 of color blocking layer 3 and first, the first counterbore is located on the transparent electrode layer 5
The second counterbore 8 is formed on 4 (shown in Fig. 8)；
Auxiliary air gap particle 6 is formed in the second counterbore 8 and formed on transparent electrode layer 5 main gap particle 7 (Fig. 9 and
Shown in Figure 10), make to form difference in height between auxiliary air gap particle 6 and main gap particle 7.
In the above-mentioned methods, the height of color blocking layer 3 higher than black matrix" 2 height, make two neighboring color identical and
Color blocking layer 3 in same row is connected with each other to form strip (shown in Figure 10).
The present invention can also be made in the following ways in addition to above two implementation method.
As shown in figure 14, the colored filter substrate of embodiment 3 includes substrate 1, the black square being sequentially formed on substrate 1
Battle array 2, color blocking layer 3 and transparent electrode layer (ITO) 5, are formed with the He of main gap particle 7 of array arrangement on transparent electrode layer 5
Auxiliary air gap particle 6, is located on the black matrix" 2 and color blocking layer 3 at the position of auxiliary air gap particle 6 and is respectively provided with the 3rd counterbore 9, the
One counterbore 4, color blocking layer 3 fills the 3rd counterbore 9, is located on transparent electrode layer 5 at first counterbore 4 and is formed with the second counterbore 8, real
The height of the height higher than black matrix" 2 of color blocking layer 3 in example 3 is applied, makes two neighboring color identical and in same row
Color blocking layer 3 is connected with each other to form strip (shown in Figure 12), and auxiliary air gap particle 6 is in the second counterbore 8, so that auxiliary air gap grain
Difference in height is formed between son 6 and main gap particle 7.
The preparation method of embodiment 3, comprises the following steps：
One substrate 1 is provided；
Form black matrix" 2 on substrate 1 (shown in Figure 11)；
It is located on black matrix" 2 and the 3rd counterbore 9 is formed at auxiliary air gap particle 6, the manufacture craft of the 3rd counterbore 9 is using existing
There is technology, be not specifically limited herein；
Color blocking layer 3 (shown in Figure 12) is formed on black matrix" 2, in prepared by general color blocking layer, color blocking layer is not only filled out
Filling in the color blocking accommodating cavity of black matrix" 2 can also cover the grid of black matrix" 2；The height of color blocking layer 3 is higher than black herein
The height of matrix 2, makes two neighboring color identical and the color blocking layer 3 in same row is connected with each other to form strip (figure
Shown in 12), color blocking layer 3 fills the 3rd counterbore 9；It is located in color blocking layer 3 and the (Figure 13 of the first counterbore 4 is formed at auxiliary air gap particle 6
It is shown), the first counterbore 4 is corresponding with the position of the 3rd counterbore 9；
Transparent electrode layer 5 is formed on the counterbore 4 of color blocking layer 3 and first, the first counterbore is located on the transparent electrode layer 5
The second counterbore 8 is formed on 4 (shown in Figure 13)；
Auxiliary air gap particle 6 is formed in the second counterbore 8 and (Figure 14 institutes of main gap particle 7 are formed on transparent electrode layer 5
Show), make to form difference in height between auxiliary air gap particle 6 and main gap particle 7.
The making of black matrix", color blocking layer, transparent electrode layer and counterbore is using colored in the prior art in the present invention
The conventional processing procedure of filter sheet base plate is prepared.
By the photoresistance generally negativity photoresistance that colored filter substrate is used, i.e., the generation for being shone by light in the present invention
Cross-linking reaction, stays after development, and the part for not shining light is washed off, so the mask in the present invention uses common mask
Version, the position corresponding section with the first counterbore 4 on mask is in the light with chromium.
The aperture of the second counterbore 8 is 10-15um in the present invention, and depth is 0.4-0.6um；The thickness of black matrix" is 1um, color
The thickness of resistance layer 3 is 2-3um, and the height of major and minor gap particles is 2.5-3.5um.
The set-up mode of major and minor gap particles 6 can be using between being every eight pairs on the direction in length and breadth of transparent electrode layer 5
The mode that gap particle 6 sets a main gap particle 7 is arranged.
Color blocking layer 3 in the present invention can also use the color color blocking layers of RGBW tetra- for the color color blocking layers of RGB tri-, not do herein
It is specific to limit.
