CN102854668B - The method for making of display base plate, display base plate and display device - Google Patents
The method for making of display base plate, display base plate and display device Download PDFInfo
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- CN102854668B CN102854668B CN201210359030.2A CN201210359030A CN102854668B CN 102854668 B CN102854668 B CN 102854668B CN 201210359030 A CN201210359030 A CN 201210359030A CN 102854668 B CN102854668 B CN 102854668B
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Abstract
The invention provides a kind of method for making of display base plate, be included in step underlay substrate being formed chock insulator matter figure, wherein, described chock insulator matter adopts lighttight material to be formed, and described chock insulator matter figure is separated out multiple pixel region on described underlay substrate.Correspondingly, a kind of display base plate adopting the method to make and the display device comprising described display base plate is provided.The display base plate that the method for making of display base plate of the present invention and employing the method are made can reduce patterning processes number of times.
Description
Technical field
The present invention relates to display fabrication techniques field, be specifically related to a kind of method for making of display base plate, adopt the display base plate that the method is made and the display device comprising described display base plate.
Background technology
Along with the development of display fabrication techniques, LCD Technology development rapidly, instead of traditional crt display unit and has become the main flow of following flat-panel monitor.In LCD Technology field, TFT-LCD(ThinFilmTransistorLiquidCrystalDisplay, Thin Film Transistor-LCD) with its large scale, highly integrated, powerful, technique flexibly, the advantage such as low cost and be widely used in the fields such as televisor, computer, mobile phone.
Wherein, TN(twisted-nematic, TwistedNematic) type TFT-LCD is less owing to exporting GTG progression, and liquid crystal deflecting element speed is fast, therefore the response time is short, and cost is lower, is thus used widely in field of liquid crystal; ADSDS(senior super dimension field switch technology, ADvancedSuperDimensionSwitch, being called for short ADS) type TFT-LCD is owing to having high resolving power, high permeability, low-power consumption, wide viewing angle, high aperture, low aberration, without advantages such as water of compaction ripples (pushMura), being more widely used in field of liquid crystal.
Display panel is one of critical piece of TFT-LCD, and described display panel is generally undertaken box by array base palte and color film (CF, ColorFilter) substrate, and filling liquid crystal forms between array base palte and color membrane substrates.Wherein, described array base palte is provided with the many grid lines be parallel to each other and the many data lines be parallel to each other, described many grid lines intersect with described many data lines and define multiple pixel cell, and each pixel cell includes a TFT element (comprising gate electrode, semiconductor layer, source electrode and drain electrode) and a pixel electrode.In existing TN type TFT-LCD, the manufacture craft of color membrane substrates generally comprises: on underlay substrate, form black matrix (BM successively, BlackMatrix), totally seven patterning processes such as red color filter region, green color region, blue color region, section difference eliminating layer (OC, OverCoat), public electrode and chock insulator matter (Spacer); In existing ADS type TFT-LCD, the manufacture craft of color membrane substrates generally comprises: on underlay substrate, form back side guarded electrode (B-ITO), black matrix, red color filter region, green color region, blue color region, totally seven patterning processes such as section difference eliminating layer and chock insulator matter etc. successively.In the manufacture craft of above-mentioned color membrane substrates, described underlay substrate is not formed multiple pixel region (or being called sub-pixel open area) by the place of black Matrix cover, and each pixel region on color membrane substrates is all corresponding from the different pixel cell of on array base palte, to make array base palte and color membrane substrates to after box, described multiple pixel region is relative with the position of described multiple pixel cell respectively.Because each patterning processes all needs mask plate Graphic transitions on film pattern, and every thin film figure all needs accurately to cover on another layer film figure, and in the manufacturing process of color membrane substrates, the number of times of used mask plate is fewer, then production efficiency is higher, and production cost is lower, therefore, how to reduce the number of times of patterning processes further, enhance productivity, reducing production cost is problem demanding prompt solution in industry.
Summary of the invention
Technical matters to be solved by this invention is for above-mentioned defect existing in prior art, provide a kind of can reduce the display base plate of patterning processes number of times method for making, adopt the display base plate that the method is made and the display device comprising described display base plate.
Solve the technical scheme that the technology of the present invention problem adopts:
The method for making of described display base plate is included in step underlay substrate being formed chock insulator matter figure, and wherein, described chock insulator matter adopts lighttight material to be formed, and described chock insulator matter figure is separated out multiple pixel region on described underlay substrate.
Preferably, described chock insulator matter adopts the light tight resin of black to be formed.
Preferably, described chock insulator matter comprises main chock insulator matter, secondary chock insulator matter and partition wall, the height of described chock insulator matter is between the height and the height of partition wall of main chock insulator matter, and described partition wall is arranged between main chock insulator matter and secondary chock insulator matter, and described main chock insulator matter and time chock insulator matter interval are arranged.
Preferably, the described step forming chock insulator matter figure on underlay substrate comprises:
Underlay substrate is formed chock insulator matter film;
The above-mentioned underlay substrate being formed with chock insulator matter film forms one deck photoresist;
Described photoresist is exposed, developed, region is removed completely to form the complete reserve area of photoresist, photoresist part reserve area and photoresist on described underlay substrate, the complete reserve area of described photoresist corresponds to and forms described main chock insulator matter figure, described photoresist part reserve area corresponds to and forms described chock insulator matter figure, and described photoresist is removed region completely and corresponded to the described partition wall figure of formation;
Remove region completely to the photoresist on described underlay substrate to etch, to form partition wall figure;
Ashing process is carried out to the underlay substrate being formed with partition wall figure, melts the photoresist of described photoresist part reserve area with ash, then described underlay substrate is etched again, to form time chock insulator matter figure;
After secondary chock insulator matter figure is formed, by the photoresist lift off of complete for described photoresist reserve area, to form main chock insulator matter figure.
Preferably, also comprise before described underlay substrate being formed the step of chock insulator matter figure: the step forming color filter figure on described underlay substrate.
Preferably, described method for making also comprises: the step not being formed with the formation back side, the side guarded electrode figure of color filter on underlay substrate; Described chock insulator matter figure is formed directly on color filter figure.
Preferably, also comprise before described underlay substrate being formed the step of chock insulator matter figure: the step forming common pattern of electrodes on described color filter figure; Described chock insulator matter figure is formed directly in common pattern of electrodes.
The present invention provides a kind of display base plate simultaneously, comprises underlay substrate and chock insulator matter disposed thereon, and wherein, described chock insulator matter adopts lighttight material to make, and described chock insulator matter composition figure is separated out multiple pixel region on described underlay substrate.
Preferably, described chock insulator matter adopts the light tight resin of black to make.
Preferably, described chock insulator matter comprises main chock insulator matter, secondary chock insulator matter and partition wall, the height of described chock insulator matter is between the height and the height of partition wall of main chock insulator matter, and described partition wall is arranged between main chock insulator matter and secondary chock insulator matter, and described main chock insulator matter and time chock insulator matter interval are arranged.
Preferably, described display base plate also comprises color filter, and described color filter is arranged between underlay substrate and chock insulator matter.
Preferably, described display base plate also comprises back side guarded electrode, the shielding of the described back side
Electrode is arranged on side underlay substrate not being provided with color filter.
Preferably, described display base plate also comprises public electrode, and described public electrode is arranged on color filter, and described chock insulator matter is arranged on public electrode.
The present invention also provides a kind of display device comprising described display base plate simultaneously.
Beneficial effect:
1) display base plate of the present invention instead of existing black matrix owing to adopting lighttight chock insulator matter, and described chock insulator matter had both played the thick effect of existing chock insulator matter supporting case, play again the effect that existing black matrix prevents light leak and increases contrast, thus eliminate the production process of black matrix;
2) display base plate of the present invention both can be color membrane substrates, also can be array base palte.In existing color membrane substrates, due to underlay substrate not being defined multiple pixel region by the place of black Matrix cover, and color filter is formed on this black matrix, the section of existence difference on the underlay substrate making to be formed with color filter, be unfavorable for the formation of chock insulator matter in subsequent technique, thus formation chock insulator matter before need on color filter the section of being formed difference eliminating layer poor to eliminate section, if display base plate of the present invention is color membrane substrates, then owing to eliminating black matrix, also the problem of the just not section of existence difference, therefore the production process of the section of also omit difference eliminating layer simultaneously.