Although the present invention has shown and described with reference to specific embodiment, it should be appreciated by those skilled in the art that：
In the case where the spirit and scope of the present invention limited by claim and its equivalent are not departed from, can carry out herein form and
Various change in details.
Claims (10)
1. a kind of colored filter substrate, including substrate (1), it is characterised in that：Also include black matrix" (2), color blocking layer (3),
Transparent electrode layer (5), main gap particle (7) and auxiliary air gap particle (6), are located at pair on black matrix" (2) or color blocking layer (3)
The first counterbore (4) is respectively equipped with gap particles (6) position, makes to form the second counterbore (8), auxiliary air gap on transparent electrode layer (5)
Particle (6) is interior located at the second counterbore (8), so that forming difference in height between auxiliary air gap particle (6) and main gap particle (7).
2. colored filter substrate according to claim 1, it is characterised in that：Between pair being located on the black matrix" (2)
The first counterbore (4) is respectively equipped with gap particle (6) position.
3. colored filter substrate according to claim 1, it is characterised in that：Auxiliary air gap is located on the color blocking layer (3)
The first counterbore (4) is respectively equipped with particle (6) position.
4. colored filter substrate according to claim 3, it is characterised in that：Between pair being located on the black matrix" (2)
Gap particle (6) place is additionally provided with the 3rd counterbore (9).
5. colored filter substrate according to claim 3, it is characterised in that：The height of the color blocking layer (3) is higher than black
The height of colour moment battle array (2), two neighboring color is identical and color blocking layer (3) of in same row is connected with each other to form strip
Shape.
6. the colored filter substrate according to claim 1 to 5 any one, it is characterised in that：In transparent electrode layer (5)
Direction in length and breadth on be every eight auxiliary air gap particles (6) a main gap particle (7) be set.
7. a kind of preparation method of colored filter substrate, it is characterised in that：Comprise the following steps：
One substrate (1) is provided；
Black matrix" (2) is formed on substrate (1)；
Auxiliary air gap particle (6) place is located on black matrix" (2) and forms the first counterbore (4)；
Color blocking layer (3) is formed on black matrix" (2)；
The color blocking layer (3) in the first counterbore (4) is removed by gold-tinted processing procedure using mask；
Transparent electrode layer (5) is formed in color blocking layer (3) and the first counterbore (4), first is located on the transparent electrode layer (5)
The second counterbore (8) is formed on counterbore (4)；
Auxiliary air gap particle (6) is formed in the second counterbore (8) and main gap particle (7) is formed on transparent electrode layer (5), made
Difference in height is formed between auxiliary air gap particle (6) and main gap particle (7).
8. a kind of preparation method of colored filter substrate, it is characterised in that：Comprise the following steps：
One substrate (1) is provided；
Black matrix" (2) and color blocking layer (3) are sequentially formed on substrate (1)；
Auxiliary air gap particle (6) place is located in color blocking layer (3) and forms the first counterbore (4)；
Transparent electrode layer (5) is formed in color blocking layer (3) and the first counterbore (4), first is located on the transparent electrode layer (5)
The second counterbore (8) is formed on counterbore (4)；
Auxiliary air gap particle (6) is formed in the second counterbore (8) and main gap particle (7) is formed on transparent electrode layer (5), made
Difference in height is formed between auxiliary air gap particle (6) and main gap particle (7).
9. the preparation method of colored filter substrate according to claim 8, it is characterised in that：On black matrix" (2)
The 3rd counterbore (9) is also formed with positioned at auxiliary air gap particle (6) place.
10. the preparation method of the colored filter substrate according to claim 7-9 any one, it is characterised in that：It is described
The aperture of the second counterbore (8) is 10-15um, and depth is 0.4-0.6um.
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| CN201710254617.XA CN106873252A (en) | 2017-04-18 | 2017-04-18 | Colored filter substrate and preparation method thereof |
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| CN201710254617.XA CN106873252A (en) | 2017-04-18 | 2017-04-18 | Colored filter substrate and preparation method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107589596A (en) * | 2017-09-25 | 2018-01-16 | 惠科股份有限公司 | Display panel and its manufacture method |
| CN109407413A (en) * | 2018-11-12 | 2019-03-01 | 惠科股份有限公司 | A kind of display panel, display device and its production light shield |
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