Accompanying drawing explanation
Fig. 1 is the method for making process flow diagram of color membrane substrates described in the embodiment of the present invention 2;
Fig. 2 is the method for making process flow diagram of color membrane substrates described in the embodiment of the present invention 3;
Fig. 3 is the partial structurtes schematic diagram of chock insulator matter described in the embodiment of the present invention 4, and wherein, Fig. 3 (a) is vertical view, and Fig. 3 (b) is front view.
In figure: the main chock insulator matter of 1-; 2-chock insulator matter; 3-partition wall.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with drawings and Examples, the method for making of display base plate of the present invention, the display base plate adopting the method to make and the display device that comprises described display base plate are described in further detail.
Embodiment 1:
The present embodiment provides a kind of method for making of display base plate, it is included in step underlay substrate being formed chock insulator matter figure, wherein, described chock insulator matter adopts lighttight material to be formed, and described chock insulator matter figure is separated out multiple pixel region on described underlay substrate.
It should be noted that, described display base plate both can be that color membrane substrates also can for array base palte, therefore described chock insulator matter figure both can be formed on color membrane substrates and also can be formed on array base palte.
Preferred described chock insulator matter adopts the light tight resin of black (i.e. negative photoresist) to be formed.
Preferred described chock insulator matter comprises main chock insulator matter, secondary chock insulator matter and partition wall, the height of described chock insulator matter is between the height and the height of partition wall of main chock insulator matter, described partition wall is arranged between main chock insulator matter and secondary chock insulator matter, and described main chock insulator matter and time chock insulator matter interval are arranged.The described step forming chock insulator matter figure on underlay substrate comprises: main chock insulator matter figure forming step, secondary chock insulator matter figure forming step, and partition wall figure forming step.
Particularly, the step of described formation chock insulator matter figure comprises:
Underlay substrate is formed chock insulator matter film;
The above-mentioned underlay substrate being formed with chock insulator matter film forms one deck photoresist;
Described photoresist is exposed, developed, region is removed completely to form the complete reserve area of photoresist, photoresist part reserve area and photoresist on described underlay substrate, the complete reserve area of described photoresist corresponds to and forms described main chock insulator matter figure, described photoresist part reserve area corresponds to and forms described chock insulator matter figure, and described photoresist is removed region completely and corresponded to the described partition wall figure of formation;
Remove region completely to the photoresist on described underlay substrate to etch, to form partition wall figure;
Ashing process is carried out to the underlay substrate being formed with partition wall figure, melts the photoresist of described photoresist part reserve area with ash, then described underlay substrate is etched again, to form time chock insulator matter figure;
After secondary chock insulator matter figure is formed, by the photoresist lift off of complete for described photoresist reserve area, to form main chock insulator matter figure.
The chock insulator matter adopting light-proof material to be formed in display base plate described in the present embodiment can play the thick effect of existing chock insulator matter supporting case, the effect that existing black matrix prevents light leak and increases contrast can be played again, thus the production process of existing black matrix can be omitted, and then do not need the section of setting difference eliminating layer yet, correspondingly improve production efficiency, reduce production cost.
Embodiment 2:
For display base plate of the present invention for color membrane substrates, as shown in Figure 1, the present embodiment provides a kind of method for making of color membrane substrates, color filter in described color membrane substrates comprises red color filter region, green color region and blue color region, described chock insulator matter adopts the light tight resin of black (i.e. negative photoresist) to be formed, and the method for making of described color membrane substrates comprises the steps:
S101. on underlay substrate, form back side guarded electrode figure.
Concrete, underlay substrate is formed back side guarded electrode film (i.e. B-ITO film), then on the guarded electrode film of the described back side, one deck photoresist is applied, mask plate is adopted to expose described photoresist, develop, described photoresist reserve area corresponds to and forms back side guarded electrode figure, again the back side guarded electrode film come out is etched, finally by described photoresist lift off, thus form back side guarded electrode figure.
Described back side guarded electrode is generally connected with the earth point be arranged in color membrane substrates or array base palte (GroundDotting), for being dissipated by earth point by the electrostatic charge from the external world, effectively can avoid the electrostatic from the external world and electromagnetic interference (EMI).
S102. the side not being formed with back side guarded electrode figure on the underlay substrate of completing steps s101 forms red color filter regional graphics, green color regional graphics and blue color regional graphics (namely back side guarded electrode is formed in the side of underlay substrate, and color filter is formed in the opposite side of underlay substrate) respectively.
Preferred described red color filter region adopts red pixel resin to make, and described green color region adopts green pixel resin to make, and described blue color region adopts blue pixel resin to make.
In this step, the formation order of described red color filter regional graphics, green color regional graphics and blue color regional graphics is not limit.
Form red color filter regional graphics, green color regional graphics and blue color regional graphics successively for the side not being formed with back side guarded electrode figure on the underlay substrate of completing steps s101 to be below described in detail to step s102.
Described step s102 is specially:
S102-1. the side not being formed with back side guarded electrode figure on the underlay substrate of completing steps s101 forms red pixel resin film, then one deck photoresist is applied thereon, mask plate is adopted to expose described photoresist, develop, described photoresist reserve area corresponds to and forms red color filter regional graphics, again the red pixel resin film come out is etched, finally by described photoresist lift off, thus form red color filter regional graphics.
S102-2. the side being formed with red color filter regional graphics on the underlay substrate of completing steps s102-1 forms green pixel resin film, then one deck photoresist is applied thereon, mask plate is adopted to expose described photoresist, develop, described photoresist reserve area corresponds to and forms green color regional graphics, again the green pixel resin film come out is etched, finally by described photoresist lift off, thus form green color regional graphics.
S102-3. the side being formed with green color regional graphics on the underlay substrate of completing steps s102-2 forms blue pixel resin film, then one deck photoresist is applied thereon, mask plate is adopted to expose described photoresist, develop, described photoresist reserve area corresponds to and forms blue color regional graphics, again the blue pixel resin film come out is etched, finally by described photoresist lift off, thus form blue color regional graphics.
S103. the side being formed with red color filter regional graphics, green color regional graphics and blue color regional graphics on the underlay substrate of completing steps s102 forms chock insulator matter figure, and described chock insulator matter figure is separated out multiple pixel region on described underlay substrate.
Preferred described chock insulator matter figure is latticed.
Described step s103 is specially:
S103-1. the side being formed with red color filter regional graphics, green color regional graphics and blue color regional graphics on described underlay substrate forms chock insulator matter film; S103-2. on the underlay substrate of completing steps s103-1, one deck photoresist is formed, half-tone mask plate or gray mask plate is adopted to expose described photoresist, develop, region is removed completely to form the complete reserve area of photoresist, photoresist part reserve area and photoresist on described underlay substrate, the complete reserve area of described photoresist corresponds to and forms described main chock insulator matter figure, described photoresist part reserve area corresponds to and forms described chock insulator matter figure, and described photoresist is removed region completely and corresponded to the described partition wall figure of formation;
S103-3. remove region completely to the photoresist on the underlay substrate of completing steps s103-2 to etch, to form partition wall figure;
S103-4. ashing process is carried out to the underlay substrate of completing steps s103-3, melt the photoresist of described photoresist part reserve area with ash, then described underlay substrate is etched again, to form time chock insulator matter figure;
S103-5. by the photoresist lift off of complete for described photoresist reserve area, to form main chock insulator matter figure.
As can be seen from step s103, described main chock insulator matter figure is higher than secondary chock insulator matter figure, described chock insulator matter figure is higher than partition wall figure, the i.e. section of existence difference in described chock insulator matter figure, this is because be filled with liquid crystal between array base palte and color membrane substrates, the section difference existed in chock insulator matter figure can make display panel (by array base palte and color membrane substrates to box and filling liquid crystal form) when being squeezed, the amount of liquid crystal of filling in it can fluctuate within the specific limits.
Certainly, because described back side guarded electrode figure is formed in the side of underlay substrate, color filter figure and chock insulator matter figure are formed in the opposite side of underlay substrate successively, therefore described back side guarded electrode figure can be formed after color filter figure and chock insulator matter figure are formed on underlay substrate successively again, or described back side guarded electrode figure also can be formed after color filter figure is formed on underlay substrate again, namely also described step s101 can after step s103, also can between step s102 and step s103.
Visible, the color membrane substrates made in the present embodiment is the color membrane substrates of the ADS pattern after improving, its needs five patterning processes get final product (step s101 needs patterning processes, a step s102 to need three patterning processes, step s103 to need a patterning processes), with need compared with seven patterning processes in prior art, save twice patterning processes (namely having saved black matrix production process and section difference eliminating layer production process), thus improve production efficiency to a certain extent, reduce production cost.
It should be noted that, described color filter is not limited to comprise the situation in red color filter region, green color region and blue color region, and the color filter that thinkable all colours and combination thereof or modification are formed for those skilled in the art can as the color filter described in the embodiment of the present invention.Described chock insulator matter is also not limited to adopt the light tight resin of black (i.e. negative photoresist) chock insulator matter that formed, and what thinkable all black light-proof materials were formed for those skilled in the art can play the chock insulator matter preventing light leak effect can as the chock insulator matter described in the embodiment of the present invention.Described color membrane substrates also can not comprise color filter, and described color filter can be arranged on array base palte, such as, be arranged between underlay substrate in array base palte and polaroid.
Additive method in the present embodiment and effect all identical with embodiment 1, repeat no more here.
Embodiment 3:
For display base plate of the present invention for color membrane substrates, as shown in Figure 2, the present embodiment provides a kind of method for making of color membrane substrates, color filter in described color membrane substrates comprises red color filter region, green color region and blue color region, described chock insulator matter adopts the light tight resin of black (i.e. negative photoresist) to be formed, and the method for making of described color membrane substrates comprises the steps:
S201. on underlay substrate, red color filter regional graphics, green color regional graphics and blue color regional graphics are formed respectively.
In this step, the formation order of described red color filter regional graphics, green color regional graphics and blue color regional graphics is not limit, and the formation method of described red color filter regional graphics, green color regional graphics and blue color regional graphics is identical with the step s102 in embodiment 2, repeats no more.
S202. on the underlay substrate of completing steps s201, (namely on red color filter regional graphics, green color regional graphics and blue color regional graphics) forms common pattern of electrodes.
Concrete, the underlay substrate of completing steps s201 is formed public electrode film (i.e. ito thin film), then on described public electrode film, one deck photoresist is applied, mask plate is adopted to expose described photoresist, develop, described photoresist reserve area corresponds to and forms common pattern of electrodes, again the public electrode film come out is etched, finally by described photoresist lift off, thus form common pattern of electrodes.
S203. on the underlay substrate of completing steps s202, (namely in common pattern of electrodes) forms chock insulator matter figure, and described chock insulator matter figure is separated out multiple pixel region on described underlay substrate.
Preferred described chock insulator matter figure is latticed.
In this step, the formation method of described chock insulator matter figure is identical with the step s103 in embodiment 2, repeats no more.
Visible, the color membrane substrates made in the present embodiment is the color membrane substrates of the TN pattern after improving, its needs five patterning processes get final product (step s201 needs three patterning processes, step s202 to need patterning processes, a step s203 to need a patterning processes), with need compared with seven patterning processes in prior art, save twice patterning processes (namely having saved black matrix production process and section difference eliminating layer production process), thus improve production efficiency to a certain extent, reduce production cost.
It should be noted that, described color filter is not limited to comprise the situation in red color filter region, green color region and blue color region, and the color filter that thinkable all colours and combination thereof or modification are formed for those skilled in the art can as the color filter described in the embodiment of the present invention.Described chock insulator matter is also not limited to adopt the light tight resin of black (i.e. negative photoresist) chock insulator matter that formed, and what thinkable all black light-proof materials were formed for those skilled in the art can play the chock insulator matter preventing light leak effect can as the chock insulator matter described in the embodiment of the present invention.Described color membrane substrates also can not comprise color filter, and described color filter can be arranged on array base palte, such as, be arranged between underlay substrate in array base palte and polaroid.
Additive method in the present embodiment and effect all identical with embodiment 1, repeat no more here.
Embodiment 4:
The present embodiment provides a kind of display base plate, and it comprises underlay substrate and chock insulator matter disposed thereon, and wherein, described chock insulator matter adopts lighttight material to make, and the figure of described chock insulator matter composition is separated out multiple pixel region on described underlay substrate.
It should be noted that, described display base plate both can be color membrane substrates can be also array base palte, therefore described chock insulator matter figure both can be arranged on color membrane substrates, also can be arranged on array base palte.
The chock insulator matter adopting light-proof material to make in display base plate described in the present embodiment can play the thick effect of existing chock insulator matter supporting case, the effect that existing black matrix prevents light leak and increases contrast can be played again, thus existing black matrix can be replaced, and then do not need the section of setting difference eliminating layer yet, correspondingly improve production efficiency, reduce production cost.
Preferred described chock insulator matter adopts the light tight resin of black (i.e. negative photoresist) to make.
Preferably, as shown in Figure 3, in the present embodiment, the partition wall 3 that described chock insulator matter can comprise multiple main chock insulator matter 1, multiple chock insulator matters 2 and be arranged between described multiple main chock insulator matter and multiple chock insulator matters, described multiple main chock insulator matter 1 and described multiple chock insulator matters 2 interval are arranged, the height of described chock insulator matter 2 is between the height and the height of partition wall 3 of described main chock insulator matter 1, and described main chock insulator matter 1 and time chock insulator matter 2 interval are arranged.Can find out, the section of existence difference between described main chock insulator matter 1, secondary chock insulator matter 2 and partition wall 3, make display panel (such as by array base palte and color membrane substrates to box and the display panel of filling liquid crystal) when being squeezed, the amount of liquid crystal of filling in it can fluctuate within the specific limits.
Embodiment 5:
For display base plate of the present invention for color membrane substrates, the present embodiment provides a kind of color membrane substrates, and it comprises underlay substrate, back side guarded electrode, color filter and chock insulator matter; Described back side guarded electrode is arranged on underlay substrate, and described color filter is arranged on side underlay substrate not being provided with back side guarded electrode, and described chock insulator matter is arranged on color filter.Described chock insulator matter is latticed and adopts lighttight material to make, and the figure of described chock insulator matter composition is separated out multiple pixel region at described underlay substrate.
Preferred described chock insulator matter adopts the light tight resin of black (i.e. negative photoresist) to be formed.
Preferred described color filter comprises red color filter region, green color region and blue color region.
Preferred described pixel region is arranged in multirow along the direction of its minor face, and often row includes multiple pixel region, be positioned at the colour filter region of the equal corresponding same color of multiple pixel regions of same a line to form the colour filter region row of this color, namely form red color filter region row, green color region row and blue color region row; The colour filter region row cycle arrangement successively of different colours, i.e. described red color filter region row, green color region row and blue color region row cycle arrangement successively.
The colour filter region row of preferred described different colours successively cycle arrangement time, the colour filter region in the colour filter region row of adjacent two different colours keeps at a certain distance away or to connect or overlapping.
Other structures in the present embodiment and effect all identical with embodiment 4, repeat no more here.
Embodiment 6:
For display base plate of the present invention for color membrane substrates, the present embodiment provides a kind of color membrane substrates, and it comprises underlay substrate, the color filter be arranged on underlay substrate, the chock insulator matter that is arranged on the public electrode on color filter and is arranged on public electrode.Described chock insulator matter is latticed and adopts lighttight material to make, and the figure of described chock insulator matter composition is separated out multiple pixel region at described underlay substrate.
Preferred described chock insulator matter adopts the light tight resin of black (i.e. negative photoresist) to be formed.Preferred described color filter comprises red color filter region, green color region and blue color region.
Preferred described pixel region is arranged in multirow along the direction of its minor face, and often row includes multiple pixel region, be positioned at the colour filter region of the equal corresponding same color of multiple pixel regions of same a line to form the colour filter region row of this color, namely form red color filter region row, green color region row and blue color region row; The colour filter region row cycle arrangement successively of different colours, i.e. described red color filter region row, green color region row and blue color region row cycle arrangement successively.
The colour filter region row of preferred described different colours successively cycle arrangement time, the colour filter region in the colour filter region row of adjacent two different colours keeps at a certain distance away or to connect or overlapping.
Other structures in the present embodiment and effect all identical with embodiment 4, repeat no more here.
Embodiment 7:
The present embodiment provides a kind of display device, comprises the display base plate according to any one of embodiment 4 ~ 6.
Be understandable that, the illustrative embodiments that above embodiment is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (12)
1. the method for making of a display base plate, it is characterized in that, be included in step underlay substrate being formed chock insulator matter figure, and carried out before forming chock insulator matter figure: the step forming color filter figure on described underlay substrate, wherein, described chock insulator matter figure is latticed, it is separated out multiple pixel region on described underlay substrate, and described chock insulator matter adopts lighttight material to be formed, by the regions shield between described multiple pixel region, to avoid occurring light leak, and increase contrast.
2. method for making according to claim 1, is characterized in that, described chock insulator matter adopts the light tight resin of black to be formed.
3. method for making according to claim 1, it is characterized in that, described chock insulator matter comprises main chock insulator matter, secondary chock insulator matter and partition wall, the height of described chock insulator matter is between the height and the height of partition wall of main chock insulator matter, described partition wall is arranged between main chock insulator matter and secondary chock insulator matter, and described main chock insulator matter and time chock insulator matter interval are arranged.
4. method for making according to claim 3, is characterized in that, the described step forming chock insulator matter figure on underlay substrate comprises:
Underlay substrate is formed chock insulator matter film;
The above-mentioned underlay substrate being formed with chock insulator matter film forms one deck photoresist;
Described photoresist is exposed, developed, region is removed completely to form the complete reserve area of photoresist, photoresist part reserve area and photoresist on described underlay substrate, the complete reserve area of described photoresist corresponds to and forms described main chock insulator matter figure, described photoresist part reserve area corresponds to and forms described chock insulator matter figure, and described photoresist is removed region completely and corresponded to the described partition wall figure of formation;
Remove region completely to the photoresist on described underlay substrate to etch, to form partition wall figure;
Ashing process is carried out to the underlay substrate being formed with partition wall figure, melts the photoresist of described photoresist part reserve area with ash, then described underlay substrate is etched again, to form time chock insulator matter figure;
After secondary chock insulator matter figure is formed, by the photoresist lift off of complete for described photoresist reserve area, to form main chock insulator matter figure.
5. method for making according to claim 1, is characterized in that,
Described method for making also comprises: the step not being formed with the formation back side, the side guarded electrode figure of color filter on underlay substrate; Described chock insulator matter figure is formed directly on color filter figure.
6. method for making according to claim 1, is characterized in that,
Also comprise before described underlay substrate is formed the step of chock insulator matter figure: the step forming common pattern of electrodes on described color filter figure; Described chock insulator matter figure is formed directly in common pattern of electrodes.
7. a display base plate, it is characterized in that, comprise underlay substrate and chock insulator matter disposed thereon and color filter, wherein, described chock insulator matter composition figure is latticed, and it is separated out multiple pixel region on described underlay substrate, and described chock insulator matter adopts lighttight material to make, by the regions shield between described multiple pixel region, to avoid occurring light leak, and increase contrast; Described color filter is arranged between underlay substrate and chock insulator matter.
8. display base plate according to claim 7, is characterized in that, described chock insulator matter adopts the light tight resin of black to make.
9. display base plate according to claim 7, it is characterized in that, described chock insulator matter comprises main chock insulator matter, secondary chock insulator matter and partition wall, the height of described chock insulator matter is between the height and the height of partition wall of main chock insulator matter, described partition wall is arranged between main chock insulator matter and secondary chock insulator matter, and described main chock insulator matter and time chock insulator matter interval are arranged.
10. display base plate according to claim 7, is characterized in that, described display base plate also comprises back side guarded electrode, and described back side guarded electrode is arranged on side underlay substrate not being provided with color filter.
11. display base plates according to claim 7, it is characterized in that, described display base plate also comprises public electrode, described public electrode is arranged on color filter, and described chock insulator matter is arranged on public electrode.
12. 1 kinds of display device, comprise the display base plate according to any one of claim 7-11.
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| CN201210359030.2A CN102854668B (en) | 2012-09-24 | 2012-09-24 | The method for making of display base plate, display base plate and display device |
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| CN201210359030.2A CN102854668B (en) | 2012-09-24 | 2012-09-24 | The method for making of display base plate, display base plate and display device |
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| CN102854668B true CN102854668B (en) | 2015-11-25 |
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| CN105353567B (en) * | 2015-12-02 | 2019-01-15 | 深圳市华星光电技术有限公司 | Using the VA type liquid crystal display panel and preparation method thereof of no black matrix" technology |
| CN109284023B (en) | 2017-07-21 | 2021-01-26 | 京东方科技集团股份有限公司 | Touch panel, preparation method thereof and touch display device |
| CN109402559B (en) | 2018-11-12 | 2021-01-26 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof, evaporation device and display device |
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